TW572851B - Recovery of cerium from solution containing both chromium and cerium - Google Patents
Recovery of cerium from solution containing both chromium and cerium Download PDFInfo
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- TW572851B TW572851B TW89107975A TW89107975A TW572851B TW 572851 B TW572851 B TW 572851B TW 89107975 A TW89107975 A TW 89107975A TW 89107975 A TW89107975 A TW 89107975A TW 572851 B TW572851 B TW 572851B
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/40—Valorisation of by-products of wastewater, sewage or sludge processing
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- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
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Description
572851 五、發明說明(1) [發明之詳細說明] [發明所屬之技術領域] 本發明為關於由含有鉻及錦之溶液,詳言之,為由含有 六價及四價鈽之溶液中,將鈽以硝酸鈽銨(NH4、以(N〇 )) 型式回收之方法。特別地,本發明為關於將含有含鉻金屬 之硝’酸鈽錄溶液予以蝕刻之工程所排出之含有六價鉻與四 價及三價鈽溶液中,將鈽以可使用作為蝕刻用藥品之高純 度石肖酸飾録型式予以回收之方法。 ” 〇 [先前之技術]572851 V. Description of the invention (1) [Detailed description of the invention] [Technical field to which the invention belongs] The present invention relates to a solution containing chromium and bromine, in particular, a solution containing hexavalent and tetravalent europium, The method of recovering amidine as ammonium ammonium nitrate (NH4, (N0)). In particular, the present invention relates to a solution containing hexavalent chromium, tetravalent and trivalent europium discharged from a process for etching a nitric acid recording solution containing a chromium-containing metal, and can be used as a chemical for etching. Method for recycling high-purity shi Xiao acid decoration. "〇 [Previous technology]
於半導體和液晶顯示器之製造工程中,蝕刻工程多含 有含鉻金屬的硝酸鈽銨溶液。由此工程所排出之廢液中 含有六價鉻與四價及三價鈽。因此,此廢液為呈強氧化 性,故必須由廢液中除去此些物質,例如於特 記載於此廢液中添加亞硫酸^納令S 還,,其。人加入虱氧化鈣令鉻與鈽以氫氧化物型式、 ^去之方法。又,於特開平9_85264號公報中,記將、」 價鉻及四價鈽還原後,於吸附劑上吸附除去 、八 [發明所欲解決之課題] ’ ° 但是,於此些方法中鈽最終為被廢 的,故期望儘可能回收再利用。特別,若可二 刻液之高純度硝酸鈽銨型式予以回期=衣名 工程戶二 = = 酸飾録溶液予以 m : 價鈽之廢液溶液中,八你·、In the manufacturing process of semiconductor and liquid crystal display, the etching process mostly contains ammonium hafnium nitrate solution containing chromium metal. The waste liquid discharged from this project contains hexavalent chromium and tetravalent and trivalent europium. Therefore, this waste liquid is strongly oxidizing, so it is necessary to remove these substances from the waste liquid. For example, it is described in this waste liquid that the addition of sulfurous acid ^ Naring S, also. The method of adding lice calcium oxide to humans to remove chromium and tadpoles in the form of hydroxide. Further, in Japanese Patent Application Laid-Open No. 9_85264, it is written that ", after reduction of valent chromium and tetravalent europium, is adsorbed and removed on an adsorbent. [Problems to be Solved by the Invention] '° However, in these methods, the final Because it is obsolete, it is desirable to recycle it as much as possible. In particular, if the high purity ammonium osmium nitrate type of the second engraving solution is returned, the name is the name of the project, the household is equal to = the acid solution is given as m: in the waste solution of the valence, eight you ·,
间純度之硝酸鈽銨型式予以回收之方法。 7鈽LMethod for recovering ammonium ammonium nitrate of intermediate purity. 7 钸 L
89107975.ptd 第4頁 572851 五、發明說明(2) [用以解決課題之手段] 若根據本發明,則可由含有鉻及鈽之溶液中,將氫氧化 #回收之氫氧化鈽回收工程、將氫氧化鈽回收工程所得之 氫氧化鈽沈搬物予以水洗之洗淨工程,於經過洗淨工程之 氫氧化鈽中添加硝酸及氨源令硝酸鈽銨濃縮析出結晶之硝 酸飾銨析出結晶工程,及將石肖酸飾銨析出結晶工程所生成 之確酸鈽銨結晶予以回收之硝酸鈽銨回收工程所構成之由 含有鉻及鈽之溶液中回收高純度硝酸鈽銨。 詳言之’依序進行於含有六價鉻及四價鈽之未滿pH2之 溶液中添加還原劑,將六價鉻及四價鈽分別還原成三價鉻 及三價鈽之還原工程、於還原工程所得之溶液中添加鹼令 三價鉻沈殿除去之除去鉻工程、於除去鉻工程所得之溶液 中添加驗與氧化劑作成pH8以上,並將鈽以四價鈽氫氧化 物型式沈澱之氫氧化鈽沈澱工程、將鈽沈澱工程所得之沈 殿物予以水洗之洗淨工程、將經過洗淨工程之沈澱物溶於 肖酉文中 並於生成之硝酸飾溶液中添加氨源令石肖酸鈽錢漢 細析出結晶之硝酸鈽銨析出結晶工程、及將硝酸鈽銨析出 結晶工程所生成之硝酸鈽銨結晶予以回收之硝酸鈽銨回收 ^私之各工程,則可由含有六價鉻及四價鈽之溶液中回收 高純度硝酸鈽銨。 [發明之實施型態] 2為本發明鈽回收對象之溶液,若為含有鉻及铈、較佳 ”、、s有六價鉻及四價鈽者即可,且亦可含有=鋪。例89107975.ptd Page 4 572851 V. Description of the invention (2) [Means to solve the problem] According to the present invention, the rhenium hydroxide recovery process for recovering the hydroxide # can be performed from a solution containing chromium and rhenium. The washing process of washing the rubidium hydroxide sinking material obtained by the rubidium hydroxide recovery project, adding nitric acid and ammonia source to the rubidium hydroxide after the washing process, the ammonium nitrate decoration crystallizing process, And ammonium osmium nitrate recovery project, which recovers the ammonium osmium acid crystals produced by the crystallization process of ammonium oxalate, and recovers high purity ammonium osmium nitrate from a solution containing chromium and rhenium. In detail, 'reducing agent is sequentially added to a solution containing hexavalent chromium and tetravalent europium under pH 2 to reduce the hexavalent chromium and tetravalent europium to trivalent chromium and trivalent europium, respectively. Adding alkali to the solution obtained in the reduction process removes the chromium from the trivalent chromium Shen Dian. Adds a test oxidant to the solution obtained from the chromium removal process to make it pH 8 or more, and the hydroxide is precipitated in the form of a tetravalent europium hydroxide.钸 Precipitation project, washing process to wash the Shen Dianwu obtained from the 钸 precipitation project, dissolve the precipitate after the washing process in Xiao Wenwen and add ammonia source to the resulting nitric acid decoration solution to make Shi Xiao acid 钸 Qian Han The fine crystallization of ammonium osmium nitrate precipitation crystallization process, and the recovery of ammonium osmium nitrate from the ammonium osmium nitrate crystals produced by the crystallization process of ammonium osmium nitrate, and the recovery of ammonium osmium nitrate can be performed by using hexavalent chromium and High purity ammonium osmium nitrate was recovered from the solution. [Implementation mode of the invention] 2 is the solution of the target of the recovery of the europium of the present invention, if it contains chromium and cerium, it is better to have hexavalent chromium and tetravalent europium, and it may also contain = shop.
89l〇7975.pld 第5頁 572851 發明說明(3) ^含有含鉻金屬之硝酸鈽銨溶液、含有六價鉻及四價 貝錦之’谷液,為適於作為本發明之處理對象。 ^,明首先由此溶液中,回收氫氧化錦。 氫氧化鈽之回收杈佳為由此溶液中回收鉻(鉻回收工 :、由鉻回收後之溶液中回收氫氧化鈽(氫氧化鈽沈澱工 工程之順序進行。又,鉻回收工程為由還原工程及除 去=工程所構成,且較佳以此順序進行。 <還原工程> 將ί $ η:此:容液以未滿邱2並以還原劑予以還原, 或將全部四價筛還原成三價錦。 此還原反應較佳於PH2以下之強乂 =程所排出之廢液通常為此類下;别樣/ 本發明之處理。 放馱注,故可就其原樣供於 常之過氧化氫。過氧化氫通 作用為還原劑。還原劑之使;則對於六價鉻及四價錦 之全量,&別還原成三價對於六價鉻及四價鈽 還原工程若殘存一部分四;m鈽所必須之份量。於此 之工程中,與三價欽Α =鈽未遏原,則於其次之除去鉻 去,故得得鈽之回^降二殘存之四價鈽以沈澱型式被除 尚,若殘存四價鈽,則呈 鉻除去率提高的傾向。因^々八次之除去鉻之工程中之 高鉻除去率之情形中, ,於即犧牲鈽之回收率亦欲提 原工程。此還原工程為^ =可令四價鉻若干殘存地進行還 “、' &有原料六價鉻及四價鈽之溶液89l7975.pld Page 5 572851 Description of the invention (3) ^ Ammonium osmium nitrate solution containing chromium-containing metal, hexavalent chromium and tetravalent shellfish's grain solution are suitable for the treatment object of the present invention. ^, Ming first recovered from this solution. The recovery of thorium hydroxide is preferably the recovery of chromium from this solution (chromium recycler :, the recovery of thorium hydroxide from the solution after chromium recovery (the thorium hydroxide precipitation process is performed in sequence. In addition, the chromium recovery process is based on reduction Engineering and removal = constituted by engineering, and preferably carried out in this order. ≪ Reduction engineering > will ί $ η: This: the volume of the solution is reduced to less than 2 and reduced with a reducing agent, or all the tetravalent sieve is reduced The trivalent bromide is better. This reduction reaction is better than PH2. The waste liquid discharged from the process is usually this type; the other kind / the treatment of the present invention. Put a note, so it can be used as it is. Hydrogen peroxide. Hydrogen peroxide acts as a reducing agent. The reducing agent is used; for the full amount of hexavalent chromium and tetravalent bromine, & don't reduce it to trivalent. 4. The necessary amount of m 钸. In this project, the three valences A = 钸 did not contain the original, then the chromium was removed next, so you can get back 降 ^ reduce the remaining four valence 钸 to precipitate The type is eliminated, and if the tetravalent europium remains, the chromium removal rate tends to increase. Because ^ 々 In the case of the high chromium removal rate in the second chromium removal project, the recovery rate of samarium is also sacrificed, and the original project is also wanted to be raised. This reduction project is ^ = it can make some residual valence of tetravalent chromium to be returned, "& A solution with raw materials hexavalent chromium and tetravalent europium
:^加過氧化氫,旅於常溫下攪拌則可輕易地進行。反應 進行過程可藉由測定溶液的氧化還原電位而追 <除去鉻之工程> 於經過還为τ避之》谷液中,甘, 钬4 、您原工枉 ^ r 其次添加鹼令pH上升,且令 D洗澱。將生成之沈殿物以過滹# 未 /愿 離心等適當手段予以除 古。鉻之沈澱為在pH2以上進行 钦、曲 w P Η若低則溶液中殘存之 1各濃度上升。相反地,ΡΗ若高 二曲殘^之 、 貝〗雖々殘遠之絡〉辰度降 ' 但飾則變成沈藏。因此,& 〜7,姓w c 。> 此除去絡之工程較佳於ρΗ2 驗可Α气ϋ几力發々終厶Η 此工程於溶液中所添加之: ^ Add hydrogen peroxide and stir easily at room temperature. The progress of the reaction can be tracked by measuring the redox potential of the solution < the process of removing chromium > In the gluten solution which is still τ avoidance, ,, 钬 4, your original work ^ r Then add alkali to make the pH Rise, and make D wash. The resulting Shen Dianwu will be removed by appropriate means such as 滹 # 未 / 愿 Centrifugation. The precipitation of chromium is performed at a pH of 2 or higher. If the pH is low, the concentrations of 1 remaining in the solution increase. On the contrary, if PΗ is high in the second song, the decoration becomes sunk. Therefore, & ~ 7, surname w c. > This process of removing the network is better than ρΗ2 可可 Aϋ
金屬θ^ ^ 乂 乳乳化物、虱氧化鈣等之鹼土 ’虱乳化物、氨等,但通當盔 " 佳為氫氧化鈉。 吊為使用鹼金屬氫氧化物、較 <氫氧化鈽沈澱工程> 將經過除去鉻工程之溶液, 佳為ΡΗ10以上,並且添加氧化二之加鹼作成ΡΗ8以上、較 價鈽。 制令液中之三價鈽氧化成四 驗為同於除去鉻之工程,Metal θ ^ ^ 碱 Alkaline earth of milk emulsion, lice calcium oxide, etc. ‘Emulsion of lice, ammonia, etc., but Tongdang helmet is preferably sodium hydroxide. It is better to use an alkali metal hydroxide than the < Hydrogen hydroxide precipitation process > The solution after the chromium removal process is preferably P10 or more, and the alkali added with two oxides to make P8 or more, which is more expensive. The trivalent tritium in the manufacturing order solution is oxidized to tetrazine. The test is the same as the process of removing chromium.
屬氫氧化物、氫氧化鈣等之亦可使用氫氧化鉀等之鹼金 通常為使用鹼金屬氫氧化物、^金屬氫氧化物、氨等,且 工程、氳氧化鈽沈澱工程兩工^佳為氫氧化鈉。除去鉻之 生成之氫氧化鈽中的鹼金屬f ^中’若使用氨作為鹼,則 有氮、於廢液處理上具有費=度為非常低,但因廢液中含 屬氫氧化物作為鹼。 、功夫之問題,故通常使用鹼金 马乳化劑。過氧化氫於前述還Alkali gold that is a hydroxide, calcium hydroxide, etc., and potassium hydroxide can also be used. Usually, alkali metal hydroxides, metal hydroxides, ammonia, etc. are used. Sodium hydroxide. If ammonia is used as a base, the alkali metal f ^ in the ytterbium hydroxide produced by the removal of chromium has nitrogen and has a low cost for waste liquid treatment. However, the waste liquid contains a hydroxide as a hydroxide. Alkali. And kung fu problems, so alkali gold horse emulsifiers are usually used. Hydrogen peroxide is
又,較佳使用過氧化氫 572851 五、發明說明(5) 則作用=強^性條件下作用為還原劑,但於中J4石人 下則作用為氧化劑。若於經過除 ^中性至鹼性 由氧化劑而車仏飾為以f氧化物型式沈凝,但其可姐 添加順序為任意的。 又転與乳化劑的 ,奋/夜中殘存前工程所未除去的三價扠 加驗而暫時# 一1員t,可經由承 ^ 守以風乳化物型式沈澱,但經由轰仆七 j、、 成六價鉻並且再产 ^ 一、、、由虱化劑則再氧化 以上進行。此ίίΓ 氧化飾沈殿工程較佳於PH10 於當π ΤΓ Μ 4/布及鉻之乳化亦可於溶液中加入氧化~i 於吊飢下攪拌則可輕易進行。苴乳化片丨J,亚 物,可經由過遽、離心等適當^ 由…=氧化錦沈澱 於接用禍今儿— 哥週田予奴而由洛液中回收。 複合物沈殿:以為卜令氫氧化飾與過氧化氫之 為,於後續;;::中中含;物中除去過氧化氣。因 中,則變成夫1 Μ中有虱之複合物若溶解於硝酸 I則欠成未滿ΡΗ2的強酸性溶液,令過氧 原劑且四價鈽被還眉占一 11作用為逛 去,其最簡單Ϊ = 。由複合物中將過氧化氫除 可。'早為將沈廠加熱,令過氧化氫分解成水和氧即 <洗淨工程> 水:沈得之沈殿物為含有大量的鹼金屬,故進行 行至“腎:Ϊ之鹼金屬減低的洗淨工程。水洗通常為進 PDm #之鹼金屬含有率,以乾量基準為2000重量 特別為600重量_以下人屬/有率為1 00 0重量ppm以下、 里ppm以下。令沈澱物於水中懸浮作成流漿 第8頁 89107975.ptd 572851 五、發明說明(6) 後以過遽或離心將沈激與洗 回,則可有效率地進行水洗。尹笔水刀離之方法反覆數 水洗為在常溫〜8〇 令水洗次數增加。但是,。若過低則洗淨效率惡化, j以水洗除去,故即使反覆數回=内:所包含之驗金屬 率,大幅降低至乾量基準洗淨旦亦難令鹼金屬含有 所用之水,通常為純水 重聊m之等級。水洗中 純水。 為導電度為1 ^s/cm以下之 <硝酸鈽銨析出結晶工程> 經過洗淨工程將鹼金屬含 解於硝酸中,較佳為於過量=減低之沈澱物,可令其溶 型式完全溶解,其次於其中汚為,中以硝酸鈽之硝酸溶液 溶液中濃縮析出結晶。藉此^ /氨源,令硝酸鈽銨由酸性 小,且可令結晶析出。 ,可令鹼金屬之含有率顯著變 氫氧化鈽易於溫度及濃度高 鈽溶解所用之硝酸溫度通常為6 2文中洛解,故令氫氧化 C,硝酸濃度通常為5 〇〜7 〇重旦^、較佳為7 5〜8 5 為6 0〜7 0重量% (最高共沸濃声0 ^^共沸濃度)、較佳 100%、較佳為95〜looi。 X 。又,硝酸之純度為80〜 又,氨源若為如硝酸銨和氨入 由所得之硝酸鈽銨之純度方面、又=3有銨離子者即可,但 〜30%、純度為〜丨〇〇%之物質。而★言,則—較佳使用氨濃度為 系内之硝酸反應並且發熱,故右使&用氨作為氨源,則與 解,可削減所必須的加熱能量Y 了令生成之硝酸鈽銨溶 572851 五、發明說明(7) 由硝酸鈽之硝酸溶液中析出硝酸鈽銨,可依據公知之方 法,例如專利第2 8 4 4 3 6 8號記載之方法進行。硝酸錦錢於 硝酸中之溶解度,於硝酸濃度愈高,或溫度愈低則愈小。 因此,於硝酸中,添加儘可能除去水分之氫氧化鈽沈殿 並將其丨谷解,其次添加氨源,生成確酸飾按後令其完全溶解 。藉由令生成的硝酸鈽銨完全溶解,則可令析出所得之石肖 酸鈽銨純度變高。為了令硝酸鈽銨完全溶解,其通常於添 加氨源後,於60〜85 °C加溫、攪拌30〜120分鐘。其後,視 需要,於進行濃縮操作後冷卻,令硝酸鈽銨析出結晶為佳。 <硝酸鈽銨回收工程> 析出結晶之硝酸鈽銨沈澱物,可經由過濾、離心等適當 手段,而由溶液中回收。將析出結晶之硝酸鈽銨予以部分 回收後之母液’通常以蒸發濃縮,令硝酸鈽銨更加析出結 晶且回收後,將該母液以用以溶解氫氧化鈽之硝酸型式^ 少再利用一部分為佳。 <硝酸洗淨工程> 由母液中回收之硝酸鈽銨,為以硝酸將附著之鹼金屬以 外之其他不純物洗淨除去,則可更加提高硝酸鈽銨之純 度。以硝酸洗淨,其有效為反覆數回令硝酸鈽銨沈澱物於 硝酸中懸浮作成流漿後,予以過濾或離心分離成沈澱物與參 洗淨廢水之方法、。硝酸洗淨之次數可根據硝酸鈽銨所含不 純物之濃度、作為製品所要求之不純物濃度之說明而予以 適當選定。硝酸洗淨之溫度通常為在常溫附近進行。溫度 若過高,則硝酸鈽銨之溶解度變高且流失變多。又,硝酸In addition, it is preferable to use hydrogen peroxide 572851. V. Description of the invention (5) The action is a reducing agent under strong conditions, but it acts as an oxidizing agent in the middle of J4 Shiren. If it is removed from neutral to alkaline, it is decorated with oxidant and is decorated with f-oxide type, but its order of addition is arbitrary. With the emulsifier, the trivalent fork that was not removed by the previous project in Fen / Night was temporarily inspected and temporarily # 一 1 员 t, can be precipitated by the emulsifier type of Chengfeng, but by the bomber seven, Hexavalent chromium is produced and re-produced ^ 1 ,, and re-oxidation is carried out by the lice agent. This ίΓ oxidized decoration Shen Dian project is better than PH10 in the emulsification of π ΤΓ Μ 4 / cloth and chromium. Oxidation can also be added to the solution and stirred under hunger.苴 Emulsified tablets 丨 J, Substances, can be properly recovered by 遽 = centrifugation, centrifugation, etc. ^ = Oxidation bromide is deposited in the scourge of today's accident-Ge Zhoutian Yunu and recovered from Luoye. Compound Shen Dian: I think the hydroxides and hydrogen peroxide are used in the follow-up; Because it becomes a complex with lice in husband 1 M, if dissolved in nitric acid I, it becomes a strong acidic solution less than PZ2, which causes the peroxygen agent and tetravalent europium to be returned. Its simplest Ϊ =. Removal of hydrogen peroxide from the complex. 'As early as to heat the Shen plant, decomposing hydrogen peroxide into water and oxygen, <washing process> Water: Shen Dezhi Shen Dianwu contains a large amount of alkali metals, so proceed to "kidney: alkali metal Reduced washing process. Water washing usually involves the alkali metal content of PDm #. It is 2000 weight on a dry basis, and 600 weight in particular. It is less than 100% by weight and less than ppm by weight. Material suspended in water to form a slurry. Page 8 89107975.ptd 572851 V. Description of the invention (6) After being washed and washed back by centrifugation or centrifugation, it can be washed efficiently. The number of water washings is to increase the number of washings at room temperature to 80. However, if it is too low, the washing efficiency will be deteriorated, and j will be removed by washing, so even if it is repeated several times = Inner: The metal inspection rate included is greatly reduced to dryness. It is also difficult to make the base metal contain the water used in the standard washing, which is usually a grade of pure water. Pure water in washing. It is the < Ammonium osmium nitrate precipitation crystallization process with a conductivity of 1 s / cm or less > The alkali metal is dissolved in nitric acid after washing process, preferably over Amount = reduced precipitate, which can completely dissolve the dissolved form, followed by the contamination, and the crystals are concentrated and precipitated in the nitric acid solution of thallium nitrate. By this means, the ammonium nitrate is made less acidic, and Crystals can be precipitated. The alkali metal content can be significantly changed. The temperature of nitric acid is easy to dissolve. The temperature of nitric acid used for dissolution is usually 62 ° C, so the hydroxide C and the concentration of nitric acid are usually 50%. 70 ° C., preferably 7 5 to 8 5 is 60 to 70% by weight (highest azeotropic concentration 0 ^^ azeotropic concentration), preferably 100%, and more preferably 95 to 15 loo. X. In addition, the purity of nitric acid is 80 ~. If the source of ammonia is ammonium nitrate obtained from ammonium nitrate such as ammonium nitrate and ammonia, and there are 3 ammonium ions, it is ~ 30% and the purity is ~ 丨. 〇% 的 物。 And in other words,-it is better to use the nitric acid concentration in the system to react with nitric acid and generate heat, so if you use & ammonia as the ammonia source, it can be reconciled and the necessary heating energy can be reduced. The produced ammonium osmium nitrate is dissolved 572851 5. Description of the invention (7) Ammonium osmium nitrate is precipitated from the nitric acid solution of osmium nitrate It can be carried out according to a known method, for example, the method described in Patent No. 2 8 4 4 3 68. The solubility of nitric acid in nitric acid is higher as the concentration of nitric acid is lower or the temperature is lower. Therefore, in nitric acid Add Shen Dian hydroxide, which removes water as much as possible, and dissolve it. Then add an ammonia source to generate acid solution and then completely dissolve it. By completely dissolving the ammonium phosphonium nitrate produced, the precipitation can be obtained. The purity of ammonium ammonium oxalate is increased. In order to completely dissolve ammonium ammonium nitrate, it is usually heated at 60 ~ 85 ° C and stirred for 30 ~ 120 minutes after adding an ammonia source. After that, it is concentrated as needed It is preferable to cool after the operation so that ammonium osmium nitrate precipitates and crystals. < Ammonium phosphonium ammonium nitrate recovery process > The crystallized ammonium phosphonium ammonium nitrate precipitate can be recovered from the solution by appropriate means such as filtration and centrifugation. After partially recovering the crystallized ammonium ammonium nitrate, the mother liquor is usually concentrated by evaporation to make the ammonium ammonium nitrate more precipitated and recovered. After the mother liquor is dissolved in a nitric acid type that dissolves thallium hydroxide, it is better to reuse a part of it . < Cleaning process of nitric acid > The ammonium osmium nitrate recovered from the mother liquor is to remove the impurities other than the attached alkali metal with nitric acid to improve the purity of the ammonium osmium nitrate. Washing with nitric acid, which is effective for several times. After the ammonium hafnium nitrate precipitate is suspended in nitric acid to form a slurry, it is filtered or centrifuged to separate the precipitate and the method of washing wastewater. The number of times of nitric acid washing can be appropriately selected according to the concentration of impurities in ammonium osmium nitrate and the concentration of impurities required as a product. The temperature of the nitric acid cleaning is usually carried out near normal temperature. If the temperature is too high, the solubility of ammonium osmium nitrate will increase and the loss will increase. Also, nitric acid
572851 、發明說明(8) L'爭!!使用之确酸濃度若低’則續酸飾錢之溶解度變高且 二失變多’故硝酸濃度通常為50〜70%(最高共沸濃度), 广,為65〜70%(最高共沸濃度)。又,硝酸之純度愈高, 乂恩可取得大的洗淨效果,故硝酸之純度通常為80〜 、較佳為95〜1〇0%。 鉻金屬之蝕刻液調製中所用之硝酸鈽銨,需求其乾量 f準之鹼金屬含有率為3卿以了、較佳匐卿以下:於滿 此要求上,硝酸鈽銨之析出結晶,較佳於鹼金屬含有率 為35〇Ppm以下、特別為3〇〇ppm以下之母液中開始進行。若572851, description of the invention (8) L 'contention !! If the acid concentration used is low, then the solubility of the acid continues to increase and the di-loss increases, so the nitric acid concentration is usually 50 ~ 70% (the highest azeotropic concentration) , Wide, 65 ~ 70% (highest azeotropic concentration). In addition, the higher the purity of nitric acid, the greater the cleaning effect of thion, so the purity of nitric acid is usually 80 ~, preferably 95 ~ 100%. The ammonium osmium nitrate used in the preparation of the etching solution of chromium metal requires an alkali metal content of 3% or less, preferably the following: In the case of satisfying this requirement, the precipitated crystals of ammonium osmium nitrate are It is better to start in mother liquors with an alkali metal content of 35 ppm or less, particularly 300 ppm or less. If
由,此鹼金屬含有率之母液中進行析出結晶,則所得石肖 酉欠鈽銨結晶之鹼金屬含有率,即使於硝酸洗淨後亦難作成 lppm以下° 母液中之鹼金屬含有率為35〇ppm以下,將分離出析出結 晶後之母液,再利用作為溶解氫氧化鈽所用之硝酸時,必. 須將其部分排出系統外,並防止鹼金屬於系統内堆積。但 是,對系統外之排出量若多,則令溶解之鈽的損失增加,-故排出量較佳於析出結晶之母液之鹼金屬 30 0ppm、特別為20 0〜250ppm下進行。 若根據本發明,則以含有硝酸鈽銨之蝕刻液,蝕刻鉻工 程所排出之廢液中,將鈽以可調製蝕刻液之高純度硕酸铈II 銨型式回收。 [實施例] <實施例> 以含有硝酸鈽銨1 2重量%、硝酸3 8重量%、及過氣酸2重Therefore, precipitation and crystallization in the mother liquor of this alkali metal content rate, the alkali metal content rate of the obtained crystals of Shi Xiaoyu under ammonium, even after washing with nitric acid, is difficult to be less than 1 ppm. The alkali metal content rate in the mother liquor is 35 ppm In the following, when the mother liquor after crystallization is separated and reused as the nitric acid used to dissolve the thorium hydroxide, it must be discharged out of the system to prevent the alkali metal from accumulating in the system. However, if there is a large amount of discharge outside the system, the loss of dissolved plutonium will increase. Therefore, the discharge is preferably performed at 300 ppm, especially 200 to 250 ppm, of the alkali metal from which the crystallized mother liquor is precipitated. According to the present invention, the etching solution containing ammonium osmium nitrate is used to recover the waste solution discharged from the chromium etching process, and the rhenium is recovered as a high-purity cerium II ammonium sulphate which can be prepared as an etching solution. [Examples] < Examples > 2% by weight of ammonium phosphonium nitrate, 38% by weight of nitric acid, and 2% by weight of peroxyacid were included.
89107975. ptd 第 11 頁 572851 五、發明說明(9) ,之蝕刻液,將鉻薄膜蝕刻之工程所排出之六價鉻〇. 〇 2 3 莫耳/升、四價鈽〇· 〇70莫耳/升、三價鈽〇· 278莫耳/升之 ^餘,液(ρΗ0· 2 ) 1 330公升中,攪拌下室溫中,將作為過 ,化氫之3 5重量%過氧化氫水溶液,相對於鈽添加約〇 · 4倍 莫耳’並將鉻及鈽還原成三價。反應之終點為由測定溶液 之氧化還原電位而檢測出。其次,於此溶液中,攪拌下室 /里中,將2 5重量%氫氧化鈉水溶液添加至令液體之μ為6 · 〇 。將生成之沈澱物以過濾除去,並於濾液中,攪拌下 至溫中,將過氧化氫水溶液相對於鈽添加丨· 7倍莫耳,令 鈽氧化,其後,添加25重量%之氫氧化鈉水溶液令溶液: ph為ίο。室溫下攪拌!小時後,於8(rc加熱且再攪拌2小 時。。過濾則取得氫氧化鈽之薄黃色沈澱物。鈽之回收率為 90%。此沈澱物之鈉含有率以乾量基準為12重量%。 · 、,將其以乾量基準為0·1克/升地懸浮於純水中,攪 拌後重覆5回過濾之操作。沈澱物之鈉含有率以乾量美 為6 00重量ppm。 以乾里基準,將85· 1 2公斤之上述沈澱物加至7〇%硝酸 5^公斤中,於84 t中加熱且保持2小時。沈澱物為完全溶 解。於其中添加29%氨水48公斤,並於攪拌下於84。 小時。其次’^c/hr之速度冷卻至室溫,取㈣== ^晶152公斤。結晶分離後之母液中的鈉含有率為約8〇 重量ppm。 將此結晶以結晶同重量之70%硝酸予以洗淨並乾燥。结 晶之純度為99. 0%,含鈉之金屬類含有率為未滿i重量°89107975. ptd Page 11 572851 V. Description of the invention (9), The etching solution, the hexavalent chromium discharged from the process of etching the chromium thin film is 0.02 mol / liter, and the tetravalent 钸 〇.〇70 mol / Liter, trivalent 钸 278 mol / liter of excess, liquid (ρ Η 0 · 2) 1 330 liters, at room temperature under stirring, will be used as hydrogen peroxide, 35% by weight hydrogen peroxide aqueous solution, Add about 0.4 times Mohr's to tritium and reduce chromium and tritium to trivalent. The end point of the reaction was detected by measuring the redox potential of the solution. Next, in this solution, a 25% by weight aqueous sodium hydroxide solution was added to the lower chamber / chamber to make the liquid μ to be 6.0. The resulting precipitate was removed by filtration, and the filtrate was stirred and warmed, and a hydrogen peroxide aqueous solution was added to 钸 · 7 times moles to oxidize 钸, and thereafter, 25% by weight of hydroxide was added. Aqueous sodium solution makes the solution: ph is ίο. Stir at room temperature! After 8 hours, heat at 8 ° C and stir for another 2 hours. Filter to obtain a thin yellow precipitate of rhenium hydroxide. The recovery of rhenium is 90%. The sodium content of this precipitate is 12% by weight on a dry basis ·, Suspend it in pure water on a dry basis of 0.1 g / liter, repeat the operation of filtering 5 times after stirring. The sodium content of the precipitate is 6000 ppm by dry weight. On a dry basis, add 85.1 kg of the above precipitate to 5 ^ kg of 70% nitric acid, and heat and hold for 2 hours at 84 t. The precipitate is completely dissolved. 48 kg of 29% ammonia water is added to it And, under stirring for 84 hours. Next, cool down to room temperature at a rate of ^ c / hr, take 152 kg of = = ^ crystals. The sodium content of the mother liquor after crystal separation is about 80 ppm by weight. This crystal is washed and dried with 70% nitric acid of the same weight as the crystal. The purity of the crystal is 99.0%, and the content of the metal containing sodium is less than 1% by weight.
572851572851
ppm。此時相對於廢蝕刻液中之 <比較例> 回收率為66% 之氫氧化 化鈽沈澱 持2小時< 並於攪拌 卻至室溫 結晶純 過濾後乾 回收之硝 又,此 :1/理,由廢錄夜中回收氫氧化飾。將所得 :未水洗地,就其原樣將乾量基相公斤之氫氧 、’加至70%石肖酸520公斤中,並於84。。加熱且保 >沈澱物為完全溶解。於其令添加m氨水48公斤 下84 C中保持2小時。其次,以6 〇c/hr之速度冷 ’取得硝酸鈽銨之結晶丨5 1公斤。 ,為到達9 9· 0%,將此結晶重覆以7〇%硝酸洗淨、 燥。其結果,洗淨所需之硝酸為348公斤,取得 酸鈽銨結晶1 3 6公斤。 時相對於廢蝕刻液中鈽之回收率為58%。ppm. At this time, with respect to the < Comparative Example > recovery rate of 66% of the rhenium hydroxide in the waste etching solution, hold it for 2 hours < and stir it to room temperature to crystallize the purely recovered nitrate after filtering, again: 1 / manufactured, recycle the hydroxide decoration from waste recording night. The obtained: without washing the ground, as it is, dry weight of basic phase kilograms of hydrogen and oxygen was added to 70% of 520 kilograms of oxalic acid, and at 84. . Heat and keep the precipitate completely dissolved. Add 48 kg of ammonia water at 84 C under the condition of 2 hours. Next, it was cooled at 60 ° C / hr to obtain 5 1 kg of crystals of ammonium osmium nitrate. In order to reach 99.0%, this crystal was repeatedly washed with 70% nitric acid and dried. As a result, the nitric acid required for washing was 348 kg, and 136 kg of ammonium phosphonium crystals were obtained. The recovery rate of plutonium in waste etching solution was 58%.
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TW89107975A TW572851B (en) | 1999-04-27 | 2000-04-27 | Recovery of cerium from solution containing both chromium and cerium |
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KR (1) | KR20010049291A (en) |
TW (1) | TW572851B (en) |
Families Citing this family (2)
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KR20020022309A (en) * | 2000-09-19 | 2002-03-27 | 정지완 | Ceric ammonium nitrate manufacture method |
KR100391715B1 (en) * | 2000-10-05 | 2003-07-16 | 일동화학 주식회사 | Method for preparing ceric ammonium nitrate with high purity |
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2000
- 2000-04-26 KR KR1020000022090A patent/KR20010049291A/en active IP Right Grant
- 2000-04-27 TW TW89107975A patent/TW572851B/en not_active IP Right Cessation
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