TW574420B - Surface treating films on nickel metal with superior heat resisting adhesivity to resins - Google Patents
Surface treating films on nickel metal with superior heat resisting adhesivity to resins Download PDFInfo
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- TW574420B TW574420B TW91121277A TW91121277A TW574420B TW 574420 B TW574420 B TW 574420B TW 91121277 A TW91121277 A TW 91121277A TW 91121277 A TW91121277 A TW 91121277A TW 574420 B TW574420 B TW 574420B
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- nickel
- based surface
- film
- phosphorus
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/32—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
- C23C28/321—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
- C23C28/345—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
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- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Inorganic Chemistry (AREA)
- Organic Chemistry (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Chemical Treatment Of Metals (AREA)
- Laminated Bodies (AREA)
Description
574420 五、發明說明(l) ------- 【本發明之詳細說明】 【本發明所屬之技術領域】 本發明為有關為了提供為對象之基材,特別是金 樹脂接著時,_力之接著力,形成於金屬表面之 面處理皮膜。如更詳細地敘述,即為有關縱使將前述之金 屬—樹脂接合體置於200 °c〜300 r之高溫環境下仍可佴姓 優異接著力之鎳系表面處理皮膜。 μ、 【習知之技術】 於印刷電路板、標準框、LS I等等之電子電器零件,金屬 ^樹,之接合部分經常被使用。尤其,在使用於此領域之 環氧樹脂或聚醯亞胺樹脂等之熱硬化性樹脂或成、 之熱可塑性樹脂中,於這些樹脂成形之時,需 體於,〜斷之高溫下曝曝。又,為了 : = 上之銅泊上形成配線佈局,亦需經過與有機溶劑、酸以及 驗等等之化學藥品接觸之嚴酷之製造工程。再者,組裝半 導體零件等等之有源零件,LCR等等之無源零件時雖使&用 焊接,因近來之環境問題鉛焊接漸無法使用,故焊接反流 溫度正逐漸升高。 於此種狀況下,金屬基材與樹脂之接著性低劣,尤其在高 溫時吸附於金屬面之水分或因製造工程吸附於接著界面^ 水分膨脹而造成金屬基材表面與樹脂之剝離;膨脹等等之 產生將損及内部之耐蝕性,依情況之不同將導致樹脂破 裂,配線佈局被破壞之結果。574420 V. Description of the invention (l) ------- [Detailed description of the present invention] [Technical field to which the present invention belongs] The present invention relates to a substrate for providing an object, especially a gold resin, Force-to-force force forms a surface treatment film on a metal surface. As described in more detail, it is related to a nickel-based surface treatment film that has excellent adhesion even when the aforementioned metal-resin joint is placed in a high temperature environment of 200 ° C to 300 r. μ, [Known technology] Used in printed circuit boards, standard frames, LS I, and other electronic and electrical parts, metal parts, and joints. In particular, in thermosetting resins or thermoplastic resins such as epoxy resins or polyimide resins used in this field, when these resins are molded, they need to be exposed to high temperatures at high temperatures. . In addition, in order to: = form the wiring layout on the copper berth, it also needs to undergo severe manufacturing processes in contact with organic solvents, acids, and chemicals. Furthermore, although active parts such as semiconductor parts and passive parts such as LCR are used for welding, lead welding has become increasingly unavailable due to recent environmental problems, so the solder reflow temperature is gradually increasing. Under such conditions, the adhesion between the metal substrate and the resin is poor, especially the moisture adsorbed on the metal surface at high temperature or due to the manufacturing process adsorbed on the bonding interface ^ The expansion of the water caused the metal substrate surface and the resin to peel off; swelling, etc. The occurrence of such damage will damage the internal corrosion resistance, depending on the situation, it will cause the resin to crack and the wiring layout to be damaged.
第5頁 五、發明說明(2) 2令金屬基材與樹脂之接著性提高,由以前即施行機械 使金屬表面粗面化,所謂形成固定點之 ,但這種機 =工生產性不佳且常導致高成本,’又 生於加工時之 ,粒:經常會損及電子電器零件之㈣性:因此,實際 上,一般都在金屬基材表面施行一些 。 鋼鐵材料中以碟酸鹽處理:ς於二以及銅合金’ 妒ί黑』之氧化銅處理為其代表。前者為,令與亞 =之第3磷酸之溶解度積極小之重金屬溶解,與磷酸 性水溶液接觸之方法;後者為,浸潰於含有適當氧化劑 之強鹼水溶液煮沸之方法。 、、Page 5 V. Description of the invention (2) 2 The adhesion between the metal substrate and the resin is improved, and the metal surface was roughened by machinery before, so-called fixed points are formed, but this machine = poor productivity And often lead to high costs, 'Born again during processing, grain: often damage the nature of electronic and electrical parts: Therefore, in fact, generally implemented on the surface of the metal substrate. In steel materials, dish salt treatment: Cu 2 and copper alloy ‘Je ί Black’ are treated with copper oxide as its representative. The former is a method of dissolving heavy metals with a low solubility in the third phosphoric acid of sub- =, and contacting it with a phosphoric acid aqueous solution; the latter is a method of boiling by immersion in a strong alkaline aqueous solution containing an appropriate oxidant. ,,
Ur數由磷酸鹽處理而形成之皮膜因含有結晶水,至多 於『染广程Λ中结1 將被破壞,且皮膜之耐熱性不佳; 不佳j:二1=#左接者初期之接著性雖良好,因财久性 時間而逐漸減低1對於加熱處理亦益 泛保持其初期之接著力。 心ΛΙ…、 對此,於特開平9 - 2091 67號公報或特開平9 =中’由在金屬基材表面施以鉻酸鹽處理 公 升。再者,於特開2000 — 1 9 3235號公報中亦ς _者性提 法令其形成於表面存有多數之微小鱗片叔不使用電解 合物層之方法。 片狀犬起之特殊鉻化 Ϊ Ϊ ί ί方法之任何一個皆於表面處理液使用有宝之6伊 鉻化合物,可知形成之金屬基材表面上 u之6仏 合物,此於環境保護上較不理想。 貝之路化 【本發明所欲解決之課題】 五、發明說明(3) 本發明為欲解決前述以往技 的在於’非使用6價鉻等等為;的問’,·本發明之目 供金屬基材與樹脂之接著性,原因之物質,而提 性之表面處理皮膜。 回溫時擁有優異接著 【解決此課題之方法】 本f明人為了解決前述技術上所存有之門0§ 結果,將焦點置於一般而言耐熱 2而銳意檢討之 金屬錄以及形成於其表面之錄氧化物;7 =定性優異之 元素發明了與樹脂之接著性及唯一優里j 中由導入第3 處理皮膜。 一之嶄新的鎳系表面 即言,本發明為,於為對象之素材上所 造的錄系表面處理皮膜,提供在該構 熱接著性優異之鎳系表面處理皮膜。“徵之與树脂之耐 又’:二用:為本發明前述之鎳系表膜所 磷的替代元素。 反胰所&有之 前述之錄系表面處理皮膜所含有之元 與朋亦可共存。 打… %研尔衣®爽理反膘之鎳,磷以及/或$ 之含有比率為上層之含有比率比下層者大ν即言滿足以一 戶斤述之關係較為理想。 【(磷以及/或硼)/Ni】下層 < 【(磷以及/或硼)/ 0】上」 又,前述鎳系表面處理皮膜之上層含有柱狀組織,柱狀名 I,相對於前述鎳系表面處理皮膜之鎳,磷以及/或硼 含有比•率為上層之合右比桌屮丁爲本丄^ β _ JL· 赞听說明(4) = —為理想。 理想。 、、/、"面處理皮膜於銅或銅合金上形成笋、 刖述本發明之 色外觀者較為理想:A理皮膜擁有灰色、灰黑色以及黑 以下將對於本發明之 明。 鎳糸表面處理皮膜做更為詳細之說 本發明之鎳系| /或蝴之素材表面:3膜;J配置含有金屬鎳與碟以及 層構造,下芦之么Μ θ 3有氧之表面,即是上岸之? 形成’而對i素材對2材因充分之密著“可 域中,因經常特別要;銅或柄;:=,於電子電器零件之領 故對象素材以铜為中心:金與樹脂之耐熱接著性, 本發明之錄系声 稱通)像示v圖广=之斷_面掃瞒電子顯微鏡(以下 本發明之錄系表面處理皮ϋ圖2。圖1之符號1表示 氧、磷),圖丨之符、士 g柱狀組織(含有鎳、 下層(含有錄、碟二^^發/月之錄系表面處理皮膜之 顯示了本發明之丄f 1之符號3則表示銅基板。圖2 )。 之鎳系表面處理皮膜之表面㈣像(χΐ〇〇〇〇 如圖1所示,本雜 。 且可觀察到柱鱼桎之表^面處理皮膜上層存有柱狀組織, 觀察(圖2 )為不柱定之开間有著微小的間隙。因此,如由表面 級之極微細之凹凡"且可查知其為數Bnm〜數l〇〇nm等 凹凸,與樹脂接著時可得到及巨大且有效之 574420 五、發明說明(5) 實質表面積。 如藉由XPS分析,上層之鎳於氧化狀態且厚度於50nm之程 度’單於金屬鎳上形成之氧化物由此更是只為薄膜,且無 法形成如同本發明之枉狀組織。由本發明導入之第3元 素’即是藉由碟以及/或领之導入而得到如同本發明之形 態。經驗上,這些第3元素於2重量%〜50重量%之範圍内 較為理想。未滿2重量%時則無法獲得這樣的形態,超過 5〇重量%者雖無妨礙,形成如此組成的鎳皮膜隨著含有量 之增加而欲形困難。即言於經濟面上較為不利。 本發明之鎳系表面處理皮膜之上層柱狀組織高度於5 〇〜 3〇〇〇nm之範圍内較理想。如未滿5〇關則將無法充分形成表 面之微細的凹凸,而超過30 00nm則凹凸將粗大化。另一 面,下層的金屬鎳層厚度並無特殊限制。但 兩 出對象素材表面之一部分之充八~ @ 絡 A裡相何衣曲之口丨刀之充刀包覆,於〇 · 5 // m以上輕 ^ =心。又,因不必要之厚膜於經濟上不利,膜 車又 如有5 // m者則可稱充分。 、之上限 明之鎳系表面處理皮膜的外觀呈現灰色、 於黑色。如圖1以及圖2所見’或可認二色以至 柱狀組織吸收可視光,但此在電子^ ς ; π有間隙之 理想的。由銅配線佈局通過樹 ς二,領域中是較 面處理皮膜表面)日夺,其呈現者命(本發明之表 明確,施行光學的佈局檢查時為=,且和佈局之對比 本發明之錄系表面處理皮膜為車 成金屬絲層後,藉由令表面氧化而二;方法於對象素材形The film of Ur number formed by phosphate treatment contains crystal water. At most, "dyeing wide range Λ in the junction 1 will be destroyed, and the heat resistance of the film is not good; poor j: 二 1 = # 左 接 者 的 前 的Although the adhesiveness is good, it is gradually reduced due to the long duration of time. 1 It is also common to maintain the initial adhesiveness for heat treatment. In this regard, in JP-A-9-209167 or JP-A-9 = Medium ', a liter is treated by applying a chromate treatment to the surface of a metal substrate. Furthermore, in Japanese Patent Application Laid-Open No. 2000-1 9235, it is also proposed that a method of forming a large number of minute scales on the surface without using an electrolyte layer is proposed. Any of the special chrome-based Ϊ Ϊ ί ί methods used in flakes can be used in the surface treatment liquid. You can know that the 6-U compound on the surface of the metal substrate is formed. This is for environmental protection. Less desirable. The road to the shell [Problems to be solved by the present invention] V. Explanation of the invention (3) The present invention aims to solve the aforementioned prior art by 'non-use of hexavalent chromium, etc .;', the purpose of the present invention Adhesiveness between metal substrate and resin, the cause of the matter, and an improved surface treatment film. It has excellent performance at the time of temperature recovery. [Methods to solve this problem] In order to solve the above-mentioned technical door 0§, the results are focused on the heat-resistant metal records and formed on the surface. The recorded oxide; 7 = the element with excellent qualitative properties was invented with the resin, and the only film was introduced into the third treatment film. In other words, the present invention relates to a nickel-based surface-treated film which is a surface-treated film formed on a target material, and which is excellent in thermal adhesion. "Symptoms and resistance of resins": dual use: it is a substitute element for phosphorus in the nickel-based surface film of the present invention. Anti-pancreatic acid & some of the aforementioned record-based surface treatment film can also contain elements and friends. Coexistence. The content ratio of nickel, phosphorous, and / or $ of Yaneryi® Shuangliyi is that the content ratio of the upper layer is greater than that of the lower layer, which means that it is ideal to satisfy the relationship described in one household. [(Phosphorus And / or boron) / Ni] the lower layer < [(phosphorus and / or boron) / 0] the upper layer; and the upper layer of the nickel-based surface treatment film contains a columnar structure, the columnar name I is opposite to the nickel-based surface The content ratio of nickel, phosphorus and / or boron of the treated film is higher than that of the upper layer. The ratio is 比 β _ JL. Please listen to the explanation (4) = — ideal. ideal. The surface treatment film forms bamboo shoots on copper or copper alloys and describes the color appearance of the present invention. It is desirable that the A-layer film has gray, gray-black, and black. The following will describe the present invention. The surface of the nickel-coated surface treatment film is made in more detail. The surface of the nickel-based material of the present invention is: 3 films; J is configured to contain metallic nickel and a plate and a layer structure. Is it ashore? The formation of the i material and the two materials is due to the closeness of the material. In the field, it is often necessary; copper or shank;: =, in the field of electronic and electrical parts. The object material is centered on copper: gold and resin The continuity of the recording of the present invention is shown in Figure V. The cross-section scanning electron microscope (hereinafter the recording of the present invention is shown in Figure 2. The symbol 1 in Figure 1 represents oxygen and phosphorus) The symbol of Figure 丨, columnar structure (including nickel, lower layer (including recording, disc ^^ hair / month) is a surface-treated film. The symbol 3 of the invention 丄 f 1 represents a copper substrate. Figure 2). The surface image of the nickel-based surface-treated film (χΐ〇〇〇〇 is shown in Figure 1, this is mixed. And can be observed on the surface of the surface of the columnar fish film treated with columnar structure, observed (Figure 2) There is a slight gap between the non-column openings. Therefore, if the surface level is extremely fine, it can be found that it has irregularities such as several Bnm to several hundred nm, and it can be bonded to the resin. Obtained and huge and effective 574420 V. Description of the invention (5) Substantial surface area. As analyzed by XPS, the upper nickel The oxide state and the thickness is about 50nm. 'The oxide formed on the metal nickel is only a thin film, and it cannot form the maggot-like structure of the present invention. The third element introduced by the present invention' is through a dish. And / or the introduction of collars to obtain the form of the present invention. Empirically, these third elements are preferably in the range of 2% to 50% by weight. When the content is less than 2% by weight, such a form cannot be obtained, exceeding 5 〇Weight% has no hindrance, it is difficult to form a nickel film with such a composition as the content increases. That is to say, it is more disadvantageous in terms of economy. The nickel-based surface treatment film of the present invention has a columnar structure higher than 5 The range of 〇 ~ 3000nm is ideal. If it is less than 50mm, the fine unevenness on the surface will not be fully formed, and the unevenness will become coarser than 300nm. On the other hand, the thickness of the underlying metal nickel layer is the same. There are no special restrictions. However, one part of the surface of the two object materials is filled with eight ~ @ A 里 相 何 衣 曲 的 口 丨 The knife is filled with a knife, and it is lighter than 0.5 5 // m ^ = heart. Also, because Unnecessary thick film The disadvantage is that the film car is sufficient if it has 5 // m. The upper surface of the nickel-based surface treatment film is gray and black. As shown in Figures 1 and 2, it can be recognized as two colors or even columns. The tissue-like tissue absorbs visible light, but this is ideal for electrons with a gap of π. The copper wiring layout passes through the tree, and the field is more surface-treated than the surface of the film. The life of the presenter (the table of the present invention) It is clear that when the optical layout inspection is performed, and the comparison with the layout, the surface treatment film of the recording system of the present invention is formed into a wire layer, and the surface is oxidized, and the method is based on the object material shape.
化而形成。形成金屬鎳層之 574420Formation. 574420 forming metal nickel layer
方法以如同PVD等等之物 解鑛金法等等之濕式表面處理隹亦J能’電鍵法或無電 下便對於前述以令第3元素共 於里產性上較為優異。以 為了令為第3元素之磷共析,‘㊁目的之鍍金法敘述之。 眾所周知之瓦特浴添加次亞 ' 鑛之情形,例如亦可於 鍍金之情形,亦可使用以市售亞磷酸。又,在無電解 式。 〇 -人亞磷酸為還原劑之形 其次,為了令為第;3元素之硼共 烧)等之含有爛之還原劑的無電解’用^ΜΑΒ (二甲胺棚 同時使用為還原劑之DMAB與此亞n爻两:再者,如 析。而這些任何一個皆有販售。〜馱,可令磷與硼同時共 另一方面,藉由添加於鍍金液之 /或硼,即可令碳、氮、硫碏以及M,將其加入磷以及 意義之上,這些方法將往更為理相,共析。於黑色化之 藉由導入以下所述之添加劑將可得 向作用t。例如, 即言,於令氮共析時,可添加苯胺、用。 胺、二甲基胺、三乙醇胺、酢酸三 乙基胺、二乙醇 嗎啡啉、鄰啡囉卩林、甘4酸、冑氨美二胺、吡4、咪唑、 蠶絲氨基酸、減、天冬酸、乙:ί;,、丙氨酸、 機物。於令硫磺共析時,可添加Ν,Ν〜表性之含有氮之有 硫青羰酸晶鹼、1,3 —二乙基—2 —炉—乙基—氨基代甲 酸、乙基硫氨酸、膀胱氨基酸、半膀:尿广甲硫丁氨 縮膀胱氨基酸縮甘氨基酸 '硫代甘^氦基酸、膠氨基酸 1 ’ 2 ’ 3 -苯并三唑-2 :噻唑啉—2?糖精、雙°比啶、 埽醇、噻唑、硫代The method uses a wet surface treatment such as PVD or the like, ore-deposited gold, or the like, and can also be excellent in the properties of the third element in combination with the aforementioned method by using the J'bonding method or without electricity. In order to make phosphorous eutectoid as the third element, ‘the purpose of the gold plating method is described. A well-known case of adding a sub- 'ore to a watt bath, for example, in the case of gold plating, a commercially available phosphorous acid can also be used. Also, in the non-electrolytic type. 〇-Human phosphorous acid is a reducing agent. Secondly, in order to make it the first element; boron co-firing of 3 elements) and other non-electrolytic materials containing rotten reducing agents. ^ ΜΑΒ (dimethylamine shed is also used as reducing agent DMAB) This is the same as the following: Moreover, such as analysis. And any of these are sold. ~ 驮, can make phosphorus and boron co-exist at the same time, by adding to the gold plating solution / or boron, you can make Carbon, nitrogen, sulfur, and M, adding them to phosphorus and meaning, these methods will be more rational, co-evaluation. In the blackening, the introduction of the additives described below will be able to obtain the action t. For example In other words, when co-analyzing nitrogen, aniline can be added and used. Amine, dimethylamine, triethanolamine, triethylamine gallate, diethanolmorpholine, orthomorphine, glycylic acid, and ammonium Melamine, pyridine 4, imidazole, silk amino acid, minus, aspartic acid, B :, alanine, organic matter. When co-analyzing sulfur, you can add Ν, Ν ~ There are thiocyanic acid crystalline base, 1,3-diethyl-2-furnace-ethyl-aminocarboxylic acid, ethylthionine, bladder amino acid, Bottom: Urinary methylthiobutanine, bladder amino acid, glycidyl amino acid, thioglycol, helyl acid, gum amino acid 1 '2' 3-benzotriazole-2: thiazoline-2? Saccharin, bi ° pyridine, Methanol, thiazole, thio
第10頁 574420Page 10 574420
五、發明說明(7) ㊁ΐ r碎氧代吲0朵酸、。—磺氨安息香酸、對氨基 :巧、甲基橙、氨基苯續酸、 ,噻唑、蘇發噠曝、硫氰酸含夂2 = 鹽化^、2 析時,可添加碳酸亞鉛、氧化亞鉛、 :%,可添加嗤次乙三氨基等之代表性的氨系有:::共 如=及銅合金之情形0寺,電鑛之 其在使用亞後’可直接電鑛’而以無電解鑛金尤 媒活性,故;法浴時’因銅對於亞磷酸無其觸 纪置換鑛金;於此情形下,藉由 擊電鍍施行為-欠掷#為1 ί处试量鈀鍍金.,或稍微觸 佳。 人微未之鎳錢後,再執行無電解鑛金較 於對象素材形成所定之^^ 人 織層。於此,令其與人=嘀二^ 7,、於表面形成柱狀組 果。具體而言,二^二 劑之酸接觸處理較有效 陽極以及陰極之分;化i;!r局部電池之 、、,α果完成了為本發明特V. Description of the invention (7) 碎 r crushed oxoindole acid. —Sulfabenzoic acid, p-Amino acid: tritium, methyl orange, aminobenzoic acid, thiazole, sulphuric acid, thionium thiocyanate. 2 = salinity ^, 2 can be added when leaching, oxidation Lead-based,:%, representative ammonia systems that can be added with ethylene glycol triamino, etc. are: ::: Gongru = and the case of copper alloy Non-electrolytic ore gold is particularly active, so in the bath, 'the copper is replaced by ore gold due to its inconsistency to phosphorous acid; in this case, by electroplating, the behavior of under-throwing is # 1 and palladium is tested. Gold-plated., Or slightly better. After the nickel money of Weiwei, the electroless mineral gold is used to form a predetermined ^^ human texture layer compared to the target material. Here, let it be equal to 与 2 ^ 7 to form a columnar component on the surface. Specifically, the acid contact treatment of the two agents is more effective for the anode and the cathode; the!, ,, and α α of the local battery has been completed as a special feature of the present invention.
第11頁 劑。或,亦可其广:或一過氧化水等等之氧化 氧化物形成處理單單;二中陽極電•。這樣的 發明之表面形態,但導入至本表面雖無法獲得如同本 而以磷為首的第3元素,一 ^之鎳系表面處理皮膜, 化且非晶質化;藉由又5 ’將金屬鎳的結晶微細 574420 五 發明說明(8) 徵之表面柱狀組織。眘 首之第3元素對於鎳之含不率\PS等等之分析,以磷為 言,顯示藉由氧化處理,〃上層較下層為大。即 果。且,上層柱狀組;含而碟等殘留之結 :’表層之含有率較高,而下層:乳化處理而導 有關與本發明之鎳系表面處理皮j ”:: 定,於電子電器零件之領域中,β T之树知雖無特別限 較多被使用,“本發明之::刼脂、聚醯亞胺樹脂 點,玻璃轉移溫度低之t盆一 '。由所謂接著之觀 ,.L ^ M月日其向溫時將敕化,可绘4人 的樹:H ί ί脹率之差,於接著性上較佳。❻是H 的树月曰因其本身之耐熱性低,故 :绝樣 佳,本發明之錄系表面處理皮膜於經 玻璃轉移溫度高之樹脂中愈是發揮 k,的 實驗組 以下同日寸舉出本發明之實驗組與比較組,以 本發明。 版^兄明 實驗組1 於30 0 χ 200 χ 〇 · 5mm之銅板(JISC1100 )表面使用瓦特 浴,施行l//m之觸擊電鐘後,浸潰於調製至填含有量為9 重量%的無電解鍍金浴,形成5//m之無電解Ni—P合金 層。又,將此於40 °C浸潰於75 %磷酸與67 · 5 %硝酸以容 量比90 ·· 10混合之氧化處理液3分鐘,於銅板上之Ni ~p合 金層表面形成磷已濃化之鎳層。氧化處理後之表面將呈現 無光澤’且美觀之黑色外觀。以XPS實施更深方向之璘分P. 11 Agent. Or, it can also be broad: or a single oxidation oxide and the like to form a single treatment; the second anode electrode •. Although the surface morphology of such an invention is introduced into this surface, although the third element, such as phosphorus, is not introduced into the surface, the nickel-based surface treatment film can be transformed and amorphized; by 5 ' The fine crystals of 574420 are described in the fifth invention (8) on the surface of the columnar structure. The analysis of the third element's nickel content ratio, PS, etc., with caution, shows that the upper layer of plutonium is larger than the lower layer by oxidation treatment. That's it. Moreover, the upper layer of the columnar group; the remaining knots of dishes and the like: 'The surface layer has a high content rate, while the lower layer: emulsification treatment is related to the nickel-based surface treatment skin of the present invention.' :: determined for electronic and electrical parts In the field, although there is no particular limitation on the use of the β T tree, "the present invention: a grease, a polyimide resin dot, and a low glass transition temperature." From the so-called view of continuity, .L ^ M will be converted to the temperature when it reaches the temperature. It can draw a tree of 4 people: the difference in expansion rate is better in continuity. ❻ is the tree of H. Because of its low heat resistance, it is excellent. The surface treatment film of the present invention exerts more k in the resin with high glass transition temperature. The experimental group and the comparative group of the present invention are produced to the present invention. Version ^ Brother Ming Experimental Group 1 Use a Watt bath on the surface of a copper plate (JISC1100) of 30 0 χ 200 χ 0.5 mm. After applying a shock of 1 // m, immerse it to prepare a filling content of 9% by weight. Electroless gold plating bath to form a 5 // m non-electrolytic Ni-P alloy layer. In addition, this was immersed in an oxidation treatment solution mixed with 75% phosphoric acid and 67.5% nitric acid at a capacity ratio of 90 ·· 10 at 40 ° C for 3 minutes, and phosphorus was formed on the surface of the Ni ~ p alloy layer on the copper plate, which was concentrated. Of nickel. The surface after oxidation treatment will have a matte 'and beautiful black appearance. Implement deeper points with XPS
574420 五、發明說明(9) 析,最表層為35曹番^ ,, %重量比。附帶ί ί 層(柱狀組織下部)則為8 .8 '帶提’圖1以及圖2表示實驗組1。 其次’於施行前述錄备 接著劑(三井化學制ί表『面/山之古銅板,令聚酿亞胺樹脂 5〇 _之厚度黏貼;\上==兩面接著板』)於 二严接j。= ^熱溫度25 0 t、加熱時間2小時之條件下 1%^/1?°11:11試驗材料於5〇111111角切斷,為促其劣化於85 β 加溫溫潤環境下放置24小時後,使其浮於 70 C之浴融焊樂浴,3〇 〇秒以上則不被認可。 以下,詳細說明使 擊電鍍為,瓦特浴 鹽化鎳·· 45 g /L, 水溶解試藥(使用 極,陰極電流密度 了使其為次亞磷酸 L、擰檬酸三鈉:〇 度’各自於脫離子 Ph5值9。如此調整 施行無電解鍍金, 實驗組2 用於實驗組1之鍍金浴與處理條件。觸 ’即言為了使其為硫酸鎳:3 3 0g /L、 ‘蝴酸:38 g/L之濃度,各自於脫離十 特級者),浴溫··於5 〇它,將鎳板於民 為5A /dm施行之。無電解鍍金浴為,》 納· 〇 · 1 5mol /L、硫酸銨:〇 · 5m〇1 / 2m〇l/L、硫酸鎳:〇 .lmoi/L 之濃 水溶解試藥,又添加苛性晶鹼,調整^ 之無電解鍍Ni -P合金浴加溫至㈣它, 而形成前述之Ni —p合金澹。 以下所示使用無電解 的試驗。即言,無電解 0 · 126mol/L、574420 V. Description of the invention (9) Analysis, the top layer is 35 Cao Fan ^,% weight ratio. The attached layer (the lower part of the columnar tissue) is 8.8 'with lifting' Figure 1 and Figure 2 show the experimental group 1. Secondly, 'Implement the aforementioned recording adhesive (the table made by Mitsui Chemicals, "surface / mountain bronze plate, so that the thickness of the polyimide resin 5〇_ stick; \ on == both sides followed by a plate") . = ^ 1% under the conditions of a heating temperature of 25 0 t and a heating time of 2 hours ^ / 1? ° 11:11 The test material was cut at an angle of 5011111, in order to promote its degradation to 85 β after being left in a warm and humid environment for 24 hours , Let it float in the bath of 70 C melting and melting, it is not approved for more than 300 seconds. In the following, the electroplating is described in detail. Watt-bath nickel-salt 45 g / L, water-soluble reagent (using the electrode, the cathode current density is adjusted to hypophosphite L, trisodium citrate: 0 ° ' The value of Ph5 is 9 for ionization. In this way, the electroless gold plating is performed. Experiment group 2 is used for the gold plating bath and treatment conditions of experiment group 1. Touch 'that is, to make it nickel sulfate: 3 3 0g / L,' butterfly acid : Concentrations of 38 g / L, each of which is separated from ten special grades), the bath temperature is at 50 ° C, and the nickel plate is applied at 5A / dm. The electroless gold plating bath is composed of: Na · 0.15 mol / L, ammonium sulfate: 0.5 m 0.25 / 2 mol / L, and nickel sulfate: 0.1 lmoi / L of concentrated water to dissolve the reagent, and caustic crystals are added. The alkali-adjusted non-electrolytic Ni-P alloy bath is heated to ㈣ to form the aforementioned Ni-p alloy 澹. The test using no electrolysis is shown below. In other words, electroless 0 · 126mol / L,
與前述之無電解Ni — P合金浴不同, N i — B合金浴而與實驗組1施行同樣 N i — B合金浴為,使濃度為鹽化鎳··Unlike the electroless Ni-P alloy bath described above, the Ni-B alloy bath was performed in the same manner as in Experimental Group 1. The Ni-B alloy bath was made so that the concentration was salted nickel ...
574420 五、發明說明(ίο) ' DMAB ·· 0 · 〇6mol /L、丙二酸:0 · 3 78mol /L、TIN03 ·· 70 mg /L各自於脫離子水溶解試藥,又,藉由氨水將值調 整至6。將如此調整之無電解鍍…—β合金浴加溫至7〇它而 使用之。所得之Ni _Β合金皮膜中之硼含有量為2 ·8重旦 %。此與實驗組1以同樣的方法氧化處理時,呈現累色二 觀。且同樣地以聚醯亞胺樹脂接著劑為媒介盥銅落接 = ; = ;境下後’調查其焊藥耐熱性,測㈣ 實驗組3 於實驗組1使用的觸擊電鍍用之瓦特 L,於溫度4(TC、電流密度5A//dm2之條中+加亞磷酸10队 解,形成磷含有量10重量% 2Ni_p合/金下使以陰極電 與實驗組1同樣的方法進行氧化處理了钕^膜5 # m。因以 黑色。以下,以與實驗組i同樣的試_ 親Μ吳觀之 焊藥耐熱性’在3 0 0秒内不可出現異常 且#彳貝之’於 比較組1 照舊使用在實驗組1中所使用之觸擊電梦 成3 // m之鍍鎳後,施行與實驗組丨相之,之瓦特’合形 微失去光澤,約略呈現出白色之外觀。'虱化處理,但略 1同樣的試料製作且評定之,於2〜3 从下,以與實驗組 著劑層剝離。 /產i膨脹,且接 由以上之實驗組1〜3,適用本發明之 後’藉著與樹脂之接著,譬如儘管暴露於== 下,仍可獲得極良好之耐熱接著性。邀+问/皿〉皿潤裱土兄 〃此相對,可知像比 574420 五、發明說明αι) 較組1單單使鎳皮膜表面氧化,無法得到良好之接著性。 【發明之效果】 藉由適用本發明之鎳系表面處理皮膜,金屬基材與樹脂接 著之際,因可賦予其耐潤滑性以及於高溫下之優異接著 „ 性,可對電子電器零件帶來高度之可靠性。再者,為其附 帶之效果,本發明之表面處理皮膜因擁有無光澤之黑色外 / 觀,於對電子電器零件施行光學檢查之情形,給予其良好 · 之對比可令檢查準確度提高。574420 V. Description of the invention (ο) 'DMAB ·· 0 · 〇6mol / L, malonic acid: 0 · 3 78mol / L, TIN03 · · 70 mg / L each dissolve the reagent in deionized water, and, by Ammonia adjusts the value to 6. The electroless plating so adjusted ...-? Alloy bath was heated to 70 and used. The boron content in the obtained Ni _B alloy film was 2. 8 wt%. This was an oxidative treatment in the same manner as in Experimental Group 1 and showed a faint color. And similarly, using copper polyimide resin adhesive as the medium, the copper was dropped. =; =; Afterwards, the heat resistance of the solder was investigated, and the test group 3 was used for the electroplating of Watt L. At a temperature of 4 ° C and a current density of 5A // dm2, a solution of 10 phosphorous acid was added to form a phosphorus content of 10% by weight. 2Ni_p alloy / gold was subjected to oxidation treatment using the same method as that of the experimental group 1. The neodymium film 5 # m. Because it is black. Below, the same test as the experimental group i_ Pro-Wu Guanzhi's solder heat resistance 'no abnormality within 300 seconds and # 彳 贝 之' in comparison group 1 As usual, after the nickel electroplating used in the experimental group 1 had a nickel plating of 3 // m, it was applied in the same way as the experimental group, and the Watt's shape was slightly tarnished, and the appearance was almost white. Chemical treatment, but the same sample is made and evaluated slightly, and it is peeled off from the test layer coating layer from 2 to 3 below. / I expands and connects to the above test groups 1 to 3, after applying the present invention 'By bonding with resin, for example, even if exposed to ==, excellent heat resistance can be obtained. 〉 Dairun mounted soil brother. In contrast, we can see that the image ratio is 574420. 5. Description of the invention αι) Compared with group 1, the surface of the nickel film is oxidized, and good adhesion cannot be obtained. [Effect of the invention] With the nickel-based surface treatment film to which the present invention is applied, when the metal substrate and the resin are adhered, it can impart lubricity resistance and excellent adhesion at high temperatures, which can bring electrical and electronic parts. High reliability. Furthermore, for its additional effect, the surface-treated film of the present invention has a matte black appearance / view, and when it is subjected to optical inspection of electronic and electrical parts, it can be inspected by giving a good comparison. Increased accuracy.
第15頁 574420 圖式簡單說明 【圖示之簡單說明】 【圖1】表示本發明之鎳系表面處理皮膜之斷面SEM像(X 3000 ) ° 【圖2】表示本發明之鎳系表面處理皮膜之表面SEM像(X 10000 )。 符號之說明 1 本發明之鎳系表面處理皮膜之上層柱狀組織(含鎳、 氧、構)。 2本發明之鎳系表面處理皮膜之下層(含鎳、磷)。Page 15 574420 Brief description of the drawings [Simplified description of the drawings] [Figure 1] A cross-sectional SEM image (X 3000) showing the nickel-based surface-treated film of the present invention ° [Figure 2] A nickel-based surface treatment of the present invention SEM image of the surface of the film (X 10000). Explanation of symbols 1 The columnar structure (containing nickel, oxygen, and structure) on the nickel-based surface-treated film of the present invention. 2 The lower layer (containing nickel and phosphorus) of the nickel-based surface treatment film of the present invention.
3銅基板3 copper substrate
第16頁Page 16
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JP4809037B2 (en) * | 2005-10-27 | 2011-11-02 | 日本カニゼン株式会社 | Black plating film, method for forming the same, and article having plating film |
JP4539869B2 (en) * | 2006-03-10 | 2010-09-08 | セイコーエプソン株式会社 | Wiring board manufacturing method |
JP4975344B2 (en) * | 2006-03-15 | 2012-07-11 | 大和電機工業株式会社 | Plating method |
CN101548029B (en) * | 2007-06-15 | 2011-01-05 | 日矿金属株式会社 | Method for production of metal-coated polyimide resin substrate having excellent thermal aging resistance property |
JP5385625B2 (en) * | 2008-12-08 | 2014-01-08 | 株式会社Jcu | Two-layer flexible copper-clad laminate and method for producing the same |
JP5846655B2 (en) * | 2014-02-05 | 2016-01-20 | Shマテリアル株式会社 | Manufacturing method of semiconductor device |
US9708693B2 (en) | 2014-06-03 | 2017-07-18 | Macdermid Acumen, Inc. | High phosphorus electroless nickel |
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CN1568380A (en) | 2005-01-19 |
KR20040054703A (en) | 2004-06-25 |
JP2003147549A (en) | 2003-05-21 |
WO2003040432A1 (en) | 2003-05-15 |
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