TW522293B - Method and device for vibration control - Google Patents
Method and device for vibration control Download PDFInfo
- Publication number
- TW522293B TW522293B TW091104363A TW91104363A TW522293B TW 522293 B TW522293 B TW 522293B TW 091104363 A TW091104363 A TW 091104363A TW 91104363 A TW91104363 A TW 91104363A TW 522293 B TW522293 B TW 522293B
- Authority
- TW
- Taiwan
- Prior art keywords
- control system
- actuator
- vibration control
- patent application
- sensor
- Prior art date
Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/005—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion using electro- or magnetostrictive actuation means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
- F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
- F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
- F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
- F16F15/0275—Control of stiffness
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D19/00—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase
- G05D19/02—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase characterised by the use of electric means
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
- F16F2230/00—Purpose; Design features
- F16F2230/08—Sensor arrangement
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R17/00—Piezoelectric transducers; Electrostrictive transducers
- H04R17/04—Gramophone pick-ups using a stylus; Recorders using a stylus
- H04R17/08—Gramophone pick-ups using a stylus; Recorders using a stylus signals being recorded or played back by vibration of a stylus in two orthogonal directions simultaneously
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Mechanical Engineering (AREA)
- Aviation & Aerospace Engineering (AREA)
- Acoustics & Sound (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Automation & Control Theory (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
- Vibration Prevention Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/803,320 US6791098B2 (en) | 1994-01-27 | 2001-03-09 | Multi-input, multi-output motion control for lithography system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW522293B true TW522293B (en) | 2003-03-01 |
Family
ID=25186220
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091104363A TW522293B (en) | 2001-03-09 | 2002-03-08 | Method and device for vibration control |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6791098B2 (enExample) |
| EP (2) | EP1482369A1 (enExample) |
| JP (1) | JP2004524693A (enExample) |
| TW (1) | TW522293B (enExample) |
| WO (1) | WO2002073318A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10491141B2 (en) | 2014-07-16 | 2019-11-26 | Vermes Microdispensing GmbH | Phase-chopping control of piezoelectric actuators |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6959484B1 (en) * | 1994-01-27 | 2005-11-01 | Cymer, Inc. | System for vibration control |
| US7158840B2 (en) * | 2001-06-29 | 2007-01-02 | Cymer, Inc. | Tuning control parameters of vibration reduction and motion control systems for fabrication equipment and robotic systems |
| US6808051B2 (en) * | 2002-09-27 | 2004-10-26 | Koninklijke Philips Electronics N.V. | System and method for active vibration isolation and active vibration cancellation |
| DE102004005758A1 (de) * | 2004-01-30 | 2005-08-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Einspannung in der ein mechanisches Element gehalten ist |
| DE102004011377A1 (de) * | 2004-03-05 | 2005-09-15 | Endress + Hauser Gmbh + Co. Kg | Vorrichtung zur Bestimmung und/oder Überwachung einer Prozessgrösse |
| US6956384B1 (en) * | 2004-11-05 | 2005-10-18 | Seoul National University Industry Foundation | Linear displacement transducer with improved accuracy |
| US8076227B2 (en) * | 2005-05-19 | 2011-12-13 | The Invention Science Fund I, Llc | Electroactive polymers for lithography |
| US8872135B2 (en) * | 2005-05-19 | 2014-10-28 | The Invention Science Fund I, Llc | Electroactive polymers for lithography |
| US7993800B2 (en) | 2005-05-19 | 2011-08-09 | The Invention Science Fund I, Llc | Multilayer active mask lithography |
| US7782446B2 (en) | 2007-03-01 | 2010-08-24 | Asml Netherlands B.V. | Stage system and lithographic apparatus comprising such stage system |
| US7710540B2 (en) * | 2007-04-05 | 2010-05-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| DE102008000816A1 (de) * | 2008-03-26 | 2009-10-01 | Robert Bosch Gmbh | Vorrichtung und Verfahren zur Anregung und/oder Dämpfung und/oder Erfassung struktureller Schwingungen einer plattenförmigen Einrichtung mittels einer piezoelektrischen Streifeneinrichtung |
| EP2119938A1 (en) * | 2008-05-15 | 2009-11-18 | Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO | A vibration sensor and a system to isolate vibrations. |
| US8618720B2 (en) * | 2009-10-01 | 2013-12-31 | Blackberry Limited | Piezoelectric assembly |
| NL2005701A (en) * | 2009-12-22 | 2011-06-23 | Asml Netherlands Bv | Active mount, lithographic apparatus comprising such active mount and method for tuning such active mount. |
| NL2007633A (en) * | 2010-11-22 | 2012-05-23 | Asml Netherlands Bv | A positioning system, a lithographic apparatus and a method for positional control. |
| JP6253312B2 (ja) * | 2012-09-10 | 2017-12-27 | キヤノン株式会社 | 制御装置、制御装置を備えるアクチュエータ、画像振れ補正装置、交換用レンズ、撮像装置、及び自動ステージ |
| US20140309793A1 (en) * | 2013-04-15 | 2014-10-16 | General Cybernation Group, Inc. | Method and apparatus of self-organizing actuation and control |
| JP6218459B2 (ja) * | 2013-07-02 | 2017-10-25 | キヤノン株式会社 | 除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法 |
| CN105084015A (zh) * | 2013-07-29 | 2015-11-25 | 朱海燕 | 采用码垛作业的机器人的砖坯码垛装置的工作方法 |
| DE102015109256A1 (de) | 2015-06-11 | 2016-12-15 | Aixacct Systems Gmbh | Verfahren und Vorrichtung zur Bestimmung dehnungsabhängiger Größen |
| DE102017204685B4 (de) | 2017-03-21 | 2021-11-11 | Carl Zeiss Smt Gmbh | Verfahren zur Lokalisierung von Montagefehlern sowie Projektionsbelichtungsanlage |
| US11428735B1 (en) | 2019-03-14 | 2022-08-30 | Maxim Integrated Products, Inc. | System for monitoring and controlling an integrated circuit testing machine |
| KR102375355B1 (ko) * | 2020-11-20 | 2022-03-16 | 강릉원주대학교 산학협력단 | 전자 장치에 의해 수행되는 고정밀 위치 제어를 위한 강인한 최적 외란 관측기를 포함하는 시스템 및 제어 방법 |
| CN114527337B (zh) * | 2022-01-14 | 2023-04-21 | 深圳市中明科技股份有限公司 | 一种非接触式静电场检测传感探头装置和系统 |
Family Cites Families (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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-
2001
- 2001-03-09 US US09/803,320 patent/US6791098B2/en not_active Expired - Fee Related
-
2002
- 2002-03-07 EP EP20040017887 patent/EP1482369A1/en not_active Withdrawn
- 2002-03-07 JP JP2002572511A patent/JP2004524693A/ja active Pending
- 2002-03-07 EP EP02733831A patent/EP1366390A2/en not_active Withdrawn
- 2002-03-07 WO PCT/US2002/006974 patent/WO2002073318A2/en not_active Ceased
- 2002-03-08 TW TW091104363A patent/TW522293B/zh not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10491141B2 (en) | 2014-07-16 | 2019-11-26 | Vermes Microdispensing GmbH | Phase-chopping control of piezoelectric actuators |
| TWI703807B (zh) * | 2014-07-16 | 2020-09-01 | 德商韋密斯微分配有限公司 | 壓電致動器陣列的壓電控制電路及控制方法、壓電致動裝置及含有其之計量閥 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20020101253A1 (en) | 2002-08-01 |
| WO2002073318A3 (en) | 2003-04-17 |
| WO2002073318A9 (en) | 2003-01-09 |
| WO2002073318A2 (en) | 2002-09-19 |
| EP1366390A2 (en) | 2003-12-03 |
| EP1482369A1 (en) | 2004-12-01 |
| US6791098B2 (en) | 2004-09-14 |
| JP2004524693A (ja) | 2004-08-12 |
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