JP2004524693A - 振動制御の方法及び装置 - Google Patents

振動制御の方法及び装置 Download PDF

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Publication number
JP2004524693A
JP2004524693A JP2002572511A JP2002572511A JP2004524693A JP 2004524693 A JP2004524693 A JP 2004524693A JP 2002572511 A JP2002572511 A JP 2002572511A JP 2002572511 A JP2002572511 A JP 2002572511A JP 2004524693 A JP2004524693 A JP 2004524693A
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JP
Japan
Prior art keywords
actuator
control system
sensor
wafer stage
piezoelectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002572511A
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English (en)
Japanese (ja)
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JP2004524693A5 (enExample
Inventor
バラッチ プレトナー
リチャード パーキンス
レオナード ラブリン
Original Assignee
サイマー インコーポレイテッド
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Application filed by サイマー インコーポレイテッド filed Critical サイマー インコーポレイテッド
Publication of JP2004524693A publication Critical patent/JP2004524693A/ja
Publication of JP2004524693A5 publication Critical patent/JP2004524693A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/005—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion using electro- or magnetostrictive actuation means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • F16F15/023—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means
    • F16F15/027—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems using fluid means comprising control arrangements
    • F16F15/0275—Control of stiffness
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D19/00—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase
    • G05D19/02—Control of mechanical oscillations, e.g. of amplitude, of frequency, of phase characterised by the use of electric means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F2230/00—Purpose; Design features
    • F16F2230/08—Sensor arrangement
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
    • H04R17/00—Piezoelectric transducers; Electrostrictive transducers
    • H04R17/04—Gramophone pick-ups using a stylus; Recorders using a stylus
    • H04R17/08—Gramophone pick-ups using a stylus; Recorders using a stylus signals being recorded or played back by vibration of a stylus in two orthogonal directions simultaneously

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Acoustics & Sound (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Vibration Prevention Devices (AREA)
JP2002572511A 2001-03-09 2002-03-07 振動制御の方法及び装置 Pending JP2004524693A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/803,320 US6791098B2 (en) 1994-01-27 2001-03-09 Multi-input, multi-output motion control for lithography system
PCT/US2002/006974 WO2002073318A2 (en) 2001-03-09 2002-03-07 Method and device for vibration control

Publications (2)

Publication Number Publication Date
JP2004524693A true JP2004524693A (ja) 2004-08-12
JP2004524693A5 JP2004524693A5 (enExample) 2005-12-22

Family

ID=25186220

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002572511A Pending JP2004524693A (ja) 2001-03-09 2002-03-07 振動制御の方法及び装置

Country Status (5)

Country Link
US (1) US6791098B2 (enExample)
EP (2) EP1482369A1 (enExample)
JP (1) JP2004524693A (enExample)
TW (1) TW522293B (enExample)
WO (1) WO2002073318A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011135076A (ja) * 2009-12-22 2011-07-07 Asml Netherlands Bv アクティブマウント、アクティブマウントを備えるリソグラフィ装置、およびアクティブマウントを調整する方法

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6959484B1 (en) * 1994-01-27 2005-11-01 Cymer, Inc. System for vibration control
US7158840B2 (en) * 2001-06-29 2007-01-02 Cymer, Inc. Tuning control parameters of vibration reduction and motion control systems for fabrication equipment and robotic systems
US6808051B2 (en) * 2002-09-27 2004-10-26 Koninklijke Philips Electronics N.V. System and method for active vibration isolation and active vibration cancellation
DE102004005758A1 (de) * 2004-01-30 2005-08-25 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einspannung in der ein mechanisches Element gehalten ist
DE102004011377A1 (de) * 2004-03-05 2005-09-15 Endress + Hauser Gmbh + Co. Kg Vorrichtung zur Bestimmung und/oder Überwachung einer Prozessgrösse
US6956384B1 (en) * 2004-11-05 2005-10-18 Seoul National University Industry Foundation Linear displacement transducer with improved accuracy
US8076227B2 (en) * 2005-05-19 2011-12-13 The Invention Science Fund I, Llc Electroactive polymers for lithography
US8872135B2 (en) * 2005-05-19 2014-10-28 The Invention Science Fund I, Llc Electroactive polymers for lithography
US7993800B2 (en) 2005-05-19 2011-08-09 The Invention Science Fund I, Llc Multilayer active mask lithography
US7782446B2 (en) 2007-03-01 2010-08-24 Asml Netherlands B.V. Stage system and lithographic apparatus comprising such stage system
US7710540B2 (en) * 2007-04-05 2010-05-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102008000816A1 (de) * 2008-03-26 2009-10-01 Robert Bosch Gmbh Vorrichtung und Verfahren zur Anregung und/oder Dämpfung und/oder Erfassung struktureller Schwingungen einer plattenförmigen Einrichtung mittels einer piezoelektrischen Streifeneinrichtung
EP2119938A1 (en) * 2008-05-15 2009-11-18 Nederlandse Organisatie voor toegepast-natuurwetenschappelijk Onderzoek TNO A vibration sensor and a system to isolate vibrations.
US8618720B2 (en) * 2009-10-01 2013-12-31 Blackberry Limited Piezoelectric assembly
NL2007633A (en) * 2010-11-22 2012-05-23 Asml Netherlands Bv A positioning system, a lithographic apparatus and a method for positional control.
JP6253312B2 (ja) * 2012-09-10 2017-12-27 キヤノン株式会社 制御装置、制御装置を備えるアクチュエータ、画像振れ補正装置、交換用レンズ、撮像装置、及び自動ステージ
US20140309793A1 (en) * 2013-04-15 2014-10-16 General Cybernation Group, Inc. Method and apparatus of self-organizing actuation and control
JP6218459B2 (ja) * 2013-07-02 2017-10-25 キヤノン株式会社 除振装置、除振方法、リソグラフィ装置及びデバイスの製造方法
CN105084015A (zh) * 2013-07-29 2015-11-25 朱海燕 采用码垛作业的机器人的砖坯码垛装置的工作方法
DE102014110003A1 (de) * 2014-07-16 2016-01-21 Vermes Microdispensing GmbH Phasenabschnittsteuerung von Piezoaktoren
DE102015109256A1 (de) 2015-06-11 2016-12-15 Aixacct Systems Gmbh Verfahren und Vorrichtung zur Bestimmung dehnungsabhängiger Größen
DE102017204685B4 (de) 2017-03-21 2021-11-11 Carl Zeiss Smt Gmbh Verfahren zur Lokalisierung von Montagefehlern sowie Projektionsbelichtungsanlage
US11428735B1 (en) 2019-03-14 2022-08-30 Maxim Integrated Products, Inc. System for monitoring and controlling an integrated circuit testing machine
KR102375355B1 (ko) * 2020-11-20 2022-03-16 강릉원주대학교 산학협력단 전자 장치에 의해 수행되는 고정밀 위치 제어를 위한 강인한 최적 외란 관측기를 포함하는 시스템 및 제어 방법
CN114527337B (zh) * 2022-01-14 2023-04-21 深圳市中明科技股份有限公司 一种非接触式静电场检测传感探头装置和系统

Family Cites Families (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3481014A (en) 1968-01-04 1969-12-02 Litton Precision Prod Inc Method of making a high temperature,high vacuum piezoelectric motor mechanism
CH476990A (de) 1968-07-30 1969-08-15 Kistler Instrumente Ag Kraftaufnehmer mit mindestens einem zwischen zwei Kraftübertragungslagern angeordneten Piezoelement
GB1370164A (en) 1972-01-30 1974-10-16 Mullard Ltd Piezoelectric transducer
CA1006969A (en) 1973-07-26 1977-03-15 Lyle E. Shoot Piezoelectric transducer
US4054808A (en) 1974-08-19 1977-10-18 Matsushita Electric Industrial Co., Ltd. Vibration detecting device having a piezoelectric ceramic plate and a method for adapting the same for use in musical instruments
US4194194A (en) 1978-01-30 1980-03-18 The United States Of America As Represented By The Secretary Of The Navy Piezoelectric vibration detector for sensing a nearby intruder
DE2820403C2 (de) 1978-05-10 1984-09-27 Siemens AG, 1000 Berlin und 8000 München Verfahren zum Ankleben und zum Kontaktieren eines elektrischen Bauteils mit einer flächenförmigen Elektrode
US4240002A (en) 1979-04-02 1980-12-16 Motorola, Inc. Piezoelectric transducer arrangement with integral terminals and housing
US4363991A (en) 1980-12-24 1982-12-14 Seymour Edelman Drag modification piezoelectric panels
DE3267853D1 (en) 1981-02-06 1986-01-23 Emi Ltd Device sensitive to pressure waves
US4458173A (en) 1983-02-04 1984-07-03 Essex-Tec Corporation Pressure sensitive electric signal generator
JPS60143358U (ja) 1984-03-05 1985-09-24 呉羽化学工業株式会社 アレイ型超音波探触子
GB2155732B (en) 1984-03-14 1987-05-28 Rolls Royce Stress wave transducer
JPS61144565A (ja) 1984-12-18 1986-07-02 Toshiba Corp 高分子圧電型超音波探触子
JPS61205100A (ja) 1985-03-08 1986-09-11 Murata Mfg Co Ltd 圧電発音体
US4732351A (en) 1985-03-21 1988-03-22 Larry Bird Anti-icing and deicing device
CH667763A5 (de) 1985-07-23 1988-10-31 Schenk & Co Folientastatur.
US4680595A (en) 1985-11-06 1987-07-14 Pitney Bowes Inc. Impulse ink jet print head and method of making same
US4864179A (en) 1986-10-10 1989-09-05 Edo Corporation, Western Division Two-dimensional piezoelectric transducer assembly
US4761582A (en) 1987-03-19 1988-08-02 Motorola, Inc. Dual mode transducer
US4849668A (en) 1987-05-19 1989-07-18 Massachusetts Institute Of Technology Embedded piezoelectric structure and control
US4914565A (en) 1987-05-22 1990-04-03 Siemens Aktiengesellschaft Piezo-electric transducer having electrodes that adhere well both to ceramic as well as to plastics
JPS6452657A (en) 1987-08-24 1989-02-28 Mitsubishi Electric Corp Production of oxide superconducting material
JP2694868B2 (ja) * 1987-08-31 1997-12-24 株式会社ニコン 位置検出方法及び装置
DE3917408A1 (de) 1988-06-06 1989-12-07 Takenaka Corp Daempfungssockel
DE3921824A1 (de) 1988-07-11 1990-04-19 Takenaka Corp Daempfungssockel
US5448232A (en) 1989-05-03 1995-09-05 Mitron Systems Corporation Roadway sensors and method of installing same
EP0408306B1 (en) 1989-07-11 1996-05-01 Ngk Insulators, Ltd. Piezoelectric/electrostrictive actuator having at least one piezoelectric/electrostrictive film
US5030007A (en) 1989-08-18 1991-07-09 Measurex Corporation System for vibration isolation of FT-IR interferometers
WO1991012953A1 (en) 1990-02-27 1991-09-05 University Of Maryland At College Park Method and apparatus for structural actuation and sensing in a desired direction
JPH03265734A (ja) 1990-03-14 1991-11-26 Sumitomo Heavy Ind Ltd 精密機械を設置するテーブル等の精密振動制御方法
US5404067A (en) 1990-08-10 1995-04-04 Siemens Aktiengesellschaft Bonded piezoelectric bending transducer and process for producing the same
GB2249189B (en) 1990-10-05 1994-07-27 Canon Kk Exposure apparatus
US5894651A (en) 1990-10-29 1999-04-20 Trw Inc. Method for encapsulating a ceramic device for embedding in composite structures
US5305507A (en) 1990-10-29 1994-04-26 Trw Inc. Method for encapsulating a ceramic device for embedding in composite structures
US5379980A (en) 1991-12-23 1995-01-10 Newport Corporation Stabilization systems for vibration isolators
JP2646414B2 (ja) 1992-02-21 1997-08-27 キヤノン株式会社 半導体製造装置
US5315203A (en) 1992-04-07 1994-05-24 Mcdonnell Douglas Corporation Apparatus for passive damping of a structure
US5285995A (en) 1992-05-14 1994-02-15 Aura Systems, Inc. Optical table active leveling and vibration cancellation system
JPH0653114A (ja) 1992-08-03 1994-02-25 Nec Ic Microcomput Syst Ltd 縮小投影露光装置
JP3265670B2 (ja) 1993-01-21 2002-03-11 株式会社ニコン ステージ装置、ステージ駆動方法、及び露光装置
US5525853A (en) 1993-01-21 1996-06-11 Trw Inc. Smart structures for vibration suppression
US5473214A (en) 1993-05-07 1995-12-05 Noise Cancellation Technologies, Inc. Low voltage bender piezo-actuators
US5438998A (en) 1993-09-07 1995-08-08 Acuson Corporation Broadband phased array transducer design with frequency controlled two dimension capability and methods for manufacture thereof
US5415175A (en) 1993-09-07 1995-05-16 Acuson Corporation Broadband phased array transducer design with frequency controlled two dimension capability and methods for manufacture thereof
US6420819B1 (en) 1994-01-27 2002-07-16 Active Control Experts, Inc. Packaged strain actuator
US20020099475A1 (en) * 2000-12-01 2002-07-25 Ronald Spangler Method and device for vibration control
US5660255A (en) * 1994-04-04 1997-08-26 Applied Power, Inc. Stiff actuator active vibration isolation system
JP3065489B2 (ja) 1994-10-12 2000-07-17 捷夫 本田 耐振動型干渉計
US5458222A (en) 1994-12-05 1995-10-17 General Electric Company Active vibration control of structures undergoing bending vibrations
US5493541A (en) 1994-12-30 1996-02-20 General Electric Company Ultrasonic transducer array having laser-drilled vias for electrical connection of electrodes
US5632841A (en) 1995-04-04 1997-05-27 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Thin layer composite unimorph ferroelectric driver and sensor
JPH08326835A (ja) 1995-05-31 1996-12-10 Hitachi Plant Eng & Constr Co Ltd アクティブ除振装置
US5812420A (en) 1995-09-05 1998-09-22 Nikon Corporation Vibration-preventive apparatus and exposure apparatus
DE69631362T2 (de) 1995-10-04 2004-11-04 Ebara Corp. Vorrichtung zur Schwingungsdämpfung
JP3337906B2 (ja) 1996-04-02 2002-10-28 キヤノン株式会社 空圧式振動絶縁除去装置、投影露光装置及びこれを用いたデバイス製造方法
JP3769326B2 (ja) 1996-07-15 2006-04-26 東洋ゴム工業株式会社 アクティブ型除振装置
US5802966A (en) 1996-08-05 1998-09-08 The Minster Machine Company Dual mount control system
JP3531894B2 (ja) 1996-09-13 2004-05-31 キヤノン株式会社 投影露光装置
TW406292B (en) 1997-06-03 2000-09-21 Koninkl Philips Electronics Nv Motion damper with electrical amplifier, and lithographic device with such a motion damper
JPH118181A (ja) 1997-06-17 1999-01-12 Nec Kyushu Ltd 投影型露光装置
US6089525A (en) 1997-10-07 2000-07-18 Ultratech Stepper, Inc. Six axis active vibration isolation and payload reaction force compensation system
WO1999025011A1 (en) 1997-11-12 1999-05-20 Nikon Corporation Projection exposure apparatus
US6060813A (en) 1998-01-08 2000-05-09 Xerox Corporation Vibration suppression and electromechanical damping apparatus for electrophotographic printing structures
US6031598A (en) 1998-09-25 2000-02-29 Euv Llc Extreme ultraviolet lithography machine
US6563128B2 (en) * 2001-03-09 2003-05-13 Cymer, Inc. Base stabilization system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011135076A (ja) * 2009-12-22 2011-07-07 Asml Netherlands Bv アクティブマウント、アクティブマウントを備えるリソグラフィ装置、およびアクティブマウントを調整する方法

Also Published As

Publication number Publication date
US20020101253A1 (en) 2002-08-01
TW522293B (en) 2003-03-01
WO2002073318A3 (en) 2003-04-17
WO2002073318A9 (en) 2003-01-09
WO2002073318A2 (en) 2002-09-19
EP1366390A2 (en) 2003-12-03
EP1482369A1 (en) 2004-12-01
US6791098B2 (en) 2004-09-14

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