TW503553B - Mask case and mask structure with active anti-ESD function - Google Patents
Mask case and mask structure with active anti-ESD function Download PDFInfo
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- TW503553B TW503553B TW90115585A TW90115585A TW503553B TW 503553 B TW503553 B TW 503553B TW 90115585 A TW90115585 A TW 90115585A TW 90115585 A TW90115585 A TW 90115585A TW 503553 B TW503553 B TW 503553B
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Abstract
Description
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五、發明說明(1) [習知技術說明 本發明係有關於一種主動式(active)防靜電破壞 (ant i -ESD)功能之結構,尤指一種可以防止靜電破瓌放裏 其内之光罩的光罩盒(reticle pod)之結構,以及一禮哥 以防止靜電破壞電路圖案(pattern)的光罩(reticle)之結 構。 半導體製程中,光罩是用以將所需要的圖案,定義在 半導體晶片的光阻層上,然後半導體晶片才以光阻層的圖 案為基礎,繼續以下的蝕刻或離子佈值製程。光罩所扮演 的角色就疋整個半導體製程圖案定義的開端,如果,於開 端中出現了問題,那不論後續的曝光、顯影、刻等製槎調 整的再好也是枉然。 請參閱第1A 上視圖,第1B圖 的光罩盒10大約 盤1 2。光罩14就 1 6,把光罩1 4全 (particle)掉落 案。罩蓋16之上 一提把20。當線 時,作業員便用 預定位置,然後 但是,習知 20等都是以塑膠 罩盒的 ,習知 個底 個罩蓋 上的圖 中設有 製程 進機的 及提把 品接 圖以及第1B圖,第1A圖為習知的光 為第1A圖中延a-a線的剖面示意圖、 是一個正方形的盒子。光罩盒1〇有 承放在底盤12之上。底盤12上有一 然的蓋住,用以防止外界的微粒 至光罩14上,而改變了原本光罩14 方中央部位有一個凹槽18,凹槽18 上=7業員(operator)要進行微影 手提著提把20,將光罩盒1〇拿到步 才進行微影製程。 的光罩盒10上的底盤12、罩蓋16以 所構成的。一旦光罩盒10與外界物V. Description of the invention (1) [Known technical description The present invention relates to a structure of an active anti-static destruction (ant i-ESD) function, especially a kind of light which can prevent static electricity from breaking into the inside. The structure of the reticle pod of the cover, and the structure of the reticle that prevents the static electricity from damaging the circuit pattern. In the semiconductor process, the photomask is used to define the required pattern on the photoresist layer of the semiconductor wafer. Then the semiconductor wafer is based on the pattern of the photoresist layer and continues the following etching or ion layout process. The role of the photomask is the beginning of the definition of the entire semiconductor process pattern. If there is a problem in the beginning, no matter how well the subsequent adjustments of the exposure, development, and engraving systems are adjusted, it is just as good. Please refer to the top view of FIG. 1A, and the photomask box 10 of FIG. The mask 14 is 16, and the mask 1 4 is dropped. On the cover 16, a handle 20 is mentioned. When the line is in operation, the operator uses the predetermined position, but then, the 20 and so on are all covered with plastic covers. The figures on the bottom cover are equipped with the process advance machine and the handle connection diagram. FIG. 1B and FIG. 1A are cross-sectional diagrams of the conventional light, which is a line aa in FIG. 1A, and is a square box. The photomask box 10 is supported on the chassis 12. There is a cover on the chassis 12 to prevent outside particles from reaching the photomask 14, and the original photomask 14 has a groove 18 at the center of the square. The groove 18 is equal to 7 operators. Lithography carried the handle 20 and took the photomask box 10 to the step before performing the lithography process. The chassis 12 and the cover 16 on the photomask box 10 are formed by. Once the reticle box 10 communicates with foreign objects
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,,便非常容易產生靜電效應,而於光罩盒1〇上的局部區 域堆積大量的電荷。而且,隨著半導體製程中圖案的縮小 (shrinkage),光罩14上由金屬鉻所構成的線寬線距也越 來越小,致使靜電效應所產生的電荷容易導致光罩14上的 金屬線因電場而產生電弧(arcing)放電,就像避雷針的放 電效應一樣。然而,電弧放電時的高熱會使金屬鉻熔解並 改變了光罩14圖案。光罩14圖案若是錯誤了,依據光罩14 圖案所製作出的半導體晶片當然便都成了廢物。 為了解決如此靜電所導致的光罩圖案變化,在工業上 已有許多種方法實施。一種是由環境上著手。譬如說,於 操作員的手套加裝接地裝置以防止手接觸光罩盒丨〇時產生 靜電,或在光罩盒10的放置位置以及移動的路線上喷灑離 子(Ionizer)以中和可-能產生的靜電。另一種則是由光罩 盒ίο的材質著手。譬如說,將光罩盒10的罩蓋16、凹槽18 以及底盤1 2材質全換成導電物所構成,可以防止靜電的發 生。但是,不論如何地改善,終究是被動式(passive)K 止靜電的方式,如果沒有導體來接地,例如作業者手沒來 接觸’靜電就無法經由作業者流出,而一直殘留在光罩盒 10上,造成靜電破壞光罩14圖案。 1 [發明概述] 有鑑於此’本發明的第一個目的,在於提供一種具 主動式防靜電破壞功能之光罩盒結構,一方面減少靜^ 生的機率,另一方面隔絕掉靜電對光罩的影響,能夠在 變更外界任何的機台以及製程環境下,隨時地防止靜電對, It is very easy to generate electrostatic effects, and a large amount of charge is accumulated in a local area on the photomask box 10. In addition, with the shrinkage of the patterns in the semiconductor manufacturing process, the line width and line pitch of the metal mask on the photomask 14 are becoming smaller and smaller, so that the charges generated by the electrostatic effect easily lead to the metal lines on the photomask 14 An arcing discharge due to an electric field is like the discharge effect of a lightning rod. However, the high heat during the arc discharge can cause the metallic chromium to melt and change the pattern of the photomask 14. If the pattern of the photomask 14 is wrong, of course, the semiconductor wafers produced according to the pattern of the photomask 14 will become waste. In order to solve the change in the mask pattern caused by such static electricity, many methods have been implemented in the industry. One is to start from the environment. For example, the operator's gloves are equipped with a grounding device to prevent static electricity when hands touch the photomask box, or spraying ions (Ionizer) on the placement position and moving path of the photomask box to neutralize the may- Can generate static electricity. The other is to start with the material of the mask box ίο. For example, replacing the material of the cover 16, the recess 18, and the chassis 12 of the photomask box 10 with conductive materials can prevent the generation of static electricity. However, no matter how it is improved, it is a passive K antistatic method. If there is no conductor to ground, for example, if the operator does not touch the hand, the static electricity cannot flow out through the operator, and it remains on the photomask box 10 all the time. , Causing static electricity to damage the pattern of the photomask 14. [Summary of the Invention] In view of this, the first object of the present invention is to provide a photomask box structure with an active anti-static destruction function, which reduces the chance of static electricity on the one hand and blocks static electricity from light on the other. The effect of the hood can prevent static electricity at any time under any external machine and process environment changes.
五、發明說明(3) 放置其中之光罩所產生的破壞。 電破的::於Ϊ供-種具有主動式防靜 光罩所產生=對光罩的影響,能夠隨時地防止靜電對 破壞Ξίΐϊί:的’本發明提出-種具有主動式防靜電 迴路能吸收靜電的電子迴路。該電子 路包括迴路與第二子迴路。㈣-子迴 關,該第1用以當作控制靜電電流流向開 上。以及第一主動元件,d::该该光罩盒的導電體 一二極體元件的陰極,哕=兀件的正極連結該第 電子迴路之間的電位平;以^用2 j該光罩盒與該 二極體元件的陽極與該第一主動【:二極體元件,該第二 二二極體元件的陰極則與該第—::極連結’且該第 ζϊ;順:偏m迴路。該第-順向:壓= -訊息顯示元件,能隨時監測:雷而消耗掉。以及 電流狀況。而該第二子迴路包:電:迴路上的零件壽命與 當作控制靜電電流流向開關,哕笛第二二極體元件,用以 結於該該光罩盒的導電體上。^第二二極體元件的陰極連 主動元件的負極連結該第三二2及第一主動元件,該第二 件用以調整該光罩盒虚該雷:、體元件的陽極,該主動元 電子迴路之間的電位平衡。以及 0503-5934TWF;TSMC2000-0667;J acky.p t d 第 503553 五、發明說明(4) 第四二極體元件,該 元件的正極連結,且 主動元件的負極連結 順向偏壓迴路更包括 換成熱能而消耗掉。 電子迴路上的零件壽 藉由此發明,可 程度,增加半導體產 另外,本發明亦 之光軍結構’其包括 例如鉻膜,連結一種 包括有獨立的第一子 括·第一二極體元件 該第一二極體元件的 及第一主動元件,該 體元件的陰極,該主 之間的電位平衡。以 件的陽極與該第一主 元件的陰極則與該第 順向偏壓迴路。該第 件,用以使該靜電能 顯示元件,能隨時監 況。而該第二子迴路 制靜電電流流向開關 第四二極 該第四二 ,以形成 :一被動 以及一訊 命與電流 切實地把 品的穩定 提出一種 一光罩, 能吸收靜 迴路與第 ,用以當 陽極連結 第一主動 動元件用 及第二二 動元件的 一主動元 一順向偏 量轉換成 測該電子 包括:第 ,該第三 體元件 極體元 第二順 元件, 息顯示 狀況。 光罩盒 度與信 具有主 以及在 電的電 二子迴 作控制 於該該 元件的 以調整 極體元 正極連 件的負 壓迴路 熱能而 迴路上 三二極 —極體 的陽極 件的陰 向偏壓 用以使 元件, 上的靜 賴度。 動式防 該光罩 子迴路 路。該 靜電電 光罩的 正極連 該光罩 件,該結,且 極連結 更包括 消耗掉 的零件 體元件 元件的 與該第二主動 極則與該第二 迴路。該第二 該靜電能量轉 能隨時監測該 電消除到最低 靜電破壞功能 的導電體上, 。該電子迴路 第一子迴路包 流流向開關, 導電體上。以 結該第一二極 與該電 第二二 該第二 ,以形 :一被 。以及 哥命與 ,用以 陰極連 子迴路 極體元 二極體 成第一 動元 一訊息 電流狀 當作控 結於該5. Description of the invention (3) Damage caused by placing the mask in it. Electrically broken: Yu Yu-supply-a kind of active anti-static photomask = the effect on the photomask, which can prevent static electricity at any time from damaging the 'proposed by the present invention-a kind of active anti-static circuit can absorb Electrostatic circuit of static electricity. The electronic circuit includes a loop and a second sub-loop. For the 子 -sub return, the first is used to control the static current flow on. And the first active element, d :: the cathode of the conductor-diode element of the photomask box, 哕 = the potential of the positive electrode connected to the second electronic circuit; and 2j the photomask The anode of the box and the diode element and the first active [: diode element, the cathode of the second diode element is connected to the first — :: pole connection 'and the first ζϊ; forward: partial m Circuit. The first-forward: pressure =-message display element, can be monitored at any time: thunder and consumed. And current conditions. The second sub-circuit package includes: electricity: the life of the parts on the circuit and the switch for controlling the flow of electrostatic current, and the second diode element of the flute is used to be connected to the conductor of the photomask box. ^ The cathode of the second diode element is connected to the negative electrode of the active element, and the third and second active elements are connected to the third and second active elements. Potential balance between electronic circuits. And 0503-5934TWF; TSMC2000-0667; Jacky.ptd Article 503553 V. Description of the invention (4) The fourth diode element, the positive pole of the element is connected, and the negative pole of the active element is connected to the forward bias circuit. Heat energy is consumed. Through the invention of parts on electronic circuits, the degree of semiconductor production can be increased. In addition, the invention also has a light-arm structure, which includes, for example, a chrome film, and a type that includes an independent first sub-element and a first diode element. The potential of the first diode element and the first active element, the cathode of the body element, and the main are balanced. The anode of the element and the cathode of the first main element are connected to the first forward bias circuit. This piece is used to enable the electrostatic energy display element to monitor the condition at any time. And the second sub-loop makes the electrostatic current flow to the fourth and second poles of the switch to form: a passive and a signal and current to effectively put the stability of the product into a photomask, which can absorb the static circuit and the first, When the anode is connected to the first active element and the second second movable element, an active element and a forward bias are converted to measure the electron. The electron includes: the third, the third body element, the polar element, and the second forward element. situation. The mask box and the letter have a main and an electric secondary circuit that are controlled by the element to adjust the negative-pressure loop thermal energy of the positive connection of the polar element and the negative direction of the three-pole-polar anode on the circuit. Bias is used to make the component quiet. The movable type prevents the photomask from a sub-circuit. The positive electrode of the electrostatic mask is connected to the mask member, the junction, and the pole connection further includes the consumed parts, body elements, and the second active electrode and the second circuit. The second electrostatic energy can be monitored at any time to eliminate the electricity to the conductor with the lowest electrostatic destruction function. The first sub-circuit of the electronic circuit includes the flow to the switch and the conductor. Take the first dipole and the electric second two and the second in the form: a bedding. And brother's life and, used to connect the cathode circuit, the polar element, the diode, the first motive element, the message, the current, as the control.
0503-5934TWF;TSMC2000-0667;J acky.ptd 第7頁0503-5934TWF; TSMC2000-0667; Jacky.ptd Page 7
f光罩的導電體上。以及第二主動元件,該第二主 f負極連結該第三二極體元件的陽極,該主動元件 整該光罩與該電子迴路之間@電位以及第四 疋件,該第四二極體元件的陽極與該第二主動元件 連結、,且該第四二極體元件的陰極則與該第二主動 負極連結,以形成第二順向偏壓迴路。該第二順向 =更包括:一被動元件,用以使該靜電能量轉換成 /肖耗掉。以及一訊息顯示元件,能隨時監測該電子 的零件壽命與電流狀況。 動元件 用以調 二極體 的正極 元件的 偏壓迴 熱能而 迴路上f photoconductor. And a second active element, the second main f negative electrode is connected to the anode of the third diode element, the active element adjusts the @potential between the photomask and the electronic circuit and a fourth element, the fourth diode The anode of the element is connected to the second active element, and the cathode of the fourth diode element is connected to the second active negative electrode to form a second forward bias circuit. The second forward direction further includes: a passive element for converting the electrostatic energy into / shaw. And a message display element can monitor the life and current status of the electronic parts at any time. The moving element is used to adjust the bias of the positive element of the diode and return the thermal energy to the circuit.
藉由此發明’可切實地把光罩上的靜電消除到最低程 度,減少該光罩上電路圖案因靜電破壞而報廢。 本發明之最大優點在於成本的節省。僅僅是連結一主 動式靜電消除電子迴路,這動作不會影響到習知的光罩盒 及光罩之外在結構。所以,一切處理光罩盒及光罩的機台 之介面以及製程環境都不需要變更,可以節省改變的成 本。 為使本發明之上述目的、特徵和優點能更明顯易懂, 下文特舉兩個較佳實施例,並配合所附圖式,作詳細說明 如下:According to this invention, the static electricity on the photomask can be reliably eliminated to a minimum, and the circuit pattern on the photomask can be scrapped due to electrostatic damage. The greatest advantage of the present invention is the cost savings. It is only connected with an active static elimination electronic circuit. This action will not affect the conventional mask box and the external structure of the mask. Therefore, the interface of the machine and the processing environment for processing the mask box and the mask need not be changed, which can save the cost of change. In order to make the above-mentioned objects, features, and advantages of the present invention more comprehensible, two preferred embodiments are given below and described in detail with the accompanying drawings as follows:
[圖式之簡單說明]: 第1A圖為習知的光罩盒的上視圖; 第1B圖為第1A圖中延a-a線的剖面示意圖; 第1C圖為習知之被動式靜電消除之光罩盒示意圖; 第2圖為本發明之第1實施例之主動式靜電消除之光罩[Brief description of the drawings]: FIG. 1A is a top view of a conventional photomask box; FIG. 1B is a schematic cross-sectional view taken along line aa in FIG. 1A; and FIG. 1C is a schematic photomask box of a conventional passive static elimination Figure 2 is the active static elimination photomask of the first embodiment of the present invention
0503-5934TWF;TSMC2000-0667;Jacky.ptd 第 8 頁 —-—. 五、發明說明(6) 盒不意圖; 第3圖為本發明之第2實施例之主動式靜電 示意圖; 陈之九單 第4圖為本發明主動式靜電消除之迴路 [符號說明]: %實%例。 1 0〜光罩盒, 16〜罩蓋, 1 8〜凹槽, 21〜作業者的手, 23〜光罩, 32〜光罩上的圖案區 42及42’〜電阻, 44〜保險絲, 12〜底盤, 14〜光罩, 2 0〜提把, 22〜主動式靜電消除迴路, 31〜光罩上的鉻膜, 41及4Γ〜電池, 43、43’、46 及46,〜二極體 4 5及4 5 ’〜燈泡 實施例: 差1實施例: 請參閱第1C圖、第2圖以及第4圖,第1C圖為習知之被 動式靜電消除光罩盒示意圖,第2圖為本發明之第1實施例 之主動式靜電消除光罩盒示意圖,第4圖為本發明之主動 式靜電消除迴路的實施例。在第lc圖中,由於操作員的手 最經常接觸到光罩盒20的區域,也就是提把2〇以及凹槽18 j面,都以導電物構成,而導電物與手的接觸使得靜電經 由手=’這就是習知的靜電消除法,是屬於被動式的。 _參閱第2圖,第2圖為本發明之第 主動式0503-5934TWF; TSMC2000-0667; Jacky.ptd Page 8 ---. V. Description of the invention (6) The box is not intended; Figure 3 is a schematic diagram of the active electrostatic of the second embodiment of the present invention; Chen Zhijiu Dan Fig. 4 is a circuit of active static elimination according to the present invention. [Symbol description]: %%. 1 0 ~ mask box, 16 ~ cover, 18 ~ groove, 21 ~ operator's hand, 23 ~ mask, 32 ~ pattern area 42 and 42 '~ resistor on the mask, 44 ~ fuse, 12 ~ Chassis, 14 ~ Mask, 20 ~ Handle, 22 ~ Active static elimination circuit, 31 ~ Chrome film on the mask, 41 and 4Γ ~ Battery, 43, 43 ', 46 and 46, ~ Diode 4 5 and 4 5 ′ ~ bulb embodiments: Difference 1 embodiment: Please refer to FIG. 1C, FIG. 2 and FIG. 4, FIG. 1C is a schematic diagram of a conventional passive static elimination mask box, and FIG. 2 is the present invention The first embodiment is a schematic diagram of an active static elimination mask box, and FIG. 4 is an embodiment of the active static elimination circuit of the present invention. In Figure lc, the area where the operator's hand most often touches the mask box 20, that is, the handle 20 and the surface of the groove 18j, are all made of conductive material, and the contact between the conductive material and the hand causes static electricity. Via hand = 'This is the conventional static elimination method, which is passive. _See Figure 2. Figure 2 is the active mode of the present invention.
0503 - 5934TW ;TSMC2000-0667; J acky. ptd 第9頁 503553 五、發明說明(7) 靜電消除光罩盒示意圖,在第2圖中,本發明提出一種主 f式(active)防靜電破壞(anti-ESD)功能之結構,其包括 一,罩盒ίο,該光罩盒用以罩住一光罩23,在該光罩盒1〇 :,電體上’例如導體作成的手才巴、凹槽、罩蓋或底盤, 办結一種能吸收靜電的電子迴路22。而該電子迴路22,請 二閱第4圖,該電子迴路包括有一保險絲元件和獨立的 :子迴路與第二子迴路。位於第4圖左侧的該第一子迴 ^ ^括··第一二極體元件46,用以當作控制靜電電流流向 二Φ触該第一二極體元件46的陽極連結於該該光罩盒1 0的 及第一主動元件41,該第-主動元件41的正 「二極體元件46的㊣極,1亥主動②件41用以調 二二駢-與該電子迴路22之間的電位平衡。以及第二 元j、’該第二二極體元件43的陽極與該第一主動 览 私正5連結,且該第二二極體元件43的陰極則與該 件41的負極連結,以形成第-順向偏壓迴路。 該第一順向偏壓迴路Ρ白 . M , ^ 、+、峪更包括·電阻42,用以使該靜電能量 測兮電^ 耗掉。以及—訊息顯示元件45,能隨時監 迴:上:零件壽命與電流狀況。而 包括:第三二極體元件46,,用以當作 :於哕兮异開關’該第三二極體元件46’的陰極連 該第二主動元件41 Λ體上。以及第二主動元件41,, ^ ^ ^ .,的負極連結該第三二極體元件46,的陽 之間二雷彳2 ^41、用以調整該光罩盒10與該電子迴路22 曰、立平衡。以及第四二極體元件43,,該第四二極0503-5934TW; TSMC2000-0667; Jacky. Ptd Page 9 503553 V. Description of the invention (7) Schematic diagram of static elimination mask box. In the second figure, the present invention proposes a main f-type (active) antistatic destruction ( anti-ESD) structure, which includes a mask box ο, which is used to cover a mask 23, on the mask box 10 :, on the electrical body, for example, a hand made of a conductor, The groove, cover or chassis forms an electronic circuit 22 capable of absorbing static electricity. For the electronic circuit 22, please refer to FIG. 4. The electronic circuit includes a fuse element and an independent: sub-circuit and a second sub-circuit. The first sub-element ^ ^ on the left side of FIG. 4 includes a first diode element 46, which is used to control the electrostatic current flow to the two anodes connected to the first diode element 46. The mask box 10 and the first active element 41 are the positive pole of the first active element 41 and the first pole of the diode element 46, and the first active element ② is used to adjust the two second poles and the electronic circuit 22 And the second element j, the anode of the second diode element 43 is connected to the first active diode 5 and the cathode of the second diode element 43 is connected to the 41 The negative poles are connected to form a first forward bias circuit. The first forward bias circuit P is white. M, ^, +, and 峪 further include a resistor 42 for the electrostatic energy to be measured and consumed. And—the information display element 45 can be monitored at any time: upper: the life of the part and the current status, and includes: a third diode element 46, which is used as: Yu Xiyi switch 'the third diode The cathode of the element 46 'is connected to the second active element 41, and the negative electrode of the second active element 41 ,, ^ ^ ^, is connected to the third diode element 46, Between the anode and the thunder, 2 ^ 41, is used to adjust the vertical balance between the photomask box 10 and the electronic circuit 22, and the fourth diode element 43, the fourth diode
503553 五、發明說明(8) ' -------- 5元件43’的陽極與該第二主動元件41,的正極連結,且誃 第四二極體兀件43,的陰極則與該第二主動元件41, = 2 ’以形成第二順向偏M迴路。該第:順向偏魔迴路更 :括:電阻42,用以使該靜電能量轉換成熱能而消耗更 卓。以及一訊息顯示元件45,,能隨時監測該電子迴路 的零件壽命與電流狀況。 藉由此發明,可切實地把光罩盒10上的靜電消除到最 低程度,減少靜電對光罩盒10内的光罩23的影響,而能辦 加半導體產品的穩定度與信賴度。 曰 請參閱第4圖,第4圖為本發明之主動式靜電消除迴路 的實施例。當光罩盒10上的靜電電位能高於該迴路22的電 池41或41電位能時,靜電就會流向該主動式靜電消除迴 路22中,而且在該迴路22的電阻42或42,中,該靜電流便 會轉換成熱能而自動消失,因此不論殘留在光罩盒丨〇上的 該靜電是正電或負電,皆能用本發明達到隨時隨地主動式 靜電消除之效果。 第2實施例: 請參閱第3圖以及第4圖,第3圖為本發明之第2實施例 之主動式靜電消除光罩示意圖’第4圖為本發明之主動式 靜電消除迴路的實施例。 請參閱第3圖’第3圖為本發明之第2實施例之主動式 靜電消除光罩示意圖’在第3圖中,本發明提出一種主動 式(active)防靜電破壞(anti-ESD)功能之光罩結構,其包 括一光罩23,該光罩用以微影曝光電路圖案,以及在該光503553 V. Description of the invention (8) '-------- The anode of the 5 element 43' is connected to the anode of the second active element 41 ', and the cathode of the fourth diode element 43' is connected to The second active element 41 = 2 ′ to form a second forward-biased M-loop. The first: forward-biased magic circuit further includes: a resistor 42, which is used to convert the electrostatic energy into thermal energy and consume more. And a message display element 45, can monitor the life and current status of the parts of the electronic circuit at any time. By this invention, the static electricity on the photomask box 10 can be reliably eliminated to a minimum, the influence of static electricity on the photomask 23 in the photomask box 10 can be reduced, and the stability and reliability of semiconductor products can be improved. Please refer to FIG. 4, which is an embodiment of the active static elimination circuit of the present invention. When the electrostatic potential energy on the photomask box 10 is higher than the potential energy of the battery 41 or 41 of the circuit 22, static electricity will flow into the active static elimination circuit 22, and in the resistance 42 or 42 of the circuit 22, The static current will be converted into thermal energy and disappear automatically. Therefore, no matter whether the static electricity remaining on the photomask box is positive or negative, the present invention can achieve the effect of active static elimination anytime, anywhere. Second embodiment: Please refer to FIG. 3 and FIG. 4. FIG. 3 is a schematic diagram of an active static elimination mask according to a second embodiment of the present invention. FIG. 4 is an embodiment of an active static elimination circuit of the present invention. . Please refer to FIG. 3 'FIG. 3 is a schematic diagram of an active static elimination mask according to the second embodiment of the present invention' In FIG. 3, the present invention proposes an active anti-ESD function A photomask structure includes a photomask 23 for lithographically exposing a circuit pattern, and
0503 - 5934TWF ;TSMC2000-0667; J acky. ptd 第 11 頁 503553 五、發明說明(9) = 23=導電體上,例如在鉻膜31上,連結一種能吸收靜電 迴路22。該電子迴路22包括—保險絲元賴和獨立 心ΪΓ子迴路與第二子迴路。位於第4圖左側的該第一子 Ϊ開:括琴Ϊ:二極體元件46,$以當作控制靜電電流流 導;體上:以:ΐ ί體疋件46的陽極連結於該該光罩23的 極、車社一主動兀件41,該第一主動元件41的正 極連、、,。该第一二極體元件46的陰極,該主動元件41用 整該光罩23與該電子迴路22之間的電位平衡。以二 :體元件43,Μ第二二極體元件43的陽極與該第一 -主動亓株w ίΐ第一 的陰極則與該第 主動7L件41的負極連結,以形成第一順向偏壓 第一順向偏壓迴路更包括:電阻42,用以使該靜 詈= 換成熱能而消耗掉。以及—訊息顯示 該電子迴路上的零件壽命與電流狀況。而位於;隨時監測 的該第二子迴路包括··第三二極體元件46,,、= = 制靜電電流流向開關,該第三二極體元件46,的陰二 於該该光罩23的鉻膜31上。以及第二主動元件41:、: =主動元件41’的負極連結該第三二極體元件^,的陽X 該主動疋件41’用以調整該光罩23與該電子迴路^ ’ 電位平衡。以及第四二極體元件43,,該第四- 4的 43’的陽極與該第二主動元件41,的正極連结,一體元件 極體元件43,的陰極則與該第二主動元件41,,第四二 以形成第二順向偏壓迴路。該第二順向偏壓迴敗,連結, 電阻42’,用以使該靜電能量轉換成熱能而;肖耗掉更包以括及:0503-5934TWF; TSMC2000-0667; Jacky. Ptd page 11 503553 V. Description of the invention (9) = 23 = Conductor, such as a chromium film 31, is connected to a circuit 22 capable of absorbing static electricity. The electronic circuit 22 includes a fuse element, an independent core sub-circuit and a second sub-circuit. The first element on the left side of FIG. 4 includes: zither: diode element 46, which is used to control the static current flow; on the body: ΐ: the anode of the element 46 is connected to the The pole of the reticle 23 and the vehicle body are an active element 41, and the positive pole of the first active element 41 is connected to. The cathode of the first diode element 46 and the active element 41 adjust the potential balance between the photomask 23 and the electronic circuit 22. The second: the body element 43, the anode of the second diode element 43 and the first-active plant w ΐ the first cathode are connected with the negative electrode of the first active 7L member 41 to form a first forward bias The first forward bias circuit further includes: a resistor 42 to make the static electricity = heat energy to be consumed. And—the message shows the life and current status of the parts on the electronic circuit. The second sub-circuit that is located at any time includes: a third diode element 46 ,, == a static current flow switch, and the cathode of the third diode element 46, is greater than the photomask 23 On the chromium film 31. And the second active element 41:,: = the negative pole of the active element 41 'is connected to the anode of the third diode element ^, and the active element 41' is used to adjust the photomask 23 and the electronic circuit ^ 'potential balance . And the fourth diode element 43, the anode of 43 'of the fourth-4 is connected to the positive pole of the second active element 41, and the cathode of the integrated element pole element 43, is connected to the second active element 41. ,, forty-two to form a second forward bias circuit. The second forward bias is defeated, connected, and a resistor 42 'is used to convert the electrostatic energy into thermal energy; Shaw consumes more including:
503553 五、發明說明(ίο) 一訊息顯示元件4 5 ’,能隨時監測該電子迴路上的零件旁 命與電流狀況。 7 藉由此發明,可切實地把光罩2 3上的靜電消除到最低 程度,減少靜電對光罩23的影響,而能增加微影製程中光 罩圖案32曝光的精碟度。 請參閱第4圖’第4圖為本發明之主動式靜電消除迴路 的實施例。當光罩23上的靜電電位能高於該迴路22的電池 41或41’電位能時,靜電就會流向該主動式靜電消除迴路 22中,而且在該迴路22的電阻42或42,中,該靜電流便會 轉換成熱能而自動消失’因此不論殘留在光罩23上的該曰靜 ==負[皆能用本發明達到隨時隨地主動式:電 洎除之效果。 本發明雖以一較佳實施例揭露如上,麸1 定本發明,任何熟習此項技藝者二非用以: 和範圍内,當可做些許的更動盘潤=不發明之精神 於〇〇血、, 兴潤飾,因此本發明之俘謹 範圍#視後附之申請專利範圍所界定者為準。 ”503553 V. Description of the invention (ίο) A message display element 4 5 ′ can monitor the sidelines and current conditions of parts on the electronic circuit at any time. 7 With this invention, static electricity on the reticle 23 can be reliably eliminated to a minimum, the influence of the static electricity on the reticle 23 can be reduced, and the precision of the exposure of the reticle pattern 32 in the lithography process can be increased. Please refer to FIG. 4 'FIG. 4 is an embodiment of the active static elimination circuit of the present invention. When the electrostatic potential energy on the photomask 23 is higher than the potential energy of the battery 41 or 41 'of the circuit 22, static electricity will flow into the active static elimination circuit 22, and in the resistance 42 or 42 of the circuit 22, The electrostatic current will be converted into thermal energy and will disappear automatically. Therefore, the present invention can achieve the effect of active elimination of electricity anytime, anywhere, regardless of the static state remaining on the reticle 23 == negative. Although the present invention is disclosed as above with a preferred embodiment, the bran 1 determines the present invention, and any person skilled in the art can use it as follows: Within the scope, when it can be changed slightly, the spirit of non-invention is not blood. , Xingrun decoration, so the captive scope # of the present invention is determined by the scope of the attached patent application. "
Claims (1)
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TW90115585A TW503553B (en) | 2001-06-27 | 2001-06-27 | Mask case and mask structure with active anti-ESD function |
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TW90115585A TW503553B (en) | 2001-06-27 | 2001-06-27 | Mask case and mask structure with active anti-ESD function |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI699613B (en) * | 2019-02-12 | 2020-07-21 | 華邦電子股份有限公司 | Anti-static photomask |
TWI762340B (en) * | 2020-09-30 | 2022-04-21 | 家登精密工業股份有限公司 | Reticle pod with antistatic capability |
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2001
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI699613B (en) * | 2019-02-12 | 2020-07-21 | 華邦電子股份有限公司 | Anti-static photomask |
TWI762340B (en) * | 2020-09-30 | 2022-04-21 | 家登精密工業股份有限公司 | Reticle pod with antistatic capability |
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