TW499508B - Roughening treated copper foil and producing method therefor - Google Patents

Roughening treated copper foil and producing method therefor Download PDF

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Publication number
TW499508B
TW499508B TW90109580A TW90109580A TW499508B TW 499508 B TW499508 B TW 499508B TW 90109580 A TW90109580 A TW 90109580A TW 90109580 A TW90109580 A TW 90109580A TW 499508 B TW499508 B TW 499508B
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Taiwan
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copper
copper foil
month
current density
bath
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TW90109580A
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Chinese (zh)
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Yasuhiro Endo
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Nippon Denkai Kk
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Priority claimed from JP2000124637A external-priority patent/JP3949871B2/en
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Abstract

A roughening treated copper foil comprises a composite metal formed of (I) Cu, (II) more than one metal selected from W and Mo, and (III) at least one metal selected from Ni, Co, Fe and Zn, on the adhesion face of the copper foil; and a roughened layer formed of Cu on this layer.

Description

499508 A7 B7 年月日修(更)正替換頁 經濟部智葸財產局負工涓費合作社印製 五、發明説明(5 ) 面,亦可爲雙面。 於此銅箔之被接著面上,設置有(I )銅之附著量宜 爲 5, 000 〜10, OOO/zg/dm2,(II)由鎢 及I目選出的一種以上之金屬附著量宜爲10〜1,000 jug/dm2,較宜爲 100 〜1, 000 仁 g/dm2, (I I I )由鎳.鐵、鈷及鋅選出之至少一種以上的金屬 之附著量宜爲10〜1, 〇〇〇Ag/dm2,較宜爲10 〜3 0 0 y g/dm2之複合金屬層。 由鎳、鐵、鈷及鋅選出之至少一種以上的金屬之附著 量未滿1 0 V g/dm2時,即使利用電鍍法形成節瘤狀銅 ,節瘤狀銅亦不予形成於銅箔之凹部•有集中於凸部並予 形成的傾向,於超過1,000#g/dni2時,於形成銅 .電路,藉由蝕刻不需要的銅予以去除時,該電鍍層之蝕刻 時間有顯著變緩的傾向。由鎳.鈷、鐵及鋅選出之至少一 種以上的金屬之附著量,係與電鍍浴之組成或其處理條件 之設定等有關聯者,可由後述的浴組成,電解條件等予以 適當選擇。 又,複合金屬層之銅之附著量若未滿5, 000 μ g/dm2時,則於凹部整體上有未能形成節瘤狀銅之傾 向,若超過10, 000eg/dm2時•於凹部整體上形 成節瘤狀銅之效果較小,又有使製造成本增大的傾向。由 複合金屬層之鎢及鉬選出的至少一種以上的金屬之附著量 若未滿10#g/dm2時,則於凹部整體上有未能形成節 瘤狀銅之傾向*又若超過1, ΟΟΟ/ig/dm2時,則節 I n n n 批衣 .I I I i 11 訂 I n ! L I 乡 (請先聞讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) A4规格(210X297公釐) -8- 499508499508 A7 B7 Revised (corrected) Corrected replacement page Printed by the Ministry of Economic Affairs, Intellectual Property Office, Bureau of Labor and Economics Cooperatives 5. The description of the invention (5) can also be double-sided. On the adhered surface of this copper foil, (I) copper is preferably attached in an amount of 5,000 to 10,000 / zg / dm2, and (II) more than one metal is selected by tungsten and I. 10 ~ 1,000 jug / dm2, more preferably 100 ~ 1,000 ren g / dm2, (III) The adhesion amount of at least one metal selected from nickel, iron, cobalt and zinc should be 10 ~ 1, 〇〇〇Ag / dm2, more preferably 10 ~ 300 yg / dm2 composite metal layer. When the adhesion amount of at least one metal selected from nickel, iron, cobalt, and zinc is less than 10 V g / dm2, nodular copper is not formed on the copper foil even if nodular copper is formed by electroplating. Concavity and tend to be concentrated and formed. When it exceeds 1,000 # g / dni2, copper and circuit are formed, and the etching time of the plating layer is significantly changed when copper is removed by etching. Slow tendency. The adhesion amount of at least one metal selected from nickel, cobalt, iron, and zinc is related to the composition of the plating bath or the setting of the processing conditions, and can be appropriately selected from the bath composition and electrolytic conditions described below. In addition, if the copper adhesion amount of the composite metal layer is less than 5,000 μ g / dm2, there is a tendency that nodular copper is not formed in the entire recess, and if it exceeds 10,000eg / dm2 • in the entire recess. The effect of forming nodular copper on the surface is small, and it tends to increase the manufacturing cost. If the adhesion amount of at least one metal selected from tungsten and molybdenum of the composite metal layer is less than 10 # g / dm2, there is a tendency that nodular copper is not formed in the entire concave portion * and if it exceeds 1, 〇〇〇 / ig / dm2, then I nnn will be approved. III i 11 Order I n! LI Township (please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 Mm) -8- 499508

經濟部智慧財產局員工消費合作社印製 五、發明説明(6 ) 瘤狀銅有不能變大的傾向。複合金屬層之厚度宜爲 0 . 05 〜0 · 15#m。更宜爲 0 . 07 〜0 _ 12 β m 。 於本發明之複合金屬層之形成,係於用作陰極之銅箔 之被接著面上,採用含有屬(i)銅離子,(ii)由鎢 及鉬選出之一種以上的金屬之金屬離子及(i i i )由鎳 、鈷、鐵及鋅選出之至少一種以上的金屬之金屬離子及( S. 1 i i )由鎳、鈷、鐵及鋅選出之一種以上的金屬之金屬 離子的電鍍浴,以浴之未滿界限電流密度之電流密度進行 電解處理予以實施的。銅箔之被接著面係事先進行酸洗、 脫脂處理爲宜。 此電鍍浴之各金屬離子源係由水溶性金屬鹽選擇並予 使用。較合適的浴組成係由下述範圍選擇爲宜,惟並未予 特別限定者。 銅離子源—硫酸銅五水合物:1 0〜1 0 0 g/L 鎢離子源一鎢酸鈉二水合物:〇.01〜20g/L 鉬離子源一鉬酸鈉二水合物:〇.5〜20g/L 鎳離子源-硫酸鎳六水合物 銘離子源-硫酸鈷七水合物 鐵離子源-硫酸亞鐵七水合物 辞離子源-硫酸辞七水合物 •硫酸鎳六水合物、硫酸鈷七水合物、硫酸亞鐵七水合 物及硫酸鋅七水合物之合計:1 〇〜1 〇 〇 g/L 較合適的電解條件若爲未滿電鍍浴之界限電流密度時 -----:-----粜-- (請先聞讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS ) /U規格(2丨0X297公釐) -9- 499508 P 1. 13 A7 B7 曰修(更)正替換頁 經濟部智慧財產局員工消费合作社印製 五、發明説明(7) 即可,大致由下述範圍選擇爲宜。 電流密度:1〜ΙΟΑ/dm2,電解處理時間:1〜 30秒,浴溫度爲1〇〜60 °C。 電鍍浴之pH係由1·5〜5.0之範圍予以選擇爲 宜。pH較1 · 5低時,由複合金屬層中的鎢及鉬選出之 一種以上的金屬之附著量,及由鎳、鈷、鐵及鋅選出之至 少一種以上的金屬之附著量的合適範圍變成狹窄,利用電 鍍法即使形成節瘤狀銅,節瘤狀銅亦不予形成於銅箔之凹 部,集中於凸部並予形成的傾向。又pH較5 . 0高的情 形,由鎢及鉬選出之一種以上的金屬之金屬離子之溶解時 間變成顯著的遲緩,有生產性惡化的傾向。較宜的p Η係 在2 . 〇〜4 . 0之範圍》 利用複合金屬層之形成,於銅箔凸部上發生微細粒, 惟保持此狀態或利用烤鍍或被覆電鍍方式僅以銅被覆該層 上,有未能獲得足夠的接著強度。因此於該層上合倂使用 烤鍍及被覆電鍍方式使節瘤狀銅析出由銅而成的粗化層至 銅箔之凹部爲止,圖謀接著強度之提高。 亦即,水洗以上述的條件而得的銅箔,於所得的複合 金屬層上,採用有銅離子之電鍍浴並以浴之界限電流密度 以上的電流密度,利用電解處理的烤鍍方式形成樹枝狀銅 電著層•再以未滿浴之界限電流密度的電流密度利用電解 處理的被覆電鍍形成節瘤狀銅,設置由銅而成的粗化層。 由銅而成的粗化層之銅之附著量宜爲30, 000〜 3 0 0, OOOgg/dm2。若爲未滿 30, 0 0 0 I ^ 1 裝— I 訂 I n 線 (請先《讀背面之注意事項再填寫本頁) 本纸張尺度適用中國國家標準(CNS ) A4規格(2丨〇><297公釐) -10- 499508Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the invention (6) The nodular copper tends not to become larger. The thickness of the composite metal layer should be 0. 05 ~ 0 · 15 # m. More preferably, it is 0.07 to 0_12 βm. In the formation of the composite metal layer of the present invention, a metal ion containing one or more metals selected from the group consisting of (i) copper ions and (ii) tungsten and molybdenum is used on the adhered surface of the copper foil used as a cathode and (Iii) a plating bath of metal ions of at least one metal selected from nickel, cobalt, iron, and zinc and (S. 1 ii) metal ions of one or more metals selected from nickel, cobalt, iron, and zinc; The current density of the bath below the limit current density is subjected to electrolytic treatment. The surface of the copper foil to be adhered is preferably acid-washed and degreased in advance. The source of each metal ion in this plating bath is selected from water-soluble metal salts and used. A more suitable bath composition is preferably selected from the following ranges, but it is not particularly limited. Copper ion source—copper sulfate pentahydrate: 10 ~ 100 g / L Tungsten ion source monosodium tungstate dihydrate: 0.011 ~ 20g / L Molybdenum ion source monosodium molybdate dihydrate: 0. 5 ~ 20g / L Nickel ion source-Nickel sulfate hexahydrate Ming ion source-Cobalt sulfate heptahydrate iron ion source-Ferrous sulfate heptahydrate ion source-Sulfate sulfate heptahydrate • Nickel sulfate hexahydrate, sulfuric acid The total of cobalt heptahydrate, ferrous sulfate heptahydrate, and zinc sulfate heptahydrate: 10 ~ 100g / L More suitable electrolysis conditions if the limit current density of the electroplating bath is less than the limit ----- : ----- 粜-(Please read the precautions on the reverse side before filling out this page) The paper size is applicable to the Chinese National Standard (CNS) / U specifications (2 丨 0X297 mm) -9- 499508 P 1. 13 A7 B7 Revised (revised) the replacement page of the Intellectual Property Bureau Staff Consumer Cooperatives of the Ministry of Economic Affairs to print V. Description of Invention (7), it is generally appropriate to choose from the following range. Current density: 1 ~ IOA / dm2, electrolytic treatment time: 1 ~ 30 seconds, bath temperature is 10 ~ 60 ° C. The pH of the plating bath is preferably selected from a range of 1.5 to 5.0. When the pH is lower than 1.5, the appropriate range of the adhesion amount of one or more metals selected from tungsten and molybdenum in the composite metal layer and the adhesion amount of at least one metal selected from nickel, cobalt, iron, and zinc becomes It is narrow. Even if nodular copper is formed by the plating method, nodular copper is not formed in the concave portion of the copper foil, and tends to concentrate on the convex portion and form it. In the case where the pH is higher than 5.0, the dissolution time of the metal ions of one or more metals selected from tungsten and molybdenum becomes significantly delayed, and the productivity tends to deteriorate. The preferable p Η is in the range of 2.0 to 4.0. Using the formation of a composite metal layer, fine grains occur on the copper foil protrusions, but this state is maintained or only coated with copper by baking or coating plating. On this layer, sufficient adhesion strength was not obtained. Therefore, a combination of baking plating and coating plating on this layer is used to precipitate nodular copper from the copper-coarse roughened layer to the recessed portion of the copper foil, and the strength is improved. That is, the copper foil obtained under the above conditions is washed with water, and on the obtained composite metal layer, a plating bath having copper ions is used, and a current density above the limit current density of the bath is used to form a branch by electrolytic plating. Copper-like copper electrode layer • A nodular copper is formed by electrolytic plating with a current density that is less than the limit current density of the full bath, and a roughened layer made of copper is provided. The copper adhesion amount of the roughened layer made of copper should preferably be 30,000 ~ 3 0,000gg / dm2. If it is less than 30, 0 0 0 I ^ 1 Pack — I order the I n line (please read the precautions on the back before filling out this page) This paper size applies the Chinese National Standard (CNS) A4 specification (2 丨 〇 > < 297 mm) -10- 499508

經濟部智慧財產局員工消費合作社印製 五、發明説明(9) 以下,利用實施例及比較例更具體的說明本發明,惟 本發明並非受此等實施例所限定者。 實施例1 一 8及比較例1 一 8 實施例1 (1 )以1 0%硫酸溶液對厚度3 5 之電解銅箔 (粗面側表面粗糙度RaO . 9#m、以J I S B 0 6 0 1爲準予以測定)進行酸洗處理2 0秒。 (2 )水洗此銅箔,採用已將由硫酸銅五水合物5 0 g/L,鉬酸鈉二水合物2 g/L及硫酸鎮六水合物5 0 g/L而成的電鍍浴調整成pH3 · 0,浴溫度3 0°C之 電鍍浴,以電流密度6 A/dm2電解處理前述銅箔之粗面 側(被接著面)4秒並於銅箔之被接著面側形成含有銅、 鉬及鎳之複合金屬層。用I C P (感應結合電漿發光)分 析裝置定量複合金屬層之各金屬量時,銅之附著量爲 7, 900//g/dm2,鉬之附著量爲178 yg/dm2,鎳之附著量爲1 45gg/dm2,處理後 的處理面之表面粗糙度爲R a 〇 . 9 vm。 (3 )其次*水洗此銅箔,於前述複合金屬層上,採 用已調整成硫酸銅五水合物1 3 0 g/L ·硫酸1 〇 〇 g/L,浴溫度3 0°C之電鍍浴,以①電流密度3 0 A/dm2電解處理3秒鐘(界限電流密度以上),②以電 流密度5 A / d m 2施以8 0秒電解處理(未滿界限電流密 度),形成由銅而成的粗化層。由銅而成的粗化層之附著 ϋ J 裝 II 訂 I 線 (請先閲讀背面之注意事項再填寫本頁〕 本纸張適用中國國家標準(CNS ) Α4坑格(2丨0X297公釐) -12- 499508 A7 B7 isrrrrz-1年月日修(更)正替換頁 經濟部智慈財產局負工消费合作社印製 五、發明说明(10) 量爲150, 000#g/dm2,表面粗糙度爲 Ra 1 . 4#m »所得的經予處理的電解銅箔係被觀察於 銅箔之凹凸整體上形成節瘤狀銅。粗化處理面之掃瞄型電 子顯微鏡照相(倍率:2000倍,攝影角度45°)示於 圖1。 (4 )其次水洗此銅.范,並浸漬於已調整成重鉻酸鈉 二水合物3 .5g/L * pH4 . 2,浴溫28°C之水溶 液內1 0秒,形成防銹處理層。 (5 )再者,水洗此銅箔,並浸漬於3 -環氧丙氧基 丙基三甲氧基矽烷0 . 1重量%之水溶液1 0秒後,立即 在8 0°C乾燥,形成矽烷偶合劑處理層。 (6 )接著爲測定接著強度,將相當於F R - 5之玻 璃之環氧樹脂浸漬基材及前述銅箔之被接著面層合而成貼 合銅箔之層合板,製作試片。以J I S C6481爲準 ,在室溫下測定此試片之銅箔及樹脂基材間之接著強度( 銅箔寬度1mm)。又,以氯化銅水溶液對貼合銅箔之層 合板蝕刻去除銅箔後,以標尺放大器(倍率:60倍•視 野:2mm 0 )對基材表面之任意十個位置觀察於樹脂基 材之中有無節瘤狀銅殘存的殘銅。再者,以市售的黏膠帶 捲(Lintech公司製造,CR捲筒)滾轉於該銅箔粗化處理 面之全面後,令捲筒表面之黏膠帶(寬度8 0mm X長度2 0 0 mm )以接著面朝下貼合至白紙面,在膠帶表面之任 意十個位置以標尺放大器(倍率:6 0倍,視野=2 mm# )觀察節瘤狀銅有無脫落(掉粉)。將測定及觀察 ----:-----^------1T------^. (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS } A4規格(210X297公釐) -13- 499508Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 5. Description of the Invention (9) Hereinafter, the present invention will be described more specifically using examples and comparative examples, but the present invention is not limited by these examples. Example 1-8 and Comparative Example 1-8 Example 1 (1) A 10% sulfuric acid solution was used for an electrolytic copper foil with a thickness of 3 5 (roughness side surface roughness RaO. 9 # m, JISB 0 6 0 1 It is subject to measurement) Pickling treatment for 20 seconds. (2) The copper foil was washed with water, and an electroplating bath made of 50 g / L of copper sulfate pentahydrate, 2 g / L of sodium molybdate dihydrate, and 50 g / L of sulfate hexahydrate was used. An electroplating bath with a pH of 3 · 0 and a bath temperature of 30 ° C is electrolytically treated at a current density of 6 A / dm2 to the rough surface side (adhered surface) of the copper foil for 4 seconds, and copper-containing, Composite metal layer of molybdenum and nickel. When the ICP (inductively coupled plasma luminescence) analysis device was used to quantify the amount of each metal in the composite metal layer, the copper adhesion amount was 7, 900 // g / dm2, the molybdenum adhesion amount was 178 yg / dm2, and the nickel adhesion amount was 1 45gg / dm2, the surface roughness of the treated surface after the treatment is R a 0.9 vm. (3) Secondly, wash the copper foil with water, and use an electroplating bath adjusted to copper sulfate pentahydrate 130 g / L · sulfuric acid 100 g / L and bath temperature 30 ° C on the composite metal layer. , Electrolytic treatment at ① current density 30 A / dm2 for 3 seconds (above the limit current density), ② electrolytic treatment at current density 5 A / dm 2 for 80 seconds (below the limit current density), forming copper and Into a roughened layer. Attachment of the roughened layer made of copper ϋ J mount II order I line (please read the precautions on the back before filling this page) This paper applies the Chinese National Standard (CNS) Α4 pit (2 丨 0X297 mm) -12- 499508 A7 B7 isrrrrz-1 Revised (revised) Correction page Printed by the Consumers ’Cooperative of the Intellectual Property Office of the Ministry of Economic Affairs 5. Description of the invention (10) The quantity is 150, 000 # g / dm2, the surface is rough The obtained pretreated electrolytic copper foil having a degree of Ra 1.4 .4 m was observed to form nodular copper on the entire unevenness of the copper foil. Scanning electron microscope photography of the roughened surface (magnification: 2000 times) (Photographing angle 45 °) is shown in Figure 1. (4) Secondly wash this copper. Fan and immerse it in sodium dichromate dihydrate adjusted to 3.5g / L * pH 4.2, bath temperature 28 ° C An anti-rust treatment layer was formed in the aqueous solution for 10 seconds. (5) Furthermore, the copper foil was washed with water and immersed in a 3-glycidoxypropyltrimethoxysilane 0.1% by weight aqueous solution after 10 seconds. , Immediately dried at 80 ° C to form a silane coupling agent treatment layer. (6) Next, in order to measure the bonding strength, an epoxy resin impregnated group of glass equivalent to FR-5 was used. The laminated surface of the copper foil and the aforementioned copper foil was laminated to form a laminated sheet of copper foil to produce a test piece. Based on JIS C6481, the adhesion strength between the copper foil and the resin substrate of this test piece was measured at room temperature. (The width of the copper foil is 1mm). After the copper foil is etched and removed with a copper chloride aqueous solution, the scale amplifier (magnification: 60 times • field of view: 2mm 0) is applied to any ten of the substrate surface. The position was observed on the resin substrate for the presence of nodular copper residues. Furthermore, a commercially available adhesive tape roll (manufactured by Lintech, CR roll) was rolled over the entire surface of the roughened surface of the copper foil. Make the sticky tape on the surface of the roll (width 80mm X length 200mm) adhere to the white paper surface face down, and use a scale magnifier (magnification: 60 times, field of view = 10 times) at any ten positions on the surface of the tape. 2 mm #) Observe the nodular copper for shedding (powder). Will be measured and observed ----: ----- ^ ------ 1T ------ ^. (Please read first Note on the back, please fill out this page again) This paper size applies to Chinese National Standard (CNS) A4 (210X297mm) -13- 499508

經濟部智葸財產局員工消費合作社印奴 五、發明説明(u) 結果全部彙整於表1。 實施例2 與實施例1採用相同的電解銅箔並進行與實施例1相 .同的酸洗,水洗後,採用將由硫酸銅五水合物5 0 g/L ,鉬酸鈉二水合物2 g/L,硫酸鈷七水合物3 0 g/L 及硫酸亞鐵七水合物3 0 g/L而成的電鍍浴調整成 PH2 · 〇,浴溫30°C之電鍍浴,以電流密度6 A/dm2電解處理前述銅箔之粗面側(被接著面)4秒並 於銅箔之被接著面側上形成含有鉬、銅、鈷及鐵之複合金 屬層。用I C P (感應結合電漿發光)分析裝置定量複合 金屬層之各金屬量時,銅之附著量爲7, 900 Z/g/dm2,鉬之附著量爲1 80#g/dm2,鈷之附 著量爲1 2# g/dm2,鐵之附著量爲5 Oe.g/dm2 。處理後的處理面之表面粗糙度爲Ra〇 . 9//m。其次 ’與實施例1同樣的形成由銅而成的粗化層。此粗化層之 銅之附著量爲1 5 0,000//g/dm2,表面粗糙度 Ra1.5#m。所得的經予粗化處理之電解銅箔係於銅 箔之凹凸全體上被觀察形成有節瘤狀銅。 再者進行實施例1之(4 )及(5 )之處理後,與實 施例1之(6 )同法進行接著強度之測定及殘銅,掉粉試 驗的結果示於表1。 實施例3 本^張尺度適用中國國家標芈(CNS ) A4規格(210X297公釐) 裝------訂------線 (請先聞讀背面之注$項再填寫本萸) -14- 499508 A7 B7 ΤΤΧΓΓ~—--Ί年月日修(更)正替換頁 經濟部智慧財產局負工消費合作社印製 五、發明説明(14) 各金屬量時,銅之附著量爲7, 900eg/dm2,鎢之 附著量爲200yg/dm2,鈷之附著量爲1 2 #g/dm2,鐵之附著量爲50/zg/dm2。處理後的 處理面之表面粗糙度爲Ra〇 . 9//m。其次與實施例1 同樣的形成由銅而成的粗化層。表面粗糙度爲Ra 1 . 5 # m »所得的經予粗化處理之電解銅箔係於銅箔之凹凸全 體上被觀察形成有節瘤狀銅。 再者進行實施例1之(4 )及(5 )之處理後,與實 施例1之(6 )同法進行接著強度之測定及殘銅,掉粉試 驗的結果示於表1。 實施例6 採用與實施例1相同的電解銅箔,進行與實施例1相 同,的酸洗,水洗後,採用將由硫酸銅五水合物5 0 g/L,鎢酸鈉二水合物lg/L、鉬酸鈉二水合物2 g/L及硫酸鋅七水合物5 0 g/L而成的電鍍浴調整成 pH2 . 5,浴溫3 0°C之電鍍浴,以電流密度7 A/dm2電解處理前述銅箔之粗面側(被接著面)4秒並 於銅箔之被接著面側上形成含有銅.鎢、鉬及鋅之複合金 屬層。用I C P (感應結合電漿發光)分析裝置定量複合 金屬層之各金屬量時,銅之附著量爲9, 200 /zg/dm2 ’鎢之附著量爲50#g/dm2,鉬之附著 量爲180#g/dm2,鋅之附著量爲160 gg/dm2»處理後的處理面之表面粗糙度爲Ra〇.9 I I ΙΊ n I I I 裝— I I I I 訂 I I I 線 (請先聞讀背面之注$項再填寫本頁) 本纸张尺度適用中國國家標準(CNS)A4規格(2丨OX297公釐) -17-Employees' Cooperatives of the Intellectual Property Office of the Ministry of Economic Affairs, Consumer Cooperatives 5. Inventive Notes (u) The results are all summarized in Table 1. Example 2 The same electrolytic copper foil was used as in Example 1. The same pickling was performed as in Example 1. After the same pickling and water washing, 50 g / L of copper sulfate pentahydrate and 2 g of sodium molybdate dihydrate were used. / L, electroplating bath made of cobalt sulfate heptahydrate 30 g / L and ferrous sulfate heptahydrate 30 g / L is adjusted to pH 2 · 〇, bath temperature 30 ° C plating bath, current density 6 A / dm2 Electrolytically treats the rough surface side (adhered surface) of the aforementioned copper foil for 4 seconds and forms a composite metal layer containing molybdenum, copper, cobalt, and iron on the adhered surface side of the copper foil. When using an ICP (inductively coupled plasma luminescence) analysis device to quantify the amount of each metal in the composite metal layer, the adhesion amount of copper is 7,900 Z / g / dm2, the adhesion amount of molybdenum is 1 80 # g / dm2, and the adhesion of cobalt The amount is 1 2 # g / dm2, and the iron adhesion amount is 5 Oe.g / dm2. The surface roughness of the treated surface after the treatment was Ra 0.9 // m. Next, as in Example 1, a roughened layer made of copper was formed. The copper adhesion amount of this roughened layer was 15 000 // g / dm2, and the surface roughness was Ra1.5 # m. The obtained roughened electrolytic copper foil was observed to form nodular copper on the entire unevenness of the copper foil. Furthermore, after the treatments (4) and (5) of Example 1 were performed, the adhesion strength measurement and residual copper were performed in the same manner as in (6) of Example 1 and the results of the powder dropping test are shown in Table 1. Example 3 This standard is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm). Packing ------ order ------ line (please read the note $ on the back before filling in this萸) -14- 499508 A7 B7 ΤΤχΓΓ ~ ——---- Replacement (revised) is printed on the page of the year, month, day, day, day, month, day, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, month, week, month, month, week, month, week, month and month at a time (replaced) The amount is 7,900eg / dm2, the adhesion amount of tungsten is 200yg / dm2, the adhesion amount of cobalt is 1 2 # g / dm2, and the adhesion amount of iron is 50 / zg / dm2. The surface roughness of the treated surface after the treatment was Ra 0.9 // m. Next, a roughened layer made of copper was formed in the same manner as in Example 1. The surface roughness was Ra 1 .5 # m »The obtained roughened electrolytic copper foil was observed to form nodular copper on the entire unevenness of the copper foil. Furthermore, after the treatments (4) and (5) of Example 1 were performed, the adhesion strength measurement and residual copper were performed in the same manner as in (6) of Example 1 and the results of the powder dropping test are shown in Table 1. Example 6 The same electrolytic copper foil as in Example 1 was used, and acid pickling was performed in the same manner as in Example 1. After washing with water, copper sulfate pentahydrate 50 g / L and sodium tungstate dihydrate lg / L were used. Electroplating bath made of sodium molybdate dihydrate 2 g / L and zinc sulfate heptahydrate 50 g / L adjusted to pH 2.5, bath temperature 30 ° C, and current density 7 A / dm2 The rough surface side (bonded surface) of the aforementioned copper foil was electrolytically treated for 4 seconds and a composite metal layer containing copper, tungsten, molybdenum, and zinc was formed on the bonded surface side of the copper foil. When the amount of each metal in the composite metal layer was quantified by an ICP (inductively coupled plasma luminescence) analysis device, the adhesion amount of copper was 9, 200 / zg / dm2 'the adhesion amount of tungsten was 50 # g / dm2, and the adhesion amount of molybdenum was 180 # g / dm2, the amount of zinc attached is 160 gg / dm2 »The surface roughness of the treated surface is Ra.9 II ΙΊ n III Packing — IIII order III line (please read the note on the back first) (Fill in this page again) The paper size is applicable to China National Standard (CNS) A4 (2 丨 OX297 mm) -17-

499508 五、發明説明(17) 比較例3 採用與實施例1柑同的銅箔進行實施例4之(1 )及 (2 )之處理後,水洗此銅箔,採用由硫酸銅五水合物 130g/L ’硫酸l〇〇g/L而成的已調整成浴溫 3 Ot之電鍍浴’以電流密度3 ΟΑ/dm2電解處理(界 限電流密度以上)3秒並形成樹枝狀銅層(烤鍍)。樹枝 狀銅層之銅之附著量爲3 0 , 0 0 0 # g/dm2,表面粗 糕度爲Ra 1 . 再者進行實施例1之(4)及(5 )之處理後,與實 施例1之(6 )同法進行接著強度之測定及殘銅,掉粉試 驗的結果示於表1。 比較例4 採用與實施例1相同的銅箔進行實施例4之(1)及 (2 )之處理後,水洗此銅箔,採用由硫酸銅五水合物 1 3 0 g/L及硫酸1 〇 〇 g/L而成的已調整成浴溫 3 0°C之電鍍浴,以電流密度5A/dm2電解處理(未滿 界限電流密度)8 0秒並形成平滑銅層(被覆電鍍)。平 滑銅層之銅之附著量爲132, OOOyg/dm2,表面 粗糙度爲Ral.1仁m。 再者進行實施例1之(4 )及(5 )之處理後,與實 施例1之(6 )同法進行接著強度之測定及殘銅,掉粉試 驗的結果示於表1。 本紙張尺度適用中國國家標準(CNS > A4规格(210X297公釐) [ I ""« I I 1 裝 訂 I I I 線 (請先聞讀背面之注意事項再填寫本頁) 經濟部智纥財產馬員工消費合作汪印挺 -20- 499508 A7 B7 ^ I. 13年月日修(更)正替換頁 五、發明説明(2(J) 五水合物1 OOg/L、硫酸1 20g/L、鎢酸鈉二水 合物0 . 6g/L及硫酸亞鐵七水合物I5g/L而成的 « 調整成浴溫3 5 °C之電鍍浴,於前述銅箔之粗面側(被接 著面)上以電流密度4 ΟΑ/dm2電解處理(界限電流密 度以上)3 . 5秒,其次以②採用由硫酸銅五水合物 250g/L,硫酸100g/L而成的調整成浴溫50 °C之電鍍浴,以電流密度5A/dm2電解處理(未滿界限 電流密度)8 0秒•形成含有鎢及鐵之銅粗化層,表面粗 糙度爲Ra1.7ym。 再者進行實施例1之(4)及(5)之處理後,與實 施例1之(6 )同法進行接著強度之測定及殘銅,掉粉試 驗的結果示於表1。 I ^ 裝 . 訂 線 (請先聞讀背面之注意事項再填寫本頁) 經濟部智慈財產局員工消費合作社印製 本纸張尺度適用中國國家標準(CMS > A4規格(210 X297公釐) -23- 499508499508 V. Description of the invention (17) Comparative example 3 The copper foil same as that in Example 1 was used for the treatment of (1) and (2) in Example 4, and the copper foil was washed with water, and 130 g of copper sulfate pentahydrate was used. / L 'Electroplating bath adjusted to a bath temperature of 3 Ot made from 100 g / L of sulfuric acid' is electrolytically treated at a current density of 3 ΑΑ / dm2 (above the limit current density) for 3 seconds to form a dendritic copper layer (roast plating ). The copper adhesion amount of the dendritic copper layer was 3 0, 0 0 0 # g / dm2, and the coarseness of the surface was Ra 1. Furthermore, after the treatments of (4) and (5) of Example 1 were performed, and the examples were 1 (6) The measurement of the bonding strength and the residual copper in the same method, and the results of the powder dropping test are shown in Table 1. Comparative Example 4 After the treatments of (1) and (2) of Example 4 were performed using the same copper foil as in Example 1, the copper foil was washed with water, and copper sulfate pentahydrate 130 g / L and sulfuric acid 1 were used. 〇g / L electroplating bath adjusted to a bath temperature of 30 ° C, electrolytic treatment at a current density of 5A / dm2 (under the limit current density) for 80 seconds, and a smooth copper layer (coated plating) is formed. The copper adhesion of the smooth copper layer was 132, OOOyg / dm2, and the surface roughness was Ral.1 in m. Furthermore, after the treatments (4) and (5) of Example 1 were performed, the adhesion strength measurement and residual copper were performed in the same manner as in (6) of Example 1 and the results of the powder dropping test are shown in Table 1. This paper size applies to Chinese national standards (CNS > A4 size (210X297 mm) [I " " «II 1 Binding III line (please read the precautions on the back before filling out this page) Ministry of Economic Affairs Intellectual Property Employee Consumption Cooperation Wang Yinting -20- 499508 A7 B7 ^ I. Corrected (revised) 13/13 Replacement Page V. Invention Description (2 (J) Pentahydrate 1 100g / L, sulfuric acid 1 20g / L, sodium tungstate An electroplating bath adjusted to a bath temperature of 35 ° C with 0.6 g / L of dihydrate and I5 g / L of ferrous sulfate heptahydrate, and an electric current is applied to the rough surface side (the surface to be bonded) of the aforementioned copper foil. Density 4 〇Α / dm2 electrolytic treatment (above the limit current density) 3.5 seconds, followed by ② using a plating bath made of copper sulfate pentahydrate 250g / L and sulfuric acid 100g / L, adjusted to a bath temperature of 50 ° C, Electrolytic treatment at a current density of 5A / dm2 (less than the limit current density) for 80 seconds. • A copper roughened layer containing tungsten and iron was formed with a surface roughness of Ra1.7ym. Furthermore, (4) and (1) 5) After the treatment, the same method as in Example 1 (6) was used to measure the adhesion strength and copper residue, and the results of the powder drop test are shown in Table 1. I ^ 装Ordering (please read the precautions on the back before filling this page) Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper applies Chinese national standards (CMS > A4 (210 X297 mm) -23 -499508

五、發明説明( 21 表1 經濟部智慧財產局員工消費合作社印製 接著強度-單位:kN/m 接著強度 殘銅 掉粉 實施例1 2.0 鈕 Μ 實施例2 1.9 Μ j\ w -frrr. till Φ * \\ 實施例3 1.9 组 Μ /» 實施例4 2.0 组 、\ 4ττΤ. TCTT! / ·、、 實施例5 2.1 Μ /»χ> Μ j\w 實施例6 1.9 無 瓶 V t、、 實施例7 1.0 Μ /i\\ Μ J \ w 實施例8 0.9 Μ >ι、ν J 1 比較例1 0.9 Μ 直徑0.1 # m級 無數 比較例2 0.9 ίκ 直徑0.1 β m級 無數 比較例3 1.0 ίκ /ΟΝ 直徑1 " m級無 數 比較例4 1.3 脏 /ον «Μ、、 比較例5 1.6 直徑1 0 // m 以下1 5個 直徑2 ~ 10 μ m 23個 比較例6 0.5 直徑1 0 V m 以下8個 直徑2 ~ 1 0仁m 15個 比較例7 0.5 直徑1 0 // m 以下7個 直徑2〜1 0 // m 18個 比較例8 1.7 直徑10 μ m 以下2個 直徑 2 - 10 /Z m 3個 (請先閱讀背面之注意事項再填寫本頁) -$ 本纸張尺度適用中國國家標準(CNS ) A4現格(210Χ297公釐) -24- 499508 第090 1 095 8 0號專利申請案砟文申請專利範圍昆正本 ?! 民國丨〇〇年丨月13日修正 D8六、申請專利範圍 1 · 一種經粗化處理之銅箔,其特徵在於銅箔之被接 著面上設有由(I )銅,(I I )由鎢及鉬選出的一種以 上之金屬與(III)由鎳、鈷、鐵及鋅選出的至少一種 以上之金屬而成的複合金屬層,且銅之附著量爲 . 5, 000〜10, ΟΟΟ/zg/dm2,由鎢及鉬選出之 —種以上的金屬之附著量爲10〜1, 〇〇〇#g/dm2 ,由鎳.鈷、鐵及鋅選出之至少一種以上的金屬之附著量 爲10〜1, ΟΟΟ/zg/dm2的複合金屬層,再於此層 之上設置在樹枝狀銅電著層上形成節瘤狀銅所成之由銅而 成的粗化層所成者。 2 .如申請專利範圍第1項之經粗化處理之銅箔,其 中由銅而成之粗化層的銅之附著量爲30, 000〜 300, 000/^g/dm2" 3 .—種經粗化處理之銅箔之製造方法,其特徵在於 以銅箔爲陰極,採用含有(i)銅離子,(i i)由鎢及 鉬選出的一種以上之金屬的金屬離子及(i i i)由鎳、 請 閲 讀 背 之 注V. Description of the invention (21 Table 1 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, followed by the intensity-unit: kN / m, and then the strength of the residual copper drops off powder Example 1 2.0 Button M Example 2 1.9 Μ j \ w -frrr. Till Φ * \\ Example 3 1.9 Group M / »Example 4 Group 2.0, \ 4τττ. TCTT! / · ,, Example 5 2.1 Μ /» χ > Μ j \ w Example 6 1.9 Bottleless V t ,, Example 7 1.0 Μ / i \\ Μ J \ w Example 8 0.9 Μ > ι, ν J 1 Comparative Example 1 0.9 Μ diameter 0.1 #m order countless comparative example 2 0.9 κ diameter 0.1 β m order countless comparative example 3 1.0 ίκ / ΟΝ diameter 1 " m-class countless comparative examples 4 1.3 dirty / ον «Μ ,, comparative example 5 1.6 diameter 1 0 // m or less 1 5 diameters 2 to 10 μm 23 comparative examples 6 0.5 diameter 1 8 diameters below 0 m 2 ~ 1 0 mm 15 comparative examples 7 0.5 diameter 1 0 // m below 7 diameters 2 to 1 0 // m 18 comparative examples 8 1.7 diameter 10 μm 2 diameters 2-10 / Z m 3 (please read the notes on the back before filling this page)-$ This paper size is applicable to Chinese National Standard (CNS) A4 (210 × 297 mm) -2 4- 499508 No. 090 1 095 8 0 Patent application text Scope of the original patent application Kunming ?! Republic of China 丨 丨 on the 13th of November Amendment D8 VI. Patent application scope 1 · A roughened copper foil, which It is characterized in that copper foil is provided with (I) copper, (II) one or more metals selected from tungsten and molybdenum, and (III) at least one metal selected from nickel, cobalt, iron, and zinc. Into a composite metal layer, and the copper adhesion amount is .5, 000 ~ 10, 〇OO / zg / dm2, and the adhesion amount of more than one metal selected from tungsten and molybdenum is 10 ~ 1, 〇〇〇 # g / dm2, a composite metal layer with an adhesion amount of at least one metal selected from nickel, cobalt, iron, and zinc of 10 to 1, 00 / zg / dm2, and then disposed on this layer on a dendritic copper electrode layer Formed by a nodular copper made of a roughened layer made of copper. 2. For example, the roughened copper foil of item 1 of the patent application scope, wherein the roughened layer made of copper is made of copper. The adhesion amount is 30,000 ~ 300,000 / ^ g / dm2 " 3. A method for manufacturing a roughened copper foil, which is characterized in that the copper foil is used as a cathode, Containing (i) a copper ion, (i i) a metal ion selected from tungsten and molybdenum metal and one or more of (i i i) a nickel, read back of the note

I t 裝 訂 線 經濟部智慧財產局員工消費合作社印製 鍍處上 電解以 之電種 子行 I 離進的 屬度出 金密選 的流鉬 屬電及 金的鎢 之度由 上密} 以流I 種電 I 一 限 € 少界、 至之銅 的浴> 出滿 I 選未{ 鋅以由 及由有 鐵藉設 1 > 鈷浴理 以 ο 種 ο I ο 少-至 5 ½.爲 出量 選著 鋅附 及之 鐵銅 ' 且 鈷, 、 層 鎳屬 由金 合 I複 I 的 I 成 C 而 與屬 屬金 金之 之上 g ο 少 y 1 至 ο 爲之 ο 量出 ο 著選 ,附鋅 ο 之及 1 屬鐵 ~ 金 、 爲 量 d.著 /附 及 g之 y. 屬 ο 金 ,ο 的 2 ο 上 m,以 d 1 種 由 的鈷 上 、 以鎳 種由 1 » 之2 出m 選d 鉬/ 本紙張尺度適用中國國家#準(CNS)A4規格( 210X297公釐)_1 · 499508I t Gutter line Electrolyzed on the electroplating on the printing and plating office of the Consumer Cooperative Bureau of the Intellectual Property Bureau of the Ministry of Economic Affairs I kind of electricity I limit € less bounded, to the bath of copper > full I choose not {zinc reason and by iron borrowed 1 > cobalt bath reason ο kind ο I ο less-to 5 ½. In order to measure the amount of iron, copper, zinc, and cobalt that are attached to zinc, and the layer of nickel is composed of a compound I and I, I and C, and the metal is above the gold g ο less y 1 to ο ο Selected, attached zinc ο 1 is iron ~ gold, the amount d. is / attached to g of y. is ο gold, ο 2 ο above m, with d 1 species of cobalt, with nickel species Choose from 1 »2 out of m and select d. Molybdenum / This paper size applies to China National Standards (CNS) A4 (210X297 mm) _1 · 499508

六、申請專利範圍 1, 0 0 0 //g/dm2的複合金屬層,再於此複合金屬層 上,採用含有銅離子之電鍍浴,在浴之界限電流密度以上 的電流密度進行電解處理並形成樹枝狀銅電著層,再以未 滿浴之界限電流密度的電流密度進行電解處理並形成節瘤 狀銅,設置由銅而成的粗化層。 經濟部智慧財產局員工消費合作社印製 (請先閲讀背面之注意事項再填寫本頁) •v*··6. The scope of patent application is 1, 0 0 0 // g / dm2 composite metal layer, and then on this composite metal layer, an electroplating bath containing copper ions is used, and electrolytic treatment is performed at a current density above the limit current density of the bath and A dendritic copper electrode layer is formed, and then electrolytic treatment is performed at a current density that is less than the limit current density of the full bath to form nodular copper, and a roughened layer made of copper is provided. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs (please read the precautions on the back before filling out this page) • v * ··

本纸張尺度適用中國國家榇準(CNS ) A4规格(210X297公釐)-2 -This paper size applies to China National Standard (CNS) A4 (210X297 mm)-2-

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI487437B (en) * 2009-06-18 2015-06-01 Jx Nippon Mining & Metals Corp Electronic circuit and method for forming the same, and copper composite sheet for forming electronic circuit
TWI496954B (en) * 2011-07-29 2015-08-21 Furukawa Electric Co Ltd An electrolytic copper alloy foil manufacturing method, an electrolytic solution for the production of the alloy foil, a negative electrode current collector for a secondary battery, a secondary battery and an electrode
TWI498057B (en) * 2008-11-25 2015-08-21 Jx Nippon Mining & Metals Corp Copper foil for printed circuit
TWI619409B (en) * 2013-11-29 2018-03-21 Jx Nippon Mining & Metals Corp Method for manufacturing surface-treated copper foil, laminated board, printed wiring board, electronic device, copper foil with carrier and printed wiring board

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI498057B (en) * 2008-11-25 2015-08-21 Jx Nippon Mining & Metals Corp Copper foil for printed circuit
TWI487437B (en) * 2009-06-18 2015-06-01 Jx Nippon Mining & Metals Corp Electronic circuit and method for forming the same, and copper composite sheet for forming electronic circuit
TWI496954B (en) * 2011-07-29 2015-08-21 Furukawa Electric Co Ltd An electrolytic copper alloy foil manufacturing method, an electrolytic solution for the production of the alloy foil, a negative electrode current collector for a secondary battery, a secondary battery and an electrode
US9890463B2 (en) 2011-07-29 2018-02-13 Furukawa Electric Co., Ltd. Electrolysis copper-alloy foil, method of the same, electrolytic-solution using the production, negative electrode aggregation used the same, secondary battery, and electrode of the same
TWI619409B (en) * 2013-11-29 2018-03-21 Jx Nippon Mining & Metals Corp Method for manufacturing surface-treated copper foil, laminated board, printed wiring board, electronic device, copper foil with carrier and printed wiring board

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