TW496806B - Laser trimming method and apparatus - Google Patents

Laser trimming method and apparatus Download PDF

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TW496806B
TW496806B TW090111665A TW90111665A TW496806B TW 496806 B TW496806 B TW 496806B TW 090111665 A TW090111665 A TW 090111665A TW 90111665 A TW90111665 A TW 90111665A TW 496806 B TW496806 B TW 496806B
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Taiwan
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laser
resistor
resistance
trimming
laser pulse
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TW090111665A
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Chinese (zh)
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Satoshi Horikoshi
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Nippon Electric Co
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Abstract

In a laser trimming method which laser pulses are intermittently irradiated on a resistor, a laser pulse irradiation position is moved with a constant speed relevantly to the resistor, and trimming of the resistor is performed while an electrical resistance of the resistor is measured. At this time, in the case where a difference between the final target value and the measured value during laser trimming of the electrical resistance is defined as ΔRfm, the change of the measured electrical resistance per one laser pulse irradiation is defined as ΔR, and an initial setting of the pause time is defined as T, when ΔRfm is greater than ΔR, the pause time is defined as T, and when ΔRfm is equal to or smaller than ΔR, the pause time Tend between the immediately preceding laser pulse irradiation and the next laser pulse irradiation is determined by the formula below Tend=ΔRfm/ΔR x T.

Description

496806 五、發明說明(1) —^' 【發明領域】 本發明係關於一種用於修整微小之電阻晶片等等的雷 射修整方法及設備;特別是關於一種用於高速修整與高$ 確度修整的雷射修整方法及設備。 【發明背景】 對於諸如電子零件内之印刷電路中的電阻器,已有藉 由雷射修整操縱來調整其電阻的習用方法。其中之一是4 為追蹤修整的方法,該方法乃是在測量電阻器的電阻或通 過電阻器之電流的直流電壓同時,間歇性地對電阻器照射 雷射脈衝’並執行電阻器的雷射修整直到其電阻到達一目 標值為止。在這種方法中,於修整操縱的第一階段時,必 須要求高速與操縱的穩定性。而於修整操縱的最終階段 時’則要求高準確度地調整電阻。 近來’為了符合降低成本與電子零件小型化的需求, 故在雷射修整操縱中也會要求高速與高準確度。舉例來 說’晶片電阻器的尺寸會從1 0 0 5改變至〇 603。然而即便晶 片電阻器的尺寸變得更小’但因所決定的膜厚取決於電阻 糊狀物之特性,故相較於習用的膜厚來說,電阻器的膜厚 依然不,。此外,諸如鄰近雷射脈衝(以下稱為信W息組大 小)之照射位置間的距離等雷射修整條件基本上是沒有改 變的^而所決定的信息組大小則是取決於操縱速度與雷射 脈衝”、、射期間内的脈衝時間。因此,如果讓電阻器的尺寸 變小’則每個信息組大小的電阻變化率會增加,然後就變496806 V. Description of the invention (1) — ^ '[Field of the Invention] The present invention relates to a laser trimming method and equipment for trimming tiny resistance wafers and the like; in particular, it relates to a method for high-speed trimming and high accuracy trimming. Laser trimming method and equipment. [Background of the Invention] Conventional methods for adjusting the resistance of a resistor such as a printed circuit in an electronic part by a laser trimming operation have been used. One of them is the method of tracking trimming. This method is to measure the resistance of the resistor or the DC voltage of the current passing through the resistor, and at the same time, irradiate the resistor with laser pulses intermittently and perform the laser of the resistor. Trim until its resistance reaches a target value. In this method, the high speed and the stability of the maneuver must be required when trimming the first stage of the maneuver. At the final stage of the trimming operation, it is required to adjust the resistance with high accuracy. Recently, in order to meet the needs for cost reduction and miniaturization of electronic components, high-speed and high-accuracy are also required in laser trimming operations. For example, the size of the chip resistor will change from 1 0 05 to 0 603. However, even if the size of the chip resistor becomes smaller, the film thickness of the resistor is still smaller than the conventional film thickness because the determined film thickness depends on the characteristics of the resistor paste. In addition, the laser trimming conditions such as the distance between the irradiation positions of adjacent laser pulses (hereinafter referred to as the size of the information packet) are basically unchanged. The size of the determined packet depends on the speed of operation and the laser. Shot pulse ", the pulse time within the shot period. Therefore, if the size of the resistor is made smaller, the resistance change rate of each block size will increase, and then change

第6頁 496806 五、發明說明(2)Page 6 496806 V. Description of the invention (2)

得更難高準確度地控制雷射修整操縱Q 以下將敘述一種習用的修整方法。圖丨是顯示在 的雷射修整方法中、位在電阻器上的雷射脈衝照射位用 平面圖。在習用的雷射修整方法中,如圖丨所示,用—夏之 束掃描器(未圖示)讓位在電阻器上的雷射脈衝照射位^ 以一定速相對移動,並將雷射脈衝照射間的脈衝時 常數。結果即將電阻器上的雷射脈衝照射位置52 二 隔U式設置在-條直線巾。也就是說讓信息組大 定值L。接著,移動位在雷射脈衝照射位置52的電阻 加以修整。至於電阻器中之雷射修整操縱槽5 1則是、 複的雷射脈衝照射而形成的。然冑,在電‘二 預定射脈衝照射並終止修以 種情;Γ,目印刷所形成的厚膜電阻器此 禋It况時,其膜厚大約為1〇至20⑽。此外 ::30至50…此時為了改善由雷射脈 修整#縱槽51的操縱狀態,故所f的信息組大小成=2 ^ °當雷射光束直徑為3〇 _且信 ㈣ 雷射修整摔縱μ 5彳杯立你嬰老人& 兩b // m ¥,在 衝。偏;ΐ = 置處會獲得6個重疊的雷射脈 級。 里太夕^,則電阻器會損壞且會使其特性降 然而這種習用的方法會含有 第一個問題是修整動作太了 β么所描述的兩個問題。 9酿-丨動作末了後,會使得電阻誤差拎加。 2顯不出圖1所示之習用雷射修 9加圖 時與電阻哭的雷阳坳儿日日 中、雷射脈衝照射計 的電阻免化間之關係圖,其 496806 五、發明說明(3) 而垂直軸為電阻器之電阻與雷射強度。 有不同初始電阻的3個電阻器R4、R5 θ中,在以具 =目Τ時,分別以線條41、42與43表示其電:?修整操 外,線條44顯示雷射修整所使用之雷射的 灸綠此 二示出雷射脈衝的照射。在這種習用的方:中 #心,、且大小定義為定值L,並於電阻測量值 乃疋將 值Rf之際即終止修整動作。 超t預疋目標 在這種情況下,在將因雷射脈衝暌 量值變量定義為圖2所示的^時,則;“二後= 表不該變量的大小。舉例來說,圖2中的電阻器圍^ 43之電阻乃是稍微小於第(n—丨)個脈俨=It is more difficult to control the laser dressing operation Q with high accuracy. A conventional dressing method will be described below. Figure 丨 is a plan view showing the laser pulse irradiation position on the resistor in the laser trimming method. In the conventional laser trimming method, as shown in Figure 丨, a Xia Zhibei scanner (not shown) is used to allow the laser pulse on the resistor to irradiate the position ^ at a certain speed and move the laser relatively. Pulse time constant between pulses. As a result, the laser pulse irradiation position 52 on the resistor was set in a U-shaped linear towel at two intervals. In other words, let the information group have a large value L. Next, the resistance shifted to the laser pulse irradiation position 52 is trimmed. As for the laser trimming control groove 51 in the resistor, a complex laser pulse is irradiated. However, when the electric pulse is irradiated and the repair is stopped; Γ, the thickness of the thick film resistor formed by the screen printing is about 10 to 20 况. In addition :: 30 to 50 ... At this time, in order to improve the manipulation of the vertical groove 51 by the laser pulse trimming, the size of the information block is 2 ^ ° when the laser beam diameter is 30 ° and the laser beam is Trimming the vertical μ 5 彳 cup standing your baby & two b // m ¥, in the red. Bias; ΐ = 6 overlapping laser pulse levels will be obtained at the position. If the temperature is too high, the resistor will be damaged and its characteristics will be reduced. However, this conventional method will contain the first two problems described in the trimming action. 9-After the end of the action, the resistance error will increase. 2 Does not show the relationship between the conventional laser repair shown in Figure 1 and the resistance of Lei Yang, who is crying, and the resistance of the laser pulse irradiance meter, which is crying. 496806 3) The vertical axis is the resistance and laser intensity of the resistor. Among the three resistors R4 and R5 θ with different initial resistances, when the electric resistance is equal to the target T, the electric lines are represented by lines 41, 42 and 43:? In addition to the dressing operation, line 44 shows the laser moxibustion green used for laser dressing. The second shows the irradiation of the laser pulse. In this customary formula: the center is centered, and the size is defined as the fixed value L, and the trimming operation is terminated when the resistance measurement value is the value Rf. In this case, when the pre-triggering target of super-t is defined as ^ shown in Fig. 2 due to the laser pulse, then "second post = indicates the size of the variable. For example, Fig. 2 The resistance of the resistor ^ 43 in the middle is slightly smaller than the (n— 丨) th pulse =

Rf '“在習用的方法中,會執行如同第(射二目二 射的第η個脈衝照射,於是雷 衝…、 小於〔Rf + + 疋電阻^R6之電阻會增加成稍微 標值Rf。 。那就是說電阻器R6的電阻會超過目 Μ修2二個問題則是很難增加操縱的速度。《了增加雷 ^正刼縱的速度,故增加雷射脈衝掃描的 射時期間的脈衝時間,藉此使其必須增加= =變=進速度㈣,就不能隨著此電 °°的電阻測1。如此會增加電阻的 η;進而降低修整的準確度。因為這樣的關係,故 驾用的方法,其中以高準確度方式執行修整時充 分地降低操縱速度,或在増加操縱速度的情況下,暫時停 謂 第8頁 496806 五、發明說明(4) 止修整動作,以高準確产旦 修整動作缺而 X方式測s電阻,然後再重新啟動 鳥了 m =二而I、,任何一楂方法均會降低操縱效率。 法。對把义π:描述的問題’因而採用以下的習用方 度,的第—個問題,為了改善修整準確 :數量的方、^同:降低信息組大小與每個雷射脈衝之修 正数里的方法。藉由使用 最終電阻的誤差。 k種方法可降低⑽,並減少 作為解決第二個問顳 59(198^1711_,之方法的日本公開專利公報第 個以上> φ 虎揭路一種在雷射修整設備中提供兩 ^阻比較電路的方法。纟這 縱之初始階段時會增加择 T孓1少正栎 為低速,,此::二。? 速度’並間歇性地將其切換 此兼容。s同速知縱效率與良好的修整準確度能夠彼 解決方法卻有著以下 時、雷射修整操縱样中沾+ f中,會有信息組大小過小 此一來會損壞電阻器蛊:数太夕的問喊。如 阻器的可靠性顯著:肖$ 2 4組成的物質。結果會使得電 ^且信息組大小者定\失為义 此-來,會損壞電阻=:Vv二 級。 ,、物貝,並使得電阻器之特性降 號所ί 露 Π 法公報第 59( 1 984)~1711°3 無法解決第-個;題雖善:縱效率,卻 卜在绝種方法中,雖然增加操縱Rf '"In the conventional method, it will perform the nth pulse irradiation as the first shot, so the lightning strike ..., the resistance less than [Rf + + 疋 resistance ^ R6 will increase to a slightly standard value Rf. That is to say that the resistance of the resistor R6 will exceed the speed of the mesh 2 repair. The second problem is that it is difficult to increase the speed of the operation. Time, which makes it necessary to increase = = change = advance speed 就, can not be measured with this electrical ° ° resistance 1. This will increase the η of the resistance; and then reduce the accuracy of trimming. Because of this relationship, driving The method in which the trimming speed is sufficiently reduced when trimming is performed with a high degree of accuracy, or when the trimming speed is increased, temporarily suspending the operation on page 8 496806 V. Description of the invention (4) Stop trimming operations with high accuracy Once the trimming action is missing and the X method is used to measure the s resistance, then restart the bird. M = 2 and I. Any one of the methods will reduce the operating efficiency. Method. For the problem π: description of the problem 'so use the following custom Fangdu, the first question In order to improve the accuracy of the trimming, the method of the quantity is the same as the method of reducing the size of the block and the correction number of each laser pulse. By using the error of the final resistance, k methods can reduce ⑽ and reduce it as a solution. A method of Japanese 59 (198 ^ 1711_), the first method of Japanese Laid-Open Patent Gazette > φ Tiger Reveals a method of providing a two-resistance comparison circuit in a laser trimming device. This will increase during the initial stage. T 孓 1 Shaozheng oak is selected as low speed, this :: Two.? Speed 'and switch it intermittently for compatibility. S Same speed knowing vertical efficiency and good trimming accuracy can be solved by the following methods. In the laser trimming control sample, if there is + f, there will be too small information group size. This will damage the resistor. 蛊: Count the eve of the call. For example, the reliability of the resistor is significant: the material consisting of $ 2 4 Xiao. Result It will make the electric power and the size of the information group unreasonable, and it will damage the resistance =: Vv level II, and the characteristics of the resistor will be reduced. It is disclosed in Law Bulletin No. 59 (1 984) ~ 1711 ° 3 The first one cannot be solved; Efficiency, but in extinct methods, although increased manipulation

$ 9頁 五、發明說明(5) 製程之初始階段中 速度切換為低速。 善。此外,在切換 XY台或控制雷射脈 定位裝置可以為各 為各種類型,諸如 況下亦可為了控制 在輸入用來切換操 直到實際上已改變 隨著種種條件而改 了時必須將操縱速 先前所提之延遲時 就改變操縱速度。 間0 :性地將操縱 .效率的改 .置電阻器的 。至於光束 而XY台亦可 時在任:: 因為如此, 延遲時門, 間會 可操縱期 【發明概述】 本發明之一目的是提供一兩 具有改善修整準確田射修整方法與設備,其 〇正平;度而不會損壞 、,、一 執行操縱的能力。 ’亚以尚速有效地 一種電阻器之雷射修整方法,龙 電阻器上之該雷射脈衝的一照射位^包3步驟為:在讓該 時,間歇性針對該電阻器照射雷射I;對於該電阻器移動 器的一修整動作。該電阻器修整,以便執行該電阻 阻器的一電阻;以及依照最終 :?含步驟為測量該電 ^值與於該修整動作内該$ 9 pages 5. Description of the invention (5) In the initial stage of the process, the speed is switched to low speed. good. In addition, when switching the XY stage or controlling the laser pulse positioning device, there can be various types. For example, in order to control the input to switch the operation until it has actually changed, it must be changed according to various conditions. The previously mentioned delay changes the operating speed. Time 0: The operation efficiency will be changed by the resistor. As for the light beam, the XY stage can also be used at any time: Because of this, the time gate is delayed and the period can be manipulated. [Invention Summary] One of the objects of the present invention is to provide one or two methods and equipment for improving the accuracy of field shooting. ; Degree without damaging the ability to perform manipulation. 'Ya Yishang is an effective laser trimming method for resistors. One irradiation position of the laser pulse on the dragon resistor is included. The three steps are: at this time, the laser is irradiated intermittently to the resistor. A trimming action for the resistor mover. The resistor is trimmed to perform a resistance of the resistor; and in accordance with the final:? The steps include measuring the electrical value and

第10頁 496806 五、發明說明(6) 電阻器的該電阻測量值間的一至推 . 所引起的該電阻測量:::變;值2因-雷射脈衝照射 間的一暫停時間。 &里,決定雷射脈衝照射時期 在本發明中,利用_你ι1: μ γ夂#』σ 時期㈣暫停時期以最“。ς #㈣雷射脈衝照射 度的雷射修整,並可; = 當藉此可達到高準確 值。 电丨且為的取後電阻接近最終目標 此外,在該雷射修整方法中, 照射位置相對於該電阻器移動,並速讓一雷,脈衝 射脈衝照射時期間的該暫停時下方式決定該雷 目標值與修整期間所測量心值=電:器之最終電阻 _、因—雷射脈衝践所㈣m差值定義為△ 為…、且該暫停時間初始設變量定義 下-欠該變量⑽情況下,即時執行與 :,的田射脈衝照射間的該暫停時間Tend由下式⑴決 (1) 起、ΐΐΠΐ: m最終雷射脈衝照射過度所引 的準r無可免產生的誤差…,改善修整 致。與:俾二因而讓電阻益的最終電阻與最終目標值- 是暫;i::ΐ相較之:’胃,雷射脈衝照射時期很短,於 、/只貝上等於雷射脈衝照射的周期。Page 10 496806 V. Description of the invention (6) One-to-one push between the resistance measurement value of the resistor. The resistance measurement caused by ::: change; value 2 is a pause time between laser pulse irradiation. In the present invention, the laser pulse irradiation period is determined. In the present invention, the laser period is _1: μ γ 夂 # σ ㈣ The pause period is adjusted by the most ". = When this can achieve a high accuracy value, the resistance is close to the final target. In addition, in the laser trimming method, the irradiation position is moved relative to the resistor, and a laser is pulsed and pulsed. The time-of-day pause method determines the target value of the laser and the measured heart value during the trimming period = electrical: the final resistance of the device _, the difference between the m and the laser pulse is defined as △, and the pause time is initially Set the definition of the variable-if the variable is owed, the pause time Tend between the instantaneous execution and the field pulse irradiation is: from the following formula (1), ΐΐΠΐ: m due to the final laser pulse over-exposure The quasi-r inevitably produces errors ... to improve the trimming. And: Secondly, the final resistance of the resistance gain and the final target value-is temporary; i :: ΐ Compared to: 'Stomach, laser pulse irradiation period is very Short, on, / only equal to the laser pulse cycle.

五、發明說明(7) 雷射it較佳之情況是使用一㈣換雷射脈衝來作為該 ”―種雷射修整設備’其包含:一雷 ,用於間歇性震盪出雷射脈衝;一 ,衣 ::::rr衝的-路徑;-測以= 丄 制該雷射震M f ί為的—電阻;一操作控制裝置,用於控 該測量儀器;以及,計算I置,用 2 k破置與 该雷射脈衝照射時期間的一暫停時間。 I里决疋 本發明的一種雷射修整設備,其包含:一 置’用於間歇性震盈出雷射脈衝;一傳送裝置,用= 旦=工物亚控制該加工物的一位置;一測量儀@,用於測 里一加工物中之一電阻器的一電阻;一操作控制裝置,用 於控制 置與該 衝照射 決定該 此 換雷射 根 起、在 縱速度 損壞電 該雷射 測量儀 所引起 雷射脈 外在該 脈衝, 據本發 習用方 減速而 阻器。 震盪裝置 益,以及 的該電阻 衝照射時 雷射修整 且該計算 明得知, 法中無可 降低操縱 該光學 ,計算裝 之一變量 期間的一 設備中, 裝置表好 可限制因 避免產生 效率,且 如此一來,可改善 系統控制 置,用於 ,並依照 暫停時間。 該雷射脈衝最好為一 Q切 為一數位信號處理器。 脈衝照射所引 整,而不會因操 度的脈衝照射而 有關的修整準確 裝置、該傳送裝 計算因該雷射脈 該電阻之該變量 最終雷射 的過度修 不會因過 與電阻器V. Description of the invention (7) The better case of laser it is to use a laser exchange pulse as the "-type laser trimming equipment" which includes: a laser for intermittently oscillating laser pulses; one, :::: rr rushed-path; -measured by = to control the laser shock M f ί -resistance; an operation control device for controlling the measuring instrument; and, calculate I set, use 2 k A break time between the burst and the laser pulse irradiation time. The laser trimming device of the present invention includes: a device for intermittently generating laser pulses; and a transmission device for = Dan = Gongwuya controls a position of the processed object; a measuring instrument @ is used to measure a resistance of a resistor in a processed object; an operation control device is used to control the impact and the irradiation to determine the This laser replacement takes root and damages the laser pulse caused by the electric laser measuring instrument at the longitudinal velocity. The external pulse is decelerated and blocked by the user according to this tutorial. Oscillating device benefits, and the resistance is irradiated when the laser is irradiated. Trimming and the calculation clearly shows that there is no way to reduce the manipulation of the method In a device that calculates a variable period, a good device table can limit the efficiency caused by avoidance, and in this way, the system control device can be improved and used according to the pause time. The laser pulse is preferably one Q-cut is a digital signal processor. The pulsed radiation is adjusted without the relevant trimming accurate device due to the pulsed radiation of the operation. The transmission device calculates the final laser overshoot due to the variable of the laser pulse and the resistance. Repair will not be caused by

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度。因此,在諸如 說,當雷射當操縱 的修整。結果,在 的效益。 微小的電阻晶片等 速度維持在高速時 進行電子零件生產 電子零件中,舉例來 ,則可達到高準確度 力的改善時獲得很大 【較佳貫施例之詳細說明】 A ^下將參照附圖來進行本發明之一實施例的描述。圖 一、例中的雷射修整設備構造之方塊圖。如圖3所 =I帝°亥 '施例中的雷射修整設備内設有用於震盪Q切換 2,田射(以下稱之為Qsw脈衝雷射17)的雷射光源2。此 於山Ϊ用於控制雷射光源2操作之雷射震蘯控制電路16的 =古:ί輸入至雷射光源2内。又,在雷射光源2的輸出侧 击二t型式之雷射光束掃描器3,該電流計型式之雷 晰#r + T描器3乃是用來控制從雷射光源2震盪而來之QSW 脈衝雷射1 7的路徑。 AM 7 ^ ΐ電机计型式之雷射光束掃描器3内、沿QSf脈衝雷 脱^ + t依序没有:用於擴散從雷射光源2震盪而來之Qsw 的光束擴散器4;用於在任意方向中反射已穿 散器4之QSW脈衝雷射17的兩掃描鏡7;用於聚集 :::I描鏡7反射而來之_脈衝雷射17的f-β透鏡8; ίο的於L已穿過Η透鏡8之QSW脈衝雷射17反射至加工物 机有5 。此外,在電流計型式之雷射光束掃描器3内尚 一電机计6的先束知描控制電路5。然後將輸出自光束degree. So, for example, when the laser is manipulated for trimming. As a result, the benefits. When maintaining the speed of tiny resistance chips and other electronic components at high speeds, for example, in the production of electronic parts, high accuracy can be achieved. [Detailed description of the preferred embodiment] A ^ will refer to the attached The drawings are used to describe one embodiment of the present invention. Figure 1. Block diagram of laser trimming equipment in the example. As shown in Fig. 3, the laser trimming device in the embodiment of "I °°" is provided with a laser light source 2 for oscillating Q switching 2 and field emission (hereinafter referred to as Qsw pulse laser 17). The laser vibration control circuit 16 for controlling the operation of the laser light source 2 by Yu Shanyu is input into the laser light source 2. In addition, on the output side of the laser light source 2, a two-t-type laser beam scanner 3 is hit. The galvanometer type of the clear #r + T-scanner 3 is used to control the QSW from the laser light source 2 Pulse laser 17 paths. AM 7 ^ ΐMotor gauge type laser beam scanner 3, along the QSf pulse laser ^ + t sequentially not: beam diffuser 4 for diffusing Qsw oscillating from laser light source 2; for Two scanning mirrors 7 reflecting the QSW pulsed laser 17 that has passed through the diffuser 4 in any direction; used to gather ::: I mirror 7 reflected from _f-β lens 8 of pulsed laser 17; ίο The QSW pulsed laser 17 which has passed through the chirped lens 8 is reflected to the processing machine 5. In addition, in the laser beam scanner 3 of the galvanometer type, there is also a pre-scanning control circuit 5 of a motor meter 6. Will then be output from the beam

、發明說明(9) 掃插電路5的_ 些信號來各自入到電流計6内,則電流計6會根據這 此合目控制掃描鏡7。 是以Χγ方向的1上設置有加工物10,而載物台11則 以台上。 式承載在用來移動載物台11與加工物1〇的 10。然後方:過二:於測量電阻的探針12連接到加工物 將探針12所偵测到的;置的探針升降機構18、 電阻測量儀器13in到電阻測量儀器13内。 轉變成電子信號;口 :物ι〇的電阻’把此測量值 ;射脈衝間隔控制裝輸值計算及 射脈衝間隔控制裝置15中二:::,值計算及雷 阻測量值獲得電 里㈢透過计异過程而從該電 射脈衝照射時時:定;據該電阻變化而來之雷 制裝置1。 J後將結果輸出到操作控 操作控制裝置1是用爽批 束掃描控制電路5、二t控:雷_控制㈣ 機構18與測量值計算及雷 阻測篁儀器13、探針升降 之操作的-種裝二裝中的變量 號輸入至這些裝置各個中。工波置所輸出之控制信 現在將針對圖3戶斤示的雷射 述。在載物台η上放置有諸如具備電上之二作進行描 工:ι〇。接著’將加工物10與載物台}1固。::件的加 然後將探針12連接到加工物1〇的電阻器。在χΥ D14上。 496806Explanation of the invention (9) The signals of the scanning circuit 5 are respectively input into the galvanometer 6, and the galvanometer 6 will control the scanning mirror 7 according to this purpose. The workpiece 10 is placed on the 1 in the Xγ direction, and the stage 11 is placed on the stage. The type is carried at 10 for moving the stage 11 and the processed object 10. Then: Pass two: Connect the probe 12 for measuring the resistance to the processed object. The probe lifting mechanism 18 and the resistance measuring instrument 13in placed in the resistance measuring instrument 13 are detected by the probe 12. Transform into electronic signal; Mouth: the resistance of the object 'put this measured value; the radio pulse interval control device input value calculation and radio pulse interval control device 15 middle 2 ::, the value calculation and the lightning resistance measurement value get the electric distance ㈢ Through the differentiating process, the radio pulse is irradiated from time to time: fixed; the lightning device 1 according to the resistance change. After J, the result is output to the operation control. The operation control device 1 is controlled by the cool batch scanning control circuit 5. Two t control: mine_control㈣ mechanism 18 and measurement value calculation and lightning resistance measurement 篁 instrument 13, probe lift operation -The variable number in the second device is entered into each of these devices. The control letter output by the wave wave will now be described for the laser shown in Figure 3. On the stage η, for example, there is an electric two-piece work for drawing: ι〇. Next, the processed object 10 is fixed to the stage}. :: Adding the pieces Then connect the probe 12 to the resistor of the processed object 10. On χΥ D14. 496806

接下來,操作控制裝置1會輸 與探針升降機構18。隨即根據此 ^制信號抑台U 探針升降機構18,並將加工物1〇移動來驅動Η台U與 外,?作控制裝置i會輸出一控制信動取理想的旦位置。此 動他們。 ㈣裝置15中的變量,並促 操作控制裝置1會輸出 接下來 輸出之信號輸人到雷射錢2,域著Next, the operation control device 1 is input to the probe lifting mechanism 18. Then, the probe U lifting mechanism 18 is suppressed based on the control signal, and the processed object 10 is moved to drive the platform U and the outside. The operation control device i will output a control signal to take the ideal position. Move them. Variables in device 15 and prompt operation control device 1 to output the next output signal to laser money 2

QSff脈衝雷射17。另一古而 者田射先源2來震盪 描控制電路5。在制裝置1會促動光束 制信號至電流^ 控制電路5會輸出 ^ t6亚促動他們。至於電流計6則會杵告丨 由雷射光源2震盪而來之QSW脈衝雷射17會 散器‘而在光束直徑中擴散,編兩掃描鏡?而:= 向t反射,然後會藉由f_ 0透鏡8而聚集。接著藉由鏡子9 f反射所聚集的雷射光束,並將其照射到加工物1 〇的電阻 器0 描鏡7的角度與QSW脈衝雷射17的照射位置。 二制 在加工物10的電阻器中,位在QSW脈衝雷射17所照射 位置上的電阻器會蒸發掉。在這種方式中,即完成加工物 1 0的修整操縱動作。 另一方面’利用探針丨2來偵測電阻器的電阻。然後將 所债測到的信號輪入到電阻測量儀器1 3,再利用電阻測量 儀151 3來計算電阻器的電阻。其中電阻測量儀器1 3會將電QSff pulse laser 17. Another ancient source, Tianye Xianyuan 2, oscillates the control circuit 5. The in-process device 1 will actuate the beam control signal to the current ^ The control circuit 5 will output ^ t6 to actuate them. As for the galvanometer 6, the QSW pulse laser 17 diffuser oscillated from the laser light source 2 diffuses in the beam diameter, and two scanning mirrors are edited. And: = reflects to t, and then will be reflected by t f_ 0 lens 8 is converged. Then, the collected laser beam is reflected by the mirror 9f and irradiated to the resistor 0 of the workpiece 10 and the angle of the mirror 7 and the irradiation position of the QSW pulse laser 17. In the resistor of the work 10, the resistor at the position irradiated by the QSW pulse laser 17 will evaporate. In this way, the trimming operation of the processed object 10 is completed. On the other hand, the resistance of the resistor is detected using the probe 丨 2. Then the signal measured by the debt is turned into a resistance measuring instrument 13, and the resistance measuring instrument 1513 is used to calculate the resistance of the resistor. Among them resistance measuring instrument 1 3 will

第15頁 496806 五、發明說明(11) 子信號型態的電阻供應至測量值 裝置15中的變量。而測量值計算及脈衝間隔控制 15中的《 #會計算ί^射脈衝^後1間隔控制裝置 變量。之後,根據此計算值來:;曾電阻器電阻内的 佳暫停時間,並將玦果浐ώ ° :田射脈衝時期之間的最 灯°口禾翰出到操作控制桊罟〗..^ :控制裝置!依照所收到的結 二操 方式中,加工物10之電阻器 二,,故種 時機。 θ久畎出田射脈衝的照射 —此刻將描述該實施例的雷射修整方法。圖3 =施例之雷射修整方法中所使用的雷射修整;而為/ :施例的雷射修整方法中,會利用電流計型式之光束 來改變QSW脈衝雷射”的路徑,而且通常在修整末= 2之前’操縱速度與雷射脈衝照射間的暫停時間均是固 就是說,當信息組大小固定時,則使得雷射脈衝 二射到電阻器,並會執行雷射修整操縱。這時,針對各個 雷射脈衝在雷射脈衝照射前後的變量AR,與電阻目標值 與測量值間的差值加以計算。然後,在差值△Mm等 於f小於變量時,即改變照射最終雷射脈衝的時機。 在這種情況下’差值ARf ffl是由目標值減去測量值而來, 至於變量AR則是由雷射脈衝後的測量值減去雷射脈衝前 的测量值而來。 、 在將雷射脈衝照射時期間之暫停時間的初始設定定義 為T ’差值ARf m等於或小於變量ar時的ARf^值定義為△Page 15 496806 V. Description of the invention (11) The resistance of the sub-signal type is supplied to the variable in the measured value device 15. And the measurement value calculation and pulse interval control in the "# will calculate ^ 脉冲 脉冲 pulse after 1 interval control device variable. After that, according to this calculated value :; the best pause time in the resistor resistance, and the fruit will be free: the most light between the field pulse period ° Hehe out to the operation control 桊 罟 .. ^ : Control device! According to the received operation mode, the second resistor of the processed object 10, so the timing is right. Irradiation of θ-jiu-kuta field pulses-The laser trimming method of this embodiment will now be described. Figure 3 = Laser trimming used in the laser trimming method of the embodiment; and /: In the laser trimming method of the embodiment, the path of the QSW pulse laser is changed by using the beam of the galvanometer type, and usually Before the end of trimming = 2, the pause time between the manipulation speed and the laser pulse irradiation is fixed, that is, when the size of the information group is fixed, the laser pulse is shot to the resistor, and the laser trimming operation will be performed. At this time, the difference between the variable AR of each laser pulse before and after the laser pulse irradiation and the target value of the resistance and the measured value are calculated. Then, when the difference ΔMm equals f is smaller than the variable, the final laser irradiation is changed The timing of the pulse. In this case, the difference ARf ffl is obtained by subtracting the measured value from the target value, and the variable AR is obtained by subtracting the measured value before the laser pulse from the measured value after the laser pulse. The initial setting of the pause time during the time of laser pulse irradiation is defined as T ′ when the difference ARf m is equal to or less than the variable ar, and the value of ARf ^ is defined as △

第16頁 496806 五、發明說明(12)Page 16 496806 V. Description of the invention (12)

Rend,且從立即執行雷射脈衝照射至下次最終雷射脈 射的暫停時間定義為Tend時,則可由以下的公 五… 定Tend。 敉“彡采決 在這種情況下,因為要求用來計算變量需的時 間要小於Tend,故最好使用快速計算裝置來計算。在 如圖3所示的雷射修整設備中,雖然在測量值計〃算及雷射 脈衝間隔控制裝置1 5中的變量内來計算變量,作最好 使,具有針對測量值計算及雷射脈衝間隔控制裝置^5取 中的 變量執行快速計算之能力的數位信號處理器。 « 現在將描述該實施例中具有優點的效果。圖4是顯示 雷射脈衝照射時機與電阻器電阻變化間之關係圖,其中時 間為水平軸,而電阻器電阻與所照射之雷射強度則^垂直 軸。在圖4中,將初始電阻值不同之R1、R2與〇的 ,分別定義為ARendl、△Rend〗與△RenM,並將其Tend 定義為Tendl、Tend2與Tend3。此外,線條21至23分別表 示電阻器R1至R3電阻變化,線條24至26分別表示照射到電 阻裔R1至R3的雷射強度,而脈衝27則表示用來作用於電阻 器R1至R3的雷射脈衝。如圖4與圖2所示,在該實施例的方 法中’與雷射修整施加在因習用方法而使彼此具有不同初 始電阻的電阻器R4至R6的情況相較之下,在具有不同初始 電阻之電阻器R1至R3上施加雷射修整的情況時,最終電阻 變化量很小,且可達到實質上與目標值相等的一值。 以下將描述其原因。圖5A至圖5C各自顯示分別位在電 阻器R1至R3中的雷射脈衝照射位置之平面圖。在圖μ至圖Rend, and when the pause time from the immediate execution of the laser pulse irradiation to the next final laser pulse is defined as Tend, then Tend can be determined by the following public five ...敉 "彡 In this case, because the time required to calculate the variable is less than Tend, it is best to use a fast calculation device. In the laser trimming equipment shown in Figure 3, although the measurement The value calculation and the laser pulse interval control device 15 calculate the variables within the variables. It is best to have the ability to perform fast calculations on the measured value calculation and the laser pulse interval control device ^ 5 to perform the fast calculation. Digital signal processor. «The advantageous effects of this embodiment will now be described. Figure 4 is a graph showing the relationship between the timing of laser pulse irradiation and the change in resistor resistance, where time is the horizontal axis and the resistor resistance and the irradiation The laser intensity is the vertical axis. In Figure 4, R1, R2, and 0 with different initial resistance values are defined as ARendl, △ Rend, and △ RenM, and Tend is defined as Tendl, Tend2, and Tend3 In addition, the lines 21 to 23 indicate the resistance changes of the resistors R1 to R3, the lines 24 to 26 indicate the laser intensity of the resistors R1 to R3, and the pulse 27 indicates the resistors R1 to R3. As shown in FIGS. 4 and 2, in the method of this embodiment, compared with the case where the resistors R4 to R6 having different initial resistances from each other due to the conventional method are applied to the laser trimming. When laser trimming is applied to resistors R1 to R3 with different initial resistances, the final resistance change is small and can reach a value that is substantially equal to the target value. The reason will be described below. Figures 5A to Fig. 5C is a plan view showing the laser pulse irradiation positions respectively located in the resistors R1 to R3.

第17頁 496806 五、發明說明(13) 5 〇中L #曰出在隶終雷射脈衝照射前立即加在雷射脈衝照 射上、也就是加在第(η-1 )個雷射脈衝照射上的信息組大 =,其中Lendl、Lend2與Lend3各自指出第(η —d個雷射脈 衝照射與亦即最終之第η個雷射脈衝照射間的信息組大 小。藉由雷射脈衝27(參考圖4)即可讓電阻器^至”在雷 射,衝的照射位置3 4處蒸發。在這種方法中,會分別在電 阻器R1至R 3上形成雷射修整操縱槽3〗至3 3。 ^ 在該實施例中依照ARend值來調整Tend值,藉此調整 取終雷射脈衝照射中的信息組大小Lendl、Lend2與 ^nd3+。胃在廷種方法中,將因最終雷射脈衝照射所引起的 包阻變ϊ AR予以最佳化調整,並控制修整末了後的電阻 以便於使其實質上等於目標值Rf。 盥f例來說’如圖4與圖5β所示,針對電阻目標值(Rf) ^ =里值(線條22)間的差值為小於第(η-1 )個脈衝照 量△^的^以11(12之情況下的電阻器R2來說,可根 時間Ter^2式(1 )獲得第(n —1 )個與第n個脈衝照射間的暫停 照紛2 =,當修整速度定義為V時,暫停時間τ與雷射脈衝 所示j '月間的信息組大小L兩者間的關係如以下的公式(2) (2) 因此,電阻器R2中最後的信息組大小可由公式(3)而Page 17 496806 V. Description of the invention (13) 5 〇 中 L # means that immediately before the final laser pulse irradiation, the laser pulse irradiation is added, that is, the (η-1) th laser pulse irradiation is added. The information group on the large =, where Lendl, Lend2, and Lend3 each indicate the size of the information group between the (n -d laser pulse irradiation and the final nth laser pulse irradiation. With the laser pulse 27 ( (Refer to FIG. 4) The resistors ^ to ”can be evaporated at the irradiation positions of laser and punch 34. In this method, laser trimming control grooves 3 are formed on resistors R1 to R 3, respectively. 3 3. ^ In this embodiment, the Tend value is adjusted according to the ARend value, so as to adjust the size of the block Lendl, Lend2 and ^ nd3 + in the final laser pulse irradiation. In the stomach method, the final laser The envelope change caused by pulse irradiation 照射 AR is optimized and controlled, and the resistance after trimming is adjusted so that it is substantially equal to the target value Rf. For example, as shown in FIG. 4 and FIG. 5β, for Resistance target value (Rf) ^ = The difference between the inner value (line 22) is less than the (η-1) th pulse irradiance △ ^ In the case of the resistor R2 in the case of 11 (12, we can obtain the pause between the (n — 1) th and the nth pulse irradiation by the formula (1) at the time Ter ^ 2. 2 =, when trimming When the speed is defined as V, the relationship between the pause time τ and the size of the packet L in the month indicated by the laser pulse is as follows (2) (2) Therefore, the size of the last packet in the resistor R2 can be determined by Formula (3) while

496806 五、發明說明(14) 卩 戀戀 ^wf ^ \> ^>ίΡ X ί> w ^ ^ oSL ^ Λ V / Λ 、 祕!( 3 )496806 V. Description of the invention (14) 恋 Lianlian ^ wf ^ \ > ^ > ίΡ X ί > w ^ ^ oSL ^ Λ V / Λ, secret! (3)

當將與信息組大小L有關 八R 時 即導出下列的公式⑷之△'的測s值係數定義為k 靈謙邏 (4 ) 因此,因最終脈衝照射所引起之電阻 △ Rn2即可由以下公式(5)而來。 1:阻的反里 « ⑸ 1這種方法中’因最終脈衝照射所引起之 阻的;量鄭等於電阻目檩鎖與最終脈衝照射前°之電 阻兩者間的差值。因此根據該 的=電 阻實質上與目標值-致。兄發生’並能夠讓修整後的電 實際上此時的電阻變量^並不固定, 距=增加而增加。如此-來,與由前述公式二=: :息組:小L相關的電阻變請的係 ::4 :士之 近此,根據移動平均^ 衝照射時的係數k,並在最估計最終雷射脈 脈衝照射所引起之電阻器 ^因取終雷射 改善雷射修整準確产。 、、”'、里 η,藉此可進一牛When eight R is related to the size L of the information block, the following formula is derived: The measured coefficient of Δ 'is measured as k humility (4). Therefore, the resistance △ Rn2 caused by the final pulse irradiation can be expressed by the following formula (5) Coming. 1: Inversion of resistance «⑸ 1 In this method, the resistance caused by the final pulse irradiation is equal to the difference between the resistance yoke and the resistance of ° before the final pulse irradiation. Therefore, according to this = resistance is substantially the same as the target value. It can cause the trimmed electricity to actually increase the resistance variable ^ at this time. In this way, the following is related to the resistance change related to the above formula 2: =: interest group: small L:: 4: close to the person, according to the moving average ^, the coefficient k at the time of irradiation, and in the most estimated final thunder The resistor caused by the pulse of the pulse is improved by the final laser to improve the laser trimming accuracy. ,, "', li η, so you can enter a cow

(6) 496806 五、發明說明(15)(6) 496806 V. Description of the invention (15)

TrndmMB 在該實施例中所顯示的方法, 光束掃描器3來改變QSW脈衝雷射} 7 衝fe、射位置3 4相對加工物1 〇之電阻 中’舉例來說,則是以驅動χγ台j 4 式’藉此讓雷射脈衝照射位置相對 如上所述在該實施例的修整方 衝照射時期間的暫停時間來控制電 一來’最後的修整速度為定值,且 :低效率。此外,此種暫停時間調 而不會出現因機械操作所導致 n =在該實施例中,乃是使用 t旒處理器來計算在電阻器中 ^可隨著電阻變化來計算其 -的誤差,故不會發生修整準確度 匕外根據S亥貫施例的修敕t 行修整動作。如此一來,;:;方法 射脈衝昭鼾gp -r ^ Γ不需對電 ‘、、、射,即可形成具有良好狀 其中利用 的路徑, 為移動。 與移動加 電阻器移 法中,藉 阻器最後 不會因修 整不需要 的延遲時 具有高計 阻變化。 不會增加 降低的問 可以高準 阻最終調 態的雷射 電流計型式之 藉此讓雷射脈 然而在本發明 工物1 0的方 動。 由調整雷射脈 的電阻。如此 整速度減速而 透過機械操 間。 鼻速度的數位 如此一來,因 所計算電阻變 題。 確度方式來執 整重複執行雷 修整操縱槽。 »TrndmMB The method shown in this embodiment, the beam scanner 3 to change the QSW pulse laser} 7 punch fe, the shooting position 3 4 in the resistance relative to the processed product 10, for example, it is to drive χγ stage j Equation 4 is used to control the laser pulse irradiation position relative to the pause time during the trimming irradiation of the embodiment as described above to control the electricity. The final trimming speed is constant and has low efficiency. In addition, such a pause time adjustment does not occur due to mechanical operation. N = In this embodiment, the t 旒 processor is used to calculate the error in the resistor, which can be calculated as the resistance changes. Therefore, no trimming action will be performed outside the trimming accuracy according to the trimming example of the Shaiguan embodiment. In this way, the ::; method of firing pulses 鼾 gp -r ^ Γ does not require electricity ′ ,,, and radio to form a path that has a good condition and is used for movement. With the move-plus-resistor shift method, the resistor does not end up with a high resistance change due to unwanted delays in trimming. It does not increase the problem of the laser, which can adjust the laser current meter with a high precision to the final tuning. This allows the laser pulse to move in the direction of the workpiece of the invention. By adjusting the resistance of the laser pulse. This slows down the full speed and passes through the mechanical operation. Digit of nasal speed This is the case because the calculated resistance changes. Confirm the way to perform the repetitive lightning trimming operation. »

第20頁 Η·^Οόυ〇Page 20 Η · ^ Οόυ〇

位在一電阻器内的雷射 圖式簡單說明 圖1為習用雷射修整方法中 脈衝照射位置之平面圖。 圖2是顯不在習用雷射修整方法中、一 時機與一電阻器的電 r衝恥射 电阻k s間之關係圖,其中水平鉦 間,垂窗崖由為雷Μ t孕由為時 u 2直神兩电1且益之電阻與雷射強度。 了 圖3為本發明~警&丨rh仏 方塊圖。 属訑例中的一種雷射修整設備構造之 圖4是顯示在實施例的雷射修 照射時機與一電阻器的電阻万法中、田射脈衝 為時間,垂直軸為電阻器之電阻與係圖,其中水平軸 圖5A至5C各自顯示在實施例的恭L強度。 器R 1至R3的雷射脈衝照射位田射修整方法中、電阻 芡干面圖。 【符號說明】 1 操作控制裝置 2 雷射光源A simple illustration of a laser located in a resistor Figure 1 is a plan view of the pulse irradiation position in a conventional laser trimming method. Figure 2 shows the relationship between the timing and the electrical resistance of a resistor in the conventional laser trimming method, and the electrical resistance of a resistor and the resistor ks. The resistance and laser intensity of Zhishen Liangdian 1 and Yiyi. Figure 3 is a block diagram of the present invention ~ police & rh 丨. Figure 4 shows the structure of a laser trimming device in the example. Figure 4 shows the laser trimming timing and the resistance of a resistor in the embodiment. The field pulse is time, and the vertical axis is the resistance and system of the resistor. Figures, where horizontal axis figures 5A to 5C each show the Gong L intensity in the embodiment. In the laser trimming method of the laser pulses of the devices R1 to R3, the resistance surface is shown. [Symbol description] 1 Operation control device 2 Laser light source

電流計型式之雷射光束掃描 光束擴散 光束掃描控制電路 電流計 掃描鏡 8 f - 0透鏡 9 鏡子 10 加工物Galvanometer type laser beam scanning beam spreading beam scanning control circuit galvanometer scanning mirror 8 f-0 lens 9 mirror 10 work

496806 圖式簡單說明 11 載物台 12 探針 13 電阻測量儀器 14 XY 台 15 測量值計算及雷射脈衝間隔控制裝置 16 雷射震盪控制裝置 17 QSW脈衝雷射 18 探針升降機構 3 1、3 2、3 3、5 1 雷射修整操縱槽 34、52 雷射脈衝照射位置496806 Brief description of drawings 11 Stage 12 Probe 13 Resistance measuring instrument 14 XY stage 15 Measurement value calculation and laser pulse interval control device 16 Laser oscillation control device 17 QSW pulse laser 18 Probe lifting mechanism 3 1, 3 2, 3 3, 5 1 Laser trimming control slot 34, 52 Laser pulse irradiation position

第22頁Page 22

Claims (1)

1、申請專利範圍 在種讓W器之雷射修整方法’包含下列各步驟: 電阪器=阻=:雷射脈衝的-照射位置相對” 執行”心的該電阻器照射雷射脈衝,“ ’則1該電阻器的一電阻;以及, 測量=終目標值與於該修整動作内該電阻器的該電組 間。值之—變篁’決定雷射脈衝照射時期間的一暫停^阻 2中如申一請專利範圍第1項的電阻器之雷射修整方法,发 ,以—定速讓該雷射脈衝照射位置相對於該電阻哭ς 電阻=該電阻器之最終目標電阻值與修整期間所剛量之 起的^的一差值定義為、因一雷射脈衝照射所引 電阻測量值變量定義為Μ、且該暫停時間初2 =士疋義為Τ的情況下決定該雷射脈衝照射時期間的J二 分日^'間;當該差值△Rfffl大於該變量AR時,將暫停日/ ^ 義為T ;當該差值ARf ω等於或小於該變量AR時,即間定 J與下次的雷射脈衝照射間的該暫停時間Tend由下式^1. The scope of the patent application is for a laser trimming method for the W device, which includes the following steps: TVB = resistance =: laser pulse-relative to the irradiation position "perform" the resistor to irradiate the laser pulse, " 'Then 1 is a resistance of the resistor; and, measurement = the final target value and the electrical group of the resistor in the trimming action. The value of-change 篁' determines a pause during the laser pulse irradiation. In claim 2, please apply the laser trimming method for the resistor in the first item of the patent scope, and send the laser pulse irradiation position relative to the resistor at a constant speed. Resistance = the final target resistance value of the resistor and A difference of ^ from the amount of stiffness during the trimming period is defined as the resistance measurement variable due to a laser pulse irradiation is defined as M, and the suspension time is determined at the beginning of the time 2 = Shiyi is T During the period of J two minutes during the time of the pulse pulse irradiation; when the difference ΔRfffl is greater than the variable AR, the suspension day / ^ is defined as T; when the difference ARf ω is equal to or less than the variable AR, the interval The pause time Tend between the fixed J and the next laser pulse irradiation is given by the following formula ^ 3·如申請專利範圍第1項的電阻器之雷射修整方法, ,其 、'申請專利範圍 中,使用一 Q切換雷 射脈衝作為該雷射脈衝 4· 一種雷射修整設備,包含: :射震盪裝置,用於間歇性震盈出 -光學系統控制裝置,用於控制該路 -測量儀器,用於測量—加工物中之一電阻器的一電 系絲:ί作控制裝置,用於控制該雷射震盪裝置、$光學 系統控,襄置與該測量儀器;以及,m該先子 阻之ΐ K置、::::ί因該雷射脈衝照射所引起的該電 時期間暫;該電阻之該變量決定該雷射脈衝照射 5. 一種雷射修整設備,包含: 二1射Ϊ盪裝置’用於間歇性震逢出雷射脈衝; 位置; 置’用於負載-加工物並控制該加工物的- -測量儀器,用於測量該加工物中之—電阻器的一電 徑 阻 阻; _ 操作控制裝置,用於 裝置與該測量儀 器;以及, 控制該雷射震盪裝置、該傳送3. The laser trimming method for the resistor of the first scope of the patent application, which, in the scope of the patent application, uses a Q-switched laser pulse as the laser pulse 4. A laser trimming equipment, including: Radio-oscillation device, used for intermittent vibrating-optical system control device, used to control the road-measuring instrument, used to measure an electrical wire of a resistor in the processing: as a control device, used for Controlling the laser oscillator, optical system control, and the measuring instrument; and, the predecessor's resistance, K:, ::: ί temporarily caused by the laser pulse irradiation ; The variable of this resistance determines the laser pulse irradiation 5. A laser trimming device comprising: two 1-pulse oscillating devices 'for intermittent shocks to emit laser pulses; position; set' for load-processed objects And control the processed object-a measuring instrument for measuring an electrical path resistance of the resistor in the processed object; an operation control device for the device and the measuring instrument; and, controlling the laser oscillation device , The transfer 496806496806 6 ·如申請專利範圍第4項的雷射修整設備,复 速讓該雷射脈衝照射位置相對於該電阻器移&中,以—定 阻器之最終目標電阻值與修整期間所測量之,並於該電 差值定義為AR f m、因一雷射脈衝照射所引起限值間的— 量值變量定義為AR、且該暫停時間初始設定電阻剛 个月況下決定該雷射脈衝照射時期間的該暫停時 '義為丁的 值△Rfm大於該變量AR時,將暫停時間定義為/ · 當該差 值ΛΚίπι等於或小於該變量ar時,即時執行與下a當該差 脈衝照射間的該暫停時間Tend由下式決定。、次的雷射 晶麵1¾ 7 ·如申請專利範圍第4項的雷射修整設備,其中_ 脈衝為一 Q切換雷射脈衝。 該雷射6 · If the laser trimming equipment in the 4th scope of the patent application is applied, the laser pulse irradiation position is shifted relative to the resistor at a double speed, with the final target resistance value of the fixed resistor and the value measured during the trimming , And the laser pulse irradiation is determined when the electrical difference value is defined as AR fm, the limit value caused by a laser pulse irradiation is defined as AR, and the pause time is initially set when the resistance is just one month. When the pause during the time period is defined as the value ΔRfm is greater than the variable AR, the pause time is defined as / · When the difference ΛΚίπι is equal to or less than the variable ar, the immediate execution is performed with the next a when the difference pulse is illuminated The pause time Tend is determined by the following formula. Second and third laser crystal planes 1¾ 7 · As the laser trimming equipment for patent application No. 4, the _ pulse is a Q-switched laser pulse. The laser 第25頁Page 25
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CN104616851B (en) * 2015-01-23 2017-09-29 洛阳冰岩激光设备有限公司 A kind of laser resistance adjuster
CN107017068B (en) * 2017-03-24 2018-09-11 深圳市杰普特光电股份有限公司 Method and device, the laser resistor trimming system of laser resistor trimming
CN109903943B (en) * 2019-04-29 2021-06-22 深圳市杰普特光电股份有限公司 Resistance value adjusting method and device, storage medium and equipment
CN110070971A (en) * 2019-05-13 2019-07-30 深圳市杰普特光电股份有限公司 Laser resistor trimming system

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CN1193382C (en) 2005-03-16
CN1324079A (en) 2001-11-28

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