1259549 (1) 玖、發明說明 【發明所屬之技術領域】 本發明是有關照射距離自動調整方法及其裝置，詳細 地說，是有關使來自雷射振盪裝置之脈衝雷射 （pulse 1 a s e r)聚焦之物鏡與載置於台面 （s t a g e )之被照射物之 間的照射距離自動調整方法及其裝置者。 【先前技術】 先前，在製造薄膜電晶體之結晶矽時，是在玻璃基板 上形成有薄a- S i (非晶形矽）膜之被照射物照射雷射光， 將a- Si膜結晶化成p- Si (聚矽）膜。對該非晶形矽照射雷 射光的方法之一有將均勻強度之雷射光撞觸光柵（光罩） ’並以光學儀器之物鐘將其投影於被照射物之非晶形矽膜 上成像而照射之方法（例如日本專利第32049 86號）。 它是將以發生準分子雷射之雷射振盪裝置所發生雷射 光引導到光學儀器並以反射鏡適當轉換方向，同時整形與 均勻化強度後，使其通過光柵與物鏡而整形爲方形之光線 (line beam)(脈衝雷射）而照射於被照射物而複製。被照 射物是被設置於雷射退火 （1 a s e r a m m e a 1 i n g)裝置中。 在該種情形下，以物鏡將光柵之像忠實地成像於被照 射物上之方法可以大致分爲三種。 第1種是藉由改變光柵之位置1適當設定光柵與物鏡 之距離以使成像於被照射物上。第2種是藉由改變物鏡之 位置，並適當設定光柵與物鏡之距離以使成像於被照射物 -6 - 1259549 (2) 上。第3種是保持光柵物鏡之距離固定，而藉由改變被照 射物之位置並適當設定由物鏡到被照射物爲止之距離以便 成像於被照射物上之方法。 第1種與第2種方法有所形成之像的大小會變動之缺點 。因此，本發明係採用第3種方法。在此，如果台面的精 密度與被照射物之形狀尺寸良好時，不會發生問題，但是 事實上，就台面本身而言，如停止上下方向移動 （Z軸） 而僅移動於水平方向 （Z軸）時，最多會變動1 Ο μ m左右。 另外，被照射物之厚度最多會變動30pm左右。亦即，合 計會發生40μιη左右之變動。因此，必須上下移動台面以 保持由物鏡到被照射物之成像面之距離於固定。 然後，爲了在被照射物之整面獲得適當的成像，必須 計算控制物件與被照射物在光軸上之距離。在先前技術中 ，有幾個實現之方法。 其代表例如圖5所示。此是將雷射振盪裝置所產生之 脈衝雷射80透過光柵 （reticle) 70，並利用反射鏡71與半 透明鏡所構成之反射鏡72適當轉換方向，在通過物鏡73後 ，照射於被照射物74之表面。 —方面，利用適當之光計算物鏡73與被照射物74之光 軸上之距離。亦即，將光8 1透射柱面透鏡 （cylindrical 1 e n s ) 7 6後以半透明鏡所構成之反射鏡7 7反射，同時使其 透射反射鏡72，穿過物鏡73而聚焦，並照射於被照射物74 之表面，再將該反射光通過物鏡7 3與反射鏡7 2 ’ 7 7並使測 定器7 8受光。 -7 - 1259549 (3) 然後由測定器7 8所接受之光8 1的形狀判定物鏡7 3與被 照射物7 4之光軸上之距離的適當與否’並以圖外之外降驅 動裝置外降移動台面7 9與被照射物7 4以便成爲恰當狀態。 物鏡73與被照射物74之光軸上之距離誤差B- A以小於5μπι 爲理想。以測定器7 8所接受之光8 1的形狀如圖6所示’圖6 (甲）爲物鏡7 3過於接近被照射物7 4，圖6 (乙）爲恰當狀 態，圖6 (丙）表示物鏡73離被照射物74太遠。 可是，在爲製造薄膜電晶體之結晶矽而照射雷射光時 ，需要非常強的雷射光80，但是由於由半透明鏡所構成的 反射鏡7 2等之反射而發生強度之降低。另外’當測距用之 光8 1透過由半透明鏡所構成之反射鏡72，77時’不但有發 生反射光或透射光而降低強度之傾向，在測距用之光8 1爲 紫外線等波長短的時候，容易發生與雷射光80之干涉等’ 因此有不易採用之一面。此外，即使用使特定波長之光8 1 之半透明鏡做爲反射鏡7 2，7 7時，因爲反射鏡7 7係用於使 相同波長之光8 1反射與通過者，因此會發生透射光或反射光 而降低強度。再者，因爲雷射光8 0與光8 1具有不同之波長’ 通過物鏡73後之成像位置偏移，不容易正確判定距離是否適 當。這是由於將結晶用雷射光80及測距用之光8 1兩者引導至 相同光軸上所導致。 本發明之目的在提供一種照射距離自動調整方法及其 裝置，其可以將被照射物一邊相對移動一邊照射雷射時，在 離開脈衝雷射之光軸之位置設置距離計以解決上述之課題。 1259549 (4) 【發明內容】 [解決課題之手段;| 本發明爲鑑及上述之先前技術上課題而完成者’其構 造如下。 申請專利範圍第1項之發明爲照射距離自動調整方法’ 具有雷射振盪裝置1，承載被照射物5之台面10，以及將台面 1 0相對移動於雷射振盪裝置1之特定方向（X)之移動裝置 20，在每一特定間隔中將依次通過光柵21及物鏡3而由物鏡3 聚焦之來自雷射振盪裝置1之脈衝雷射4照射於承載於台面1〇 上面之被照射物5，其特徵爲具備： 升降驅動裝置30，使台面10對雷射振盪裝置1 ’光柵21 及物鏡3相對升降移動， 距離計3 1，設置於脈衝雷射4對上述被照射物5之照射位 置到台面1 0之進行方向後側隔著特定距離L之雷射振盪裝置1 的側部，並依次測定上述被照射物5與脈衝雷射4之照射面之 距離h並輸出檢測値hn，以及 基本控制値設定手段32，用於輸出與承載於台面1 0之被 照射物5與物鏡3之間的恰當距離相對應之基本控制値Η，並 且 依次求取基本控制値Η與檢測値hn之差値A η，同時求 取前面所求差値Δη- 1與後續所求差値Δη之差所構成之控 制差値5，並將該控制差値（5僅延遲台面1 〇移動上述特定距 離L所需要之時間輸出，而且 1259549 (5) 與物鏡3之固定間隔以控制物鏡3與承載於台面1 0之被照射物 5之脈衝雷射4之照射面之距離。 ‘ 申請專利範圍第2項之發明爲照射距離自動調整裝置， 具備雷射振盪裝置1，承載被照射物5之台面1 0，以及將台面 10對雷射振盪裝置1相對移動於特定方向（X)之移動裝置 2 0，並且在每一間隔中將依次通過光柵2 1及物鏡3而由物鏡3 聚焦之來自雷射振盪裝置1之脈衝雷射4照射於承載於台面1 0 上面之被照射物5，其特徵具備： φ 升降驅動裝置30，使台面10對雷射振盪裝置1，光柵21 及物鏡3相對升降移動， 距離計3 1，設置於由對脈衝雷射4之上述被照射物5之照 射位置到台面1 0之進行方向後側隔著特定距離L之雷射振盪 裝置1之側部，並依次測定與上述被照射物5之脈衝雷射4之 照射面之距離h而輸出檢測値hn，以及 基本控制値設定手段32，用於輸出與承載於台面10之被 照射物5與物鏡3之間的距離相對應之基本控制値Η， ^ 第1演算手段3 3，用於依次求取基本控制値Η與檢測値 h η之差値△ η， 記憶手段3 5，用於記憶前面求得之差値△ η - 1， 第2演算手段36，用於求取由前面所求得之差値△ η- 1 與後續求得之差値△ η之差所構成之控制差値（5，以及 延遲手段3 4，將該控制差値δ僅延遲台面1 0移動上述特 定距離L所需要之時間輸出，而且， 藉由依照控制差値（5驅動升降驅動裝置30，保持光栅2 1 -10 - 1259549 (6) 與物鏡3之固定間隔以控制物鏡3與承載於台面10之被照射物 5之脈衝雷射4之照射面之距離。 申請專利範圍第3項之發明爲申請專利範圍第2項之照 射距離自動調整裝置，其中延遲手段34係由第1FIFO記憶體 45所構成，將該檢測値hn僅延遲台面1〇移動上述特定距離L 所需要之時間輸出，以延遲控制差値（5之輸出。 申請專利範圍第4項之發明爲申請專利範圍第2項或第3 項之照射距離自動調整裝置，其中記憶手段35係由第2FIFO 記億4 6所構成。 [實施方式】 圖1至圖4爲表示本發明之照射距離自動調整裝置之一 實施形態。圖中符號1 0爲台面，如圖3所示，以台面1 0上承 載由基板所構成之被照射物5之狀態，由移動裝置20將台面 1 〇對準來自雷射振盪裝置1之脈衝雷射4相對移動於水平的特 定方向X (掃瞄之X軸方向）。此外，實際上是將台面10來 回移動於特定方向X。 0 雷射振盪裝置1如圖4 (甲）所示，是固定於基台2 2，使 產生由脈衝雷射所構成之準分子雷射 （excimer laser)，並 將產生之雷射光A 1引導至含有光柵2 1及物鏡3之光學機器9 ’再以反射鏡7轉換方向，使其通過長軸均化器 (homogenuer) 2a與短軸均化器2b整形以均勻化強度後，再 以反射鏡8轉換方向並藉由通過光柵2 1與物鏡3整形成由方形 的光線 （1 i n e b e a m )所形成的脈衝雷射4以照射，俾使投 -11 - 1259549 (7) 影·成像在承載於台面1 〇上之被照射物5上。光柵2 1與物 鏡3係對準光軸而固定配置於特定間隔，該光軸與被照射 物5之照射面正交。被照射物5是設置於雷射退火裝置之真 空室中。 被照射物5爲如圖4所示，在玻璃基板6上形成薄的a-Si (非晶形矽）膜5a者，並藉由在該非晶形矽膜5a照射脈 衝雷射4，將非晶形矽膜5a結晶化成薄的聚矽膜5b。照射 方法是一邊來回移動台面1 0，一般將脈衝雷射4照射被照 射物5之特定方向X的整個寬度。實際上，接著將台面1 0 變位到與特定方向X正交的方位，並藉由對被照射物5之 特定方向X之整個寬度照射脈衝雷射4對被照射物5之整面 照射脈衝雷射4，並且更換整面達到特定照射次數 （1 0至 20次）之被照射物5，依次對被照射物5照射脈衝雷射4。 移動裝置20具體上具有圖3所示之X軸伺服器55。亦 即具伺服馬達4 0，由於伺服馬達4 0之正反旋轉，藉由圖外 之滾珠絲杠 （b a 11 s c r e w)機構將台面1 〇間歇性或連續性地在 每一特定間隔移動。 移動裝置20之伺服馬達40係依據圖3所示之驅動信號R4 ，由伺服控制裝置60所驅動，由驅動信號R4減去移動信號 Zn成爲零時即停止，台面1 〇與被照射物5也停止。實際上5 接著’伺服馬達4 0即被反射驅動，當由驅動信號R 4減去移 動信號Zn成爲零時再度停止，台面丨〇與被照射物5也停止。 由於該重複動作，在台面1 〇上之被照射物5對來自雷射振盪 裝置1之脈衝雷射4相對來回移動於特定方向X。因此，後面 -12- 1259549 (8) 所述之距離計3 1實際上是設置於脈衝雷射4對上述被照射物5 之照射位置，亦即，對稱設置於光柵與物鏡3之光軸到台面 1 〇之進行方向之前後兩側。 移動信號Ζ η係以旋轉編碼器 （R ◦ t a r y e n c q d e 1·) 4 1檢測 伺服馬達40之旋轉數（旋轉角度），並利用第1計數器42計 算該檢測脈衝，而每當台面10之移動長度成爲特定値時獲得 脈衝信號。因此，移動信號Zn在每一脈衝時皆與台面1 〇之特 定移動長度相對應。 由於X軸伺服器55，在圖2上由右移動至左邊的台面1〇 之具體速度爲100至800mm/秒左右。間歇性照射之脈衝雷射4 爲例如每秒發光50至1，000次，其發光時間爲約2毫微秒 (nsec)至1〇μ秒。因爲脈衝雷射4發光的時間與台面1〇之移 動速度相比非常短暫，所以即使連續移動台面1 〇，利用設 置於X軸伺服器5 5以表示特定方向X之位置之第1計數器4 2 之値也可以等間隔地照射脈衝雷射4。亦即，利用伺服馬 達4 〇驅動台面10事實上不必進行暫時停止每一個要照射的 處所照射之間歇性照射，也可以毫無問題地進行照射。 該移動信號Ζ η是由第2計數器4 3所計數，每當計數値 1/Ν1時，即做爲台面10之特定間隔之移動時間，而輸出振 盪脈衝雷射4之信號I，並以該信號I驅動雷射振盪裝置1以 照射脈衝雷射4。因此，可以對台面10上之被照射物5在特定 間隔之距離與位置依次照射脈衝雷射4。 然後，如圖1所示，設置外降驅動裝置30，距離計3 1， 基本控制値設定手段32，第1演算手段33，延遲手段34，記 -13 - 1259549 (9) 憶手段與第2演算手段36。 升降驅動裝置3 0具有對雷射振盪裝置1，光栅2 1與物鏡3 相對地升降移動台面1 0之功能，並藉由圖2所示被正反旋轉 驅動之伺服馬達3 6，透過滾珠絲杠機構3 7將第1傾斜滑車 (block) 3 8進退驅動於水平方向。如此一來，以傾斜面繫合 於第1傾斜滑車3 8之第2傾斜滑車3 9會升降，因此，與第2傾 斜滑車結成一體之台面1 〇也升降。第丨傾斜滑車3 8被支撐成 在基台22側成滑動自如於水平方向，而台面1 〇被支撐成在基 台2 2側成滑動自如於上下方向。 距離計3 1如圖2所示，係設置於距離台面1 〇上所承載之 被照射物5之雷射4之照射位置隔特定距離L之台面10之進行 方向之後方之基台22側之雷射振盪裝置1旁邊以測定與上述 被照射物5之脈衝雷射4之照射面之距離h。以距離計3 1所測 定之距離h位於與通過光柵2 1與物鏡3之後，照射於被照射物 5之脈衝雷射4之光軸平行。利用該距離計3丨，被照射物5與 脈衝雷射4之照射面之距離h於特定間隔依次被測定，而檢測 値hn依次被輸出。 基本控制値設定手段32，延遲手段34，第1演算手段33 ’記憶手段35與第2演算手段36係由微電腦所構成。基本控 制値設定手段32在被照射物5之表面爲無凹凸之表面時’輸 出對應於承載於均勻厚度之台面1 〇之被照射物5與物鏡3之間 之恰當距離之基本控制値Η。亦即，基本控制値Η爲光柵2 1 載置於端正地成像於被照射物5上面時之台面1 0上的被照射 物5之起始狀態之位置設定値，爲設定一次即不必變更。該 -14 - 1259549 (10) 被照射物5之脈衝雷射4之照射面與物鏡3之間的恰當距離與 利用距離計3丨所計測之恰當距離相對應。 延遲手段34將上述特定距離L僅延遲台面10移動時所需 要之特定時間再輸出。但是’延遲手段34只要設定成最後可 以僅將後面敘述之控制差値5延遲特定時間輸出到升降驅動 裝置3 0即可。因此，延遲手段3 4也可以配置於第2演算手段 36與升降驅動裝置30之間。 第1演算手段33利用Η- 1ιη = Δ η求得以基本控制値設定手 段3 2所設定之基本控制値Η與距離計3 1之檢測値hn之差値△ η 並輸出差値△ η。 記憶手段35將由第1演算手段33依序輸出之差値△ η中， 將前次求得之差値△ η · 1依次記憶。第2演算手段3 6利用△ η -( △ η - 1) = 6 演算記 憶於記 憶手段 3 5 之前 所求得 之差値 △ η -1，以及後續所求之差値△ η之差所構成之控制差値δ。 然後，依照控制差値5 驅動升降驅動裝置3 0，將光 柵2 1與物鏡3之間的距離保持一定之狀態下，將台面1 〇上 所承載之被照射物5與脈衝雷射4之照射面之距離h，甚至 物鏡3與台面1 0上所承載之被照射物5與脈衝雷射4之照射 面之距離控制成恰當。 茲參照圖3說明照射距離自動調整裝置之具體構造。 照射距離自動調整裝置具備使甩第1 FIFO (先進先出）記 憶體4 5與第2 F I F Ο記憶體4 6之信號處理部5 7，驅動台面i 〇 於上下方向之Z軸伺服器56及距離計31。FIFO記憶體45， 4 6又稱爲欄位影像記億體 （Π e 1 d i m a g e m e m 〇 r y )，係用 -15 - 1259549 (11) 於儲存與取出資料時，可以依儲存之順序由最早之資料取 出之記憶體。 在使用FIFO記億體45，46之信號處理部57中，事先由 第3計數器44計算上述移動信號Zn，而每當計數値成1/N 2 時即輸出脈衝信號J，而在輸出脈衝信號J時，信號處理部 5 7開始操作並進行利闱FIFO記憶體45，46之計算等。因此 ，脈衝信號J是依據驅動信號R 4而產生的。 在此，如利用移動裝置20將台面10移動至特定方向X (X軸方向），即產生移動信號Zn之脈衝，而每1脈衝（P) 之台面10之移動距離約爲0.01至lOum/P。例如，以移動信 號Zn爲lym/P之情形爲例說明如下。第2計數器43計算移 動信號Ζ η之脈衝數而在每一 Ν 1計數時將一個脈衝信號I 輸出到雷射振盪裝置1俾產生脈衝雷射4。具體例中是Ν 1爲 1000而每1mm間隔照射脈衝雷射4。另方面，第3計數器44 是每N計數時輸出脈衝信號】而於輸出脈衝信號J時，進行 信號處理部57之計算等。 通常，將第1FIFO記憶體45之階段數（圖3之第1 FIFO 記憶體中爲4階段）定爲Μ，如果由圖2之距離Lmm，於每 L/M mm由第1 FIFO記憶體45取出距離計31之檢測値hn計算 1，即可將距離計3 1之檢測値僅延遲台面1 〇移動上述特定 距離L所需要之時間來計算。因此，如將第3計數器44之計 數N 2之値設定爲L/M/1 μ m時，即隨著台面1 0之移動驅動升 降驅動裝置30，。如將N2之値設成與Ν 1之値相同，即可配 合雷射4之發光進行依據距離計3 1之檢測値hn之升降驅動裝 -16 - 1259549 (12) 置3 0之驅動。但是，配合脈衝雷射4之發光以進行升降驅動 並非必要 ° 第1 FIFO記憶體45是於每經過特定時間（每N2計數） 被輸入距離計3 1之檢測値hn，該値並依次移動至Μ 1，M2， M3，Μ4，檢測値hn僅被延遲特定期間而由Μ4輸出。因此， 第1 FIFO記憶體45之功能成爲將距離計3 1之檢測値hn僅延遲 台面10移動上述特定距離L所需要之時間以輸之延遲手段34 。但是該距離計3 1之檢測値h η後來會變成控制差値6，所縱 使將控制差値（5僅延遲台面1 〇移動上述特定距離L所需要的 時間輸出，其作用相同。 由第1 FIFO記憶體45取出之檢測値hn直到圖3所示之第I 演算手段33，依次求取由基本控制設定手段32輸出之基本控 制値Η與檢測値hn之檢測値hn之差値△ η爲H- hn = Z\ η。 第2 FIFO記憶體46依次將由第1演算手段33所輸出之差 値△ η儲存，記憶。然後，在下一脈衝信號被輸出時，求得 由第1FIF0記憶體45到本次被輸出之距離計31之檢測値hn與 基本控制値Η之差値△ η，該差値△ η被儲存，記憶於第 2FIF0記憶體46，同時繞過第2FIF0記憶體46到達圖3所示第2 演算手段3 6。 第2演算手段36中，由第2FIF0記憶體46所取出之上次之 差値△ η - 1與本次之差値△之差所構成之控制差値δ被求取 爲(△ η- 1) = δ。因此，第2FIF0記憶體46具有用於記 億前面所求得之差値△ η · 1之記憶手段3 5之功能。 控制差値（5被輸入於Ζ軸伺服器56。Ζ軸伺服器56具備 -17 - 1259549 (13) 伺服馬達36，並使伺服馬達36正反旋轉，且透過圖2所示之 滾珠絲杠機構37使台面1 0上下移動。 Z軸伺服器5 6之伺服馬達3 6依據圖3所示之控制差値5 ，藉由伺服控制裝置6 1邊控制邊驅動，並在由驅動信號之控 制差値（5減去升降移動信號Zn成爲零時停止，而且台面1 〇與 被照射物5也停止。升降移動信號Zn2以旋轉編碼器（rotary encoder) 5 1檢測出伺服馬達36之旋轉數（旋轉角度），而該 檢測脈衝被第4計數器5 2計算，每當台面1 0之升降移動長度 成爲特定値時獲及脈衝信號。因此，升降移動信號Zn2在每 一脈衝時皆與台面1 0之特定升降移長度相對應。 其次要就上述1實施形態之作用加以說明。 一開始在基本控制値設定手段3 2設定基本控制値η， 並使承載於台面1 0之被照射物5與物鏡3之間的距離相對於 基本厚度相同之多枚被照射物5呈恰當之狀態。因此，距 離計3 1之高度位置在恰當的距離h之狀態，而由圖2上被照 射物5之左端部之距離h開始測定。 然後，依據驅動信號R 4，如上所述移動裝置2 〇被伺服 控制裝置6 0所驅動，而承載於台面；[〇之被照射物5在圖？上 面移動至左方，同時，利用信號I驅動雷射振盪裝置i以 照射脈衝雷射4。距離計3 1由被照射物5之左端部之距離 Η開始測定，因此，脈衝雷射4由被照射物5之左端僅離開 距離L的位置開始及照射。 另方面’被照射物5與脈衝雷射4之照射面之距離h在 特定間隔依次被測定，檢測値hn透過延遲手段34依次僅延 • 18 - 1259549 (14) 遲台面1 〇要移動上述特定距離L所需要之時間輸出並輸入 於第1演算手段3 3 ’同時來自基本控制値設定手段之基本 控制値Η被輸入第1演算手段3 3。第1演算手段3 3每當產生 檢測値h η時，即依次求取基本控制値η與檢測値h η之差値1259549 (1) 玖 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 发明 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 】 自动 自动 自动 自动 自动 自动 自动 自动 自动 自动The method of automatically adjusting the irradiation distance between the objective lens and the irradiated object placed on the stage and the device thereof. [Prior Art] Previously, in the production of a crystalline germanium of a thin film transistor, an irradiated object having a thin a-S i (amorphous germanium) film formed on a glass substrate was irradiated with laser light, and the a-Si film was crystallized into p. - Si (poly) film. One of the methods for irradiating the amorphous ray with laser light is to irradiate the laser beam with a uniform intensity against the grating (photomask) and image it onto the amorphous enamel film of the object to be irradiated by the object clock of the optical instrument. Method (for example, Japanese Patent No. 32049 86). It is to guide the laser light generated by the laser oscillating device with the occurrence of excimer laser to the optical instrument and appropriately transform the direction with the mirror, and at the same time shape and homogenize the intensity, and then shape the light into a square shape through the grating and the objective lens. (line beam) (pulse laser) is irradiated onto the object to be irradiated and reproduced. The object to be irradiated is placed in a laser annealing (1 a s e r a m m e a 1 i n g) device. In this case, the method of faithfully imaging the image of the grating onto the object by the objective lens can be roughly classified into three types. The first is to appropriately set the distance between the grating and the objective lens by changing the position 1 of the grating to image on the object to be illuminated. The second type is to change the position of the objective lens and appropriately set the distance between the grating and the objective lens to image on the object to be illuminated -6 - 1259549 (2). The third type is a method of keeping the distance of the grating objective lens fixed by changing the position of the object to be irradiated and appropriately setting the distance from the objective lens to the object to be irradiated for imaging on the object to be irradiated. The disadvantage of the size of the image formed by the first and the second method is variable. Therefore, the present invention employs the third method. Here, if the precision of the mesa and the shape of the object to be irradiated are good, no problem occurs, but in fact, in the table itself, if the movement in the up and down direction (Z axis) is stopped, only the horizontal direction is moved (Z When the axis is used, it will change by up to 1 Ο μ m. In addition, the thickness of the object to be irradiated can vary by up to about 30 pm. That is, a total of about 40 μm is expected to change. Therefore, it is necessary to move the table top up and down to keep the distance from the objective lens to the imaged surface of the object to be irradiated fixed. Then, in order to obtain proper imaging over the entire surface of the object to be irradiated, it is necessary to calculate the distance between the control object and the object to be irradiated on the optical axis. In the prior art, there are several ways to implement it. Its representative is shown, for example, in FIG. The pulse laser 80 generated by the laser oscillating device is transmitted through a reticle 70, and the mirror 72 formed by the mirror 71 and the semi-transparent mirror is appropriately converted. After passing through the objective lens 73, the illumination is irradiated. The surface of the object 74. On the other hand, the distance between the objective lens 73 and the optical axis of the object to be irradiated 74 is calculated using appropriate light. That is, the light 8 1 is transmitted through the cylindrical lens 7 6 and then reflected by the mirror 77 formed by the semi-transparent mirror, while being transmitted through the mirror 72, focused and illuminated by the objective lens 73. The surface of the object 74 is irradiated, and the reflected light is passed through the objective lens 73 and the mirror 7 2' 7 7 to receive the light. -7 - 1259549 (3) Then, the shape of the light 8 1 received by the measuring device 7 8 determines whether the distance between the objective lens 7 3 and the optical axis of the irradiated object 7 4 is appropriate or not. The apparatus descends the moving surface 7 9 and the irradiated object 7 4 so as to be in an appropriate state. The distance error B-A between the objective lens 73 and the optical axis of the object to be irradiated 74 is preferably less than 5 μm. The shape of the light 8 1 received by the measuring device 7 is as shown in Fig. 6. 'Fig. 6 (a) is that the objective lens 7 3 is too close to the irradiated object 7 4, and Fig. 6 (b) is in an appropriate state, Fig. 6 (c) The objective lens 73 is shown to be too far away from the object 74 to be irradiated. However, when laser light is irradiated to produce a crystal ytterbium of a thin film transistor, very strong laser light 80 is required, but the intensity is lowered by reflection of the mirror 72 or the like constituted by the semitransparent mirror. In addition, when the light for distance measurement 81 passes through the mirrors 72 and 77 formed by the semi-transparent mirrors, there is a tendency to reduce the intensity of reflected light or transmitted light, and the light for distance measurement 8 1 is ultraviolet rays or the like. When the wavelength is short, interference with the laser light 80 is likely to occur, so that it is difficult to use one side. In addition, when a semi-transparent mirror that uses light 8 1 of a specific wavelength is used as the mirrors 7 2, 7 7 , since the mirror 7 7 is used to reflect the light of the same wavelength and the passer, the transmission occurs. Light or reflected light reduces the intensity. Furthermore, since the laser light 80 has a different wavelength from the light 8', the imaging position after the objective lens 73 is shifted, it is not easy to correctly determine whether the distance is appropriate. This is caused by guiding both the crystallization laser light 80 and the distance measuring light 81 to the same optical axis. SUMMARY OF THE INVENTION An object of the present invention is to provide an automatic adjustment method of an irradiation distance and an apparatus for providing a distance meter at a position away from an optical axis of a pulse laser when the object to be irradiated is irradiated with a relative movement to solve the above problem. 1259549 (4) [Description of the Invention] [Means for Solving the Problems; | The present invention has been completed in view of the above-mentioned prior art problems]. The invention of claim 1 is an automatic adjustment method of the irradiation distance. The laser oscillation device 1 has a table top 10 for carrying the object 5 to be irradiated, and the table 10 is relatively moved in a specific direction (X) of the laser oscillation device 1. The moving device 20 irradiates the irradiated object 5 from the laser oscillating device 1 with the pulsed laser 4 from the laser oscillating device 1 which is sequentially focused by the objective lens 3 through the grating 21 and the objective lens 3 in each specific interval. It is characterized in that the elevation drive device 30 is provided such that the table top 10 relatively moves up and down the laser oscillation device 1 'grating 21 and the objective lens 3, and the distance meter 3 1 is disposed on the irradiation position of the pulsed laser 4 to the object 5 to be irradiated The side of the laser oscillating device 1 at a specific distance L is interposed on the rear side of the countertop 10, and the distance h between the irradiated object 5 and the irradiation surface of the pulsed laser 4 is sequentially measured and the detection 値hn is output, and the basic The control unit setting means 32 is configured to output a basic control 相对 corresponding to an appropriate distance between the object 5 to be irradiated on the table 10 and the objective lens 3, and sequentially obtain the difference between the basic control 値Η and the detection 値 hn値A η At the same time, the control difference 构成5 formed by the difference between the previously obtained difference Δη-1 and the subsequent difference Δη is obtained, and the control difference 値 (5 is only delayed by the time required for the table 1 〇 to move the specific distance L described above) Output, and 1259549 (5) is fixedly spaced from the objective lens 3 to control the distance between the objective lens 3 and the irradiation surface of the pulsed laser 4 of the object 5 to be irradiated on the mesa 10 . The distance automatic adjusting device includes a laser oscillating device 1, a table 10 carrying the irradiated object 5, and a moving device 20 that relatively moves the table 10 to the laser oscillating device 1 in a specific direction (X), and The pulsed laser 4 from the laser oscillating device 1 which is focused by the objective lens 3 and sequentially passed through the grating 2 1 and the objective lens 3 in the interval is irradiated onto the irradiated object 5 carried on the surface of the table 10 , and has the following features: φ lifting drive device 30, the table top 10 pairs the laser oscillating device 1, the grating 21 and the objective lens 3 are relatively moved up and down, and the distance meter 3 1 is disposed in the direction from the irradiation position of the irradiated object 5 to the pulsed laser 4 to the table top 10 The back side is separated by a specific distance L The side portion of the laser oscillating device 1 sequentially measures the distance h from the irradiation surface of the pulsed laser 4 of the object 5 to be output, and outputs a detection 値hn, and a basic control 値 setting means 32 for outputting and carrying it on the table. The basic control corresponding to the distance between the irradiated object 5 and the objective lens 3, ^ the first calculation means 3 3, for sequentially obtaining the difference 基本 Δ η between the basic control 値Η and the detection 値 h η, memory The means 3 5 is for memorizing the difference Δ η - 1 obtained in the foregoing, and the second calculation means 36 is for obtaining the difference 値 Δ η obtained by the above and the difference 値 Δ η obtained afterwards. The control difference formed by the difference (5, and the delay means 34, the control difference 値δ is only delayed by the time required for the table 10 to move by the specific distance L, and by driving the lift according to the control The driving device 30 maintains a fixed interval between the grating 2 1 -10 - 1259549 (6) and the objective lens 3 to control the distance between the objective lens 3 and the irradiation surface of the pulsed laser 4 of the object 5 to be irradiated on the mesa 10 . The invention of claim 3 is the automatic irradiation distance adjusting device of claim 2, wherein the delay means 34 is constituted by the first FIFO memory 45, and the detection 値hn is delayed only by the table 1 〇 to move the specific distance L The required time output is delayed by the control difference (5 output. The invention of claim 4 is the automatic adjustment device for the illumination distance of the second or third item of the patent application, wherein the memory means 35 is 2 Embodiments of the FIFO are shown in Fig. 1 to Fig. 4 are views showing an embodiment of the automatic irradiation distance adjusting device of the present invention. In the figure, the symbol 10 is a table surface, as shown in Fig. 3, with a table top 10 The state in which the irradiated object 5 composed of the substrate is carried, the table 1 〇 is aligned by the moving device 20 with respect to the pulsed laser 4 from the laser oscillating device 1 in a specific direction X (the X-axis direction of the scan) In addition, the table 10 is actually moved back and forth in a specific direction X. 0 The laser oscillating device 1 is fixed to the base 22 as shown in Fig. 4(a), so that the pulse laser is generated. Molecular laser (exci Mer laser), and directs the generated laser light A 1 to the optical machine 9' containing the grating 21 and the objective lens 3', and then redirects the mirror 7 through the long axis homogenizer 2a and the short axis After the equalizer 2b is shaped to equalize the intensity, the mirror 8 is used to switch the direction and the pulsed laser 4 formed by the square light (1 inebeam) is formed by the grating 2 1 and the objective lens 3 to illuminate the light. -11 - 1259549 (7) Shadowing and imaging are carried on the object 5 to be irradiated on the table top 1. The grating 2 1 and the objective lens 3 are aligned with each other at a predetermined interval, and the optical axis and the object to be irradiated 5 are fixed. The irradiated surface is orthogonal to each other. The irradiated object 5 is disposed in a vacuum chamber of the laser annealing apparatus. The irradiated object 5 is formed as a thin a-Si (amorphous crucible) film on the glass substrate 6 as shown in FIG. 5a, and by irradiating the pulsed laser 4 on the amorphous ruthenium film 5a, the amorphous ruthenium film 5a is crystallized into a thin ruthenium film 5b. The irradiation method is to move the mesa 10 0 back and forth, generally to pulse laser 4 The entire width of the specific direction X of the object 5 to be irradiated. In fact, the table 10 is then displaced to The orientation of the specific direction X is orthogonal, and the entire surface of the object 5 to be illuminated is irradiated with the pulsed laser 4 by irradiating the entire width of the specific direction X of the object 5 with the pulsed laser 4, and the entire surface is replaced to reach a specific number of times of irradiation. The object 5 to be irradiated (10 to 20 times) sequentially irradiates the irradiated object 5 with a pulsed laser 4. The moving device 20 specifically has the X-axis servo 55 shown in Fig. 3. That is, the servo motor 40 is provided. Due to the forward and reverse rotation of the servo motor 40, the table 1 is moved intermittently or continuously at each specific interval by a ball screw mechanism (ba 11 screw). The servo motor 40 of the mobile device 20 is driven by the servo control device 60 according to the drive signal R4 shown in FIG. 3, and is stopped when the drive signal R4 minus the movement signal Zn becomes zero, and the table 1 and the object 5 are also irradiated. stop. Actually, 5, the servo motor 40 is driven to be reflected, and when the movement signal Zn is subtracted from the drive signal R 4 to zero, the tablen 丨〇 and the object 5 are also stopped. Due to this repetitive motion, the irradiated object 5 on the mesa 1 is relatively moved back and forth in the specific direction X with respect to the pulsed laser 4 from the laser oscillation device 1. Therefore, the distance meter 3 1 described in the following -12-1259549 (8) is actually disposed at the irradiation position of the pulsed laser 4 on the irradiated object 5, that is, symmetrically disposed on the optical axis of the grating and the objective lens 3 to The table top 1 is in the direction of the front and rear sides. The moving signal Ζ η detects the number of rotations (rotation angle) of the servo motor 40 by a rotary encoder (R ◦ taryencqde 1·) 4 1 , and calculates the detection pulse by the first counter 42 , and the movement length of the table 10 becomes A pulse signal is obtained at a specific time. Therefore, the moving signal Zn corresponds to the specific moving length of the mesa 1 在 at each pulse. Due to the X-axis servo 55, the specific speed of moving from the right to the left side of the table 1 in Fig. 2 is about 100 to 800 mm/sec. The intermittently irradiated pulsed laser 4 is, for example, 50 to 1,000 times per second, and has a light-emitting time of about 2 nanoseconds (nsec) to 1 μsec. Since the time during which the pulsed laser 4 emits light is very short compared to the moving speed of the table top, even if the table top is continuously moved, the first counter 4 2 which is disposed at the position of the X-axis servo 5 to indicate the specific direction X is used. The pulsed laser 4 can also be illuminated at equal intervals. That is, it is practically unnecessary to temporarily stop the intermittent irradiation of each of the places to be irradiated by the servo motor 4 〇, and the irradiation can be performed without any problem. The movement signal Ζη is counted by the second counter 43, and when the count 値1/Ν1, it is used as the movement time of the specific interval of the mesa 10, and the signal I of the oscillation pulse laser 4 is output, and The signal I drives the laser oscillating device 1 to illuminate the pulsed laser 4. Therefore, the pulsed laser 4 can be sequentially irradiated to the irradiated object 5 on the mesa 10 at a specific interval distance and position. Then, as shown in FIG. 1, the outer-lower drive unit 30, the distance meter 3 1, the basic control unit setting means 32, the first calculation means 33, the delay means 34, and the -13259549 (9) means and the second means are provided. Calculation means 36. The lifting drive device 30 has a function of lifting and lowering the moving table 10 for the laser oscillating device 1, and the grating 2 1 and the objective lens 3, and is driven by the servo motor 3 6 driven by the forward and reverse rotation as shown in FIG. The lever mechanism 37 drives the first tilt block 38 forward and backward in the horizontal direction. As a result, the second inclined pulleys 39 that are attached to the first inclined block 38 by the inclined surface are lifted and lowered. Therefore, the table top 1 that is integrated with the second inclined block also moves up and down. The third tilting pulley 38 is supported to be slidable on the side of the base 22 so as to be horizontally movable, and the table 1 is supported to be slidable on the side of the base 22 in the up and down direction. As shown in FIG. 2, the distance meter 3 1 is disposed on the base 22 side of the irradiation position of the laser beam 4 of the object 5 to be irradiated on the table top 1 at a position corresponding to the direction of the mesa 10 at a specific distance L. Next to the laser oscillation device 1, the distance h from the irradiation surface of the pulsed laser 4 of the object 5 to be irradiated is measured. The distance h measured by the distance meter 31 is located parallel to the optical axis of the pulsed laser 4 irradiated to the object 5 after passing through the grating 21 and the objective lens 3. Using the distance meter 3, the distance h between the irradiated object 5 and the irradiation surface of the pulsed laser 4 is sequentially measured at a specific interval, and the detected 値hn is sequentially output. The basic control unit setting means 32, the delay means 34, and the first arithmetic means 33' means the memory means 35 and the second arithmetic means 36 are constituted by a microcomputer. The basic control unit setting means 32 outputs a basic control 对应 corresponding to the proper distance between the object 5 to be irradiated on the mesa 1 of the uniform thickness and the objective lens 3 when the surface of the object 5 is a surface having no unevenness. That is, the basic control 値 is the position setting of the initial state of the irradiated object 5 on the mesa 10 when the grating 2 1 is placed on the upper surface of the object 5, and it is not necessary to change it once. The -14 - 1259549 (10) The proper distance between the illuminated surface of the pulsed laser 4 of the irradiated object 5 and the objective lens 3 corresponds to the appropriate distance measured by the distance meter 3丨. The delay means 34 re-outputs the specific distance L described above only for a specific time required for the movement of the table top 10. However, the delay means 34 may be set to be outputted to the elevation drive unit 30 only by delaying the control time 5 described later by a specific time. Therefore, the delay means 34 may be disposed between the second calculation means 36 and the elevation drive means 30. The first calculation means 33 uses Η - 1ιη = Δ η to obtain the basic control 値 setting difference 値 Δ between the basic control 设定 set by the hand 3 2 and the detection 値 hn of the distance meter 3 1 and outputs the difference 値 Δ η. The memory means 35 sequentially stores the difference 値 Δ η 1 obtained in the previous calculation by the first calculation means 33. The second calculation means 3 6 uses Δ η -( Δ η - 1) = 6 to calculate the difference 値 Δ η -1 obtained before the memory means 3 5 and the difference between the subsequent difference 値 Δ η The control difference δ. Then, the elevation driving device 3 is driven in accordance with the control difference 5, and the distance between the grating 2 1 and the objective lens 3 is kept constant, and the irradiated object 5 and the pulsed laser 4 carried on the mesa 1 are irradiated. The distance h of the surface, even the distance between the objective lens 3 and the illuminated object 5 carried on the mesa 10 and the illuminated surface of the pulsed laser 4 is controlled to be appropriate. The specific configuration of the irradiation distance automatic adjusting device will be described with reference to FIG. The irradiation distance automatic adjustment device includes a Z-axis servo 56 that drives the first FIFO (first in first out) memory 45 and the second FIF memory 46, and drives the mesa i to the vertical direction. Distance meter 31. The FIFO memory 45, 4 6 is also called the field image (e1 dimagemem 〇ry), and the -15 - 1259549 (11) is used to store and retrieve data, and the oldest data can be stored in the order of storage. Remove the memory. In the signal processing unit 57 using the FIFO unit 45, 46, the movement signal Zn is calculated in advance by the third counter 44, and the pulse signal J is output every time the count becomes 1/N 2 , and the pulse signal is output. At time J, the signal processing unit 57 starts the operation and performs the calculation of the FIFO memory 45, 46 and the like. Therefore, the pulse signal J is generated in accordance with the drive signal R 4 . Here, if the table 10 is moved to a specific direction X (X-axis direction) by the moving device 20, a pulse of the movement signal Zn is generated, and the movement distance of the table 10 per pulse (P) is about 0.01 to 10 μm/P. . For example, the case where the moving signal Zn is lym/P is taken as an example. The second counter 43 calculates the number of pulses of the mobile signal Ζη and outputs a pulse signal I to the laser oscillation device 1 at each Ν1 count to generate a pulse laser 4. In the specific example, Ν 1 is 1000 and pulse laser 4 is irradiated every 1 mm interval. On the other hand, the third counter 44 outputs a pulse signal every N counts, and when the pulse signal J is output, the calculation by the signal processing unit 57 is performed. In general, the number of stages of the first FIFO memory 45 (four stages in the first FIFO memory of FIG. 3) is set to Μ, and if the distance Lmm of FIG. 2 is used, the first FIFO memory 45 is used every L/M mm. The detection 値hn of the distance meter 31 is calculated as 1, and the detection 距离 of the distance meter 3 1 can be calculated by delaying only the time required for the table 1 to move the specific distance L. Therefore, if 计 of the count N 2 of the third counter 44 is set to L/M/1 μ m, the drive device 30 is driven to rise and fall with the movement of the table 10 . If the enthalpy of N2 is set to be the same as Ν 1, the illuminance of the laser 4 can be matched to the driving of the lifting device according to the distance meter 3 値 - hn -16 - 1259549 (12). However, it is not necessary to cooperate with the illumination of the pulsed laser 4 for lifting and lowering. The first FIFO memory 45 is input to the detection 値hn of the distance meter 3 1 every time a certain time (every N2 count), and the 値 is sequentially moved to Μ 1, M2, M3, Μ 4, detection 値 hn is only delayed by a certain period and output by Μ4. Therefore, the function of the first FIFO memory 45 is a delay means 34 for delaying the detection of the distance meter 31 by only delaying the time required for the mesa 10 to move by the specific distance L described above. However, the detection 値h η of the distance meter 3 1 later becomes the control difference ,6, and the effect is the same even if the control lag is delayed (5 delays only the time required for the table 1 〇 to move the specific distance L described above). The detection 値 hn of the FIFO memory 45 is taken up until the first calculation means 33 shown in FIG. 3, and the difference 値 Δ η between the basic control 输出 outputted by the basic control setting means 32 and the detection 値 hn of the detection 値 hn is sequentially determined. The second FIFO memory 46 sequentially stores the difference 値 Δ η outputted by the first calculation means 33 and stores it. Then, when the next pulse signal is output, the first FIF0 memory 45 is obtained. The difference 値 η between the detection 値 hn of the output distance meter 31 and the basic control ,, the difference 値 Δ η is stored, stored in the second FIF0 memory 46, and bypasses the second FIF0 memory 46 to reach the map. The second calculation means 36 shown in Fig. 3. In the second calculation means 36, the control difference formed by the difference between the difference 値 Δ η - 1 of the second time and the difference Δ Δ of the current time is taken out by the second FIF0 memory 46. δ is obtained as (Δ η - 1) = δ. Therefore, the second FIF0 memory 46 has a function for recording The difference Δ η · 1 is the function of the memory means 3 5. The control difference (5 is input to the spindle servo 56. The spindle servo 56 is provided with -17 - 1259549 (13) servo motor 36, The servo motor 36 is rotated forward and backward, and the table 10 is moved up and down through the ball screw mechanism 37 shown in Fig. 2. The servo motor 36 of the Z-axis servo 56 is controlled according to the control factor 5 shown in Fig. 3. The servo drive device 6 1 controls the side drive, and stops when the control signal difference 値 (5 minus the lift movement signal Zn becomes zero, and the table 1 〇 and the object 5 are also stopped. The lift movement signal Zn2 The number of rotations (rotation angle) of the servo motor 36 is detected by a rotary encoder 51, and the detection pulse is calculated by the fourth counter 52, and is obtained every time the lifting and lowering movement length of the table 10 becomes a specific enthalpy. Therefore, the lifting and lowering movement signal Zn2 corresponds to the specific lifting and lowering length of the table 10 at each pulse. Next, the action of the above-described first embodiment will be described. Initially, the basic control setting means 3 2 is set. Basic control 値η, The distance between the object 5 to be irradiated on the mesa 10 and the objective lens 3 is in an appropriate state with respect to the plurality of objects 5 having the same basic thickness. Therefore, the height position of the distance meter 31 is at an appropriate distance h. The state is measured by the distance h from the left end of the irradiated object 5 in Fig. 2. Then, according to the driving signal R 4 , the mobile device 2 is driven by the servo control device 60 as described above, and is carried on the mesa; The irradiated object 5 is moved to the left on the top of the figure, and at the same time, the laser oscillating device i is driven by the signal I to illuminate the pulsed laser 4. Since the distance meter 3 1 is measured by the distance Η from the left end of the object 5 to be irradiated, the pulse laser 4 is started and irradiated only by the left end of the object 5 from the position of the distance L. On the other hand, the distance h between the irradiated object 5 and the irradiation surface of the pulsed laser 4 is sequentially measured at a specific interval, and the detection 値 hn is delayed by the delay means 34 in the order of only 18 - 1259549 (14), and the late stage 1 is moved to the above specific The time required for the distance L is output and input to the first calculation means 3 3 ', and the basic control from the basic control setting means is input to the first calculation means 33. The first calculation means 3 3, when the detection 値h η is generated, the difference between the basic control 値η and the detection 値h η is sequentially obtained.
An。 該差値△ η依次被記憶於記憶手段3 5中，同時進入第2 演算手段3 6 ’而在第2演算手段3 6依次計算由記憶手段3 5 得到之則所求得之差値△ η - 1與其次求得之差値△ ^之差所 構成之控制差値5 (△ η- (△ η- 1) = 5。 然後’依據逐次求得之控制差値6，依次驅動升降驅 動裝置3 0 ’相對於雷射振盪裝置1，光柵2 i與物鏡3升降移 動台面1 〇，並使脈衝雷射4之照射時之被照射物5之照射面 之高度位置與基本控制値Η所定恰當高度相一致。另方面 ’被照射物5之照射面形成凸部，當差値△ η爲正値時，利 用升降驅動裝置3 0將台面1 0相對於光柵2 i與物鏡3下降移 動，使脈衝雷射4之照射時的被照射物5之照射面的高度位 置與基本控制値Η所定之恰當高度相一致。如此一來，被 照射物5之照射面之高度位對光柵2 i與物鏡3可以在恰當的 狀態下繼續照射脈衝雷射。 其次，要就距離計3 1之檢測値h n被輸入圖3所示之 FI F Ο記憶體4 5之情形加以說明。此時，利用距離計3 1測定 被照射物5與脈衝雷射4之情形加以說明。此時，利用距離 計3 1測定被照射物5與脈衝雷射4之照射面之距離h，而在 輸出脈衝信號J時，檢測値hn依次依輸入信號處理部57之 -19· 1259549 (15) 第1. F IF 0記憶體4 5，同時進行利用F I F〇記憶體4 5，4 6之計 算。亦即，一.邊將檢測値h η依次輸入延遲手段3 3之第 1 FIFO記憶體45，一邊台面10與被照射物5開始移動，與第 5次之檢測値h η之輸入的同時，在第1 F I F〇記憶體4 5被輸出 第1次被輸入之檢測値h η。該延遲之檢測値h η到達演算手 段3 3而得到基本控制値設定手段3 2之基本控制値Η ’俾演 算其差値△ η。該差値A η被記憶於記憶手段35之第2FIFO 記憶體4 6。 接著，在下一個脈衝信號J被輸出時，除了由第1FIFO 記億體45輸出下一個檢測値hn之外，被記憶於第2FIFO記 憶體4 6之差値△ η即進入第2演算手段3 6做爲前面所求得之 差値△ 1，而在第2演算手段36計算由第2FIF0記憶體46 所得之上次差値△ η- 1與此次差値△ η之差所構成之控制差 値 5 (Δη- (Δη- 1) =〇 )。 根據該控制差値5，升降驅動裝置3 0被驅動，並使台 面1 0對雷射振盪裝置1 ’光柵2 1與物鏡3相對升降移動，一 邊恰當控制台面1 〇上之被照射物5之照射部分之高度，一 邊照射脈衝雷射4。 藉此’將光柵2 1與物鏡3之間隔保持固定，並藉由相 對地變更被照射物：> 之位置以調整與修正物鏡3到被照射物 5之距離。如此一來’即可藉由物鏡3正確地將光栅21之像 成像於被照射物：> 上面。而且，可以將距離計3 i離開光柵 3 1與物鏡3之光軸配置’且始終將光軸上之物鏡3到被照物 ：>之成像面（照射面）之距離控制於固定。 -20 - 1259549 (16) 惟在上述一實施形態中，係利用移動裝置20使台面1 〇 對來自雷射振盪裝置1之脈衝雷射4移動於水平上特定方向 X ’但是也可以將雷射振盪裝置1，光學儀器9，光柵2 1與 物鏡3結成一體移動至反特定方向X以代替移動台面1 〇。 另外，實施形態中，利用升降驅動裝置30使台面10對雷射 振盪裝置1，光學機器9，光柵2 1與物鏡3升降移動，惟也 可以將雷射振盪裝置1，光學儀器9，光柵2 1與物鏡3結成 一體升降移動。 [發明之效果] 由以上說明可知，利用本發明之照射距離自動調整方 法與其裝置可以扮演下面的效果。 在一邊移動被照射物一邊照射雷射時，一邊在離開脈 衝雷射之光軸之位置設置距離計並將光柵與物鏡之間隔保 持固定，一邊相對地變更被照射物之位置，即可調整，修 正由物鏡到被照射物之照射面爲止之距離成恰當與固定， 並以物鏡將光柵之像正確地成像（於被照射物）上。其結 果是可以將雷射正確地照射於被照射物而製得局品質的產 品。 【圖式簡單說明】 圖1爲表示本發明之一實施形態有關之照射距離自動 調整裝置之構成要件之圖。 圖2爲表示相同圖中重要部分之圖。 -21 - 1259549An. The difference Δ η is sequentially stored in the memory means 35, and simultaneously enters the second calculation means 3 6 ', and the difference 値 Δ η obtained by the memory means 3 5 is sequentially calculated in the second calculation means 36. - 1 is the difference between the difference 値 求 ^ and the control difference 値 5 (△ η - (△ η - 1) = 5. Then, based on the control difference 値6 obtained successively, the lifting drive is driven in sequence. 3 0 ' With respect to the laser oscillating device 1, the grating 2 i and the objective lens 3 are moved up and down by 1 〇, and the height position of the illuminated surface of the irradiated object 5 at the time of irradiation of the pulsed laser 4 is appropriately determined. The height is the same. On the other hand, the irradiated surface of the irradiated object 5 forms a convex portion, and when the difference Δ η is positive, the table 10 is moved downward relative to the grating 2 i and the objective lens 3 by the elevation driving device 30 to make a pulse. The height position of the illuminated surface of the irradiated object 5 at the time of irradiation of the laser 4 coincides with the appropriate height determined by the basic control 。. Thus, the height of the illuminated surface of the irradiated object 5 is opposite to the grating 2 i and the objective lens 3 It is possible to continue to illuminate the pulsed laser in an appropriate state. The case where the detection 値hn of the distance meter 31 is input to the FI F Ο memory 4 shown in Fig. 3 will be described. In this case, the case where the object 5 and the pulse laser 4 are measured by the distance meter 31 will be described. At this time, the distance h between the irradiated object 5 and the irradiation surface of the pulsed laser 4 is measured by the distance meter 31, and when the pulse signal J is output, the detected 値hn is sequentially subjected to the input signal processing unit 57 of -19·1259549 (15). The first F IF 0 memory 4 5 is simultaneously calculated by using the FIF 〇 memory 4 5, 4 6 , that is, the first FIFO memory is sequentially input to the detection 値 h η into the delay means 3 3 . 45, while the table top 10 and the object 5 are moved, and the input of the fifth detection 値h η is input, the first FIF memory 4 is outputted with the detection 値h η input for the first time. The detection of the delay 値h η reaches the calculation means 3 3 to obtain the basic control 値 setting means 3 2 basic control 値Η '俾 calculus the difference 値 η. The difference 値A η is stored in the second FIFO memory of the memory means 35 4 6. Next, when the next pulse signal J is output, the next one is output by the first FIFO. In addition to detecting 値hn, the difference 値Δη stored in the second FIFO memory 46 is entered into the second calculation means 36 as the difference ΔΔ1 obtained in the foregoing, and is calculated by the second calculation means 36. 2FIF0 memory 46 The control difference 値5 (Δη - (Δη - 1) = 〇) formed by the difference between the upper difference 値 Δ η 1 and the difference Δ η. According to the control difference , 5, the lift The driving device 30 is driven, and the table 10 is moved up and down with respect to the laser oscillating device 1 'grating 2 1 and the objective lens 3, and the pulse is irradiated while the height of the irradiated portion of the irradiated object 5 on the appropriate console surface 1 is oscillated. Laser 4. Thereby, the interval between the grating 2 1 and the objective lens 3 is kept fixed, and the position of the irradiated object: > is relatively changed to adjust the distance from the correction objective lens 3 to the object 5 to be irradiated. In this way, the image of the grating 21 can be correctly imaged by the objective lens 3 on the object to be irradiated: > Further, the distance meter 3 i can be separated from the optical axis arrangement of the grating 3 1 and the objective lens 3 and the distance between the objective lens 3 on the optical axis and the imaging surface (irradiation surface) of the object to be illuminated can be controlled to be fixed. -20 - 1259549 (16) In the above-described embodiment, the moving device 20 is used to move the pulsed laser 4 from the laser oscillating device 1 to the horizontally specific direction X' by the moving device 20, but the laser can also be used. The oscillating device 1, the optical instrument 9, the grating 2 1 and the objective lens 3 are integrally moved to the opposite specific direction X instead of the moving table 1 〇. Further, in the embodiment, the table 10 is moved up and down by the elevation drive device 30, the optical device 9, the grating 2 1 and the objective lens 3, but the laser oscillation device 1, the optical device 9, and the grating 2 may be used. 1 is integrated with the objective lens 3 to move up and down. [Effects of the Invention] As apparent from the above description, the automatic adjustment method of the irradiation distance of the present invention and the apparatus thereof can exert the following effects. When the laser beam is irradiated while moving the object to be irradiated, the distance meter is placed at a position away from the optical axis of the pulse laser, and the distance between the grating and the objective lens is fixed, and the position of the object to be irradiated is relatively changed, thereby being adjusted. Correct the distance from the objective lens to the illuminated surface of the object to be illuminated to be appropriate and fixed, and correctly image the image of the grating (on the object to be irradiated) with the objective lens. As a result, it is possible to accurately irradiate the irradiated object with the irradiated object to obtain a quality product. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a view showing the components of an automatic irradiation distance adjusting device according to an embodiment of the present invention. Fig. 2 is a view showing an important part in the same figure. -21 - 1259549
連貫而得之構造之圖。 5台面移動之X軸伺服，使照射 z軸伺服及雷射振盪裝置之驅動 圖4爲表示相同圖中將來自雷射振 照射於台面上之被照射物之狀態，甲 盪裝置之脈衝雷射 照射於 (甲）爲正面圖，（2) 爲右側面圖。 前之物鏡與被照射物在光軸上 圖5爲表示用於計測先前 之距離的裝置之正面圖。 圖6爲表示相同圖中以測定器接受之光的形狀之圖。 【主要元件對照表】 ··雷射振盪裝置 被照射物，1 0...... 物鏡，4......脈衝雷射， 1〇......台面，20......移動裝置，21..... 光柵，3 〇......升降驅動裝置，3 1……距離計，3 2......基本 控制設定手段，3 3……第丨演算手段，3 4……延遲手段， 35......記憶手段，36……第2演算手段，45……第1FIF0記 憶體’ 46......第2之FIFO記憶體，H-基本控制値，h… …距離，hn-檢測値，L ......特定距離，X ......特定方 向 占......控制差値，△ η ......差値，△ ω -. 1……前面 求得之差値。A diagram of a consistent structure. 5 X-axis servos for moving the table, driving the z-axis servo and the laser oscillating device. FIG. 4 is a pulsed laser showing the state of the irradiated object from the laser beam on the table surface in the same figure. Irradiation (A) is the front view, and (2) is the right side view. The front objective lens and the object to be illuminated are on the optical axis. Fig. 5 is a front view showing the means for measuring the previous distance. Fig. 6 is a view showing the shape of light received by a measuring device in the same drawing. [Main component comparison table] · · Laser oscillating device is irradiated, 1 0... objective lens, 4...pulse laser, 1 〇... countertop, 20.. ....mobile device, 21..... grating, 3 〇... lifting drive, 3 1... distance meter, 3 2... basic control setting means, 3 3... ...the third calculus, 3 4...delay means, 35...memory means,36...the second calculus,45...the 1st FIF0 memory' 46...the 2nd FIFO Memory, H-basic control 値, h... distance, hn-detection 値, L ...... specific distance, X ... specific direction occupies ... control difference, △ η ...... 値, △ ω -. 1...... The difference obtained before.