TW492132B - Semiconductor manufacturing apparatus with an improved wafer cassette - Google Patents

Semiconductor manufacturing apparatus with an improved wafer cassette Download PDF

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Publication number
TW492132B
TW492132B TW090103681A TW90103681A TW492132B TW 492132 B TW492132 B TW 492132B TW 090103681 A TW090103681 A TW 090103681A TW 90103681 A TW90103681 A TW 90103681A TW 492132 B TW492132 B TW 492132B
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Taiwan
Prior art keywords
wafer
wafer tray
tray
patent application
adjacent
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TW090103681A
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Chinese (zh)
Inventor
Takashi Kyouno
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Nippon Electric Co
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6732Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67346Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders characterized by being specially adapted for supporting a single substrate or by comprising a stack of such individual supports

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The first present invention provides a wafer cassette mechanism comprising: a plurality of wafer tray sets, each set storing a single semiconductor wafer; a supporting mechanism for mechanically supporting the wafer tray sets which are laminated together with each other, and so that adjacent two of the wafer tray sets are in contact directly with each other, the supporting mechanism adjusting level of the laminated wafer trays; and a locking mechanism for locking selected ones of the wafer tray sets so that a target one of the wafer trays is distanced from adjacent underlying and overlying ones of the wafer tray sets.

Description

I _ 492132 五、發明說明Ο) 【發明背景J 、. 本發明乃是與用以處理半導體晶圖的半導體製邊=備 有關,尤有闕於作為移送半導體晶圓用途的晶圓輸^部 份0 m日日圓。供ρ 王1 &円與拾;兰人+1、 的晶圓輸送龛1、22之間,由晶圓輪送機衬、:載置台21 -半導體晶圓的工作。而輸送室丨4中有一曰/31負責移送 1 5,用以在載互鎖真空室1 2與處理室丨3 g圓輸送機械臂 此間移送半導體晶圓。加載互鎖真空室,,處理室1 3彼 臂3 1相接的邊界處各自裝配有一第一閘闕了曰曰圓輸送機械 室14端的邊界處亦各自有一第二閘閥。^每而另外與輪送 用以處料導體晶圓之習知f導艘製造设備之概略平 面圖顯示於圖1中。在習知的半導體製造設備裡二包含用 於處理半導體裝置的一主體11、上方置有容納半導體晶圓 之晶圓輸送盒2 2的一輸送盒載置台21,以及將半導體晶圓 於主體11與輸送盒載置台之間移送的一晶圓輸送機械臂 31。此外主體11更包含經由晶圓輸送機械臂31而連接到輪 送盒載置台旦具有隔'纟巴本體11與外界空氣作用的兩加载互 鎖真空室12、執行半導體裝置製造的五個處理室13,以及 緊鄰兩加載立鎖真空至12而與輸送盒載置台21相隔、且盥 注入13相速的單一輸迗室14,藉此使得處理室13盥雨Λ二 互鎖真空室12可經由輸送室14而彼此連通。在個二二載 鎖真空室1 2中設置一晶圓輪送盒1,以便於暫日士 σ载互 體晶圓。位在兩加載互鎖真空室12内盘輪、令存放半導 盒1、22之間,由晶圓輪这;益载置台21上 五、發明說明(2) 封住各個加載互鎖直* 用。 …二 處理室13與輸送室14的作 接下來藉著上述的習 體晶圓的處理流程。一㊄'製造設備,來說明半導 二台21上的晶圓輸送盒22内部放在輸送盒載 輸送盒載置台21上的晶圓輸送^曰曰囫輸送機械臂31從 並存放到加載互鎖真办二 ’將半導體晶圓移送 送室“中的晶圓輪送;置15:=圓輸送盒1内。然後輸 中的晶圓輪送盒丨之半導 X將位於加载互鎖真空室12 讓半導體晶圓進行如7ΛθθΛ移^到處/里室13内,藉此 程。隨後晶圓輸送機械臂7相沉積等預定的製 -種製程的處理室13 :=導=圓移送到另 送裝置15將輪送室14内經畢後,晶圓輸 裝置3心:ΐ 2中的晶圓輸送盒1。然後晶圓輸送 曰圓游、^ί ^、、,&鎖真空室12中的晶圓輸送盒1將半導體 =箱—=。=迗盒載置台21上的晶圓輸送盒22之中。在進 "I疋^程前,將加載互鎖真空室12與處理室13的閘閥關 =以於讓輸送室14、加載互鎖真空室12與處理室13能 夠處於各自獨立的真空狀態。而製程完畢後,即解除加載 互鎖真工至1 2的真空狀態,以便於將位於加載互鎖真空室 1 2、中的晶圓輸送盒丨之經完全處理過之半導體晶圓移送到 ΐ送ί載置台21上的晶圓輸送盒22之中。如圖1所示之半 ,,製造設備中,位於加載互鎖真空室1 2内的習知晶圓輸 迗盒之概略圖表示於圖2Α上。而圖2Β則為圖2Α中、以橢圓 五、發明說明(3)I _492132 V. Description of the invention 0) [Background of the invention J. The present invention is related to semiconductor edge processing for processing semiconductor crystal patterns, and is particularly useful as a wafer transfer unit for transferring semiconductor wafers. For 0 m yen. For ρ Wang 1 & 円 and ;; Lan Ren +1, wafer transfer 龛 1, 22, wafer lining, wafer carrier: mounting table 21-semiconductor wafer work. And one of the transfer chambers 4/31 is responsible for transferring 15, which is used to transfer semiconductor wafers between the carrier interlocking vacuum chamber 12 and the processing chamber 3g circular transfer robot arms. The load interlocking vacuum chamber is equipped with a first gate at the boundary where the processing chamber 13 and the arm 31 are in contact with each other, and a second gate valve at the boundary of the end of the round conveying machine chamber 14 respectively. ^ A schematic plan view of a conventional guide ship manufacturing facility for processing conductor wafers separately and in turn is shown in FIG. 1. In the conventional semiconductor manufacturing equipment, two include a main body 11 for processing semiconductor devices, a transport box mounting table 21 on which a wafer transport box 22 for storing semiconductor wafers is placed, and semiconductor wafers on the main body 11. A wafer transfer robot arm 31 is transferred between the wafer transfer platform and the cassette mounting table. In addition, the main body 11 further includes a two-load interlocking vacuum chamber 12 that is connected to the carousel box via a wafer transfer robot arm 31 and has a function of isolating the main body 11 from outside air, and five processing chambers that perform semiconductor device manufacturing. 13 and a single delivery chamber 14 which is adjacent to the two loading vertical lock vacuums to 12 and is separated from the conveying box mounting table 21 and is filled with a 13-phase speed, thereby allowing the processing chamber 13 to be cleaned by the two interlocking vacuum chambers 12 The conveyance chambers 14 communicate with each other. A wafer carousel 1 is provided in each of the two-load-locking vacuum chambers 12 to facilitate the loading of the inter-wafer wafer. It is located between the inner wheel of the two loading interlocking vacuum chambers 12 and the storage semiconducting boxes 1, 22 by the wafer wheel; on the benefit mounting table 21 5. Description of the invention (2) Sealing each loading interlocking directly * . … 2 The work of the processing chamber 13 and the transfer chamber 14 Next, the above-mentioned processing flow of the custom wafer is used. A “manufacturing equipment” to explain the wafer conveyance inside the wafer conveyance box 22 on the two semiconducting tables 21 placed on the conveyance box carrying conveying box placing table 21 The lock really does two: the wafers in the "Semiconductor wafer transfer chamber" will be rotated; set 15: = in the round transport box 1. Then the semiconducting X of the wafer transport box in transit will be located in the loading interlock vacuum The chamber 12 allows the semiconductor wafer to be moved to the inside / inside chamber 13 such as 7ΛθθΛ. This process is then performed by the wafer conveying robot 7-phase deposition and other processing chambers 13 of a predetermined manufacturing process: = guide = circular transfer to another After the feeding device 15 passes the inside of the carousel 14, the wafer conveying device 3 is centered on the wafer conveying box 1 in ΐ 2. Then the wafer conveying is described as "Yuanyou", ^ ί ^ ,, & lock vacuum chamber 12 In the wafer transfer box 1 in the middle, the semiconductor = box — =. = 迗 is placed in the wafer transfer box 22 on the cassette mounting table 21. Before entering the “I” process, the interlocking vacuum chamber 12 and the processing chamber will be loaded. The gate valve of 13 is closed so that the conveying chamber 14, the loading interlocking vacuum chamber 12, and the processing chamber 13 can be in separate vacuum states. After the process is completed, the addition is canceled. Load the interlock to the vacuum state of 12 to facilitate the transfer of the fully processed semiconductor wafers from the wafer transfer box 丨 in the load interlock vacuum chamber 12 to the transfer stage 21 Among the wafer transfer boxes 22. As shown in the half of FIG. 1, in the manufacturing equipment, a schematic diagram of a conventional wafer transfer box located in the load-locking vacuum chamber 12 is shown in FIG. 2A. And FIG. 2B is In Figure 2A, the ellipse V. Description of the invention (3)

形虛線所標示之『A 晶圓輸送盒的收納溝』進刀的局部放大圖,其中針對習知 作為存放半導體晶圓41二。☆晶圓輸送盒lb中的-對 可以利用驅動馬達4將a於托盤8具有複數個收納溝9。 的收納溝9即能夠達到;;升降,如此-來成對 部取出所預定的高度位置'體日a圓41存放至内部或自内 ^ ^. ..ο „ ^ ^ ^ ^ ., u , , ^1 j m以』排成一行。而且晶圓 因]t : w田t間距『P2』係刻意設計地較寬,以便於避免 =利用日日圓輸送機械们5與31移送半導體晶㈣時的 =確性,使得半導體晶圓41與晶圓輸送盒lb碰撞並產生機 升、性知傷。然而這樣的設計必須加大晶圓輸送盒丨b的尺 =,同時也得讓加載互鎖真空室丨2的體積增加。因此勢必 得耗費更長的時間以達到真空狀態與進行晶圓批量的 理。 倘若為了要避免上述問題以達到晶圓輪送盒丨b縮小 化、加載互鎖真空室1 2的體積降低,以及為了抽真空的時 間縮短等目的,而將晶圓輸送盒lb中的間距『P2』窄化, 則會使得晶圓輸送機械臂1 5與31定位時可接受的準確度範 圍也縮小。 由於上述狀況,因此需要研發出具有排除上述問題之 改良型晶圓輸送盒的新穎之半導體製造設備。A partial enlarged view of the feeding of the "A-groove of the wafer transport box" indicated by the dotted line, in which conventional semiconductor wafers are stored as the second one. ☆-Pairs in the wafer conveyance box lb The drive motor 4 can be used to have a plurality of storage grooves 9 on the tray 8. The storage groove 9 can be reached; lifting, so-to take out the predetermined height position in pairs, 'body day a circle 41 stored inside or from inside ^ ^. ..Ο „^ ^ ^ ^., U, , ^ 1 jm is lined with ". And the wafer is] t: w t t-pitch" P2 "is deliberately designed to be wide, in order to avoid = when the semiconductor wafers are transferred by 5 and 31 yen transport machinery = Certainty, which causes the semiconductor wafer 41 to collide with the wafer transfer box lb and cause machine lift and sexual damage. However, such a design must increase the size of the wafer transfer box 丨 b =, and at the same time, the loading interlocking vacuum chamber must be allowed丨 2 increases in volume. Therefore, it will take longer to reach the vacuum state and the wafer batch process. If you want to avoid the above problems to reach the wafer carousel 丨 b shrink, load the interlocking vacuum chamber 1 The reduction of the volume of 2 and the narrowing of the distance "P2" in the wafer transfer box lb for the purpose of shortening the evacuation time will make the wafer transfer robot arms 15 and 31 acceptable in positioning accuracy. The scope is also narrowing. Due to the above situation, it is necessary to develop Novel semiconductor manufacturing equipment of the improved wafer transfer cassette described above.

努明概述】 所以 改良细曰^ Θ之一目的是提供一種具有排除上述問題之 :圓輸送盒的新穎之半導體製造設備。 的收納漢: 一目的是提供一種具有小尺寸與間距窄化 備。/結構之改良型晶圓輸送盒的新穎之半導體製遠誤 +發明之另一 送盒。 之又另 穎之晶圓輪 本發明 化的收納溝 本發明 可於各組内 來將彼此間 起以便於兩 用該支撐機 拴鎖選定之 上下相鄰之 以上所 後續的說明 目的是提供一種具有排除上述問題么 結構之新 第一個實 存放單一 層疊在一 相鄰者能 構調整層 晶圓托盤 晶圓托盤 提及關於 中呈現出 目的是 穎之晶 施態樣 半導體 起的晶 夠直接 疊之晶 組以便 組離開 本發明 來0 提供'~ 圓輸送 提供的 晶圓的 圓托盤 互相接 圓托盤 於讓一 的一栓 的目的 種具有小尺寸與間 盒。 晶圓輸送盒機構包 複數個晶圓托盤組 組以機械化方式/ 觸的一支撐機構, 的高度位置,以及 才示的之晶圓托盤能 鎖機構。 、特性與優點等將 新 Ψ 含·#擭 用來 夠與 I在Summary of Numing] Therefore, one of the objectives of the improvement ^ Θ is to provide a novel semiconductor manufacturing equipment with a round conveying box that eliminates the above problems. Receptacle: One purpose is to provide a device with small size and narrow pitch. / The structure of the improved wafer transfer box is a novel semiconductor manufacturing error + another invention of the transfer box. In addition, the wafer wheel of the present invention is a storage groove. The present invention can be used to lift each other in each group so that the support machine can be used to lock the selected upper and lower adjacent ones. The purpose of subsequent description is to provide a The new first structure with the structure that eliminates the above problems is a single stack. A neighbour can structure an adjustment layer. Wafer tray. The wafer tray mentioned above is about direct. Fold the crystal group so that the group leaves the present invention. The round trays of wafers provided by the round transport are connected to each other. The round trays have a small size and a box for the purpose of one pin. The wafer transfer box mechanism includes a plurality of wafer tray groups, a support mechanism that is mechanized / touched, a height position, and a wafer tray lock mechanism that is shown. , Features, and advantages will use the new Ψ 含 含 # 擭 to communicate with I

五、發明說明(5) 托礙b)、一支撐機構,用來將彼此間層疊在一起的該晶圓 接Ξ Γ从機械化方式撐起著,俾相鄰兩晶圓托盤組能夠直 高声位,觸,且利用该支撐機構調整層疊之該晶圓托盤的 X H置;以及, 於譆2 4 一栓鎖機構,用來拴鎖選定的晶圓托盤組,以便 開標的晶圓托盤能夠與上下相鄰之該晶圓托盤組離 <1 一驅動馬達 b) 鎖真i ^,情況是,晶圓輸送盒機構是設置在一加載互 另較佳之情況是,支撐機構更包含: —升降桿,連接至該驅動馬達; 達,料接^驅動馬 Η、 堆®在該堆疊載置台上· L7 β d)—引導件機構,用以*於—戰置口上,以及, 口’以使該晶圓托盤與堆最支拉//曰圓托盤與堆疊載置 而升降。 且載置口文該驅動馬達的驅動力 此外較佳之情況是, ^至少兩組栓鎖構件 $,構更包含: 在不同的高度位置,;J少二組栓鎖構件以第-間距 兩相鄰層叠之晶圓托般門間距較由彼此直接接觸的 ▲間之距離所界定的第二間距為大。 C6再者較佳之全鎖構件各自包含一栓鎖麟。 仏之情況是,晶圓托盤各自包含:V. Description of the invention (5) Support b) A supporting mechanism for connecting the wafers stacked on top of each other Ξ Supported by mechanization, 俾 Adjacent two wafer tray groups can straighten out Position, touch, and use the support mechanism to adjust the XH position of the stacked wafer trays; and Yu He 2 4 a latch mechanism to lock the selected wafer tray group, so that the open wafer tray can communicate with The wafer tray group adjacent to the top and bottom is separated from a driving motor b) the lock i ^. In the case, the wafer conveying box mechanism is arranged under a loading condition. The supporting mechanism further includes: — lifting The rod is connected to the drive motor; the driver is connected to the drive unit and the stacker is placed on the stacking platform. L7 β d)-a guide mechanism for * on the battle opening, and The wafer tray and the stacker are lifted and / or the round tray and the stacker are placed and raised. In addition, the driving force of the driving motor on which the oral text is placed is more preferably: ^ at least two sets of locking members $, the structure further includes: at different height positions, and J less two sets of locking members are in two phases at the first pitch The distance between adjacent stacked wafer tray-like doors is larger than the second distance defined by the distance between ▲ in direct contact with each other. C6 and the more preferred full-lock members each include a bolt. In the case, each wafer tray contains:

而較佳之情況9 492132 五、發明說明(6) a) —主體’具有一平坦頂面與一平坦底面及一厚 度’並具有能夠容納該检鎖銷插入之一检鎖孔; b) —接觸部,係由該主體向内延伸,且容許一半導 體晶圓的邊緣能夠與該接觸部的上表面接觸。 又較佳之情況是,接觸部的一端為逐漸尖細狀。 本發明第二個實施態樣提供一種晶圓輸送盒機構包 含: a) 複數個晶圓托盤組,於各組内存放單一半導體晶 圓; b) —支撐機構,用來將彼此間層疊在一起的該晶圓 托盤組以機械化方式撐起著,俾相鄰兩晶圓托盤組能夠直 接互相接觸,且利用該支撐機構調整層疊之該晶圓托盤的 高度位置;以及, c) 一栓鎖機構,用來拴鎖選定的晶圓托盤組,俾使 由一標的晶圓托盤與其上方相鄰的一晶圓托盤間之距離所 界定的第一間距,與由該標的晶圓托盤與其下方相鄰的一 晶圓托盤間之距離所界定的第二間距,均大於由層疊在一 起且相鄰的兩晶圓托盤間之距離所界定的第三間距。 且較佳之情況是,晶圓輸送盒機構是設置在一加載互 鎖真空室中。 而較佳之情況是,支撐機構更包含: a) —驅動馬達; b) —升降桿,連接至該驅動馬達; c) 一堆疊載置台,係經由該起降桿連接至該驅動馬And the better case 9 492132 V. Description of the invention (6) a)-the main body 'has a flat top surface and a flat bottom surface and a thickness' and has a lock hole capable of receiving the lock pin insertion; b)-contact The portion extends inward from the main body and allows an edge of a semiconductor wafer to contact the upper surface of the contact portion. Further preferably, one end of the contact portion is tapered gradually. A second embodiment of the present invention provides a wafer transport box mechanism including: a) a plurality of wafer tray groups, each of which stores a single semiconductor wafer; b) a supporting mechanism for stacking each other The wafer tray group is mechanically supported, so that two adjacent wafer tray groups can directly contact each other, and the support mechanism is used to adjust the height position of the stacked wafer trays; and, c) a latch mechanism , Used to lock the selected wafer tray group, so that the first distance defined by the distance between a target wafer tray and an adjacent wafer tray above it is adjacent to the target wafer tray next to it The second distance defined by the distance between two wafer trays is larger than the third distance defined by the distance between two stacked and adjacent wafer trays. It is also preferable that the wafer transfer cassette mechanism is provided in a load-locking vacuum chamber. Preferably, the supporting mechanism further comprises: a) a driving motor; b) a lifting rod connected to the driving motor; c) a stacking platform connected to the driving horse via the lifting rod;

第10頁 492132 五、發明說明(7) 達,以容許將晶圓托盤組堆疊在該堆疊載置台上;以及 d) —引導件機構,用以支撐該晶圓托盤與堆疊載置 台,以使該晶圓托盤與堆疊載置台受該驅動馬達的驅動力 而升降。 此外較佳之情況是,栓鎖機構更包含:至少兩組栓鎖 構件,且以第一間距將其設置在不同的高度位置。 而較佳之情況是,栓鎖構件各自包含一栓鎖銷。 再者較佳之情況是,晶圓托盤各自包含: a) —主體,具有一平坦頂面與一平坦底面,以及能 夠容納該栓鎖銷插入一栓鎖孔的一厚度; b) —接觸部,係由該主體向内延伸,以容許一半導 體晶圓的邊緣能夠與該接觸部的上表面接觸。 且又較佳之情況是,接觸部的一端為逐漸尖細狀。 1 5本發明第三個實施態樣提供一種半導體製造設備包 含: a) 複數個處理室; b) 至少一個加載互鎖真空室,具有一第一種型態的 晶圓輸送盒, c) 一輸送室,係連接至所有處理室與加載互鎖真空 室,且具有一第一輸送機械臂; d) 一晶圓載置台,具有複數個第二種型態的晶圓輸 送盒;Page 10 492132 V. Description of the invention (7) to allow stacking of wafer tray groups on the stacking stage; and d) a guide mechanism for supporting the wafer tray and the stacking stage so that The wafer tray and the stacking stage are raised and lowered by the driving force of the driving motor. Further preferably, the latching mechanism further includes: at least two sets of latching members, and the latching members are arranged at different height positions at a first interval. Preferably, each of the latch members includes a latch pin. Further preferably, the wafer trays each include: a) a body having a flat top surface and a flat bottom surface, and a thickness capable of accommodating the latch pin into a latch hole; b) a contact portion, The main body extends inwardly to allow an edge of a semiconductor wafer to contact the upper surface of the contact portion. It is also preferable that one end of the contact portion is gradually tapered. 15. A third embodiment of the present invention provides a semiconductor manufacturing equipment including: a) a plurality of processing chambers; b) at least one loading interlocking vacuum chamber having a first type of wafer transfer box, c) a The transfer chamber is connected to all processing chambers and loading interlocking vacuum chambers, and has a first transfer robot arm; d) a wafer mounting table, with a plurality of wafer transfer boxes of the second type;

492132 五、發明說明(8) '〜 e) —第二輸送機械臂,係設置於該輸送盒載置台與 該至少一個加載互鎖真空室間; 其中,該晶圓輸送盒更包含: f 1)複數個晶圓托盤組,用來將單一半導體晶圓存放 於各組内; f 2 ) —支撐機構,用來將彼此間層疊在一起的該晶圓 托盤組以機械化方式撐起著,俾相鄰兩晶圓托盤組能夠直 接互相接觸,且利用該支撐機構調整層疊之該晶圓托盤的 高度位置;以及 f 3 ) —栓鎖機構,用來拴鎖選定的晶圓托盤組,以便 於讓一標的晶圓托盤能夠與上下相鄰之該晶圓托盤組離 開。 鎖真空室中。月兄疋 日日圓輸运是機構疋设置在一加載互 也較佳之情況是,支撐機構更包含: a ) —驅動馬達; 一升,桿,連接至該驅動馬達;492132 V. Description of the invention (8) '~ e) — The second conveying robot arm is disposed between the conveying box mounting table and the at least one loading interlocking vacuum chamber; wherein the wafer conveying box further includes: f 1 ) A plurality of wafer tray groups for storing a single semiconductor wafer in each group; f 2)-a supporting mechanism for mechanizingly supporting the wafer tray groups stacked on each other, 俾Adjacent two wafer tray groups can directly contact each other, and use the support mechanism to adjust the height position of the stacked wafer trays; and f 3)-a latching mechanism for locking the selected wafer tray group in order to facilitate A target wafer tray can be separated from the wafer tray groups adjacent to each other. Lock the vacuum chamber. Moon brother 疋 Japanese yen transport is a mechanism. It is also better to set it under a load. The support mechanism further includes: a) a drive motor; one liter, a rod, connected to the drive motor;

^ ^ ^ ^ ^# ^# ^ ^ ^ ^ cn — α ^ π 堆疊在該堆疊載置台上;以石 台,以使兮曰η牛4機構,用以支撐該晶圓托盤與堆疊載^ ^ ^ ^ ^ # ^ # ^ ^ ^ cn — α ^ π stacked on the stacking platform; a stone platform is used to support the wafer tray and the stacking platform.

:升降。〃盤與堆疊載置台受該驅動馬達的驅S 並且較佳之情況是 至少兩組栓鎖構件 ’拾鎖機構更包含: ’該至少兩組栓鎖構件以第一間距 492132 五、發明說明(9) "又置在不同的高度位置,該第一間距較由彼此直接接觸的 兩相鄰層疊之晶圓托盤間之距離所界定的第二間距為大。 而較佳之情況疋’检鎖構件各自包含一检鎖銷。 再者較佳之情況是,晶圓托盤各自包含: 度 a) —主體,具有一平坦頂面與一平坦底面及一厚 並具有能夠容納該栓鎖銷插入之一栓鎖孔; b) 一接觸部,係由该主體向内延伸,且容許一半導 曰曰圓的邊緣能夠與該接觸部的上表面接觸。 且又較佳之情況是,接觸部的一端為逐漸尖細狀。 含 2 2本發明第四個實施態樣提供一種半導體製造設備包 a)複數個處理室; b)至少一個加載互鎖真空室,具有一第一種型態的 晶圓輪送盒; 〜 ^ c) 一輸送室,係連接至所有處理室與加載互鎖真空 室’且具有一第一輸送機械臂; 〃工 d ) aa圓載置口’具有複數個第》—種型態的晶圓輪 送盒; & ^ 一第二輸送機械臂,係設置於該輸送盒載置台與 该至少一個加載互鎖真空室間; 其中’該晶圓輸送盒更包含: f 1)複數個晶圓托盤組,用來將單一半導體晶圓在 於各組内; 口廿從 f 2) —支撐機構,用來將彼此間層疊在一 起的該晶圓: Lifting. The pan and the stacking platform are driven by the drive motor S and preferably, there are at least two sets of latching members. The pick-up mechanism further includes: 'The at least two sets of latching members are at a first pitch of 492132. 5. Description of the invention (9 ) " Also placed at different height positions, the first pitch is greater than the second pitch defined by the distance between two adjacent stacked wafer trays that are in direct contact with each other. Preferably, each of the lock detecting members includes a lock detecting pin. Further preferably, the wafer trays each include: a) a main body having a flat top surface and a flat bottom surface and a thick locking hole capable of accommodating the insertion of the locking pin; b) a contact The portion extends inward from the main body and allows a half of the rounded edge to contact the upper surface of the contact portion. It is also preferable that one end of the contact portion is gradually tapered. Containing 22, a fourth embodiment of the present invention provides a semiconductor manufacturing equipment package a) a plurality of processing chambers; b) at least one loading interlocking vacuum chamber having a first type of wafer carousel; ~ ^ c) a conveying chamber, which is connected to all processing chambers and loading interlocking vacuum chambers 'and has a first conveying robotic arm; masonry d) aa round loading port' has a plurality of wafer wheels &Amp; ^ A second conveying robot arm is disposed between the conveying box mounting table and the at least one loading interlocking vacuum chamber; wherein the wafer conveying box further includes: f 1) a plurality of wafer trays Group, used to place a single semiconductor wafer in each group; mouth from f 2)-a support mechanism, used to stack the wafers on top of each other

第13頁 492132 五、發明說明(ίο) 托盤組以機械化方式撐起著,俾相鄰兩晶圓托盤組能夠直 接互相接觸,且利用該支撐機構調整層疊之該晶圓托盤的 高度位置;以及 f 3 ) —栓鎖機構,用來拴鎖選定的晶圓托盤組,俾使 由一標的晶圓托盤與其上方相鄰的一晶圓托盤間之距離所 界定的第一間距,與由該標的晶圓托盤與其下方相鄰的一 晶圓托盤間之距離所界定的第二間距,均大於由層疊在一 起且相鄰的兩晶‘圓托盤間之距離所界定的第三間距。 且較佳之情況是,晶圓輸送盒機構是設置在一加載互 鎖真空室中。 2 4而較佳之情況是,支樓機構更包含: a) —驅動馬達; b) —升降桿,連接至該驅動馬達; c) 一堆疊載置台,係經由該起降桿連接至該驅動馬 達,以容許將晶圓托盤組堆疊在該堆疊載置台上;以及, d) —引導件機構,用以支撐該晶圓托盤與堆疊載置 台,以使該晶圓托盤與堆疊載置台受該驅動馬達的驅動力 而升降。 此外又較佳之情況是,栓鎖機構更包含··至少兩組栓 鎖構件,且以第一間距將其設置在不同的高度位置。 又較佳之情況是,栓鎖構件各自包含一栓鎖銷。 且又較佳之情況是,晶圓托盤各自包含: a) —主體,具有一平坦頂面與一平坦底面及一厚 度,並具有能夠容納該栓鎖銷插入之一栓鎖孔;Page 13 492132 V. Description of the invention (ίο) The tray group is supported in a mechanized manner, two adjacent wafer tray groups can directly contact each other, and the support mechanism is used to adjust the height position of the stacked wafer trays; and f 3) — a latching mechanism for latching a selected wafer tray group such that a first distance defined by a distance between a target wafer tray and a wafer tray adjacent to the target The second distance defined by the distance between the wafer tray and an adjacent one of the wafer trays below it is greater than the third distance defined by the distance between the stacked and adjacent two wafer circular trays. It is also preferable that the wafer transfer cassette mechanism is provided in a load-locking vacuum chamber. 2 4 In a better case, the branch mechanism further includes: a) a driving motor; b) a lifting rod connected to the driving motor; c) a stacking platform connected to the driving motor via the lifting rod To allow the wafer tray group to be stacked on the stacking stage; and, d) a guide mechanism for supporting the wafer tray and the stacking stage so that the wafer tray and the stacking stage are driven by the driving The driving force of the motor rises and falls. In addition, it is also preferable that the latching mechanism further includes at least two sets of latching members, and the latching members are arranged at different height positions at a first interval. It is also preferred that the latch members each include a latch pin. It is also preferable that the wafer trays each include: a) a main body having a flat top surface and a flat bottom surface and a thickness, and having a latching hole capable of receiving the insertion of the latching pin;

第14頁 492132Page 14 492132

五、發明說明(11) b) —接觸部 體晶圓的邊緣能夠 再者較佳之情 ,係由該主體向内延伸,且容許一半導 與·該接觸部的上表面接觸。 況是,接觸部的一端為逐漸尖細狀。 【較佳實施例之詳細况明J p 以下表e附圖來詳細說明本發明的第一個實施例。根 據本發明二ί〆個實施例中的一種半導體製造設備之概略 平面圖顯干於圖3中。由於本發明著重在半導體製造設備 内、且位於加載彡鎖真空室中的晶圓輪送盒構造來進行改 良,因此半導體製造設備的一般裝置與上述先前技術中相 同。而該半導體製造設備裡’包含用於處理半導體裝置的 —主體11、上方置有容納半導體晶圓之晶圓輸送盒22的一 輪送盒载置台21,以及將半導體晶圓於主體11與輸送盒載 置台之間移送的一晶圓輸送機械臂31。此外主體11更包 含:兩加載互鎖真空室1 2,經由晶圓輸送機械臂3丨而連接 ,輸,盒載置台21,以隔絕本體11與外界空氣作用;五個 理ί =,以執行半導體裝置之處理;以及單一之輸送室 且二 載互鎖真空室12而連接於輪送盒載置台21, 且與處理至1 3相連。蕻此#得虛理宕〗 室12可經由輸送室14 = ”兩加載互鎖真空 12中#詈一曰4而彼此連通。在各個加载互鎖真空室 °又 日日圓輸送盒1,以便於暫時存放半導體晶圓。 =二载之互鎖真内與輸送盒載置丄導上體的^ 圓的工作。而0於、曰圓輸达機械臂31負責移送半導體晶 輸迗至14中的另一晶圓輸送機械臂15,則是V. Description of the invention (11) b) —The contact part The edge of the body wafer can be better. It extends from the main body inward and allows half of the guide to contact the upper surface of the contact part. In other words, one end of the contact portion is gradually tapered. [Detailed description of the preferred embodiment J p The following table e illustrates the first embodiment of the present invention in detail. A schematic plan view of a semiconductor manufacturing apparatus according to one embodiment of the present invention is shown in FIG. Since the present invention focuses on improving the structure of the wafer carousel in the semiconductor manufacturing equipment and is located in the load lock vacuum chamber, the general equipment of the semiconductor manufacturing equipment is the same as in the aforementioned prior art. The semiconductor manufacturing equipment includes a main body 11 for processing semiconductor devices, a round cassette placing table 21 on which a wafer transport box 22 for storing semiconductor wafers is placed, and semiconductor wafers on the main body 11 and the transport box. A wafer transfer robot arm 31 is transferred between the mounting tables. In addition, the main body 11 further includes: two loading interlocking vacuum chambers 12 connected by a wafer transfer robot arm 3, and a box mounting table 21 to isolate the body 11 from the outside air; Semiconductor device processing; and a single transfer chamber and two-load interlocking vacuum chamber 12 connected to the carousel mounting table 21, and connected to processing 1 to 3.蕻 此 # 得 虚 理当〗 The chambers 12 can communicate with each other via the conveying chamber 14 = "two loading interlocking vacuum 12" # 詈 一 曰 4. In each loading interlocking vacuum chamber ° and the yen transport box 1 to facilitate Temporary storage of semiconductor wafers. = The round work of placing the upper body on the interlocking two-in-one interlocking true and the transport box. And the robot arm 31 is responsible for transferring the semiconductor wafers 14 to 14. The other wafer transfer robot 15 is

492132 五、發明說明(12) 執行加載互鎖真空室j 2、處理室n 半導體晶圓移送。加載互鎖真空室=彼此間的 相接的邊界處各自裝配有一第一閘 圓輪达機械臂3 1 端的邊界處亦各自有一第二閘閥。且外與輸达室14 送室1 4的邊界同樣也都有一閘閥。這歧=理室1 3連接輸 各個加載互鎖真空室】2、處理室〗3盥二、f,二具有緊密封住 接下來藉著上述的習知半導體“乍用二 體晶圓的處理流程。一開始半導體晶 來說明半導 置台21上的晶圓輸送盒22内部。接荽曰=放在輸送盒載 輸送盒載置台21上的晶圓輸送盒22内曰,曰=^幾械臂31從 並存放到加載互鎖真空室12中的晶圓 導體晶圓移送 J室"中的晶圓輸送裝置15再度 加;内。直然,輸 中的晶圓輸送盒!之半導體晶圓移送到處理载,鎖真空室12 讓半導體晶圓進行如濺射蝕刻或化學 ,藉此 程。隨後晶圓輸送機械臂15進一步將半導的製 送室13中。在所需製程執行完畢‘, 延機械臂15即會將輸送室14内的經過完 更 j輸 圓移送到位於加載互鎖直* 半導體晶 曰圓舲7胜罢W Γ 2中的晶圓輸送盒1。秋德 日曰«輸达裝置31再從加载互鎖真…、後 將半導體晶圓移送到輸送各费w中的日日®輪送盒1 中。在進行預定製程力的晶圓輪送盒22之 的間閥關閉,以便於讓浐二?鎖真空室12與處理室13 理宮輸运室14、加載互鎖真空室12盘處 =13此夠處於各自獨立的真空狀態。而製程完畢後、f492132 V. Description of the invention (12) Perform loading interlocking vacuum chamber j 2. Processing chamber n Semiconductor wafer transfer. The load interlocking vacuum chamber = a first gate is installed at the boundary between each other, and a second gate valve is also provided at the boundary of the end of the round wheel robot arm 3 1. And there is also a gate valve at the boundary between the outside and the delivery room 14 and the delivery room 14. This difference = the processing room 1 3 is connected to each loading interlocking vacuum chamber] 2, the processing room 3, the second, f, the second has a tightly sealed, and then by the above-mentioned conventional semiconductor "first-use two-body wafer processing First, the semiconductor wafer is used to explain the inside of the wafer transfer box 22 on the semi-conducting stage 21. Then, the wafer transfer box 22 placed on the transfer box-mounted transfer box mount table 21 is described as follows: The arm 31 is moved from the wafer conductor wafer transferred to the load-locking vacuum chamber 12 to the wafer transfer device 15 in the J-chamber " again. Inside. Directly, the wafer transfer box being transported! Circularly transferred to the processing carrier, the vacuum chamber 12 is locked to allow semiconductor wafers to perform processes such as sputtering etching or chemistry. Subsequently, the wafer transfer robot 15 further places the semi-conducting process chamber 13 in the process. ', The robot arm 15 will transfer the completed circle in the transfer chamber 14 to the wafer transfer box 1 located in the load-locking interlocking semiconductor wafer 7 wins W Γ 2. Autumn Day Said «the conveyance device 31 then interlocked from loading ..., and then transferred the semiconductor wafer to each of the transportation w In the RiRi® carousel 1. The valve between the wafer carousel 22 with the predetermined process force is closed to allow the second one? Lock the vacuum chamber 12 and the processing chamber 13 Ligong transport room 14, load Interlocking vacuum chamber 12 trays = 13 This is enough to be in a separate vacuum state. After the process is completed, f

解除加載互鎖真空室12的真空狀態,以便於將位於上載J 492132 五、發明說明(13) ,真空室12中的晶圓輪送盒丨之經過完全處理半導 圓移送到輸送盒載置台21上的晶圓輸送盒22之中Ή曰曰 ^如圖^所示之半導體製造設備中’位於加截互鎖直* =内的新病之晶圓輸送盒之概略圖表示於圖4上。而圖工 =圖4所示之新穎之晶圓輸送盒中的收 ^貝! ^圖。設置在各個加載互鎖真空室12内之^日放大^ fa而具對作為存放半導體晶圓41用途的晶 半導體母日= 日曰η。此外各個晶圓托盤2之延伸部份2(1具有内側 =中央區域延伸並逐漸尖細狀之特徵,#中 ”緣部份是與各個晶圓托盤2之延伸部 〜曰曰 =的上表面接觸。同時新穎之.晶圓輸送盒lat =延伸之晶圓托盤2的垂直方向上,也具有單獨。者 开以件』在:晶圓托盤2的外側邊緣會與成對的直線 缘形引導件6即ΐ ί ’其中,成對的晶圓托盤2可沿著直 二 向移動。另外新穎之晶圓輸送盒 旦一堆豐載置台5,讓成對的晶圓托盤2因本身的重 :蟲隹豐於其上。而此堆疊載置台5呈現橫向延伸狀。且 ,載置台5相對的兩邊緣也會與成對的直線形 起’其中,堆疊載置台5可沿著直線形引導件6牛、J ^方向移動。再者堆疊載i台W底面以機械方式連接 一升降機構4A。而此升降機構4A可讓堆疊載置a =形引導件6、即垂直方向進行升降。料降機口構。 匕3 -驅動馬達4-1,以及連接在堆疊載置台5與驅動馬達 492132 五、發明說明(14) 4-1之間的-升降桿4-2。各個晶圓托盤2均具有一由晶圓 托盤2外侧邊緣延伸至其内部且作為固定用的凹龙設 置第一與第二對栓鎖機構7,用來拴鎖選定的成圓托 盤2。而各個栓鎖機構7包含一圓柱部份以或几,、以aB及一栓 。且利用栓鎖機構7的栓鎖_插進盤 :用凹溝3内’以達到拾鎖晶圓托盤2之目的。—托曰盤栓鎖機 此外將第晶固血托笛盤2拾鎖住後’晶圓托盤2即變成無法移動。 =外第一與第二對栓鎖機構7係從加載互鎖真空外 壁,經由直線形引導件6而插進晶圓托盤2中。又,以大於 ==2厚度之高度差將這兩組栓鎖機構7裝配在不同的 ::μ ΐ二假设以下、上組之栓鎖機構7 ’分別將首先 堆:ί圓托盤組拴鎖住,其中,堆疊載置台5上 ί f ^百先選定者下方之晶圓托盤組’又其次選定者 疊著其上方的晶圓托盤組。那就是,首先&其次 差 1間的冋度差,即為上下兩組栓鎖機構7間的 定的曰::: 大於晶圓托盤組厚度。此外,其次選 曰曰0托盤組,與位在其下方、堆疊在堆疊載置台5 产。端之晶圓托盤組間的高度差’也大於晶圓托盤組厚 操作$ :將:紹如何將晶圓存放至或取出晶圓輸送盒la的 引古 動馬達4-1使得堆叠載置台5沿著直線^ 袅的曰二直移動或升降,以便於能夠將堆疊載置台5上堆 :上:圓托盤組2中所選定者2A f周整隹 ⑽㈣’將Μ選定或稱為標;^晶^托The vacuum state of the loading interlocking vacuum chamber 12 is released, so that the wafer carousel in the vacuum chamber 12 which is located in uploading J 492132 V. Description of the invention (13) is transferred to the conveying box mounting table after the semi-circular guide is completely processed. The wafer transfer box on 21 is shown in Figure ^. In the semiconductor manufacturing equipment shown in Figure ^, the schematic diagram of the new diseased wafer transfer box located in the interlocking interlocking direct line * = is shown in Figure 4. . And the drawing worker = the receipt in the novel wafer transfer box shown in Fig. 4! The ^ -day enlargement ^ fa provided in each loading interlocking vacuum chamber 12 has a crystal semiconductor mother day for the purpose of storing the semiconductor wafer 41 = day η. In addition, the extension portion 2 of each wafer tray 2 (1 has the feature that the inner side = the central area extends and gradually becomes tapered. The #middle "edge portion is the upper surface of the extension portion of each wafer tray 2 ~ At the same time, it is novel. The wafer transfer box lat = the extended wafer tray 2 in the vertical direction also has a separate one. The open side is: the outer edge of the wafer tray 2 will be guided with a pair of straight edges. Piece 6 is the one where the paired wafer trays 2 can be moved in two directions. In addition, the novel wafer transfer box is provided with a stack of loading platforms 5 to allow the paired wafer trays 2 to be weighed by their own weight. : The worms are abundant on it. And this stacking table 5 has a laterally extending shape. Moreover, the two opposite edges of the table 5 will also form a pair of straight lines. Among them, the stacking table 5 can be guided along a straight line. 6 pieces in the direction of cattle and J ^. In addition, the bottom surface of the stacking platform I is mechanically connected to a lifting mechanism 4A. This lifting mechanism 4A allows the stacking platform a to be shaped as a guide 6, that is, to lift vertically. Lowering mechanism. Dagger 3-drive motor 4-1, and connected to the stacking stage 5 and drive Up to 492132 V. Description of the invention (14) 4-1-Lifting bar 4-2. Each wafer tray 2 has a concave dragon set extending from the outer edge of the wafer tray 2 to the inside and used as a fixing part. A pair of latching mechanisms 7 is used to latch the selected round tray 2. Each latching mechanism 7 includes a cylindrical portion or several, aB and a bolt. Latching_Insert into the tray: Use the groove 3 'to achieve the purpose of picking up the wafer tray 2. —Tuo Yue tray locking machine also picks up and locks the second crystal solid blood flute tray 2'wafer tray 2 That is, it becomes impossible to move. = The first and second pairs of latching mechanisms 7 are inserted into the wafer tray 2 from the outer wall of the loading interlocking vacuum via the linear guides 6. Also, the height is greater than == 2 thickness The two sets of latching mechanisms 7 are assembled in different :: μ ΐ 2 Suppose that the following latching mechanisms 7 ′ of the upper group will be stacked first: the round tray group is locked, and the stacking platform 5 is stacked f ^ The wafer tray group below the one hundred selected first 'and the wafer tray group above the second selected. The first & the second difference The difference in the angle is the set between the two latching mechanisms of the upper and lower groups 7: :: is greater than the thickness of the wafer tray group. In addition, the next is the 0 tray group, which is located below it and stacked on the stacking stage. 5. The height difference between the wafer tray groups at the end is also larger than the thickness of the wafer tray group. Operation: How to store or remove wafers to or from the wafer transport box 1 The mounting table 5 is moved or moved up and down along a straight line, so that the stacking table 5 can be stacked on the stack: upper: the selected person in the round tray group 2A f week rectification 'Select or call Μ Standard; ^ 晶 ^ 托

492132 五、發明說明(15) ^者⑼拾鎖住’其中,是將检鎖機構7的拾鎖 'β日日圓托盤組2Β内部。而位於晶圓托盤組2Β上方者 :Γ=ΐΛ。至甘於遺留在晶圓托盤組2”方者係堆疊在 隹且載置口 5上,其中,位於晶圓托盤組2β下方、最上 的?留者為2Α。然後’啟動驅動馬達4]使得堆疊載置 2者^線形引導件6垂直下降’以便於能夠將標的: 盤組2Α調整到栓鎖機構下組以所在的預定高度位置上。托 下來,以栓鎖機構下組7Α將標的晶圓托盤組2Α拴鎖住,其 :^是將栓鎖機構7Α的栓鎖銷7C插進晶圓托盤組以内部了 4時,遺留在晶圓托盤組2Α下方者係堆疊在堆疊載置台5 ^。再度啟動驅動馬達4-1使得堆疊載置台5沿著直線形 =6垂直下降到更低位置’以便於能夠讓遺留在晶圓 :組2A下方者再隨著堆疊載置台5一同降低。因此,即可 :位於堆璺載置台5中最上端之晶圓托盤組%與標的以分 T。另外,堆疊之晶圓托盤組2的第一間距『pU』即為各 自”。而標的晶圓托盤組2A與其正上方者则的距離 貝j疋表示為第二間距『plb』。又標的晶圓托盤組2A與其 正下方者2C間的距離以第三間距『plc』表示。在此第二 間距『Plb』係寬於第一間距『Pla』,且第三間距 一 『=』亦寬於第一間距『pla』。即表示標的晶圓托盤組 的表面’與2B、2C的表面呈現分離狀態。 晶圓輸送機械臂31的輸送臂16係與^置欲移動之半導 圓的刀片17連接。而啟動晶圓輸送機械臂31的輸送 #16 ’以便於能夠將半導體晶圓41從晶圓輸送盒22移動到 492132 五、發明說明(16) 加載互鎖真空室1 2中的晶圓輸送盒1内,其中,半導體晶 圓4 1係存放於晶圓托盤組2 A的收納托盤2d部份。伸出晶圓 輸送機械臂15的輸送臂16,將存放於晶圓托盤組2A之收納 托盤2 d部份的半導體晶圓4 1拾起,以便於能夠將半導體晶 圓4 1再度移動至預定的處理室丨3中。而利用晶圓輸送機械 臂將半導體晶圓41移送到加載互鎖真空室1 2中的晶圓托盤 組2A ’與上述晶圓輸送臂16移送半導體晶圓41的操作方式 相同。 之後,啟動驅動馬達4-1將堆疊載置台5升高,以便於 使得晶圓托盤組2C與2A接觸。並將栓鎖機構下組7A從晶圓 ^盤f2A中釋放,以便於使得晶圓托盤組2A呈現非拴鎖狀 態’藉此晶圓托盤組2A即可直接雄疊於晶圓托盤組2C上而 位於堆疊載置台5上方。492132 V. Description of the invention (15) ⑼Pick up and lock 'Among them, the lock of the lock detection mechanism 7' β-Japanese yen tray set 2B is inside. The one above the wafer tray group 2B is: Γ = ΐΛ. Those who are willing to be left in the wafer tray group 2 ”are stacked on the stacker and the loading port 5. Among them, the uppermost one located below the wafer tray group 2β is 2A. Then 'start the drive motor 4] to make the stack Place the 2 ^ linear guides 6 vertically down so that the target can be adjusted: The disk set 2A is adjusted to the predetermined height position of the lower group of the latching mechanism. Hold it down, and the target wafer is lowered by the lower group of the latching mechanism 7A. Tray group 2A is locked. It is: when the latch pin 7C of the latch mechanism 7A is inserted into the wafer tray group 4 inside, the one left under the wafer tray group 2A is stacked on the stacking table 5 ^ Start the drive motor 4-1 again so that the stacking table 5 descends vertically to a lower position along the straight line = 6, so as to be able to allow the remaining ones below the wafer: group 2A to lower together with the stacking table 5. Therefore That is, the wafer tray group% located at the uppermost end of the stacker loading platform 5 and the target are divided by T. In addition, the first distance "pU" of the stacked wafer tray group 2 is each ". The distance between the target wafer tray group 2A and the one directly above it is denoted by the second pitch "plb". The distance between the sub-labeled wafer tray group 2A and the directly below 2C is represented by a third pitch "plc". Here, the second interval "Plb" is wider than the first interval "Pla", and the third interval "1" is also wider than the first interval "pla". That is, the surface 'of the target wafer tray group is separated from the surfaces of 2B and 2C. The transfer arm 16 of the wafer transfer robot arm 31 is connected to a semi-circular blade 17 to be moved. And start the transfer # 16 'of the wafer transfer robot arm 31 in order to be able to move the semiconductor wafer 41 from the wafer transfer box 22 to 492132 V. Description of the invention (16) Load the wafer transfer box in the interlocking vacuum chamber 12 In 1, the semiconductor wafer 41 is stored in the storage tray 2d portion of the wafer tray group 2A. The conveying arm 16 extending out of the wafer conveying robot arm 15 picks up the semiconductor wafer 41 stored in the storage tray 2 d portion of the wafer tray group 2A, so that the semiconductor wafer 41 can be moved to a predetermined position again. Processing room 丨 3. The semiconductor wafer 41 is transferred to the wafer tray group 2A 'in the load-locking vacuum chamber 12 by the wafer transfer robot arm in the same manner as the wafer transfer arm 16 for transferring the semiconductor wafer 41. After that, the drive motor 4-1 is started to raise the stacking stage 5 so that the wafer tray group 2C and 2A are brought into contact. And release the lower group 7A of the latch mechanism from the wafer tray f2A, so that the wafer tray group 2A is in a non-latched state ', so that the wafer tray group 2A can be directly stacked on the wafer tray group 2C. It is located above the stacking stage 5.

又, 使得晶圓 托盤組2B 態,藉此 位於堆疊 堆疊載置 位於 存放單一 少 選定 下鄰近者 而實現減 啟動驅動馬達4-1將堆疊載置台5再升高,以便於 托盤組2A與2B接觸。且將栓鎖機構上組7β從晶圓 中釋放,以便於使得晶圓托盤組2B呈現非拴鎖狀 晶圓牦盤組2A即可直接堆疊於晶圓托盤組2A上而 載置台5上方。結果所有的晶圓托盤組均堆疊 台5的上方。 加載互鎖真空室中的晶圓輸送盒包含可於各組 半導體晶圓的複數個晶圓托盤組,其中,.除了 的曰曰圓托盤組係藉由晶圓托盤組栓鎖機構盥 間保持距離並藉此避免先前技術中所存在^問 小晶圓輸送盒尺寸的目的外,其餘所有的晶圓托In addition, the wafer tray group 2B is brought into a state, so that the stacker is placed on the stack and the storage is located in the vicinity of a single selection. The drive motor 4-1 is reduced to raise the stacker table 5 to facilitate the trays 2A and 2B. contact. Furthermore, the upper group 7β of the latch mechanism is released from the wafer, so that the wafer tray group 2B has a non-latched shape. The wafer tray group 2A can be directly stacked on the wafer tray group 2A and above the mounting table 5. As a result, all the wafer tray groups are stacked above the stage 5. The wafer transfer box in the loading interlocking vacuum chamber includes a plurality of wafer tray groups that can be used for each group of semiconductor wafers. Among them, the round tray group is held by the wafer tray group lock mechanism in the bathroom. Distance and thereby avoiding the problem of the size of the small wafer transfer box in the prior art, all the other wafer carriers

492132 五、發明說明(17) 盤組彼此間係層疊在一起。 有鑑於精通相關技術的人士能夠針對本發明進行修 改,因此應可以了解有關本專利說明書中實施例所顯示與 解說,僅只為說明之用而不應解釋為其限制的意思。因此 依循本發明的精神與範疇内的所有修改案例,應該表示皆 為申請專利範圍所涵蓋。 (492132 V. Description of the invention (17) The disk sets are stacked on top of each other. In view of the fact that a person skilled in the related art can modify the present invention, it should be understood that the embodiments shown and explained in this patent specification are only for illustrative purposes and should not be interpreted as a limitation. Therefore, all modification cases that follow the spirit and scope of the present invention should be said to be covered by the scope of patent application. (

第21頁 492132 圖式簡單說明 根據本發明的較佳實施例,將會參照以下附圖進行解 說。 圖1係顯示用以處理半導體晶圓的一種習知半導體製 造設備之概略平面圖。 圖2A係如圖1所示之半導體製造設備中,位於加載互 鎖真空室内的一種習知晶圓輸送盒之概略圖。 圖2B則為圖2 A中、以橢圓形虛線所標示之『A』部份 的局部放大圖,其中針對該習知晶圓輸送盒的收納溝進行 解說。 圖3係根據本發明第一個實施例,顯示一種用於處理 半導體晶圓的半導體製造設備之概略平面圖。 圖4係如圖3所示之該半導體製造設備中,位於加載互 鎖真空室内的一種新穎之晶圓輸送盒之概略圖。 圖5則為圖4所示之該新穎之晶圓輸送盒的收納溝部份 的局部放大圖。 【符號說明】 1、 la、lb〜晶圓輸送盒 2、 2A、2B、2C〜晶圓托盤組 2d〜晶圓托盤組的收納托盤部份 3〜 凹溝部份 4 A〜升降機構 4、4 -1〜驅動馬達 4 - 2〜升降桿Page 21 492132 Brief description of the drawings According to a preferred embodiment of the present invention, it will be explained with reference to the following drawings. FIG. 1 is a schematic plan view showing a conventional semiconductor manufacturing equipment for processing semiconductor wafers. Fig. 2A is a schematic view of a conventional wafer transfer box in a semiconductor manufacturing equipment shown in Fig. 1 and located in a load-locking vacuum chamber. Fig. 2B is a partial enlarged view of the portion "A" indicated by an oval dashed line in Fig. 2A, in which a storage groove of the conventional wafer transfer box is explained. Fig. 3 is a schematic plan view showing a semiconductor manufacturing apparatus for processing a semiconductor wafer according to a first embodiment of the present invention. FIG. 4 is a schematic diagram of a novel wafer transfer box located in a load-locking vacuum chamber in the semiconductor manufacturing equipment shown in FIG. 3. FIG. Fig. 5 is a partial enlarged view of a receiving groove portion of the novel wafer transfer cassette shown in Fig. 4. [Symbol description] 1. la, lb ~ wafer transport box 2, 2A, 2B, 2C ~ wafer tray set 2d ~ wafer tray set storage tray part 3 ~ groove part 4 A ~ lifting mechanism 4, 4 -1 ~ Drive motor 4-2 ~ Lift

第22頁 492132 圖式簡單說明 5〜堆疊載置台 6〜直線形引導件 7、7A、7B〜栓鎖機構 7 C〜栓鎖銷 8〜 收納托盤 9〜 收納溝 11〜半導體製造設備本體 1 2〜加載互鎖真空室 1 3〜處理室 14〜輸送室 1 5、3 1〜晶圓輸送機械臂 1 6〜機械臂 17〜刀片 21〜輸送載置台 22〜晶圓輸送盒 4卜半導體晶圓 pla、plb、plc、p2〜間距Page 492132 Brief description of the drawings 5 ~ Stacking stage 6 ~ Linear guides 7, 7A, 7B ~ Latch mechanism 7C ~ Latch pin 8 ~ Storage tray 9 ~ Storage groove 11 ~ Semiconductor manufacturing equipment body 1 2 ~ Loading interlocking vacuum chamber 1 3 ~ Processing chamber 14 ~ Transfer chamber 1 5, 3 1 ~ Wafer transfer robot 1 16 ~ Robot 17 ~ Blade 21 ~ Transfer mounting table 22 ~ Wafer transfer box 4 semiconductor wafer pla, plb, plc, p2 ~ pitch

第23頁Page 23

Claims (1)

六、申讀 請專利範圍 a) 晶圓; b) 托盤組 接互相 鬲度位 c) 於讓一 開。 2· 該 3. 中,該 a) b) c) 達,且 d) 台,以 而升降 4· 中,該 至 中 一種晶圓輸送盒機構,包含: 複數個晶圓托般相 皿、、且於各組内存放單一之半導體 一支撐機構,用來將田 以機械化方式撑起著,?b間、層,在-起的該晶圓 接觸,且利用該立’俾相鄰兩晶圓托盤組能夠直 置;以及, > 機構調整層疊之該晶圓托盤的 一栓鎖機構,用 標的晶圓托盤能,Λ鎖下選Λ的晶圓托盤組’以便 〕與上下相鄰之該晶圓托盤組離 晶圓二,第1項的晶圓輸送盒機構’其 冓$設置在一加載互鎖直介室中。 支圍第1項的晶圓輸送盒機構,其 一驅動馬達; 升,彳干’連接至該驅動馬達; 允VI疊3載^置4台,係經由該起降桿連接至尨驅動馬 1曰曰^^^盤挺堆疊在該堆疊載置台上;以及, # > a 、構,用以支撐該晶圓托盤與堆疊載置 使該晶圓托盤與% 為 /、择且戟置 。 教登載置口又"亥驅動馬達的驅動力 认ί申請專利範51第1項的晶圓輸送各機谌甘 栓鎖機構更包含: W、凰機構,其 少兩組栓鎖構# ^ ^ N ^, L 牛,該至V兩組拴鎖構件以第一間距VI. Application Please apply for the scope of patents a) wafers; b) the trays are connected to each other; c) they are opened. 2. · In 3., the a) b) c) is reached, and d) is raised and lowered 4 ·, the to one of the wafer transport box mechanisms includes: a plurality of wafer tray-like phase dishes, And a single semiconductor-supporting mechanism is stored in each group to support the field in a mechanized manner, b, layers, the wafers in contact with each other, and the two adjacent wafer tray groups can be placed upright using the stand; and, > a mechanism for adjusting a latching mechanism of the stacked wafer trays, using The target wafer tray can be locked, and the selected wafer tray group Λ is locked so that the wafer tray group adjacent to the upper and lower sides is separated from the wafer. The wafer transport box mechanism of the first item is set at one Load the interlocking direct mediator in the chamber. One of the drive motors supporting the wafer conveyance box mechanism of item 1 is connected to the drive motor; the VI is allowed to stack 3 units, and is connected to the drive horse 1 through the landing gear. Said ^^^ trays are stacked on the stacking stage; and # > a structure for supporting the wafer tray and the stacking placement such that the wafer tray and the wafer tray are placed at /%. The driving force of the teaching loading port and the driving force of the Hai drive motor is recognized. The wafer conveying machine of the patent application No. 51 is the first. The latching mechanism further includes: W, Phoenix mechanism, which has two sets of latching structures # ^ ^ N ^, L cattle, the two sets of locking members to V are at a first distance 第24頁 492132 六、申請專利範圍 設置在不同的高度位置,該第一間距較由彼此直接接觸的 兩相鄰層疊之晶圓托盤間之距離所界定的第二間距為大。 5. 如申請專利範圍第4項的晶圓、輸送盒機構,其 中,該栓鎖構件各自包含一栓鎖銷。 6 · 如申請專利範圍第5項的晶圓輸送盒機構,其 中,各該晶圓托盤更包含: a) —主體,具有一平坦頂面與一平坦底面及一厚 度,並具有能夠容納該栓鎖銷插入之一栓鎖孔; b) —接觸部,係由該主體向内延伸,且容許一半導 體晶圓的邊緣能夠與該接觸部的上表面接觸。 7. 如申請專利範圍第6項的晶圓輸送盒機構,其 中,該接觸部的一端為逐漸尖細狀。 8. 一種晶圓輸送盒機構,包含: a) 複數個晶圓托盤組,於各組内存放單一半導體晶 圓; b) —支撐機構,用來將彼此間層疊在一起的該晶圓 托盤組以機械化方式撐起著,俾相鄰兩晶圓托盤組能夠直 接互相接觸,且利用該支撐機構調整層疊之該晶圓托盤的 高度位置;以及, c) 一栓鎖機構,用來拴鎖選定的晶圓托盤組,俾使 由一標的晶圓托盤與其上方相鄰的一晶圓托盤間之距離所 界定的第一間距,與由該標的晶圓托盤與其下方相鄰的一 晶圓托盤間之距離所界定的第二間距,均大於由層疊在一 起且相鄰的兩晶圓托盤間之距離所界定的第三間距。Page 24 492132 VI. Scope of patent application Set at different height positions, the first distance is larger than the second distance defined by the distance between two adjacent stacked wafer trays in direct contact with each other. 5. For the wafer and cassette mechanism of item 4 of the patent application, wherein the latch members each include a latch pin. 6 · If the wafer conveyance cassette mechanism of the fifth item of the patent application, each of the wafer trays further includes: a) a main body, which has a flat top surface, a flat bottom surface and a thickness, and has a capacity to accommodate the bolt; The locking pin is inserted into one of the locking holes; b) the contact portion extends inward from the main body and allows an edge of a semiconductor wafer to contact the upper surface of the contact portion. 7. For the wafer transfer cassette mechanism according to item 6 of the patent application, wherein one end of the contact portion is gradually tapered. 8. A wafer transport box mechanism, comprising: a) a plurality of wafer tray groups storing a single semiconductor wafer in each group; b) a support mechanism for stacking the wafer tray groups on each other It is mechanized, and two adjacent wafer tray groups can directly contact each other, and the supporting mechanism is used to adjust the height position of the stacked wafer trays; and, c) a latching mechanism is used to latch the selected The wafer tray group includes a first distance defined by a distance between a target wafer tray and a wafer tray adjacent to the target wafer tray, and a distance between the target wafer tray and a wafer tray adjacent thereto below. The second distance defined by the distance is greater than the third distance defined by the distance between two stacked and adjacent wafer trays. 第25頁 492132 六、申請專利範圍 9. 如申請專利範圍第8項的晶圓輸送盒機構,其 中,該晶圓輸送盒機構是設置在一加載互鎖真空室中。 10. 如申請專利範圍第8項的晶圓輸送盒機構,其 中,該支撐機構更包含: a ) —驅動馬達; b) —升降桿,連揍至該驅動馬達; c) 一堆疊載置台,係經由該起降桿連接至該驅動馬 達,以容許將晶圓托盤組堆疊在該堆疊載置台上;以及 d) —引導件機構,用以支撐該晶圓托盤與堆疊載置 台,以使該晶圓托盤與堆疊載置台受該驅動馬達的驅動力 而升降。 11. 如申請專利範圍第8項的晶圓輸送盒機構,其 中,該栓鎖機構更包含: 至少兩組栓鎖構件,且以該第一間距將該兩栓鎖構件 設置在不同的高度位置。 12. 如申請專利範圍第11項的晶圓輸送盒機構,其 中,該栓鎖構件各自包含一栓鎖銷。 13. 如申請專利範圍第1 2項的晶圓輸送盒機構,其 中,該晶圓托盤各自更包含: a) —主體,具有一平坦頂面與一平坦底面,以及能 夠容納該栓鎖銷插入一栓鎖孔的一厚度; b) —接觸部,係由該主體向内延伸,以容許一半導 體晶圓的邊緣能夠與該接觸部的上表面接觸。 14. 如申請專利範圍第1 3項的晶圓輸送盒機構,其Page 25 492132 6. Scope of patent application 9. For example, the wafer conveyance cassette mechanism of the eighth patent application scope, wherein the wafer conveyance cassette mechanism is arranged in a loading interlocking vacuum chamber. 10. The wafer conveyance cassette mechanism according to item 8 of the patent application scope, wherein the supporting mechanism further includes: a) a driving motor; b) a lifting rod connected to the driving motor; c) a stacking stage, Is connected to the drive motor via the take-off and landing lever to allow stacking of the wafer tray group on the stacking stage; and d) a guide mechanism for supporting the wafer tray and the stacking stage so that the The wafer tray and the stacking stage are lifted by the driving force of the driving motor. 11. The wafer transport cassette mechanism according to item 8 of the patent application scope, wherein the latching mechanism further includes: at least two sets of latching members, and the two latching members are set at different height positions with the first pitch. . 12. The wafer transfer cassette mechanism of claim 11 in which the latch members each include a latch pin. 13. For example, the wafer transfer cassette mechanism of the patent application No. 12 range, wherein each of the wafer trays further includes: a) a body having a flat top surface and a flat bottom surface, and capable of accommodating the insertion of the latch pin A thickness of a latch hole; b) a contact portion extending inward from the main body to allow an edge of a semiconductor wafer to contact the upper surface of the contact portion. 14. If the wafer transfer box mechanism of item 13 of the patent application scope, 第26頁 492132 六、申請專利範圍 中,該接觸部的一端為逐漸尖、細狀。 15. 一種半導體製造設備,包含: a) 複數個處理室; b) 至少一個加載互鎖真空室,具有一第一種型態的 晶圓輸送盒; c) 一輸送室,係連接至所有處理室與加載互鎖真空 室,且具有一第一輸送機械臂; d) —晶圓載置台,具有複數個第二種型態的晶圓輸 送盒; e) —第二輸送機械臂,係設置於該輸送盒載置台與 該至少一個加載互鎖真空室間; 其中,該晶圓輸送盒更包含: f 1 ) 複數個晶圓托盤組,用來將單一半導體晶圓存放 於各組内; f 2 ) —支撐機構,用來將彼此間層疊在一起的該晶圓 托盤組以機械化方式撐起著,俾相鄰兩晶圓托盤組能夠直 接互相接觸,且利用該支撐機構調整層疊之該,晶圓托盤的 高度位置;以及 f 3 ) —栓鎖機構,用來拴鎖選定的晶圓托盤組,以便 於讓一標的晶圓托盤能夠與上下相鄰之該晶圓托盤組離 開。 16. 如申請專利範圍第1 5項的半導體製造設備,其 中,該晶圓輸送盒機構是設置在一加載互鎖真空室中。 17. 如申請專利範圍第1 5項的半導體製造設備,其Page 26 492132 6. In the scope of patent application, one end of the contact part is gradually sharp and thin. 15. A semiconductor manufacturing equipment comprising: a) a plurality of processing chambers; b) at least one loading interlocking vacuum chamber having a first type of wafer transfer box; c) a transfer chamber connected to all processes The chamber and the loading interlocking vacuum chamber have a first transfer robot arm; d) a wafer mounting table with a plurality of wafer transfer boxes of the second type; e) a second transfer robot arm, which is provided at The transfer box mounting table and the at least one loading interlocking vacuum chamber; wherein the wafer transfer box further includes: f 1) a plurality of wafer tray groups for storing a single semiconductor wafer in each group; f 2) a supporting mechanism for mechanizingly supporting the wafer tray groups stacked on each other, so that two adjacent wafer tray groups can directly contact each other, and the supporting mechanism is used to adjust the stacking position, The height position of the wafer tray; and f 3)-a latching mechanism for locking the selected wafer tray group, so that a target wafer tray can be separated from the wafer tray group adjacent to each other. 16. The semiconductor manufacturing equipment according to item 15 of the patent application scope, wherein the wafer transfer cassette mechanism is provided in a load-locking vacuum chamber. 17. For the semiconductor manufacturing equipment with the scope of patent application No. 15 which 第27頁 492132 六、申請專利範圍 中’該支撐機構更包含: a) —驅動馬達; b) —升降桿,連接至該驅動馬達; ^ ,τ Μ χ牧芏該驅勁內逐; / 堆疊載置台,係經由該起降桿連接至該驅動馬 ’以容許將晶圓托盤組堆疊在該堆疊载置a上·以及, 而升=使該晶圓托盤與堆疊載置台受該驅動馬達的驅動力 18. 如申請專利範圍第丨 中,該栓鎖機構更包含: t卞體1造认備’其 至少兩組栓鎖構件,兮 + 設置在不同的高度位置,二兩、'且栓鎖構件以第一間距 兩相鄰層疊之晶圓托般 ,距較由彼此直接接觸的19. *申請專利。=所界定的第二間距為大 該栓鎖構件各自包含— 、的半導體製造設備,其 20·如中請專利範圍第二:鱗二、 該晶圓托盤各自更包含·、的半導體製造設備’其 a) —主體,具有一平3垣 並具有能夠容納該栓鎖銷插面與一平坦底面及一厚 b) 一接觸部,係由該主番入之一栓鎖孔; 體晶圓的邊緣能夠與該接觸部的向^内延伸,且容許一半v 21·如申請專利範圍第20項的::接觸。供焦 中,該接觸部的一端為逐漸尖細狀。V體製造δ又備/、 2 2. —種半導體製造設備,包含· 達 台 中 中 度 492132 六、申請專利範圍 a) 複數個處理室; b) 至少一個加載互鎖真空室,具有一第一種型態的 晶圓輸送盒; c) 一輸送室,係連接至所有處理室與加載互鎖真空 室,且具有一第一輸送機械臂; d) —晶圓載置台,具有複數個第二種型態的晶圓輸 送盒; e) —第二輸送機械臂,係設置於該輸送盒載置台與 該至少一個加載互鎖真空室間; 其中,該晶圓輸送盒更包含: f 1 ) 複數個晶圓托盤組,用來將單一半導體晶圓存放 於各組内; f 2 ) —支撐機構,用來將彼此間層疊在一起的該晶圓 托盤組以機械化方式撐起著,俾相鄰兩晶圓托盤組能夠直 接互相接觸,且利用該支撐機構調整層疊之該晶圓托盤的 高度位置;以及 f 3 ) —栓鎖機構,用來拴鎖選定的晶圓托盤組,俾使 由一標的晶圓托盤與其上方相鄰的一晶圓托盤間之距離所 界定的第一間距,與由該標的晶圓托盤與其下方相鄰的一 晶圓托盤間之距離所界定的第二間距,均大於由層疊在一 起且相鄰的兩晶圓托盤間之距離所界定的第三間距。 23.如申請專利範圍第22項的半導體製造設備,其 中,該晶圓輸送盒機構是設置在一加載互鎖真空室中。 24 .如申請專利範圍第2 2項的半導體製造設備,其Page 27 492132 VI. In the scope of the patent application, 'the support mechanism further includes: a) — a driving motor; b) — a lifting rod connected to the driving motor; ^ τ Μ χ 芏 芏 驱 drove the drive; / stacked The mounting table is connected to the driving horse through the take-off and landing lever to allow stacking of the wafer tray group on the stacking table a, and, while raising the wafer tray and the stacking table to the driving motor. Driving force 18. As described in the scope of the patent application, the latching mechanism further includes: t body 1 is prepared to have at least two sets of latching members, Xi + set at different height positions, two, two, and * The lock member has a first pitch of two adjacent stacked wafer trays, and a distance of 19. * patented by direct contact with each other. = The second distance defined is large. The latching members each contain a semiconductor manufacturing equipment of 、 and 20, as claimed in the patent. The second scope: scale two. The wafer trays each include semiconductor manufacturing equipment of 、, ′. A) a main body, which has a flat surface and a flat bottom surface capable of accommodating the latch pin and a thick b) a contact portion, which is a latch hole formed by the main slot; the edge of the body wafer It can extend inwardly with the contact part, and allows half v 21 · As in the scope of patent application No. 20 :: contact. In the focusing, one end of the contact portion is gradually tapered. V body manufacturing δ is also available, 2. 2. A semiconductor manufacturing equipment, including · Taichung Moderate 492132 6. Patent application scope a) Multiple processing chambers; b) At least one loading interlocking vacuum chamber with a first Various types of wafer transfer boxes; c) a transfer room, which is connected to all processing chambers and loading interlocking vacuum chambers, and has a first transfer robot arm; d)-a wafer mounting table, with a plurality of second types A type of wafer transfer box; e) a second transfer robot arm disposed between the transfer box mounting table and the at least one loading interlocking vacuum chamber; wherein the wafer transfer box further includes: f 1) a plurality of F wafer tray groups, used to store a single semiconductor wafer in each group; f 2)-a support mechanism, used to mechanically support the wafer tray groups stacked on each other, adjacent to each other The two wafer tray groups can directly contact each other, and use the support mechanism to adjust the height position of the stacked wafer trays; and f 3)-a latching mechanism for locking the selected wafer tray group, Subject crystal The first gap defined by the distance between the tray and an adjacent wafer tray above it, and the second gap defined by the distance between the target wafer tray and an adjacent wafer tray below it are both larger than the stack A third distance defined by the distance between two adjacent and adjacent wafer trays. 23. The semiconductor manufacturing equipment of claim 22, wherein the wafer transfer cassette mechanism is provided in a load-locking vacuum chamber. 24. If the semiconductor manufacturing equipment of the 22nd scope of the patent application, 第29頁 492132 六、申請專利範圍 中,該支撐機構更包含: a ) —驅動馬達; b) —升降桿,連接至該驅動馬達; c ) 一堆疊載置台,係經由該起降桿連接至該驅動馬 達,以容許將晶圓托盤組堆疊在該堆疊載置台上;以及, d) —引導件機構,兩以支撐該晶圓托盤與堆疊載置 台,以使該晶圓托盤與堆疊載置台受該驅動馬達的驅動力 而升降。 25. 如申請專利範圍第2 2項的半導體製造設備,其 中,該栓鎖機構更包含: ’ 至少兩組栓鎖構件,且以該第一間距將該兩栓鎖構件 設置在不同的高度位置。 26. 如申請專利範圍第25項的半導體製造設備,其 中,該栓鎖構件各自包含一栓鎖銷。 2 7.如申請專利範圍第2 6項的半導體製造設備,其 中,各該晶圓托盤更包含: a) —主體,具有一平坦頂面與一平坦底面及一厚 度,並具有能夠容納該栓鎖銷插入之一栓鎖孔; b) —接觸部,係由該主體向内延伸,且容許一半導 體晶圓的邊緣能夠與該接觸部的上表面接觸。 28.如申請專利範圍第27項的半導體製造設備,其 中,該接觸部的一端為逐漸尖細狀。Page 492132 6. In the scope of the patent application, the support mechanism further includes: a) a driving motor; b) a lifting rod connected to the driving motor; c) a stacking platform connected to the lifting rod via The driving motor to allow the wafer tray group to be stacked on the stacking stage; and, d) a guide mechanism for supporting the wafer tray and the stacking stage so that the wafer tray and the stacking stage Lifted by the driving force of the drive motor. 25. The semiconductor manufacturing equipment according to item 22 of the scope of patent application, wherein the latching mechanism further includes: 'At least two sets of latching members, and the two latching members are set at different height positions with the first pitch. . 26. The semiconductor manufacturing apparatus of claim 25, wherein the latch members each include a latch pin. 2 7. The semiconductor manufacturing equipment according to item 26 of the patent application scope, wherein each of the wafer trays further includes: a) a main body having a flat top surface, a flat bottom surface and a thickness, and having a capacity capable of accommodating the bolt The locking pin is inserted into one of the locking holes; b) the contact portion extends inward from the main body and allows an edge of a semiconductor wafer to contact the upper surface of the contact portion. 28. The semiconductor manufacturing apparatus according to claim 27, wherein one end of the contact portion is gradually tapered. 第30頁Page 30
TW090103681A 2000-02-16 2001-02-16 Semiconductor manufacturing apparatus with an improved wafer cassette TW492132B (en)

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