TW445459B - Method and device for chemical decontaminating for structural part of radiation handling facility - Google Patents

Method and device for chemical decontaminating for structural part of radiation handling facility Download PDF

Info

Publication number
TW445459B
TW445459B TW88122567A TW88122567A TW445459B TW 445459 B TW445459 B TW 445459B TW 88122567 A TW88122567 A TW 88122567A TW 88122567 A TW88122567 A TW 88122567A TW 445459 B TW445459 B TW 445459B
Authority
TW
Taiwan
Prior art keywords
ozone
decontamination
mentioned
solution
aqueous solution
Prior art date
Application number
TW88122567A
Other languages
English (en)
Chinese (zh)
Inventor
Yumi Yaita
Masami Enda
Hitoshi Sakai
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of TW445459B publication Critical patent/TW445459B/zh

Links

Landscapes

  • Apparatus For Disinfection Or Sterilisation (AREA)
TW88122567A 1998-06-23 1999-12-21 Method and device for chemical decontaminating for structural part of radiation handling facility TW445459B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17546398 1998-06-23
JP13289299A JP3859902B2 (ja) 1998-06-23 1999-05-13 放射線取扱施設の構造部品の化学除染方法及びその装置

Publications (1)

Publication Number Publication Date
TW445459B true TW445459B (en) 2001-07-11

Family

ID=26467352

Family Applications (1)

Application Number Title Priority Date Filing Date
TW88122567A TW445459B (en) 1998-06-23 1999-12-21 Method and device for chemical decontaminating for structural part of radiation handling facility

Country Status (2)

Country Link
JP (1) JP3859902B2 (ja)
TW (1) TW445459B (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101385093B (zh) * 2006-02-09 2013-03-27 株式会社东芝 化学除污装置以及化学除污方法
CN110391032A (zh) * 2019-06-20 2019-10-29 中国辐射防护研究院 放射性废树脂芬顿氧化废液电解深度净化及硫酸回收方法

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3977963B2 (ja) * 1999-09-09 2007-09-19 株式会社日立製作所 化学除染方法
JP4316100B2 (ja) * 2000-04-07 2009-08-19 株式会社東芝 原子力発電プラントの洗浄方法
TW529041B (en) 2000-12-21 2003-04-21 Toshiba Corp Chemical decontamination method and treatment method and apparatus of chemical decontamination solution
JP4299974B2 (ja) * 2001-02-01 2009-07-22 株式会社東芝 放射線取扱い施設の構造部品の化学除染方法およびその装置
JP2003098294A (ja) * 2001-09-27 2003-04-03 Hitachi Ltd オゾンを用いた除染方法及びその装置
JP4040854B2 (ja) * 2001-09-28 2008-01-30 株式会社神戸製鋼所 放射性廃棄物の処分容器、処分施設及び処分方法
JP3614401B2 (ja) * 2001-12-25 2005-01-26 川崎重工業株式会社 トリチウム防染除染方法
JP4131814B2 (ja) * 2002-11-21 2008-08-13 株式会社東芝 放射化部品の化学除染方法および装置
JP4083607B2 (ja) * 2003-03-19 2008-04-30 株式会社東芝 放射能の化学除染方法および装置
KR100724710B1 (ko) 2002-11-21 2007-06-04 가부시끼가이샤 도시바 방사화 부품의 화학적 오염제거 시스템 및 방법
JP2004212228A (ja) * 2002-12-27 2004-07-29 Iwatani Internatl Corp 放射性物質で汚染された金属構造部品の化学除染方法
JP2006105828A (ja) * 2004-10-06 2006-04-20 Toshiba Plant Systems & Services Corp 化学除染方法
US8440876B2 (en) 2006-02-09 2013-05-14 Kabushiki Kaisha Toshiba Chemical decontamination apparatus and decontamination method therein
DE102010028457A1 (de) * 2010-04-30 2011-11-03 Areva Np Gmbh Verfahren zur Oberflächen-Dekontamination
JP6164801B2 (ja) * 2012-05-08 2017-07-19 三菱重工業株式会社 除染装置及び除染方法
CN104073836A (zh) * 2014-07-21 2014-10-01 胡松 一种膜电极电解臭氧发生器的阴极催化剂及阴极结构
JP6901947B2 (ja) * 2017-09-29 2021-07-14 三菱重工業株式会社 化学除染方法
CN111302478B (zh) * 2020-03-03 2024-03-12 清华大学 污泥及废水处理装置、污泥或废水处理方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101385093B (zh) * 2006-02-09 2013-03-27 株式会社东芝 化学除污装置以及化学除污方法
CN110391032A (zh) * 2019-06-20 2019-10-29 中国辐射防护研究院 放射性废树脂芬顿氧化废液电解深度净化及硫酸回收方法
CN110391032B (zh) * 2019-06-20 2022-07-29 中国辐射防护研究院 放射性废树脂芬顿氧化废液电解深度净化及硫酸回收方法

Also Published As

Publication number Publication date
JP2000081498A (ja) 2000-03-21
JP3859902B2 (ja) 2006-12-20

Similar Documents

Publication Publication Date Title
TW445459B (en) Method and device for chemical decontaminating for structural part of radiation handling facility
KR102122164B1 (ko) 원자력 발전소의 금속면을 제염하는 방법
EP1054413B1 (en) Method of chemically decontaminating components of radioactive material handling facility and system for carrying out the same
JP4567542B2 (ja) 原子力プラント構成部材への放射性核種の付着抑制方法
US20090185653A1 (en) Suppression Method of Radionuclide Deposition on Reactor Component of Nuclear Power Plant and Ferrite Film Formation Apparatus
US6549603B1 (en) Method of chemical decontamination
TW200416746A (en) System and method for chemical decontamination of radioactive material
JP2010266393A (ja) 化学除染方法
JP4131814B2 (ja) 放射化部品の化学除染方法および装置
JP4551843B2 (ja) 化学除染方法
JP2000346988A (ja) 再処理関連施設の金属構造材の化学除染方法
JP2009109427A (ja) 化学除染方法およびその装置
JP2008180740A (ja) 原子力プラント構成部材
JP4861252B2 (ja) 原子炉解体前の化学除染方法
JP2008036591A (ja) 廃液中の有機酸の分解方法及びその分解装置
JP2015143636A (ja) 原子力プラントの構造部材への貴金属付着方法
JP6937143B2 (ja) 化学除染装置及び化学除染方法
JP2005134407A (ja) 化学除染方法及びその装置
CN108780669B (zh) 用于处理来自金属表面的净化的废水的方法、废水处理装置和废水处理装置的用途
JP6663302B2 (ja) 有機酸溶液分解装置、及び有機酸溶液分解方法
TWI825540B (zh) 化學除汙方法及化學除汙裝置
JP2002365397A (ja) 放射性部材の除染方法
KR20110117924A (ko) 마이크로 버블을 이용한 방사성 오염물 침착 금속재의 오염 제거방법 및 이를 위한 처리장치
JP2006162277A (ja) 化学除染液処理方法およびその装置
KR20130042074A (ko) 마이크로 버블을 이용한 방사성 오염물 침착 금속재의 오염 제거 방법 및 이를 위한 처리 장치

Legal Events

Date Code Title Description
GD4A Issue of patent certificate for granted invention patent
MM4A Annulment or lapse of patent due to non-payment of fees