MX9710043A
(es )
1998-03-31
Fabricacion de dispositivos semiconductores.
WO2006060116A3
(en )
2007-03-08
Multi-bit nanocrystal memory
TW428312B
(en )
2001-04-01
A new scheme of capacitor and bit-line at same level and its fabrication method for 8F2 DRAM cell with minimum bit-line coupling noise
EP1083604A3
(en )
2005-08-31
Radiation hardened semiconductor memory
TW200511545A
(en )
2005-03-16
Storage node contact forming method and structure for use in semiconductor memory
EP1519417A3
(en )
2006-12-27
Magnetic random access memory comprising MTJ layer and method of manufacturing
TW200518268A
(en )
2005-06-01
Improved method for manufacturing a 2-transistor memory cell, and improved memory cell thus obtained
WO2004025731A3
(de )
2004-08-19
Verfahren zur herstellung von sonos-speicherzellen, sonos-speicherzelle und speicherzellenfeld
TWI264114B
(en )
2006-10-11
Nonvolatile two-transistor semiconductor memory cell and associated fabrication methods
KR100365415B1
(en )
2002-12-18
Method for manufacturing static ram cell
TW200516718A
(en )
2005-05-16
SRAM cell structure and manufacturing method thereof
TW429555B
(en )
2001-04-11
Method for making poly-spacer word line in the high density memory cell
US6380045B1
(en )
2002-04-30
Method of forming asymmetric wells for DRAM cells
WO2005067048A3
(en )
2006-03-30
Contactless flash memory array
TW341730B
(en )
1998-10-01
Process for producing a multi-level ROM
DE59607510D1
(de )
2001-09-20
Verfahren zum erzeugen der sourcebereiche eines flash-eeprom-speicherzellenfeldes
TW374246B
(en )
1999-11-11
Flash memory cell structure and method for manufacturing the same
TW276363B
(en )
1996-05-21
Fabricating method for multi-level mask read only memory
TW337604B
(en )
1998-08-01
Flash memory structure with self-aligning floating gate and process of producing the same
KR100464382B1
(ko )
2005-02-28
반도체장치의소자분리방법
TW429517B
(en )
2001-04-11
Gate oxide layer manufacturing method
TW417299B
(en )
2001-01-01
Structure of high density and low power Flash memory and its formation method
TW329547B
(en )
1998-04-11
The manufacturing method for cylindrical capacitor in memory cell of DRAM
TW370713B
(en )
1999-09-21
Method of manufacturing source structure in flash memory
TW356585B
(en )
1999-04-21
Method for minimizing component size in semiconductor processing and load register structure