TW420770B - Pellicle film, method of preparing the same and exposure method - Google Patents
Pellicle film, method of preparing the same and exposure method Download PDFInfo
- Publication number
- TW420770B TW420770B TW088115887A TW88115887A TW420770B TW 420770 B TW420770 B TW 420770B TW 088115887 A TW088115887 A TW 088115887A TW 88115887 A TW88115887 A TW 88115887A TW 420770 B TW420770 B TW 420770B
- Authority
- TW
- Taiwan
- Prior art keywords
- dust
- organic polymer
- proof film
- fluorine
- film
- Prior art date
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- FYJQJMIEZVMYSD-UHFFFAOYSA-N perfluoro-2-butyltetrahydrofuran Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C1(F)OC(F)(F)C(F)(F)C1(F)F FYJQJMIEZVMYSD-UHFFFAOYSA-N 0.000 description 1
- 125000005004 perfluoroethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 239000010451 perlite Substances 0.000 description 1
- 235000019362 perlite Nutrition 0.000 description 1
- 238000005191 phase separation Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920006389 polyphenyl polymer Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 229910052624 sepiolite Inorganic materials 0.000 description 1
- 235000019355 sepiolite Nutrition 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
- 239000011782 vitamin Substances 0.000 description 1
- 229940088594 vitamin Drugs 0.000 description 1
- 229930003231 vitamin Natural products 0.000 description 1
- 235000013343 vitamin Nutrition 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/23—Sheet including cover or casing
- Y10T428/239—Complete cover or casing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26842898 | 1998-09-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW420770B true TW420770B (en) | 2001-02-01 |
Family
ID=17458362
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW088115887A TW420770B (en) | 1998-09-22 | 1999-09-15 | Pellicle film, method of preparing the same and exposure method |
Country Status (6)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102549714A (zh) * | 2009-09-01 | 2012-07-04 | 旭硝子株式会社 | 浸液曝光装置用涂布材料组合物、叠层体、叠层体的形成方法以及浸液曝光装置 |
| TWI481623B (zh) * | 2010-07-08 | 2015-04-21 | Mitsui Chemicals Inc | 表層膜 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003514955A (ja) * | 1999-11-17 | 2003-04-22 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 紫外および真空紫外透過性重合体組成物およびそれらの使用 |
| KR100677782B1 (ko) * | 2000-01-17 | 2007-02-05 | 제이에스알 가부시끼가이샤 | 절연막 형성용 재료의 제조 방법 |
| US6544693B2 (en) | 2001-01-26 | 2003-04-08 | Advanced Micro Devices, Inc. | Pellicle for use in small wavelength lithography and a method for making such a pellicle |
| US6593035B1 (en) | 2001-01-26 | 2003-07-15 | Advanced Micro Devices, Inc. | Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films |
| TW200422793A (en) * | 2002-11-15 | 2004-11-01 | Mitsui Chemicals Inc | Pellicle with small gas production amount |
| KR20080098403A (ko) * | 2006-02-01 | 2008-11-07 | 미쓰이 가가쿠 가부시키가이샤 | 고개구수 노광 장치용 펠리클 |
| JP2007267272A (ja) * | 2006-03-29 | 2007-10-11 | Matsushita Electric Ind Co Ltd | コンデンサマイクロフォン |
| KR101164460B1 (ko) * | 2006-04-07 | 2012-07-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 리소그래피용 펠리클 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4970099A (en) * | 1989-05-19 | 1990-11-13 | E. I. Du Pont De Nemours And Company | Perfluoropolymer coated pellicles |
| US5061024C1 (en) | 1989-09-06 | 2002-02-26 | Dupont Photomasks Inc | Amorphous fluoropolymer pellicle films |
| DE69019268T2 (de) * | 1989-09-06 | 1995-11-09 | Du Pont | Nichtreflektierende Filmabdeckung. |
| JP2524436B2 (ja) * | 1990-09-18 | 1996-08-14 | インターナショナル・ビジネス・マシーンズ・コーポレイション | 表面処理方法 |
| JP3088783B2 (ja) * | 1991-06-20 | 2000-09-18 | 旭化成工業株式会社 | 高透過性ペリクル |
| JP3186844B2 (ja) * | 1992-06-22 | 2001-07-11 | 旭化成株式会社 | ペリクルおよびその製造方法 |
| JPH0885728A (ja) * | 1994-07-20 | 1996-04-02 | Mitsui Petrochem Ind Ltd | 含フッ素樹脂薄膜の製造方法 |
| JPH08220734A (ja) * | 1995-02-10 | 1996-08-30 | Asahi Glass Co Ltd | ペリクル用薄膜 |
| JP3433658B2 (ja) * | 1997-11-21 | 2003-08-04 | 三井化学株式会社 | リソグラフィにおけるペリクル膜の劣化防止方法 |
-
1999
- 1999-09-15 TW TW088115887A patent/TW420770B/zh not_active IP Right Cessation
- 1999-09-18 KR KR1019990040269A patent/KR20000023289A/ko not_active Application Discontinuation
- 1999-09-21 CA CA002282924A patent/CA2282924A1/en not_active Abandoned
- 1999-09-21 SG SG9904402A patent/SG87830A1/en unknown
- 1999-09-22 EP EP99118048A patent/EP0989457A3/en not_active Withdrawn
- 1999-09-22 US US09/404,241 patent/US6620555B1/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102549714A (zh) * | 2009-09-01 | 2012-07-04 | 旭硝子株式会社 | 浸液曝光装置用涂布材料组合物、叠层体、叠层体的形成方法以及浸液曝光装置 |
| TWI481623B (zh) * | 2010-07-08 | 2015-04-21 | Mitsui Chemicals Inc | 表層膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20000023289A (ko) | 2000-04-25 |
| CA2282924A1 (en) | 2000-03-22 |
| EP0989457A2 (en) | 2000-03-29 |
| SG87830A1 (en) | 2002-04-16 |
| US6620555B1 (en) | 2003-09-16 |
| EP0989457A3 (en) | 2000-05-03 |
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Legal Events
| Date | Code | Title | Description |
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| GD4A | Issue of patent certificate for granted invention patent | ||
| MM4A | Annulment or lapse of patent due to non-payment of fees |