TW398052B - Inspecting method and apparatus for repeated micro-miniature patterns - Google Patents

Inspecting method and apparatus for repeated micro-miniature patterns Download PDF

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Publication number
TW398052B
TW398052B TW087112763A TW87112763A TW398052B TW 398052 B TW398052 B TW 398052B TW 087112763 A TW087112763 A TW 087112763A TW 87112763 A TW87112763 A TW 87112763A TW 398052 B TW398052 B TW 398052B
Authority
TW
Taiwan
Prior art keywords
image
foreign object
inspected
foreign
scattered light
Prior art date
Application number
TW087112763A
Other languages
English (en)
Chinese (zh)
Inventor
Junichi Taguchi
Aritoshi Sugimoto
Masami Ikoda
Hiroko Inoue
Tetsuya Watanabe
Original Assignee
Hitachi Electr Eng
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP22583697A external-priority patent/JP3938227B2/ja
Priority claimed from JP17960598A external-priority patent/JP4052733B2/ja
Application filed by Hitachi Electr Eng filed Critical Hitachi Electr Eng
Application granted granted Critical
Publication of TW398052B publication Critical patent/TW398052B/zh

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N21/95607—Inspecting patterns on the surface of objects using a comparative method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8822—Dark field detection
    • G01N2021/8825—Separate detection of dark field and bright field

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Pathology (AREA)
  • Immunology (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW087112763A 1997-08-07 1998-08-03 Inspecting method and apparatus for repeated micro-miniature patterns TW398052B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22583697A JP3938227B2 (ja) 1997-08-07 1997-08-07 異物検査方法および装置
JP17960598A JP4052733B2 (ja) 1998-06-11 1998-06-11 パターン付きウエハの異物検査方法

Publications (1)

Publication Number Publication Date
TW398052B true TW398052B (en) 2000-07-11

Family

ID=26499403

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087112763A TW398052B (en) 1997-08-07 1998-08-03 Inspecting method and apparatus for repeated micro-miniature patterns

Country Status (2)

Country Link
KR (1) KR100564871B1 (ko)
TW (1) TW398052B (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4591802B2 (ja) * 2000-09-13 2010-12-01 株式会社ニコン 表面検査装置および方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62237305A (ja) * 1986-04-08 1987-10-17 Dainippon Printing Co Ltd パタ−ン欠陥検査方法
JP3314440B2 (ja) * 1993-02-26 2002-08-12 株式会社日立製作所 欠陥検査装置およびその方法

Also Published As

Publication number Publication date
KR19990023403A (ko) 1999-03-25
KR100564871B1 (ko) 2006-05-25

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MM4A Annulment or lapse of patent due to non-payment of fees