TW376528B - Semiconductor device manufacturing apparatus and method employing chemicals in liquid form, such as developing solution, photoresist solution or the like - Google Patents

Semiconductor device manufacturing apparatus and method employing chemicals in liquid form, such as developing solution, photoresist solution or the like

Info

Publication number
TW376528B
TW376528B TW084111659A TW84111659A TW376528B TW 376528 B TW376528 B TW 376528B TW 084111659 A TW084111659 A TW 084111659A TW 84111659 A TW84111659 A TW 84111659A TW 376528 B TW376528 B TW 376528B
Authority
TW
Taiwan
Prior art keywords
semiconductor device
device manufacturing
liquid form
manufacturing apparatus
solution
Prior art date
Application number
TW084111659A
Other languages
English (en)
Inventor
Jang-Hoon Kim
Dong-Heui Jang
Sang-Kap Kim
Jeong-Yeal Kim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Application granted granted Critical
Publication of TW376528B publication Critical patent/TW376528B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • H10P95/00—
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW084111659A 1995-07-26 1995-11-03 Semiconductor device manufacturing apparatus and method employing chemicals in liquid form, such as developing solution, photoresist solution or the like TW376528B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950022313A KR970008315A (ko) 1995-07-26 1995-07-26 반도체장치

Publications (1)

Publication Number Publication Date
TW376528B true TW376528B (en) 1999-12-11

Family

ID=19421660

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084111659A TW376528B (en) 1995-07-26 1995-11-03 Semiconductor device manufacturing apparatus and method employing chemicals in liquid form, such as developing solution, photoresist solution or the like

Country Status (5)

Country Link
JP (1) JPH0945615A (zh)
KR (1) KR970008315A (zh)
DE (1) DE19540010A1 (zh)
GB (1) GB2303564B (zh)
TW (1) TW376528B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8777189B2 (en) 2005-04-25 2014-07-15 Entegris, Inc. Method and apparatus for treating fluids to reduce microbubbles

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW535216B (en) * 1996-09-13 2003-06-01 Tokyo Electron Ltd Photoresist processing method and photoresist processing system
DE10345379B3 (de) * 2003-09-30 2005-06-02 Advanced Micro Devices, Inc., Sunnyvale Vorratstank für Prozessflüssigkeiten mit einer reduzierten Menge an Blasen und Verfahren zum Betreiben desselben
DE102005004361B4 (de) 2005-01-31 2006-12-07 Advanced Micro Devices, Inc., Sunnyvale Vorrichtung und Verfahren zum Entfernen von Blasen aus einer Prozessflüssigkeit
JP5967045B2 (ja) * 2013-10-02 2016-08-10 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0252005A (ja) * 1988-08-12 1990-02-21 Japan Gore Tex Inc 脱気機構
JPH0745001B2 (ja) * 1990-09-11 1995-05-17 シーケーディ株式会社 液体供給装置及び脱泡方法
JP2652301B2 (ja) * 1992-05-28 1997-09-10 株式会社荏原製作所 洗浄水製造装置
CA2141612C (en) * 1992-08-07 1999-03-09 Yasutoshi Senoo Improvement to membrane type deaerator
EP0598424A3 (en) * 1992-11-16 1996-05-15 Novellus Systems Inc Device for removing dissolved gas from a liquid.
EP0622475A1 (en) * 1993-04-29 1994-11-02 Applied Materials, Inc. Method and apparatus for degassing semiconductor processing liquids

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8777189B2 (en) 2005-04-25 2014-07-15 Entegris, Inc. Method and apparatus for treating fluids to reduce microbubbles
US9333443B2 (en) 2005-04-25 2016-05-10 Entegris, Inc. Method and apparatus for treating fluids to reduce microbubbles

Also Published As

Publication number Publication date
GB9522520D0 (en) 1996-01-03
GB2303564B (en) 1998-12-30
KR970008315A (ko) 1997-02-24
GB2303564A (en) 1997-02-26
JPH0945615A (ja) 1997-02-14
DE19540010A1 (de) 1997-01-30

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