GB9522520D0 - Semiconductor device manufacturing apparatus and manufacturing method - Google Patents
Semiconductor device manufacturing apparatus and manufacturing methodInfo
- Publication number
- GB9522520D0 GB9522520D0 GBGB9522520.7A GB9522520A GB9522520D0 GB 9522520 D0 GB9522520 D0 GB 9522520D0 GB 9522520 A GB9522520 A GB 9522520A GB 9522520 D0 GB9522520 D0 GB 9522520D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- manufacturing
- semiconductor device
- manufacturing apparatus
- device manufacturing
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0031—Degasification of liquids by filtration
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950022313A KR970008315A (en) | 1995-07-26 | 1995-07-26 | Semiconductor device |
Publications (3)
Publication Number | Publication Date |
---|---|
GB9522520D0 true GB9522520D0 (en) | 1996-01-03 |
GB2303564A GB2303564A (en) | 1997-02-26 |
GB2303564B GB2303564B (en) | 1998-12-30 |
Family
ID=19421660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB9522520A Expired - Fee Related GB2303564B (en) | 1995-07-26 | 1995-11-03 | Semiconductor device manufacturing apparatus and manufacturing method |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH0945615A (en) |
KR (1) | KR970008315A (en) |
DE (1) | DE19540010A1 (en) |
GB (1) | GB2303564B (en) |
TW (1) | TW376528B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW535216B (en) * | 1996-09-13 | 2003-06-01 | Tokyo Electron Ltd | Photoresist processing method and photoresist processing system |
DE10345379B3 (en) * | 2003-09-30 | 2005-06-02 | Advanced Micro Devices, Inc., Sunnyvale | Storage tank for process liquids with a reduced amount of bubbles and method for operating the same |
DE102005004361B4 (en) | 2005-01-31 | 2006-12-07 | Advanced Micro Devices, Inc., Sunnyvale | Apparatus and method for removing bubbles from a process fluid |
EP1874446A1 (en) | 2005-04-25 | 2008-01-09 | Entegris, Inc. | Method and apparatus for treating fluids to reduce microbubbles |
JP5967045B2 (en) * | 2013-10-02 | 2016-08-10 | 東京エレクトロン株式会社 | Treatment liquid supply apparatus and treatment liquid supply method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0252005A (en) * | 1988-08-12 | 1990-02-21 | Japan Gore Tex Inc | Deaeration mechanism |
JPH0745001B2 (en) * | 1990-09-11 | 1995-05-17 | シーケーディ株式会社 | Liquid supply device and defoaming method |
JP2652301B2 (en) * | 1992-05-28 | 1997-09-10 | 株式会社荏原製作所 | Cleaning water production equipment |
WO1994003397A1 (en) * | 1992-08-07 | 1994-02-17 | Miura Co., Ltd. | Improvement to membrane type deaerator |
EP0598424A3 (en) * | 1992-11-16 | 1996-05-15 | Novellus Systems Inc | Device for removing dissolved gas from a liquid. |
EP0622475A1 (en) * | 1993-04-29 | 1994-11-02 | Applied Materials, Inc. | Method and apparatus for degassing semiconductor processing liquids |
-
1995
- 1995-07-26 KR KR1019950022313A patent/KR970008315A/en not_active Application Discontinuation
- 1995-10-27 DE DE19540010A patent/DE19540010A1/en not_active Withdrawn
- 1995-11-03 TW TW084111659A patent/TW376528B/en active
- 1995-11-03 GB GB9522520A patent/GB2303564B/en not_active Expired - Fee Related
-
1996
- 1996-03-26 JP JP8097769A patent/JPH0945615A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
JPH0945615A (en) | 1997-02-14 |
TW376528B (en) | 1999-12-11 |
GB2303564B (en) | 1998-12-30 |
KR970008315A (en) | 1997-02-24 |
DE19540010A1 (en) | 1997-01-30 |
GB2303564A (en) | 1997-02-26 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19991103 |