KR970008315A - Semiconductor device - Google Patents
Semiconductor device Download PDFInfo
- Publication number
- KR970008315A KR970008315A KR1019950022313A KR19950022313A KR970008315A KR 970008315 A KR970008315 A KR 970008315A KR 1019950022313 A KR1019950022313 A KR 1019950022313A KR 19950022313 A KR19950022313 A KR 19950022313A KR 970008315 A KR970008315 A KR 970008315A
- Authority
- KR
- South Korea
- Prior art keywords
- semiconductor device
- degassing
- developer
- chemical agent
- liquid chemical
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0031—Degasification of liquids by filtration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
웨이퍼 상의 잔 기포를 제거할 수 있는 반도체장치가 개시되어 있다. 액체 화학제를 사용하여 반도체 제조공정을 수행하는 반도체장치에 있어서, 상기 액체 화학제 속에 포함되어 있는 기체를 제거하기 위해 기체분압을 저하시켜 탈기시키는 진공펌프를 갖는 탈기설비를 구비한다. 현상액과 같은 액체 속에 포함되어 있는 잔 기포를 제거함으로써, 공정불량의 발생을 방지할 수 있다.A semiconductor device capable of removing residual bubbles on a wafer is disclosed. A semiconductor device for performing a semiconductor manufacturing process using a liquid chemical agent, comprising a degassing facility having a vacuum pump for degassing by lowering the gas partial pressure to remove gas contained in the liquid chemical agent. By removing the residual bubbles contained in the liquid such as the developer, it is possible to prevent the generation of process defects.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.
제4도는 본 발명에 의한 탈기설비를 갖는 현상장치의 배관도, 제5도는 탈기설비의 기본 시스템을 나타내는 구성도.4 is a piping diagram of a developing apparatus having a degassing apparatus according to the present invention, and FIG. 5 is a block diagram showing a basic system of the degassing apparatus.
Claims (3)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950022313A KR970008315A (en) | 1995-07-26 | 1995-07-26 | Semiconductor device |
DE19540010A DE19540010A1 (en) | 1995-07-26 | 1995-10-27 | Plant and method for semiconductor component production |
TW084111659A TW376528B (en) | 1995-07-26 | 1995-11-03 | Semiconductor device manufacturing apparatus and method employing chemicals in liquid form, such as developing solution, photoresist solution or the like |
GB9522520A GB2303564B (en) | 1995-07-26 | 1995-11-03 | Semiconductor device manufacturing apparatus and manufacturing method |
JP8097769A JPH0945615A (en) | 1995-07-26 | 1996-03-26 | Manufacturing device of semiconductor element and preparation using this |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019950022313A KR970008315A (en) | 1995-07-26 | 1995-07-26 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
KR970008315A true KR970008315A (en) | 1997-02-24 |
Family
ID=19421660
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019950022313A KR970008315A (en) | 1995-07-26 | 1995-07-26 | Semiconductor device |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH0945615A (en) |
KR (1) | KR970008315A (en) |
DE (1) | DE19540010A1 (en) |
GB (1) | GB2303564B (en) |
TW (1) | TW376528B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW535216B (en) * | 1996-09-13 | 2003-06-01 | Tokyo Electron Ltd | Photoresist processing method and photoresist processing system |
DE10345379B3 (en) * | 2003-09-30 | 2005-06-02 | Advanced Micro Devices, Inc., Sunnyvale | Storage tank for process liquids with a reduced amount of bubbles and method for operating the same |
DE102005004361B4 (en) | 2005-01-31 | 2006-12-07 | Advanced Micro Devices, Inc., Sunnyvale | Apparatus and method for removing bubbles from a process fluid |
US8777189B2 (en) | 2005-04-25 | 2014-07-15 | Entegris, Inc. | Method and apparatus for treating fluids to reduce microbubbles |
JP5967045B2 (en) * | 2013-10-02 | 2016-08-10 | 東京エレクトロン株式会社 | Treatment liquid supply apparatus and treatment liquid supply method |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0252005A (en) * | 1988-08-12 | 1990-02-21 | Japan Gore Tex Inc | Deaeration mechanism |
JPH0745001B2 (en) * | 1990-09-11 | 1995-05-17 | シーケーディ株式会社 | Liquid supply device and defoaming method |
JP2652301B2 (en) * | 1992-05-28 | 1997-09-10 | 株式会社荏原製作所 | Cleaning water production equipment |
CA2141612C (en) * | 1992-08-07 | 1999-03-09 | Yasutoshi Senoo | Improvement to membrane type deaerator |
EP0598424A3 (en) * | 1992-11-16 | 1996-05-15 | Novellus Systems Inc | Device for removing dissolved gas from a liquid. |
EP0622475A1 (en) * | 1993-04-29 | 1994-11-02 | Applied Materials, Inc. | Method and apparatus for degassing semiconductor processing liquids |
-
1995
- 1995-07-26 KR KR1019950022313A patent/KR970008315A/en not_active Application Discontinuation
- 1995-10-27 DE DE19540010A patent/DE19540010A1/en not_active Withdrawn
- 1995-11-03 GB GB9522520A patent/GB2303564B/en not_active Expired - Fee Related
- 1995-11-03 TW TW084111659A patent/TW376528B/en active
-
1996
- 1996-03-26 JP JP8097769A patent/JPH0945615A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
GB2303564B (en) | 1998-12-30 |
DE19540010A1 (en) | 1997-01-30 |
JPH0945615A (en) | 1997-02-14 |
GB9522520D0 (en) | 1996-01-03 |
GB2303564A (en) | 1997-02-26 |
TW376528B (en) | 1999-12-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E601 | Decision to refuse application |