KR970008315A - Semiconductor device - Google Patents

Semiconductor device Download PDF

Info

Publication number
KR970008315A
KR970008315A KR1019950022313A KR19950022313A KR970008315A KR 970008315 A KR970008315 A KR 970008315A KR 1019950022313 A KR1019950022313 A KR 1019950022313A KR 19950022313 A KR19950022313 A KR 19950022313A KR 970008315 A KR970008315 A KR 970008315A
Authority
KR
South Korea
Prior art keywords
semiconductor device
degassing
developer
chemical agent
liquid chemical
Prior art date
Application number
KR1019950022313A
Other languages
Korean (ko)
Inventor
김장훈
장동희
김상갑
김정렬
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019950022313A priority Critical patent/KR970008315A/en
Priority to DE19540010A priority patent/DE19540010A1/en
Priority to TW084111659A priority patent/TW376528B/en
Priority to GB9522520A priority patent/GB2303564B/en
Priority to JP8097769A priority patent/JPH0945615A/en
Publication of KR970008315A publication Critical patent/KR970008315A/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

웨이퍼 상의 잔 기포를 제거할 수 있는 반도체장치가 개시되어 있다. 액체 화학제를 사용하여 반도체 제조공정을 수행하는 반도체장치에 있어서, 상기 액체 화학제 속에 포함되어 있는 기체를 제거하기 위해 기체분압을 저하시켜 탈기시키는 진공펌프를 갖는 탈기설비를 구비한다. 현상액과 같은 액체 속에 포함되어 있는 잔 기포를 제거함으로써, 공정불량의 발생을 방지할 수 있다.A semiconductor device capable of removing residual bubbles on a wafer is disclosed. A semiconductor device for performing a semiconductor manufacturing process using a liquid chemical agent, comprising a degassing facility having a vacuum pump for degassing by lowering the gas partial pressure to remove gas contained in the liquid chemical agent. By removing the residual bubbles contained in the liquid such as the developer, it is possible to prevent the generation of process defects.

Description

반도체장치Semiconductor device

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제4도는 본 발명에 의한 탈기설비를 갖는 현상장치의 배관도, 제5도는 탈기설비의 기본 시스템을 나타내는 구성도.4 is a piping diagram of a developing apparatus having a degassing apparatus according to the present invention, and FIG. 5 is a block diagram showing a basic system of the degassing apparatus.

Claims (3)

액체 화학제를 사용하여 반도체 제조공정을 수행하는 반도체장치에 있어서, 상기 액체 화학제 속에 포함되어 있는 기체를 제거하기 위해 기체분압을 저하시켜 탈기시키는 진공펌프를 갖는 탈기설비를 구비하는 것을 특징으로 하는 반도체장치.A semiconductor device for performing a semiconductor manufacturing process using a liquid chemical agent, comprising: a degassing facility having a vacuum pump for degassing by lowering the gas partial pressure to remove a gas contained in the liquid chemical agent Semiconductor device. 주 탱크로부터 현상액을 공급받아 일정량을 저장하는 중간탱크; 상기 현상액에 존재하는 먼지를 걸러내기 위한 필터; 및 상기 중간탱크와 필터 사이에 위치하며, 상기 현상액 속에 포함된 기체를 제거하기 위한 진공펌프를 갖는 탈기설비를 구비하는 것을 특징으로 하는 반도체장치.An intermediate tank for receiving a developer from a main tank and storing a predetermined amount; A filter for filtering dust present in the developer; And a degassing device positioned between the intermediate tank and the filter and having a vacuum pump for removing gas contained in the developer. 제2항에 있어서, 상기 탈기설비의 직경은 약 99ψ이고 길이는 약 260㎜인 것을 특징으로 하는 반도체장치.3. The semiconductor device according to claim 2, wherein the diameter of the degassing unit is about 99, and the length is about 260 mm. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019950022313A 1995-07-26 1995-07-26 Semiconductor device KR970008315A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1019950022313A KR970008315A (en) 1995-07-26 1995-07-26 Semiconductor device
DE19540010A DE19540010A1 (en) 1995-07-26 1995-10-27 Plant and method for semiconductor component production
TW084111659A TW376528B (en) 1995-07-26 1995-11-03 Semiconductor device manufacturing apparatus and method employing chemicals in liquid form, such as developing solution, photoresist solution or the like
GB9522520A GB2303564B (en) 1995-07-26 1995-11-03 Semiconductor device manufacturing apparatus and manufacturing method
JP8097769A JPH0945615A (en) 1995-07-26 1996-03-26 Manufacturing device of semiconductor element and preparation using this

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019950022313A KR970008315A (en) 1995-07-26 1995-07-26 Semiconductor device

Publications (1)

Publication Number Publication Date
KR970008315A true KR970008315A (en) 1997-02-24

Family

ID=19421660

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019950022313A KR970008315A (en) 1995-07-26 1995-07-26 Semiconductor device

Country Status (5)

Country Link
JP (1) JPH0945615A (en)
KR (1) KR970008315A (en)
DE (1) DE19540010A1 (en)
GB (1) GB2303564B (en)
TW (1) TW376528B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW535216B (en) * 1996-09-13 2003-06-01 Tokyo Electron Ltd Photoresist processing method and photoresist processing system
DE10345379B3 (en) * 2003-09-30 2005-06-02 Advanced Micro Devices, Inc., Sunnyvale Storage tank for process liquids with a reduced amount of bubbles and method for operating the same
DE102005004361B4 (en) 2005-01-31 2006-12-07 Advanced Micro Devices, Inc., Sunnyvale Apparatus and method for removing bubbles from a process fluid
US8777189B2 (en) 2005-04-25 2014-07-15 Entegris, Inc. Method and apparatus for treating fluids to reduce microbubbles
JP5967045B2 (en) * 2013-10-02 2016-08-10 東京エレクトロン株式会社 Treatment liquid supply apparatus and treatment liquid supply method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0252005A (en) * 1988-08-12 1990-02-21 Japan Gore Tex Inc Deaeration mechanism
JPH0745001B2 (en) * 1990-09-11 1995-05-17 シーケーディ株式会社 Liquid supply device and defoaming method
JP2652301B2 (en) * 1992-05-28 1997-09-10 株式会社荏原製作所 Cleaning water production equipment
CA2141612C (en) * 1992-08-07 1999-03-09 Yasutoshi Senoo Improvement to membrane type deaerator
EP0598424A3 (en) * 1992-11-16 1996-05-15 Novellus Systems Inc Device for removing dissolved gas from a liquid.
EP0622475A1 (en) * 1993-04-29 1994-11-02 Applied Materials, Inc. Method and apparatus for degassing semiconductor processing liquids

Also Published As

Publication number Publication date
GB2303564B (en) 1998-12-30
DE19540010A1 (en) 1997-01-30
JPH0945615A (en) 1997-02-14
GB9522520D0 (en) 1996-01-03
GB2303564A (en) 1997-02-26
TW376528B (en) 1999-12-11

Similar Documents

Publication Publication Date Title
US3591946A (en) Fluid-degassing system
KR100379648B1 (en) Resist processing method and resist processing apparatus
KR900000288A (en) Nitrogen Fluoride Gas Purification Method
KR970008315A (en) Semiconductor device
CN101477314A (en) Immersion liquid feed apparatus of immersion photo-etching machine
KR900702080A (en) Method and apparatus for cleaning objects with pollution solvents, especially halogen hydrocarbons
EP0400873B1 (en) Method and apparatus for cleaning object
KR970077287A (en) Method of processing semiconductor material
JPH0440270A (en) Cleaning method for electronic component
JP2005081302A (en) Washing method and washing device of electronic component members by supercritical fluid
KR950025911A (en) Drain Photoresist Reuse System for Photo Process Applicator
JP3797775B2 (en) Wet cleaning device for electronic material and processing method for cleaning liquid for electronic material
CN1499179A (en) Chemical treating tank with indicator for liquid level in outer trough
JP3016301B2 (en) Cleaning method
JPH0722686B2 (en) Separation membrane cleaning method
SU1440527A1 (en) Apparatus for filtering cryogenic liquids
JPS55121806A (en) Deaerator
KR20030045268A (en) Process solution circulation apparatus for chemical etching apparatus
KR19980025172A (en) Wet processing device with partition plate movable between two processing chambers
JPH11114308A (en) Coating liquid deaerator and deaerating method
JP3283190B2 (en) Resist processing apparatus and resist processing method
KR950012141A (en) Separation of liquids
RU2066709C1 (en) Method for pickling of materials
KR970033005A (en) Defoaming device
JPS59112299A (en) Water leakage testing device for open tank

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E601 Decision to refuse application