KR950025911A - Drain Photoresist Reuse System for Photo Process Applicator - Google Patents

Drain Photoresist Reuse System for Photo Process Applicator Download PDF

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Publication number
KR950025911A
KR950025911A KR1019940001899A KR19940001899A KR950025911A KR 950025911 A KR950025911 A KR 950025911A KR 1019940001899 A KR1019940001899 A KR 1019940001899A KR 19940001899 A KR19940001899 A KR 19940001899A KR 950025911 A KR950025911 A KR 950025911A
Authority
KR
South Korea
Prior art keywords
bottle
drain
piping system
photosensitive liquid
stack filter
Prior art date
Application number
KR1019940001899A
Other languages
Korean (ko)
Inventor
김문우
김정곤
박경신
신동화
Original Assignee
김광호
삼성전자 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 김광호, 삼성전자 주식회사 filed Critical 김광호
Priority to KR1019940001899A priority Critical patent/KR950025911A/en
Priority to JP7009475A priority patent/JPH07263335A/en
Priority to CN95102906A priority patent/CN1075209C/en
Publication of KR950025911A publication Critical patent/KR950025911A/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D19/00—Degasification of liquids
    • B01D19/0031—Degasification of liquids by filtration

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Coating Apparatus (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

본 발명은 반도체 포토(photo) 공정의 포토레지스트(photoresist : 이하 P/R이라 한다)도포장치에 사용되는 P/R 공급 시스템에 관한 것으로 1) 스텍필터부의 카트리지를 통해 자동 드레인되는 감광액을 P/R 바틀부로 리턴되도록 배관계를 형성하거나, 2) 중간 탱크부에서 기포를 제거하기 위하여 자동 드레인 되는 감광액 및 스텍 필터부의 카트리지를 통해 드레인되는 감광액을 모두 P/R 바틀부로 리턴되도록 배관계를 형성함으로써 P/R 손실을 줄여 원가절감 및 생산성 증가를 달성할 수 있을 뿐 아니라 바틀 교체 주기 연장으로 인해 가동을 향상에 기여할 수 있는 고신뢰성의 포토 공정 도포장치의 드레인 P/R 재사용 시스템을 실현할 수 있게 된다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a P / R supply system used in a photoresist coating apparatus of a semiconductor photo process. 1) P / S of a photoresist that is automatically drained through a cartridge of a stack filter unit. P / R by forming a piping system so as to return to the R bottle part, or 2) forming a piping system so that both the photosensitive liquid automatically drained to remove bubbles from the intermediate tank part and the photosensitive liquid drained through the cartridge of the stack filter part are returned to the P / R bottle part. In addition to reducing R losses, cost savings and increased productivity can be achieved, as well as a highly reliable photo process applicator drain P / R reuse system that can contribute to improved operation due to extended bottle replacement cycles.

Description

포토 공정 도포장치의 드레인 포토레지스트 재사용 시스템Drain Photoresist Reuse System for Photo Process Applicator

본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음Since this is an open matter, no full text was included.

제2도는 본 발명의 제1 실시예에 따른 감광액 계통도를 나타낸 개략도.2 is a schematic diagram showing a photosensitive liquid system according to a first embodiment of the present invention.

Claims (4)

P/R을 담아두는 통 역할을 하는 P/R 바틀부(bpttle)부와, 상기 P/R 바틀부와 연결되어 파티클(particle)을 제거시키기 위한 필터 역할을 하는 스텍 필터(stack filter)부와, 상기 스텍 필터부에서 P/R 토출시 기포성에 의한 코팅 불량 방지용으로 사용되는 상기 스텍 필터부에 연결된 드레인과, 웨이퍼에 P/R을 분사하는 노즐(nozzle)로 구성되는 감광액 공급 배관 시스템에 있어서, 배관의 기포제거를 위하여 드레인시키는 감광액을 P/R바틀부로 리턴하여 재사용할수 있도록 배관이 형성된 것을 특징으로 하는 포토 공정 도포장치의 드레인 P/R재사용 시스템.A P / R bottle part serving as a container for storing P / R, a stack filter part connected to the P / R bottle part to serve as a filter for removing particles, and In the photosensitive liquid supply piping system comprising a drain connected to the stack filter portion used to prevent coating failure due to foaming when P / R discharge from the stack filter unit, and a nozzle for spraying P / R on the wafer The drain P / R reuse system of the photo process coating device, characterized in that the pipe is formed to be reused by returning to the P / R bottle part to drain the bubble to remove the bubble. 제1항에 있어서, 상기 시스템은 상기 배관 시스템상에서의 P/R유무를 판단하는 중간 탱크부와, 상기 P/R바틀부와 연결되어 P/R을 펌핑시키는 P/R 펌프부와, 상기 노즐을 통해 웨이퍼에 P/R 도포시P/R 방울의 떨어짐을 막아주기 위해서 상기 P/R액을 관 안쪽으로 빨아당기는 역할을 하는 석 백 유니트(suck back unit)을 더 포함하는 것을 특징으로 하는 포토 공정 도포장치의 드레인 P/R 재사용 시스템.The system of claim 1, wherein the system comprises: an intermediate tank unit configured to determine whether P / R is present on the piping system; a P / R pump unit connected to the P / R bottle unit to pump P / R; Photos further comprising a suck back unit that serves to suck the P / R liquid into the tube to prevent the drop of P / R drops when applying the P / R to the wafer through Drain P / R reuse system for process applicator. 제2항에 있어서, 상기P/R 바틀부로 리턴되도록 구성된 배관계는 스텍 필터부의 카트리지를 통해 자동드레인 되는 감광액을 모두 P/R바틀부로 리턴되도록 구성시킨 것을 특징으로 하는 포토 공정 도포장치의 드레인 P/R재사용 시스템.3. The drain system of claim 2, wherein the piping system configured to return to the P / R bottle part is configured to return all of the photosensitive liquid automatically drained through the cartridge of the stack filter part to the P / R bottle part. R reuse system. 제2항에 있어서, 상기 P/R 바틀부로 리턴되도록 구성된 배관계는 중간 탱크부에서 기포를 제거하기 위하여 자동 트레인되는 감광액 및 스텍필터부의 카트리지를 통해 드레인 되는 감광액을 모두 P/R 바틀부로 리턴되도록 구성시킨 것을 특징으로 하는 포토 공정 도포장치의 드레인 P/R 재사용 시스템.3. The piping system of claim 2, wherein the piping system configured to return to the P / R bottle portion is configured such that all of the photosensitive liquid automatically trained to remove bubbles in the intermediate tank portion and the photosensitive liquid drained through the cartridge of the stack filter portion are returned to the P / R bottle portion. A drain P / R reuse system of a photo process coating device, characterized in that. ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.※ Note: The disclosure is based on the initial application.
KR1019940001899A 1994-02-02 1994-02-02 Drain Photoresist Reuse System for Photo Process Applicator KR950025911A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1019940001899A KR950025911A (en) 1994-02-02 1994-02-02 Drain Photoresist Reuse System for Photo Process Applicator
JP7009475A JPH07263335A (en) 1994-02-02 1995-01-25 Drain exposure film solution reuse system of photosensitive film solution coating device
CN95102906A CN1075209C (en) 1994-02-02 1995-01-28 System for supplying photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019940001899A KR950025911A (en) 1994-02-02 1994-02-02 Drain Photoresist Reuse System for Photo Process Applicator

Publications (1)

Publication Number Publication Date
KR950025911A true KR950025911A (en) 1995-09-18

Family

ID=19376657

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019940001899A KR950025911A (en) 1994-02-02 1994-02-02 Drain Photoresist Reuse System for Photo Process Applicator

Country Status (3)

Country Link
JP (1) JPH07263335A (en)
KR (1) KR950025911A (en)
CN (1) CN1075209C (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100234527B1 (en) * 1996-05-16 1999-12-15 윤종용 Vacuum apparatus of semiconductor manufacture equipment
KR20000026455A (en) * 1998-10-20 2000-05-15 윤종용 Sprayer of photoresist

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19990001552A (en) * 1997-06-16 1999-01-15 윤종용 Piping structure of spinner for semiconductor device manufacturing
JP3890229B2 (en) * 2001-12-27 2007-03-07 株式会社コガネイ Chemical liquid supply apparatus and degassing method of chemical liquid supply apparatus
US8580117B2 (en) * 2007-03-20 2013-11-12 Taiwan Semiconductor Manufactuing Company, Ltd. System and method for replacing resist filter to reduce resist filter-induced wafer defects
CN102540706A (en) * 2012-01-18 2012-07-04 上海华力微电子有限公司 Method for extending effective use time of photoresist
CN103769351B (en) * 2014-01-20 2016-08-17 北京京东方显示技术有限公司 A kind of photoresist recovery system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100234527B1 (en) * 1996-05-16 1999-12-15 윤종용 Vacuum apparatus of semiconductor manufacture equipment
KR20000026455A (en) * 1998-10-20 2000-05-15 윤종용 Sprayer of photoresist

Also Published As

Publication number Publication date
JPH07263335A (en) 1995-10-13
CN1075209C (en) 2001-11-21
CN1121845A (en) 1996-05-08

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