JPH07263335A - Drain exposure film solution reuse system of photosensitive film solution coating device - Google Patents
Drain exposure film solution reuse system of photosensitive film solution coating deviceInfo
- Publication number
- JPH07263335A JPH07263335A JP7009475A JP947595A JPH07263335A JP H07263335 A JPH07263335 A JP H07263335A JP 7009475 A JP7009475 A JP 7009475A JP 947595 A JP947595 A JP 947595A JP H07263335 A JPH07263335 A JP H07263335A
- Authority
- JP
- Japan
- Prior art keywords
- film solution
- photosensitive film
- photosensitive
- solution
- bottle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D19/00—Degasification of liquids
- B01D19/0031—Degasification of liquids by filtration
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Coating Apparatus (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体工程（photolit
hography) に使用される感光膜（photoresist, PR)の塗
布装置に関するものであり、より詳しくは、感光膜塗布
装置のドレイン感光膜再使用システムに関するものであ
る。BACKGROUND OF THE INVENTION The present invention relates to a semiconductor process (photolit).
The present invention relates to a photo-resist (PR) coating device used for hography), and more specifically, to a drain photoresist re-use system of a photoresist coating device.
【０００２】[0002]
【従来の技術】感光膜は、光が透視されるとその分子構
造が変わる物質として、半導体工程にパターンを形成す
るために使用されるものであるが、これを半導体ウエハ
に供給するための感光膜塗布装置は、前記の感光膜溶液
をフィルタリングする手段を具備すべきである。2. Description of the Related Art A photosensitive film is used as a material whose molecular structure is changed when light is seen through to form a pattern in a semiconductor process. The film coating device should include means for filtering the photosensitive film solution.
【０００３】以下、添付する図１に示す従来の感光液供
給系統図を参照して、半導体写真製版に使用される感光
膜溶液塗布装置の感光液供給システムに採用している感
光膜溶液のフィルタリング方式について説明する。Referring to the accompanying diagram of the conventional photosensitive solution supply system shown in FIG. 1, the filtering of the photosensitive film solution used in the photosensitive solution supply system of the photosensitive film solution coating apparatus used for semiconductor photoengraving is described below. The method will be described.
【０００４】図１に示すように、従来の感光膜供給系統
図の感光膜溶液供給システムの構成は、感光膜溶液を入
れる容器の役割をする感光膜溶液ボトル（bottle) １０
と、前記配管システム上の感光膜溶液の有無を判断でき
るようにセンサが設置されている中間タンク２０と、前
記中間タンク２０と連結されて配管ラインの気泡除去用
に使用されるドレインと、感光膜溶液をポンピングさせ
る感光膜溶液供給ポンプ３０と、パーティクル（partic
le）を制御させるためのスタックフィルタ（stack filt
er) ４０と、感光膜に存在する気泡によるコーティング
不良を防止するために使用される前記スタックフィルタ
４０に連結されているドレインと、ウエハに感光膜溶液
を噴射するノズル（nozzle) ６０と、前記ノズル６０を
通じてウエハに感光膜を塗布する際、感光膜溶液が滴下
することを防止するために前記感光膜溶液を管の内側に
吸い寄せる役割をするサック−バックユニット（suck b
ack unit) ５０とから構成される。As shown in FIG. 1, the structure of the conventional photosensitive film solution supply system shown in FIG. 1 is a photosensitive film solution bottle 10 which functions as a container for containing a photosensitive film solution.
An intermediate tank 20 in which a sensor is installed so as to determine the presence or absence of a photosensitive film solution on the piping system; a drain connected to the intermediate tank 20 for removing bubbles in the piping line; A photosensitive film solution supply pump 30 for pumping the film solution and particles (particulate).
le) to control the stack filter (stack filt
er) 40, a drain connected to the stack filter 40 used to prevent coating defects due to air bubbles present in the photosensitive film, a nozzle 60 for injecting a photosensitive film solution onto a wafer, and When the photoresist film is applied to the wafer through the nozzle 60, the suck-back unit sucks the photoresist solution to the inside of the tube to prevent the photoresist solution from dripping.
ack unit) 50.
【０００５】[0005]
【発明が解決しようとする課題】しかしながら、前述の
従来の感光膜溶液供給システムの配管方式は、感光膜溶
液供給ポンプ３０に感光膜溶液をポンピング後、スタッ
クフィルタ（stack filter) ４０を経て感光膜溶液が供
給されるとき、気泡性によるコーティング不良を防止す
るために、スタックフィルタ４０のカートリッジ（cart
ridge)“Ａ”に２〜３ｃｃずつ自動にドレインされて、
廃液容器に入れるようにされる。すなわち、感光膜溶液
供給ポンプ３０に感光膜溶液が供給されるとき、少量の
感光膜溶液が自動にドレインされるので、感光膜溶液の
浪費が相当量存在するという短所を有する。However, the above-described conventional piping system of the photosensitive film solution supply system is such that the photosensitive film solution is pumped to the photosensitive film solution supply pump 30 and then passed through the stack filter 40. When the solution is supplied, the cartridge (cart) of the stack filter 40 is provided to prevent coating failure due to air bubbles.
ridge) “A” is automatically drained by 2-3cc each,
It is designed to be put in a waste container. That is, when the photoresist film solution supply pump 30 is supplied with the photoresist film solution, a small amount of the photoresist film solution is automatically drained, so that the photoresist film solution is wasted.
【０００６】また、前述の従来の感光膜溶液供給システ
ムの中間タンク２０の液面センサにより、感光膜溶液が
ないことが感知されてエラー（error)が発生すると、感
光膜溶液ボトル１０を作業者が直接交換すべきである。
そのため、このとき、再び気泡を完全に制御するため
に、感光膜溶液が前記中間タンク２０に連結される廃液
容器に自動ドレインされて入れられる。その結果、上述
のように、感光膜溶液の浪費がこの場合にも存在する。Further, when the liquid level sensor of the intermediate tank 20 of the above-mentioned conventional photosensitive film solution supply system detects that there is no photosensitive film solution and an error occurs, the operator can remove the photosensitive film solution bottle 10 from the operator. Should be replaced directly.
Therefore, at this time, in order to completely control the bubbles again, the photosensitive film solution is automatically drained and put in the waste liquid container connected to the intermediate tank 20. As a result, as described above, the waste of the photosensitive film solution still exists in this case.
【０００７】本発明の目的は、前述の問題点を解決し、
（１） スタックフィルタのカートリッジを通じて自動
ドレインされる感光液が、感光膜溶液ボトル部にリター
ンされるように配管系を形成し、（２） 中間タンク部
に気泡を制御するために自動ドレインされる感光液およ
びスタックフィルタのカートリッジを通じてドレインさ
れる感光液が、全部感光膜溶液ボトル部にリターンされ
るように配管系を形成することにより、感光膜溶液損失
を減らして費用節減および生産性増加を達成できる、感
光膜塗布装置のドレイン感光膜溶液再使用システムを提
供することにある。The object of the present invention is to solve the above-mentioned problems,
(1) The photosensitive liquid that is automatically drained through the cartridge of the stack filter forms a piping system so as to be returned to the photosensitive film solution bottle portion, and (2) is automatically drained to the intermediate tank portion to control bubbles. By forming a piping system so that the photosensitive solution and the photosensitive solution drained through the cartridge of the stack filter are all returned to the photosensitive solution solution bottle portion, the photosensitive film solution loss is reduced to achieve cost reduction and productivity increase. Another object of the present invention is to provide a drain photoresist solution reuse system for a photoresist coating apparatus.
【０００８】[0008]
【課題を解決するための手段】請求項１の発明による感
光膜溶液塗布装置のドレイン感光膜溶液再使用システム
は、感光膜溶液を入れる容器の役割をする感光膜溶液ボ
トル（bottle) と、感光膜溶液ボトルに連結されて、パ
ーティクル（particle）を制御するためのフィルタの役
割をするスタックフィルタ（stack filter) と、スタッ
クフィルタに感光膜溶液を吐出する際の気泡によるコー
ティング不良防止用に使用されるスタックフィルタに連
結されるドレインと、ウエハに感光膜溶液を噴射するノ
ズル（nozzle) とにより構成される感光液供給システム
において、配管の気泡制御のためにドレインされる感光
液を感光膜溶液ボトルにリターンさせて再使用できるよ
うに配管系が形成されることを特徴としている。A drain photosensitive film solution reuse system of a photosensitive film solution coating apparatus according to the present invention comprises a photosensitive film solution bottle serving as a container for containing a photosensitive film solution, and a photosensitive film solution bottle. It is connected to the membrane solution bottle and is used as a stack filter that functions as a filter for controlling particles, and is used to prevent coating defects due to bubbles when the photosensitive membrane solution is discharged to the stack filter. In a photosensitive solution supply system consisting of a drain connected to a stack filter and a nozzle for injecting a photosensitive film solution onto a wafer, the photosensitive solution drained for controlling bubble bubbles in a pipe is used as a photosensitive film solution bottle. It is characterized in that a piping system is formed so that it can be returned to and reused.
【０００９】請求項２の発明による感光膜溶液塗布装置
のドレイン感光膜溶液再使用システムは、請求項１の発
明において、システムは、配管システム上に感光膜溶液
の有無を判断するためのセンサが設置されている中間タ
ンクと、感光膜溶液ボトルと連結されて、感光膜溶液を
ポンピングさせる感光膜溶液供給ポンプと、ノズルを通
じてウエハに感光膜溶液を塗布する際に、感光膜溶液が
滴下することを防止するために、感光膜溶液を管の内側
に吸い寄せる役割をするサック−バックユニット（suck
back unit) をさらに包含することを特徴としている。According to a second aspect of the present invention, there is provided a drain photosensitive film solution reuse system for a photosensitive film solution coating apparatus according to the first aspect of the present invention, wherein the system includes a sensor for determining the presence or absence of the photosensitive film solution on the piping system. A photosensitive film solution supply pump that is connected to the installed intermediate tank and the photosensitive film solution bottle to pump the photosensitive film solution, and the photosensitive film solution drips when applying the photosensitive film solution to the wafer through the nozzle. In order to prevent this, a suck-back unit (suck-back unit) that functions to draw the photosensitive film solution inside the tube.
back unit) is further included.
【００１０】請求項３の発明による感光膜溶液塗布装置
のドレイン感光膜溶液再使用システムは、請求項２の発
明において、感光膜溶液ボトルにリターンされるように
構成される配管系は、スタックフィルタのカートリッジ
を通じて自動にドレインされる感光液が感光膜溶液ボト
ルにリターンされるように構成されることを特徴として
いる。The drain photosensitive film solution reuse system of the photosensitive film solution coating apparatus according to the third aspect of the present invention is the same as that of the second aspect, wherein the piping system configured to be returned to the photosensitive film solution bottle is a stack filter. It is characterized in that the photosensitive liquid which is automatically drained through the cartridge is returned to the photosensitive film solution bottle.
【００１１】請求項４の発明による感光膜溶液塗布装置
のドレイン感光膜溶液再使用システムは、請求項２の発
明において、感光膜溶液ボトルにリターンされるように
構成される配管系は、中間タンクの気泡を制御するため
に自動にドレインされる感光液およびスタックフィルタ
のカートリッジを通じてドレインされる感光液を、全部
感光膜溶液ボトルにリターンさせるように構成されるこ
とを特徴としている。The drain photosensitive film solution reuse system of the photosensitive film solution coating apparatus according to a fourth aspect of the present invention is the same as that of the second aspect, wherein the piping system configured to be returned to the photosensitive film solution bottle is an intermediate tank. It is characterized in that the photosensitive liquid that is automatically drained to control the air bubbles and the photosensitive liquid that is drained through the stack filter cartridge are all returned to the photosensitive film solution bottle.
【００１２】すなわち、本発明の一例による感光膜溶液
塗布装置のドレイン感光膜溶液再使用システムの構成
は、感光膜溶液を入れる容器の役割をする感光膜溶液ボ
トル（bottle) １０と、配管システム上に感光膜溶液の
有無を判断できるようにセンサが設置されている中間タ
ンク２０と、中間タンク２０と連結されて配管ラインの
気泡防止用に使用されるドレインと、感光膜溶液をポン
ピングさせる感光膜溶液供給ポンプ３０と、パーティク
ル（particle）を制御するためのスタックフィルタ（st
ack filter) ４０と、スタックフィルタ４０に感光膜溶
液供給時気泡性によるコーティング不良防止用に使用さ
れるスタックフィルタ４０に連結されているドレイン
と、半導体ウエハに感光膜溶液を噴射するノズル（nozz
le) ６０と、ノズル６０を通じてウエハに感光膜溶液塗
布時感光膜溶液が滴下することを防止するために感光膜
溶液を管の内側に吸い寄せる役割をするサック−バック
ユニット（suck back unit) ５０とから構成される感光
液供給配管システムにおいて、配管の気泡制御のために
ドレインさせる感光液を前記の感光膜溶液ボトル１０に
リターンして再使用するように配管が形成されているこ
とを特徴としている。That is, the configuration of the drain photosensitive film solution reuse system of the photosensitive film solution coating apparatus according to an embodiment of the present invention includes a photosensitive film solution bottle 10 serving as a container for storing a photosensitive film solution, and a piping system. An intermediate tank 20 in which a sensor is installed so that the presence or absence of a photosensitive film solution can be determined, a drain that is connected to the intermediate tank 20 and is used to prevent bubbles in a pipeline, and a photosensitive film that pumps the photosensitive film solution. The solution supply pump 30 and a stack filter (st) for controlling particles
ack filter) 40, a drain connected to the stack filter 40 used to prevent coating defects due to air bubbles when supplying the photosensitive film solution to the stack filter 40, and a nozzle (nozz) for injecting the photosensitive film solution onto the semiconductor wafer.
le) 60 and a suck back unit 50 that serves to attract the photosensitive film solution to the inside of the tube to prevent the photosensitive film solution from dripping on the wafer through the nozzle 60. In the photosensitive liquid supply piping system including the above, the piping is formed so that the photosensitive liquid to be drained for controlling bubbles in the piping is returned to the photosensitive film solution bottle 10 and reused. There is.
【００１３】[0013]
【実施例】以下、添付した図面を参照して、本発明の実
施例について詳細に説明する。Embodiments of the present invention will now be described in detail with reference to the accompanying drawings.
【００１４】本発明の実施例においては、図１に示した
従来の構成と同一の部分は同一符号を使用して図示する
ものとし、重複を避けるためにこれに対する説明は省略
する。In the embodiment of the present invention, the same parts as those of the conventional structure shown in FIG. 1 are designated by the same reference numerals, and the description thereof will be omitted to avoid duplication.
【００１５】図２は、本発明の第１実施例による感光液
供給系統図を示す概略図である。図２を参照して、本発
明の第１実施例によると、従来は感光膜溶液をポンピン
グした後にスタックフィルタ４０を通って感光膜溶液が
吐出されるとき、気泡によるコーティング不良を制御す
るためにスタックフィルタ４０のカートリッジ“Ａ”に
２〜３ｃｃずつ自動ドレインされて廃液容器に入れて捨
てられていた感光膜溶液が、配管“Ｂ”を通じて感光膜
溶液ボトル１０にリターンされるように配管系を形成し
ている。すなわち、感光膜溶液の損失を減らして、感光
液使用効率が高まるように構成されていることがわか
る。FIG. 2 is a schematic diagram showing a photosensitive liquid supply system diagram according to the first embodiment of the present invention. Referring to FIG. 2, according to the first embodiment of the present invention, in order to control coating failure due to air bubbles when the photoresist film solution is discharged through the stack filter 40 after the photoresist film solution is pumped. The piping system is set so that the photosensitive film solution that has been automatically drained by 2 to 3 cc each in the cartridge “A” of the stack filter 40 and put in the waste liquid container and discarded is returned to the photosensitive film solution bottle 10 through the pipe “B”. Is forming. That is, it is understood that the loss of the photosensitive film solution is reduced and the use efficiency of the photosensitive solution is increased.
【００１６】図３は、本発明の第２実施例による感光液
供給系統図を示す概略図である。図３を参照して、本発
明の第２実施例によると、従来、スタックフィルタ４０
のカートリッジ“Ａ”に自動にドレインされて廃液容器
に入れて捨てられていた感光膜溶液のみならず、新規に
感光膜溶液ボトル１０を交換する場合に、すなわち、中
間タンク２０の液面センサにより感光膜溶液がないこと
が感知されてエラーが発生したことにより感光膜溶液ボ
トル１０を作業者が直接交替する場合に、中間タンク２
０に気泡を制御するために廃液容器に自動にドレインさ
れていた感光膜溶液も、ともに感光膜溶液ボトル１０に
リターンされるように配管系を形成している。その結
果、前記第１実施例よりもさらに優れた効果が得られ
る。FIG. 3 is a schematic diagram showing a photosensitive liquid supply system diagram according to a second embodiment of the present invention. Referring to FIG. 3, according to a second embodiment of the present invention, a conventional stack filter 40 is used.
Not only the photosensitive film solution that has been automatically drained to the cartridge "A" of the present invention and placed in the waste liquid container and discarded, that is, when the photosensitive film solution bottle 10 is newly replaced, that is, by the liquid level sensor of the intermediate tank 20. When the worker directly replaces the photosensitive film solution bottle 10 due to the occurrence of an error due to the absence of the photosensitive film solution, the intermediate tank 2
The piping system is formed so that the photosensitive film solution that was automatically drained to the waste liquid container to control the bubbles to 0 is also returned to the photosensitive film solution bottle 10. As a result, a more excellent effect than that of the first embodiment can be obtained.
【００１７】前記実施例による実験結果を、図４（Ａ）
および図４（Ｂ）に示す。図４（Ａ）は、従来技術（適
用前）によるウエハコーティング枚数と本発明（適用
後）によるウエハコーティング枚数とを比較して表に表
わしたものであり、図４（Ｂ）は、これをグラフ化した
ものである。FIG. 4 (A) shows the experimental results according to the above embodiment.
And shown in FIG. FIG. 4A is a table comparing the number of wafer coatings according to the conventional technique (before application) with the number of wafer coatings according to the present invention (after application), and FIG. 4B shows this. It is a graph.
【００１８】前記の実験は、４回反復して行ない、本発
明により配管系を形成した場合のウエハ処理枚数と、従
来の配管系を使用した場合のウエハ処理枚数とを記録し
た後に、その平均値を計算してボトル当り消耗される感
光膜溶液の量を比較した。その結果は、図４（Ａ），
（Ｂ）に示すとおりである。The above experiment was repeated 4 times, and after recording the number of wafers processed when the piping system was formed according to the present invention and the number of wafers processed when the conventional piping system was used, the average of the averages was recorded. Values were calculated to compare the amount of photoresist film solution consumed per bottle. The result is shown in FIG.
It is as shown in (B).
【００１９】また、平均値だけに言及してみると、下記
のとおりである。すなわち、従来の場合にはボトル当り
のウエハの処理枚数が６０８枚であるのに対して、本発
明を適用した場合は、ボトル当りのウエハ処理枚数が７
３３枚に増加し、本発明によれば、１２５枚のウエハに
塗布される感光膜溶液の量を節約できることがわかる。Further, referring to only the average value, it is as follows. That is, in the conventional case, the number of processed wafers per bottle is 608, whereas when the present invention is applied, the number of processed wafers per bottle is 7.
The number of wafers is increased to 33, and it can be seen that according to the present invention, the amount of the photosensitive film solution applied to 125 wafers can be saved.
【００２０】[0020]
【発明の効果】上述したように、本発明によれば、スタ
ックフィルタのカートリッジを通じて自動ドレインされ
る感光液が感光膜溶液ボトルにリターンされるように配
管系を形成し、また、中間タンク部に気泡を制御するた
めに自動ドレインされる感光液およびスタックフィルタ
のカートリッジを通じてドレインされる感光液が全部感
光膜溶液ボトルにリターンされるように配管系を形成し
ているので、損失（loss) される感光膜溶液を再使用で
き、従来に比較してボトル当り４〜６ＬＯＴのウエハを
さらに処理することができて、原価節減および生産性を
向上させることができる。As described above, according to the present invention, the piping system is formed so that the photosensitive liquid that is automatically drained through the cartridge of the stack filter is returned to the photosensitive film solution bottle, and the intermediate tank part is also provided. The piping system is formed so that the photosensitive liquid that is automatically drained to control the air bubbles and the photosensitive liquid that is drained through the cartridge of the stack filter are all returned to the photosensitive film solution bottle, which causes a loss. The photosensitive film solution can be reused, and 4 to 6 LOT wafers per bottle can be further processed as compared with the conventional method, which can reduce the cost and improve the productivity.
【図１】従来の技術による感光液供給系統図を示す概略
図である。FIG. 1 is a schematic diagram showing a photosensitive liquid supply system diagram according to a conventional technique.
【図２】本発明の第１実施例による感光液供給系統図を
示す概略図である。FIG. 2 is a schematic diagram showing a photosensitive liquid supply system diagram according to a first embodiment of the present invention.
【図３】本発明の第２実施例による感光液供給系統図を
示す概略図である。FIG. 3 is a schematic diagram showing a photosensitive liquid supply system diagram according to a second embodiment of the present invention.
【図４】（Ａ）は従来技術によるウエハコーティング枚
数と本発明によるウエハコーティング枚数を比較して示
した表であり、（Ｂ）はこれをグラフ化したものであ
る。FIG. 4A is a table showing a comparison between the number of wafers coated according to the related art and the number of wafers coated according to the present invention, and FIG. 4B is a graph thereof.
１０ 感光膜溶液ボトル ２０ 中間タンク ３０ 感光膜溶液供給ポンプ ４０ スタックフィルタ ５０ サック−バックユニット ６０ ノズル なお、各図中、同一符号は同一または相当部分を示す。 10 Photosensitive Film Solution Bottle 20 Intermediate Tank 30 Photosensitive Film Solution Supply Pump 40 Stack Filter 50 Suck-Back Unit 60 Nozzle In each drawing, the same reference numerals indicate the same or corresponding parts.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 申 東和 大韓民国京畿道水原市八達区梅灘２洞104 −32 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shin-Towa 104-32, Meidan 2-dong, Batanda-gu, Suwon-si, Gyeonggi-do, Towa, Republic of Korea
Claims (4)
光膜溶液ボトルと、 前記感光膜溶液ボトルに連結されて、パーティクルを制
御するためのフィルタの役割をするスタックフィルタ
と、 前記スタックフィルタに感光膜溶液を吐出する際の気泡
によるコーティング不良防止用に使用される前記スタッ
クフィルタに連結されるドレインと、 ウエハに感光膜溶液を噴射するノズルとにより構成され
る感光液供給システムにおいて、 配管の気泡制御のためにドレインされる感光液を感光膜
溶液ボトルにリターンさせて再使用できるように配管系
が形成されることを特徴とする、感光膜溶液塗布装置の
ドレイン感光膜溶液再使用システム。1. A photosensitive film solution bottle serving as a container for containing a photosensitive film solution, a stack filter connected to the photosensitive film solution bottle and serving as a filter for controlling particles, and a stack filter. In the photosensitive liquid supply system including a drain connected to the stack filter used for preventing coating failure due to bubbles when discharging the photosensitive film solution and a nozzle for injecting the photosensitive film solution onto the wafer, A drain photosensitive film solution reuse system for a photosensitive film solution coating apparatus, wherein a piping system is formed so that the photosensitive solution drained for controlling bubbles can be returned to the photosensitive film solution bottle and reused.
のセンサが設置されている中間タンクと、 前記感光膜溶液ボトルと連結されて、感光膜溶液をポン
ピングさせる感光膜溶液供給ポンプと、 前記ノズルを通じてウエハに感光膜溶液を塗布する際
に、感光膜溶液が滴下することを防止するために、前記
感光膜溶液を管の内側に吸い寄せる役割をするサック−
バックユニットをさらに包含することを特徴とする、請
求項１記載の感光膜溶液塗布装置のドレイン感光膜溶液
再使用システム。2. The system is connected to an intermediate tank in which a sensor for determining the presence or absence of a photosensitive film solution is installed on the piping system, and is connected to the photosensitive film solution bottle to pump the photosensitive film solution. A photosensitive film solution supply pump, and a sucker for sucking the photosensitive film solution into the inside of the tube to prevent the photosensitive film solution from dripping when the photosensitive film solution is applied to the wafer through the nozzle.
The drain photoresist solution reuse system of claim 1, further comprising a back unit.
ように構成される配管系は、スタックフィルタのカート
リッジを通じて自動にドレインされる感光液が感光膜溶
液ボトルにリターンされるように構成されることを特徴
とする、請求項２記載の感光膜溶液塗布装置のドレイン
感光膜溶液再使用システム。3. The piping system configured to be returned to the photosensitive film solution bottle is configured to return the photosensitive solution which is automatically drained through the cartridge of the stack filter to the photosensitive film solution bottle. The drain photosensitive film solution reuse system of the photosensitive film solution coating apparatus according to claim 2, wherein
ように構成される配管系は、中間タンクの気泡を制御す
るために自動にドレインされる感光液およびスタックフ
ィルタのカートリッジを通じてドレインされる感光液
を、全部感光膜溶液ボトルにリターンさせるように構成
されることを特徴とする、請求項２記載の感光膜溶液塗
布装置のドレイン感光膜溶液再使用システム。。4. A piping system configured to be returned to the photosensitive film solution bottle includes a photosensitive solution that is automatically drained to control bubbles in an intermediate tank and a photosensitive solution that is drained through a cartridge of a stack filter. 3. The drain photoresist film solution reuse system of the photoresist film solution coating device according to claim 2, wherein the drain photoresist film solution recycling apparatus is configured to return all of them to the photoresist film solution bottle. .
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1019940001899A KR950025911A (en) | 1994-02-02 | 1994-02-02 | Drain Photoresist Reuse System for Photo Process Applicator |
| KR94P1899 | 1994-02-02 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07263335A true JPH07263335A (en) | 1995-10-13 |
Family
ID=19376657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7009475A Withdrawn JPH07263335A (en) | 1994-02-02 | 1995-01-25 | Drain exposure film solution reuse system of photosensitive film solution coating device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPH07263335A (en) |
| KR (1) | KR950025911A (en) |
| CN (1) | CN1075209C (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19990001552A (en) * | 1997-06-16 | 1999-01-15 | 윤종용 | Piping structure of spinner for semiconductor device manufacturing |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100234527B1 (en) * | 1996-05-16 | 1999-12-15 | 윤종용 | Vacuum apparatus of semiconductor manufacture equipment |
| KR20000026455A (en) * | 1998-10-20 | 2000-05-15 | 윤종용 | Sprayer of photoresist |
| JP3890229B2 (en) * | 2001-12-27 | 2007-03-07 | 株式会社コガネイ | Chemical liquid supply apparatus and degassing method of chemical liquid supply apparatus |
| US8580117B2 (en) * | 2007-03-20 | 2013-11-12 | Taiwan Semiconductor Manufactuing Company, Ltd. | System and method for replacing resist filter to reduce resist filter-induced wafer defects |
| CN102540706A (en) * | 2012-01-18 | 2012-07-04 | 上海华力微电子有限公司 | Method for extending effective use time of photoresist |
| CN103769351B (en) * | 2014-01-20 | 2016-08-17 | 北京京东方显示技术有限公司 | A kind of photoresist recovery system |
-
1994
- 1994-02-02 KR KR1019940001899A patent/KR950025911A/en not_active Application Discontinuation
-
1995
- 1995-01-25 JP JP7009475A patent/JPH07263335A/en not_active Withdrawn
- 1995-01-28 CN CN95102906A patent/CN1075209C/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR19990001552A (en) * | 1997-06-16 | 1999-01-15 | 윤종용 | Piping structure of spinner for semiconductor device manufacturing |
Also Published As
| Publication number | Publication date |
|---|---|
| KR950025911A (en) | 1995-09-18 |
| CN1121845A (en) | 1996-05-08 |
| CN1075209C (en) | 2001-11-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
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