TW368757B - Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage - Google Patents

Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage

Info

Publication number
TW368757B
TW368757B TW087100713A TW87100713A TW368757B TW 368757 B TW368757 B TW 368757B TW 087100713 A TW087100713 A TW 087100713A TW 87100713 A TW87100713 A TW 87100713A TW 368757 B TW368757 B TW 368757B
Authority
TW
Taiwan
Prior art keywords
low
semiconductor diodes
devices
voltage drop
reverse current
Prior art date
Application number
TW087100713A
Other languages
English (en)
Inventor
Richard A Metzler
Vladimir Rodov
Original Assignee
Luminous Intent Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=25142076&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW368757(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Luminous Intent Inc filed Critical Luminous Intent Inc
Application granted granted Critical
Publication of TW368757B publication Critical patent/TW368757B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66083—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
    • H01L29/6609—Diodes
    • H01L29/66136—PN junction diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861—Diodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66666—Vertical transistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/7827—Vertical transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Bipolar Transistors (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Electronic Switches (AREA)
TW087100713A 1997-01-23 1998-03-20 Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage TW368757B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/787,627 US5825079A (en) 1997-01-23 1997-01-23 Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage

Publications (1)

Publication Number Publication Date
TW368757B true TW368757B (en) 1999-09-01

Family

ID=25142076

Family Applications (1)

Application Number Title Priority Date Filing Date
TW087100713A TW368757B (en) 1997-01-23 1998-03-20 Semiconductor diodes having low forward conduction voltage drop and low reverse current leakage

Country Status (12)

Country Link
US (1) US5825079A (zh)
EP (1) EP0956597B1 (zh)
JP (1) JP4058541B2 (zh)
KR (1) KR100453264B1 (zh)
CN (1) CN1135633C (zh)
AT (1) ATE467906T1 (zh)
AU (1) AU6027698A (zh)
CA (1) CA2278308C (zh)
DE (1) DE69841658D1 (zh)
IL (1) IL130973A (zh)
TW (1) TW368757B (zh)
WO (1) WO1998033218A1 (zh)

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US6331455B1 (en) 1999-04-01 2001-12-18 Advanced Power Devices, Inc. Power rectifier device and method of fabricating power rectifier devices
US6186408B1 (en) 1999-05-28 2001-02-13 Advanced Power Devices, Inc. High cell density power rectifier
US6420757B1 (en) 1999-09-14 2002-07-16 Vram Technologies, Llc Semiconductor diodes having low forward conduction voltage drop, low reverse current leakage, and high avalanche energy capability
US6433370B1 (en) 2000-02-10 2002-08-13 Vram Technologies, Llc Method and apparatus for cylindrical semiconductor diodes
US6667237B1 (en) 2000-10-12 2003-12-23 Vram Technologies, Llc Method and apparatus for patterning fine dimensions
US6580150B1 (en) * 2000-11-13 2003-06-17 Vram Technologies, Llc Vertical junction field effect semiconductor diodes
US6537860B2 (en) 2000-12-18 2003-03-25 Apd Semiconductor, Inc. Method of fabricating power VLSI diode devices
US6537921B2 (en) * 2001-05-23 2003-03-25 Vram Technologies, Llc Vertical metal oxide silicon field effect semiconductor diodes
US6515330B1 (en) 2002-01-02 2003-02-04 Apd Semiconductor, Inc. Power device having vertical current path with enhanced pinch-off for current limiting
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US7030680B2 (en) * 2003-02-26 2006-04-18 Integrated Discrete Devices, Llc On chip power supply
US6958275B2 (en) * 2003-03-11 2005-10-25 Integrated Discrete Devices, Llc MOSFET power transistors and methods
US7932539B2 (en) * 2005-11-29 2011-04-26 The Hong Kong University Of Science And Technology Enhancement-mode III-N devices, circuits, and methods
US7972915B2 (en) * 2005-11-29 2011-07-05 The Hong Kong University Of Science And Technology Monolithic integration of enhancement- and depletion-mode AlGaN/GaN HFETs
US8044432B2 (en) * 2005-11-29 2011-10-25 The Hong Kong University Of Science And Technology Low density drain HEMTs
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US8502323B2 (en) * 2007-08-03 2013-08-06 The Hong Kong University Of Science And Technology Reliable normally-off III-nitride active device structures, and related methods and systems
EP2232559B1 (en) 2007-09-26 2019-05-15 STMicroelectronics N.V. Adjustable field effect rectifier
US8643055B2 (en) 2007-09-26 2014-02-04 Stmicroelectronics N.V. Series current limiter device
US8633521B2 (en) 2007-09-26 2014-01-21 Stmicroelectronics N.V. Self-bootstrapping field effect diode structures and methods
US8148748B2 (en) * 2007-09-26 2012-04-03 Stmicroelectronics N.V. Adjustable field effect rectifier
US8076699B2 (en) * 2008-04-02 2011-12-13 The Hong Kong Univ. Of Science And Technology Integrated HEMT and lateral field-effect rectifier combinations, methods, and systems
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US20100084687A1 (en) * 2008-10-03 2010-04-08 The Hong Kong University Of Science And Technology Aluminum gallium nitride/gallium nitride high electron mobility transistors
CN102332473A (zh) * 2011-09-20 2012-01-25 彭艳兵 一种低压降有源二极管
US9337310B2 (en) 2014-05-05 2016-05-10 Globalfoundries Inc. Low leakage, high frequency devices
US9861828B2 (en) 2014-09-08 2018-01-09 Medtronic, Inc. Monitoring multi-cell power source of an implantable medical device
US9539435B2 (en) 2014-09-08 2017-01-10 Medtronic, Inc. Transthoracic protection circuit for implantable medical devices
US9724528B2 (en) 2014-09-08 2017-08-08 Medtronic, Inc. Multiple transformer charging circuits for implantable medical devices
US9604071B2 (en) 2014-09-08 2017-03-28 Medtronic, Inc. Implantable medical devices having multi-cell power sources
US9643025B2 (en) 2014-09-08 2017-05-09 Medtronic, Inc. Multi-primary transformer charging circuits for implantable medical devices
US9579517B2 (en) 2014-09-08 2017-02-28 Medtronic, Inc. Transformer-based charging circuits for implantable medical devices
US9861827B2 (en) 2014-09-08 2018-01-09 Medtronic, Inc. Implantable medical devices having multi-cell power sources
US10050115B2 (en) 2014-12-30 2018-08-14 Globalfoundries Inc. Tapered gate oxide in LDMOS devices
US10596648B2 (en) 2017-05-08 2020-03-24 Snap-On Incorporated Internal thread chase

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Also Published As

Publication number Publication date
US5825079A (en) 1998-10-20
DE69841658D1 (de) 2010-06-24
KR20000070391A (ko) 2000-11-25
WO1998033218A1 (en) 1998-07-30
JP2001523393A (ja) 2001-11-20
JP4058541B2 (ja) 2008-03-12
AU6027698A (en) 1998-08-18
IL130973A0 (en) 2001-01-28
EP0956597A4 (en) 2000-08-16
CA2278308A1 (en) 1998-07-30
CA2278308C (en) 2007-12-11
CN1255239A (zh) 2000-05-31
ATE467906T1 (de) 2010-05-15
EP0956597A1 (en) 1999-11-17
CN1135633C (zh) 2004-01-21
IL130973A (en) 2003-03-12
KR100453264B1 (ko) 2004-10-15
EP0956597B1 (en) 2010-05-12

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees