TW315481B - - Google Patents

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Publication number
TW315481B
TW315481B TW086100165A TW86100165A TW315481B TW 315481 B TW315481 B TW 315481B TW 086100165 A TW086100165 A TW 086100165A TW 86100165 A TW86100165 A TW 86100165A TW 315481 B TW315481 B TW 315481B
Authority
TW
Taiwan
Prior art keywords
plates
filament
plate
patent application
length
Prior art date
Application number
TW086100165A
Other languages
English (en)
Chinese (zh)
Original Assignee
American Int Tech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Int Tech filed Critical American Int Tech
Application granted granted Critical
Publication of TW315481B publication Critical patent/TW315481B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements common to two or more basic types of discharge tubes or lamps
    • H01J3/12—Arrangements for controlling cross-section of ray or beam; Arrangements for correcting aberration of beam, e.g. due to lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • H01J33/02—Details

Landscapes

  • Electron Sources, Ion Sources (AREA)
TW086100165A 1996-01-22 1997-01-09 TW315481B (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/589,265 US5637953A (en) 1996-01-22 1996-01-22 Cathode assembly for a line focus electron beam device

Publications (1)

Publication Number Publication Date
TW315481B true TW315481B (enExample) 1997-09-11

Family

ID=24357302

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086100165A TW315481B (enExample) 1996-01-22 1997-01-09

Country Status (7)

Country Link
US (1) US5637953A (enExample)
EP (1) EP0880791B1 (enExample)
JP (1) JP3723577B2 (enExample)
KR (1) KR100488264B1 (enExample)
DE (1) DE69620799T2 (enExample)
TW (1) TW315481B (enExample)
WO (1) WO1997027612A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI466157B (zh) * 2007-04-20 2014-12-21 Sen Corp 射束處理裝置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7264771B2 (en) * 1999-04-20 2007-09-04 Baxter International Inc. Method and apparatus for manipulating pre-sterilized components in an active sterile field
US6239543B1 (en) * 1999-08-23 2001-05-29 American International Technologies, Inc. Electron beam plasma formation for surface chemistry
US6785359B2 (en) * 2002-07-30 2004-08-31 Ge Medical Systems Global Technology Company, Llc Cathode for high emission x-ray tube

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE359165A (enExample) * 1928-04-14
NL149610B (nl) * 1967-10-03 1976-05-17 Matsushita Electric Industrial Co Ltd Elektrostatische registratie-inrichting.
US3609401A (en) * 1970-03-09 1971-09-28 Gen Electric Line focus electron gun
US3788892A (en) * 1970-05-01 1974-01-29 Rca Corp Method of producing a window device
US4468282A (en) * 1982-11-22 1984-08-28 Hewlett-Packard Company Method of making an electron beam window
ATE49322T1 (de) * 1983-08-26 1990-01-15 Feinfocus Verwaltung Roentgenlithographiegeraet.
US4764947A (en) * 1985-12-04 1988-08-16 The Machlett Laboratories, Incorporated Cathode focusing arrangement
NL8700834A (nl) * 1987-04-09 1988-11-01 Philips Nv Diodekanon met samengestelde anode.
FR2633773B1 (fr) * 1988-07-01 1991-02-08 Gen Electric Cgr Tube radiogene a auto-limitation du flux electronique par saturation
US5414267A (en) * 1993-05-26 1995-05-09 American International Technologies, Inc. Electron beam array for surface treatment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI466157B (zh) * 2007-04-20 2014-12-21 Sen Corp 射束處理裝置

Also Published As

Publication number Publication date
EP0880791A4 (enExample) 1998-12-09
KR19990081835A (ko) 1999-11-15
DE69620799D1 (de) 2002-05-23
EP0880791B1 (en) 2002-04-17
WO1997027612A1 (en) 1997-07-31
JP3723577B2 (ja) 2005-12-07
KR100488264B1 (ko) 2005-09-02
DE69620799T2 (de) 2002-11-28
US5637953A (en) 1997-06-10
EP0880791A1 (en) 1998-12-02

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees