TW291597B - - Google Patents

Info

Publication number
TW291597B
TW291597B TW084103943A TW84103943A TW291597B TW 291597 B TW291597 B TW 291597B TW 084103943 A TW084103943 A TW 084103943A TW 84103943 A TW84103943 A TW 84103943A TW 291597 B TW291597 B TW 291597B
Authority
TW
Taiwan
Application number
TW084103943A
Original Assignee
Nippon Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co filed Critical Nippon Electric Co
Application granted granted Critical
Publication of TW291597B publication Critical patent/TW291597B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007—Multistep manufacturing processes
    • H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409—Unipolar field-effect transistors
    • H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66742—Thin film unipolar transistors
    • H01L29/6675—Amorphous silicon or polysilicon transistors
    • H01L29/66765—Lateral single gate single channel transistors with inverted structure, i.e. the channel layer is formed after the gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/78—Field effect transistors with field effect produced by an insulated gate
    • H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Thin Film Transistor (AREA)
TW084103943A 1994-04-22 1995-04-21 TW291597B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8422994 1994-04-22

Publications (1)

Publication Number Publication Date
TW291597B true TW291597B (zh) 1996-11-21

Family

ID=13824652

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084103943A TW291597B (zh) 1994-04-22 1995-04-21

Country Status (5)

Country Link
US (1) US5561074A (zh)
EP (1) EP0678907B1 (zh)
KR (1) KR0180323B1 (zh)
DE (1) DE69525558T2 (zh)
TW (1) TW291597B (zh)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2833545B2 (ja) * 1995-03-06 1998-12-09 日本電気株式会社 半導体装置の製造方法
JP3082679B2 (ja) * 1996-08-29 2000-08-28 日本電気株式会社 薄膜トランジスタおよびその製造方法
WO1998057506A1 (en) * 1997-06-12 1998-12-17 Northern Telecom Limited Directory service based on geographic location of a mobile telecommunications unit
JP2001308339A (ja) 2000-02-18 2001-11-02 Sharp Corp 薄膜トランジスタ
JP4118484B2 (ja) * 2000-03-06 2008-07-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2001257350A (ja) 2000-03-08 2001-09-21 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP4700160B2 (ja) 2000-03-13 2011-06-15 株式会社半導体エネルギー研究所 半導体装置
JP4118485B2 (ja) 2000-03-13 2008-07-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4683688B2 (ja) 2000-03-16 2011-05-18 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
JP4393662B2 (ja) 2000-03-17 2010-01-06 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
JP4785229B2 (ja) 2000-05-09 2011-10-05 株式会社半導体エネルギー研究所 半導体装置の作製方法
US7071037B2 (en) 2001-03-06 2006-07-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
KR101576813B1 (ko) * 2007-08-17 2015-12-11 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시 장치
KR101452204B1 (ko) * 2007-11-05 2014-10-21 가부시키가이샤 한도오따이 에네루기 켄큐쇼 박막 트랜지스터 및 상기 박막 트랜지스터를 구비하는 표시 장치
TWI487104B (zh) 2008-11-07 2015-06-01 Semiconductor Energy Lab 半導體裝置和其製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61237420A (ja) * 1985-04-13 1986-10-22 Oki Electric Ind Co Ltd Ｐ型アモルフアスシリコン薄膜の製造方法
US4882295A (en) * 1985-07-26 1989-11-21 Energy Conversion Devices, Inc. Method of making a double injection field effect transistor
US5270224A (en) * 1988-03-11 1993-12-14 Fujitsu Limited Method of manufacturing a semiconductor device having a region doped to a level exceeding the solubility limit
JPH01241175A (ja) * 1988-03-23 1989-09-26 Seikosha Co Ltd 非晶質シリコン薄膜トランジスタの製造方法
US5053354A (en) * 1988-05-30 1991-10-01 Seikosha Co., Ltd. Method of fabricating a reverse staggered type silicon thin film transistor
JPH01302769A (ja) * 1988-05-30 1989-12-06 Seikosha Co Ltd 逆スタガー型シリコン薄膜トランジスタの製造方法
JPH07114285B2 (ja) * 1988-12-16 1995-12-06 日本電気株式会社 薄膜トランジスタの製造方法
US5109260A (en) * 1989-07-10 1992-04-28 Seikosha Co., Ltd. Silicon thin film transistor and method for producing the same
EP0606114A1 (en) * 1989-08-11 1994-07-13 Seiko Instruments Inc. Method of producing field effect transistor
JPH04505833A (ja) * 1990-10-05 1992-10-08 ゼネラル・エレクトリック・カンパニイ 基準構造の地形の伝搬地形による装置の自己アライメント
JPH04321275A (ja) * 1991-04-19 1992-11-11 Nec Corp 薄膜トランジスタ
JPH04367276A (ja) * 1991-06-14 1992-12-18 Nec Corp 薄膜トランジスタおよびその製造方法
JPH04367277A (ja) * 1991-06-14 1992-12-18 Nec Corp 薄膜トランジスタおよびその製造方法
JPH0583197A (ja) * 1991-09-21 1993-04-02 Alpine Electron Inc デイジタルオーデイオ装置

Also Published As

Publication number Publication date
KR0180323B1 (ko) 1999-04-15
KR950030282A (ko) 1995-11-24
DE69525558T2 (de) 2002-08-22
EP0678907B1 (en) 2002-02-27
EP0678907A2 (en) 1995-10-25
EP0678907A3 (en) 1997-08-20
US5561074A (en) 1996-10-01
DE69525558D1 (de) 2002-04-04

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees