TW280782B - - Google Patents
Info
- Publication number
- TW280782B TW280782B TW083108440A TW83108440A TW280782B TW 280782 B TW280782 B TW 280782B TW 083108440 A TW083108440 A TW 083108440A TW 83108440 A TW83108440 A TW 83108440A TW 280782 B TW280782 B TW 280782B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H10P52/00—
-
- H10P72/0416—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22649693 | 1993-08-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW280782B true TW280782B (OSRAM) | 1996-07-11 |
Family
ID=16846023
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW083108440A TW280782B (OSRAM) | 1993-08-18 | 1994-09-13 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US5482068A (OSRAM) |
| KR (1) | KR100236412B1 (OSRAM) |
| TW (1) | TW280782B (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104868018B (zh) * | 2014-02-21 | 2017-06-13 | 台湾积体电路制造股份有限公司 | 化学浴沉积的方法和系统 |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5772784A (en) * | 1994-11-14 | 1998-06-30 | Yieldup International | Ultra-low particle semiconductor cleaner |
| US6630052B1 (en) * | 1996-06-26 | 2003-10-07 | Lg. Philips Lcd Co., Ltd. | Apparatus for etching glass substrate |
| DE19644253A1 (de) * | 1996-10-24 | 1998-05-07 | Steag Micro Tech Gmbh | Vorrichtung zum Behandeln von Substraten |
| US6009890A (en) * | 1997-01-21 | 2000-01-04 | Tokyo Electron Limited | Substrate transporting and processing system |
| US6273107B1 (en) * | 1997-12-05 | 2001-08-14 | Texas Instruments Incorporated | Positive flow, positive displacement rinse tank |
| JPH11274282A (ja) | 1998-03-23 | 1999-10-08 | Toshiba Corp | 基板収納容器、基板収納容器清浄化装置、基板収納容器清浄化方法および基板処理装置 |
| JPH11354478A (ja) * | 1998-05-29 | 1999-12-24 | Lsi Logic Corp | マイクロバブル付着防止装置 |
| US6539963B1 (en) * | 1999-07-14 | 2003-04-01 | Micron Technology, Inc. | Pressurized liquid diffuser |
| DE19960241A1 (de) * | 1999-12-14 | 2001-07-05 | Steag Micro Tech Gmbh | Vorrichtung und Verfahren zum Behandeln von Substraten |
| JP2002164409A (ja) * | 2000-11-29 | 2002-06-07 | Tokyo Electron Ltd | 移送装置，基板処理装置及び基板処理システム |
| US6500274B2 (en) * | 2001-01-16 | 2002-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd | Apparatus and method for wet cleaning wafers without ammonia vapor damage |
| US20090029560A1 (en) * | 2001-12-07 | 2009-01-29 | Applied Materials, Inc. | Apparatus and method for single substrate processing |
| US7582180B2 (en) * | 2004-08-19 | 2009-09-01 | Micron Technology, Inc. | Systems and methods for processing microfeature workpieces |
| US8863763B1 (en) | 2009-05-27 | 2014-10-21 | WD Media, LLC | Sonication cleaning with a particle counter |
| US8404056B1 (en) | 2009-05-27 | 2013-03-26 | WD Media, LLC | Process control for a sonication cleaning tank |
| US10297472B2 (en) * | 2012-11-28 | 2019-05-21 | Acm Research (Shanghai) Inc. | Method and apparatus for cleaning semiconductor wafer |
| JP6450653B2 (ja) * | 2015-06-24 | 2019-01-09 | 東京エレクトロン株式会社 | 格納ユニット、搬送装置、及び、基板処理システム |
| JP6971124B2 (ja) * | 2017-10-24 | 2021-11-24 | 東京エレクトロン株式会社 | 基板処理装置 |
| CN109365382B (zh) * | 2018-10-25 | 2024-03-12 | 广东西江数据科技有限公司 | 一种服务器清洗设备及其清洗方法 |
| JP7178261B2 (ja) * | 2018-12-27 | 2022-11-25 | 東京エレクトロン株式会社 | 基板液処理装置 |
| JP7381370B2 (ja) * | 2020-03-05 | 2023-11-15 | キオクシア株式会社 | 半導体製造装置および半導体装置の製造方法 |
| US11508596B2 (en) | 2020-05-28 | 2022-11-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus and methods for automatically handling die carriers |
| TWI837779B (zh) | 2022-03-16 | 2024-04-01 | 日商鎧俠股份有限公司 | 基板處理裝置 |
| DE102023205058A1 (de) * | 2023-05-31 | 2024-12-05 | Singulus Technologies Aktiengesellschaft | Vorrichtung und Verfahren zur Behandlung von Wafern unter Verwendung von Trennelementen |
| DE102023205059A1 (de) * | 2023-05-31 | 2024-12-05 | Singulus Technologies Aktiengesellschaft | Vorrichtung und Verfahren zur Behandlung von Wafern unter Verwendung von Führungselementen |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5000795A (en) * | 1989-06-16 | 1991-03-19 | At&T Bell Laboratories | Semiconductor wafer cleaning method and apparatus |
| JPH0456321A (ja) * | 1990-06-26 | 1992-02-24 | Fujitsu Ltd | 半導体ウエハの洗浄装置 |
| JPH05166793A (ja) * | 1991-12-16 | 1993-07-02 | Dainippon Screen Mfg Co Ltd | 浸漬型基板処理装置 |
| US5327921A (en) * | 1992-03-05 | 1994-07-12 | Tokyo Electron Limited | Processing vessel for a wafer washing system |
-
1994
- 1994-08-18 KR KR1019940020357A patent/KR100236412B1/ko not_active Expired - Fee Related
- 1994-08-18 US US08/292,284 patent/US5482068A/en not_active Expired - Lifetime
- 1994-09-13 TW TW083108440A patent/TW280782B/zh active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104868018B (zh) * | 2014-02-21 | 2017-06-13 | 台湾积体电路制造股份有限公司 | 化学浴沉积的方法和系统 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR950007014A (ko) | 1995-03-21 |
| US5482068A (en) | 1996-01-09 |
| KR100236412B1 (ko) | 1999-12-15 |