TW267239B - - Google Patents

Info

Publication number
TW267239B
TW267239B TW084102473A TW84102473A TW267239B TW 267239 B TW267239 B TW 267239B TW 084102473 A TW084102473 A TW 084102473A TW 84102473 A TW84102473 A TW 84102473A TW 267239 B TW267239 B TW 267239B
Authority
TW
Taiwan
Application number
TW084102473A
Other languages
Chinese (zh)
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Application granted granted Critical
Publication of TW267239B publication Critical patent/TW267239B/zh

Links

Classifications

    • H10P14/20—
    • H10P72/0448—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • H10P14/6342—
    • H10P14/6922—
    • H10P95/06—
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/11—Deposition methods from solutions or suspensions
    • C03C2218/116—Deposition methods from solutions or suspensions by spin-coating, centrifugation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)
  • Formation Of Insulating Films (AREA)
TW084102473A 1994-02-17 1995-03-15 TW267239B (oth)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP02043994A JP3280791B2 (ja) 1994-02-17 1994-02-17 塗膜形成方法

Publications (1)

Publication Number Publication Date
TW267239B true TW267239B (oth) 1996-01-01

Family

ID=12027084

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084102473A TW267239B (oth) 1994-02-17 1995-03-15

Country Status (4)

Country Link
US (1) US6277441B1 (oth)
JP (1) JP3280791B2 (oth)
KR (1) KR100254851B1 (oth)
TW (1) TW267239B (oth)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5714417A (en) * 1996-08-22 1998-02-03 Vanguard International Semiconductor Corporation Planarization process using artificial gravity
JP2000082647A (ja) * 1998-09-04 2000-03-21 Nec Corp レジスト膜の塗布方法及び塗布装置
KR20010003577A (ko) * 1999-06-24 2001-01-15 김영환 반도체 소자의 층간 절연막 형성 방법
JP4394239B2 (ja) * 2000-02-29 2010-01-06 独立行政法人理化学研究所 二次非線形光学特性を有するポリマーフィルムの製造方法、ポリマーフィルム及び非線形光学素子
JP4334168B2 (ja) 2001-09-25 2009-09-30 東京応化工業株式会社 被膜形成方法
JP5790622B2 (ja) * 2012-11-01 2015-10-07 東京エレクトロン株式会社 塗布膜形成方法、塗布膜形成装置及び記憶媒体

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60123031A (ja) * 1983-12-08 1985-07-01 Hoya Corp レジスト塗布方法
JPS62190838A (ja) 1986-02-18 1987-08-21 Rohm Co Ltd レジスト塗布方法
JP2583239B2 (ja) 1987-06-16 1997-02-19 大日本印刷株式会社 フォトマスク用基板等へのレジスト塗布方法およびスピンナチャック装置
JPH0656832B2 (ja) 1988-12-09 1994-07-27 富士電機株式会社 レジスト塗布方法

Also Published As

Publication number Publication date
JP3280791B2 (ja) 2002-05-13
JPH07227568A (ja) 1995-08-29
KR100254851B1 (ko) 2000-05-01
KR950034494A (ko) 1995-12-28
US6277441B1 (en) 2001-08-21

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees