TW262626B - - Google Patents
Info
- Publication number
- TW262626B TW262626B TW081105485A TW81105485A TW262626B TW 262626 B TW262626 B TW 262626B TW 081105485 A TW081105485 A TW 081105485A TW 81105485 A TW81105485 A TW 81105485A TW 262626 B TW262626 B TW 262626B
- Authority
- TW
- Taiwan
- Prior art keywords
- plasma
- substrate
- gas
- reaction chamber
- bell jar
- Prior art date
Links
- 239000007789 gas Substances 0.000 abstract 3
- 238000000034 method Methods 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- 150000001722 carbon compounds Chemical class 0.000 abstract 1
- 229910010293 ceramic material Inorganic materials 0.000 abstract 1
- 238000005229 chemical vapour deposition Methods 0.000 abstract 1
- 230000001419 dependent effect Effects 0.000 abstract 1
- 229910003460 diamond Inorganic materials 0.000 abstract 1
- 239000010432 diamond Substances 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
- C23C16/274—Diamond only using microwave discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
- B22F7/02—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite layers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Composite Materials (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB919114014A GB9114014D0 (en) | 1991-06-28 | 1991-06-28 | Plasma assisted diamond synthesis |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW262626B true TW262626B (OSRAM) | 1995-11-11 |
Family
ID=10697507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW081105485A TW262626B (OSRAM) | 1991-06-28 | 1992-07-10 |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP0520832B1 (OSRAM) |
| JP (1) | JPH05239656A (OSRAM) |
| KR (1) | KR930000181A (OSRAM) |
| AT (1) | ATE135752T1 (OSRAM) |
| AU (1) | AU1862392A (OSRAM) |
| CA (1) | CA2072455A1 (OSRAM) |
| DE (1) | DE69209163T2 (OSRAM) |
| GB (1) | GB9114014D0 (OSRAM) |
| TW (1) | TW262626B (OSRAM) |
| ZA (1) | ZA924765B (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5328550A (en) * | 1992-10-02 | 1994-07-12 | At&T Bell Laboratories | Thinning a diamond body by means of molten rare-earth-containing alloys |
| DE10156615B4 (de) * | 2001-11-17 | 2004-10-07 | Forschungszentrum Karlsruhe Gmbh | Einrichtung zur Erzeugung eines örtlich variierbaren Elektron-Zyklotron-Resonanz-Mikrowellen-Niederdruckplasmas |
| US6845734B2 (en) | 2002-04-11 | 2005-01-25 | Micron Technology, Inc. | Deposition apparatuses configured for utilizing phased microwave radiation |
| RU2215061C1 (ru) | 2002-09-30 | 2003-10-27 | Институт прикладной физики РАН | Высокоскоростной способ осаждения алмазных пленок из газовой фазы в плазме свч-разряда и плазменный реактор для его реализации |
| US8555921B2 (en) | 2002-12-18 | 2013-10-15 | Vapor Technologies Inc. | Faucet component with coating |
| US7866343B2 (en) | 2002-12-18 | 2011-01-11 | Masco Corporation Of Indiana | Faucet |
| US6904935B2 (en) | 2002-12-18 | 2005-06-14 | Masco Corporation Of Indiana | Valve component with multiple surface layers |
| US7866342B2 (en) | 2002-12-18 | 2011-01-11 | Vapor Technologies, Inc. | Valve component for faucet |
| US8220489B2 (en) | 2002-12-18 | 2012-07-17 | Vapor Technologies Inc. | Faucet with wear-resistant valve component |
| US20070026205A1 (en) | 2005-08-01 | 2007-02-01 | Vapor Technologies Inc. | Article having patterned decorative coating |
| RU2357001C2 (ru) * | 2007-07-25 | 2009-05-27 | Ооо "Твинн" | Способ получения изделий из поликристаллического алмаза |
| DE102008035917B4 (de) * | 2008-08-01 | 2010-06-17 | Eads Deutschland Gmbh | Blitzschutz von Radomen und Sende-/Empfangsvorrichtungen |
| CN113373425B (zh) * | 2020-03-10 | 2022-06-10 | 宏硕系统股份有限公司 | 人造钻石生产装置及其微波发射模块 |
| US11155915B1 (en) | 2020-04-13 | 2021-10-26 | Wave Power Technology Inc. | Artificial diamond production device and microwave transmitting module thereof |
| JP7074795B2 (ja) * | 2020-04-21 | 2022-05-24 | 宏碩系統股▲フン▼有限公司 | 合成ダイヤモンドの製造装置及びこれに用いられるマイクロ波発射モジュール |
| US12084759B2 (en) | 2022-01-07 | 2024-09-10 | Wave Power Technology Inc. | Artificial diamond plasma production device |
| JP7250969B1 (ja) * | 2022-02-08 | 2023-04-03 | 宏碩系統股▲フン▼有限公司 | 人工ダイヤモンドプラズマ生成機器 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4434188A (en) * | 1981-12-17 | 1984-02-28 | National Institute For Researches In Inorganic Materials | Method for synthesizing diamond |
| AU560521B2 (en) * | 1982-10-18 | 1987-04-09 | Energy Conversion Devices Inc. | Layered amorphous semiconductor alloys |
-
1991
- 1991-06-28 GB GB919114014A patent/GB9114014D0/en active Pending
-
1992
- 1992-06-26 AU AU18623/92A patent/AU1862392A/en not_active Abandoned
- 1992-06-26 ZA ZA924765A patent/ZA924765B/xx unknown
- 1992-06-26 CA CA002072455A patent/CA2072455A1/en not_active Abandoned
- 1992-06-27 KR KR1019920011419A patent/KR930000181A/ko not_active Withdrawn
- 1992-06-29 AT AT92305950T patent/ATE135752T1/de not_active IP Right Cessation
- 1992-06-29 JP JP4210619A patent/JPH05239656A/ja active Pending
- 1992-06-29 EP EP92305950A patent/EP0520832B1/en not_active Expired - Lifetime
- 1992-06-29 DE DE69209163T patent/DE69209163T2/de not_active Expired - Fee Related
- 1992-07-10 TW TW081105485A patent/TW262626B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| EP0520832A1 (en) | 1992-12-30 |
| ZA924765B (en) | 1993-03-31 |
| JPH05239656A (ja) | 1993-09-17 |
| ATE135752T1 (de) | 1996-04-15 |
| DE69209163D1 (de) | 1996-04-25 |
| EP0520832B1 (en) | 1996-03-20 |
| KR930000181A (ko) | 1993-01-15 |
| AU1862392A (en) | 1993-01-07 |
| CA2072455A1 (en) | 1992-12-29 |
| GB9114014D0 (en) | 1991-08-14 |
| DE69209163T2 (de) | 1996-08-01 |
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