TW237572B - - Google Patents

Info

Publication number
TW237572B
TW237572B TW082100857A TW82100857A TW237572B TW 237572 B TW237572 B TW 237572B TW 082100857 A TW082100857 A TW 082100857A TW 82100857 A TW82100857 A TW 82100857A TW 237572 B TW237572 B TW 237572B
Authority
TW
Taiwan
Application number
TW082100857A
Original Assignee
Mitsubishi Electric Machine
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Machine filed Critical Mitsubishi Electric Machine
Application granted granted Critical
Publication of TW237572B publication Critical patent/TW237572B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
  • Laser Beam Processing (AREA)
TW082100857A 1993-01-07 1993-02-09 TW237572B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5001185A JP2830671B2 (ja) 1993-01-07 1993-01-07 レーザ発振器の出力制御装置

Publications (1)

Publication Number Publication Date
TW237572B true TW237572B (zh) 1995-01-01

Family

ID=11494398

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082100857A TW237572B (zh) 1993-01-07 1993-02-09

Country Status (4)

Country Link
US (2) US5499257A (zh)
JP (1) JP2830671B2 (zh)
DE (1) DE4400184C2 (zh)
TW (1) TW237572B (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3315556B2 (ja) * 1994-04-27 2002-08-19 三菱電機株式会社 レーザ加工装置
JP3837626B2 (ja) * 1998-10-29 2006-10-25 ミヤチテクノス株式会社 レーザ加工装置
US6947802B2 (en) * 2000-04-10 2005-09-20 Hypertherm, Inc. Centralized control architecture for a laser materials processing system
US20030174744A1 (en) * 2002-03-13 2003-09-18 Reilly Timothy J. Digital control of burst mode laser
US7186947B2 (en) 2003-03-31 2007-03-06 Hypertherm, Inc. Process monitor for laser and plasma materials processing of materials
KR100576156B1 (ko) * 2003-10-22 2006-05-03 삼성전자주식회사 댐이 형성된 반도체 장치 및 그 반도체 장치의 실장 구조
JP2005158984A (ja) * 2003-11-26 2005-06-16 Fanuc Ltd レーザ発振器
JP2005268558A (ja) * 2004-03-19 2005-09-29 Fanuc Ltd レーザ装置
US20060163220A1 (en) 2005-01-27 2006-07-27 Brandt Aaron D Automatic gas control for a plasma arc torch
US7889772B2 (en) * 2006-04-25 2011-02-15 Mitsubishi Electric Corporation Laser oscillator apparatus and power supply apparatus therefor, and control method therefor
JP2008028317A (ja) * 2006-07-25 2008-02-07 Fanuc Ltd レーザ装置
DE102007030398A1 (de) * 2007-06-29 2009-01-02 Trumpf Laser- Und Systemtechnik Gmbh Vorrichtung und Verfahren zur Überwachung der Temperatur und/oder einer temperaturabhängigen Kenngröße eines optischen Elements
US8731014B2 (en) 2012-02-02 2014-05-20 Coherent, Inc. Output-power control apparatus for a CO2 gas-discharge laser
CN103606801A (zh) * 2013-11-29 2014-02-26 中国科学院上海硅酸盐研究所 一种反馈控制的封离式二氧化碳激光管

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4745614A (en) * 1986-08-20 1988-05-17 Kabushiki Kaisha Komatsu Seisakusho Silent discharge type laser device
JP2804027B2 (ja) * 1987-07-13 1998-09-24 ファナック 株式会社 レーザ出力補正方式
JPH01161883A (ja) * 1987-12-18 1989-06-26 Nec Corp ガスレーザ発振器
JPH0714090B2 (ja) * 1988-11-24 1995-02-15 株式会社島津製作所 エキシマレーザ装置
US5036519A (en) * 1988-12-05 1991-07-30 Ricoh Company, Ltd. Semiconductor laser controller
JP2644315B2 (ja) * 1989-01-23 1997-08-25 ファナック株式会社 高周波放電励起レーザ装置
JPH0330452A (ja) * 1989-06-28 1991-02-08 Hitachi Ltd 半導体集積回路装置
JPH03202808A (ja) * 1989-12-28 1991-09-04 Toshiba Corp レーザ発振器の光量制御装置
CH679816A5 (zh) * 1990-02-15 1992-04-15 Ingbuero Fuer Laser Technologi
US5003624A (en) * 1990-03-29 1991-03-26 Hughes Aircraft Company Automatic bias controller for electro-optic modulator
JPH04123483A (ja) * 1990-09-14 1992-04-23 Mitsubishi Electric Corp レーザ出力制御装置
FR2680883B1 (fr) * 1991-08-30 1993-11-19 Alcatel Cit Procede et dispositif de commande d'un convertisseur de longueur d'onde optique.
JPH0590691A (ja) * 1991-09-26 1993-04-09 Sharp Corp レーザ光出力制御装置
US5280536A (en) * 1991-10-11 1994-01-18 Coherent, Inc. Method and apparatus for supplying pulsed power to an ophthalmic laser system
US5272716A (en) * 1991-10-15 1993-12-21 Mcdonnell Douglas Corporation Hand held laser apparatus
FR2694423B1 (fr) * 1992-07-30 1994-12-23 France Telecom Dispositif de contrôle de la puissance de sortie des diodes laser.

Also Published As

Publication number Publication date
DE4400184C2 (de) 2000-11-30
JP2830671B2 (ja) 1998-12-02
US5499257A (en) 1996-03-12
JPH06204596A (ja) 1994-07-22
DE4400184A1 (de) 1994-08-04
US5638389A (en) 1997-06-10

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