TW230263B - One fabrication method for gate below 0.25 micrometer with general light mask and light resistance on transistor and integrated circuit - Google Patents

One fabrication method for gate below 0.25 micrometer with general light mask and light resistance on transistor and integrated circuit

Info

Publication number
TW230263B
TW230263B TW82110939A TW82110939A TW230263B TW 230263 B TW230263 B TW 230263B TW 82110939 A TW82110939 A TW 82110939A TW 82110939 A TW82110939 A TW 82110939A TW 230263 B TW230263 B TW 230263B
Authority
TW
Taiwan
Prior art keywords
light resistance
micrometer
metal film
transistor
etching
Prior art date
Application number
TW82110939A
Other languages
English (en)
Inventor
Jia-Jenn Lii
Original Assignee
Jia-Jenn Lii
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jia-Jenn Lii filed Critical Jia-Jenn Lii
Priority to TW82110939A priority Critical patent/TW230263B/zh
Application granted granted Critical
Publication of TW230263B publication Critical patent/TW230263B/zh

Links

Landscapes

  • Weting (AREA)
  • Bipolar Transistors (AREA)
TW82110939A 1993-12-23 1993-12-23 One fabrication method for gate below 0.25 micrometer with general light mask and light resistance on transistor and integrated circuit TW230263B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW82110939A TW230263B (en) 1993-12-23 1993-12-23 One fabrication method for gate below 0.25 micrometer with general light mask and light resistance on transistor and integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW82110939A TW230263B (en) 1993-12-23 1993-12-23 One fabrication method for gate below 0.25 micrometer with general light mask and light resistance on transistor and integrated circuit

Publications (1)

Publication Number Publication Date
TW230263B true TW230263B (en) 1994-09-11

Family

ID=51348561

Family Applications (1)

Application Number Title Priority Date Filing Date
TW82110939A TW230263B (en) 1993-12-23 1993-12-23 One fabrication method for gate below 0.25 micrometer with general light mask and light resistance on transistor and integrated circuit

Country Status (1)

Country Link
TW (1) TW230263B (zh)

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