TW229350B - - Google Patents

Info

Publication number
TW229350B
TW229350B TW082106654A TW82106654A TW229350B TW 229350 B TW229350 B TW 229350B TW 082106654 A TW082106654 A TW 082106654A TW 82106654 A TW82106654 A TW 82106654A TW 229350 B TW229350 B TW 229350B
Authority
TW
Taiwan
Application number
TW082106654A
Original Assignee
Hitachi Seisakusyo Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Seisakusyo Kk filed Critical Hitachi Seisakusyo Kk
Application granted granted Critical
Publication of TW229350B publication Critical patent/TW229350B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
    • H05K3/184—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method using masks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786—Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793—Aqueous alkaline solution, e.g. for cleaning or etching
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49126—Assembling bases
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
TW082106654A 1992-08-28 1993-08-18 TW229350B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22969292 1992-08-28

Publications (1)

Publication Number Publication Date
TW229350B true TW229350B (zh) 1994-09-01

Family

ID=16896212

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082106654A TW229350B (zh) 1992-08-28 1993-08-18

Country Status (6)

Country Link
US (2) US5438751A (zh)
EP (1) EP0584780B1 (zh)
KR (1) KR970004758B1 (zh)
CN (1) CN1038806C (zh)
DE (1) DE69326925T2 (zh)
TW (1) TW229350B (zh)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07235755A (ja) * 1994-02-25 1995-09-05 Hitachi Ltd プリント配線基板の製法
JP2001144432A (ja) * 1999-11-02 2001-05-25 Internatl Business Mach Corp <Ibm> 絶縁層上の導体層の製造方法およびビルドアップ回路基板の製造方法
US6360950B1 (en) 2000-03-10 2002-03-26 Melida J. Hoover-Szendre Circuit board stuffing process
WO2002016973A2 (en) * 2000-08-25 2002-02-28 Microcoating Technologies, Inc. Electronic and optical devices and methods of forming these devices
US7029529B2 (en) 2002-09-19 2006-04-18 Applied Materials, Inc. Method and apparatus for metallization of large area substrates
US7666291B2 (en) 2005-09-28 2010-02-23 Chunghwa Picture Tubes, Ltd. Method for fabricating metal wires
KR100932535B1 (ko) * 2007-11-28 2009-12-17 주식회사 심텍 임베디드 저항이 포함된 인쇄회로기판 및 그 제조방법
US8765217B2 (en) 2008-11-04 2014-07-01 Entrotech, Inc. Method for continuous production of (meth)acrylate syrup and adhesives therefrom
US8329079B2 (en) 2009-04-20 2012-12-11 Entrochem, Inc. Method and apparatus for continuous production of partially polymerized compositions and polymers therefrom
CN103369837B (zh) * 2012-04-09 2016-04-06 安捷利电子科技（苏州）有限公司 卷式催化浆料填孔并形成电路的双面柔性电路板工艺
CN105407648B (zh) * 2014-09-16 2018-08-03 常州欣盛微结构电子有限公司 极细的金属线路的制造方法及其结构

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE21737E (en) 1941-03-04 Resin bonded abrasive article
US21737A (en) * 1858-10-12 bishop
US2884336A (en) * 1955-01-27 1959-04-28 Rohm & Haas Methods for producing coated leather and the products thereof
US3311966A (en) * 1962-09-24 1967-04-04 North American Aviation Inc Method of fabricating multilayer printed-wiring boards
JPS5226259B2 (zh) * 1973-02-10 1977-07-13
US3883352A (en) * 1973-04-05 1975-05-13 Grace W R & Co Process for forming a photocured solder resist
GB1478341A (en) * 1973-06-07 1977-06-29 Hitachi Chemical Co Ltd Printed circuit board and method of making the same
US4181752A (en) * 1974-09-03 1980-01-01 Minnesota Mining And Manufacturing Company Acrylic-type pressure sensitive adhesives by means of ultraviolet radiation curing
JPS5397416A (en) * 1977-02-04 1978-08-25 Asahi Chemical Ind Light polymeric constitute possible for water development
JPS54133322A (en) * 1978-04-07 1979-10-17 Cho Lsi Gijutsu Kenkyu Kumiai Positive type ionizing radiation sensitive resist
US4196272A (en) * 1978-11-27 1980-04-01 Nalco Chemical Company Continuous process for the preparation of an acrylic acid-methyl acrylate copolymer in a tubular reactor
JPS56145907A (en) * 1980-04-15 1981-11-13 Kyowa Gas Chem Ind Co Ltd Production of methacrylic resin having excellent heat distorsion resistance
DE3131448A1 (de) * 1981-08-07 1983-02-24 Basf Ag, 6700 Ludwigshafen Fuer die herstellung von photoresistschichten geeignete photopolymerisierbare aufzeichnungsmasse
JPH0642073B2 (ja) * 1984-04-10 1994-06-01 三菱レイヨン株式会社 光重合性樹脂組成物
JPS61213213A (ja) * 1985-03-19 1986-09-22 Fuji Photo Film Co Ltd 光重合性組成物
US4716303A (en) * 1985-05-01 1987-12-29 Sharp Kabushiki Kaisha MOS IC pull-up circuit
JPS61262736A (ja) * 1985-05-17 1986-11-20 Nippon Oil & Fats Co Ltd 感光性樹脂組成物
US4761303A (en) * 1986-11-10 1988-08-02 Macdermid, Incorporated Process for preparing multilayer printed circuit boards
JPS6410234A (en) * 1987-07-02 1989-01-13 Mitsubishi Chem Ind Photopolymerizable negative type resist
JPH01296248A (ja) * 1988-05-24 1989-11-29 Neos Co Ltd フォトレジスト用剥離剤
SU1668369A1 (ru) * 1988-11-14 1991-08-07 Научно-исследовательский институт химии при Горьковском государственном университете им.Н.И.Лобачевского Способ получени органического стекла
JPH0636472B2 (ja) * 1990-05-28 1994-05-11 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 多層配線基板の製造方法
JPH04206677A (ja) * 1990-11-30 1992-07-28 Hitachi Chem Co Ltd ダブルアクセスフレキシブル印刷配線板の製造方法
DE19507174A1 (de) * 1995-03-02 1996-09-05 Roehm Gmbh UV-härtbare Kratzfestlacke mit einpolymerisierendem Verdicker

Also Published As

Publication number Publication date
KR970004758B1 (ko) 1997-04-03
KR940005202A (ko) 1994-03-16
DE69326925D1 (de) 1999-12-09
DE69326925T2 (de) 2000-02-24
CN1086372A (zh) 1994-05-04
CN1038806C (zh) 1998-06-17
US5438751A (en) 1995-08-08
EP0584780B1 (en) 1999-11-03
EP0584780A3 (en) 1995-08-02
EP0584780A2 (en) 1994-03-02
US5919603A (en) 1999-07-06

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