TW212250B - - Google Patents
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- TW212250B TW212250B TW081104161A TW81104161A TW212250B TW 212250 B TW212250 B TW 212250B TW 081104161 A TW081104161 A TW 081104161A TW 81104161 A TW81104161 A TW 81104161A TW 212250 B TW212250 B TW 212250B
- Authority
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- Taiwan
- Prior art keywords
- semiconductor device
- thin film
- film
- leads
- patent application
- Prior art date
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- 239000004065 semiconductor Substances 0.000 claims description 36
- 239000010409 thin film Substances 0.000 claims description 33
- 239000010408 film Substances 0.000 claims description 28
- 239000000463 material Substances 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 4
- 238000004806 packaging method and process Methods 0.000 claims description 4
- 229920005989 resin Polymers 0.000 claims description 3
- 239000011347 resin Substances 0.000 claims description 3
- 238000005538 encapsulation Methods 0.000 claims description 2
- 239000010931 gold Substances 0.000 claims description 2
- 229910052737 gold Inorganic materials 0.000 claims description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 claims 2
- 229920000069 polyphenylene sulfide Polymers 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000002985 plastic film Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 230000009977 dual effect Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 230000008450 motivation Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/4985—Flexible insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/02—Containers; Seals
- H01L23/04—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls
- H01L23/053—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body
- H01L23/057—Containers; Seals characterised by the shape of the container or parts, e.g. caps, walls the container being a hollow construction and having an insulating or insulated base as a mounting for the semiconductor body the leads being parallel to the base
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/16—Fillings or auxiliary members in containers or encapsulations, e.g. centering rings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Lead Frames For Integrated Circuits (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Wire Bonding (AREA)
Description
21325U A6 _B6_ 五、發明説明(1) 發明之領域 本發明係關於半導體裝置,尤指一種使用可撓性薄膜 供為封裝材料之封裝。 發明之背景 一 人們對於更電路度板密度之需要,终於産生具有低輪 廓之小型半導體裝置。人們慣常由平面觀點考慮電路板 空間條件,薄封裝之動機則為次要論點。不過,隨著電 子業界考慮薄封裝,以針對與種種産品如記億卡、靈巧 卡、仿真卡等有關之密度問題,封裝厚度便為一性關鍵 性因素。 先前技藝封裝包括習知之封装,諸如National Semicondutor's TapePak™,帶自動接合(Tape Automated Bonding,簡稱 TAB),雙列直插引線(Dual I η - 1 i n e P i η ,簡稱D I P )封裝,及小型輪廓封裝(S in a 1 1 Outline Packages,簡稱 SOPs) e TAB 封裝使用一種液 體塑膠包封半導體晶片。習知之先前技藝封裝用金屬線 接合將晶片連接至引線框架。TapePak™ 沿封裝之四面 均有連接。 發明之槪逑 '' 經濟部中央標準局貝工消費合作社印製 本發明為一種半導體封裝,其中傜將半導體装置夾於 二薄層塑膠薄膜之間。薄膜使該裝置對環境氣密密封, 使該裝置具有機械強度,提供低輪廓,並為一種低重量 裝置。與標準之封裝技術比較,該封裝為成本低廉。 81. 5. 20.000(H) (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度遑用中國國家標準(CNS)甲4規格(210X297公釐) 212250 A6 B6 五、發明説明(2) 種 一 有 為具 可或 置具 裝模 體體 導導 半半 之 上 朝 片 晶 成 凸 之 點 觸 電 或體 ’積 下 朝 片 晶 路 可 形一 構合 配 力 . 應 圖 之 附 上 合 面 配 接 , 交 明 線 說 n 弓 歹 1 下 部 之 凸 例 使 施 以 實 , 佳 線 較 引 項 置 一 偏 之 用 。明 使少發 環最本 承為由 支減 將 慮 C 考的 色目 特多 穎諸 新其 種及 •I ΙΛ 1" 之步 釋進 閫術 所技 圍之 範表 利 '代 專所明 請明說 申發要 附本簡 後白之 及明圖 以會附 圖 面 剖 視圖 側視 之上 裝之 封裝 之封 明之 發 1 本圖 為為 1 2 圖圖 圖 視 。 側圖 之視 裝倒 封之 之裝 上封 朝之 側環 點承 觸支明 具及說 模線之 體引例 導置施 半偏實 以有佳 一 一 較 為為之 3 4 明 圖圖發 本 多體可 有導膜 上半薄 10。料 具點材 模觸此 體部 , 導凸蓋 半一覆 。每以 置至予 裝箸膜 體附薄 導11料 半線材 裝引一 封一以 膜 。a 5 ο 薄 1 1 1 點面 示觸背 1 部之 圖凸具 痼模 為 如 例 為 此 冊 註 有 具 ill 種1 之 造 製 所 材底 片之 之具 度模 厚體 吋導 05半 ο . 0 為脂 可樹 膜物 薄化 此硫 。撐 料苯 材聚 性為 撓料 可材 膜之 薄性 之般 標一 商 〇 (請先閱讀背面之注意事項再填寫本頁) 裝- 訂- 經濟部中央標準局貝工消費合作社印製 間選 之任 線可 引線 與引 蓋 。 覆合 在接 。波 蓋音 覆超 以成 予作 膜位 薄部 膠之 塑示 由所 也 B 11及 線 A 引頭 及箭 面在 引 例 施 實1 在 0 圍 周 膜-C 薄成 部製 底所 於架 叠框 摺線 > 弓 示之 所把 中鍍 1 由 函為 如線 本紙張尺度逍用中B國家標毕(CNS)甲4規格(210x297公*) 81. 5. 20,000(H) 經濟部中央標準局貝工消费合作社印製 五、發明説明(3) 画2為圖1之裝置之上視圖,示引線在積體電路裝置 上之一般配置。引線11予以繞裝置10設置,並且伸出裝 置之側面。除了提供外部電接觸至積體電路之引線11a 之尾端外,塑膠薄膜覆蓋該裝置及引線》引線數及引線 之排列並非關鍵性因素,而是可依裝置構形繞半導體裝 置排列。 封裝為輕質,在一實施例約為Q.Q3吋厚度。此種薄膜 封裝裝置可起機械式及電作用,並且在大多數情況,提 供較之標準環氧樹脂模製裝置更乾淨及更好之密封裝置。 該封裝之工序流程包括將晶片以接頭帶接合至一引線 框架或諸引線,將該裝置及諸引線置於二片薄膜之間, 並以超音波將薄膜密封於引線周圍之步驟。薄膜在諸引 線間自相密封並密封至引線,以形成一種氣密密封。薄 膜之密封可在使一連缜帶引線框架上之多値裝置分開前 予以完成。在密封後,裝置可予以標示符號,並在測試 前分開為痼別之裝置。 圖3示薄膜封裝之第二實施例。半導體裝或積體電路 2 0上有多痼觸點21。諸引線22予以接合至觸點,·然後並 向下傾斜至半導體裝置之平面。其後,將上薄膜23及下· 薄膜24密封於該裝置周圍,以及密封至諸引線22。 圖4示薄膜封裝之S —實施例。半導體裝置3Q予以安 裝為以觸點側面朝上。諸引線予以連接至觸點,然後並 向下彎曲,以位於半導體裝置之平面。一絶線材料之支 -5 - A 6 B6 (請先閲讀背面之注意事項再填寫本頁) 裝. 訂- 線‘ 本紙張尺度逍用中國《家楳毕(CNS)甲4規格(210X297公龙) 81. 5. 20,000(H)
Si挪ο A6 B6 五、發明説明(4 ) 環 合 線 承 接 引ai支 在32及 裝線 3 安弓點 3 於觸 環高至 承伸加 半 在 點 觸 至 面 上 份將 體gp並 一 ΛΜ 之 導U , 延 於 並4¾置 3 5 ’ 膜 3 $ Μ膜 冑㈣® - 膠 2塱Η® f 一一 平 第 置 裝 3 用 端可 末也 線環 引承 與支 1X 3 ο 點少 觸最 輕至 減減 33其 環使 承並 支 , 。力 面壓 下或 o J 3 力 覃應 裝之 體處 導合 半接 位 或 伸 延 置 裝 該 繞 全 完 可 〇 環域 該區 〇之 置點 裝觸 之 \ 合線 接引 線在 屬好 金恰 於於 (請先閲讀背面之注意事項再填寫本頁) 裝< 訂_ 線· 經濟部中央標準局貝工消費合作社印製 本紙張尺度逍用中B國家標準(CNS)甲4規格(210x297公*) 81. 5. 20,000(fl)
Claims (1)
- A B c D 212250 六、申請專利範si 1. 一種薄膜半導體裝置封裝,包含: 一半導體裝置; (請先閱讀背面之注意事項再填寫本頁) ‘多條引線有一端附著至半導體裝置及一第二端延伸 離開該半導體裝置; - 一第一薄膜在半導體模具及引線之一側面;以及 一第二薄膜在與上述第一薄膜相反之半導體模具及 引線之側面; 其中上述第一及第二薄膜予以在上述諸引線間彼此 接合,並予接合至上述諸引線'以形成一供上述半導 體裝置之密封式薄膜封裝,而上述諸第二端自該薄膜 封裝伸出。 2. 根據申請專利範圍第1項之薄膜封裝,其中上述第一 及第二薄膜像予彼此超音波接合及接合至上述多條引 線。 3. 根據申請專利範圍第3項之薄膜封裝,其中上述第二 引線端自接合之薄膜伸出,並且摺回於薄膜封裝之一 部份。 4. 根據申請專利範圔第1項之薄膜封裝,包括一在薄膜 封裝内之金臑環,此金鼷環將薄膜支承於引線端附著, 至半導體裝置之部位。 短.濟部中央標準局R工消費合作杜印製 5. 根據申謓專利範圍第1項之薄膜封装,其中薄膜係一 種聚苯撐硫化物樹脂。 6. 根據申諳專利範圍第1項之薄膜封裝,其中引線像用 -7 - 本紙证尺度適】丨】家#準(CNS)»p43Lji格(210x297公 1?) + 81. 1. 5.000(H) 7 7 7 7 A B c D 六、申請專利範SI 一接頭片接合連接至半導體裝置。 7. 根據申請*專利範圍第1項之薄膜封裝,其中薄膜係在 諸裝置引線與一連缠引線框架帶分開前施加至半導體 裝置並將其密封。 - 8. —種薄膜半導體裝置封裝,包含: 一半導體裝置; 多條引線有一端附箸至半導體裝置及一第二端延伸 離開該半導體裝置; 一第一薄膜在半導體模具及引線之一側面;以及 一第二薄膜在與上述第一薄膜相反之半導體模具及 引線之倒面;以及 一金颶環在薄膜封装内將該薄膜支承在引線末端附 箸至半導體裝置之部位; 其中上述第一及第二薄膜予以在上述諸引線間彼此 接合,並予接合至上述諸引線,以形成一供上述半導 體裝置之密封式薄膜封裝,而上述諸第二端自該薄膜 封裝伸出。 9. 根據申請專利範圍第8項之薄膜封裝,其中上毬第一 及第二薄膜僳予彼此超音波接合及接合至上述多條引· 線。 經濟部中央標準局Η工消費合作社印製 (請先閑讀背面之注意事項再填寫本頁) 10. 根據申請專利範圍第8項之薄膜封裝,其中上述第 二引線端自接合之薄膜伸出,並且摺回於薄膜封裝之 —部份。 "8 - 本紙張尺度適丨丨]中《«家標芈(CNS)<P4规格(210x297公"ΪΠ ' 81. 1. 5.000(H) 212^^ AT B7 C7 D7 六、申請專利苑® 11. 根據申請專利範圍第8項之薄膜封裝,其中薄膜傷 一種聚苯撐硫化物樹脂。 12. 根據申請專利範圍第8項之薄膜封装 用一接頭片接合連接至半導體装置。 13. 根據申請專利範圍第8項之薄膜封裝 在諸裝置引線與一連缠引線框架帶分開 體裝置並將其密封。 ,其中引線傜 ,其中薄膜傜 前施加至半導 14. 一種製造薄膜封裝半導體裝置之方法 將一引線框架上之諸引線以接頭片接 包含下列步驟 合相互連接至 一 TAB接合凸起之半導體晶片; 施加薄膜材料至半導體裝置及引線之相對表面;以 及 超音波密封薄膜材料,以包封半導體裝置及諸引線 之一部份。 15. 根據申請專利範圍第14項之方法,包 内密封半導體裝置及諸引線之一部份以 環安裝於諸引線一部份之步驟。 16. 根據申諳專利範圍第14項之方法,其 使諸值別裝置分開前,施加至一連缠帶 多锢半導體裝置。 括在薄膜封装 前,將一支承 中薄膜傜予在 引線框架上之 ............................( ......................R...............................訂·.........................级 (請先閱讀背面之注意事項再填寫本頁) 經濟部中央標準局Η工消費合作社印製 本紙張尺度適川中B «家標毕(CNS) <P4規格(210x297公S) 81. 1. 5.000(H)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/664,170 US5130783A (en) | 1991-03-04 | 1991-03-04 | Flexible film semiconductor package |
Publications (1)
Publication Number | Publication Date |
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TW212250B true TW212250B (zh) | 1993-09-01 |
Family
ID=24664867
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW081104161A TW212250B (zh) | 1991-03-04 | 1992-05-28 |
Country Status (6)
Country | Link |
---|---|
US (1) | US5130783A (zh) |
EP (1) | EP0502710B1 (zh) |
JP (1) | JPH0567692A (zh) |
KR (1) | KR100263723B1 (zh) |
DE (1) | DE69212185T2 (zh) |
TW (1) | TW212250B (zh) |
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US5294827A (en) * | 1992-12-14 | 1994-03-15 | Motorola, Inc. | Semiconductor device having thin package body and method for making the same |
US5820014A (en) | 1993-11-16 | 1998-10-13 | Form Factor, Inc. | Solder preforms |
JP3378338B2 (ja) * | 1994-03-01 | 2003-02-17 | 新光電気工業株式会社 | 半導体集積回路装置 |
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US5994152A (en) | 1996-02-21 | 1999-11-30 | Formfactor, Inc. | Fabricating interconnects and tips using sacrificial substrates |
US8033838B2 (en) | 1996-02-21 | 2011-10-11 | Formfactor, Inc. | Microelectronic contact structure |
US5786988A (en) * | 1996-07-02 | 1998-07-28 | Sandisk Corporation | Integrated circuit chips made bendable by forming indentations in their back surfaces flexible packages thereof and methods of manufacture |
US5877555A (en) * | 1996-12-20 | 1999-03-02 | Ericsson, Inc. | Direct contact die attach |
DE19653782A1 (de) * | 1996-12-21 | 1998-07-02 | Mci Computer Gmbh | Halbleiter-Bauelement |
US6478229B1 (en) | 2000-03-14 | 2002-11-12 | Harvey Epstein | Packaging tape with radio frequency identification technology |
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US7583862B2 (en) * | 2003-11-26 | 2009-09-01 | Aptina Imaging Corporation | Packaged microelectronic imagers and methods of packaging microelectronic imagers |
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US8092734B2 (en) * | 2004-05-13 | 2012-01-10 | Aptina Imaging Corporation | Covers for microelectronic imagers and methods for wafer-level packaging of microelectronics imagers |
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US7498647B2 (en) * | 2004-06-10 | 2009-03-03 | Micron Technology, Inc. | Packaged microelectronic imagers and methods of packaging microelectronic imagers |
US7262405B2 (en) * | 2004-06-14 | 2007-08-28 | Micron Technology, Inc. | Prefabricated housings for microelectronic imagers |
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US7294897B2 (en) * | 2004-06-29 | 2007-11-13 | Micron Technology, Inc. | Packaged microelectronic imagers and methods of packaging microelectronic imagers |
US7232754B2 (en) * | 2004-06-29 | 2007-06-19 | Micron Technology, Inc. | Microelectronic devices and methods for forming interconnects in microelectronic devices |
US7416913B2 (en) * | 2004-07-16 | 2008-08-26 | Micron Technology, Inc. | Methods of manufacturing microelectronic imaging units with discrete standoffs |
US7189954B2 (en) * | 2004-07-19 | 2007-03-13 | Micron Technology, Inc. | Microelectronic imagers with optical devices and methods of manufacturing such microelectronic imagers |
US7402453B2 (en) * | 2004-07-28 | 2008-07-22 | Micron Technology, Inc. | Microelectronic imaging units and methods of manufacturing microelectronic imaging units |
US20060023107A1 (en) * | 2004-08-02 | 2006-02-02 | Bolken Todd O | Microelectronic imagers with optics supports having threadless interfaces and methods for manufacturing such microelectronic imagers |
US7364934B2 (en) | 2004-08-10 | 2008-04-29 | Micron Technology, Inc. | Microelectronic imaging units and methods of manufacturing microelectronic imaging units |
US7223626B2 (en) * | 2004-08-19 | 2007-05-29 | Micron Technology, Inc. | Spacers for packaged microelectronic imagers and methods of making and using spacers for wafer-level packaging of imagers |
US7397066B2 (en) * | 2004-08-19 | 2008-07-08 | Micron Technology, Inc. | Microelectronic imagers with curved image sensors and methods for manufacturing microelectronic imagers |
US7429494B2 (en) | 2004-08-24 | 2008-09-30 | Micron Technology, Inc. | Microelectronic imagers with optical devices having integral reference features and methods for manufacturing such microelectronic imagers |
US7115961B2 (en) * | 2004-08-24 | 2006-10-03 | Micron Technology, Inc. | Packaged microelectronic imaging devices and methods of packaging microelectronic imaging devices |
US7425499B2 (en) | 2004-08-24 | 2008-09-16 | Micron Technology, Inc. | Methods for forming interconnects in vias and microelectronic workpieces including such interconnects |
US7276393B2 (en) * | 2004-08-26 | 2007-10-02 | Micron Technology, Inc. | Microelectronic imaging units and methods of manufacturing microelectronic imaging units |
US7511262B2 (en) * | 2004-08-30 | 2009-03-31 | Micron Technology, Inc. | Optical device and assembly for use with imaging dies, and wafer-label imager assembly |
US20070148807A1 (en) * | 2005-08-22 | 2007-06-28 | Salman Akram | Microelectronic imagers with integrated optical devices and methods for manufacturing such microelectronic imagers |
US7646075B2 (en) * | 2004-08-31 | 2010-01-12 | Micron Technology, Inc. | Microelectronic imagers having front side contacts |
US7300857B2 (en) | 2004-09-02 | 2007-11-27 | Micron Technology, Inc. | Through-wafer interconnects for photoimager and memory wafers |
KR100577430B1 (ko) | 2004-09-03 | 2006-05-08 | 삼성전자주식회사 | 디스플레이 장치 |
US7271482B2 (en) * | 2004-12-30 | 2007-09-18 | Micron Technology, Inc. | Methods for forming interconnects in microelectronic workpieces and microelectronic workpieces formed using such methods |
US7214919B2 (en) * | 2005-02-08 | 2007-05-08 | Micron Technology, Inc. | Microelectronic imaging units and methods of manufacturing microelectronic imaging units |
US7303931B2 (en) * | 2005-02-10 | 2007-12-04 | Micron Technology, Inc. | Microfeature workpieces having microlenses and methods of forming microlenses on microfeature workpieces |
US20060177999A1 (en) * | 2005-02-10 | 2006-08-10 | Micron Technology, Inc. | Microelectronic workpieces and methods for forming interconnects in microelectronic workpieces |
US7190039B2 (en) * | 2005-02-18 | 2007-03-13 | Micron Technology, Inc. | Microelectronic imagers with shaped image sensors and methods for manufacturing microelectronic imagers |
US7795134B2 (en) | 2005-06-28 | 2010-09-14 | Micron Technology, Inc. | Conductive interconnect structures and formation methods using supercritical fluids |
US20060290001A1 (en) * | 2005-06-28 | 2006-12-28 | Micron Technology, Inc. | Interconnect vias and associated methods of formation |
US7262134B2 (en) | 2005-09-01 | 2007-08-28 | Micron Technology, Inc. | Microfeature workpieces and methods for forming interconnects in microfeature workpieces |
US7288757B2 (en) * | 2005-09-01 | 2007-10-30 | Micron Technology, Inc. | Microelectronic imaging devices and associated methods for attaching transmissive elements |
US7622377B2 (en) | 2005-09-01 | 2009-11-24 | Micron Technology, Inc. | Microfeature workpiece substrates having through-substrate vias, and associated methods of formation |
US20100194465A1 (en) * | 2009-02-02 | 2010-08-05 | Ali Salih | Temperature compensated current source and method therefor |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
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US4007479A (en) * | 1976-03-29 | 1977-02-08 | Honeywell Information Systems, Inc. | Fixture for an integrated circuit chip |
CA1226966A (en) * | 1985-09-10 | 1987-09-15 | Gabriel Marcantonio | Integrated circuit chip package |
US4870476A (en) * | 1986-02-13 | 1989-09-26 | Vtc Incorporated | Integrated circuit packaging process and structure |
ATE115335T1 (de) * | 1988-09-30 | 1994-12-15 | Raychem Ltd | Verbindungsartikel für hybrid-mikrochip. |
DE3838085A1 (de) * | 1988-11-10 | 1990-05-17 | Rheinmetall Gmbh | Beschleunigungsfeste verpackung fuer integrierte schaltungen und verfahren zu ihrer herstellung |
JPH02240956A (ja) * | 1989-02-03 | 1990-09-25 | Motorola Inc | プラスチックカプセル収納集積回路デバイスおよびその製造方法 |
US5019673A (en) * | 1990-08-22 | 1991-05-28 | Motorola, Inc. | Flip-chip package for integrated circuits |
-
1991
- 1991-03-04 US US07/664,170 patent/US5130783A/en not_active Expired - Lifetime
-
1992
- 1992-03-03 KR KR1019920003479A patent/KR100263723B1/ko not_active IP Right Cessation
- 1992-03-04 DE DE69212185T patent/DE69212185T2/de not_active Expired - Fee Related
- 1992-03-04 JP JP4046553A patent/JPH0567692A/ja active Pending
- 1992-03-04 EP EP92301854A patent/EP0502710B1/en not_active Expired - Lifetime
- 1992-05-28 TW TW081104161A patent/TW212250B/zh active
Also Published As
Publication number | Publication date |
---|---|
KR920018878A (ko) | 1992-10-22 |
KR100263723B1 (ko) | 2000-09-01 |
EP0502710A1 (en) | 1992-09-09 |
JPH0567692A (ja) | 1993-03-19 |
EP0502710B1 (en) | 1996-07-17 |
DE69212185T2 (de) | 1996-11-21 |
US5130783A (en) | 1992-07-14 |
DE69212185D1 (de) | 1996-08-22 |
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