TW202548407A - 光罩基底用基板、附多層反射膜之基板、反射型光罩基底、反射型光罩、透過型光罩基底及透過型光罩、以及半導體裝置之製造方法 - Google Patents
光罩基底用基板、附多層反射膜之基板、反射型光罩基底、反射型光罩、透過型光罩基底及透過型光罩、以及半導體裝置之製造方法Info
- Publication number
- TW202548407A TW202548407A TW114134753A TW114134753A TW202548407A TW 202548407 A TW202548407 A TW 202548407A TW 114134753 A TW114134753 A TW 114134753A TW 114134753 A TW114134753 A TW 114134753A TW 202548407 A TW202548407 A TW 202548407A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- substrate
- reflective film
- reflective
- multilayer reflective
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020-162097 | 2020-09-28 | ||
| JP2020162097 | 2020-09-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202548407A true TW202548407A (zh) | 2025-12-16 |
Family
ID=80845392
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW114134753A TW202548407A (zh) | 2020-09-28 | 2021-09-27 | 光罩基底用基板、附多層反射膜之基板、反射型光罩基底、反射型光罩、透過型光罩基底及透過型光罩、以及半導體裝置之製造方法 |
| TW110135745A TWI899337B (zh) | 2020-09-28 | 2021-09-27 | 附多層反射膜之基板、反射型光罩基底、反射型光罩之製造方法及半導體裝置之製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110135745A TWI899337B (zh) | 2020-09-28 | 2021-09-27 | 附多層反射膜之基板、反射型光罩基底、反射型光罩之製造方法及半導體裝置之製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20230314928A1 (https=) |
| JP (2) | JP7793527B2 (https=) |
| KR (1) | KR20230073195A (https=) |
| TW (2) | TW202548407A (https=) |
| WO (1) | WO2022065144A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2024029410A1 (https=) * | 2022-08-03 | 2024-02-08 | ||
| WO2025120973A1 (ja) * | 2023-12-05 | 2025-06-12 | Agc株式会社 | 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3939167B2 (ja) * | 2002-02-28 | 2007-07-04 | Hoya株式会社 | 露光用反射型マスクブランク、その製造方法及び露光用反射型マスク |
| US20040131947A1 (en) * | 2003-01-07 | 2004-07-08 | International Business Machines Corporation | Reflective mask structure and method of formation |
| JP5239762B2 (ja) * | 2008-11-13 | 2013-07-17 | 大日本印刷株式会社 | 反射型マスク、および、反射型マスク製造方法 |
| KR102180712B1 (ko) * | 2012-09-28 | 2020-11-19 | 호야 가부시키가이샤 | 다층 반사막 부착 기판의 제조방법 |
| JP6033987B1 (ja) * | 2014-12-19 | 2016-11-30 | Hoya株式会社 | マスクブランク用基板、マスクブランク及びこれらの製造方法、転写用マスクの製造方法並びに半導体デバイスの製造方法 |
| JP2016122751A (ja) * | 2014-12-25 | 2016-07-07 | Hoya株式会社 | 多層反射膜付き基板、反射型マスクブランク及び反射型マスク、並びに多層反射膜付き基板、反射型マスクブランク及び半導体装置の製造方法 |
| JP6556029B2 (ja) * | 2015-11-18 | 2019-08-07 | Hoya株式会社 | レジスト層付きマスクブランク、レジスト層付きマスクブランクの製造方法、及び、転写用マスクの製造方法 |
| JP6739960B2 (ja) * | 2016-03-28 | 2020-08-12 | Hoya株式会社 | 反射型マスクブランク、反射型マスク及び半導体装置の製造方法 |
| KR102429244B1 (ko) * | 2017-02-27 | 2022-08-05 | 호야 가부시키가이샤 | 마스크 블랭크 및 임프린트 몰드의 제조 방법 |
| US10962873B2 (en) * | 2017-09-29 | 2021-03-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Extreme ultraviolet mask and method of manufacturing the same |
-
2021
- 2021-09-15 WO PCT/JP2021/033837 patent/WO2022065144A1/ja not_active Ceased
- 2021-09-15 JP JP2022551911A patent/JP7793527B2/ja active Active
- 2021-09-15 US US18/024,918 patent/US20230314928A1/en active Pending
- 2021-09-15 KR KR1020237008903A patent/KR20230073195A/ko active Pending
- 2021-09-27 TW TW114134753A patent/TW202548407A/zh unknown
- 2021-09-27 TW TW110135745A patent/TWI899337B/zh active
-
2025
- 2025-12-17 JP JP2025258480A patent/JP2026034634A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2026034634A (ja) | 2026-02-27 |
| JPWO2022065144A1 (https=) | 2022-03-31 |
| KR20230073195A (ko) | 2023-05-25 |
| WO2022065144A1 (ja) | 2022-03-31 |
| TW202219625A (zh) | 2022-05-16 |
| JP7793527B2 (ja) | 2026-01-05 |
| US20230314928A1 (en) | 2023-10-05 |
| TWI899337B (zh) | 2025-10-01 |
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