TW202528396A - 共聚物、非線性光學材料和電光學元件 - Google Patents
共聚物、非線性光學材料和電光學元件Info
- Publication number
- TW202528396A TW202528396A TW113142849A TW113142849A TW202528396A TW 202528396 A TW202528396 A TW 202528396A TW 113142849 A TW113142849 A TW 113142849A TW 113142849 A TW113142849 A TW 113142849A TW 202528396 A TW202528396 A TW 202528396A
- Authority
- TW
- Taiwan
- Prior art keywords
- group
- carbon atoms
- copolymer
- nonlinear
- repeating unit
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/34—Introducing sulfur atoms or sulfur-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
- C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023191822 | 2023-11-09 | ||
| JP2023-191822 | 2023-11-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202528396A true TW202528396A (zh) | 2025-07-16 |
Family
ID=95696018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW113142849A TW202528396A (zh) | 2023-11-09 | 2024-11-08 | 共聚物、非線性光學材料和電光學元件 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2025100536A1 (cg-RX-API-DMAC7.html) |
| KR (1) | KR20260089624A (cg-RX-API-DMAC7.html) |
| CN (1) | CN122138987A (cg-RX-API-DMAC7.html) |
| TW (1) | TW202528396A (cg-RX-API-DMAC7.html) |
| WO (1) | WO2025100536A1 (cg-RX-API-DMAC7.html) |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19525304A1 (de) * | 1995-07-12 | 1997-01-16 | Basf Ag | Copolymere mit Adamantyl- und Farbstoffseitenketten |
| JP2004148811A (ja) * | 2002-10-08 | 2004-05-27 | Fuji Photo Film Co Ltd | セルロースアシレートフイルムの製造方法、セルロースアシレートフイルム、並びにそれを用いた光学機能性シート、偏光板、液晶表示装置及びハロゲン化銀写真感光材料 |
| JP4631297B2 (ja) * | 2004-03-10 | 2011-02-16 | Jsr株式会社 | (メタ)アクリル酸系重合体および感放射線性樹脂組成物 |
| JP4621525B2 (ja) * | 2005-03-30 | 2011-01-26 | 富士フイルム株式会社 | Euv露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| US20080102403A1 (en) * | 2006-10-27 | 2008-05-01 | Samsung Electronics Co., Ltd. | Photoresist compositions and methods of forming a pattern using the same |
| JP2009075430A (ja) * | 2007-09-21 | 2009-04-09 | Fujifilm Corp | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| JP6150157B2 (ja) * | 2012-12-28 | 2017-06-21 | 国立大学法人九州大学 | 非線形光学活性コポリマー |
| JP6137694B2 (ja) * | 2014-03-18 | 2017-05-31 | 国立研究開発法人情報通信研究機構 | 有機電気光学ポリマーとして有用な、ガラス転移温度調整可能な共重合体、及び該共重合体を用いた有機電気光学素子 |
| JP2017159815A (ja) | 2016-03-10 | 2017-09-14 | アイシン精機株式会社 | 車両用スライドドア装置 |
| KR102323778B1 (ko) * | 2019-12-04 | 2021-11-11 | 주식회사 트리엘 | 아다만틸 아크릴계 모노머를 포함하는 저유전 코팅액 조성물 |
| WO2023074622A1 (ja) * | 2021-10-29 | 2023-05-04 | 国立大学法人九州大学 | 非線形光学活性コポリマー |
| JPWO2023145943A1 (cg-RX-API-DMAC7.html) * | 2022-01-31 | 2023-08-03 |
-
2024
- 2024-11-08 JP JP2025556481A patent/JPWO2025100536A1/ja active Pending
- 2024-11-08 TW TW113142849A patent/TW202528396A/zh unknown
- 2024-11-08 WO PCT/JP2024/039859 patent/WO2025100536A1/ja active Pending
- 2024-11-08 KR KR1020267016157A patent/KR20260089624A/ko active Pending
- 2024-11-08 CN CN202480070944.8A patent/CN122138987A/zh active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| CN122138987A (zh) | 2026-06-02 |
| JPWO2025100536A1 (cg-RX-API-DMAC7.html) | 2025-05-15 |
| KR20260089624A (ko) | 2026-06-15 |
| WO2025100536A1 (ja) | 2025-05-15 |
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