CN122138987A - 共聚物、非线性光学材料和电光学元件 - Google Patents

共聚物、非线性光学材料和电光学元件

Info

Publication number
CN122138987A
CN122138987A CN202480070944.8A CN202480070944A CN122138987A CN 122138987 A CN122138987 A CN 122138987A CN 202480070944 A CN202480070944 A CN 202480070944A CN 122138987 A CN122138987 A CN 122138987A
Authority
CN
China
Prior art keywords
group
carbon atoms
repeating structural
copolymer
structural unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480070944.8A
Other languages
English (en)
Chinese (zh)
Inventor
德田雄介
小林武史
山田俊树
大友明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Organic Chemical Industry Co Ltd
National Institute of Information and Communications Technology
Original Assignee
Osaka Organic Chemical Industry Co Ltd
National Institute of Information and Communications Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Organic Chemical Industry Co Ltd, National Institute of Information and Communications Technology filed Critical Osaka Organic Chemical Industry Co Ltd
Publication of CN122138987A publication Critical patent/CN122138987A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/34—Introducing sulfur atoms or sulfur-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/281—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing only one oxygen, e.g. furfuryl (meth)acrylate or 2-methoxyethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C08F220/36—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate containing oxygen in addition to the carboxy oxygen, e.g. 2-N-morpholinoethyl (meth)acrylate or 2-isocyanatoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/30—Introducing nitrogen atoms or nitrogen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN202480070944.8A 2023-11-09 2024-11-08 共聚物、非线性光学材料和电光学元件 Pending CN122138987A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023191822 2023-11-09
JP2023-191822 2023-11-09
PCT/JP2024/039859 WO2025100536A1 (ja) 2023-11-09 2024-11-08 コポリマー、非線形光学材料、及び電気光学素子

Publications (1)

Publication Number Publication Date
CN122138987A true CN122138987A (zh) 2026-06-02

Family

ID=95696018

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480070944.8A Pending CN122138987A (zh) 2023-11-09 2024-11-08 共聚物、非线性光学材料和电光学元件

Country Status (5)

Country Link
JP (1) JPWO2025100536A1 (cg-RX-API-DMAC7.html)
KR (1) KR20260089624A (cg-RX-API-DMAC7.html)
CN (1) CN122138987A (cg-RX-API-DMAC7.html)
TW (1) TW202528396A (cg-RX-API-DMAC7.html)
WO (1) WO2025100536A1 (cg-RX-API-DMAC7.html)

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19525304A1 (de) * 1995-07-12 1997-01-16 Basf Ag Copolymere mit Adamantyl- und Farbstoffseitenketten
JP2004148811A (ja) * 2002-10-08 2004-05-27 Fuji Photo Film Co Ltd セルロースアシレートフイルムの製造方法、セルロースアシレートフイルム、並びにそれを用いた光学機能性シート、偏光板、液晶表示装置及びハロゲン化銀写真感光材料
JP4631297B2 (ja) * 2004-03-10 2011-02-16 Ｊｓｒ株式会社 （メタ）アクリル酸系重合体および感放射線性樹脂組成物
JP4621525B2 (ja) * 2005-03-30 2011-01-26 富士フイルム株式会社 Ｅｕｖ露光用ポジ型レジスト組成物及びそれを用いたパターン形成方法
US20080102403A1 (en) * 2006-10-27 2008-05-01 Samsung Electronics Co., Ltd. Photoresist compositions and methods of forming a pattern using the same
JP2009075430A (ja) * 2007-09-21 2009-04-09 Fujifilm Corp ポジ型レジスト組成物及びそれを用いたパターン形成方法
JP6150157B2 (ja) * 2012-12-28 2017-06-21 国立大学法人九州大学 非線形光学活性コポリマー
JP6137694B2 (ja) * 2014-03-18 2017-05-31 国立研究開発法人情報通信研究機構 有機電気光学ポリマーとして有用な、ガラス転移温度調整可能な共重合体、及び該共重合体を用いた有機電気光学素子
JP2017159815A (ja) 2016-03-10 2017-09-14 アイシン精機株式会社 車両用スライドドア装置
KR102323778B1 (ko) * 2019-12-04 2021-11-11 주식회사 트리엘 아다만틸 아크릴계 모노머를 포함하는 저유전 코팅액 조성물
WO2023074622A1 (ja) * 2021-10-29 2023-05-04 国立大学法人九州大学 非線形光学活性コポリマー
JPWO2023145943A1 (cg-RX-API-DMAC7.html) * 2022-01-31 2023-08-03

Also Published As

Publication number Publication date
TW202528396A (zh) 2025-07-16
JPWO2025100536A1 (cg-RX-API-DMAC7.html) 2025-05-15
KR20260089624A (ko) 2026-06-15
WO2025100536A1 (ja) 2025-05-15

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