TW202426513A - 封裝組合物及膜層 - Google Patents
封裝組合物及膜層 Download PDFInfo
- Publication number
- TW202426513A TW202426513A TW111148382A TW111148382A TW202426513A TW 202426513 A TW202426513 A TW 202426513A TW 111148382 A TW111148382 A TW 111148382A TW 111148382 A TW111148382 A TW 111148382A TW 202426513 A TW202426513 A TW 202426513A
- Authority
- TW
- Taiwan
- Prior art keywords
- component
- compound
- weight
- particle size
- independently
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 108
- 239000008393 encapsulating agent Substances 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 claims abstract description 68
- 239000000843 powder Substances 0.000 claims abstract description 50
- 239000003999 initiator Substances 0.000 claims abstract description 9
- 150000001491 aromatic compounds Chemical class 0.000 claims abstract description 7
- 238000004806 packaging method and process Methods 0.000 claims description 67
- 239000002245 particle Substances 0.000 claims description 55
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 41
- 125000003342 alkenyl group Chemical group 0.000 claims description 34
- 239000011737 fluorine Chemical group 0.000 claims description 22
- 229910052731 fluorine Inorganic materials 0.000 claims description 22
- 239000000047 product Substances 0.000 claims description 21
- -1 2-vinylphenyl Chemical group 0.000 claims description 18
- 125000002733 (C1-C6) fluoroalkyl group Chemical group 0.000 claims description 17
- QEDJMOONZLUIMC-UHFFFAOYSA-N 1-tert-butyl-4-ethenylbenzene Chemical compound CC(C)(C)C1=CC=C(C=C)C=C1 QEDJMOONZLUIMC-UHFFFAOYSA-N 0.000 claims description 16
- 238000005538 encapsulation Methods 0.000 claims description 16
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical group FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 15
- 125000000217 alkyl group Chemical group 0.000 claims description 13
- 239000001257 hydrogen Substances 0.000 claims description 10
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims description 8
- 125000001153 fluoro group Chemical group F* 0.000 claims description 7
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 claims description 7
- 125000000882 C2-C6 alkenyl group Chemical group 0.000 claims description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 6
- 239000003607 modifier Substances 0.000 claims description 6
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 claims description 4
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 claims description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 4
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 4
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 4
- 239000006087 Silane Coupling Agent Substances 0.000 claims description 3
- WVAFEFUPWRPQSY-UHFFFAOYSA-N 1,2,3-tris(ethenyl)benzene Chemical compound C=CC1=CC=CC(C=C)=C1C=C WVAFEFUPWRPQSY-UHFFFAOYSA-N 0.000 claims description 2
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 claims description 2
- XQBHAZDVLGNSOJ-UHFFFAOYSA-N 1-(4-ethenylphenyl)-n,n-dimethylmethanamine Chemical compound CN(C)CC1=CC=C(C=C)C=C1 XQBHAZDVLGNSOJ-UHFFFAOYSA-N 0.000 claims description 2
- VDNSZPNSUQRUMS-UHFFFAOYSA-N 1-cyclohexyl-4-ethenylbenzene Chemical compound C1=CC(C=C)=CC=C1C1CCCCC1 VDNSZPNSUQRUMS-UHFFFAOYSA-N 0.000 claims description 2
- SAMJGBVVQUEMGC-UHFFFAOYSA-N 1-ethenoxy-2-(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOC=C SAMJGBVVQUEMGC-UHFFFAOYSA-N 0.000 claims description 2
- OUSXYCTXXLYBGJ-UHFFFAOYSA-N 1-ethenyl-2,4-di(propan-2-yl)benzene Chemical compound CC(C)C1=CC=C(C=C)C(C(C)C)=C1 OUSXYCTXXLYBGJ-UHFFFAOYSA-N 0.000 claims description 2
- OEVVKKAVYQFQNV-UHFFFAOYSA-N 1-ethenyl-2,4-dimethylbenzene Chemical compound CC1=CC=C(C=C)C(C)=C1 OEVVKKAVYQFQNV-UHFFFAOYSA-N 0.000 claims description 2
- NVZWEEGUWXZOKI-UHFFFAOYSA-N 1-ethenyl-2-methylbenzene Chemical compound CC1=CC=CC=C1C=C NVZWEEGUWXZOKI-UHFFFAOYSA-N 0.000 claims description 2
- JZHGRUMIRATHIU-UHFFFAOYSA-N 1-ethenyl-3-methylbenzene Chemical compound CC1=CC=CC(C=C)=C1 JZHGRUMIRATHIU-UHFFFAOYSA-N 0.000 claims description 2
- RRRXUCMQOPNVAT-UHFFFAOYSA-N 1-ethenyl-4-(4-methylphenyl)benzene Chemical compound C1=CC(C)=CC=C1C1=CC=C(C=C)C=C1 RRRXUCMQOPNVAT-UHFFFAOYSA-N 0.000 claims description 2
- VVTGQMLRTKFKAM-UHFFFAOYSA-N 1-ethenyl-4-propylbenzene Chemical compound CCCC1=CC=C(C=C)C=C1 VVTGQMLRTKFKAM-UHFFFAOYSA-N 0.000 claims description 2
- OIEANVCCDIRIDJ-UHFFFAOYSA-N 1-ethenyl-5-hexylnaphthalene Chemical compound C1=CC=C2C(CCCCCC)=CC=CC2=C1C=C OIEANVCCDIRIDJ-UHFFFAOYSA-N 0.000 claims description 2
- ZMYIIHDQURVDRB-UHFFFAOYSA-N 1-phenylethenylbenzene Chemical group C=1C=CC=CC=1C(=C)C1=CC=CC=C1 ZMYIIHDQURVDRB-UHFFFAOYSA-N 0.000 claims description 2
- LUECERFWADIZPD-UHFFFAOYSA-N 1-tert-butyl-2-ethenylbenzene Chemical compound CC(C)(C)C1=CC=CC=C1C=C LUECERFWADIZPD-UHFFFAOYSA-N 0.000 claims description 2
- SMSKIVCCLIQXFD-UHFFFAOYSA-N 1-tert-butyl-3-ethenylbenzene Chemical compound CC(C)(C)C1=CC=CC(C=C)=C1 SMSKIVCCLIQXFD-UHFFFAOYSA-N 0.000 claims description 2
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 claims description 2
- BJELTSYBAHKXRW-UHFFFAOYSA-N 2,4,6-triallyloxy-1,3,5-triazine Chemical compound C=CCOC1=NC(OCC=C)=NC(OCC=C)=N1 BJELTSYBAHKXRW-UHFFFAOYSA-N 0.000 claims description 2
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 claims description 2
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 claims description 2
- PMZXJPLGCUVUDN-UHFFFAOYSA-N 4-ethenyl-1,2-dimethylbenzene Chemical compound CC1=CC=C(C=C)C=C1C PMZXJPLGCUVUDN-UHFFFAOYSA-N 0.000 claims description 2
- 239000004641 Diallyl-phthalate Substances 0.000 claims description 2
- 239000005062 Polybutadiene Substances 0.000 claims description 2
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 claims description 2
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 claims description 2
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- UBHHTPOLMACCDD-UHFFFAOYSA-N n,n-dimethyl-4-phenylbut-3-en-1-amine Chemical compound CN(C)CCC=CC1=CC=CC=C1 UBHHTPOLMACCDD-UHFFFAOYSA-N 0.000 claims description 2
- 150000001282 organosilanes Chemical group 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 229920002857 polybutadiene Polymers 0.000 claims description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 claims description 2
- 239000001294 propane Substances 0.000 claims description 2
- AKRQMTFHUVDMIL-UHFFFAOYSA-N tetrakis(prop-2-enyl)silane Chemical compound C=CC[Si](CC=C)(CC=C)CC=C AKRQMTFHUVDMIL-UHFFFAOYSA-N 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 4
- 150000002978 peroxides Chemical group 0.000 claims 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 26
- CARSMBZECAABMO-UHFFFAOYSA-N 3-chloro-2,6-dimethylbenzoic acid Chemical compound CC1=CC=C(Cl)C(C)=C1C(O)=O CARSMBZECAABMO-UHFFFAOYSA-N 0.000 description 17
- 239000000377 silicon dioxide Substances 0.000 description 14
- 239000010410 layer Substances 0.000 description 11
- 239000005022 packaging material Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 8
- 230000009477 glass transition Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 150000002431 hydrogen Chemical group 0.000 description 5
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 4
- LTQBNYCMVZQRSD-UHFFFAOYSA-N (4-ethenylphenyl)-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(C=C)C=C1 LTQBNYCMVZQRSD-UHFFFAOYSA-N 0.000 description 4
- GRFNSWBVXHLTCI-UHFFFAOYSA-N 1-ethenyl-4-[(2-methylpropan-2-yl)oxy]benzene Chemical compound CC(C)(C)OC1=CC=C(C=C)C=C1 GRFNSWBVXHLTCI-UHFFFAOYSA-N 0.000 description 4
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 description 4
- KBQVDAIIQCXKPI-UHFFFAOYSA-N 3-trimethoxysilylpropyl prop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C=C KBQVDAIIQCXKPI-UHFFFAOYSA-N 0.000 description 4
- PRKPGWQEKNEVEU-UHFFFAOYSA-N 4-methyl-n-(3-triethoxysilylpropyl)pentan-2-imine Chemical compound CCO[Si](OCC)(OCC)CCCN=C(C)CC(C)C PRKPGWQEKNEVEU-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 4
- 239000003822 epoxy resin Substances 0.000 description 4
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 4
- 238000012858 packaging process Methods 0.000 description 4
- 229920000647 polyepoxide Polymers 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000004132 cross linking Methods 0.000 description 3
- 150000001924 cycloalkanes Chemical class 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- ZBXBDQPVXIIXJS-UHFFFAOYSA-N 2,4,6,8,10-pentakis(ethenyl)-2,4,6,8,10-pentamethyl-1,3,5,7,9,2,4,6,8,10-pentaoxapentasilecane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 ZBXBDQPVXIIXJS-UHFFFAOYSA-N 0.000 description 2
- VMAWODUEPLAHOE-UHFFFAOYSA-N 2,4,6,8-tetrakis(ethenyl)-2,4,6,8-tetramethyl-1,3,5,7,2,4,6,8-tetraoxatetrasilocane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O[Si](C)(C=C)O1 VMAWODUEPLAHOE-UHFFFAOYSA-N 0.000 description 2
- BVTLTBONLZSBJC-UHFFFAOYSA-N 2,4,6-tris(ethenyl)-2,4,6-trimethyl-1,3,5,2,4,6-trioxatrisilinane Chemical compound C=C[Si]1(C)O[Si](C)(C=C)O[Si](C)(C=C)O1 BVTLTBONLZSBJC-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- DOYKFSOCSXVQAN-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(OCC)CCCOC(=O)C(C)=C DOYKFSOCSXVQAN-UHFFFAOYSA-N 0.000 description 2
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 2
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 description 2
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 2
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 description 2
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 2
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 2
- IHOYHKVQNJDASX-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS.CO[Si](OC)(OC)CCCS IHOYHKVQNJDASX-UHFFFAOYSA-N 0.000 description 2
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 description 2
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 description 2
- ZDSFBVVBFMKMRF-UHFFFAOYSA-N dimethyl-bis(prop-2-enyl)silane Chemical compound C=CC[Si](C)(C)CC=C ZDSFBVVBFMKMRF-UHFFFAOYSA-N 0.000 description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 2
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 description 2
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 125000003784 fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000005394 methallyl group Chemical group 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 2
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 2
- 238000012856 packing Methods 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- JPPLPDOXWBVPCW-UHFFFAOYSA-N s-(3-triethoxysilylpropyl) octanethioate Chemical compound CCCCCCCC(=O)SCCC[Si](OCC)(OCC)OCC JPPLPDOXWBVPCW-UHFFFAOYSA-N 0.000 description 2
- 238000006561 solvent free reaction Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical group Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 2
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 description 2
- VTHOKNTVYKTUPI-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyltetrasulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSSSCCC[Si](OCC)(OCC)OCC VTHOKNTVYKTUPI-UHFFFAOYSA-N 0.000 description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 2
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000005050 vinyl trichlorosilane Substances 0.000 description 2
- NALFRYPTRXKZPN-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane Chemical compound CC1CC(C)(C)CC(OOC(C)(C)C)(OOC(C)(C)C)C1 NALFRYPTRXKZPN-UHFFFAOYSA-N 0.000 description 1
- HSLFISVKRDQEBY-UHFFFAOYSA-N 1,1-bis(tert-butylperoxy)cyclohexane Chemical compound CC(C)(C)OOC1(OOC(C)(C)C)CCCCC1 HSLFISVKRDQEBY-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- HQOVXPHOJANJBR-UHFFFAOYSA-N 2,2-bis(tert-butylperoxy)butane Chemical compound CC(C)(C)OOC(C)(CC)OOC(C)(C)C HQOVXPHOJANJBR-UHFFFAOYSA-N 0.000 description 1
- AWFYPPSBLUWMFQ-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(1,4,6,7-tetrahydropyrazolo[4,3-c]pyridin-5-yl)ethanone Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=C2 AWFYPPSBLUWMFQ-UHFFFAOYSA-N 0.000 description 1
- HTCRKQHJUYBQTK-UHFFFAOYSA-N 2-ethylhexyl 2-methylbutan-2-yloxy carbonate Chemical compound CCCCC(CC)COC(=O)OOC(C)(C)CC HTCRKQHJUYBQTK-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical group C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical group O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 125000006001 difluoroethyl group Chemical group 0.000 description 1
- 125000001028 difluoromethyl group Chemical group [H]C(F)(F)* 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 125000005817 fluorobutyl group Chemical group [H]C([H])(F)C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000005004 perfluoroethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000006337 tetrafluoro ethyl group Chemical group 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/32—Monomers containing only one unsaturated aliphatic radical containing two or more rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/34—Monomers containing two or more unsaturated aliphatic radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/12—Monomers containing a branched unsaturated aliphatic radical or a ring substituted by an alkyl radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F216/125—Monomers containing two or more unsaturated aliphatic radicals, e.g. trimethylolpropane triallyl ether or pentaerythritol triallyl ether
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/34—Silicon-containing compounds
- C08K3/36—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K9/00—Use of pretreated ingredients
- C08K9/04—Ingredients treated with organic substances
- C08K9/06—Ingredients treated with organic substances with silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
- C09D125/02—Homopolymers or copolymers of hydrocarbons
- C09D125/16—Homopolymers or copolymers of alkyl-substituted styrenes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D125/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Coating compositions based on derivatives of such polymers
- C09D125/18—Homopolymers or copolymers of aromatic monomers containing elements other than carbon and hydrogen
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D129/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal, or ketal radical; Coating compositions based on hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Coating compositions based on derivatives of such polymers
- C09D129/10—Homopolymers or copolymers of unsaturated ethers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
- C09D7/62—Additives non-macromolecular inorganic modified by treatment with other compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
- C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2325/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring; Derivatives of such polymers
- C08J2325/02—Homopolymers or copolymers of hydrocarbons
- C08J2325/04—Homopolymers or copolymers of styrene
- C08J2325/08—Copolymers of styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2312/00—Crosslinking
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Materials For Photolithography (AREA)
Abstract
本揭露提供一種封裝組合物及其固化物。該封裝組合物包含20-45重量份的成分(A)、55-80重量份的成分(B)、以及成分(C)。該成分(A)與該成分(B)的總重量為100重量份,且該成分(C)與成分(A)的重量比為1:100至5:100。該成分(A)包含一第一化合物(A-1)以及一第二化合物(A-2)、該成分(B)係一未改質的無機粉體或一改質的無機粉體、以及成分(C)係一起始劑。該第一化合物(A-1)係具有式(I)或式(II)所示結構,以及該第二化合物(A-2)係單烯基芳香族化合物(monoalkenyl aromatic compound)
,其中R
1、R
2、R
3、R
4、R
5、R
6、R
7、R
8、R
9、R
10、R
11、R
12、a、b、c、d、e及f如說明書所定義。
Description
本揭露關於一種封裝組合物及膜層。
環氧樹脂廣泛應用於光電以及半導體元件,由於優異的機械性能以及良好的耐熱性,是作為絕緣材料的優選之一。然而,傳統環氧樹脂之硬化物具有高極性之羥基,因此於高頻領域下無法得到足夠低的低介電特性。
此外,傳統低介電環氧樹脂樹脂具有較高的熔點,且於高溫之熔融狀態下亦具有高黏性,因此無法應用在無溶劑型液態封裝材料上。
根據本揭露實施例,本揭露提供一種封裝組合物。該封裝組合物可包含20-45重量份的成分(A)、55-80重量份的成分(B)、以及成分(C)。該成分(A)與該成分(B)的總重量為100重量份,且該成分(C)與成分(A)的重量比可為1:100至5:100。該成分(A)包含一第一化合物(A-1)以及一第二化合物(A-2)。該成分(B)係一未改質的無機粉體或一改質的無機粉體。成分(C)係一起始劑。該第一化合物(A-1)可為具有式(I)或式(II)所示結構的化合物。該第二化合物(A-2)可為單烯基芳香族化合物(monoalkenyl aromatic compound)
式(I)
式(II)
,其中R
1及R
2係各自獨立為氫、氟、甲基、氟甲基、或乙基;R
3、R
4、R
5、R
6係各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基,且R
3、R
4、R
5、R
6至少兩者為C
2-6烯基;R
7及R
8係各自獨立為C
2-6末端烯基、2-乙烯基苯基(2-vinylphenyl)、3-乙烯基苯基(3-vinylphenyl)、或4-乙烯基苯基(4-vinylphenyl);R
9及R
10係各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;a及b係各自獨立為1、2、3、4、或5;以及,c、d、e以及f係各自獨立為1、2、3、或4。
根據本揭露實施例,本揭露亦提供一種膜層。該膜層包含本揭露所述封裝組合物之固化產物。
以下針對本揭露所述之封裝組合物及膜層作詳細說明。應了解的是,以下之敘述提供許多不同的實施例或例子,用以實施本揭露之不同樣態。以下所述特定的元件及排列方式僅為簡單描述本揭露。當然,這些僅用以舉例而非本揭露之限定。本揭露中,用詞「約」係指所指定之量可增加或減少一本領域技藝人士可認知為一般且合理的大小的量。
本揭露提供一種封裝組合物(在室溫下為低黏度樹脂組合物),不包含有機溶劑或共沸挾帶劑,可應用於為無溶劑之液態封裝材料。本揭露所述封裝組合物可作為膠材,應用於異方性導電接著劑、底部填充(underfill)膠、或B階段(b-stageable)貼合膜或液態模封膠材。藉由特定結構的化合物(例如特定的環烷烴衍生樹脂、特定的單官能基稀釋劑)以及特定的成份比例,本揭露所述封裝組合物可藉由無溶劑反應(neat reaction)進行固化,得到一膜層(即封裝材料)。包含該封裝組合物之固化物的膜層,除了在高頻(10GHz以上的頻段)可具有低介電常數(dielectric coefficient,Dk)及低介電損失因子(dielectric loss factor,Df),亦具有低彈性模數及高玻璃轉化溫度的特性,可滿足封裝材料(例如應用於高頻區段半導體封裝製程之封裝材料)的需求。
根據本揭露實施例,本揭露所述封裝組合物可包含20-45重量份的成分(A)、55-80重量份的成分(B)、以及成分(C)。該成分(A)與該成分(B)的總重量可為100重量份,且該成分(C)與成分(A)的重量比可為1:100至5:100 (例如2:100、3:100、或4:100)。
根據本揭露實施例,該成分(A)可包含一第一化合物(A-1)以及一第二化合物(A-2)。根據本揭露實施例,該第一化合物(A-1)與該第二化合物(A-2)的重量比為9:1至3:7(例如8:2、7:3、6:4、5:5、或4:6)。當該第一化合物(A-1)與該第二化合物(A-2)的重量比過高時,封裝組合物在固化製程後易得到過高交聯的產物,材料易脆裂。當該第一化合物(A-1)與該第二化合物(A-2)的重量比過低時,封裝組合物不具成型性。
根據本揭露實施例,該第一化合物(A-1)(例如環烷烴衍生樹脂)可為具有式(I)或式(II)所示結構的化合物
式(I)
式(II)
,其中R
1及R
2係各自獨立為氫、氟、甲基、氟甲基、或乙基;R
3、R
4、R
5、R
6係各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基,且R
3、R
4、R
5、R
6至少兩者為C
2-6烯基;R
7及R
8係各自獨立為C
2-6末端烯基、2-乙烯基苯基(2-vinylphenyl)、3-乙烯基苯基(3-vinylphenyl)、或4-乙烯基苯基(4-vinylphenyl);R
9及R
10係各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;a及b係各自獨立為1、2、3、4、或5;以及,c、d、e以及f係各自獨立為1、2、3、或4。當a為2、3、4、或5時,R
3各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;當b為2、3、4、或5時,R
6各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;當c為2、3、或4時,R
4各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;當d為2、3、或4時,R
5各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;當e為2、3、或4時,R
9各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;以及,當f為2、3、或4時,R
10各自獨立為氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基。
根據本揭露實施例,C
1-6烷基可為直鏈或分支鏈(linear or branched)的烷基。舉例來說,C
1-6烷基可為甲基(methyl)、乙基(ethyl)、丙基(propyl)、丁基(butyl)、戊基(pentyl)、己基(hexyl)、或其異構體(isomer)。根據本揭露實施例,C
1-6氟烷基係指碳上的氫全部或部份被氟取代的烷基,且可為直鏈或分支鏈(linear or branched),例如氟甲基(fluoromethyl)、氟乙基(fluoroethyl)、丙基(fluoropropyl)、丁基(fluorobutyl)、戊基(fluoropentyl)、氟己基(fluorohexyl)、或其異構體(isomer)。在此,本揭露所述氟甲基可為單氟甲基、二氟甲基、或全氟甲基,而氟乙基可為單氟乙基、二氟乙基、三氟乙基、四氟乙基、或全氟乙基。根據本揭露實施例,C
2-6烯基可為直鏈或分支鏈(linear or branched)的烯基。舉例來說,C
2-6烯基可為乙烯基(vinyl)、烯丙基(allyl)、甲基烯丙基(methallyl)、4-丁烯基(butenyl), 5-戊烯基(pentenyl)、或6-己烯基(6-hexenyl)。
根據本揭露實施例,該第一化合物(A-1)可為
、
、
、
、
、
、
、
、
、
,其中R
1及R
2係各自獨立為氫、氟、甲基、氟甲基、或乙基;R
3、R
4、R
5、R
6係各自獨立為氫、氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基,且R
3、R
4、R
5、R
6至少兩者為C
2-6烯基;a及b係各自獨立為1、2、3、4、或5;以及,c及d係各自獨立為1、2、3、或4。
根據本揭露實施例,該具有式(I)所示結構的化合物可具有四個末端烯基。舉例來說,在該具有式(I)所示結構的化合物中,R
3、R
4、R
5、R
6係各自獨立為 C
2-6末端烯基,且a、b、c及d係各自獨立為1。換言之,該第一化合物(A-1)可具有至少四個可進行自由基聚合的手臂(arms),因此具有高交聯反應性。如此一來,可進一步降低封裝組合物其固化物的介電常數(dielectric coefficient,Dk)及介電損失因子(dielectric loss factor,Df),提高其介電穩定性。根據本揭露實施例,具有四個C
2-6末端烯基的第一化合物(A-1)可為
、
、
、
、
、
、
、
、或
,其中R
3、R
4、R
5、R
6可各自獨立為乙烯基(vinyl)、烯丙基(allyl)、甲基烯丙基(methallyl)、4-丁烯基(butenyl), 5-戊烯基(pentenyl)、或6-己烯基(6-hexenyl)。
根據本揭露實施例,該第一化合物(A-1)可為
、
、或
,其中R
7及R
8可各自獨立為C
2-6末端烯基、2-乙烯基苯基(2-vinylphenyl)、3-乙烯基苯基(3-vinylphenyl)、或4-乙烯基苯基(4-vinylphenyl);R
9及R
10可各自獨立為氫、氟、C
1-6烷基、C
1-6氟烷基、或C
2-6末端烯基;以及,e及f係各自獨立為1、2、3、或4。
根據本揭露實施例,該具有式(II)所示結構的化合物可具有四個末端烯基。舉例來說,在該具有式(II)所示結構的化合物中,當e為1時,R
9為C
2-6末端烯基;當f為1時,R
10為C
2-6末端烯基;當e為2、3、或4時,至少一個R
9為C
2-6末端烯基;以及,當f為2、3、或4時,至少一個R
10為C
2-6末端烯基。換言之,該第一化合物(A-1)可具有至少四個可進行自由基聚合的手臂(arms),因此具有高交聯反應性。如此一來,可進一步降低封裝組合物其固化物的介電常數(dielectric coefficient,Dk)及介電損失因子(dielectric loss factor,Df),提高其介電穩定性。
根據本揭露實施例,該第二化合物(A-2)可為單烯基芳香族化合物(monoalkenyl aromatic compound),作為單官能基稀釋劑(調整組成物黏度,避免封裝組合物在固化製程後得到過高交聯的產物)。
根據本揭露實施例,該第二化合物(A-2)可為苯乙烯(styrene), α-甲基苯乙烯(α-methylstyrene)、2-甲基苯乙烯(2-methylstyrene)、 3-甲基苯乙烯(3-methylstyrene)、 4-甲基苯乙烯(4-methylstyrene)、 2,4-甲基苯乙烯(2,4-dimethylstyrene)、 2,4-二異丙基苯乙烯(2,4-diisopropylstyrene)、 4-丙基苯乙烯(4-propylstyrene)、4-環己基苯乙烯(4-cyclohexylstyrene)、 4-(對甲基苯基)苯乙烯(4-(p-methylphenyl)styrene)、2-第三丁基苯乙烯(2-tert-butylstyrene)、3-第三丁基苯乙烯(3-tert-butylstyrene)、4-第三丁基苯乙烯(4-tert-butylstyrene)、N,N-二甲基氨基乙基苯乙烯(N,N-dimethylaminoethylstyrene)、1-乙烯基-5-己萘(1-vinyl-5-hexylnaphthalene)、乙烯基苄基二甲基胺(N-(4-Vinylbenzyl)-N,N-dimethylamine)、2-乙烯基吡啶(2-vinylpyridine)、4-乙烯基-1,2-二甲基苯 (4-ethenyl-1,2-dimethyl-benzene)、1-乙烯基萘(1-vinylnaphthalene)、1,1-二苯乙烯(1,1-diphenylethylene) 、2-苯基丙烯(2-propenylbenzene)、或上述之組合。
根據本揭露實施例,當單烯基芳香族化合物為不包含烷氧基的單烯基芳香族化合物時,可進一步降低封裝組合物之固化物的介電常數(dielectric coefficient,Dk)及介電損失因子(dielectric loss factor,Df)。舉例來說,該單烯基芳香族化合物非為4-第三丁氧基苯乙烯(4-tert-butoxystyrene,tBOS)。
根據本揭露實施例,本揭露所述成分(A)可由該第一化合物(A-1)以及第二化合物(A-2)所組成。
根據本揭露實施例,該成分(A)可更包含一第三化合物(A-3), 其中該第三化合物(A-3)可為一多烯基化合物(multialkenyl compound),用以調整封裝組合物的交聯反應性。根據本揭露實施例,該第二化合物(A-2)與該第三化合物(A-3)的重量比可為1:1至9:1,例如2:1、:3:1、4:1、5:1、6:1、7:1、或8:1。
根據本揭露實施例,本揭露所述成分(A)可由該第一化合物(A-1)、第二化合物(A-2)、以及第三化合物(A-3)所組成。
根據本揭露實施例,該第三化合物(A-3)可為二乙烯基苯(divinylbenzene)、三乙烯基苯(trivinylbenzene)、三烯丙基氰脲酸酯(triallyl cyanurate)、三烯丙基異氰脲酸酯(triallyl isocyanurate)、二乙二醇二乙烯基醚(di(ethylene glycol) divinyl ether)、四烯丙基矽烷(tetraallylsilane)、聚丁二烯(polybutadiene)、苯二甲酸二烯丙酯(diallyl phthalate)、2,2-雙[3-烯丙基-4-(4-乙烯基芐基)苯基]丙烷(2,2-bis[3-allyl-4-(4-vinylbenzyl)phenyl]propane,AV-BPA)、或上述之組合。
根據本揭露實施例,除了成分(A)外,本揭露所述封裝組合物不包含其他反應性樹脂或反應性單體(即可用來形成聚合物的反應性單體)。
根據本揭露實施例,該成分(B)可為一未改質的無機粉體或一改質的無機粉體。
根據本揭露實施例,該未改質的無機粉體或該改質的無機粉體具有一平均粒徑為0.5μm 至20μm,例如1μm、2μm、3μm、4μm、5μm、6μm、7μm、8μm、9μm、10μm、11μm、12μm、13μm、14μm、15μm、16μm、17μm、18μm、或19μm。
根據本揭露實施例,該未改質的無機粉體或該改質的無機粉體之最大粒徑可為1μm至75μm,例如5μm、10μm、15μm、20μm、25μm、30μm、35μm、40μm、45μm、50μm、55μm、60μm、65μm、或70μm。
根據本揭露實施例,該成分(B)(未改質的無機粉體或改質的無機粉體)可包含一具有一第一平均粒徑的第一粉體(B-1)及一具有一第二平均粒徑的第二粉體(B-2)。根據本揭露實施例,該成分(B)(未改質的無機粉體或改質的無機粉體)可由一具有一第一平均粒徑的第一粉體(B-1)及一具有一第二平均粒徑的第二粉體(B-2)所組成。
根據本揭露實施例,該第一平均粒徑大於第二平均粒徑。根據本揭露實施例,該第一平均粒徑可為0.75μm至20μm,例如1μm、2μm、3μm、4μm、5μm、6μm、7μm、8μm、9μm、10μm、11μm、12μm、13μm、14μm、15μm、16μm、17μm、18μm、或19μm。根據本揭露實施例,該第二平均粒徑可為0.5μm至13.34μm,例如1μm、2μm、3μm、4μm、5μm、6μm、7μm、8μm、9μm、10μm、11μm、12μm、或13μm。根據本揭露實施例,該第一平均粒徑與該第二平均粒徑的比值可為1.5至10,例如2、3、4、5、6、7、8、或9。當該第一平均粒徑與該第二平均粒徑的比值在上述範圍內時,可得到較佳填充密度及較低黏度。
根據本揭露實施例,該第一粉體(B-1)與該第二粉體(B-2)的重量比可為1:5至5:1,例如1:4、1:3、1:2、1:1、2:1、3:1、或4:1。當第一粉體(B-1)與該第二粉體(B-2)的重量比在上述範圍內時,可得到較佳填充密度及較低黏度。
根據本揭露實施例,該未改質的無機粉體可為氧化矽、氧化鋁、氧化鈦、氧化鋯、或上述之組合。根據本揭露實施例,該改質的無機粉體可為一氧化物與一改質劑之反應產物,其中該氧化物係氧化矽、氧化鋁、氧化鈦、或氧化鋯,以及該改質劑係有機矽烷(organosilane)。根據本揭露實施例,該氧化物與改質劑的重量比可為1:9至9:1,例如2:8、3:7、4:6、5:5、6:4、7:3、或8:2。
根據本揭露實施例,該改質劑可為乙烯基三氯矽烷(vinyltrichlorosilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、乙烯基三乙氧基矽烷(vinyltriethoxysilane)、(4-乙烯基苯基)三甲氧基矽烷((4-ethenylphenyl)trimethoxy-silane)、2-(3,4-環氧基環己基)乙基三甲氧基矽烷(2-(3,4epoxycyclohexyl)ethyltrimethoxysilane)、3-縮水甘油氧基丙基三甲氧基矽烷(3-glycidoxypropyltrimethoxysilane)、3-縮水甘油氧基丙基甲基二乙氧基矽烷(3-glycidoxypropylmethyldiethoxysilane)、3-縮水甘油氧基丙基三乙氧基矽烷(3-glycidoxypropyltriethoxysilane)、對苯乙烯基三甲氧基矽烷(p-styryltrimethoxysilane)、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷(3-methacryloxypropylmethyldimethoxysilane)、3-甲基丙烯醯氧基丙基三甲氧基矽烷(3-methacryloxypropyltrimethoxysilane)、3-甲基丙烯醯氧基甲基二乙氧基矽烷(3-methacryloxypropylmethyldiethoxysilane)、3-甲基丙烯醯氧基丙基三乙氧基矽烷(3-methacryloxypropyltriethoxysilane)、3-丙烯醯氧基丙基三甲氧基矽烷(3-acryloxypropyltrimethoxysilane)、N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷(N-2(-aminoethyl) 3-aminopropylmethyldimethoxysilane)、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷(N-2(-aminoethyl) 3-aminopropyltrimethoxysilane)、N-2-(胺基乙基)-3-胺基丙基三乙氧基矽烷(N-2(aminoethyl) 3-aminopropyltriethoxysilane)、3-胺基丙基三甲氧基矽烷(3-aminopropyltrimethoxysilane)、3-胺基丙基三乙氧基矽烷(3-aminopropyltriethoxysilane)、3-三乙氧基矽烷基-N-(1,3-二甲基-亞丁基)丙基胺(3-triethoxysilyl-N-(1,3-dimethyl-butylidene)propylamine)、N-苯基-3-胺基丙基三甲氧基矽烷(N-phenyl-3-aminopropyltrimethoxysilane)、3-脲基丙基三乙氧基矽烷(3-ureidopropyltriethoxysilane)、3-氯丙基三甲氧基矽烷(3-chloropropyltrimethoxysilane)、3-巰基丙基甲基二甲氧基矽烷(3-mercaptopropylmethyldimethoxysilane)、3-巰基丙基三甲氧基矽烷(3-mercaptopropyltrimethoxysilane)、雙(三乙氧基矽烷基丙基)四硫化物(bis(triethoxysilylpropyl)tetrasulfide)、3-異氰酸酯基丙基三乙氧基矽烷(3-isocyanatepropyltriethoxysilane)、乙烯基三(2-甲氧基乙氧基)矽烷(vinyltris(2-methoxyethoxy)silane)、乙烯基甲基二甲氧基矽烷(vinylmethyldimethoxysilane)、3-巰基丙基三乙氧基矽烷(3-mercaptopropyltriethoxysilane)、3-辛醯基硫基-1-丙基三乙氧基矽烷(3-octanoylthio-1-propyltriethoxysilane)、3-異氰酸酯基丙基三甲氧基矽烷(3-isocyanatepropyltrimethoxysilane)、3-三乙氧基矽烷基-N-(1,3-二甲基-亞丁基) (3-triethoxysilyl-N-(1,3-dimethyl-butylidene))、3-丙烯醯氧基丙基三甲氧基矽烷(3-acryloxypropyltrimethoxysilane)、3-縮水甘油氧基丙基甲基二甲氧基矽烷(3-glycidoxypropylmethyldimethoxysilane)、雙[3-(三乙氧基矽烷基)丙基]二硫化物(bis[3-(triethoxysilyl)propyl]disulfide)、乙烯基三乙醯氧基矽烷(vinyltriacetoxysilane)、乙烯基三異丙氧基矽烷(vinyltriisopropoxysilane)、烯丙基三甲氧基矽烷(allyltrimethoxysilane)、二烯丙基二甲基矽烷(diallyldimethylsilane)、3-巰基丙基三乙氧基矽烷(3-mercaptopropyltriethoxysilane)、N-(1,3-二甲基亞丁基)-3-胺基丙基三乙氧基矽烷(N-(1,3-dimethylbutylidene)-3-aminopropyltriethoxysilane)、三甲基三乙烯基環三矽氧烷(trimethyltriethenyl cyclotrisiloxane)、四甲基四乙烯基環四矽氧烷(tetramethyltetraethenyl cyclotetrasiloxane)、五甲基五乙烯基環五矽氧烷(pentamethylpentaethenyl cyclopentasiloxane)、或上述之組合。
根據本揭露實施例,該成分(C)可為一起始劑,例如氧化物起始劑。根據本揭露實施例,本揭露所述起始劑的1小時半衰期溫度可為110℃至130℃。舉例來說,該起始劑可為過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate)、過氧化(2-乙基己基)碳酸三級戊酯(tert-amylperoxy 2-ethylhexyl carbonate)、1,1-二第三丁基過氧化環己烷(1,1-di(tert-butylperoxy)cyclohexane)、1,1-二第三丁基過氧化-3,3,5-三甲基環己烷(1,1-di-(tert-butylperoxy)-3,3,5-trimethylcyclohexane)、2,2-雙(過氧化第三丁基)丁烷(2,2-bis(tert-butylperoxy)butane)、或上述之組合。
根據本揭露實施例,本揭露所述封裝組合物可由成分(A)、成分(B)以及成分(C)所組成。
根據本揭露實施例,本揭露所述封裝組合物可更包含成分(D),其中該成分(D)係為矽烷偶聯劑,以增加成分(A)及成份(B)的相容性及分散性。根據本揭露實施例,該成分(D)與成分(A)的重量比可為0.1:100至5:100,例如0.5:100、1:100、2:100、3:100、或4:100。
根據本揭露實施例,該矽烷偶聯劑可為乙烯基三氯矽烷(vinyltrichlorosilane)、乙烯基三甲氧基矽烷(vinyltrimethoxysilane)、乙烯基三乙氧基矽烷(vinyltriethoxysilane)、(4-乙烯基苯基)三甲氧基矽烷((4-ethenylphenyl)trimethoxy-silane)、2-(3,4-環氧基環己基)乙基三甲氧基矽烷(2-(3,4epoxycyclohexyl)ethyltrimethoxysilane)、3-縮水甘油氧基丙基三甲氧基矽烷(3-glycidoxypropyltrimethoxysilane)、3-縮水甘油氧基丙基甲基二乙氧基矽烷(3-glycidoxypropylmethyldiethoxysilane)、3-縮水甘油氧基丙基三乙氧基矽烷(3-glycidoxypropyltriethoxysilane)、對苯乙烯基三甲氧基矽烷(p-styryltrimethoxysilane)、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷(3-methacryloxypropylmethyldimethoxysilane)、3-甲基丙烯醯氧基丙基三甲氧基矽烷(3-methacryloxypropyltrimethoxysilane)、3-甲基丙烯醯氧基甲基二乙氧基矽烷(3-methacryloxypropylmethyldiethoxysilane)、3-甲基丙烯醯氧基丙基三乙氧基矽烷(3-methacryloxypropyltriethoxysilane)、3-丙烯醯氧基丙基三甲氧基矽烷(3-acryloxypropyltrimethoxysilane)、N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷(N-2(-aminoethyl) 3-aminopropylmethyldimethoxysilane)、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷(N-2(-aminoethyl) 3-aminopropyltrimethoxysilane)、N-2-(胺基乙基)-3-胺基丙基三乙氧基矽烷(N-2(aminoethyl) 3-aminopropyltriethoxysilane)、3-胺基丙基三甲氧基矽烷(3-aminopropyltrimethoxysilane)、3-胺基丙基三乙氧基矽烷(3-aminopropyltriethoxysilane)、3-三乙氧基矽烷基-N-(1,3-二甲基-亞丁基)丙基胺(3-triethoxysilyl-N-(1,3-dimethyl-butylidene)propylamine)、N-苯基-3-胺基丙基三甲氧基矽烷(N-phenyl-3-aminopropyltrimethoxysilane)、3-脲基丙基三乙氧基矽烷(3-ureidopropyltriethoxysilane)、3-氯丙基三甲氧基矽烷(3-chloropropyltrimethoxysilane)、3-巰基丙基甲基二甲氧基矽烷(3-mercaptopropylmethyldimethoxysilane)、3-巰基丙基三甲氧基矽烷(3-mercaptopropyltrimethoxysilane)、雙(三乙氧基矽烷基丙基)四硫化物(bis(triethoxysilylpropyl)tetrasulfide)、3-異氰酸酯基丙基三乙氧基矽烷(3-isocyanatepropyltriethoxysilane)、乙烯基三(2-甲氧基乙氧基)矽烷(vinyltris(2-methoxyethoxy)silane)、乙烯基甲基二甲氧基矽烷(vinylmethyldimethoxysilane)、3-巰基丙基三乙氧基矽烷(3-mercaptopropyltriethoxysilane)、3-辛醯基硫基-1-丙基三乙氧基矽烷(3-octanoylthio-1-propyltriethoxysilane)、3-異氰酸酯基丙基三甲氧基矽烷(3-isocyanatepropyltrimethoxysilane)、3-三乙氧基矽烷基-N-(1,3-二甲基-亞丁基) (3-triethoxysilyl-N-(1,3-dimethyl-butylidene))、3-丙烯醯氧基丙基三甲氧基矽烷(3-acryloxypropyltrimethoxysilane)、3-縮水甘油氧基丙基甲基二甲氧基矽烷(3-glycidoxypropylmethyldimethoxysilane)、雙[3-(三乙氧基矽烷基)丙基]二硫化物(bis[3-(triethoxysilyl)propyl]disulfide)、乙烯基三乙醯氧基矽烷(vinyltriacetoxysilane)、乙烯基三異丙氧基矽烷(vinyltriisopropoxysilane)、烯丙基三甲氧基矽烷(allyltrimethoxysilane)、二烯丙基二甲基矽烷(diallyldimethylsilane)、3-巰基丙基三乙氧基矽烷(3-mercaptopropyltriethoxysilane)、N-(1,3-二甲基亞丁基)-3-胺基丙基三乙氧基矽烷(N-(1,3-dimethylbutylidene)-3-aminopropyltriethoxysilane)、三甲基三乙烯基環三矽氧烷(trimethyltriethenyl cyclotrisiloxane)、四甲基四乙烯基環四矽氧烷(tetramethyltetraethenyl cyclotetrasiloxane)、五甲基五乙烯基環五矽氧烷(pentamethylpentaethenyl cyclopentasiloxane)、或上述之組合。
根據本揭露實施例,本揭露所述封裝組合物可由成分(A)、成分(B)、成分(C)以及成分(D)所組成。
根據本揭露實施例,本揭露所述封裝組合物可更包含成分(E),其中該成分(E)為一添加劑。該添加劑可為封裝組合物所習知的添加劑,例如為整平劑(leveling agent)、消泡劑(defoamer)、阻燃劑(flame retardant)、黏度調節劑(viscosity modifier)、觸變劑(thixotropic agent) 、分散劑(dispersant)、安定劑(stabilizer)、或上述之組合。根據本揭露實施例,該添加劑之添加量並無特別限制,可為約0.1wt%至30wt%(例如約0.2wt%、0.5wt%、0.8wt%、1wt%、1.5wt%、2wt%、2.5wt%、3wt%、4wt%、5wt%、6wt%、7wt%、8wt%、9wt%、10wt%、11wt%、12wt%、13wt%、14wt%、15wt%、16wt%、17wt%、18wt%、19wt%、20wt%、25wt%、或28wt%),以成分(A)及成分(B)之總重為基準。
根據本揭露實施例,由於所使用的環氧化合物在低溫(例如25℃至90℃)下具有流動性,本揭露所述組合物在作為封裝材料組合物時不包含溶劑,並可直接應用在封裝製程中。
根據本揭露實施例,本揭露所述封裝組合物可由成分(A)、成分(B)、成分(C)、成分(D)以及成分(E)所組成。
根據本揭露實施例,本揭露亦提供一種本揭露所述封裝組合物之固化物。根據本揭露實施例,該固化物可為本揭露所述組合物經一固化製程後所得之產物。
本揭露所述固化物的製備方式可包含以下步驟。首先,提供本揭露所述封裝組合物。接著,利用一塗佈製程將該封裝組合物在一基材上形成一塗層。接著,對該塗層進行一固化製程,得到該固化物(可例如為一膜層)。該固化製程的溫度可為約80℃至190℃,以及製程的時間可為30分鐘至8小時。此外,該固化製程可包含數個加熱階段。根據本揭露實施例,該基材並無特別限制,可為金屬片材、矽基材、玻璃、或聚合物膜,且該基材上可已形成任何所需的膜層。
根據本揭露實施例,本揭露亦提供一種膜層(即封裝材料),其中該膜層包含本揭露所述封裝組合物之固化物。
為讓本揭露之上述內容和其他目的、特徵、和優點能更明顯易懂,下文特舉出較佳實施例,並配合所附圖式,作詳細說明如下。
封裝組合物
實施例1
將10重量份之化合物(1)(結構為
)、10重量份之4-第三丁基苯乙烯(4-tert-butylstyrene,tBS)、0.6重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.4重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、64重量份之二氧化矽粉體(1)(以乙烯基三乙氧基矽烷改質、平均粒徑為約20μm、最大粒徑為約75μm)、以及16重量份之二氧化矽粉體(2)(以乙烯基三乙氧基矽烷改質、平均粒徑為約12μm、最大粒徑為約45μm) 於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(1)。
實施例2
將12.5重量份之化合物(2)(結構為
)、12.5重量份之4-第三丁基苯乙烯(4-tert-butylstyrene,tBS)、0.75重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.5重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、以及75重量份之二氧化矽粉體(3)(以乙烯基三乙氧基矽烷改質、平均粒徑為約3.1μm、最大粒徑為約10μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(2)。
實施例3
將22.5重量份之化合物(2)(結構為
)、22.5重量份之4-第三丁基苯乙烯(4-tert-butylstyrene,tBS)、1.35重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.9重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、44重量份之之二氧化矽粉體(3)(以乙烯基三乙氧基矽烷改質、平均粒徑為約3.1μm、最大粒徑為約10μm)、以及11重量份之二氧化矽粉體(4)(以乙烯基三乙氧基矽烷改質、平均粒徑為約0.6μm、最大粒徑為約3μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(3)。
實施例4
將20重量份之化合物(2)(結構為
)、5重量份之4-第三丁基苯乙烯(4-tert-butylstyrene,tBS)、1重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.5重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、60重量份之之二氧化矽粉體(3)(以乙烯基三乙氧基矽烷改質、平均粒徑為約3.1μm、最大粒徑為約10μm)、以及15重量份之二氧化矽粉體(4)(以乙烯基三乙氧基矽烷改質、平均粒徑為約0.6μm、最大粒徑為約3μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(4)。
實施例5
將18重量份之化合物(2)(結構為
)、27重量份之4-第三丁基苯乙烯(4-tert-butylstyrene,tBS)、0.9重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.9重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、44重量份之之二氧化矽粉體(3)(以乙烯基三乙氧基矽烷改質、平均粒徑為約3.1μm、最大粒徑為約10μm)、以及11重量份之二氧化矽粉體(4)(以乙烯基三乙氧基矽烷改質、平均粒徑為約0.6μm、最大粒徑為約3μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(5)。
實施例6
將10重量份之化合物(1)(結構為
)、10重量份之4-第三丁基苯乙烯(4-tert-butylstyrene,tBS)、0.6重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.4重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、64重量份之二氧化矽粉體(5)(未改質、平均粒徑為約20μm、最大粒徑為約75μm)、以及16重量份之二氧化矽粉體(6)( 未改質、平均粒徑為約12μm、最大粒徑為約45μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(6)。
實施例7
將12.5重量份之化合物(2)(結構為
)、12.5重量份之4-第三丁氧基苯乙烯(4-tert-butoxystyrene,tBOS)、0.75重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.5重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、60重量份之之二氧化矽粉體(3)(以乙烯基三乙氧基矽烷改質、平均粒徑為約3.1μm、最大粒徑為約10μm)、以及15重量份之二氧化矽粉體(4)(以乙烯基三乙氧基矽烷改質、平均粒徑為約0.6μm、最大粒徑為約3μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(7)。
比較例1
將6.5重量份之環氧樹脂(商品編號為CELLOXIDE 2021P,由Daicel化學販售)、3.5重量份
之(商品編號為EXA-830LVP,由DIC販售)、15重量份之酸酐(商品編號為HN-2200 ,由日立化成販售)、0.5重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、60重量份之之二氧化矽粉體(3)(以乙烯基三乙氧基矽烷改質、平均粒徑為約3.1μm、最大粒徑為約10μm)、以及15重量份之二氧化矽粉體(4)(以乙烯基三乙氧基矽烷改質、平均粒徑為約0.6μm、最大粒徑為約3μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(8)。
比較例2
將5重量份之化合物(1)(結構為
)、20重量份之4-第三丁基苯乙烯(4-tert-butylstyrene,tBS)、0.5重量份之過氧化-3,5,5-三甲基己酸第三丁酯(tert-butyl peroxy-3,5,5-trimethylhexanoate,TBPIN)、0.5重量份之乙烯基三乙氧基矽烷(vinyltriethoxysilane)、60重量份之之二氧化矽粉體(3)(以乙烯基三乙氧基矽烷改質、平均粒徑為約3.1μm、最大粒徑為約10μm)、以及15重量份之二氧化矽粉體(4)(以乙烯基三乙氧基矽烷改質、平均粒徑為約0.6μm、最大粒徑為約3μm)於常溫環境下利用攪拌機混合,得到一混合物。以三滾筒(three-roller)對混合物進行分散,得到封裝組合物(9)。
封裝組合物性質測試
分別量測封裝組合物(1)-(9)的黏度,結果如表1所示。封裝組合物黏度的量測方式係以錐板式黏度儀(Brookfield 87333)在室溫(25℃)下進行量測。
表1
黏度(Pa.S)(25℃) | |
封裝組合物(1) | 6.8 |
封裝組合物(2) | 17.8 |
封裝組合物(3) | 13.5 |
封裝組合物(4) | 26.3 |
封裝組合物(5) | 11.8 |
封裝組合物(6) | 5.9 |
封裝組合物(7) | 16.5 |
封裝組合物(8) | 46.5 |
封裝組合物(9) | 9.2 |
由表1可知,本揭露所述封裝組合物(1)-(7)在室溫(例如25℃)下具有流動性,可應用於無溶劑之液態封裝製程中。
固化物性質測試
分別將封裝組合物(1)-(9) 倒入模具(80mm x 15mm x 3mm)中。在多次真空脫泡後,將該等封裝組合物在100℃下固化1小時以及在135℃下固化6小時,得到固化物(1)-(8)(可觀察到封裝組合物(9)無法成型)。
分別對固化物(1)-(8)進行裁切,得到尺寸為60mm x 15mm x 3mm的樣品(1)-(8)。接著,對樣品(1)-(8)進行彈性模數(elastic modulus)、玻璃轉化溫度(glass transition temperature,Tg)、介電常數(dielectric coefficient,Dk)及介電損失因子(dielectric loss factor,Df)的量測,結果如表2所示。
彈性模數的量測係利用動態機械分析儀(dynamic mechanical analyzer,DMA)進行。測試條件為氮氣下,測試溫度為0℃~250℃,升溫速率為每分鐘10℃,讀取樣品在25℃的彈性模數。玻璃轉化溫度係由正切(tan delta)曲線的峰值確定。介電常數(Dk)與介電損耗因子(Df)的量測係使用向量網路分析儀搭配開放式共振腔,在25°C下於28GHz及60GHz頻率下量測。
表2
成型性 | 玻璃轉化溫度 (℃) | 彈性模數(GPa) | 28GHz | 60GHz | |||
介電常數(Dk) | 介電損耗因子(Df) | 介電常數(Dk) | 介電損耗因子(Df) | ||||
封裝組合物(1) | O | 188 | 12.9 | 3.28 | 0.003 | 3.15 | 0.003 |
封裝組合物(2) | O | 188 | 7.2 | 3.12 | 0.003 | 3.05 | 0.002 |
封裝組合物(3) | O | 186 | 7.5 | 3.01 | 0.003 | 2.99 | 0.002 |
封裝組合物(4) | O | 192 | 6.2 | 3.1 | 0.004 | 3.05 | 0.003 |
封裝組合物(5) | O | 186 | 7.3 | 3.05 | 0.003 | 2.98 | 0.002 |
封裝組合物(6) | O | 181 | 13.1 | 3.52 | 0.003 | 3.46 | 0.004 |
封裝組合物(7) | O | 182 | 6.5 | 2.88 | 0.017 | 2.64 | 0.014 |
封裝組合物(8) | O | 175 | 14 | 3.51 | 0.009 | - | - |
封裝組合物(9) | X | - | - | - | - | - | - |
由表2可知,由於封裝組合物(9)其第一化合物(A-1)與第二化合物(A-2)的比例不在本揭露所述範圍內,封裝組合物(9)在固化製程後無法成型。此外,由表2可知,本揭露所述封裝組合物(1)-(7)的固化物在28GHz下其介電常數(Dk)可小於3.55以及介電損耗因子(Df)可小於0.02,以及在60GHz下其介電常數(Dk)可小於3.50以及介電損耗因子(Df)可小於0.015。值得注意的是,本揭露所述封裝組合物(1)-(6)的固化物在28GHz下以及60GHz下其介電損耗因子(Df)可小於0.005。
綜合上述,藉由特定結構的化合物(例如特定的環烷烴衍生樹脂、特定的單官能基稀釋劑)以及特定的成份比例,本揭露所述封裝組合物可藉由無溶劑反應(neat reaction)進行固化,得到一膜層(即封裝材料)。包含該封裝組合物之固化物的膜層,除了在高頻(10GHz以上的頻段)可具有低介電常數(dielectric coefficient,Dk)及低介電損失因子(dielectric loss factor,Df),亦具有低彈性模數及高玻璃轉化溫度的特性,可滿足封裝材料(例如應用於高頻區段半導體封裝製程之封裝材料)的需求。
雖然本揭露已以數個實施例揭露如上,然其並非用以限定本揭露,任何本技術領域中具有通常知識者,在不脫離本揭露之精神和範圍內,當可作任意之更動與潤飾,因此本揭露之保護範圍當視後附之請求項所界定者為準。
無
無。
無。
Claims (14)
- 一種封裝組合物,包含: 20-45重量份的成分(A),其中該成分(A)包含一第一化合物(A-1)以及一第二化合物(A-2),以及該第一化合物(A-1)與該第二化合物(A-2)的重量比為9:1至3:7; 55-80重量份的成分(B),其中該成分(B)係一未改質的無機粉體或一改質的無機粉體,且該成分(A)與該成分(B)的總重量為100重量份;以及 成分(C),其中成分(C)係一起始劑,且該成分(C)與成分(A)的重量比為1:100至5:100,其中該第一化合物(A-1)係具有式(I)或式(II)所示結構,以及該第二化合物(A-2)係單烯基芳香族化合物(monoalkenyl aromatic compound) 式(I) 式(II) ,其中R 1及R 2係各自獨立為氫、氟、甲基、氟甲基、或乙基;R 3、R 4、R 5、R 6係各自獨立為氟、C 1-6烷基、C 1-6氟烷基、或C 2-6末端烯基,且R 3、R 4、R 5、R 6至少兩者為C 2-6末端烯基;R 7及R 8係各自獨立為C 2-6末端烯基、2-乙烯基苯基(2-vinylphenyl)、3-乙烯基苯基(3-vinylphenyl)、或4-乙烯基苯基(4-vinylphenyl);R 9及R 10係各自獨立為氟、C 1-6烷基、C 1-6氟烷基、或C 2-6末端烯基;a及b係各自獨立為1、2、3、4、或5;以及,c、d、e以及f係各自獨立為1、2、3、或4。
- 如請求項1之封裝組合物,其中該未改質的無機粉體係氧化矽、氧化鋁、氧化鈦、氧化鋯、或上述之組合。
- 如請求項1之封裝組合物,其中該改質的無機粉體係一氧化物與一改質劑之反應產物,其中該氧化物係氧化矽、氧化鋁、氧化鈦、或氧化鋯,以及該改質劑係有機矽烷(organosilane)。
- 如請求項1之封裝組合物,其中該第一化合物(A-1)係 、 、 、 、 、 、 、 、 、或 ,其中R 1及R 2係各自獨立為氫、氟、甲基、氟甲基、或乙基;R 3、R 4、R 5、R 6係各自獨立為氫、氟、C 1-6烷基、C 1-6氟烷基、或C 2-6末端烯基,且R 3、R 4、R 5、R 6至少兩者為C 2-6烯基;R 7及R 8係各自獨立為C 2-6末端烯基、2-乙烯基苯基(2-vinylphenyl)、3-乙烯基苯基(3-vinylphenyl)、或4-乙烯基苯基(4-vinylphenyl);R 9、R 10、R 11及R 12係各自獨立為氫、氟、C 1-6烷基、C 1-6氟烷基、或C 2-6末端烯基;a及b係各自獨立為1、2、3、4、或5;以及,c及d係各自獨立為1、2、3、或4。
- 如請求項1之封裝組合物,其中該第二化合物(A-2)係苯乙烯(styrene), α-甲基苯乙烯(α-methylstyrene)、 2-甲基苯乙烯(2-methylstyrene)、 3-甲基苯乙烯(3-methylstyrene)、 4-甲基苯乙烯(4-methylstyrene)、 2,4-甲基苯乙烯(2,4-dimethylstyrene)、 2,4-二異丙基苯乙烯(2,4-diisopropylstyrene)、 4-丙基苯乙烯(4-propylstyrene)、4-環己基苯乙烯(4-cyclohexylstyrene)、 4-(對甲基苯基)苯乙烯(4-(p-methylphenyl)styrene)、2-第三丁基苯乙烯(2-tert-butylstyrene)、3-第三丁基苯乙烯(3-tert-butylstyrene)、4-第三丁基苯乙烯(4-tert-butylstyrene)、N,N-二甲基氨基乙基苯乙烯(N,N-dimethylaminoethylstyrene)、1-乙烯基-5-己萘(1-vinyl-5-hexylnaphthalene)、乙烯基苄基二甲基胺(N-(4-Vinylbenzyl)-N,N-dimethylamine)、2-乙烯基吡啶(2-vinylpyridine)、4-乙烯基-1,2-二甲基苯 (4-ethenyl-1,2-dimethyl-benzene)、1-乙烯基萘(1-vinylnaphthalene)、1,1-二苯乙烯(1,1-diphenylethylene) 、2-苯基丙烯(2-propenylbenzene)、或上述之組合。
- 如請求項1之封裝組合物,其中該起始劑係過氧化物起始劑。
- 如請求項1之封裝組合物,更包含成分(D),其中該成分(D)係矽烷偶聯劑,其中該成分(D)與成分(A)的重量比為1:100至5:100。
- 如請求項1之封裝組合物,其中該未改質的無機粉體或該改質的無機粉體具有一平均粒徑為0.5μm至20 μm。
- 如請求項1之封裝組合物,其中該未改質的無機粉體或該改質的無機粉體係由一具有一第一平均粒徑的第一粉體(B-1)及一具有一第二平均粒徑的第二粉體(B-2)所組成,其中該第一平均粒徑大於第二平均粒徑,且該第一平均粒徑與該第二平均粒徑的比值係1.5至10。
- 如請求項9之封裝組合物,其中該第一粉體(B-1)與該第二粉體(B-2)的重量比係1:5至5:1。
- 如請求項1之封裝組合物,其中該成分(A)更包含一第三化合物(A-3),其中該第三化合物(A-3)係一多烯基化合物(multialkenyl compound)。
- 如請求項11之封裝組合物,其中該第三化合物(A-3)係二乙烯基苯(divinylbenzene)、三乙烯基苯(trivinylbenzene)、三烯丙基氰脲酸酯(triallyl cyanurate)、三烯丙基異氰脲酸酯(triallyl isocyanurate)、二乙二醇二乙烯基醚(di(ethylene glycol) divinyl ether)、四烯丙基矽烷(tetraallylsilane)、聚丁二烯(polybutadiene)、苯二甲酸二烯丙酯(diallyl phthalate)、2,2-雙[3-烯丙基-4-(4-乙烯基芐基)苯基]丙烷(2,2-bis[3-allyl-4-(4-vinylbenzyl)phenyl]propane; AV-BPA)、或上述之組合。
- 如請求項11之封裝組合物,其中該第二化合物(A-2)與該第三化合物(A-3)的重量比為1:1至9:1。
- 一種膜層,包含請求項1-13任一項所述之封裝組合物之固化物。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111148382A TWI843341B (zh) | 2022-12-16 | 2022-12-16 | 封裝組合物及膜層 |
CN202310716705.2A CN118206679A (zh) | 2022-12-16 | 2023-06-16 | 封装组合物及膜层 |
US18/361,325 US20240218188A1 (en) | 2022-12-16 | 2023-07-28 | Encapsulant composition and film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW111148382A TWI843341B (zh) | 2022-12-16 | 2022-12-16 | 封裝組合物及膜層 |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI843341B TWI843341B (zh) | 2024-05-21 |
TW202426513A true TW202426513A (zh) | 2024-07-01 |
Family
ID=91447854
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW111148382A TWI843341B (zh) | 2022-12-16 | 2022-12-16 | 封裝組合物及膜層 |
Country Status (3)
Country | Link |
---|---|
US (1) | US20240218188A1 (zh) |
CN (1) | CN118206679A (zh) |
TW (1) | TWI843341B (zh) |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109796745B (zh) * | 2017-11-16 | 2021-12-21 | 台光电子材料(昆山)有限公司 | 树脂组合物及由其制成的物品 |
-
2022
- 2022-12-16 TW TW111148382A patent/TWI843341B/zh active
-
2023
- 2023-06-16 CN CN202310716705.2A patent/CN118206679A/zh active Pending
- 2023-07-28 US US18/361,325 patent/US20240218188A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US20240218188A1 (en) | 2024-07-04 |
CN118206679A (zh) | 2024-06-18 |
TWI843341B (zh) | 2024-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3814301B2 (ja) | ペルフッ素化炭化水素重合体入り接着剤配合物及びその用途 | |
JP6503725B2 (ja) | エポキシ樹脂組成物、樹脂シート、半硬化エポキシ樹脂組成物、硬化エポキシ樹脂組成物及び金属基板 | |
JP6135991B2 (ja) | 封止用エポキシ樹脂無機複合シート | |
EP1874869A1 (en) | Curable silicone composition and cured product therefrom | |
JP2014518921A (ja) | 絶縁配合物 | |
CN108441165B (zh) | 低比重有机硅灌封胶及其制备方法 | |
TWI843341B (zh) | 封裝組合物及膜層 | |
JP2020169291A (ja) | スラリー組成物、該スラリー組成物の硬化物、該硬化物を用いた基板、フィルム、及びプリプレグ | |
JPH1192550A (ja) | 液状エポキシ樹脂組成物 | |
JP6900749B2 (ja) | カーボンブラック分散フェノール樹脂組成物、エポキシ樹脂組成物およびこれらの製造方法 | |
JPS62227923A (ja) | エボキシ樹脂組成物 | |
JP7351297B2 (ja) | 半導体封止材料用熱硬化性樹脂組成物、半導体封止材料、及び半導体装置 | |
JPS6375024A (ja) | 硬化性樹脂組成物 | |
TWI803025B (zh) | 樹脂材料及金屬基板 | |
TWI813019B (zh) | 樹脂材料及金屬基板 | |
US20230257493A1 (en) | Curable Composition | |
CN112341821B (zh) | 一种固体硅树脂复合物及其制备方法和应用 | |
TWI732733B (zh) | 漿料組成物及其製備方法 | |
TWI614285B (zh) | 聚合物及包含該聚合物之樹脂組成物 | |
CN117586741A (zh) | 一种耐高温氰酸酯导电胶黏剂及其制备方法 | |
US20240174779A1 (en) | Resin composition | |
JP6666138B2 (ja) | 多価アルキン化合物、その製法および用途 | |
TW202346459A (zh) | 含聯苯型雙馬來醯亞胺的樹脂組合物 | |
JPH03167250A (ja) | エポキシ樹脂組成物 | |
TW202419556A (zh) | 樹脂組成物 |