TW202419472A - 光阻組成物及光阻圖案形成方法 - Google Patents

光阻組成物及光阻圖案形成方法 Download PDF

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Publication number
TW202419472A
TW202419472A TW112136322A TW112136322A TW202419472A TW 202419472 A TW202419472 A TW 202419472A TW 112136322 A TW112136322 A TW 112136322A TW 112136322 A TW112136322 A TW 112136322A TW 202419472 A TW202419472 A TW 202419472A
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TW
Taiwan
Prior art keywords
polymer
group
formula
photoresist
photoresist composition
Prior art date
Application number
TW112136322A
Other languages
English (en)
Chinese (zh)
Inventor
藤村誠
Original Assignee
日商日本瑞翁股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日本瑞翁股份有限公司 filed Critical 日商日本瑞翁股份有限公司
Publication of TW202419472A publication Critical patent/TW202419472A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
TW112136322A 2022-09-30 2023-09-22 光阻組成物及光阻圖案形成方法 TW202419472A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022-158911 2022-09-30
JP2022158911 2022-09-30

Publications (1)

Publication Number Publication Date
TW202419472A true TW202419472A (zh) 2024-05-16

Family

ID=90477561

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112136322A TW202419472A (zh) 2022-09-30 2023-09-22 光阻組成物及光阻圖案形成方法

Country Status (3)

Country Link
JP (1) JPWO2024070672A1 (https=)
TW (1) TW202419472A (https=)
WO (1) WO2024070672A1 (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101925820B1 (ko) * 2014-09-01 2018-12-06 후지필름 가부시키가이샤 적외광 차폐 조성물, 적외광 차단 필터, 고체 촬상 소자
JP6790570B2 (ja) * 2016-08-10 2020-11-25 東洋インキＳｃホールディングス株式会社 感光性着色組成物およびカラーフィルタ
JPWO2022190714A1 (https=) * 2021-03-09 2022-09-15

Also Published As

Publication number Publication date
JPWO2024070672A1 (https=) 2024-04-04
WO2024070672A1 (ja) 2024-04-04

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