JPWO2024070672A1 - - Google Patents
Info
- Publication number
- JPWO2024070672A1 JPWO2024070672A1 JP2024550036A JP2024550036A JPWO2024070672A1 JP WO2024070672 A1 JPWO2024070672 A1 JP WO2024070672A1 JP 2024550036 A JP2024550036 A JP 2024550036A JP 2024550036 A JP2024550036 A JP 2024550036A JP WO2024070672 A1 JPWO2024070672 A1 JP WO2024070672A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
- C08L33/16—Homopolymers or copolymers of esters containing halogen atoms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022158911 | 2022-09-30 | ||
| PCT/JP2023/033241 WO2024070672A1 (ja) | 2022-09-30 | 2023-09-12 | レジスト組成物及びレジストパターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024070672A1 true JPWO2024070672A1 (https=) | 2024-04-04 |
Family
ID=90477561
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024550036A Pending JPWO2024070672A1 (https=) | 2022-09-30 | 2023-09-12 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024070672A1 (https=) |
| TW (1) | TW202419472A (https=) |
| WO (1) | WO2024070672A1 (https=) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101925820B1 (ko) * | 2014-09-01 | 2018-12-06 | 후지필름 가부시키가이샤 | 적외광 차폐 조성물, 적외광 차단 필터, 고체 촬상 소자 |
| JP6790570B2 (ja) * | 2016-08-10 | 2020-11-25 | 東洋インキＳｃホールディングス株式会社 | 感光性着色組成物およびカラーフィルタ |
| JPWO2022190714A1 (https=) * | 2021-03-09 | 2022-09-15 |
-
2023
- 2023-09-12 JP JP2024550036A patent/JPWO2024070672A1/ja active Pending
- 2023-09-12 WO PCT/JP2023/033241 patent/WO2024070672A1/ja not_active Ceased
- 2023-09-22 TW TW112136322A patent/TW202419472A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024070672A1 (ja) | 2024-04-04 |
| TW202419472A (zh) | 2024-05-16 |