TW202330963A - Sputtering target, target assembly and manufacturing method of the target assembly - Google Patents

Abstract

The invention discloses a sputtering target, which comprises a target body; the side surface of the target body protrudes outward to form an annular convex portion; The back of the convex portion protrudes. The invention also discloses a target assembly, which includes the sputtering target, a back plate ring arranged on the back of the annular convex portion, and a front ring optionally arranged on the front surface of the annular convex portion. The invention also discloses a manufacturing method of the target assembly. The annular convex part is welded with the back plate ring, or the back plate ring and the front ring, and the welding head is inserted from the back of the back plate ring near the outer side until it contacts or extends into the annular convex part or the front ring, and the welding head gradually moves to the inner side of the back plate ring during the welding process.

Description

Sputtering target, target element and method for manufacturing target element

The invention relates to the technical field of sputtering targets, in particular to a sputtering target, a target element and a method for manufacturing the target element.

In the target element in which the back plate and the sputtering target are integrally formed, since the back plate part is made of high-purity materials, the strength of the back plate part cannot meet the design or use requirements. Additional alloy materials can be placed on the back plate to increase the strength of the back plate part of the finished target.

In the prior art, the welding methods of the target and the back plate include friction stir welding (FSW), electron beam welding (EBW), etc. For example, patent specifications with publication numbers CN 111660003 A and CN 111496366 A disclose the above welding methods.

The patent specification with the publication number CN 113529030 A discloses a target element and its manufacturing method. The target element includes: a target and a back plate, the back plate is arranged around the target, and the sputtering surface of the target is opposite to the back plate The front surface is convex. The manufacturing method includes the following steps: bonding the periphery of the target to the back plate, so that the back plate is located at the periphery of the target, and offsetting the welding drill from the joint centerline between the periphery of the target and the back plate to the back plate side by a preset distance , weld the periphery of the target to the back plate. From the welding production method of this patented technology, it can be seen that the welding area is narrow and its position is mainly concentrated in the target body, which affects the crystal phase structure and grain size of the target body. Moreover, due to the small welding area, the welding bonding strength remains the same. It needs to be further improved.

In view of the above-mentioned deficiencies in the prior art, the present invention provides a sputtering target, a target element and a method for manufacturing the target element, which has little damage to the target body used for sputtering and does not affect the sputtering part of the target body. Crystal phase structure, grain size and other physical and chemical states and properties, the welding part is mainly at the connection part used for fixed connection with the flange of the abutment, the welding surface is large, and the bonding strength between the back plate ring, the front ring and the sputtering target is high .

The specific technical scheme is as follows:

A sputtering target, including a target body;

The side of the target body protrudes outward to form an annular convex part;

The front of the target body protrudes relative to the front of the annular protrusion, and the back of the target body protrudes relative to the back of the annular protrusion.

The annular convex part of the sputtering target of the present invention can be fixedly connected with the back plate ring, or, the back plate ring and the front ring, as a high-strength connection part and the flange of the abutment after welding and forming.

In the present invention, the front surface of the target body is the surface used for sputtering, and the back surface of the target body is the other surface opposite to the sputtering surface. The annular protrusion is located between the front and back of the target body, the front is relatively closer to the sputtering surface of the target body, and the back is opposite to the front of the annular protrusion and relatively closer to the target body The back side.

Based on the sputtering target with the above shape and structure, the present invention also provides a target element, including the sputtering target and the back plate ring arranged on the back of the annular convex part, which can improve the distance between the sputtering target and the base flange. Bonding firmness.

The backplate ring is preferably made of an alloy material different from that of the sputtering target to improve strength so that it can be more firmly installed on the base.

In a preferred example, in the target assembly, the outer surface of the back plate ring is flush with the outer surface of the annular protrusion.

In a preferred example, in the target assembly, the back of the back plate ring is flush with the back of the target body.

In the present invention, the front side of the backplate ring refers to the surface in contact with the backside of the annular protrusion, and the other side opposite to the front side of the backplate ring is the backside of the backplate ring.

In a preferred example, in the target assembly, the inner side of the back plate ring matches the outer side of the target body behind the annular protrusion.

The target assembly may further include a front ring disposed on the front of the annular protrusion.

In the present invention, the position of the annular protrusion is used for fixed connection with the flange of the abutment, and the connection method may be fixed connection with punching bolts. The simultaneous setting of the front ring and the back plate ring can play a role of synergistic reinforcement, so that the connection between the target element and the abutment flange forms a high-strength integral part, and further improves the connection between the target element and the abutment flange strength.

In a preferred example, in the target assembly, the outer surface of the front ring is flush with the outer surface of the annular protrusion.

In a preferred example, in the target assembly, the front of the target body is flush with the front of the front ring, or the front of the target body protrudes relative to the front of the front ring.

In the present invention, the back of the front ring refers to the face in contact with the front of the annular protrusion, and the other side opposite to the back of the front ring is the front of the front ring.

In a preferred example, in the target assembly, the inner surface of the front ring is adapted to the outer surface of the target body located in front of the annular protrusion.

In a preferred example, in the target assembly, the material of the front ring is the same as that of the back plate ring, which can further increase the strength of the connection part of the target element.

The present invention also provides the manufacturing method of the target element, the welding parts are concentrated in the area of the annular convex part (the connection part used for the fixed connection with the flange of the abutment), and the damage to the target body used for sputtering is small, It does not affect the physical and chemical state and properties such as the crystal phase structure and grain size of the sputtering part of the target body, the welding surface is large, and the bonding strength between the back plate ring, the front ring and the sputtering target is high.

When the target element has no front ring, its manufacturing method includes: welding and joining the annular protrusion and the back plate ring, inserting the welding head from the back of the back plate ring close to the outer surface until it contacts or extends into the annular protrusion, and the welding process The middle welding head gradually moves towards the inner side of the backplate ring.

When the target element also includes a front ring, the manufacturing method includes: welding the annular protrusion with the back plate ring and the front ring, and inserting the welding head from the back of the back plate ring close to the outer surface until it contacts or extends into the front ring , the welding head gradually moves to the inner side of the backplate ring during the welding process.

The manufacturing method of the target element according to the present invention can adopt friction stir welding or electron beam welding for welding and joining.

In the manufacturing method of the target element according to the present invention, during the welding process, the welding head gradually moves to the inner surface of the back plate ring until it contacts the target body, and then continues to move to the target body while gradually reducing the insertion depth of the welding head, which can further Improve the bonding strength with the target body, and minimize the impact on the physical and chemical states and properties of the target body, such as crystal phase structure and grain size.

The target element of the present invention can also be made into a desired shape and structure by cutting or other means before use.

Compared with the prior art, the present invention has main advantages including:

The invention provides a sputtering target, a target element and a manufacturing method of the target element, which has little damage to the target body used for sputtering and does not affect the crystal phase structure and grain size of the sputtering part of the target body. The physical and chemical state and properties, the welding part is mainly used for the fixed connection with the abutment flange, the welding surface is large, and the bonding strength between the back plate ring, the front ring and the sputtering target is high.

The existing technology usually only welds at the junction of the sputtering target and the back plate. On the one hand, the bonding strength between the sputtering target and the back plate needs to be further improved, and on the other hand, the welding area is narrow. During the process, problems such as air leakage and water leakage are likely to occur at the seams. In the present invention, the ring-shaped convex part of the sputtering target and the back plate ring, or the back plate ring and the front ring are integrally welded and formed, which not only combines more firmly, but also has better welding sealing performance, which solves the problem of air leakage and water leakage. And other issues.

The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments. It should be understood that these examples are only used to illustrate the present invention and are not intended to limit the scope of the present invention. The operating methods not indicated in the following examples are generally in accordance with conventional conditions, or in accordance with the conditions suggested by the manufacturer.

Example 1

This embodiment specifically introduces the sputtering target of the present invention, and its structure is shown in FIG. 1 .

The sputtering target includes a target body 1 .

The side surface of the target body 1 protrudes outward to form an annular convex portion 2;

The front of the target body 1 protrudes relative to the front of the annular protrusion 2 , and the back of the target body 1 protrudes relative to the back of the annular protrusion 2 .

The thickness of the target body 1 is D, the thickness of the annular convex portion 2 is d1, the distance between the back of the annular convex portion 2 and the back of the target body 1 is d2, and the width of the annular convex portion 2 is S.

Example 2

This embodiment specifically introduces one structure, manufacturing process and corresponding products of the target element of the present invention.

The structure of the target element is shown in the upper figure of FIG. 2 , including the sputtering target as described in Embodiment 1 and the back plate ring 3 arranged on the back of the annular convex portion 2 .

The outer surface of the back plate ring 3 is flush with the outer surface of the annular protrusion 2 .

The back of the back plate ring 3 is flush with the back of the target body 1 .

The inner side of the back plate ring 3 is adapted to the outer side of the target body 1 behind the annular protrusion 2 .

The material of the sputtering target can be any one of pure aluminum, aluminum-copper alloy, aluminum-silicon alloy, and copper-silicon-aluminum alloy.

The material of the back plate ring 3 can be any one of A5000 series aluminum, A6000 series aluminum and A2000 series aluminum.

The manufacturing process of the target assembly in this embodiment is shown in the upper figure in FIG. 2. The annular convex part 2 and the back plate ring 3 are welded together, and the welding head 5 is inserted from the back of the back plate ring 3 close to the outer surface until it contacts or extends. During the welding process, the welding head 5 gradually moves to the inner side of the back plate ring 3. After the welding head 5 contacts the target body 1, it continues to move toward the target body 1 while gradually reducing the insertion depth of the welding head 5. . After the welding is completed, adaptive cutting is performed to obtain the target element product that can be used for sputtering, as shown in the lower figure in Figure 2.

The moving distance of the welding head 5 in the target body 1 can be 0.1-3 mm.

In the above manufacturing process, friction stir welding or electron beam welding may be used for welding and joining.

Example 3

This embodiment specifically introduces another structure, manufacturing process and corresponding products of the target element of the present invention.

The structure of the target element is shown in the upper figure in Figure 3, including the sputtering target introduced in Example 1, the back plate ring 3 arranged on the back of the annular convex part 2, and the front ring arranged on the front of the annular convex part 2 4.

The outer surface of the back plate ring 3 is flush with the outer surface of the annular protrusion 2 .

The back of the back plate ring 3 is flush with the back of the target body 1 .

The inner side of the back plate ring 3 is adapted to the outer side of the target body 1 behind the annular protrusion 2 .

The material of the sputtering target can be any one of pure aluminum, aluminum-copper alloy, aluminum-silicon alloy, and copper-silicon-aluminum alloy.

The material of the back plate ring 3 can be any one of A5000 series aluminum, A6000 series aluminum and A2000 series aluminum.

The outer surface of the front ring 4 is flush with the outer surface of the annular protrusion 2 .

The front of the target body 1 is flush with the front of the front ring 4 , or the front of the target body 1 protrudes relative to the front of the front ring 4 .

The inner surface of the front ring 4 is adapted to the outer surface of the target body 1 located in front of the annular protrusion 2 .

The material of the front ring 4 can be the same as that of the back plate ring 3 .

The manufacturing process of the target assembly in this embodiment is shown in the upper figure in FIG. 3 . The annular convex part 2 is welded to the back plate ring 3 and the front ring 4, and the welding head 5 is inserted from the back of the back plate ring 3 close to the outer surface. Until it touches or extends into the front ring 4, the welding head 5 gradually moves to the inner side of the back plate ring 3 during the welding process. After the welding head 5 contacts the target body 1, it continues to move toward the target body 1 while gradually reducing the welding head 5. insertion depth. After the welding is completed, adaptive cutting is performed to obtain the target element product that can be used for sputtering, as shown in the lower figure of Figure 3.

The moving distance of the welding head 5 in the target body 1 can be 0.1-3 mm.

In the above manufacturing process, friction stir welding or electron beam welding may be used for welding and joining.

In addition, it should be understood that after reading the above description of the present invention, those skilled in the art may make various changes or modifications to the present invention, and these equivalent forms also fall within the scope defined by the appended claims of the present application.

1: Target body 2: Annular convex part 3: Backplate ring 4: front ring 5: welding head 6: alloy layer

[Fig. 1] is the structural representation of the sputtering target material of embodiment 1; [Fig. 2] is the structure, manufacturing process and product schematic diagram of the target element of embodiment 2; [ FIG. 3 ] is a schematic diagram of the structure, manufacturing process and product of the target element of Example 3.

1: Target body

2: Annular convex part

Claims (10)

A sputtering target, including a target body; The side of the target body protrudes outward to form an annular convex part; The front of the target body protrudes relative to the front of the annular protrusion, and the back of the target body protrudes relative to the back of the annular protrusion. A target element, comprising the sputtering target described in claim 1 and a backing plate ring disposed on the back of the annular protrusion. The target element as claimed in claim 2, wherein the outer surface of the backplate ring is flush with the outer surface of the annular protrusion; The back of the back plate ring is flush with the back of the target body; The inner side of the back plate ring is adapted to the outer side of the target body behind the annular protrusion. The target element according to claim 2 or 3, wherein the target assembly further includes a front ring arranged on the front face of the annular protrusion. The target element as claimed in claim 4, wherein the outer side of the front ring is flush with the outer side of the annular protrusion; The front of the target body is flush with the front of the front ring, or the front of the target body protrudes relative to the front of the front ring; The inner side of the front ring is adapted to the outer side of the target body located in front of the annular protrusion. The target element according to claim 4, wherein the material of the front ring is the same as that of the back plate ring. The manufacturing method of the target element according to claim 2 or 3, including: welding the annular protrusion and the back plate ring, the welding head is inserted from the back of the back plate ring close to the outer surface until it contacts or extends into the annular protrusion During the welding process, the welding head gradually moves to the inner side of the backplate ring. The manufacturing method of the target element according to any one of claim items 4 to 6, including: welding the annular convex part with the back plate ring and the front ring, and the welding head approaches the outer surface from the back of the back plate ring Insert until touching or protruding into the front ring, the welding head gradually moves towards the inner side of the back plate ring during the welding process. The manufacturing method of the target element according to any one of claim 7 or 8, wherein friction stir welding or electron beam welding is used for welding joint. The manufacturing method of the target element according to any one of claim 7 or 8, wherein, during the welding process, the welding head gradually moves to the inner side of the back plate ring until it contacts the target body, and then continues to move to the target body at the same time Gradually reduce the insertion depth of the solder tip.