TW202325698A - 化合物、潛在性紫外線吸收劑、組合物、硬化物及硬化物之製造方法 - Google Patents

化合物、潛在性紫外線吸收劑、組合物、硬化物及硬化物之製造方法 Download PDF

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Publication number
TW202325698A
TW202325698A TW112108971A TW112108971A TW202325698A TW 202325698 A TW202325698 A TW 202325698A TW 112108971 A TW112108971 A TW 112108971A TW 112108971 A TW112108971 A TW 112108971A TW 202325698 A TW202325698 A TW 202325698A
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TW
Taiwan
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group
compound
carbon atoms
mentioned
composition
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TW112108971A
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English (en)
Chinese (zh)
Inventor
金原有希子
岡田光裕
中屋敷哲千
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日商艾迪科股份有限公司
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Application filed by 日商艾迪科股份有限公司 filed Critical 日商艾迪科股份有限公司
Publication of TW202325698A publication Critical patent/TW202325698A/zh

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D251/00—Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24—Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D405/00—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12—Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/005—Stabilisers against oxidation, heat, light, ozone
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00—Compositions of unspecified macromolecular compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW112108971A 2017-10-05 2018-10-04 化合物、潛在性紫外線吸收劑、組合物、硬化物及硬化物之製造方法 TW202325698A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-195515 2017-10-05
JP2017195515 2017-10-05

Publications (1)

Publication Number Publication Date
TW202325698A true TW202325698A (zh) 2023-07-01

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TW112108971A TW202325698A (zh) 2017-10-05 2018-10-04 化合物、潛在性紫外線吸收劑、組合物、硬化物及硬化物之製造方法
TW107135078A TW201922717A (zh) 2017-10-05 2018-10-04 化合物、潛在性紫外線吸收劑、組合物、硬化物及硬化物之製造方法

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TW107135078A TW201922717A (zh) 2017-10-05 2018-10-04 化合物、潛在性紫外線吸收劑、組合物、硬化物及硬化物之製造方法

Country Status (5)

Country Link
JP (1) JP7393205B2 (ja)
KR (1) KR20200064029A (ja)
CN (1) CN111094256A (ja)
TW (2) TW202325698A (ja)
WO (1) WO2019069960A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20230030056A (ko) 2020-05-22 2023-03-03 알리고스 테라퓨틱스 인코포레이티드 Pd-l1을 표적화하기 위한 방법 및 조성물

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837314B2 (ja) * 1975-07-16 1983-08-15 イデミツコウサン カブシキガイシヤ ベンゾトリアゾ−ルカゴウブツノ セイゾウホウホウ
US4321396A (en) * 1980-01-17 1982-03-23 Gaf Corporation Copolymerizable, ultraviolet light absorber allyloxy-2-(2H-benzotriazol-2-yl)-4-alkylbenzenes
DE3571251D1 (en) * 1984-11-01 1989-08-03 Ciba Geigy Ag Coatings stabilized against the action of light
US4728599A (en) * 1985-12-02 1988-03-01 Eastman Kodak Company Sterically hindered phenolic ester photographic coupler dispersion addenda and photographic elements employing same
JPH06191155A (ja) * 1992-12-25 1994-07-12 Fuji Photo Film Co Ltd 記録材料
JP3331035B2 (ja) * 1993-02-05 2002-10-07 富士写真フイルム株式会社 感光性樹脂組成物及び画像形成方法
EP0711804A3 (de) * 1994-11-14 1999-09-22 Ciba SC Holding AG Kryptolichtschutzmittel
JP3512911B2 (ja) * 1995-07-11 2004-03-31 富士写真フイルム株式会社 紫外線吸収剤前駆体化合物、それを含有する感光性樹脂組成物及び画像形成方法
EP1026152B1 (en) * 1997-03-31 2006-07-26 Daikin Industries, Limited Process for producing perfluorovinyl ethersulfonic acid derivatives
IT1301973B1 (it) 1998-07-31 2000-07-20 Ausimont Spa Idro-fluoroalchilvinileteri e procedimento per il loro ottenimento
JP3590345B2 (ja) 2000-11-27 2004-11-17 三井化学株式会社 光記録媒体
US7344706B2 (en) 2002-03-12 2008-03-18 Ciba Specialty Chemicals Corp. UV absorber compositions comprising a hydroxyphenyltriazine compound
JP2004018454A (ja) 2002-06-14 2004-01-22 Daikin Ind Ltd 含フッ素フルオロスルフォニルアルキルビニルエーテル製造方法
JP2006008953A (ja) 2004-06-29 2006-01-12 Fuji Photo Film Co Ltd 保護用塗料組成物及び塗装物品
JP5138599B2 (ja) 2005-11-09 2013-02-06 チバ ホールディング インコーポレーテッド 光潜在系
JP2011048382A (ja) 2010-10-01 2011-03-10 Kodak Japan Ltd 感光性組成物、感光性平版印刷版および平版印刷版の作成方法
JP6049521B2 (ja) 2013-03-29 2016-12-21 富士フイルム株式会社 感光性樹脂組成物、硬化膜、画像形成方法、固体撮像素子、カラーフィルタおよび紫外線吸収剤
JP2015108649A (ja) 2013-12-03 2015-06-11 凸版印刷株式会社 青色感光性組成物およびカラーフィルタ基板

Also Published As

Publication number Publication date
JP7393205B2 (ja) 2023-12-06
TW201922717A (zh) 2019-06-16
JPWO2019069960A1 (ja) 2020-09-10
CN111094256A (zh) 2020-05-01
WO2019069960A1 (ja) 2019-04-11
KR20200064029A (ko) 2020-06-05

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