TW202248229A - 光造形用硬化性樹脂組成物、硬化物及立體造形物 - Google Patents
光造形用硬化性樹脂組成物、硬化物及立體造形物 Download PDFInfo
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- TW202248229A TW202248229A TW111112603A TW111112603A TW202248229A TW 202248229 A TW202248229 A TW 202248229A TW 111112603 A TW111112603 A TW 111112603A TW 111112603 A TW111112603 A TW 111112603A TW 202248229 A TW202248229 A TW 202248229A
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Classifications
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
- C08G18/72—Polyisocyanates or polyisothiocyanates
- C08G18/77—Polyisocyanates or polyisothiocyanates having heteroatoms in addition to the isocyanate or isothiocyanate nitrogen and oxygen or sulfur
- C08G18/78—Nitrogen
- C08G18/79—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates
- C08G18/791—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups
- C08G18/792—Nitrogen characterised by the polyisocyanates used, these having groups formed by oligomerisation of isocyanates or isothiocyanates containing isocyanurate groups formed by oligomerisation of aliphatic and/or cycloaliphatic isocyanates or isothiocyanates
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/067—Polyurethanes; Polyureas
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- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/06—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes
- C08F299/065—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polyurethanes from polyurethanes with side or terminal unsaturations
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/08—Processes
- C08G18/16—Catalysts
- C08G18/22—Catalysts containing metal compounds
- C08G18/24—Catalysts containing metal compounds of tin
- C08G18/244—Catalysts containing metal compounds of tin tin salts of carboxylic acids
- C08G18/246—Catalysts containing metal compounds of tin tin salts of carboxylic acids containing also tin-carbon bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
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Abstract
本發明提供一種光造形用硬化性樹脂組成物,其含有:具有(甲基)丙烯醯基之胺酯樹脂(A,urethane resin)及光聚合起始劑,且上述胺酯樹脂(A)中之(甲基)丙烯醯基之含量為0.8 mmоl/g以上且2.2 mmоl/g以下。該光造形用硬化性樹脂組成物為低黏度,且能夠形成彈性模數及衝擊強度較大,經時變化較少之耐衝擊性優異之硬化物。
Description
本發明係關於一種光造形用硬化性樹脂組成物、硬化物及立體造形物。
近年來,使用一種光學立體造形法(光造形法)作為樹脂成型品之製造方法,該光學立體造形法(光造形法)係基於藉由三維CAD(電腦輔助設計)等立體設計系統所設計之立體形狀資料,利用紫外線雷射等活性能量線使硬化性樹脂組成物選擇性地聚合硬化,藉此製作立體造形物。該光學立體造形法亦可應對藉由切削加工難以實現之複雜形狀,製造時間亦較短,操作亦較為容易,故除樹脂成型品以外,亦廣泛用於製造工業製品之試製模型。
作為光學立體造形法之代表例,可例舉下述方法:自上方對加入至容器中之液狀光硬化性樹脂照射由電腦控制之點狀紫外線雷射,使既定厚度之1層硬化,將該造形物降低與1層相應之量,而將液狀樹脂供給至層上,同樣地藉由紫外線雷射光,以與上述相同之方式進行照射使其硬化並積層,重複該操作,藉此獲得立體造形物。又,最近,除使用點狀紫外線雷射之上述點描方式以外,增加了面曝光方式,該面曝光方式係使用LED等除雷射以外之光源,介隔「複數個數位微鏡快門呈面狀配置而成之被稱為DMD(數位微鏡裝置)的面狀描繪光罩」,通過裝有光硬化性樹脂之透明容器自下方照射紫外光,使既定剖面形狀圖案之1層硬化,將該造形物向上提拉與1層相應之量,以與上述相同之方式對下一個1層進行照射使其硬化,依序積層,獲得立體造形物。
作為上述光學立體造形法所用之光硬化性樹脂所要求之特性,可例舉下述各種特性:黏度較低,能夠形成平滑之液面,具有優異之硬化性等。作為此種光硬化性樹脂,已知有一種以自由基聚合性化合物為主體之樹脂組成物(例如參照專利文獻1及2),但其並不滿足如今對彈性模數及耐衝擊性越來越高之性能要求。
因此,謀求一種低黏度且能夠形成彈性模數及耐衝擊性亦優異之硬化物的光造形用硬化性樹脂組成物。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開平7-228644號公報
[專利文獻2]日本特開2008-189782號公報
[發明所欲解決之課題]
本發明之目的在於提供一種低黏度且能夠形成彈性模數及衝擊強度較大、經時變化較少之耐衝擊性優異之硬化物的光造形用硬化性樹脂組成物。
[解決課題之技術手段]
本發明人為了解決上述課題而反覆進行認真研究,結果發現,藉由使光造形用硬化性樹脂組成物中含有胺酯(甲基)丙烯酸酯中之丙烯醯基之含量表現出特定值之特定胺酯(甲基)丙烯酸酯,能夠解決上述課題,從而完成本發明。
即,本發明包括以下態樣。
[1]一種光造形用硬化性樹脂組成物,其含有:具有(甲基)丙烯醯基之胺酯樹脂(A,urethane resin)及光聚合起始劑,且
上述胺酯樹脂(A)中之(甲基)丙烯醯基之含量為0.8 mmоl/g以上且2.2 mmоl/g以下。
[2]如[1]所記載之光造形用硬化性樹脂組成物,其中,上述胺酯樹脂(A)以下述式(1)、(2)及(3)中之任一者所表示之至少一種聚異氰酸酯(a1);以及具有羥基及(甲基)丙烯醯基之化合物(a2)作為必須反應原料,
(於上述式(1)、(2)、(3)中,R
1、R
2、R
3分別表示可具有取代基之碳數1~20之烴基)。
[3]如[2]所記載之光造形用硬化性樹脂組成物,其中,於上述式(1)、(2)、(3)中,R
1、R
2、R
3分別為直鏈烷基。
[4]如[2]或[3]所記載之光造形用硬化性樹脂組成物,其中,上述胺酯樹脂(A)以上述式(1)、(2)、(3)中之任一者所表示之至少一種聚異氰酸酯(a1);以及下述式(4)所表示之具有羥基及(甲基)丙烯醯基之化合物(a2)作為必須反應原料,
(於上述式(4)中,R
4表示氫原子或甲基,n表示0以上且10以下之整數)。
[5]如[1]至[4]中任一項所記載之光造形用硬化性樹脂組成物,其中,上述光造形用硬化性樹脂組成物含有單官能(甲基)丙烯酸系化合物(B1)及/或2官能(甲基)丙烯酸系化合物(B2),
上述光造形用硬化性樹脂組成物中之上述胺酯樹脂(A)之含量為1質量%以上且50質量%以下。
[6]如[5]所記載之光造形用硬化性樹脂組成物,其中,上述單官能(甲基)丙烯酸系化合物(B1)之聚合物之玻璃轉移溫度為50℃以上。
[7]如[5]所記載之光造形用硬化性樹脂組成物,其中,上述2官能(甲基)丙烯酸系化合物(B2)之聚合物之玻璃轉移溫度為40℃以上。
[8]如[5]或[6]所記載之光造形用硬化性樹脂組成物,其中,上述單官能(甲基)丙烯酸系化合物(B1)由下述式(5)表示,
(於上述式(5)中,R
5表示氫原子或甲基。R
6及R
7分別獨立地為可具有環結構之碳數1~40之一價烴基、上述烴基之一部分碳原子經氧原子或氮原子取代之基、或者氫原子,R
6及R
7可互相鍵結而形成環,R
6及R
7所表示之碳數1~40之一價烴基可含不飽和雙鍵,亦可不含不飽和雙鍵)
[9]一種硬化物,其係[1]至[8]中任一項所記載之光造形用硬化性樹脂組成物之硬化反應物。
[10]如[9]所記載之硬化物,其以活性能量線之照射作為硬化條件。
[11]一種立體造形物,其由[9]或[10]所記載之硬化物構成。
[發明之效果]
根據本發明,可提供一種低黏度且能夠形成彈性模數及衝擊強度較大、經時變化較少之耐衝擊性優異之硬化物的光造形用硬化性樹脂組成物。
以下,對本發明詳細地進行說明。再者,以下所記載之構成要件之說明係用以對本發明進行說明之例示,本發明並不限定於該等內容。
於本說明書中,「(甲基)丙烯酸酯」意指丙烯酸酯及/或甲基丙烯酸酯。又,「(甲基)丙烯醯基」意指丙烯醯基及/或甲基丙烯醯基。進而,「(甲基)丙烯酸」意指丙烯酸及/或甲基丙烯酸。
(光造形用硬化性樹脂組成物)
本發明之光造形用硬化性樹脂組成物含有:具有(甲基)丙烯醯基之胺酯樹脂(A)及光聚合起始劑。
胺酯樹脂(A)中之(甲基)丙烯醯基之含量為0.8 mmоl/g以上且2.2 mmоl/g以下。
本發明之光造形用硬化性樹脂組成物除具有(甲基)丙烯醯基之胺酯樹脂(A)及光聚合起始劑以外,還可含有單官能(甲基)丙烯酸系化合物(B1)及/或2官能(甲基)丙烯酸系化合物(B2)。
又,本發明之光造形用硬化性樹脂組成物亦可於不妨礙本發明之效果之範圍內含有除單官能(甲基)丙烯酸系化合物(B1)及/或2官能(甲基)丙烯酸系化合物(B2)以外之3官能以上之其他(甲基)丙烯酸系化合物。
又,本發明之光造形用硬化性樹脂組成物亦可進而視需要含有光敏劑、紫外線吸收劑、聚合抑制劑、無機填料等其他添加劑。
<具有(甲基)丙烯醯基之胺酯樹脂(A)>
關於本發明中所用之胺酯樹脂(A),該胺酯樹脂(A)中之(甲基)丙烯醯基之含量表現出0.8 mmоl/g以上且2.2 mmоl/g以下之值。
藉由使硬化性樹脂組成物中含有「(甲基)丙烯醯基之含量為特定值之胺酯樹脂(A)」,如下述實施例所示,該硬化性樹脂組成物為低黏度,且能夠形成彈性模數及耐衝擊性亦優異之硬化物。
胺酯樹脂(A)可藉由使聚異氰酸酯(a1)與具有羥基及(甲基)丙烯醯基之化合物(a2)反應而獲得。
<<聚異氰酸酯(a1)>>
聚異氰酸酯(a1)並無特別限制,只要可形成本發明中所用之(甲基)丙烯醯基之含量為特定值之胺酯樹脂(A)即可,可根據目的適當選擇。例如可例舉:丁烷二異氰酸酯、六亞甲基二異氰酸酯、2,2,4-三甲基六亞甲基二異氰酸酯、2,4,4-三甲基六亞甲基二異氰酸酯等脂肪族二異氰酸酯化合物;降莰烷二異氰酸酯、異佛酮二異氰酸酯、氫化苯二甲基二異氰酸酯、氫化二苯基甲烷二異氰酸酯等脂環式二異氰酸酯化合物;甲苯二異氰酸酯、苯二甲基二異氰酸酯、四甲基苯二甲基二異氰酸酯、二苯基甲烷二異氰酸酯、1,5-萘二異氰酸酯、4,4'-二異氰酸基-3,3'-二甲基聯苯、鄰聯甲苯胺二異氰酸酯等芳香族二異氰酸酯化合物;具有下述式(6)所表示之重複結構之聚亞甲基聚苯基聚異氰酸酯;該等之異氰尿酸酯改質體、縮二脲改質體、脲甲酸酯改質體等。
(於式(6)中,R
1分別獨立地為氫原子、碳原子數1~6之烴基中之任一者。R
2分別獨立地為碳原子數1~4之烷基、或者經由式(6)所表示之結構部位及帶*記號之亞甲基而連結之鍵結點中之任一者。l為0或1~3之整數,m為1~15之整數)。
又,尤其是若聚異氰酸酯(a1)為下述式(1)、(2)、及(3)中之任一者所表示之至少一種聚異氰酸酯,則形成(甲基)丙烯醯基之含量表現出本發明中所規定之特定值的胺酯樹脂(A),就該方面而言更佳。
作為聚異氰酸酯(a1)之較佳之實施方式,可例舉下述<<<第一實施方式>>>。
<<<第一實施方式>>>
聚異氰酸酯(a1)更佳為下述式(1)、(2)、及(3)中之任一者所表示之至少一種聚異氰酸酯。
於上述式(1)、(2)、(3)中,R
1、R
2、R
3分別表示可具有取代基之碳數1~20之烴基。
更佳為如上述式(1)~(3)所示,使用具有異氰尿酸酯結構、縮二脲結構、或脲甲酸酯結構之聚異氰酸酯作為聚異氰酸酯(a1)。
於式(1)、(2)、(3)中,R
1、R
2、R
3更佳為分別為直鏈烷基。
上述聚異氰酸酯(a1)可單獨使用,亦可併用兩種以上。
<<具有羥基及(甲基)丙烯醯基之化合物(a2)>>
具有羥基及(甲基)丙烯醯基之化合物(a2)並無特別限制,只要可形成本發明中所用之(甲基)丙烯醯基之含量為特定值之胺酯樹脂(A)即可,可視目的適當選擇。例如可例舉:(甲基)丙烯酸羥基乙酯、(甲基)丙烯酸羥基丙酯、三羥甲基丙烷(甲基)丙烯酸酯、三羥甲基丙烷二(甲基)丙烯酸酯、新戊四醇(甲基)丙烯酸酯、新戊四醇二(甲基)丙烯酸酯、新戊四醇三(甲基)丙烯酸酯、二新戊四醇(甲基)丙烯酸酯、二新戊四醇二(甲基)丙烯酸酯、二新戊四醇三(甲基)丙烯酸酯、二新戊四醇四(甲基)丙烯酸酯、二新戊四醇五(甲基)丙烯酸酯、二-三羥甲基丙烷(甲基)丙烯酸酯、二-三羥甲基丙烷二(甲基)丙烯酸酯、二-三羥甲基丙烷三(甲基)丙烯酸酯等。又,亦可使用:上述各種具有羥基及(甲基)丙烯醯基之化合物之分子結構中導入有(聚)氧乙烯基鏈、(聚)氧丙烯基鏈、(聚)氧四亞甲基鏈等(聚)氧化烯基鏈之(聚)氧化烯基改質體;上述各種具有羥基及(甲基)丙烯醯基之化合物之分子結構中導入有(聚)內酯結構之內酯改質體等。
又,尤其是若具有羥基及(甲基)丙烯醯基之化合物(a2)為下述式(4)所表示之具有羥基及(甲基)丙烯醯基之化合物,則形成(甲基)丙烯醯基之含量表現出本發明中所規定之特定值的胺酯樹脂(A),就該方面而言更佳。
作為具有羥基及(甲基)丙烯醯基之化合物(a2)之較佳之實施方式,可例舉下述<<<第二實施方式>>>。
<<<第二實施方式>>>
具有羥基及(甲基)丙烯醯基之化合物(a2)更佳為下述式(4)所表示之具有羥基及(甲基)丙烯醯基之化合物。
上述具有羥基及(甲基)丙烯醯基之化合物(a2)可單獨使用,亦可併用兩種以上。
<<胺酯樹脂(A)之製造方法>>
胺酯樹脂(A)之製造方法並無特別限制,可藉由任意方法製造。例如,可藉由使含有上述聚異氰酸酯(a1)以及上述具有羥基及(甲基)丙烯醯基之化合物(a2)之反應原料一併進行反應之方法製造,亦可藉由將反應原料分開並依序反應之方法製造。再者,就可獲得低黏度且能夠形成具有優異之彈性模數及耐衝擊性之硬化物的硬化性樹脂組成物之方面而言,上述具有羥基及(甲基)丙烯醯基之化合物(a2)所具有之羥基(OH)、與聚異氰酸酯(a1)所具有之異氰酸酯基(NCO)之當量比(OH/NCO)較佳為0.95/1.00~1.05/1.00之範圍,更佳為1/1。
於製造胺酯樹脂(A)時,作為觸媒,例如可使用月桂酸二丁基錫、乙酸二丁基錫等,可於通常所進行之胺酯化反應之條件下製造。又,亦可視需要將乙酸乙酯、乙酸丁酯、甲基異丁基酮、甲苯、二甲苯等溶劑、或者不含與異氰酸酯反應之部位之自由基聚合性單體中之不含羥基或胺基者等用作溶劑。
<<胺酯樹脂(A)之特性>>
胺酯樹脂(A)中之(甲基)丙烯醯基之含量為胺酯樹脂(A)每單位質量之量(mmоl/g)。
胺酯樹脂(A)中之(甲基)丙烯醯基之含量表現出0.8 mmоl/g以上且2.2 mmоl/g以下之值,就兼具硬化物之硬度及耐衝擊性之觀點而言,更佳為1.0 mmоl/g以上,進而較佳為1.2 mmоl/g以上,且更佳為2.0 mmоl/g以下,進而較佳為1.9 mmоl/g以下。
胺酯樹脂(A)中之(甲基)丙烯醯基之含量例如可利用下述方法等求出:使用
1HNMR分析裝置,進行測定樣品與內部標準之各波峰的歸類,藉由積分比而求出;使用IR分析裝置,根據源自丙烯醯基之波峰與標準物質之特定波峰之比製作校準曲線,進行定量。於本申請案中,基於原料之(甲基)丙烯醯基之含量(理論值)算出胺酯樹脂(A)之(甲基)丙烯醯基含量。
<光聚合起始劑>
本發明之光造形用硬化性樹脂組成物進而含有光聚合起始劑。作為光聚合起始劑,例如可例舉:1-羥基環己基苯基酮、2-羥基-2-甲基-1-苯基丙烷-1-酮、1-[4-(2-羥基乙氧基)苯基]-2-羥基-2-甲基-1-丙烷-1-酮、9-氧硫
及9-氧硫
衍生物、2,2'-二甲氧基-1,2-二苯乙烷-1-酮、二苯基(2,4,6-三甲氧基苯甲醯基)膦氧化物(diphenyl(2,4,6-trimethylbenzoyl)phosphine oxide)、2,4,6-三甲基苯甲醯基二苯基膦氧化物、雙(2,4,6-三甲基苯甲醯基)苯基膦氧化物、2-甲基-1-(4-甲硫基苯基)-2-𠰌啉基丙烷-1-酮、2-苄基-2-二甲胺基-1-(4-𠰌啉基苯基)-1-丁酮、苯基(2,4,6-三甲基苯甲醯基)次膦酸乙酯、聚合TPO-L(polymeric TPO-L)等。
作為其他光聚合起始劑之市售品,例如可例舉:「Omnirad-1173」、「Omnirad-184」、「Omnirad-127」、「Omnirad-2959」、「Omnirad-369」、「Omnirad-379」、「Omnirad-907」、「Omnirad-4265」、「Omnirad-1000」、「Omnirad-651」、「Omnirad-TPO」、「Omnirad-819」、「Omnirad-2022」、「Omnirad-2100」、「Omnirad-2959」、「Omnirad-754」、「Omnirad-784」、「Omnirad-500」、「Omnirad-81」「Omnirad TPO-L」、「Omnipol TP」(IGM公司製造);「Kayacure-DETX」、「Kayacure-MBP」、「Kayacure-DMBI」、「Kayacure-EPA」、「Kayacure-OA」(日本化藥股份有限公司製造);「Vicure-10」、「Vicure-55」(Stauffer Chemical公司製造);「Trigonal P1」(Akzo公司製造);「Sandoray 1000」(Sandoz公司製造);「DEEP」(Upjohn公司製造);「Quantacure-PDO」、「Quantacure-ITX」、「Quantacure-EPD」(Ward Blenkinsop公司製造);「Runtecure-1104」(Runtec公司製造)等。
關於光聚合起始劑之添加量,例如較佳為以於光造形用硬化性樹脂組成物中為1~20質量%之範圍使用。
<單官能(甲基)丙烯酸系化合物(B1)>
(甲基)丙烯酸系化合物中亦可包括含氮之(甲基)丙烯酸系化合物。
例如,作為(甲基)丙烯酸系化合物,可例舉:(甲基)丙烯酸酯化合物或(甲基)丙烯醯胺類等(甲基)丙烯酸系化合物。
作為單官能(甲基)丙烯酸系化合物(B1),例如可例舉:(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸苯氧基苄酯、(甲基)丙烯酸環己酯、(甲基)丙烯酸三甲基環己酯、(甲基)丙烯酸環己基甲酯、(甲基)丙烯酸環己基乙酯、(甲基)丙烯酸2-乙基己酯、二丙二醇單(甲基)丙烯酸酯、(甲基)丙烯酸異莰酯、(甲基)丙烯酸降莰酯、(甲基)丙烯酸異壬酯、(甲基)丙烯酸苄酯、(甲基)丙烯酸苯基苄酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸四氫糠酯、(甲基)丙烯酸乙氧基乙氧基乙酯、琥珀酸2-(甲基)丙烯醯氧基乙酯、(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸正戊酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸第三丁酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸2-乙基甲氧基酯、(甲基)丙烯酸2-乙基乙氧基酯、(甲基)丙烯酸2-乙基丁氧基酯、(甲基)丙烯酸正癸酯、(甲基)丙烯酸異癸酯、(甲基)丙烯酸月桂酯、丁氧基二乙二醇(甲基)丙烯酸酯、丁氧基三乙二醇(甲基)丙烯酸酯、甲氧基二乙二醇(甲基)丙烯酸酯、甲氧基三乙二醇(甲基)丙烯酸酯、甲氧基聚乙二醇(甲基)丙烯酸酯、(甲基)丙烯酸2-羥基乙酯、(甲基)丙烯酸2-羥基丙酯、(甲基)丙烯酸4-羥基丁酯、(甲基)丙烯酸二甲胺基乙酯、(甲基)丙烯酸二乙胺基乙酯、(甲基)丙烯醯𠰌啉、琥珀酸2-(甲基)丙烯醯氧基乙酯、六氫鄰苯二甲酸2-(甲基)丙烯醯氧基乙酯、(甲基)丙烯酸縮水甘油酯、(甲基)丙烯酸2-羥基-3-苯氧基丙酯、(甲基)丙烯酸二環戊烯酯、(甲基)丙烯酸二環戊烯氧基乙酯、(甲基)丙烯酸二環戊酯、(甲基)丙烯酸二環戊氧基乙酯、(甲基)丙烯酸五甲基哌啶基酯、(甲基)丙烯酸四甲基哌啶基酯、(甲基)丙烯酸(2-甲基-2-乙基-1,3-二氧雜環戊烷-4-基)甲酯、甲基丙烯酸3,4-環氧環己基甲酯、環狀三羥甲基丙烷縮甲醛(甲基)丙烯酸酯、(甲基)丙烯酸1-金剛烷基酯、(甲基)丙烯酸2-金剛烷基酯、(甲基)丙烯酸2-甲基-2-金剛烷基酯、甘油碳酸酯(甲基)丙烯酸酯、(甲基)丙烯酸第三丁基環己酯、(甲基)丙烯酸2-(1,2-環己烷二羧醯亞胺)乙酯、(甲基)丙烯酸鄰苯基苯氧基乙酯、(甲基)丙烯酸苯氧基乙酯等單官能(甲基)丙烯酸酯化合物。
單官能(甲基)丙烯酸系化合物可單獨使用,亦可併用兩種以上。
又,於單官能(甲基)丙烯酸系化合物中,就可獲得低黏度且能夠形成具有優異之機械物性之硬化物的硬化性樹脂組成物之方面而言,較佳為單官能(甲基)丙烯酸系化合物之聚合物之玻璃轉移溫度(以下簡稱為「Tg」)為50℃以上之化合物。其中,較佳為具有縮合多環結構、雜環結構等環狀結構之(甲基)丙烯酸系化合物,進而較佳為丙烯酸異莰酯(Tg:94℃)、甲基丙烯酸異莰酯(Tg:180℃)、丙烯酸二環戊烯酯(Tg:120℃)、丙烯酸二環戊酯(Tg:120℃)、甲基丙烯酸二環戊酯(Tg:175℃)。
再者,於併用兩種以上之單官能(甲基)丙烯酸系化合物(B1)之情形時,兩種以上之單官能(甲基)丙烯酸系化合物之共聚物之Tg較佳為50℃以上。
又,作為(甲基)丙烯酸系化合物(B1),亦可含有含氮之(甲基)丙烯酸系化合物,尤其是就硬化物於成形階段中之密合性之觀點而言,更佳為下述式(5)所表示之(甲基)丙烯醯胺。
於上述式(5)中,R
5表示氫原子或甲基。R
6及R
7分別獨立地為可具有環結構之碳數1~40之一價烴基、上述烴基之一部分碳原子經氧原子或氮原子取代之基、或者氫原子,R
6及R
7可互相鍵結而形成環,R
6及R
7所表示之碳數1~40之一價烴基可含不飽和雙鍵,亦可不含不飽和雙鍵。
作為式(5)所表示之單官能(甲基)丙烯醯胺化合物,例如可例舉:丙烯醯𠰌啉、異丙基丙烯醯胺、二甲基丙烯醯胺、羥乙基丙烯醯胺、二乙基丙烯醯胺,其中,較佳為具有縮合多環結構、雜環結構等環狀結構之(甲基)丙烯醯胺化合物,特佳為丙烯醯𠰌啉(Tg:145℃)。
<2官能(甲基)丙烯酸系化合物(B2)>
作為2官能(甲基)丙烯酸系化合物,例如可例舉:2官能(甲基)丙烯酸酯化合物。
更具體而言,作為2官能(甲基)丙烯酸系化合物(B2),例如可例舉:1,6-己二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,3-丁二醇二(甲基)丙烯酸酯、1,9-壬二醇二(甲基)丙烯酸酯、1,10-癸二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、環氧乙烷改質1,6-己二醇二(甲基)丙烯酸酯、羥基三甲基乙酸新戊二醇二(甲基)丙烯酸酯、環氧丙烷改質新戊二醇二(甲基)丙烯酸酯、三丙二醇二(甲基)丙烯酸酯、二丙二醇二(甲基)丙烯酸酯、三乙二醇二(甲基)丙烯酸酯、雙酚A之環氧乙烷改質二(甲基)丙烯酸酯、雙酚A之環氧丙烷改質二(甲基)丙烯酸酯、雙酚F之環氧乙烷改質二(甲基)丙烯酸酯、三環癸烷二甲醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、聚丙二醇二(甲基)丙烯酸酯、甘油之環氧丙烷改質三(甲基)丙烯酸酯、(甲基)丙烯酸2-羥基-3-丙烯醯氧基丙酯、雙苯氧基乙醇茀之環氧乙烷改質二(甲基)丙烯酸酯、聚四亞甲基二醇二(甲基)丙烯酸酯、乙氧化異三聚氰酸三(甲基)丙烯酸酯、苯氧基乙二醇(甲基)丙烯酸酯、(甲基)丙烯酸硬脂酯、琥珀酸2-(甲基)丙烯醯氧基乙酯、(甲基)丙烯酸三氟乙酯、3-甲基-1,5戊二醇二(甲基)丙烯酸酯、2,3-[(甲基)丙烯醯氧基甲基]降莰烷、2,5-[(甲基)丙烯醯氧基甲基]降莰烷、2,6-[(甲基)丙烯醯氧基甲基]降莰烷、二(甲基)丙烯酸1,3-金剛烷基酯、1,3-雙[(甲基)丙烯醯氧基甲基]金剛烷、參(羥基乙基)異三聚氰酸二(甲基)丙烯酸酯、3,9-雙[1,1-二甲基-2-(甲基)丙烯醯氧基乙基]-2,4,8,10-四氧螺[5.5]十一烷等2官能(甲基)丙烯酸酯化合物。
該等2官能(甲基)丙烯酸系化合物可單獨使用,亦可併用兩種以上。
又,於2官能(甲基)丙烯酸系化合物中,就可獲得低黏度且能夠形成具有優異之機械物性之硬化物的硬化性樹脂組成物之方面而言,較佳為2官能(甲基)丙烯酸系化合物之聚合物之Tg為40℃以上之化合物。其中,更佳為二丙二醇二丙烯酸酯(Tg:102℃)、三環癸烷二甲醇二丙烯酸酯(Tg:110℃)、羥基三甲基乙酸新戊二醇二丙烯酸酯(Tg:111℃)。
再者,於併用兩種以上之2官能(甲基)丙烯酸系化合物(B2)之情形時,兩種以上之2官能(甲基)丙烯酸系化合物之共聚物之Tg較佳為40℃以上。
又,亦可併用單官能(甲基)丙烯酸系化合物(B1)與2官能(甲基)丙烯酸系化合物(B2)。於此情形時,所併用之(甲基)丙烯酸系化合物之共聚物之Tg較佳為40℃以上。
<其他(甲基)丙烯酸系化合物>
於本發明之光造形用硬化性樹脂組成物中,可在不妨礙本發明之效果之範圍內,進而視需要併用地含有除上述單官能(甲基)丙烯酸系化合物(B1)及/或上述2官能(甲基)丙烯酸系化合物(B2)以外的3官能以上之(甲基)丙烯酸系化合物。於此情形時,所併用之(甲基)丙烯酸系化合物之共聚物之Tg亦較佳為40℃以上。
作為3官能以上之(甲基)丙烯酸系化合物,例如可例舉:EO改質丙烯酸甘油酯、PO改質三丙烯酸甘油酯、新戊四醇三丙烯酸酯、EO改質磷酸三丙烯酸酯、三羥甲基丙烷三丙烯酸酯、己內酯改質三羥甲基丙烷三丙烯酸酯、HPA改質三羥甲基丙烷三丙烯酸酯、(EO)或者(PO)改質三羥甲基丙烷三丙烯酸酯、烷基改質二新戊四醇三丙烯酸酯、異氰尿酸參(丙烯醯氧基乙基)酯等3官能(甲基)丙烯酸酯;
二-三羥甲基丙烷四丙烯酸酯、新戊四醇乙氧基四丙烯酸酯、新戊四醇四丙烯酸酯等4官能(甲基)丙烯酸酯;
二新戊四醇羥基五丙烯酸酯、烷基改質二新戊四醇五丙烯酸酯等5官能(甲基)丙烯酸酯;
二新戊四醇六丙烯酸酯等6官能(甲基)丙烯酸酯。該等3官能以上之(甲基)丙烯酸系化合物(更具體而言為(甲基)丙烯酸酯)可單獨使用,亦可併用兩種以上。
<其他添加劑>
又,本發明之光造形用硬化性樹脂組成物中亦可視需要含有光敏劑、紫外線吸收劑、抗氧化劑、聚合抑制劑、矽系添加劑、氟系添加劑、矽烷偶合劑、磷酸酯化合物、有機珠粒、無機微粒子、有機填料、無機填料、流變控制劑、消泡劑、著色劑等各種添加劑。
本發明之光造形用硬化性樹脂組成物中可視需要進而添加光敏劑,提高硬化性。
作為光敏劑,例如可例舉:脂肪族胺、芳香族胺等胺化合物;鄰甲苯基硫脲等脲化合物;蒽醌衍生物等縮合多環系化合物;二乙基二硫代磷酸鈉、s-苄基異硫脲-對甲苯磺酸鹽等硫化合物等。
作為紫外線吸收劑,例如可例舉:2-[4-{(2-羥基-3-十二烷氧基丙基)氧基}-2-羥基苯基]-4,6-雙(2,4-二甲基苯基)-1,3,5-三、2-[4-{(2-羥基-3-十三烷氧基丙基)氧基}-2-羥基苯基]-4,6-雙(2,4-二甲基苯基)-1,3,5-三等三衍生物;2-(2'-
羧基-5'-甲基苯基)苯并三唑、2-(2'-鄰硝基苄氧基-5'-甲基苯基)苯并三唑、2-
羧基-4-十二烷氧基二苯甲酮、2-鄰硝基苄氧基-4-十二烷氧基二苯甲酮等。該等紫外線吸收劑可單獨使用,亦可併用兩種以上。
作為抗氧化劑,例如可例舉:受阻酚系抗氧化劑、受阻胺系抗氧化劑、有機硫系抗氧化劑、磷酸酯系抗氧化劑等。該等抗氧化劑可單獨使用,亦可併用兩種以上。
作為聚合抑制劑,例如可例舉:對苯二酚、對甲氧基苯酚、二第三丁基對苯二酚、P-甲氧基苯酚、丁基羥基甲苯、亞硝胺鹽等。
作為矽系添加劑,例如可例舉:二甲基聚矽氧烷、甲基苯基聚矽氧烷、環狀二甲基聚矽氧烷、甲基氫聚矽氧烷、聚醚改質二甲基聚矽氧烷共聚物、聚酯改質二甲基聚矽氧烷共聚物、氟改質二甲基聚矽氧烷共聚物、胺基改質二甲基聚矽氧烷共聚物等具有烷基或苯基之聚有機矽氧烷、具有聚醚改質丙烯酸基之聚二甲基矽氧烷、具有聚酯改質丙烯酸基之聚二甲基矽氧烷等。該等矽系添加劑可單獨使用,亦可併用兩種以上。
作為氟系添加劑,例如可例舉:DIC股份有限公司製造之「MEGAFACE」系列等。該等氟系添加劑可單獨使用,亦可併用兩種以上。
作為矽烷偶合劑,例如可例舉:乙烯基三氯矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基三甲氧基矽烷、N-2-(胺基乙基)-3-胺基丙基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-三乙氧基矽基-N-(1,3-二甲基亞丁基)丙胺、N-苯基-3-胺基丙基三甲氧基矽烷、N-(乙烯基苄基)-2-胺基乙基-3-胺基丙基三甲氧基矽烷之鹽酸鹽、特殊胺基矽烷、3-醯脲基丙基三乙氧基矽烷、3-氯丙基三甲氧基矽烷、3-巰丙基甲基二甲氧基矽烷、3-巰丙基三甲氧基矽烷、雙(三乙氧基矽基丙基)四硫化物、3-異氰酸基丙基三乙氧基矽烷、烯丙基三氯矽烷、烯丙基三乙氧基矽烷、烯丙基三甲氧基矽烷、二乙氧基甲基乙烯基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷等乙烯系矽烷偶合劑;
二乙氧基(縮水甘油氧基丙基)甲基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷等環氧系矽烷偶合劑;
對苯乙烯基三甲氧基矽烷等苯乙烯系矽烷偶合劑;
3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷等(甲基)丙烯醯氧基系矽烷偶合劑;
N-2(胺基乙基)3-胺基丙基甲基二甲氧基矽烷、N-2(胺基乙基)3-胺基丙基三甲氧基矽烷、N-2(胺基乙基)3-胺基丙基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-三乙氧基矽基-N-(1,3-二甲基亞丁基)丙胺、N-苯基-3-胺基丙基三甲氧基矽烷等胺基系矽烷偶合劑;
3-醯脲基丙基三乙氧基矽烷等醯脲系矽烷偶合劑;
3-氯丙基三甲氧基矽烷等氯丙基系矽烷偶合劑;
3-巰丙基甲基二甲氧基矽烷、3-巰丙基三甲氧基矽烷等巰基系矽烷偶合劑;
雙(三乙氧基矽基丙基)四硫化物等硫化物系矽烷偶合劑;
3-異氰酸基丙基三乙氧基矽烷等異氰酸酯系矽烷偶合劑等。該等矽烷偶合劑可單獨使用,亦可併用兩種以上。
作為磷酸酯化合物,例如可例舉分子結構中具有(甲基)丙烯醯基者,作為市售品,例如可例舉:日本化藥股份有限公司製造之「Kayamer PM-2」、「Kayamer PM-21」;共榮社化學股份有限公司製造之「Light ester P-1M」、「Light ester P-2M」、「Light acrylate P-1A(N)」;SOLVAY公司製造之「SIPOMER PAM 100」、「SIPOMER PAM 200」、「SIPOMER PAM 300」、「SIPOMER PAM 4000」;大阪有機化學工業公司製造之「Viscoat #3PA」、「Viscoat #3PMA」;第一工業製藥公司製造之「NEW FRONTIER S-23A」;作為分子結構中具有烯丙醚基之磷酸酯化合物的SOLVAY公司製造之「SIPOMER PAM 5000」等。
作為有機珠粒,例如可例舉:聚甲基丙烯酸甲酯珠粒、聚碳酸酯珠粒、聚苯乙烯珠粒、聚丙烯酸苯乙烯珠粒、聚矽氧珠粒、玻璃珠、丙烯酸珠粒、苯胍胺(benzoguanamine)系樹脂珠粒、三聚氰胺系樹脂珠粒、聚烯烴系樹脂珠粒、聚酯系樹脂珠粒、聚醯胺樹脂珠粒、聚醯亞胺系樹脂珠粒、聚氟乙烯樹脂珠粒、聚乙烯樹脂珠粒等。該等有機珠粒可單獨使用,亦可併用兩種以上。又,該等有機珠粒之平均粒徑較佳為1~10 μm之範圍。
無機微粒子例如可例舉:二氧化矽、氧化鋁、氧化鋯、二氧化鈦、鈦酸鋇、三氧化二銻等微粒子。該等無機微粒子可單獨使用,亦可併用兩種以上。又,該等無機微粒子之平均粒徑較佳為95~250 nm之範圍,尤其更佳為100~180 nm之範圍。
於含有無機微粒子之情形時,可使用分散助劑。
作為分散助劑,例如可例舉:磷酸異丙酯(isopropyl acid phosphate)、亞磷酸三異癸酯、環氧乙烷改質磷酸二甲基丙烯酸酯等磷酸酯化合物等。該等分散助劑可單獨使用,亦可併用兩種以上。
又,作為分散助劑之市售品,例如可例舉:日本化藥股份有限公司製造之「Kayamer PM-21」、「Kayamer PM-2」;共榮社化學股份有限公司製造之「Lightester P-2M」等。
作為有機填料,例如可例舉:纖維素、木質素、及纖維素奈米纖維等來自植物之不溶於溶劑之物質等。
作為無機填料,例如可例舉:玻璃(粒子)、二氧化矽(粒子)、鋁矽酸鹽、滑石、雲母、氫氧化鋁、氧化鋁、碳酸鈣、奈米碳管等。
作為流變控制劑,例如可例舉:楠本化成股份有限公司製造之「Disparlon 6900」等醯胺-蠟類;BYK-Chemie公司製造之「BYK410」等脲系流變控制劑類;楠本化成股份有限公司製造之「Disparlon 4200」等聚乙烯-蠟;Eastman Chemical Products公司製造之「CAB-381-2」、「CAB32101」等纖維素-乙酸酯-丁酸酯等。
作為消泡劑,例如可例舉:含氟或矽原子之低聚物;或者高級脂肪酸、丙烯酸聚合物等低聚物等。
作為著色劑,例如可例舉:顏料、染料等。
作為顏料,可使用公知慣用之無機顏料或有機顏料。
作為無機顏料,例如可例舉:氧化鈦、銻紅、鐵丹、鎘紅、鎘黃、鈷藍、鐵藍、群青、碳黑、石墨等。
作為有機顏料,例如可例舉:喹吖啶酮顏料、喹吖啶酮醌顏料、二 顏料、酞青顏料、蒽嘧啶顏料、蒽締蒽酮(anthanthrone)顏料、陰丹士林(indanthrone)顏料、黃士酮(flavanthrone)顏料、苝顏料、吡咯并吡咯二酮顏料、芘酮顏料、喹酞酮顏料、蒽醌顏料、硫靛藍顏料、苯并咪唑酮顏料、偶氮顏料等。該等顏料可單獨使用,亦可併用兩種以上。
作為染料,例如可例舉:單偶氮-雙偶氮等偶氮染料、金屬錯鹽染料、萘酚染料、蒽醌染料、靛藍染料、碳陽離子染料、醌亞胺染料、花青染料、喹啉染料、硝基染料、亞硝基染料、苯醌染料、萘醌染料、萘二甲醯亞胺染料、芘酮染料、酞青染料、三烯丙基甲烷系染料等。該等染料可單獨使用,亦可併用兩種以上。
<光造形用硬化性樹脂組成物之特性>
就黏度不會過高,確保實用上有效之黏度範圍之觀點而言,本發明之光造形用硬化性樹脂組成物中之胺酯樹脂(A)之含量較佳為1質量%以上且50質量%以下,更佳為3質量%以上且50質量%以下。
(硬化物)
本發明之硬化物可藉由對本發明之光造形用硬化性樹脂組成物照射活性能量線而獲得。
作為活性能量線,例如可例舉:紫外線、電子束、α射線、β射線、γ射線等游離輻射。又,於使用紫外線作為活性能量線之情形時,就藉由紫外線高效率地進行硬化反應之方面而言,可於氮氣等非活性氣體環境下進行照射,亦可於空氣環境下進行照射。
就實用性、經濟性之方面而言,紫外線產生源一般使用紫外線燈。具體而言,可例舉:低壓水銀燈、高壓水銀燈、超高壓水銀燈、氙氣燈、鎵燈、金屬鹵素燈、太陽光、LED等。
活性能量線之累計光量並無特別限制,較佳為50~5,000 mJ/cm
2,更佳為300~1,000 mJ/cm
2。若累計光量為上述範圍,則可防止或抑制未硬化部分之產生,故而較佳。
(立體造形物)
本發明之立體造形物可藉由習知之光學立體造形法製作。
作為光學立體造形法,例如可例舉:立體微影(SLA,stereo lithography)方式、數位光處理(DLP,digital light processing)方式、噴墨方式。
立體微影(SLA)方式係對液狀硬化性樹脂組成物之槽以點狀照射雷射光線等活性能量線,使造形台移動並同時逐層硬化而進行立體造形之方式。
數位光處理(DLP)方式係對液狀硬化性樹脂組成物之槽以面狀照射LED等活性能量線,使造形台移動並同時逐層硬化而進行立體造形之方式。
噴墨光造形法係將光造形用硬化性樹脂組成物之微滴以描繪既定形狀圖案之方式自噴嘴噴出,然後照射紫外線而形成硬化薄膜之方法。
於該等光學立體造形法中,就可實現面高速造形之方面而言,較佳為DLP方式。
DLP方式之立體造形方法並無特別限制,只要為使用DLP方式之光造形系統之方法即可,作為其造形條件,就立體造形物之造形精度變得良好之方面而言,需要光造形之積層間距為0.01~0.2 mm之範圍,照射波長為350~410 nm之範圍,光強度為0.5~50 mW/cm
2之範圍,每層之累計光量為1~100 mJ/cm
2之範圍,其中,就立體造形物之造形精度變得更良好之方面而言,較佳為光造形之積層間距為0.02~0.1 mm之範圍,照射波長為380~410 nm之範圍,光強度為5~15 mW/cm
2之範圍,每層之累計光量為5~15 mJ/cm
2之範圍。
本發明之立體造形物由於具有較高之彈性模數,且耐衝擊性優異,故適宜用於例如:汽車零件、航空·太空相關零件、電氣電子零件、家電、建材、室內裝潢、珠寶首飾、醫療材料等。
[實施例]
以下,舉出實施例對本發明進一步進行詳述,但本發明之範圍並不定於該等實施例。
以下之實施例中所用之材料如下所述。
·Sumidur N3300:下述式(a1-1)所表示之異氰尿酸酯型六亞甲基二異氰酸酯
·Duranate 24A-100:下述式(a1-2)所表示之縮二脲型六亞甲基二異氰酸酯
·Basonat HA300:下述式(a1-3)所表示之脲甲酸酯型六亞甲基二異氰酸酯
·VESTANAT T1890:下述式(a1-4)所表示之異氰尿酸酯型異佛酮二異氰酸酯
·異佛酮二異氰酸酯:下述式(a1-5)所表示之二異氰酸酯
·Karenz AOI:下述式(a1-6)所表示之異氰酸2-丙烯醯氧基乙酯
·PLACCEL FA5:下述式(a2-1)所表示之己內酯5 mol加成型丙烯酸2-羥基乙酯,羥值:81.8 KOHmg/g,(甲基)丙烯醯基含量(理論值):1.46 mmоl/g
·PLACCEL FA4DT:下述式(a2-2)所表示之己內酯4 mol加成型丙烯酸2-羥基乙酯,羥值:98.1 KOHmg/g,(甲基)丙烯醯基含量(理論值):1.76 mmоl/g
·PLACCEL FA2D:下述式(a2-3)所表示之己內酯2 mol加成型丙烯酸2-羥基乙酯,羥值:163.1 KOHmg/g,(甲基)丙烯醯基含量(理論值):2.87 mmоl/g
·PLACCEL FA10L:下述式(a2-4)所表示之己內酯10 mol加成型丙烯酸2-羥基乙酯(固形物成分70%),羥值:31 KOHmg/g,(甲基)丙烯醯基含量(理論值):0.552 mmоl/g
·ACMO:下述式(b1-1)所表示之丙烯醯𠰌啉(KJ Chemicals股份有限公司製造),Tg 145℃,官能基數量1
·NIPAM:下述式(b1-2)所表示之異丙基丙烯醯胺(KJ Chemicals股份有限公司製造),Tg 134℃,官能基數量1
·FA-513AS:下述式(b1-3)所表示之丙烯酸二環戊酯(昭和電工材料股份有限公司製造),Tg 120℃,官能基數量1
·DMAA:下述式(b1-4)所表示之二甲基丙烯醯胺(KJ Chemicals股份有限公司製造),Tg 119℃,官能基數量1
·IBXA:下述式(b1-5)所表示之丙烯酸異莰酯(大阪有機化學工業股份有限公司製造),Tg 97℃,官能基數量1
·TBCHA:下述式(b1-6)所表示之丙烯酸4-第三丁基環己酯(KJ Chemicals股份有限公司製造),Tg 65℃,官能基數量1
·MIRAMER M210:下述式(b2-1)所表示之羥基三甲基乙酸新戊二醇二丙烯酸酯(MIWON公司製造),Tg 111℃,官能基數量2
·MIRAMER M262:下述式(b2-2)所表示之三環癸烷二甲醇二丙烯酸酯(MIWON公司製造),Tg 110℃,官能基數量2
·MIRAMER M222:下述式(b2-3)所表示之二丙二醇二丙烯酸酯(MIWON公司製造),Tg 102℃,官能基數量2
·MIRAMER M240:下述式(b2-3)所表示之雙酚A EO改質二丙烯酸酯(MIWON公司製造),Tg 42℃,官能基數量2
(合成例1:胺酯(甲基)丙烯酸酯(A1)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA5(234質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加Sumika Bayer Urethane股份有限公司製造之Sumidur N3300(65質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A1)。
根據原料之丙烯醯基含量(理論值)算出之每1 g胺酯(甲基)丙烯酸酯(A1)中之(甲基)丙烯醯基之含量為1.14 mmol(記載於下述表1中。再者,下述合成例中所得之各胺酯(甲基)丙烯酸酯中之(甲基)丙烯醯基之含量亦記載於表1中)。
(合成例2:胺酯(甲基)丙烯酸酯(A2)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA4DT(224質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加Sumika Bayer Urethane股份有限公司製造之Sumidur N3300(75質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A2)。
(合成例3:胺酯(甲基)丙烯酸酯(A3)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA2D(192質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加Sumika Bayer Urethane股份有限公司製造之Sumidur N3300(107質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A3)。
(合成例4:胺酯(甲基)丙烯酸酯(A4)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA4DT(155質量份)、第三丁基羥基甲苯(0.4質量份)、甲氧基對苯二酚(0.04質量份)、二乙酸二丁基錫(0.04質量份),升溫至70℃,耗時1小時分批添加旭化成股份有限公司製造之Duranate 24A-100(48質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A4)。
(合成例5:胺酯(甲基)丙烯酸酯(A5)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA4DT(215質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加BASF公司製造之Basonat HA300(84質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A5)。
(合成例6:胺酯(甲基)丙烯酸酯(A6)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA4DT(211質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加Evonik Industries公司製造之VESTANAT T1890(89質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A6)。
(合成例7:胺酯(甲基)丙烯酸酯(A7)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA5(258質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加異佛酮二異氰酸酯(41質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A7)。
(合成例8:胺酯(甲基)丙烯酸酯(A8)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA5(249質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加昭和電工股份有限公司製造之Karenz AOI(50質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得胺酯(甲基)丙烯酸酯(A8)。
(合成例9:胺酯(甲基)丙烯酸酯(A9)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之2升燒瓶中加入異佛酮二異氰酸酯(132質量份)、第三丁基羥基甲苯(1.6質量份)、甲氧基對苯二酚(0.2質量份)、二乙酸二丁基錫(0.2)質量份,升溫至70℃,耗時1小時分批添加聚丙二醇(數量平均分子量2000)(596質量份)。添加後,於70℃反應3小時後,耗時1小時添加Daicel股份有限公司製造之PLACCEL FA4DT(340質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,獲得具有丙烯醯基之胺酯樹脂(A-9)。
(合成例10:胺酯(甲基)丙烯酸酯(A10)之合成)
向具備攪拌機、氣體導入管、冷凝器、及溫度計之1升燒瓶中加入Daicel股份有限公司製造之PLACCEL FA10L(371質量份)、第三丁基羥基甲苯(0.6質量份)、甲氧基對苯二酚(0.06質量份)、二乙酸二丁基錫(0.06質量份),升溫至70℃,耗時1小時分批添加Sumika Bayer Urethane股份有限公司製造之Sumidur N3300(40質量份)。添加後,於70℃進行反應直至表示異氰酸酯基之2250 cm
-1處之紅外吸收光譜消失,將溶劑減壓蒸餾去除,獲得胺酯(甲基)丙烯酸酯(A10)。
(實施例1:硬化性樹脂組成物(1)之製備)
向具備攪拌機、溫度計及冷卻管之四口燒瓶中添加合成例1中所得之胺酯(甲基)丙烯酸酯(A1)30質量份、KJ Chemicals股份有限公司製造之ACMO 70質量份、IGM Resins公司製造之Omnirad TPO 2質量份,於60℃以下進行攪拌直至均勻溶解,獲得硬化性樹脂組成物(1)。
(實施例2~23:硬化性樹脂組成物(2)~(23)之製備)
將實施例1中之胺酯(甲基)丙烯酸酯、及(甲基)丙烯酸系化合物變更為表1或表2所示之組成及調配量,除此以外,藉由與實施例1同樣之方法獲得硬化性樹脂組成物(2)~(23)。
(比較例1~3:硬化性樹脂組成物(C1)~(C3)之製備)
將實施例1中之胺酯(甲基)丙烯酸酯、及(甲基)丙烯酸系化合物變更為表3所示之組成及調配量,除此以外,藉由與實施例1同樣之方法獲得硬化性樹脂組成物(C1)~(C3)。
使用上述實施例1~23、及比較例1~3中所得之硬化性樹脂組成物,進行下述評價。
[黏度之測定]
使用E型黏度計(東機產業股份有限公司製造之「TV-22」),測定各實施例及比較例中所得之硬化性樹脂組成物於25℃之黏度。
[試片之製作]
使用光造形3D印表機(3D'LIGHT公司製造之「Vittro P100」),製作拉伸試驗用啞鈴、及艾氏(Izod)衝擊試驗用試片(依據ASTM D256)。再者,拉伸試驗用啞鈴係以ASTM D638 TYPE1之相似形狀,以全長成為55 mm之尺寸製作。其次,用異丙醇洗淨藉由光造形所得之上述拉伸試驗用啞鈴、及上述艾氏衝擊試驗用試片,於常溫下乾燥1小時後,使用XYZ Printing公司製造之「Multicure 180」,分別對兩面每10分鐘照射一次波長385 nm之LED,進行後硬化,獲得試片1(拉伸試驗用啞鈴)及試片2(艾氏衝擊試驗用試片)。
[彈性模數之測定方法]
藉由INSTRON公司製造之萬能材料試驗機「5965」,進行拉伸試驗,測定彈性模數。再者,試驗係於荷重元1 kN、拉伸速度1 mm/min、拉伸夾具間距離38 mm之條件下進行測定。
[艾氏衝擊強度(耐衝擊性)之測定方法]
依據ASTM D256,使用上述試片2,藉由東洋精機製作所股份有限公司製作之「艾氏衝擊試驗機」,使用2.75 J之錘,測定艾氏衝擊強度。試驗分別於試片2製成1週後及3週後實施,亦算出經時變化率。再者,試片2於製成後至試驗之期間於室溫25℃、濕度50%之環境下保管。
將實施例1~23、及比較例1~3中所得之硬化性樹脂組成物之組成及評價結果示於下述表1~表3中。
[表1]
實施例1 | 實施例2 | 實施例3 | 實施例4 | 實施例5 | 實施例6 | 實施例7 | 實施例8 | 實施例9 | ||||
(甲基)丙烯醯基含量[mmol/g] | 硬化性樹脂組成物 | (1) | (2) | (3) | (4) | (5) | (6) | (7) | (8) | (9) | ||
胺酯(甲基)丙烯酸酯(A) | A1 | 1.14 | 組成 (質量份) | 30 | ||||||||
A2 | 1.31 | 30 | 30 | 40 | ||||||||
A3 | 1.86 | 30 | ||||||||||
A4 | 1.33 | 30 | ||||||||||
A5 | 1.26 | 30 | ||||||||||
A6 | 1.23 | 30 | ||||||||||
A7 | 1.245 | 30 | ||||||||||
A8 | 2.4 | |||||||||||
A9 | 0.73 | |||||||||||
A10 | 0.69 | |||||||||||
單官能(甲基)丙烯酸系化合物(B1) | ACMO | 70 | 70 | 30 | 30 | 30 | 30 | 30 | 30 | |||
NIPAM | ||||||||||||
FA-513AS | ||||||||||||
DMAA | ||||||||||||
IBXA | ||||||||||||
TBCHA | ||||||||||||
2官能(甲基)丙烯酸系化合物(B2) | MIRAMER M210 | 40 | 60 | 40 | 40 | 40 | 40 | 40 | ||||
MIRAMER M262 | ||||||||||||
MIRAMER M222 | ||||||||||||
MIRAMER M240 | ||||||||||||
光聚合起始劑 | Omnirad TPO | 2 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | ||
合計 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | |||
評價結果 | 黏度[mPa·s] | 147 | 210 | 170 | 420 | 170 | 163 | 181 | 176 | 116 | ||
彈性模數[×10 9Pa] | 1.405 | 1.311 | 1.619 | 1.200 | 2.468 | 1.365 | 1.294 | 2.008 | 1.765 | |||
艾氏衝擊強度[J/m](1 w後) | 56.4 | 93.0 | 61.6 | 57.6 | 37.7 | 69.8 | 58.1 | 23.5 | 31.2 | |||
艾氏衝擊強度[J/m](3 w後) | 52.2 | 86.0 | 51.9 | 73.7 | 29.0 | 59.1 | 52.9 | 28.0 | 19.5 | |||
艾氏衝擊強度經時變化率(%) | -7 | -8 | -16 | 28 | -23 | -15 | -9 | 19 | -38 |
[表2]
實施例10 | 實施例11 | 實施例12 | 實施例13 | 實施例14 | 實施例15 | 實施例16 | 實施例17 | 實施例18 | ||||
(甲基)丙烯醯基含量[mmol/g] | 硬化性樹脂組成物 | (10) | (11) | (12) | (13) | (14) | (15) | (16) | (17) | (18) | ||
胺酯(甲基)丙烯酸酯(A) | A1 | 1.14 | 組成 (質量份) | |||||||||
A2 | 1.31 | 15 | 40 | 30 | 30 | 30 | 30 | 30 | 40 | |||
A3 | 1.86 | 40 | ||||||||||
A4 | 1.33 | |||||||||||
A5 | 1.26 | |||||||||||
A6 | 1.23 | |||||||||||
A7 | 1.245 | |||||||||||
A8 | 2.4 | |||||||||||
A9 | 0.73 | |||||||||||
A10 | 0.69 | |||||||||||
單官能(甲基)丙烯酸系化合物(B1) | ACMO | 30 | 30 | 30 | 30 | |||||||
NIPAM | 30 | |||||||||||
FA-513AS | 30 | |||||||||||
DMAA | 30 | |||||||||||
IBXA | 50 | |||||||||||
TBCHA | 30 | |||||||||||
2官能(甲基)丙烯酸系化合物(B2) | MIRAMER M210 | 30 | 30 | |||||||||
MIRAMER M262 | 55 | 40 | 40 | 40 | 40 | 30 | ||||||
MIRAMER M222 | 20 | |||||||||||
MIRAMER M240 | ||||||||||||
光聚合起始劑 | Omnirad TPO | 2 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | ||
合計 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | |||
評價結果 | 黏度[mPa·s] | 150 | 298 | 423 | 905 | 632 | 610 | 151 | 598 | 501 | ||
彈性模數[×10 9Pa] | 2.653 | 1.095 | 1.989 | 1.506 | 1.481 | 1.288 | 1.492 | 1.035 | 1.516 | |||
艾氏衝擊強度[J/m](1 w後) | 46.2 | 90.4 | 64.3 | 58.0 | 49.0 | 62.0 | 51.0 | 55.0 | 54.3 | |||
艾氏衝擊強度[J/m](3 w後) | 30.8 | 82.3 | 41.5 | 53.6 | 38.6 | 65.0 | 50.4 | 49.0 | 61.4 | |||
艾氏衝擊強度經時變化率(%) | -33 | -9 | -35 | -8 | -21 | 5 | -1 | -11 | 13 |
[表3]
實施例19 | 實施例20 | 實施例21 | 實施例22 | 實施例23 | 比較例1 | 比較例2 | 比較例3 | ||||
(甲基)丙烯醯基含量[mmol/g] | 硬化性樹脂組成物 | (19) | (20) | (21) | (22) | (23) | (C1) | (C2) | (C3) | ||
胺酯(甲基)丙烯酸酯(A) | A1 | 1.14 | 組成 (質量份) | ||||||||
A2 | 1.31 | 40 | 40 | 50 | 60 | ||||||
A3 | 1.86 | 50 | |||||||||
A4 | 1.33 | ||||||||||
A5 | 1.26 | ||||||||||
A6 | 1.23 | ||||||||||
A7 | 1.245 | ||||||||||
A8 | 2.4 | 30 | |||||||||
A9 | 0.73 | 30 | |||||||||
A10 | 0.69 | 15 | |||||||||
單官能(甲基)丙烯酸系化合物(B1) | ACMO | 30 | 30 | 30 | 30 | 20 | 70 | 30 | 30 | ||
NIPAM | |||||||||||
FA-513AS | |||||||||||
DMAA | |||||||||||
IBXA | |||||||||||
TBCHA | |||||||||||
2官能(甲基)丙烯酸系化合物(B2) | MIRAMER M210 | 20 | 10 | 30 | 40 | ||||||
MIRAMER M262 | 55 | ||||||||||
MIRAMER M222 | 30 | ||||||||||
MIRAMER M240 | 30 | ||||||||||
光聚合起始劑 | Omnirad TPO | 2 | 2 | 2 | 2 | 2 | 2 | 2 | 2 | ||
合計 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | 102 | |||
評價結果 | 黏度[mPa·s] | 224 | 868 | 582 | 1098 | 847 | 70 | 220 | 145 | ||
彈性模數 [×10 9Pa] | 0.843 | 0.723 | 0.875 | 0.504 | 1.455 | 1.105 | 1.131 | 0.994 | |||
艾氏衝擊強度[J/m](1 w後) | 75.2 | 88.0 | 150.1 | 220.0 | 51.7 | 53.9 | 11.1 | 22.0 | |||
艾氏衝擊強度[J/m](3 w後) | 70.2 | 76.0 | 139.0 | 195.0 | 48.6 | 25.3 | 8.5 | 15.0 | |||
艾氏衝擊強度經時變化率(%) | -7 | -14 | -7 | -11 | -6 | -53 | -23 | -32 |
就造形性、對造形機之負荷之觀點而言,硬化性樹脂組成物之黏度為1,100 mPa·s以下,較佳為1,000 mPa·s以下。又,就硬度方面而言,造形物於拉伸試驗中之彈性模數需為0.5×10
9Pa以上,越高越好。就耐衝擊性之觀點而言,艾氏衝擊強度為18 J/m以上,較佳為20 J/m以上,更佳為30 J/m以上。進而,考慮長期使用,艾氏衝擊強度經時變化率未達50%,越小越好。
根據上述表之結果,可確認到本發明之硬化性樹脂組成物為低黏度。又,可確認到本發明之硬化性樹脂組成物能夠形成彈性模數優異之硬化物。進而可確認到,本發明之硬化性樹脂組成物能夠形成於艾氏衝擊強度試驗中衝擊強度較大,經時變化較少,且耐衝擊性優異之硬化物。本發明之硬化性樹脂組成物可有效地用於光造形。
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Claims (11)
- 一種光造形用硬化性樹脂組成物,其含有:具有(甲基)丙烯醯基之胺酯樹脂(A,urethane resin)、及光聚合起始劑,且 上述胺酯樹脂(A)中之(甲基)丙烯醯基之含量為0.8 mmоl/g以上且2.2 mmоl/g以下。
- 如請求項2之光造形用硬化性樹脂組成物,其中,於上述式(1)、(2)、(3)中,R 1、R 2、R 3分別為直鏈烷基。
- 如請求項1至4中任一項之光造形用硬化性樹脂組成物,其中,上述光造形用硬化性樹脂組成物含有單官能(甲基)丙烯酸系化合物(B1)及/或2官能(甲基)丙烯酸系化合物(B2), 上述光造形用硬化性樹脂組成物中之上述胺酯樹脂(A)之含量為1質量%以上且50質量%以下。
- 如請求項5之光造形用硬化性樹脂組成物,其中,上述單官能(甲基)丙烯酸系化合物(B1)之聚合物之玻璃轉移溫度為50℃以上。
- 如請求項5之光造形用硬化性樹脂組成物,其中,上述2官能(甲基)丙烯酸系化合物(B2)之聚合物之玻璃轉移溫度為40℃以上。
- 一種硬化物,其係請求項1至8中任一項之光造形用硬化性樹脂組成物之硬化反應物。
- 如請求項9之硬化物,其以活性能量線之照射作為硬化條件。
- 一種立體造形物,其由請求項9或10之硬化物構成。
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