TW202231126A - 在靶材供應系統中之壓力釋放設備及方法 - Google Patents

在靶材供應系統中之壓力釋放設備及方法 Download PDF

Info

Publication number
TW202231126A
TW202231126A TW110132757A TW110132757A TW202231126A TW 202231126 A TW202231126 A TW 202231126A TW 110132757 A TW110132757 A TW 110132757A TW 110132757 A TW110132757 A TW 110132757A TW 202231126 A TW202231126 A TW 202231126A
Authority
TW
Taiwan
Prior art keywords
target
pressure relief
cavity
supply system
relief device
Prior art date
Application number
TW110132757A
Other languages
English (en)
Chinese (zh)
Inventor
拉胡 桑尼爾 卡帕迪亞
奇拉格 雷吉言古魯
馬汀斯 漢德利克斯 安東尼斯 里恩德斯
史蒂芬 威廉 摳瓦克
喬治 歐雷格維齊 維斯晨庫
Original Assignee
荷蘭商Ａｓｍｌ荷蘭公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荷蘭商Ａｓｍｌ荷蘭公司 filed Critical 荷蘭商Ａｓｍｌ荷蘭公司
Publication of TW202231126A publication Critical patent/TW202231126A/zh

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
TW110132757A 2020-09-23 2021-09-03 在靶材供應系統中之壓力釋放設備及方法 TW202231126A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202063082234P 2020-09-23 2020-09-23
US63/082,234 2020-09-23

Publications (1)

Publication Number Publication Date
TW202231126A true TW202231126A (zh) 2022-08-01

Family

ID=77739053

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110132757A TW202231126A (zh) 2020-09-23 2021-09-03 在靶材供應系統中之壓力釋放設備及方法

Country Status (4)

Country Link
KR (1) KR20230071137A (fr)
CN (1) CN116235637A (fr)
TW (1) TW202231126A (fr)
WO (1) WO2022063509A2 (fr)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009020776B4 (de) * 2009-05-08 2011-07-28 XTREME technologies GmbH, 37077 Anordnung zur kontinuierlichen Erzeugung von flüssigem Zinn als Emittermaterial in EUV-Strahlungsquellen
FR2949840B1 (fr) * 2009-09-10 2012-03-30 Mahytec Reservoir, notamment pour gaz sous pression, et procede de fabrication
CN102791383B (zh) * 2010-01-06 2017-11-14 恩特格里斯公司 具有除气和感测能力的液体分配系统

Also Published As

Publication number Publication date
KR20230071137A (ko) 2023-05-23
WO2022063509A2 (fr) 2022-03-31
CN116235637A (zh) 2023-06-06
WO2022063509A3 (fr) 2022-05-05

Similar Documents

Publication Publication Date Title
Ku Operating characteristics of loop heat pipes
JP2022522760A (ja) Ｅｕｖ光源におけるターゲット材料制御
CN110430715B (zh) 控制电子设备冷却液出口温度的方法
KR20020028816A (ko) 낮은 열전도성의 열부하를 받는 본체에 대한 온도 보상 장치
US10303067B2 (en) Cooler for use in a device in a vacuum
CN104246407A (zh) 适于调节卫星的热源的温度的冷却装置和用于生产相关联的冷却装置和卫星的方法
TW202231126A (zh) 在靶材供應系統中之壓力釋放設備及方法
JP2008193014A (ja) Ｌｐｐ型ｅｕｖ光源装置用ターゲット物質供給装置及びシステム
EP3589101B1 (fr) Dispositifs de transfert de chaleur et procédés de refroidissement de sources de chaleur
JP2010123405A (ja) 極端紫外光源装置及びそのターゲット供給システム
Tang et al. Extrusion and thermal control design of an on-orbit 3D printing platform
JP4628122B2 (ja) 極端紫外光源装置用ノズル
JP2008027623A (ja) ターゲット物質供給装置
US5392844A (en) Quick connect coupling
CN116157607A (zh) 坚固的流体耦合装置
EP3974905A1 (fr) Pompe
TW202314999A (zh) 熱調節裝置及方法
EP4134747A1 (fr) Appareil et procédé de conditionnement
TW202403212A (zh) 靶材產生器中的冷凍閥
JP2012256608A (ja) ターゲット物質供給装置
JP6895538B2 (ja) 極端紫外光生成装置及び電子デバイスの製造方法
Ku et al. A prototype heat pipe heat exchanger for the capillary pumped loop flight experiment
WO2023088595A1 (fr) Appareil d'alimentation en matériau cible liquide, émetteur de combustible, source de rayonnement, appareil lithographique et procédé d'alimentation en matériau cible liquide
Narayanan et al. Recent Ground-based Test Results for the Closed Loop Two-Phase Flow Chilldown Test Module for Future Integration with the Flow Boiling and Condensation Experiment onboard International Space Station
WO2021121852A1 (fr) Réservoir de matériau cible pour source de lumière à ultraviolet extrême