TW202230410A - 電極結構材料及製備電極結構材料的方法、電解電容器 - Google Patents
電極結構材料及製備電極結構材料的方法、電解電容器 Download PDFInfo
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- TW202230410A TW202230410A TW110106696A TW110106696A TW202230410A TW 202230410 A TW202230410 A TW 202230410A TW 110106696 A TW110106696 A TW 110106696A TW 110106696 A TW110106696 A TW 110106696A TW 202230410 A TW202230410 A TW 202230410A
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- Prior art keywords
- metal
- electrode structure
- base material
- substrate
- fiber layer
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- 239000000463 material Substances 0.000 title claims abstract description 108
- 238000000034 method Methods 0.000 title claims abstract description 39
- 239000003990 capacitor Substances 0.000 title claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 title abstract 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 129
- 239000002184 metal Substances 0.000 claims abstract description 129
- 239000000835 fiber Substances 0.000 claims abstract description 123
- 239000002994 raw material Substances 0.000 claims abstract description 15
- 238000002844 melting Methods 0.000 claims abstract description 4
- 230000008018 melting Effects 0.000 claims abstract description 4
- 239000000758 substrate Substances 0.000 claims description 63
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 30
- 229910052782 aluminium Inorganic materials 0.000 claims description 27
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 229910052758 niobium Inorganic materials 0.000 claims description 9
- 239000010955 niobium Substances 0.000 claims description 9
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 9
- 229910052715 tantalum Inorganic materials 0.000 claims description 9
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 9
- 239000003792 electrolyte Substances 0.000 claims description 7
- 239000012530 fluid Substances 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 6
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 6
- 239000000155 melt Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052726 zirconium Inorganic materials 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 4
- 150000002739 metals Chemical class 0.000 claims description 2
- 239000011888 foil Substances 0.000 abstract description 40
- 238000005452 bending Methods 0.000 abstract description 15
- 239000000126 substance Substances 0.000 abstract description 11
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 51
- 238000005516 engineering process Methods 0.000 description 14
- 239000000843 powder Substances 0.000 description 14
- 239000007772 electrode material Substances 0.000 description 12
- 238000006056 electrooxidation reaction Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000003475 lamination Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000009286 beneficial effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007613 environmental effect Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000005499 meniscus Effects 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002121 nanofiber Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
- H01G9/045—Electrodes or formation of dielectric layers thereon characterised by the material based on aluminium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/145—Liquid electrolytic capacitors
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Powder Metallurgy (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010277250 | 2020-04-10 | ||
CN202010277250.5 | 2020-04-10 |
Publications (2)
Publication Number | Publication Date |
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TW202230410A true TW202230410A (zh) | 2022-08-01 |
TWI845820B TWI845820B (zh) | 2024-06-21 |
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TW110106696A TWI845820B (zh) | 2020-04-10 | 2021-02-25 | 電極結構材料及製備電極結構材料的方法、電解電容器 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7357656B2 (ja) |
CN (1) | CN113035572B (ja) |
TW (1) | TWI845820B (ja) |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4547835B2 (ja) * | 2001-06-21 | 2010-09-22 | パナソニック株式会社 | 固体電解コンデンサおよびその製造方法 |
JP2006004984A (ja) * | 2004-06-15 | 2006-01-05 | Shinko Electric Ind Co Ltd | 固体電解キャパシタ及びその製造方法 |
EP2009653A4 (en) * | 2006-03-31 | 2015-08-12 | Nippon Chemicon | ELECTRODE MATERIAL FOR AN ELECTROLYTIC CONDENSER |
JP2010232451A (ja) * | 2009-03-27 | 2010-10-14 | Hitachi Aic Inc | アルミニウム電解コンデンサ用の電極 |
JP5509715B2 (ja) * | 2009-08-05 | 2014-06-04 | セイコーエプソン株式会社 | リチウム電池用電極及びリチウム電池 |
GB2489493B (en) * | 2011-03-31 | 2013-03-13 | Norsk Titanium Components As | Method and arrangement for building metallic objects by solid freeform fabrication |
US20150201504A1 (en) * | 2014-01-15 | 2015-07-16 | Applied Nanotech, Inc. | Copper particle composition |
JP6528076B2 (ja) * | 2014-10-09 | 2019-06-12 | パナソニックIpマネジメント株式会社 | 電極箔とその製造方法および電解コンデンサ |
CN109689267B (zh) * | 2016-07-08 | 2022-02-25 | 挪威钛公司 | 用于由两个焊枪通过固体自由成形制造来构建金属物体的方法和设备 |
CN106702375B (zh) * | 2016-12-05 | 2019-01-01 | 天津工业大学 | 一种激光-感应复合熔化沉积纤维增强金属基复合材料的装置 |
CN107354498B (zh) * | 2017-07-18 | 2019-04-30 | 丰宾电子(深圳)有限公司 | 一种高压高容量的铝电解电容器用电极箔的制造方法 |
CN107732190B (zh) * | 2017-09-30 | 2020-08-11 | 山西沃特海默新材料科技股份有限公司 | 一种利用水雾化制备铜-铝-硅合金粉末的方法及其应用 |
JP2019186464A (ja) * | 2018-04-16 | 2019-10-24 | 株式会社ブイ・テクノロジー | 配線修正装置および配線修正方法 |
-
2021
- 2021-02-25 TW TW110106696A patent/TWI845820B/zh active
- 2021-03-05 CN CN202110245028.1A patent/CN113035572B/zh active Active
- 2021-04-09 JP JP2021066441A patent/JP7357656B2/ja active Active
Also Published As
Publication number | Publication date |
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CN113035572A (zh) | 2021-06-25 |
JP7357656B2 (ja) | 2023-10-06 |
CN113035572B (zh) | 2022-09-27 |
JP2021168384A (ja) | 2021-10-21 |
TWI845820B (zh) | 2024-06-21 |
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