TW202218199A - 壓電膜、觸控面板及壓電膜之製造方法 - Google Patents
壓電膜、觸控面板及壓電膜之製造方法 Download PDFInfo
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Abstract
本發明提供一種壓電膜,其可充分表現出壓電性與透明性兩者。一種壓電膜(10),其係重疊氟樹脂製透明壓電基材膜(1)與具有0.20至2.5 µm之厚度之透明塗佈層(2)而構成,且透明塗佈層(2)跨及與透明壓電基材膜(1)重疊之區域整體而與透明壓電基材膜(1)形成界面。
Description
本發明係關於一種壓電膜、觸控面板及壓電膜之製造方法。
壓電膜係根據壓力而產生電氣且根據構成亦可特定出被施加壓力之位置,因此可用於觸控面板之壓力感測器。
此種壓電膜中,已知有含有偏二氟乙烯-四氟乙烯共聚物之片狀透明壓電體層(例如參照專利文獻1)。
另外,已知上述壓電膜係藉由對將偏二氟乙烯樹脂作為主成分之樹脂膜進行延伸及極化處理而製造壓電膜。已知此時,藉由在上述樹脂膜與延伸輥相接觸之面重疊保護膜,而於利用延伸步驟對上述樹脂膜進行延伸時,保護樹脂膜免受因延伸輥之粗糙面與樹脂膜相接觸而產生之損傷(例如參照專利文獻2)。
另外,已知藉由將上述壓電膜設為於基材膜積層有具有壓電性之塗佈層之構成,而與壓電體層為單獨膜之習知壓電膜相比,改善了全光線透過率及霧度(例如參照專利文獻3)。
習知技術文獻
專利文獻
專利文獻1:日本專利特開2010-108490號公報
專利文獻2:日本專利特開2019-67908號公報
專利文獻3:日本專利特開2017-215960號公報
發明欲解決之課題
於觸控面板之類的用途中所使用之壓電膜較佳為具有高透明性,對於壓電膜要求有此種高透明性。另外,為了將壓電膜作為壓力感測器使用,除了高透明性以外,還要求可表現出充分之壓電特性。
本發明之一實施方式之目的在於提供一種壓電膜,其可表現出充分之壓電性與充分之透明性兩者。
解決問題之技術手段
為了解決上述課題,本發明之一實施方式之壓電膜係重疊氟樹脂製透明壓電基材膜與具有0.20至2.5 µm之厚度之透明塗佈層而構成,且前述透明塗佈層跨及與前述透明壓電基材膜重疊之區域整體而與前述透明壓電基材膜形成界面。
為了解決上述課題,本發明之一實施方式之觸控面板具有上述壓電膜。
為了解決上述課題,本發明之一實施方式之壓電膜之製造方法包括在氟樹脂製透明壓電基材膜之至少一面上形成具有0.20至2.5 µm之厚度之透明塗佈層的步驟,前述形成透明塗佈層之步驟包括:將前述透明塗佈層製作用塗料塗佈於前述透明壓電基材膜之至少一面的步驟;及使利用前述塗佈步驟所形成之塗膜固化的步驟。
發明效果
根據本發明之一實施方式,可提供能表現出充分之壓電性與充分之透明性兩者之壓電膜。
[構成]
本發明之一實施方式之透明壓電積層膜(以下,稱為「壓電膜」)係重疊透明壓電基材膜(以下,稱為「透明壓電基材膜」)與具有0.20至2.5 µm之厚度之透明塗佈層而構成。另外,本實施方式中,「至」表示包含兩端之數值之範圍。
[透明壓電基材膜]
本實施方式中之透明壓電基材膜為氟樹脂製。於本實施方式中,「氟樹脂製」係指於構成透明壓電基材膜之組合物中氟樹脂為主成分,「氟樹脂為主成分」係指於該組合物中氟樹脂為樹脂成分中最多之成分。該組合物中之氟樹脂之含量可為51質量%以上,可為80質量%以上,亦可為100質量%。
另外,「壓電基材膜」係指未被賦予透明塗佈層之具有壓電性之基材膜。另外,本實施方式中,「透明」係指讓與壓電膜之用途相應之所需比率以上的可見光透過之光學特性。
本實施方式中之氟樹脂可為能用於壓電膜之任意氟樹脂,可為一種亦可為一種以上。該氟樹脂之示例中包含偏二氟乙烯樹脂、四氟乙烯樹脂及該等之混合物。
偏二氟乙烯樹脂之示例中包含偏二氟乙烯之均聚物及其共聚物。偏二氟乙烯之共聚物中源自偏二氟乙烯以外之單體之結構單元的含量可於能表現出與壓電膜之用途相應之特性的範圍內適當決定。
偏二氟乙烯之共聚物中之偏二氟乙烯以外之單體的示例中,包含烴系單體及氟化合物。該烴系單體之示例中包含乙烯及丙烯。該氟化合物為偏二氟乙烯以外之氟化合物,且為具有聚合性結構之氟化合物。該氟化合物之示例中包含氟乙烯、三氟乙烯、三氟氯乙烯、四氟乙烯、六氟丙烯及氟烷基乙烯基醚。
四氟乙烯樹脂之示例中包含四氟乙烯之均聚物及其共聚物。構成該共聚物之結構單元之四氟乙烯以外之單體的示例中,包含乙烯、氟丙烯、氟烷基乙烯基醚、全氟烷基乙烯基醚及全氟二氧雜環戊烯。
本實施方式中之氟樹脂為共聚物時,該氟樹脂中之源自偏二氟乙烯之結構單元之含量可於獲得本實施方式之效果之範圍內適當決定,就該觀點而言,較佳為20質量%以上,更佳為40質量%以上,進一步較佳為60質量%以上。
本實施方式中之透明壓電基材膜可於獲得本實施方式之效果之範圍內含有各種添加劑。該添加劑可為一種亦可為一種以上,其示例中包含塑化劑、潤滑劑、交聯劑、紫外線吸收劑、pH值調整劑、穩定劑、抗氧化劑、界面活性劑及顏料。
本實施方式中之透明壓電基材膜之厚度可根據壓電膜之用途,自獲得本實施方式之效果之範圍內適當決定。透明壓電基材膜之厚度若過薄,則存在機械強度不足之情況,若過厚,則存在效果有限,或透明性不足而難以用於光學用途之情況。
就充分表現出壓電性及機械強度之觀點而言,透明壓電基材膜之厚度較佳為5 µm以上,更佳為20 µm以上,進一步較佳為30 µm以上。而且,就充分表現出透明性及壓電性之觀點而言,透明壓電基材膜之厚度較佳為100 µm以下,更佳為80 µm以下,進一步較佳為60 µm以下。
本實施方式中之透明壓電基材膜之壓電特性可根據壓電膜之用途,自獲得本實施方式之效果之範圍內適當決定。若壓電特性過低,則存在作為壓電材料之功能不足之情況。就表現出充分之壓電特性之觀點而言,例如壓電膜為觸控面板時,透明壓電基材膜之壓電特性以壓電常數d
33計較佳為8.0 pC/N以上,更佳為10.0 pC/N以上,進一步較佳為12.0 pC/N以上。該壓電特性之上限並無限定,於上述情形時,就充分獲得所需效果之觀點而言,透明壓電基材膜之壓電特性以壓電常數d
33計為30.0 pC/N以下即可。另外,本說明書中所規定之透明壓電基材膜之壓電常數d
33係指透明壓電基材膜之厚度方向之壓電常數d
33。
透明壓電基材膜之壓電常數d
33可藉由調整該膜中之氟樹脂之電偶極之朝向及取向而調整為上述範圍。電偶極之朝向及取向之調整可藉由調整透明壓電基材膜中之氟樹脂之結晶中之α晶與β晶的比率以及極化處理之程度來調整。結晶中之α晶與β晶之比率以及極化處理之程度分別可藉由調整氟樹脂膜之延伸以及輪詢之條件來調整。
本實施方式中之透明壓電基材膜可如實施例中所記載藉由氟樹脂片之延伸及極化處理而製造。於該製造時,就提高透明壓電基材膜之透明性之觀點而言,較佳為使之足夠薄為前述厚度。另外,於該製造中進行輥延伸時,就防止透明壓電基材膜之表面上之損傷,且提高透明壓電基材膜之透明性之觀點而言,較佳為使用經過鏡面加工之輥或使用保護膜(例如參照日本專利特開2019-67908號公報)。
[透明塗佈層]
本實施方式中之透明塗佈層只要為透明且於壓電膜中可充分表現出透明壓電基材膜之壓電特性之層即可。
透明塗佈層可僅配置於透明壓電基材膜之一表面側,亦可配置於兩面側。其中,就獲得更高霧度降低效果而言,透明塗佈層較佳為配置於透明壓電基材膜之兩面。將透明塗佈層形成於透明壓電基材膜之兩面時,兩透明塗佈層可具有相同組成、厚度及物性,亦可具有不同組成、厚度及物性。將透明塗佈層形成於透明壓電基材膜之兩面時,較佳為至少一透明塗佈層具有後述透明塗佈層之較佳構成,更佳為兩透明塗佈層均具有後述透明塗佈層之較佳構成。
透明塗佈層係跨及與透明壓電基材膜重疊之區域整體而與上述透明壓電基材膜形成界面。於厚度方向上透明塗佈層對於透明壓電基材膜之此種配置就降低透明壓電基材膜之霧度之觀點而言較佳。「形成界面」係指2個物體之間不隔著其他物體而直接接觸。即,透明塗佈層與透明壓電基材膜形成界面係指透明塗佈層與透明壓電基材膜直接接觸而之間不隔著例如空氣等其他物體的狀態。於透明壓電基材膜表面具有微細凹凸時係指透明塗佈層以追隨於透明壓電基材膜之表面形狀之方式與透明壓電基材膜相接觸的狀態。
本實施方式之壓電膜中,透明塗佈層係跨及與透明壓電基材膜重疊之區域整體而與透明塗佈層形成界面。「與透明壓電基材膜重疊之區域」為根據壓電膜之用途而需要透明壓電基材膜與透明塗佈層重合的區域即可。當然,透明塗佈層與透明壓電基材膜亦可於整個平面方向上完全重合。
於壓電膜之厚度方向上透明塗佈層與透明壓電基材膜形成界面之形態例如可為透明壓電基材膜之表面由透明塗佈層塗覆之形態。
若本實施方式中之透明塗佈層過薄,則存在透明塗佈層無法充分覆蓋透明壓電基材膜之表面之微細凹凸形狀的情況,有無法充分獲得降低透明壓電基材膜之霧度之效果的情況。另外,若透明塗佈層過厚,則有壓電膜之壓電性不足之情況。因此,就降低透明壓電基材膜之霧度之觀點而言,透明塗佈層之厚度較佳為0.20 µm以上,更佳為0.35 µm以上,進一步較佳為0.50 µm以上。另外,就充分顯現透明壓電基材膜之壓電特性,而獲得可充分表現出透明壓電基材膜之壓電特性之壓電膜的觀點而言,透明塗佈層之厚度較佳為3.5 µm以下,更佳為2.5 µm以下,進一步較佳為1.5 µm以下。藉由使透明塗佈層之厚度在上述範圍內,壓電膜可同時實現與用途相應之充分之壓電性與透明性。
另外,本實施方式中,透明塗佈層之厚度係指一透明塗佈層之厚度。於透明塗佈層配置在透明壓電基材膜之兩面時,透明塗佈層之厚度只要為可充分顯現透明塗佈層對該壓電膜產生之影響的值即可。例如,可為兩透明塗佈層中更厚之一透明塗佈層之厚度,亦可為兩者厚度之平均值。另外,於兩面形成透明塗佈層時,各透明塗佈層只要獨立具有上述範圍之厚度即可,可具有實質上相同之厚度,亦可具有實質上不同之厚度。
就提高透明性之觀點而言,本實施方式中之透明塗佈層之表面較佳為平滑。透明塗佈層之表面係指透明塗佈層中之不與透明壓電基材膜相接之側的面。而且,於重疊有多層透明塗佈層時,透明塗佈層之表面係指最外層之透明塗佈層中之不與其他透明塗佈層相接之側的面。透明塗佈層配置於透明壓電基材膜之兩面時,較佳為兩透明塗佈層之表面均平滑。
就此種觀點而言,關於透明塗佈層之表面形狀,表面粗糙度之最大高度Rz較佳為0.15 µm以下,更佳為0.10 µm以下,進一步較佳為0.080 µm以下。該表面形狀可利用能測定出樹脂膜之表面形狀之公知技術進行測定,或者可利用能自積層膜之截面測定出特定層之表面形狀之公知技術進行測定。
透明塗佈層可為亦被稱為所謂硬塗層之用於防止損傷的透明表面保護層。透明塗佈層之材料可於透明且能充分表現透明壓電基材膜之壓電特性之範圍內,自可用於壓電膜之任意材料中選擇。該材料可為無機材料亦可為有機材料,可為一種亦可為一種以上。另外,該塗佈層之材料亦可為硬塗層之材料。該材料之示例中包含三聚氰胺樹脂、胺基甲酸酯樹脂、醇酸樹脂、丙烯酸樹脂及矽酮樹脂。即,透明塗佈層可為選自由三聚氰胺樹脂、胺基甲酸酯樹脂、醇酸樹脂、丙烯酸樹脂及矽酮樹脂所組成之群中之一種以上之樹脂製。在將透明塗佈層形成於透明壓電基材膜之兩面時,兩透明塗佈層可具有相同組成,亦可具有不同組成。
就充分之透明性、以及材料種類之豐富度及原料價格之低廉性之觀點而言,較佳為透明塗佈層之材料為丙烯酸樹脂,即透明塗佈層為丙烯酸樹脂製。另外,就防止形成透明塗佈層時透明壓電基材膜熱變形之觀點而言,亦較佳為丙烯酸樹脂為紫外線固化型樹脂。
丙烯酸樹脂係指以丙烯酸樹脂為主成分之樹脂組合物。丙烯酸樹脂可為(甲基)丙烯酸酯樹脂。另外,「(甲基)丙烯酸」為丙烯酸及甲基丙烯酸之統稱,且係指該等之其中一者或兩者。
(甲基)丙烯酸酯樹脂之示例中包含(甲基)丙烯酸酯單體之均聚物、及(甲基)丙烯酸酯單體與其他單體之共聚物。(甲基)丙烯酸酯單體之示例中包含單官能型(甲基)丙烯酸酯單體及多官能型(甲基)丙烯酸酯單體。其他單體之示例中包含胺基甲酸酯(甲基)丙烯酸酯單體、環氧(甲基)丙烯酸酯單體、及聚酯(甲基)丙烯酸酯。
另外,透明塗佈層中之材料之樹脂之說明中,「作為主成分」係指作為主成分之樹脂為樹脂成分中最多之成分。該組合物中作為主成分之樹脂之含量可為51質量%以上,可為80質量%以上,亦可為100質量%。
透明塗佈層可於表現出本實施方式之效果之範圍內具有各種功能。透明塗佈層之材料亦可進一步含有用於表現出任意功能之材料作為其他成分。此種材料可為一種亦可為一種以上,其示例中包含用於控制透明塗佈層之折射率之光學調整劑、抗靜電劑及抗結塊劑。光學調整劑之示例中包含中空二氧化矽系微粒子、矽烷偶合劑、氧化矽、氧化鋁、氧化鈦、氧化鋯、氧化鋅及氧化錫。抗靜電劑之示例中包含界面活性劑、五氧化銻、ITO(Indium Tin Oxide,氧化銦錫)及導電性高分子。在透明塗佈層形成於透明壓電基材膜之兩面時,該其他成分可僅含有於該等透明塗佈層之其中一者中,亦可含有於兩者中。
抗結塊劑於本實施方式中就防止壓電膜之結塊之觀點而言較佳。該抗結塊劑可自能充分表現透明塗佈層之透明性之範圍內適當選擇。例如,抗結塊劑之折射率較佳為與成為透明塗佈層之材料之樹脂的折射率之差小。抗結塊劑之示例中包含凝聚二氧化矽、球狀二氧化矽、聚甲基丙烯酸甲酯(PMMA)珠、矽酮珠等無機或有機微粒子。其中,球狀二氧化矽除了有抗結塊性及透明性以外還價格低,因此作為透明塗佈層用抗結塊劑尤佳。就防止壓電膜結塊之觀點而言,在透明塗佈層形成於透明壓電基材膜之兩面時,抗結塊劑含有於該等透明塗佈層之其中一者中即可,但亦可含有於兩者中。
[其他層構成]
本實施方式之壓電膜亦可於表現出本實施方式之效果之範圍內進一步具有前述以外之其他構成。此種其他構成可為一種亦可為一種以上,其示例中包含用於將壓電膜貼合於覆蓋玻璃或透明電極之透明黏著劑層、與透明黏著劑層抵接且可剝離之脫模層、光學調整層(折射率匹配層)及導電層。該光學調整層可於表現出所需性能之範圍內使用上述透明塗佈層之材料而形成。
另外,構成壓電膜之各層之厚度可藉由將壓電膜包埋於環氧樹脂中,以壓電膜之截面露出之方式將環氧樹脂塊切斷,利用掃描式電子顯微鏡觀察該截面而測定。該層之厚度只要為該層之厚度之代表值即可,可為任意之多個測定值之平均值,亦可為該測定值之最大值,亦可為該測定值之最小值。
[物性]
就實現充分透光性之觀點而言,本實施方式之壓電膜較佳為足夠透明。例如,壓電膜之全光線透過率可根據該壓電膜之用途而適當決定。於觸控面板之壓力感測器之用途時,壓電膜之全光線透過率較佳為80%以上,就應用於觸控面板中配置在比顯示器更靠表面側之壓力感測器的觀點而言,更佳為83%以上。該全光線透過率之上限並無限定,於上述情形時,就充分獲得所需效果之觀點而言,全光線透過率為97%以下即可。全光線透過率係用於透明體之指標之參數,可以說全光線透過率越接近100%越透明。全光線透過率例如可使用霧度計,基於JIS K7361-1中記載之公知方法進行測定。
另外,壓電膜之霧度值亦與全光線透過率同樣地可根據該壓電膜之用途而適當決定。於觸控面板之壓力感測器之用途時,壓電膜之霧度值較佳為2.0%以下,就應用於觸控面板中配置在比顯示器更靠表面側之壓力感測器的觀點而言,更佳為1.0%以下。該霧度值之下限並無限定,於上述情形時,就充分獲得所需效果之觀點而言,霧度值為0.1%以上即可。霧度為渾濁之程度,因此壓電膜之霧度值表示壓電膜本身之透明程度。隨著渾濁情況增加,霧度值變高,霧度值為0時判斷為完全透明體。霧度值例如可使用霧度計,基於JIS K7136中記載之公知方法進行測定。另外,只要可得到壓電膜之所需全光線透過率及霧度值,則透明壓電基材膜之全光線透過率及霧度值並無特別限制。
關於本實施方式之壓電膜,就充分表現透明壓電基材膜之壓電特性之觀點而言,例如於觸控面板之壓力感測器之用途時,壓電膜之壓電常數d
33較佳為8.0 pC/N以上,就應用於觸控面板中配置在比顯示器更靠表面側之壓力感測器的觀點而言,更佳為10.0 pC/N以上,進一步較佳為12.0 pC/N以上。該壓電常數d
33之上限並無限定,於上述情形時,就充分獲得所需效果之觀點而言,壓電膜之壓電特性以壓電常數d
33計為30.0 pC/N以下即可。另外,本說明書中所規定之壓電膜之壓電常數d
33係指壓電膜之厚度方向之壓電常數d
33。
壓電常數d
33可利用如後述實施例中記載之公知技術進行測定。壓電膜之壓電特性可藉由壓電膜中之透明塗佈層之厚度、或者具有所需壓電性之透明壓電基材膜之使用而調整。藉由將壓電膜中之透明塗佈層之厚度設為前述範圍,可將因賦予透明塗佈層導致的透明壓電基材膜之壓電常數d
33之下降程度抑制得低。因此,藉由使用壓電特性以壓電常數d
33計為8.0 pC/N以上且30.0 pC/N以下之範圍之透明壓電基材膜,可使壓電膜之壓電常數d
33成為前述範圍。
[製法]
本實施方式之壓電膜除了使用前述膜且形成前述層以外,可與公知之壓電膜同樣地製造。
本實施方式中之透明塗佈層可藉由將用於形成透明塗佈層之塗料塗佈於透明壓電基材膜之至少一面的步驟、及使利用該塗佈步驟所形成之塗膜固化之步驟而製造。該塗佈塗料之步驟可採用公知之塗佈方法來實施。塗佈方法之示例中包含噴塗、輥塗、模嘴塗佈、氣刀塗佈、刮刀塗佈、旋塗、逆向塗佈、凹版塗佈及蒸鍍。該塗膜之厚度可藉由塗佈次數或塗料之黏度來適當調整。
固化步驟可採用使上述塗料之塗膜固化之公知方法來實施。固化方法之示例中包含乾燥、加熱或利用基於光照射之聚合之固化。其中,就適於在物體表面進行加工之觀點及防止各層熱變形之觀點而言,較佳為利用基於紫外線(UV)照射等光照射之聚合之固化。例如,透明塗佈層可藉由塗佈上述塗料後,利用加熱去除塗料中之溶劑,然後利用UV照射使塗膜固化而形成。於藉由UV照射形成透明塗佈層時,就防止氧妨礙固化之觀點而言,該UV照射較佳為於惰性環境下進行。
透明塗佈層用上述塗料可含有聚合物,亦可含有單體,亦可含有該等兩者。另外,上述塗料中,可讓聚合物含有會引起固化之交聯結構,亦可進一步含有具有多個交聯結構之低分子化合物。此外,該塗料可視需要適當含有用於讓該聚合反應發生之聚合起始劑等用於固化之添加劑。
以下,使用圖對本發明之實施方式進行說明。如圖1所示,本發明之一實施方式之壓電膜10係直接重疊透明壓電基材膜1與透明塗佈層2而構成。
透明壓電基材膜1如上所述為氟樹脂製,例如可為藉由氟樹脂材料之延伸與極化處理而獲得之膜。透明塗佈層2例如為前述丙烯酸樹脂製,且直接重疊於透明壓電基材膜1之其中一表面上。
另外,如圖2所示,本發明之另一實施方式之壓電膜20係直接重疊透明壓電基材膜1與透明塗佈層2而構成。壓電膜20中,透明塗佈層2配置於透明壓電基材膜1之兩面側。即,於透明壓電基材膜1之其中一表面上重疊有透明塗佈層2a,於透明壓電基材膜1之另一表面上重疊有透明塗佈層2b。
[觸控面板]
本發明之一實施方式之觸控面板具有前述本實施方式之壓電膜。該觸控面板中之壓電膜之位置及個數可根據觸控面板之用途或所需功能而適當決定。圖3係示意性表示本發明之實施方式之觸控面板中之層構成之一例的圖。
如圖3所示,觸控面板100具有由透明電極4b與覆蓋玻璃5夾著圖2所示之壓電膜20而成的構成。此外,於壓電膜20與覆蓋玻璃5之間,自壓電膜20朝向覆蓋玻璃5依序重疊配置有透明黏著劑層3a、透明基板6a、透明電極4a、透明黏著劑層3c、透明基板6c、透明電極4c、透明黏著劑層3d。而且,於壓電膜20與透明電極4b之間,自壓電膜20朝向透明電極4b配置有透明黏著劑層3b、透明基板6b。如上所述,觸控面板100係將透明電極4b、壓電膜20及覆蓋玻璃5依序重疊而構成。於實際使用觸控面板100時,可於顯示器30之表面重疊配置觸控面板100之透明電極4b側之表面,但並不限定於此。
壓電膜20與覆蓋玻璃5隔著透明黏著劑層3c、3d、透明電極4a、4c以及透明基板6a、6c而由透明黏著劑層3a黏接,壓電膜20與透明電極4b隔著透明基板6b而由透明黏著劑層3b黏接。另外,可於透明電極4b之積層方向上之壓電膜20之相反側,配置有機EL(Electroluminescence,電致發光)顯示面板或液晶顯示面板等顯示面板,即顯示器30。顯示器30可採用以往公知之顯示面板,因此本說明書中省略其詳細構成之說明。
透明電極4a、4b、4c可分別形成於透明基板6a、6b、6c上,與透明基板6a、6b、6c一起黏接於觸控面板100中之所需層,亦可直接形成於積層方向上透明電極4a、4b、4c所要鄰接之其他層之表面,由透明黏著劑層3a、3b、3c或3d黏接。
透明電極4a、4b、4c可採用能用於觸控面板之公知之透明電極。更詳細而言,透明電極4a、4b、4c只要為實質上透明之面狀電極即可,可為具有圖案之導電性薄膜,亦可為極細之導電性線材所形成之平面結構。構成透明電極4a、4b、4c之材料並無限定,適宜使用選自由In、Sn、Zn、Ga、Sb、Ti、Si、Zr、Mg、Al、Au、Ag、Cu、Pd、W所組成之群中之至少一種金屬之金屬氧化物。該金屬氧化物中亦可視需要進一步含有上述群中所示之金屬原子。該金屬氧化物較佳為使用銦-錫複合氧化物(ITO)、銻-錫複合氧化物(ATO)等,尤佳為使用ITO。透明電極4a、4b、4c之其他代表性材料之示例中,包含銀奈米線、銀網格、銅網格、石墨烯及奈米碳管。透明基板6a、6b、6c可採用能作為支持上述透明電極4a、4b、4c之基底使用的公知的透明膜。構成透明基板6a、6b、6c之材料並無限定,適宜使用聚對苯二甲酸乙二酯(PET)、聚碳酸酯(PC)、環烯烴聚合物(COP)。
覆蓋玻璃5為觸控面板之覆蓋玻璃。只要為觸控面板用片狀透光部件即可,可為如覆蓋玻璃5之類的玻璃板,亦可為透明樹脂片。
本發明之實施方式之觸控面板亦可於獲得本實施方式之效果之範圍內進一步包含其他構成。
另外,本發明之實施方式之觸控面板只要於積層結構中包含前述本發明之實施方式之壓電膜即可。該觸控面板中之該壓電膜於積層方向上之位置可於獲得本發明之實施方式之效果之範圍內適當決定。
另外,本發明之實施方式之觸控面板亦可具有如下構成:在GFF(Glass-Film-Film,玻璃雙薄膜)型或GF2(Glass/DITO Film,單片雙層ITO薄膜)型等習知觸控面板中之積層結構中,適當追加本實施方式之壓電膜。此時,於本實施方式之壓電膜上,可直接積層用於檢測壓力之透明電極層及用於檢測位置之位置感測器,亦可經由黏著劑層來黏接。具有此種構成之觸控面板可於習知觸控面板之功能上進一步表現出由壓電膜所產生之功能,例如可構成透明之積層結構中包含位置感測器與壓力感測器兩者之觸控面板。
另外,本實施方式之觸控面板之製造中,透明黏著劑層不僅可形成於透明塗佈層上,亦可形成於要經由透明黏著劑層而與透明塗佈層黏接之其他層上。此時,透明黏著劑層可位於透明塗佈層側,亦可不在此側。
[作用效果]
如上所述,本發明之實施方式之壓電膜可由氟樹脂製透明壓電基材膜及透明塗佈層構成。具有如上述之構成之壓電膜除了可表現出基於透明壓電基材膜之充分之壓電特性以外,亦可藉由降低透明壓電基材膜之霧度而表現出更高之透明性。
關於透明性,藉由在透明壓電基材膜設置透明塗佈層,而獲得壓電膜之霧度之降低效果,其結果,壓電膜之透明性提高。認為讓透明壓電基材膜之透明性下降之一個原因在於,透明壓電基材膜之表面存在損傷等微細凹凸形狀。認為藉由利用透明塗佈層填埋該微細凹凸形狀,可抑制該凹凸形狀所引起之光散射,而產生壓電膜之霧度之降低效果。
如上所述,該壓電膜可表現出充分之壓電特性與更高之透明性,且因僅由樹脂等有機層構成,所以可使具有此種充分壓電特性及透明性之壓力感測器整體之層厚度進一步變薄。因此,該壓電膜可作為壓力感測器配置於較前述顯示面板更靠表面(圖像顯示面)側。藉此,可較以往簡化觸控面板之層構成,或者使觸控面板整體之層厚度變薄,而且可提高觸控面板中之壓電膜之配置數及配置部位之自由度。
[總結]
根據以上說明可知,本發明之實施方式之壓電膜係重疊氟樹脂製透明壓電基材膜與具有0.20至2.5 µm之厚度之透明塗佈層而構成,且前述透明塗佈層跨及與前述透明壓電基材膜重疊之區域整體而與前述透明壓電基材膜形成界面。另外,本發明之實施方式之觸控面板具有該壓電膜。因此,該壓電膜可同時實現充分之壓電性與充分之透明性。
本發明之實施方式中,壓電膜之全光線透過率為0%以上時,可以說該壓電膜作為觸控面板之壓力感測器之用途具有充分之透明性,因此較佳。
另外,本發明之實施方式中,壓電常數d
33為8.0至30.0 pC/N時,可以說該壓電膜作為觸控面板之壓力感測器之用途具有充分之壓電特性,因此較佳。
本發明之實施方式中,壓電膜之全光線透過率為80%以上時,可以說該壓電膜作為觸控面板之壓力感測器之用途具有充分之透明性,因此較佳。
本發明之實施方式中,就降低透明壓電基材膜之霧度,實現壓電膜之充分之透明性的觀點而言,更有效的是透明塗佈層之表面之表面粗糙度之最大高度Rz為0.10 µm以下。
本發明之實施方式中,就實現同時表現出透明壓電基材膜之充分之壓電性與充分之透明性兩者的觀點而言,更有效的是透明壓電基材膜之厚度為20至100 µm。
本發明之實施方式中,就降低透明壓電基材膜之霧度,實現壓電膜之充分之透明性的觀點而言,更有效的是於透明壓電基材膜之兩面積層有前述透明塗佈層。
本發明之實施方式之壓電膜之製造方法包括在氟樹脂製透明壓電基材膜之至少一面上形成具有0.20至2.5 µm之厚度之透明塗佈層的步驟,形成透明塗佈層之步驟包括將透明塗佈層製作用塗料塗佈於透明壓電基材膜之至少一面的步驟、及使利用塗佈步驟所形成之塗膜固化的步驟。因此,可製造能表現出充分之壓電性與充分之透明性兩者之壓電膜。
本發明並不限定於上述各實施方式,可於申請專利範圍所示之範圍內進行各種變更。適當組合不同實施方式中分別公示之技術性手段後獲得之實施方式亦包含於本發明之技術性範圍內。
實施例
[實施例1]
使固有黏度為1.1 dl/g之由聚偏二氟乙烯(KUREHA股份有限公司製造)成形之樹脂膜(厚度為140 µm)通過表面溫度加熱為110℃之預熱輥。然後,使通過預熱輥後之膜通過表面溫度加熱為120℃之延伸輥,以延伸倍率成為4.2倍之方式進行延伸。延伸後,使膜通過極化輥而進行極化處理,獲得具有壓電性之膜。直流電壓自0 kV增加至11.8 kV。將極化處理後之膜進而於130℃熱處理1分鐘,藉此獲得厚度為40 µm之透明壓電基材膜。
利用棒式塗佈機,於透明壓電基材膜之單面塗佈硬塗劑(「BS CH271」,荒川化學工業股份有限公司製造),於80℃乾燥2分鐘。以下,將硬塗劑「BS CH271」稱為「HC劑(1)」。
接著,使用UV照射裝置CSOT-40(GS Yuasa股份有限公司製造),以400 mJ/cm
2之累計光量對硬塗劑乾燥而成之塗膜照射UV。如此,獲得單面包含具有後述表中所記載之厚度之透明塗佈層A的的壓電膜。藉由對透明壓電基材膜之相反側之面進行同樣之操作,而形成具有後述表中所記載之厚度之透明塗佈層B,從而獲得透明壓電基材膜之兩面具有透明塗佈層之壓電膜。
[實施例2至4]
除了以具有後述表中所記載之厚度之方式形成透明塗佈層以外,以與實施例1同樣之方式分別獲得透明塗佈層之厚度不同之壓電膜。
[實施例5]
除了將聚偏二氟乙烯樹脂膜之極化處理中之直流電壓變更為12.0 kV,將硬塗劑變更為「TYAB-M101」(Toyochem股份有限公司製造),以及以具有後述表中所記載之厚度之方式形成透明塗佈層以外,以與實施例1同樣之方式獲得壓電膜。以下,將硬塗劑「TYAB-M101」稱為「HC劑(2)」。
[實施例6]
除了以具有後述表中所記載之厚度之方式僅於單面形成透明塗佈層以外,以與實施例5同樣之方式獲得透明塗佈層之厚度不同之壓電膜。
[實施例7]
除了將透明塗佈層B用硬塗劑變更為「BS-575CB」(荒川化學工業股份有限公司製造),以及以具有後述表中所記載之厚度之方式形成透明塗佈層以外,以與實施例1同樣之方式獲得壓電膜。以下,將硬塗劑「BS-575CB」稱為「HC劑(3)」。
[實施例8]
除了以具有後述表中所記載之厚度之方式形成透明塗佈層以外,以與實施例7同樣之方式獲得透明塗佈層之厚度不同之壓電膜。
[實施例9]
除了將聚偏二氟乙烯樹脂膜之極化處理中之直流電壓變更為11.0 kV,以及以具有後述表中所記載之厚度之方式形成透明塗佈層以外,以與實施例1同樣之方式獲得壓電膜。
<比較例1>
將實施例1中獲得之透明壓電基材膜作為比較例之壓電膜。
<比較例2>
除了以具有後述表中所記載之厚度之方式形成透明塗佈層以外,以與實施例9同樣之方式獲得比較例之壓電膜。
<比較例3>
除了以具有後述表中所記載之厚度之方式形成透明塗佈層以外,以與實施例5同樣之方式獲得比較例之壓電膜。
[評估]
[透明塗佈層之厚度]
將前述實施例以及比較例2及3之壓電膜分別包埋於環氧樹脂中,且以壓電膜之截面露出之方式將環氧樹脂塊切斷。使用掃描式電子顯微鏡(「SU3800」,日立高新技術股份有限公司製造),於加速電壓3.0 kV、倍率50,000倍之條件下對露出之壓電膜之截面進行觀察,而測定壓電膜中之透明塗佈層之厚度。
另外,於透明塗佈層之厚度之測定中,測定該透明塗佈層中2處之厚度,將其平均值作為透明塗佈層之厚度。另外,於上述觀察條件下,觀察到透明塗佈層之界面為大致平滑的線,於透明塗佈層之厚度之測定中係測定該線間之距離。
[全光線透過率]
使用霧度計(「NDH7700SP II」,日本電色工業股份有限公司製造),基於JIS K7361-1中記載之方法測定實施例及比較例之壓電膜各自之全光線透過率。全光線透過率為80%以上時,可判斷於觸控面板之用途中無實用上之問題。
[霧度值]
使用霧度計(「NDH7700SP II」,日本電色工業股份有限公司製造),基於JIS K7136中記載之方法測定實施例及比較例之壓電膜各自之霧度值。霧度值為2.0%以下時,可判斷於觸控面板之用途中無實用上之問題。
[L
*值、a
*值、b
*值]
使用分光色彩計(「SE7700」,日本電色工業股份有限公司製造),利用依據JIS K8722之方法測定實施例及比較例之壓電膜各自於L
*a
*b
*表色系中之L
*值、a
*值及b
*值。L
*值為85以上時,可判斷於觸控面板之用途中無實用上之問題。a
*值為3以下時,可判斷於觸控面板之用途中無實用上之問題。b
*值為4以下時,可判斷於觸控面板之用途中無實用上之問題。
[壓電常數d
33值]
關於實施例及比較例之壓電膜各自之壓電常數d
33,使用壓電常數測定裝置(「PiezoMeter System PM300」,PIEZOTEST公司製造),以0.2 N夾住樣品,讀取施加0.15 N、110 Hz之力時之產生電荷。壓電常數d
33之實測值根據測定之膜之正反面不同而成為正值或負值,而本說明書中記載絕對值。壓電常數d
33值為8.0 pC/N以上時,可判斷於觸控面板之用途中無實用上之問題。
[表面粗糙度Ra]
使用表面粗糙度測定器(「SURFCOM1500」,東京精密股份有限公司製造),利用依據JIS B 0601-2013之方法測定實施例及比較例之壓電膜各自之透明塗佈層之表面之算術平均粗糙度(表面粗糙度)Ra。另外,於一透明塗佈層之任意10處,沿壓電膜之寬度方向(TD方向)測定算術平均粗糙度(表面粗糙度)Ra,求出測定值之平均值,將其作為該透明塗佈層之Ra。另外,比較例1中,測定透明壓電基材膜之表面之Ra。另外,實施例7及8中,測定由HC劑(3)形成之透明塗佈層之Ra。
[最大高度Rz]
與表面粗糙度Ra同樣地使用表面粗糙度測定器(「SURFCOM1500」,東京精密股份有限公司製造),利用依據JIS B 0601-2013之方法測定實施例及比較例之壓電膜各自之透明塗佈層之表面之最大高度Rz。最大高度Rz亦與算術平均粗糙度(表面粗糙度)Ra同樣地,於一透明塗佈層之任意10處,沿壓電膜之寬度方向(TD方向)測定最大高度Rz,求出測定值之平均值,將其作為該透明塗佈層之Rz。另外,比較例1中,測定透明壓電基材膜之表面之Rz。另外,實施例7及8中,測定由HC劑(3)形成之透明塗佈層之Rz。
[表1]
透明壓電基材膜 | 透明塗佈層A | 透明塗佈層B | 光學特性 | 壓電常數 | 表面粗糙度 | ||||||||
厚度 (µm) | 厚度 (µm) | 種類 | 厚度 (µm) | 種類 | 全光線透過率 (%) | 霧度 (%) | L *(-) | a *(-) | b *(-) | d 33(pC/N) | R a(µm) | R z(µm) | |
實施例1 | 40 | 0.42 | HC劑(1) | 0.40 | HC劑(1) | 91.7 | 0.6 | 96.6 | 0.3 | 0.2 | 17.0 | 0.013 | 0.080 |
實施例2 | 40 | 0.65 | HC劑(1) | 0.65 | HC劑(1) | 91.7 | 0.5 | 96.7 | 0.1 | 0.3 | 16.5 | 0.009 | 0.057 |
實施例3 | 40 | 0.97 | HC劑(1) | 0.92 | HC劑(1) | 91.9 | 0.5 | 96.8 | -0.1 | 0.4 | 16.4 | 0.008 | 0.053 |
實施例4 | 40 | 1.9 | HC劑(1) | 2.1 | HC劑(1) | 91.8 | 0.5 | 96.8 | 0.0 | 0.5 | 14.6 | 0.008 | 0.054 |
實施例5 | 40 | 1.1 | HC劑(2) | 1.0 | HC劑(2) | 91.5 | 0.7 | 96.5 | 0.0 | 0.5 | 18.6 | 0.009 | 0.053 |
實施例6 | 40 | 1.0 | HC劑(2) | - | - | 92.6 | 1.7 | 96.5 | 0.1 | 0.7 | 20.8 | 0.009 | 0.053 |
實施例7 | 40 | 0.40 | HC劑(1) | 0.41 | HC劑(3) | 91.9 | 0.3 | 96.8 | 0.2 | 0.5 | 14.2 | 0.005 | 0.036 |
實施例8 | 40 | 0.40 | HC劑(1) | 2.0 | HC劑(3) | 91.5 | 0.3 | 96.6 | 0.3 | 0.2 | 12.8 | 0.005 | 0.036 |
實施例9 | 40 | 1.0 | HC劑(1) | 1.1 | HC劑(1) | 91.9 | 0.4 | 96.7 | 0.2 | 0.2 | 9.2 | 0.008 | 0.054 |
[表2]
[考察]
透明壓電基材膜 | 透明塗佈層A | 透明塗佈層B | 光學特性 | 壓電常數 | 表面粗糙度 | ||||||||
厚度 (µm) | 厚度 (µm) | 種類 | 厚度 (µm) | 種類 | 全光線透過率 (%) | 霧度 (%) | L *(-) | a *(-) | b *(-) | d 33(pC/N) | R a(µm) | R z(µm) | |
比較例1 | 40 | - | - | - | - | 93.8 | 2.3 | 96.8 | 0.1 | 0.7 | 18.6 | 0.023 | 0.19 |
比較例2 | 40 | 3.2 | HC劑(1) | 3.1 | HC劑(1) | 91.5 | 0.5 | 96.7 | 0.2 | 0.5 | 5.9 | 0.008 | 0.054 |
比較例3 | 40 | 4.0 | HC劑(2) | 4.1 | HC劑(2) | 91.7 | 0.5 | 96.4 | 0.1 | 0.4 | 5.1 | 0.008 | 0.053 |
實施例1至9之壓電膜均具有充分之透明性與充分之壓電性兩者。關於透明性,認為其原因在於,形成於透明壓電基材膜之表面的凹凸由透明塗佈層填埋,且形成足夠平滑之表面,其結果,霧度進一步降低。另外,關於壓電性,認為其原因在於,透明塗佈層足夠薄,因此充分維持了透明壓電基材膜之厚度方向上之變形性。
相對於此,比較例1之壓電膜之霧度值較實施例1至9之壓電膜高,就透明性之觀點而言不充分。認為其原因在於,受到透明壓電基材膜之表面形狀所引起之光散射之影響。
另外,比較例2及3之壓電膜均與實施例1至9之壓電膜相比,就壓電性之觀點而言不充分。認為其原因在於,透明塗佈層過厚而進一步限制了透明壓電基材膜之厚度方向上之變形性。
產業上之可利用性
本發明可用於觸控面板。
1:透明壓電基材膜
2、2a、2b:透明塗佈層
3a、3b、3c、3d:透明黏著劑層
4a、4b、4c:透明電極
5:覆蓋玻璃
6a、6b、6c:透明基板
10、20:壓電膜
30:顯示器
100:觸控面板
[圖1]係示意性表示本發明之一實施方式之壓電膜之層構成的圖。
[圖2]係示意性表示本發明之另一實施方式之壓電膜之層構成的圖。
[圖3]係示意性表示本發明之一實施方式之觸控面板之層構成的圖。
1:透明壓電基材膜
2:透明塗佈層
10:壓電膜
Claims (9)
- 一種壓電膜,其係重疊氟樹脂製透明壓電基材膜與具有0.20至2.5 µm之厚度之透明塗佈層而構成, 前述透明塗佈層係跨及與前述透明壓電基材膜重疊之區域整體而與前述透明壓電基材膜形成界面。
- 如申請專利範圍第1項所述之壓電膜,其霧度為2.0%以下。
- 如申請專利範圍第1或2項所述之壓電膜,其壓電常數d 33為8.0至30.0 pC/N。
- 如申請專利範圍第1至3項中任一項所述之壓電膜,其全光線透過率為80%以上。
- 如申請專利範圍第1至4項中任一項所述之壓電膜,其中前述透明塗佈層之表面之表面粗糙度之最大高度Rz為0.10 µm以下。
- 如申請專利範圍第1至5項中任一項所述之壓電膜,其中前述透明壓電基材膜之厚度為20至100 µm。
- 如申請專利範圍第1至6項中任一項所述之壓電膜,其中於前述透明壓電基材膜之兩面積層有前述透明塗佈層。
- 一種觸控面板,其具有如申請專利範圍第1至7項中任一項所述之壓電膜。
- 一種壓電膜之製造方法,其包括在氟樹脂製透明壓電基材膜之至少一面上形成具有0.20至2.5 µm之厚度之透明塗佈層的步驟, 前述形成透明塗佈層之步驟包括: 將前述透明塗佈層製作用塗料塗佈於前述透明壓電基材膜之至少一面的步驟;及 使利用前述塗佈步驟所形成之塗膜固化的步驟。
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