TW202218033A - Chip-bonding device - Google Patents

Chip-bonding device Download PDF

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TW202218033A
TW202218033A TW111102128A TW111102128A TW202218033A TW 202218033 A TW202218033 A TW 202218033A TW 111102128 A TW111102128 A TW 111102128A TW 111102128 A TW111102128 A TW 111102128A TW 202218033 A TW202218033 A TW 202218033A
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die
bonding
light
wafer
pressing support
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TW111102128A
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Chinese (zh)
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TWI795176B (en
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石敦智
黃良印
語尚 林
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均華精密工業股份有限公司
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Abstract

The present invention provides a chip-bonding device that includes a plurality of die-bonding arms spaced apart from each other. Each of the die-bonding arms includes an abutting frame having a light-permeable portion, a force control unit connected to the abutting frame, and a light curing member that corresponds in position to the light-permeable portion. The abutting frame is configured to movably abut against a chip that is disposed on a carrier through an adhesive. When the abutting frame is abutted against the chip, the force control unit can drive the abutting frame to abut against the chip by a predetermined force so as to connect the chip and the carrier through the adhesive, and the light curing member can emit a curing light toward the chip by passing through the light-permeable portion so as to solidify the adhesive.

Description

固晶裝置Die bonding device

本發明涉及一種生產設備,尤其涉及能夠有效提升生產效率的一種生產設備及固晶裝置。The invention relates to a production equipment, in particular to a production equipment and a crystal bonding device which can effectively improve the production efficiency.

現有的生產設備包含有一預接合裝置及位於所述預接合裝置下游的一固晶裝置,並且現有生產設備的預接合裝置是用來在多個載體上逐一設置膠體與晶片,而現有生產設備的固晶裝置則是用來通過環境溫度加熱方式(如:烘烤)固化多個所述膠體。然而,現有生產設備的運作機制或生產效率顯然具有改善的空間存在。The existing production equipment includes a pre-bonding device and a die bonding device located downstream of the pre-bonding device, and the pre-bonding device of the existing production equipment is used to set the colloid and the wafer on a plurality of carriers one by one. The die-bonding device is used to solidify a plurality of the colloids by means of ambient temperature heating (eg, baking). However, there is obviously room for improvement in the operation mechanism or production efficiency of the existing production equipment.

於是,本發明人認為上述缺陷可改善,乃特潛心研究並配合科學原理的運用,終於提出一種設計合理且有效改善上述缺陷的本發明。Therefore, the inventor believes that the above-mentioned defects can be improved. Nate has devoted himself to research and application of scientific principles, and finally proposes an invention with reasonable design and effective improvement of the above-mentioned defects.

本發明實施例在於提供一種生產設備及固晶裝置,其能有效地改善現有生產設備所可能產生的缺陷。The embodiments of the present invention provide a production equipment and a die-bonding device, which can effectively improve the defects that may occur in the existing production equipment.

本發明實施例公開一種固晶裝置,其包括:多個固晶臂,間隔地排列設置,並且每個所述固晶臂包含有:一抵壓支架,包含有一透光部,並且所述抵壓支架用來可移動地壓迫於一晶片;其中,所述晶片通過一膠體而設置於一載體上;一力量控制單元,連接於所述抵壓支架;其中,當所述抵壓支架壓迫於所述晶片時,所述力量控制單元能驅使所述抵壓支架以一預定力量壓迫於所述晶片,以使所述晶片通過所述膠體而連接於所述載體;及一光固化器,對應於所述透光部設置;其中,當所述抵壓支架以所述預定力量壓迫於所述晶片時,所述光固化器用來發射能穿過所述透光部而投射於所述晶片的一固化光線,以固化所述膠體。An embodiment of the present invention discloses a die-bonding device, which includes a plurality of die-bonding arms arranged at intervals, and each of the die-bonding arms includes: a pressing support including a light-transmitting part, and the pressing The pressing bracket is used for movably pressing on a wafer; wherein, the wafer is arranged on a carrier through a colloid; a force control unit is connected to the pressing bracket; wherein, when the pressing bracket is pressed on the When the chip is used, the force control unit can drive the pressing support to press the chip with a predetermined force, so that the chip is connected to the carrier through the colloid; and a light curing device corresponding to The light-transmitting part is arranged on the light-transmitting part; wherein, when the pressing support is pressed against the wafer with the predetermined force, the light curing device is used to emit light that can pass through the light-transmitting part and project on the wafer. a curing light to cure the colloid.

本發明實施例也公開一種生產設備,其包括:一輸送裝置,定義有一預定路徑,並且所述輸送裝置能用來使設置有多個載體的一絕緣膜沿所述預定路徑移動;其中,所述預定路徑包含有一預接合區及位於所述預接合區下游的一固晶區;一預接合裝置,對應於所述預定路徑的所述預接合區設置、並包含有:一點膠機構,用來使得移動經過所述預接合區的每個所述載體上形成有一膠體;及一置晶機構,鄰設於所述點膠機構,並且所述置晶機構用來使得移動經過所述預接合區的每個所述膠體上設置有一晶片;以及一固晶裝置,對應於所述預定路徑的所述固晶區設置、並包含有間隔設置的多個固晶臂;其中,每個所述固晶臂包含有:一抵壓支架,包含有一透光部,並且所述抵壓支架可移動地壓迫於移動經過所述固晶區的一個所述晶片;一力量控制單元,連接於所述抵壓支架;其中,當所述抵壓支架壓迫於所述晶片時,所述力量控制單元能驅使所述抵壓支架以一預定力量壓迫於所述晶片,以使所述晶片通過所述膠體而連接於所述載體;及一光固化器,對應於所述透光部設置;其中,當所述抵壓支架壓迫於所述晶片時,所述光固化器用來發射能穿過所述透光部而投射於所述晶片的一固化光線,以固化所述膠體。The embodiment of the present invention also discloses a production equipment, which includes: a conveying device defining a predetermined path, and the conveying device can be used to move an insulating film provided with a plurality of carriers along the predetermined path; wherein, the The predetermined path includes a pre-bonding area and a die-bonding area located downstream of the pre-bonding area; a pre-bonding device is disposed corresponding to the pre-bonding area of the predetermined path, and includes: a dispensing mechanism, A colloid is formed on each of the carriers used to move through the pre-bonding area; and a crystal placement mechanism is adjacent to the dispensing mechanism, and the crystal placement mechanism is used to move through the pre-bonding area. A wafer is provided on each of the colloids in the bonding area; and a die-bonding device is provided corresponding to the die-bonding region of the predetermined path and includes a plurality of die-bonding arms arranged at intervals; The die-bonding arm includes: a pressing support including a light-transmitting part, and the pressing support is movably pressed against one of the wafers moving through the die-bonding area; a force control unit is connected to the the pressing support; wherein, when the pressing support presses the wafer, the force control unit can drive the pressing support to press the wafer with a predetermined force, so that the wafer passes through the The colloid is connected to the carrier; and a light curing device is disposed corresponding to the light-transmitting part; wherein, when the pressing support is pressed against the wafer, the light curing device is used to emit energy through the The light-transmitting part projects a curing light on the wafer to cure the colloid.

本發明實施例另公開一種固晶裝置,其包括:多個固晶臂,間隔地排列設置,並且每個所述固晶臂包含有:一抵壓支架,包含有一透光部,並且所述抵壓支架用來可移動地壓迫於一晶片;其中,所述晶片通過一膠體而設置於一載體上;及一力量控制單元,連接於所述抵壓支架;其中,當所述抵壓支架壓迫於所述晶片時,所述力量控制單元能驅使所述抵壓支架以一預定力量壓迫於所述晶片,以使所述晶片通過所述膠體而連接於所述載體;以及一光固化器,對應於多個所述固晶臂的所述透光部設置;其中,當每個所述固晶臂的所述抵壓支架以所述預定力量壓迫於所述晶片時,所述光固化器用來發射能穿過每個所述透光部而投射於所述晶片的一固化光線,以固化所述膠體。An embodiment of the present invention further discloses a die-bonding device, which includes: a plurality of die-bonding arms arranged at intervals, and each of the die-bonding arms includes: a pressing support including a light-transmitting part, and the The pressing bracket is used for movably pressing on a wafer; wherein, the chip is arranged on a carrier through a colloid; and a force control unit is connected to the pressing bracket; wherein, when the pressing bracket is When pressing the chip, the force control unit can drive the pressing support to press the chip with a predetermined force, so that the chip is connected to the carrier through the colloid; and a light curing device , corresponding to the light-transmitting parts of the plurality of die-bonding arms; wherein, when the pressing support of each die-bonding arm presses the wafer with the predetermined force, the light curing The device is used for emitting a curing light which can pass through each of the light-transmitting parts and project on the wafer, so as to cure the colloid.

綜上所述,本發明實施例所公開的生產設備及固晶裝置,其通過任一個所述抵壓支架壓迫於相對應的所述晶片,並且通過所述光固化器來固化所述膠體,據以取代加熱環境溫度的固化方式,進而有效地提升所述生產設備(或所述固晶裝置)的運作與生產效率。To sum up, in the production equipment and the die-bonding device disclosed in the embodiments of the present invention, the corresponding wafer is pressed by any one of the pressing supports, and the colloid is cured by the light curing device, Accordingly, the solidification method of heating the ambient temperature is replaced, thereby effectively improving the operation and production efficiency of the production equipment (or the die-bonding device).

為能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,但是此等說明與附圖僅用來說明本發明,而非對本發明的保護範圍作任何的限制。In order to further understand the features and technical content of the present invention, please refer to the following detailed description and accompanying drawings of the present invention, but these descriptions and drawings are only used to illustrate the present invention, rather than make any claims to the protection scope of the present invention. limit.

以下是通過特定的具體實施例來說明本發明所公開有關“生產設備及固晶裝置”的實施方式,本領域技術人員可由本說明書所公開的內容瞭解本發明的優點與效果。本發明可通過其他不同的具體實施例加以施行或應用,本說明書中的各項細節也可基於不同觀點與應用,在不悖離本發明的構思下進行各種修改與變更。另外,本發明的附圖僅為簡單示意說明,並非依實際尺寸的描繪,事先聲明。以下的實施方式將進一步詳細說明本發明的相關技術內容,但所公開的內容並非用以限制本發明的保護範圍。The following are specific specific examples to illustrate the embodiments of the "production equipment and crystal-bonding device" disclosed in the present invention, and those skilled in the art can understand the advantages and effects of the present invention from the content disclosed in this specification. The present invention can be implemented or applied through other different specific embodiments, and various details in this specification can also be modified and changed based on different viewpoints and applications without departing from the concept of the present invention. In addition, the drawings of the present invention are merely schematic illustrations, and are not drawn according to the actual size, and are stated in advance. The following embodiments will further describe the related technical contents of the present invention in detail, but the disclosed contents are not intended to limit the protection scope of the present invention.

應當可以理解的是,雖然本文中可能會使用到“第一”、“第二”、“第三”等術語來描述各種元件或者信號,但這些元件或者信號不應受這些術語的限制。這些術語主要是用以區分一元件與另一元件,或者一信號與另一信號。另外,本文中所使用的術語“或”,應視實際情況可能包括相關聯的列出項目中的任一個或者多個的組合。It should be understood that although terms such as "first", "second" and "third" may be used herein to describe various elements or signals, these elements or signals should not be limited by these terms. These terms are primarily used to distinguish one element from another element, or a signal from another signal. In addition, the term "or", as used herein, should include any one or a combination of more of the associated listed items, as the case may be.

[實施例一][Example 1]

請參閱圖1至圖8所示,其為本發明的實施例一。如圖1和圖2所示,本實施例公開一種生產設備100,其能用來使多個載體200分別通過多個膠體300而黏接於多個晶片400。而於本實施例中,所述載體200為一天線(如:無線射頻辨識天線),所述膠體300為一導電膠體(如:異方性導電膠體),但本發明不以此為限。舉例來說,在本發明未繪示的其他實施例中,所述載體200也可以是一板體,而所述膠體300可以是一非導電膠體。Please refer to FIG. 1 to FIG. 8 , which are Embodiment 1 of the present invention. As shown in FIG. 1 and FIG. 2 , the present embodiment discloses a production equipment 100 , which can be used to bond a plurality of carriers 200 to a plurality of wafers 400 through a plurality of glues 300 respectively. In this embodiment, the carrier 200 is an antenna (eg, a radio frequency identification antenna), and the colloid 300 is a conductive colloid (eg, anisotropic conductive colloid), but the invention is not limited thereto. For example, in other embodiments not shown in the present invention, the carrier 200 may also be a board, and the gel 300 may be a non-conductive gel.

所述生產設備100於本實施例中包含有一輸送裝置1、位置對應於所述輸送裝置1的一預接合裝置2、及位於所述預接合裝置2下游的一固晶裝置3。其中,所述輸送裝置1、所述預接合裝置2、及所述固晶裝置3於本實施例中是以相互搭配運作來說明,但於本發明未繪示的其他實施例中,所述固晶裝置3(或所述預接合裝置2)也可以單獨地應用(如:販賣)或搭配其他裝置使用。舉例來說,本實施例的預接合裝置2可以搭配於現有的固晶裝置;或者,本實施例的固晶裝置3可以搭配於現有的預接合裝置,但本發明在此不加以限制。In this embodiment, the production equipment 100 includes a conveying device 1 , a pre-bonding device 2 located corresponding to the conveying device 1 , and a die bonding device 3 located downstream of the pre-bonding device 2 . The conveying device 1 , the pre-bonding device 2 , and the die-bonding device 3 are described in this embodiment by cooperating with each other, but in other embodiments not shown in the present invention, the The die-bonding device 3 (or the pre-bonding device 2 ) can also be used alone (eg, sold) or used in combination with other devices. For example, the pre-bonding device 2 of this embodiment can be matched with an existing die bonding apparatus; or, the die bonding apparatus 3 of this embodiment can be matched with an existing pre-bonding apparatus, but the invention is not limited herein.

所述輸送裝置1於本實施例中是以多個滾輪來說明,但本發明不以此為限。其中,所述輸送裝置1定義有一預定路徑P,並且所述輸送裝置1能用來使設置有多個所述載體200的一絕緣膜500沿所述預定路徑P移動;也就是說,所述輸送裝置1(的多個所述滾輪)驅使所述絕緣膜500來沿著所述預定路徑P移動。再者,所述預定路徑P包含有一預接合區P1及位於所述預接合區P1下游的一固晶區P2;也就是說,多個所述載體200能通過所述輸送裝置1而由所述預接合區P1移動至所述固晶區P2。The conveying device 1 is described with a plurality of rollers in this embodiment, but the present invention is not limited to this. Wherein, the conveying device 1 defines a predetermined path P, and the conveying device 1 can be used to move an insulating film 500 provided with a plurality of the carriers 200 along the predetermined path P; that is, the The insulating film 500 is driven to move along the predetermined path P by (the plurality of said rollers) of the conveying device 1 . Furthermore, the predetermined path P includes a pre-bonding area P1 and a die bonding area P2 located downstream of the pre-bonding area P1; The pre-bonding region P1 is moved to the die bonding region P2.

所述預接合裝置2對應於所述預定路徑P的所述預接合區P1設置;也就是說,所述預接合裝置2的位置能夠朝向位在所述預接合區P1的所述絕緣膜500部位進行運作或加工。其中,所述預接合裝置2包含有一點膠機構21及鄰設於所述點膠機構21的一置晶機構22,並且所述置晶機構22較佳是位在所述點膠機構21的下游。The pre-bonding device 2 is disposed corresponding to the pre-bonding region P1 of the predetermined path P; that is, the position of the pre-bonding device 2 can face the insulating film 500 located in the pre-bonding region P1 part for operation or processing. The pre-bonding device 2 includes a glue dispensing mechanism 21 and a crystal placement mechanism 22 adjacent to the glue dispensing mechanism 21 , and the crystal placement mechanism 22 is preferably located on the side of the glue dispensing mechanism 21 . downstream.

所述點膠機構21用來使得移動經過所述預接合區P1的每個所述載體200上形成有一個所述膠體300。其中,所述點膠機構21可以是同時在多個所述載體200上分別形成多個所述膠體300;或者,所述點膠機構21也可以是在多個所述載體200上逐一形成有所述膠體300,本發明在此不加以限制。The glue dispensing mechanism 21 is used to form one glue 300 on each of the carriers 200 moving through the pre-bonding area P1 . Wherein, the glue dispensing mechanism 21 may form a plurality of the glue bodies 300 on a plurality of the carriers 200 at the same time; or, the glue dispensing mechanism 21 may also be formed on a plurality of the carriers 200 one by one The colloid 300 is not limited in the present invention.

所述置晶機構22用來使得移動經過所述預接合區P1的每個所述膠體300上設置有一個所述晶片400,並且所述置晶機構22於本實施例中是以能夠同時在多個所述膠體300上分別設置有多個所述晶片400來說明,但本發明不以此為限。也就是說,在本發明未繪示的其他實施例中,所述置晶機構22也可以是在多個所述膠體300上逐一設置所述晶片400。The die placement mechanism 22 is used to set one of the wafers 400 on each of the colloids 300 that move through the pre-bonding region P1, and the die placement mechanism 22 in this embodiment can simultaneously A plurality of the wafers 400 are respectively disposed on the plurality of the colloids 300 for illustration, but the present invention is not limited to this. That is to say, in other embodiments not shown in the present invention, the wafer placement mechanism 22 may also place the wafers 400 on the plurality of the colloids 300 one by one.

如圖3所示,所述置晶機構22包含有能用來分別固持多個晶片400的多個擷取器221、用來調整多個所述晶片400的相對位置的一校正單元222、及電性耦接於所述校正單元222的一攝像器223。其中,所述擷取器221於本實施例中是以一真空吸取器來說明,並且多個所述擷取器221可以是沿垂直所述預定路徑P的一方向排列,但本發明不受限於此。As shown in FIG. 3 , the die placement mechanism 22 includes a plurality of extractors 221 for holding a plurality of wafers 400 respectively, a calibration unit 222 for adjusting the relative positions of the plurality of wafers 400 , and A camera 223 of the calibration unit 222 is electrically coupled. Wherein, the extractor 221 is described as a vacuum suction device in this embodiment, and a plurality of the extractors 221 may be arranged in a direction perpendicular to the predetermined path P, but the present invention is not limited to limited to this.

再者,所述攝像器223於本實施例中是對應於所述預接合區P1設置,用以偵測移動經過所述預接合區P1的多個所述膠體300的位置。所述校正單元222則是能通過所述攝像器223所取得的多個所述膠體300的位置、以調整多個所述擷取器221所固持的多個所述晶片400的相對位置。多個所述擷取器221能用來使通過所述校正單元222調整後的多個所述晶片400、同步設置於移動經過所述預接合區P1的多個所述膠體300上。Furthermore, in this embodiment, the camera 223 is disposed corresponding to the pre-bonding area P1 for detecting the positions of the plurality of colloids 300 moving through the pre-bonding area P1. The calibration unit 222 can adjust the relative positions of the plurality of wafers 400 held by the plurality of capture devices 221 through the positions of the plurality of the colloids 300 obtained by the camera 223 . A plurality of the extractors 221 can be used for synchronizing the plurality of the wafers 400 adjusted by the calibration unit 222 on the plurality of the gels 300 moving through the pre-bonding area P1.

據此,所述預接合裝置2於本實施例中通過所述校正單元222來調整多個所述晶片400的相對位置,以使通過所述校正單元222調整後的多個所述晶片400可以分別被多個所述擷取器221同步設置於多個所述膠體300上,進而有效地提升所述生產設備100(或所述預接合裝置2)的運作與生產效率。Accordingly, in this embodiment, the pre-bonding device 2 adjusts the relative positions of the plurality of wafers 400 through the calibration unit 222 , so that the plurality of wafers 400 adjusted by the calibration unit 222 can The plurality of extractors 221 are respectively disposed on the plurality of the gels 300 synchronously, thereby effectively improving the operation and production efficiency of the production equipment 100 (or the pre-bonding device 2 ).

需額外說明的是,所述置晶機構22於本實施例中是以多個所述擷取器221、所述校正單元222、及所述攝像器223相互搭配運作來說明,但本發明不受限於此。舉例來說,在本發明未繪示的其他實施例中,所述置晶機構22也可以省略所述校正單元222及/或所述攝像器223。It should be additionally explained that the die placement mechanism 22 is illustrated by a plurality of the capture devices 221 , the calibration unit 222 , and the camera 223 in cooperation with each other in this embodiment, but the present invention does not limited by this. For example, in other embodiments not shown in the present invention, the die placement mechanism 22 may also omit the calibration unit 222 and/or the camera 223 .

更詳細地說,所述校正單元222在符合上述條件的情況下,其可以有多種不同的實施態樣,而為便於理解本實施例的校正單元222,以下僅以所述校正單元222的其中三種實施態樣(如圖4至圖6)來說明,但所述校正單元222的具體構造可以依據設計需求而加以調整變化,不受限於本實施例的圖式。In more detail, the correction unit 222 may have various implementations under the condition that the above conditions are met. For the convenience of understanding the correction unit 222 of this embodiment, only the correction unit 222 will be described below. Three implementation aspects (as shown in FIG. 4 to FIG. 6 ) are described, but the specific structure of the calibration unit 222 can be adjusted and changed according to design requirements, and is not limited to the drawings of this embodiment.

如圖4所示的所述校正單元222的實施態樣I,所述校正單元222具有呈環狀排列的多個頂抵臂2223,並且多個所述頂抵臂2223能用來抵接於一個所述擷取器221所固持的所述晶片400的環側面401,以使所述晶片400被調整至一特定位置(如:圖4中的實線位置)。也就是說,所述晶片400保持被所述擷取器221所固持,並且多個所述頂抵臂2223能夠微幅推動被所述擷取器221固持的所述晶片400,據以改變所述擷取器221所固持的所述晶片400位置,以使所述晶片400被調整至所述特定位置。其中,所述特定位置是對應於所述晶片400所欲設置的所述膠體300位置。As shown in the embodiment I of the calibration unit 222 shown in FIG. 4 , the calibration unit 222 has a plurality of abutting arms 2223 arranged in a ring shape, and the plurality of the abutting arms 2223 can be used to abut on the A ring side surface 401 of the wafer 400 held by the extractor 221, so that the wafer 400 is adjusted to a specific position (eg, the solid line position in FIG. 4). That is to say, the wafer 400 remains held by the extractor 221, and the plurality of the abutting arms 2223 can slightly push the wafer 400 held by the extractor 221, so as to change the The position of the wafer 400 held by the extractor 221 is adjusted so that the wafer 400 is adjusted to the specific position. Wherein, the specific position corresponds to the position of the colloid 300 to be set on the wafer 400 .

如圖5和圖6所示的所述校正單元222的實施態樣II和實施態樣III,所述校正單元222具有用來承載任一個所述晶片400的一定位盤2221及安裝於所述定位盤2221上的一微調件2222,並且所述微調件2222(與所述定位盤2221)能用來依據所述攝像器223所取得的多個所述膠體300的位置、以調整位於所述定位盤2221上的所述晶片400的位置。5 and FIG. 6 , the calibration unit 222 has an embodiment II and an embodiment III, the calibration unit 222 has a positioning plate 2221 for carrying any one of the wafers 400 and mounted on the A fine adjustment piece 2222 on the positioning plate 2221, and the fine adjustment piece 2222 (and the positioning plate 2221) can be used to adjust the positions of the gels 300 in the The position of the wafer 400 on the positioning pad 2221.

進一步地說,如圖5所示的所述校正單元222的實施態樣II,所述微調件2222包含有呈環狀排列的多個頂抵臂2223,並且多個所述頂抵臂2223能用來同時抵接位在所述定位盤2221上的所述晶片400的環側面401,而所述定位盤2221與多個所述頂抵臂2223能同步移動,以使所述晶片400被調整至一特定位置(如:圖5中的實線位置)。其中,所述特定位置是對應於所述晶片400所欲設置的所述膠體300位置。Further, as shown in the embodiment II of the calibration unit 222 shown in FIG. 5 , the fine adjustment element 2222 includes a plurality of abutting arms 2223 arranged in a ring shape, and the plurality of the abutting arms 2223 can It is used to abut the ring side 401 of the wafer 400 on the positioning plate 2221 at the same time, and the positioning plate 2221 and a plurality of the abutting arms 2223 can move synchronously, so that the wafer 400 can be adjusted to a specific position (eg: the solid line position in Figure 5). Wherein, the specific position corresponds to the position of the colloid 300 to be set on the wafer 400 .

此外,如圖6所示的所述校正單元222的實施態樣III,所述微調件2222包含有呈環狀排列的多個頂抵臂2223,並且多個所述頂抵臂2223能用來同時抵接位在所述定位盤2221上的所述晶片400的環側面401,以使所述晶片400被調整至一特定位置(如:圖6中的實線位置)。也就是說,多個所述頂抵臂2223能夠移動來調整所述晶片400相對於所述定位盤2221的位置,據以使所述晶片400被調整至所述特定位置。其中,所述特定位置是對應於所述晶片400所欲設置的所述膠體300位置。In addition, as shown in Embodiment III of the calibration unit 222 shown in FIG. 6 , the fine adjustment member 2222 includes a plurality of abutting arms 2223 arranged in a ring shape, and the plurality of the abutting arms 2223 can be used for At the same time, the ring side surface 401 of the wafer 400 on the positioning plate 2221 is abutted, so that the wafer 400 is adjusted to a specific position (eg, the solid line position in FIG. 6 ). That is, a plurality of the abutting arms 2223 can move to adjust the position of the wafer 400 relative to the positioning plate 2221, so that the wafer 400 is adjusted to the specific position. Wherein, the specific position corresponds to the position of the colloid 300 to be set on the wafer 400 .

需額外說明的是,如圖7所示,所述生產設備100也可以進一步包含有對應於所述置晶機構22設置的一承載盤4與一翻轉裝置5。其中,所述承載盤4用來供多個所述晶片400設置,並且每個所述晶片400於所述環側面401的相反兩側分別具有一焊接面402與一表面403,並且每個所述晶片400的所述焊接面402朝向遠離所述承載盤4的一側;也就是說,每個所述晶片400的所述表面403是設置在所述承載盤4上。It should be noted that, as shown in FIG. 7 , the production equipment 100 may further include a carrier plate 4 and a turning device 5 corresponding to the die placement mechanism 22 . The carrier plate 4 is used for arranging a plurality of the wafers 400, and each wafer 400 has a welding surface 402 and a surface 403 on opposite sides of the annular side surface 401, and each wafer 400 has a welding surface 402 and a surface 403 respectively. The soldering surface 402 of the wafer 400 faces the side away from the carrier plate 4 ; that is, the surface 403 of each wafer 400 is disposed on the carrier plate 4 .

所述翻轉裝置5用來使多個所述晶片400自所述承載盤4剝離,以供每個所述擷取器221能(由所述翻轉裝置5)固持一個所述晶片400。其中,所述翻轉裝置5能用來翻轉自所述承載盤4剝離的任一個所述晶片400,以使其所述焊接面402轉動180度而朝向所述承載盤4(也就是,使所述晶片400的所述表面403朝向一個所述擷取器221)。The inversion device 5 is used to peel a plurality of the wafers 400 from the carrier tray 4 , so that each of the extractors 221 can hold one of the wafers 400 (by the inversion device 5 ). Wherein, the inversion device 5 can be used to invert any one of the wafers 400 peeled from the carrier plate 4, so that the soldering surface 402 thereof is rotated by 180 degrees to face the carrier plate 4 (that is, to make all the wafers 400) The surface 403 of the wafer 400 faces one of the extractors 221).

需說明的是,所述翻轉裝置5在符合上述條件的情況下,其可以有多種不同的實施態樣,而為便於理解本實施例的翻轉裝置5,以下僅以所述翻轉裝置5的較佳實施態樣來說明,但所述翻轉裝置5的具體構造可以依據設計需求而加以調整變化,不受限於本實施例的圖式。It should be noted that the inversion device 5 can have various implementation forms under the condition that the above conditions are met. For the convenience of understanding the inversion device 5 of the present embodiment, the following only takes the comparison of the inversion device 5 as an example. The preferred embodiment is described, but the specific structure of the turning device 5 can be adjusted and changed according to design requirements, and is not limited to the drawings of this embodiment.

於本實施例中,所述翻轉裝置5包含有一旋轉支架51及安裝於所述旋轉支架51的兩個端部52(如:吸嘴),任一個所述端部52能自所述承載盤4擷取一個所述晶片400、並通過所述旋轉支架51的轉動而翻轉所述晶片400,以使其所擷取的所述晶片400鄰近於一個所述擷取器221。其中,當兩個所述端部52的其中一個所述端部52所擷取的所述晶片400鄰近於一個所述擷取器221時,兩個所述端部52的其中另一個所述端部52能用來自所述承載盤4擷取一個所述晶片400。In this embodiment, the turning device 5 includes a rotating bracket 51 and two ends 52 (eg, suction nozzles) mounted on the rotating bracket 51 , and any of the ends 52 can be removed from the carrying plate. 4. Capture one of the wafers 400, and turn the wafer 400 over by the rotation of the rotating support 51, so that the captured wafer 400 is adjacent to one of the capturers 221. Wherein, when the wafer 400 captured by one of the end portions 52 of the two end portions 52 is adjacent to the extraction device 221 , the other of the end portions 52 The end 52 can be used to pick up one of the wafers 400 from the carrier tray 4 .

再者,相鄰的兩個所述擷取器221之間的距離對應於(如:大致等於)所述旋轉支架51與所述校正單元222之間的距離,以使得當兩個所述端部52的其中一個所述端部52所擷取的所述晶片400鄰近於一個所述擷取器221時,其所相鄰的另一個所述擷取器221(已自所述翻轉裝置5擷取一個所述晶片400且其)位置對應於所述校正單元222。Furthermore, the distance between two adjacent extractors 221 corresponds to (eg, is approximately equal to) the distance between the rotating bracket 51 and the correction unit 222, so that when the two ends When the wafer 400 captured by one of the ends 52 of the portion 52 is adjacent to one of the capturers 221, the adjacent other capturer 221 (which has been removed from the inversion device 5 One of the wafers 400 is captured and its position corresponds to the calibration unit 222 .

據此,所述生產設備100通過相鄰的兩個所述擷取器221之間的距離對應於(如:大致等於)所述旋轉支架51與所述校正單元222之間的距離,使得相鄰的兩個所述擷取器221能夠同步配合於所述翻轉裝置5與所述校正單元222,進而有效地提升所述生產設備100的運作效率。Accordingly, the distance between the two adjacent extractors 221 of the production equipment 100 corresponds to (eg, is approximately equal to) the distance between the rotation bracket 51 and the correction unit 222 , so that the The two adjacent extractors 221 can be synchronized with the inversion device 5 and the calibration unit 222 , thereby effectively improving the operation efficiency of the production equipment 100 .

如圖1和圖8所示,所述固晶裝置3對應於所述預定路徑P的所述固晶區P2設置,並且所述固晶裝置3可以用來壓抵移動經過所述固晶區P2的多個所述晶片400,以使任一個所述晶片400能通過所述膠體300而連接於所述載體200、並固化所述膠體300。於本實施例中,所述固晶裝置3包含有間隔設置的多個固晶臂30a,並且多個所述固晶臂30a較佳是排列成多列固晶臂組,而每列所述固晶臂組包含有至少兩個所述固晶臂30a且沿垂直所述預定路徑P的方向排列。As shown in FIG. 1 and FIG. 8 , the die-bonding device 3 is disposed corresponding to the die-bonding region P2 of the predetermined path P, and the die-bonding device 3 can be used to press against and move through the die-bonding region A plurality of the wafers 400 of P2, so that any one of the wafers 400 can be connected to the carrier 200 through the glue 300, and the glue 300 can be cured. In this embodiment, the die-bonding device 3 includes a plurality of die-bonding arms 30a arranged at intervals, and the plurality of the die-bonding arms 30a are preferably arranged in multiple rows of die-bonding arm groups, and the The die-bonding arm group includes at least two of the die-bonding arms 30 a and is arranged along a direction perpendicular to the predetermined path P. As shown in FIG.

需先說明的是,由於本實施例中的多個所述固晶臂30a構造與運作皆大致相同,所以為了便於說明,以下先介紹單個所述固晶臂30a的構造與運作,但本發明不以此為限。舉例來說,在本發明未繪示的其他實施例中,多個所述固晶臂30a的構造也可以略有差異。It should be noted that, since the structures and operations of the plurality of die-bonding arms 30a in this embodiment are substantially the same, for the convenience of description, the structure and operation of a single die-bonding arm 30a will be described below. Not limited to this. For example, in other embodiments not shown in the present invention, the structures of the plurality of die bonding arms 30a may also be slightly different.

所述固晶臂30a包含有一抵壓支架31、連接於所述抵壓支架31的一力量控制單元32(如:液壓缸或氣壓缸)、及一光固化器33(如:光發射器)。其中,所述抵壓支架31包含有一透光部311及相連於所述透光部311的一臂部312,並且所述透光部311於本實施例中呈透明狀,所述光固化器33對應於所述透光部311設置,而所述力量控制單元32安裝於所述臂部312。其中,所述光固化器33於本實施例中的位置是適於使其發出的固化光線穿過所述透光部311。The die-bonding arm 30a includes a pressing support 31 , a force control unit 32 (eg, a hydraulic cylinder or a pneumatic cylinder) connected to the pressing support 31 , and a light curing device 33 (eg, a light emitter) . The pressing support 31 includes a light-transmitting portion 311 and an arm portion 312 connected to the light-transmitting portion 311 , and the light-transmitting portion 311 is transparent in this embodiment. 33 is disposed corresponding to the light-transmitting portion 311 , and the force control unit 32 is mounted on the arm portion 312 . The position of the light curing device 33 in this embodiment is suitable for the curing light emitted by the light curing device 33 to pass through the transparent portion 311 .

進一步地說,所述抵壓支架31可移動地壓迫於移動經過所述固晶區P2的一個所述晶片400,並且所述透光部311用以壓迫於所述晶片400。需說明的是,所述抵壓支架31於本實施例中雖是以透光部311壓迫於所述晶片400來說明,但於本發明未繪示的其他實施例中,所述抵壓支架31也可以是通過圍繞於所述透光部311的一部位壓迫於所述晶片400。More specifically, the pressing support 31 is movably pressed against one of the wafers 400 moving through the die bonding region P2 , and the transparent portion 311 is used for pressing against the wafer 400 . It should be noted that although the pressing bracket 31 is described in this embodiment by pressing the light-transmitting portion 311 against the wafer 400 , in other embodiments not shown in the present invention, the pressing bracket 31 may also be pressed against the wafer 400 by a portion surrounding the light-transmitting portion 311 .

其中,當任一個所述固晶臂30a壓迫於相對應的所述晶片400時,所述抵壓支架31(的所述透光部311)直接壓迫於相對應所述晶片400的局部所述表面403(如:所述抵壓支架31接觸所述晶片400的所述表面403的中央部位、但不接觸所述晶片400的所述表面403的外圍部位,據以避免所述膠體300蔓延至所述抵壓支架31)。據此,所述抵壓支架31(的所述透光部311)與相對應的所述晶片400之間不需要設置有任何隔離膜。Wherein, when any one of the die bonding arms 30 a presses the corresponding wafer 400 , the pressing support 31 (the light-transmitting portion 311 ) directly presses the corresponding part of the wafer 400 . The surface 403 (eg, the pressing support 31 contacts the central part of the surface 403 of the wafer 400 , but does not contact the peripheral part of the surface 403 of the wafer 400 , so as to prevent the colloid 300 from spreading to the the pressing support 31). Accordingly, there is no need to provide any isolation film between the pressing support 31 (the transparent portion 311 of the light-transmitting portion 311 ) and the corresponding wafer 400 .

再者,當所述抵壓支架31壓迫於所述晶片400時,所述力量控制單元32能驅使所述抵壓支架31以一預定力量壓迫於所述晶片400,以使所述晶片400通過所述膠體300而連接於所述載體200,而所述光固化器33則是發射能穿過所述透光部311而投射於所述晶片400的一固化光線,以固化所述膠體300。進一步地說,所述固晶臂30a的所述力量控制單元32於本實施例中能驅使所述抵壓支架31以所述預定力量壓迫於所述晶片400,以使所述導電膠體受壓迫而電性耦接所述晶片400與所述天線。Furthermore, when the pressing support 31 presses the wafer 400, the force control unit 32 can drive the pressing support 31 to press the wafer 400 with a predetermined force, so that the wafer 400 can pass through The gel 300 is connected to the carrier 200 , and the light curing device 33 emits a curing light that can pass through the transparent portion 311 and project on the wafer 400 to cure the gel 300 . Further, in this embodiment, the force control unit 32 of the die bonding arm 30a can drive the pressing support 31 to press the wafer 400 with the predetermined force, so as to press the conductive gel The chip 400 and the antenna are electrically coupled.

據此,所述固晶裝置3於本實施例中通過任一個所述抵壓支架31壓迫於相對應的所述晶片400,並且通過所述光固化器33來固化所述膠體300,據以取代加熱環境溫度的固化方式,進而有效地提升所述生產設備100(或所述固晶裝置3)的運作與生產效率。Accordingly, in this embodiment, the die bonding device 3 is pressed against the corresponding wafer 400 by any one of the pressing brackets 31 , and the colloid 300 is cured by the light curing device 33 . Instead of the curing method of heating the ambient temperature, the operation and production efficiency of the production equipment 100 (or the solid crystal device 3 ) can be effectively improved.

[實施例二][Example 2]

請參閱圖9所示,其為本發明的實施例二。本實施例類似於上述實施例一,所以兩個實施例的相同處則不再加以贅述,而本實施例相較於上述實施例一的差異大致說明如下:Please refer to FIG. 9 , which is the second embodiment of the present invention. This embodiment is similar to the above-mentioned first embodiment, so the similarities between the two embodiments will not be repeated, and the differences between this embodiment and the above-mentioned first embodiment are roughly described as follows:

於本實施例的每個所述固晶臂30a中,所述抵壓支架31的所述透光部311呈鏤空狀(也就是,所述透光部311為一穿孔),並且所述抵壓支架31是以圍繞於所述透光部311的一部位壓迫於所述晶片400。In each of the die-bonding arms 30a in this embodiment, the light-transmitting portion 311 of the pressing support 31 is hollow (that is, the light-transmitting portion 311 is a through hole), and the pressing The pressing bracket 31 is pressed against the wafer 400 by a portion surrounding the transparent portion 311 .

[實施例三][Example 3]

請參閱圖10所示,其為本發明的實施例三。本實施例類似於上述實施例一和二,所以兩個實施例的相同處則不再加以贅述,而本實施例相較於上述實施例一和二的差異大致說明如下:Please refer to FIG. 10 , which is Embodiment 3 of the present invention. This embodiment is similar to the above-mentioned first and second embodiments, so the similarities between the two embodiments will not be repeated, and the differences between this embodiment and the above-mentioned first and second embodiments are roughly described as follows:

於本實施例中,每個所述固晶臂30a未包含有任何光固化器33,並且所述固晶裝置3包含有單個光固化器30b,其對應於多個所述固晶臂30a的所述透光部311設置。據此,當每個所述固晶臂30a的所述抵壓支架31(如:透光部311)以所述預定力量壓迫於所述晶片400時,所述光固化器30b用來發射能穿過每個所述透光部311而投射於所述晶片400的一固化光線,以固化所述膠體300。In this embodiment, each of the die-bonding arms 30a does not include any photo-curing device 33, and the die-bonding device 3 includes a single photo-curing device 30b, which corresponds to a plurality of the die-bonding arms 30a. The light-transmitting portion 311 is provided. Accordingly, when the pressing support 31 (eg, the light-transmitting portion 311 ) of each die bonding arm 30 a is pressed against the wafer 400 with the predetermined force, the light curing device 30 b is used to emit energy A curing light is projected onto the wafer 400 through each of the light-transmitting portions 311 to cure the gel 300 .

[實施例四][Example 4]

請參閱圖11所示,其為本發明的實施例四。本實施例類似於上述實施例一和二,所以兩個實施例的相同處則不再加以贅述,而本實施例相較於上述實施例一和二的差異大致說明如下:Please refer to FIG. 11 , which is the fourth embodiment of the present invention. This embodiment is similar to the above-mentioned first and second embodiments, so the similarities between the two embodiments will not be repeated, and the differences between this embodiment and the above-mentioned first and second embodiments are roughly described as follows:

於本實施例中,所述固晶裝置3進一步包含有一隔離膜30c,並且所述隔離膜30c可移動地設置於多個所述固晶臂30a及相對應的多個所述晶片400之間。其中,當任一個所述固晶臂30a壓迫於相對應的所述晶片400時,所述隔離膜30c被夾持於所述抵壓支架31(的所述透光部311)以及相對應所述晶片400之間,並且所述抵壓支架31(的所述透光部311)通過所述隔離膜30c壓迫於相對應所述晶片400的整個表面。In this embodiment, the die bonding device 3 further includes an isolation film 30c, and the isolation film 30c is movably disposed between the plurality of the die bonding arms 30a and the corresponding plurality of the wafers 400 . . Wherein, when any one of the die-bonding arms 30a is pressed against the corresponding wafer 400, the isolation film 30c is clamped by the pressing support 31 (the light-transmitting portion 311) and the corresponding between the wafers 400 , and the pressing support 31 (the light-transmitting portion 311 ) is pressed against the entire surface of the corresponding wafer 400 through the isolation film 30 c .

據此,所述固晶裝置3於本實施例中通過設有不影響光固化效果的所述隔離膜30c,以有效地避免所述抵壓支架31的所述透光部311受到所述膠體300的沾附(或汙染)。Accordingly, in this embodiment, the die-bonding device 3 is provided with the isolation film 30c that does not affect the photo-curing effect, so as to effectively prevent the light-transmitting portion 311 of the pressing support 31 from being affected by the colloid 300 of adhesion (or contamination).

[實施例五][Example 5]

請參閱圖12所示,其為本發明的實施例五。本實施例類似於上述實施例一至四,所以上述多個實施例的相同處則不再加以贅述,而本實施例相較於上述實施例一至四的差異大致說明如下:Please refer to FIG. 12 , which is Embodiment 5 of the present invention. This embodiment is similar to the foregoing Embodiments 1 to 4, so the similarities of the foregoing multiple embodiments will not be repeated, and the differences between this embodiment and the foregoing Embodiments 1 to 4 are roughly described as follows:

於本實施例中,所述校正單元222為一種位置可調整式支架。其中,多個所述擷取器221安裝於所述校正單元222,所述校正單元222能夠調整多個所述擷取器221彼此之間的相對位置,並且多個所述擷取器221與所述校正單元222能夠同步地移動。進一步地說,所述校正單元222能通過所述攝像器223所取得的多個所述膠體300的位置、以調整固持有多個所述晶片400的多個所述擷取器221的相對位置。也就是說,所述校正單元222於本實施例中是通過調整多個所述擷取器221的相對位置,進而控制(或調整)多個所述晶片400的相對位置。In this embodiment, the calibration unit 222 is a position-adjustable bracket. Wherein, a plurality of the extractors 221 are installed in the calibration unit 222, and the calibration unit 222 can adjust the relative positions of the plurality of the extractors 221, and the plurality of the extractors 221 and the The correction unit 222 can move synchronously. Further, the calibration unit 222 can adjust the relative positions of the plurality of pickers 221 holding the plurality of wafers 400 through the positions of the plurality of the colloids 300 obtained by the camera 223 . Location. That is to say, in this embodiment, the calibration unit 222 controls (or adjusts) the relative positions of the plurality of wafers 400 by adjusting the relative positions of the plurality of extractors 221 .

[本發明實施例的技術效果][Technical effects of the embodiments of the present invention]

綜上所述,本發明實施例所公開的生產設備及固晶裝置,其通過任一個所述抵壓支架壓迫於相對應的所述晶片,並且通過所述光固化器來固化所述膠體,據以取代加熱環境溫度的固化方式,進而有效地提升所述生產設備(或所述固晶裝置)的運作與生產效率。To sum up, in the production equipment and the die-bonding device disclosed in the embodiments of the present invention, the corresponding wafer is pressed by any one of the pressing supports, and the colloid is cured by the light curing device, Accordingly, the solidification method of heating the ambient temperature is replaced, thereby effectively improving the operation and production efficiency of the production equipment (or the die-bonding device).

再者,本發明實施例所公開的生產設備及預接合裝置,其通過所述校正單元來調整多個所述晶片的相對位置,以使通過所述校正單元調整後的多個所述晶片可以分別被多個所述擷取器同步設置於多個所述膠體上,進而有效地提升所述生產設備(或所述預接合裝置)的運作與生產效率。Furthermore, in the production equipment and the pre-bonding device disclosed in the embodiments of the present invention, the relative positions of the plurality of wafers are adjusted by the calibration unit, so that the plurality of wafers adjusted by the calibration unit can be The plurality of extractors are respectively disposed on the plurality of the colloids synchronously, thereby effectively improving the operation and production efficiency of the production equipment (or the pre-bonding device).

進一步地說,所述抵壓支架可以直接壓迫於相對應所述晶片的局部所述表面,據以避免所述膠體蔓延至所述抵壓支架,使得所述抵壓支架與相對應的所述晶片之間不需要設置有任何隔離膜。Further, the pressing support can be directly pressed against the part of the surface corresponding to the wafer, so as to prevent the colloid from spreading to the pressing support, so that the pressing support and the corresponding There is no need for any isolation film between the wafers.

另,所述生產設備通過相鄰的兩個所述擷取器之間的距離對應於(如:大致等於)所述旋轉支架與所述校正單元之間的距離,使得相鄰的兩個所述擷取器能夠同步配合於所述翻轉裝置與所述校正單元,進而有效地提升所述生產設備的運作效率。In addition, the production equipment corresponds to (for example: approximately equal to) the distance between the rotating support and the correction unit through the distance between the two adjacent extractors, so that the two adjacent The extractor can be synchronized with the turning device and the calibration unit, thereby effectively improving the operation efficiency of the production equipment.

以上所公開的內容僅為本發明的優選可行實施例,並非因此侷限本發明的專利範圍,所以凡是運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的專利範圍內。The content disclosed above is only a preferred feasible embodiment of the present invention, and is not intended to limit the patent scope of the present invention. Therefore, any equivalent technical changes made by using the contents of the description and drawings of the present invention are included in the patent scope of the present invention. Inside.

100:生產設備 1:輸送裝置 2:預接合裝置 21:點膠機構 22:置晶機構 221:擷取器 222:校正單元 2221:定位盤 2222:微調件 2223:頂抵臂 223:攝像器 3:固晶裝置 30a:固晶臂 31:抵壓支架 311:透光部 312:臂部 32:力量控制單元 33:光固化器 30b:光固化器 30c:隔離膜 4:承載盤 5:翻轉裝置 51:旋轉支架 52:端部 P:預定路徑 P1:預接合區 P2:固晶區 200:載體 300:膠體 400:晶片 401:環側面 402:焊接面 403:表面 500:絕緣膜 100: Production equipment 1: Conveying device 2: Pre-engagement device 21: Dispensing mechanism 22: Crystal placement mechanism 221: Fetcher 222: Correction unit 2221: Positioning disc 2222: Trimming pieces 2223: push arm 223: Camera 3: Solid crystal device 30a: Die bonding arm 31: Press the bracket 311: Translucent part 312: Arm 32: Force Control Unit 33: Light Curing Device 30b: Light Curing Unit 30c: Isolation film 4: Carrier plate 5: Flip device 51: Swivel bracket 52: End P: Predetermined path P1: Pre-bonded area P2: solid crystal region 200: Carrier 300: colloid 400: Wafer 401: Ring Side 402: Welding surface 403: Surface 500: insulating film

圖1為本發明實施例一的生產設備的示意圖。FIG. 1 is a schematic diagram of the production equipment according to the first embodiment of the present invention.

圖2為本發明實施例一的生產設備的預接合區示意圖。FIG. 2 is a schematic diagram of a pre-bonding area of the production equipment according to the first embodiment of the present invention.

圖3為本發明實施例一的生產設備的置晶機構的示意圖。3 is a schematic diagram of a crystal placement mechanism of the production equipment according to Embodiment 1 of the present invention.

圖4為本發明實施例一的生產設備的校正單元的實施態樣I的示意圖。FIG. 4 is a schematic diagram of Embodiment 1 of the calibration unit of the production equipment according to Embodiment 1 of the present invention.

圖5為本發明實施例一的生產設備的校正單元的實施態樣II的示意圖。FIG. 5 is a schematic diagram of implementation II of the calibration unit of the production equipment according to the first embodiment of the present invention.

圖6為本發明實施例一的生產設備的校正單元的實施態樣III的示意圖。FIG. 6 is a schematic diagram of Embodiment III of the calibration unit of the production equipment according to the first embodiment of the present invention.

圖7為本發明實施例一的生產設備的置晶機構、承載盤、及翻轉裝置的示意圖。7 is a schematic diagram of a die placement mechanism, a carrier tray, and a turning device of the production equipment according to Embodiment 1 of the present invention.

圖8為本發明實施例一的生產設備的固晶臂的示意圖。FIG. 8 is a schematic diagram of a die bonding arm of the production equipment according to the first embodiment of the present invention.

圖9為本發明實施例二的生產設備的固晶臂的示意圖。FIG. 9 is a schematic diagram of a die bonding arm of the production equipment according to the second embodiment of the present invention.

圖10為本發明實施例三的生產設備的固晶裝置的示意圖。FIG. 10 is a schematic diagram of a die-bonding device of the production equipment according to the third embodiment of the present invention.

圖11為本發明實施例四的生產設備的固晶臂的示意圖。FIG. 11 is a schematic diagram of a die bonding arm of the production equipment according to the fourth embodiment of the present invention.

圖12為本發明實施例五的生產設備的置晶機構的示意圖。12 is a schematic diagram of a crystal placement mechanism of the production equipment according to the fifth embodiment of the present invention.

30a:固晶臂 30a: Die bonding arm

31:抵壓支架 31: Press the bracket

311:透光部 311: Translucent part

312:臂部 312: Arm

32:力量控制單元 32: Force Control Unit

33:光固化器 33: Light Curing Device

P2:固晶區 P2: solid crystal region

200:載體 200: Carrier

300:膠體 300: colloid

400:晶片 400: Wafer

401:環側面 401: Ring Side

402:焊接面 402: Welding surface

403:表面 403: Surface

500:絕緣膜 500: insulating film

Claims (8)

一種固晶裝置,其包括: 多個固晶臂,間隔地排列設置,並且每個所述固晶臂包含有: 一抵壓支架,包含有一透光部,並且所述抵壓支架用來可移動地壓迫於一晶片;其中,所述晶片通過一膠體而設置於一載體上; 一力量控制單元,連接於所述抵壓支架;其中,當所述抵壓支架壓迫於所述晶片時,所述力量控制單元能驅使所述抵壓支架以一預定力量壓迫於所述晶片,以使所述晶片通過所述膠體而連接於所述載體;及 一光固化器,對應於所述透光部設置;其中,當所述抵壓支架以所述預定力量壓迫於所述晶片時,所述光固化器用來發射能穿過所述透光部而投射於所述晶片的一固化光線,以固化所述膠體。 A crystal-bonding device, comprising: A plurality of die-bonding arms are arranged at intervals, and each of the die-bonding arms comprises: a pressing support including a light-transmitting part, and the pressing support is used for movably pressing a chip; wherein, the chip is arranged on a carrier through a colloid; a force control unit connected to the pressing support; wherein, when the pressing support presses the wafer, the force control unit can drive the pressing support to press the wafer with a predetermined force, to connect the chip to the carrier through the gel; and A light curing device is disposed corresponding to the light-transmitting part; wherein, when the pressing support presses the wafer with the predetermined force, the light-curing device is used for emitting energy passing through the light-transmitting part to A curing light is projected on the wafer to cure the colloid. 如請求項1所述的固晶裝置,其中,於每個所述固晶臂中,所述抵壓支架的所述透光部呈透明狀、並用以壓迫於所述晶片;其中,所述固晶裝置進一步包含有一隔離膜,並且所述隔離膜可移動地設置於多個所述固晶臂及相對應的多個所述晶片之間;其中,當任一個所述固晶臂壓迫於相對應的所述晶片時,所述隔離膜被夾持於所述抵壓支架的所述透光部以及相對應所述晶片之間,並且所述抵壓支架的所述透光部通過所述隔離膜壓迫於相對應所述晶片的整個表面。The die-bonding device according to claim 1, wherein in each of the die-bonding arms, the light-transmitting portion of the pressing support is transparent and used to press the wafer; wherein, the The die-bonding device further includes an isolation film, and the isolation film is movably arranged between a plurality of the die-bonding arms and a plurality of the corresponding wafers; wherein, when any one of the die-bonding arms is pressed against the When corresponding to the wafer, the isolation film is clamped between the light-transmitting part of the pressing support and the corresponding wafer, and the light-transmitting part of the pressing support passes through the The isolation film is pressed against the entire surface of the corresponding wafer. 如請求項1所述的固晶裝置,其中,於每個所述固晶臂中,所述抵壓支架的所述透光部呈透明狀、並用以壓迫於所述晶片;當任一個所述固晶臂壓迫於相對應的所述晶片時,所述抵壓支架的所述透光部直接壓迫於相對應所述晶片的局部表面。The die-bonding device according to claim 1, wherein, in each of the die-bonding arms, the light-transmitting portion of the pressing support is transparent and used to press the wafer; When the die-bonding arm presses the corresponding wafer, the light-transmitting portion of the pressing support directly presses the partial surface of the corresponding wafer. 如請求項1所述的固晶裝置,其中,於每個所述固晶臂中,所述抵壓支架的所述透光部呈透明狀、並用以壓迫於所述晶片。The die-bonding device according to claim 1, wherein, in each of the die-bonding arms, the light-transmitting portion of the pressing support is transparent and used to press the wafer. 如請求項1所述的固晶裝置,其中,於每個所述固晶臂中,所述抵壓支架的所述透光部呈鏤空狀,並且所述抵壓支架是以圍繞於所述透光部的一部位壓迫於所述晶片。The die bonding device according to claim 1, wherein in each of the die bonding arms, the light-transmitting portion of the pressing bracket is hollow, and the pressing bracket is surrounded by the A portion of the light-transmitting portion is pressed against the wafer. 如請求項1所述的固晶裝置,其中,多個所述固晶臂排列成多列固晶臂組,並且每列所述固晶臂組包含有至少兩個所述固晶臂且沿垂直所述預定路徑的一方向排列。The die-bonding device according to claim 1, wherein a plurality of the die-bonding arms are arranged in a plurality of columns of die-bonding arm groups, and each column of the die-bonding arm set includes at least two of the die-bonding arms along the lines of the die-bonding arms. are arranged in a direction perpendicular to the predetermined path. 如請求項1所述的固晶裝置,其中,任一個所述載體進一步限定為一天線,而任一個所述膠體進一步限定為一導電膠體,並且每個所述固晶臂的所述力量控制單元能驅使所述抵壓支架以所述預定力量壓迫於所述晶片,以使所述導電膠體受壓迫而電性耦接所述晶片與所述天線。The die bonding device of claim 1, wherein any one of the carriers is further defined as an antenna, and any one of the colloids is further defined as a conductive colloid, and the force of each of the die bonding arms is controlled The unit can drive the pressing support to press the chip with the predetermined force, so that the conductive glue is pressed to electrically couple the chip and the antenna. 一種固晶裝置,其包括: 多個固晶臂,間隔地排列設置,並且每個所述固晶臂包含有: 一抵壓支架,包含有一透光部,並且所述抵壓支架用來可移動地壓迫於一晶片;其中,所述晶片通過一膠體而設置於一載體上;及 一力量控制單元,連接於所述抵壓支架;其中,當所述抵壓支架壓迫於所述晶片時,所述力量控制單元能驅使所述抵壓支架以一預定力量壓迫於所述晶片,以使所述晶片通過所述膠體而連接於所述載體;以及 一光固化器,對應於多個所述固晶臂的所述透光部設置;其中,當每個所述固晶臂的所述抵壓支架以所述預定力量壓迫於所述晶片時,所述光固化器用來發射能穿過每個所述透光部而投射於所述晶片的一固化光線,以固化所述膠體。 A crystal-bonding device, comprising: A plurality of die-bonding arms are arranged at intervals, and each of the die-bonding arms comprises: a pressing support including a light-transmitting part, and the pressing support is used for movably pressing a chip; wherein, the chip is disposed on a carrier through a colloid; and a force control unit connected to the pressing support; wherein, when the pressing support presses the wafer, the force control unit can drive the pressing support to press the wafer with a predetermined force, to connect the wafer to the carrier through the gel; and A light curing device is disposed corresponding to the light-transmitting parts of the plurality of die-bonding arms; wherein, when the pressing support of each die-bonding arm presses the wafer with the predetermined force, The light curing device is used for emitting a curing light which can pass through each of the light-transmitting parts and project on the wafer, so as to cure the colloid.
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