TWI823702B - Device configured to push electronic substrate - Google Patents
Device configured to push electronic substrate Download PDFInfo
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- TWI823702B TWI823702B TW111146638A TW111146638A TWI823702B TW I823702 B TWI823702 B TW I823702B TW 111146638 A TW111146638 A TW 111146638A TW 111146638 A TW111146638 A TW 111146638A TW I823702 B TWI823702 B TW I823702B
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- 239000000758 substrate Substances 0.000 title claims abstract description 119
- 238000001179 sorption measurement Methods 0.000 claims description 21
- 238000005086 pumping Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 8
- 230000005540 biological transmission Effects 0.000 description 7
- 238000003475 lamination Methods 0.000 description 6
- 239000012790 adhesive layer Substances 0.000 description 5
- 239000012528 membrane Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 2
- 238000000407 epitaxy Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Sampling And Sample Adjustment (AREA)
- Die Bonding (AREA)
- Bipolar Transistors (AREA)
- Control And Other Processes For Unpacking Of Materials (AREA)
Abstract
Description
本發明是有關於一種頂推裝置,且特別是有關於一種頂推電子基板之裝置。The present invention relates to a pushing device, and in particular to a device for pushing an electronic substrate.
半導體元件通常是利用磊晶的方式成長於一成長基板上,但隨著半導體元件的各種不同應用的變化,半導體元件最終在成品上時未必會留在原先的成長基板上,而有可能會轉移至一轉移基板上,而最終再轉移至一目標基板上,而形成一最終的成品。Semiconductor components are usually grown on a growth substrate using epitaxy. However, as the various applications of semiconductor components change, the semiconductor components may not necessarily remain on the original growth substrate when they are finally placed on the finished product, but may be transferred. to a transfer substrate, and finally transferred to a target substrate to form a final product.
當欲將半導體元件從轉移基板轉移至目標基板時,有一種方法是將轉移基板與目標基板的正面互相面對,並壓合轉移基板與目標基板。習知的壓合方式是將轉移基板與目標基板利用機構對位後直接壓合,讓兩個基板的平面全面接觸。然而,兩個平面的共面狀態不易藉由機構調整,且轉移基板與目標基板的平面度要求高,因此製作費時且費用高。此外,用習知的壓合方式來壓合轉移基板與目標基板時,容易產生壓合力道不均勻的情形,而無法良好的掌控壓合的均勻度。When a semiconductor element is to be transferred from a transfer substrate to a target substrate, one method is to face the front surfaces of the transfer substrate and the target substrate to each other and press the transfer substrate and the target substrate together. The conventional lamination method is to align the transfer substrate and the target substrate using a mechanism and then laminate them directly so that the planes of the two substrates are in full contact. However, the coplanar state of the two planes is difficult to adjust mechanically, and the flatness requirements of the transfer substrate and the target substrate are high, so the production is time-consuming and expensive. In addition, when using conventional lamination methods to laminate the transfer substrate and the target substrate, uneven lamination force is likely to occur, and the uniformity of lamination cannot be well controlled.
本發明提供一種用以頂推電子基板之裝置,其可均勻地對電子基板施加頂推的壓力。The present invention provides a device for pushing an electronic substrate, which can apply pushing pressure uniformly to the electronic substrate.
本發明的一實施例提出一種用以頂推電子基板之裝置,其係包括一平台、一氣室、一抽氣泵及一吸附機構。平台係用以承載一電子基板,氣室係設置於平台承載電子基板之相對位置處。抽氣泵係與氣室連通,而可將外界之空氣抽入氣室內。吸附機構係設置於平台上,其可吸附固定承載於平台上之電子基板。An embodiment of the present invention provides a device for pushing an electronic substrate, which includes a platform, an air chamber, an air pump and an adsorption mechanism. The platform is used to carry an electronic substrate, and the air chamber is disposed at a relative position where the platform carries the electronic substrate. The air pump is connected with the air chamber and can pump outside air into the air chamber. The adsorption mechanism is arranged on the platform and can adsorb and fix the electronic substrate carried on the platform.
在本發明的實施例的用以頂推電子基板之裝置中,可以藉由抽氣泵將外界之空氣抽入氣室內,以使氣室內的空氣壓力可以頂推位於氣室上的電子基板。由於空氣的壓力在不同的位置上是均勻的,因此氣室內的空氣可以對電子基板均勻地施加頂推的壓力,以使電子基板與另一暫時貼附有電子元件的轉移基板均勻地壓合,進而提升電子元件與電子基板的電性接合良率。In the device for pushing the electronic substrate according to the embodiment of the present invention, external air can be drawn into the air chamber through an air pump, so that the air pressure in the air chamber can push the electronic substrate located on the air chamber. Since the pressure of the air is uniform at different locations, the air in the air chamber can evenly exert pushing pressure on the electronic substrate, so that the electronic substrate can be evenly pressed with another transfer substrate that is temporarily attached with electronic components. , thereby improving the electrical bonding yield of electronic components and electronic substrates.
圖1A、圖1B及圖1C依序為繪示本發明的一實施例的用以頂推電子基板之裝置在執行暫時基板與電子基板的壓合製程的流程的剖面示意圖。請參照圖1A、圖1B及圖1C,本實施例的用以頂推電子基板之裝置100,其係包括一平台110、一氣室120、一抽氣泵130及一吸附機構140。平台110係用以承載一電子基板50,氣室120係設置於平台110承載電子基板50之相對位置處。在本實施例中,氣室120例如為平台110上的凹陷,而當平台110承載電子基板50時,氣室120位於電子基板50下方。1A , 1B and 1C are schematic cross-sectional views in sequence illustrating the process of a device for pushing an electronic substrate during a lamination process of a temporary substrate and an electronic substrate according to an embodiment of the present invention. Referring to FIGS. 1A, 1B and 1C, the
抽氣泵130係與氣室120連通,而可將外界之空氣抽入氣室120內。在本實施例中,平台110上可具有氣體傳輸通道112,而設置於平台110外部的抽氣泵130可經由氣體傳輸通道112與氣室120連通。也就是說,外界之空氣被抽氣泵130抽入氣體傳輸通道112而被傳輸到氣室120中。The
吸附機構140係設置於平台110上,其可吸附固定承載於平台110上之電子基板50。在本實施例中,吸附機構140可為吸嘴、真空吸盤或其他具有吸附力的元件。藉吸附機構吸附平台110所承載之電子基板50,而於電子基板50與氣室120間形成一密閉空間122。具體而言,密閉空間122即為吸附機構吸附平台110所承載之電子基板50時,平台110上用以形成氣室120的凹陷與電子基板50所封閉而成的空間。The
當欲將一轉移基板60上的電子元件70轉移至電子基板50時,可依序進行圖1A至圖1C的步驟。轉移基板60上可藉由黏著層62貼附有電子元件70,電子元件70可為晶片,例如為發光二極體晶片、積體電路晶片或其他電子晶片。電子元件70上可以有接墊72。在本實施例中,多個電子元件70呈陣列地排列於轉移基板60上。另一方面,電子基板50上可設有接墊52,其電性連接至電子基板50上或內部的電路。欲將轉移基板上的電子元件70轉移至電子基板50時,可先執行如圖1A的步驟,在接墊52上形成凸塊54,例如是焊料凸塊或其他材質的凸塊,而後利用吸附機構140將電子基板50吸附於平台110上。When the
另一方面,利用一轉移平台220上的吸附機構230將轉移基板60吸附於轉移平台220上,並使轉移基板60上具有電子元件70的一側面向電子基板50。吸附機構230可為吸嘴、真空吸盤或其他具有吸附力的元件。On the other hand, an
接著,如圖1B所繪示的步驟,使轉移平台220與平台110靠近,而使轉移基板60上的電子元件70的接墊72接觸電子基板50上的凸塊54。此外,利用抽氣泵130將外界之空氣抽入氣室120內,以使密閉空間122中的氣壓上升,進而使空氣對電子基板50施加往上的均勻壓力。如此一來,轉移基板60與電子基板50便能夠被均勻地壓合,也就是不同的位置處的壓合力道大致上一致。Next, in the step shown in FIG. 1B , the
轉移平台220的中央設有一透光窗板210,透光窗板210的材質例如為石英或其他適當的透光材質。在轉移基板60與電子基板50被均勻地壓合時,一雷射產生器300可發出一雷射光束302。雷射光束302穿透透光窗板210而照射於接墊72與凸塊54的界面,以使凸塊54產生熔融。然後,關閉雷射光束302或將雷射光束302移動至下一個電子元件70的接墊72與凸塊54的位置,待凸塊54降溫後,接墊72與凸塊54便產生接合。在本實施例中,雷射光束302例如是紅外光束。然而,在其他實施例中,雷射光束302亦可以是可見光束或紫外光束。A light-transmitting
再來,執行如圖1C的步驟,使轉移平台220與平台110互相遠離,此時,接墊72與凸塊54的接合力會大於黏著層62與電子元件70的黏著力,因此電子元件70會脫離黏著層62而固定於電子基板50上的凸塊54上。如此一來,即完成將電子元件70從轉移基板60轉移至電子基板50的製程。Next, perform the steps as shown in FIG. 1C to move the
圖2為繪示本發明的另一實施例的用以頂推電子基板之裝置在類似圖1B的步驟的剖面示意圖。請參照圖2,本實施例的用以頂推電子基板之裝置100a與圖1B的用以頂推電子基板之裝置100類似,而兩者的差異在於,在本實施例的用以頂推電子基板之裝置100a中,氣室120上更設置有一撓性膜150,而於撓性膜150與氣室120間形成密閉空間122。也就是說,撓性膜150與平台110的凹陷封閉成密閉空間122,而當抽氣泵130將外界之空氣抽入氣室120內,以使密閉空間122中的氣壓上升時,撓性膜150被氣壓往上頂推,進而使撓性膜150對電子基板50施加往上的均勻的接觸力。FIG. 2 is a schematic cross-sectional view of a device for pushing an electronic substrate in steps similar to FIG. 1B according to another embodiment of the present invention. Please refer to Figure 2. The
圖3為繪示本發明的又一實施例的用以頂推電子基板之裝置在類似圖1A的步驟的剖面示意圖。請參照圖3,本實施例的用以頂推電子基板之裝置100b與圖1A的用以頂推電子基板之裝置100類似,而兩者的差異如下所述。在圖1A的用以頂推電子基板之裝置100中,吸附機構140是設置於平台110的頂面114。然而,在本實施例的用以頂推電子基板之裝置100a中,吸附機構140是設置於平台110的外側,而當吸附機構140吸附電子基板50時,電子基板50承靠於平台110的頂面114。在本實施例中,即使吸附機構140未位於平台110上,仍可視為平台110的一部分。FIG. 3 is a schematic cross-sectional view of a device for pushing an electronic substrate in steps similar to FIG. 1A according to another embodiment of the present invention. Referring to FIG. 3 , the
圖4為繪示本發明的又一實施例的用以頂推電子基板之裝置在類似圖1A的步驟的剖面示意圖。請參照圖4,本實施例的用以頂推電子基板之裝置100c與圖1A的用以頂推電子基板之裝置100類似,而兩者的差異如下所述。在本實施例的用以頂推電子基板之裝置100c中,吸附機構140是位於平台110的底部,其可包括抽氣泵144與位於平台110底部的氣體傳輸通道142。在類似於圖1A的步驟中,當將電子基板50放置於平台110上時,抽氣泵144可透過氣體傳輸通道142將密閉空間122中的空氣抽出至外界,以產生負壓,如此電子基板50便能夠被吸附在平台110上。FIG. 4 is a schematic cross-sectional view of a device for pushing an electronic substrate in steps similar to FIG. 1A according to another embodiment of the present invention. Referring to FIG. 4 , the
在一實施例中,平台110的頂面114上可設有一墊圈160,墊圈160位於電子基板50的邊緣與平台110的頂面114之間。墊圈160可具有彈性,墊圈160例如呈環狀而環繞氣室120的頂部,當電子基板50被吸附於平台110上時,墊圈會受到壓迫,進而確保了密閉空間122的密閉性。In one embodiment, a
在圖1A至圖1C、圖2及圖3的實施例中,電子基板50的邊緣與平台110的頂面114之間也可以設有墊圈160,以進一步確保密閉空間122的密閉性。In the embodiments of FIGS. 1A to 1C , 2 and 3 , a
綜上所述,在本發明的實施例的用以頂推電子基板之裝置中,可以藉由抽氣泵將外界之空氣抽入氣室內,以使氣室內的空氣壓力可以頂推位於氣室上的電子基板。由於空氣的壓力在不同的位置上是均勻的,因此氣室內的空氣可以對電子基板均勻地施加頂推的壓力,以使電子基板與另一暫時貼附有電子元件的轉移基板均勻地壓合,進而提升電子元件與電子基板的電性接合良率。To sum up, in the device for pushing the electronic substrate according to the embodiment of the present invention, the outside air can be sucked into the air chamber by the air pump, so that the air pressure in the air chamber can push the electronic substrate located on the air chamber. of electronic substrates. Since the pressure of the air is uniform at different locations, the air in the air chamber can evenly exert pushing pressure on the electronic substrate, so that the electronic substrate can be evenly pressed with another transfer substrate that is temporarily attached with electronic components. , thereby improving the electrical bonding yield of electronic components and electronic substrates.
50:電子基板
52、72:接墊
54:凸塊
60:轉移基板
62:黏著層
70:電子元件
100、100a、100b、100c:用以頂推電子基板之裝置
110:平台
112、142:氣體傳輸通道
114:頂面
120:氣室
122:密閉空間
130、144:抽氣泵
140、230:吸附機構
150:撓性膜
160:墊圈
210:透光窗板
220:轉移平台
300:雷射產生器
302:雷射光束50:
圖1A、圖1B及圖1C依序為繪示本發明的一實施例的用以頂推電子基板之裝置在執行暫時基板與電子基板的壓合製程的流程的剖面示意圖。 圖2為繪示本發明的另一實施例的用以頂推電子基板之裝置在類似圖1B的步驟的剖面示意圖。 圖3為繪示本發明的又一實施例的用以頂推電子基板之裝置在類似圖1A的步驟的剖面示意圖。 圖4為繪示本發明的又一實施例的用以頂推電子基板之裝置在類似圖1A的步驟的剖面示意圖。 1A , 1B and 1C are schematic cross-sectional views in sequence illustrating the process of a device for pushing an electronic substrate during a lamination process of a temporary substrate and an electronic substrate according to an embodiment of the present invention. FIG. 2 is a schematic cross-sectional view of a device for pushing an electronic substrate in steps similar to FIG. 1B according to another embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of a device for pushing an electronic substrate in steps similar to FIG. 1A according to another embodiment of the present invention. FIG. 4 is a schematic cross-sectional view of a device for pushing an electronic substrate in steps similar to FIG. 1A according to another embodiment of the present invention.
50:電子基板 50: Electronic substrate
52、72:接墊 52, 72: Pad
54:凸塊 54: Bump
60:轉移基板 60:Transfer substrate
62:黏著層 62:Adhesive layer
70:電子元件 70: Electronic components
100:用以頂推電子基板之裝置 100: Device used to push electronic substrates
110:平台 110:Platform
112:氣體傳輸通道 112:Gas transmission channel
120:氣室 120:Air chamber
122:密閉空間 122:Confined space
130:抽氣泵 130:Air pump
140、230:吸附機構 140, 230: Adsorption mechanism
210:透光窗板 210: Translucent window panel
220:轉移平台 220:Transfer platform
300:雷射產生器 300:Laser generator
302:雷射光束 302:Laser beam
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TWI494220B (en) * | 2009-07-24 | 2015-08-01 | Toray Eng Co Ltd | A bonding apparatus and method of a substrate, and a substrate bonded head |
TWI402171B (en) * | 2010-11-11 | 2013-07-21 | C Sun Mfg Ltd | Pressing device and pressing method thereof |
TWI564982B (en) * | 2011-04-26 | 2017-01-01 | 尼康股份有限公司 | A substrate holding device, a substrate bonding device, a substrate holding method, a substrate bonding method, a laminated semiconductor device, and a laminated substrate |
TW202135229A (en) * | 2020-02-27 | 2021-09-16 | 日商鎧俠股份有限公司 | Bonding apparatus and bonding method |
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TW202425202A (en) | 2024-06-16 |
CN118156205A (en) | 2024-06-07 |
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