TW202200816A - 濺鍍靶材及光學功能膜 - Google Patents
濺鍍靶材及光學功能膜 Download PDFInfo
- Publication number
- TW202200816A TW202200816A TW110119051A TW110119051A TW202200816A TW 202200816 A TW202200816 A TW 202200816A TW 110119051 A TW110119051 A TW 110119051A TW 110119051 A TW110119051 A TW 110119051A TW 202200816 A TW202200816 A TW 202200816A
- Authority
- TW
- Taiwan
- Prior art keywords
- film
- less
- component
- optical functional
- functional film
- Prior art date
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Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2020-093236 | 2020-05-28 | ||
JP2020093236 | 2020-05-28 | ||
JP2021086830A JP2021188133A (ja) | 2020-05-28 | 2021-05-24 | スパッタリングターゲット、および、光学機能膜 |
JP2021-086830 | 2021-05-24 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202200816A true TW202200816A (zh) | 2022-01-01 |
Family
ID=78744928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110119051A TW202200816A (zh) | 2020-05-28 | 2021-05-26 | 濺鍍靶材及光學功能膜 |
Country Status (2)
Country | Link |
---|---|
TW (1) | TW202200816A (fr) |
WO (1) | WO2021241687A1 (fr) |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003321771A (ja) * | 2002-02-28 | 2003-11-14 | Tosoh Corp | スパッタリングターゲットおよびその製造方法 |
JP4519431B2 (ja) * | 2003-08-26 | 2010-08-04 | 株式会社東芝 | 酸化膜形成用スパッタリングターゲットとそれを用いた酸化膜の製造方法 |
JP4443958B2 (ja) * | 2004-03-05 | 2010-03-31 | 日本板硝子株式会社 | 鏡およびその製造方法 |
KR101731847B1 (ko) * | 2011-07-01 | 2017-05-08 | 우베 마테리알즈 가부시키가이샤 | 스퍼터링용 MgO 타겟 |
DE102018112335A1 (de) * | 2018-05-23 | 2019-11-28 | Hartmetall-Werkzeugfabrik Paul Horn Gmbh | Magnetronsputtervorrichtung |
JP2020041217A (ja) * | 2018-09-07 | 2020-03-19 | 三菱マテリアル株式会社 | 光学機能膜、スパッタリングターゲット、及び、スパッタリングターゲットの製造方法 |
-
2021
- 2021-05-26 TW TW110119051A patent/TW202200816A/zh unknown
- 2021-05-27 WO PCT/JP2021/020200 patent/WO2021241687A1/fr active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2021241687A1 (fr) | 2021-12-02 |
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