TW202136916A - 感光性絕緣膜形成組成物 - Google Patents
感光性絕緣膜形成組成物 Download PDFInfo
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- TW202136916A TW202136916A TW109142984A TW109142984A TW202136916A TW 202136916 A TW202136916 A TW 202136916A TW 109142984 A TW109142984 A TW 109142984A TW 109142984 A TW109142984 A TW 109142984A TW 202136916 A TW202136916 A TW 202136916A
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- Prior art keywords
- group
- insulating film
- formula
- negative photosensitive
- photosensitive insulating
- Prior art date
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- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- GJBRNHKUVLOCEB-UHFFFAOYSA-N tert-butyl benzenecarboperoxoate Chemical compound CC(C)(C)OOC(=O)C1=CC=CC=C1 GJBRNHKUVLOCEB-UHFFFAOYSA-N 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical compound C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000009210 therapy by ultrasound Methods 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 125000002053 thietanyl group Chemical group 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 125000004306 triazinyl group Chemical group 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/12—Unsaturated polyimide precursors
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019223571 | 2019-12-11 | ||
| JP2019-223571 | 2019-12-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW202136916A true TW202136916A (zh) | 2021-10-01 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109142984A TW202136916A (zh) | 2019-12-11 | 2020-12-07 | 感光性絕緣膜形成組成物 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2021117586A1 (https=) |
| TW (1) | TW202136916A (https=) |
| WO (1) | WO2021117586A1 (https=) |
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| JP2021196482A (ja) * | 2020-06-12 | 2021-12-27 | 旭化成株式会社 | 低誘電正接化剤を含む感光性樹脂組成物 |
| JP7700536B2 (ja) * | 2021-06-25 | 2025-07-01 | 住友ベークライト株式会社 | ネガ型感光性ポリマー |
| TWI786979B (zh) * | 2021-09-03 | 2022-12-11 | 財團法人工業技術研究院 | 酸酐化合物、聚醯亞胺、與薄膜 |
| CN115745931B (zh) | 2021-09-03 | 2024-05-24 | 财团法人工业技术研究院 | 酸酐化合物、由其制得的聚酰亚胺与薄膜 |
| WO2026038508A1 (ja) * | 2024-08-13 | 2026-02-19 | 富士フイルム株式会社 | 感光性樹脂組成物、硬化物、積層体、硬化物の製造方法、積層体の製造方法、半導体デバイスの製造方法、半導体デバイス、樹脂、及び、酸二無水物 |
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| JP5125747B2 (ja) * | 2007-05-25 | 2013-01-23 | 東レ株式会社 | 感光性樹脂組成物 |
| KR101913997B1 (ko) * | 2009-12-04 | 2018-10-31 | 도레이 카부시키가이샤 | 감광성 수지 조성물, 그것을 이용한 적층체 및 고체 촬상 장치 |
| JP2012194534A (ja) * | 2011-02-28 | 2012-10-11 | Fujifilm Corp | 感光性組成物、感光性ソルダーレジスト組成物及び感光性ソルダーレジストフィルム、並びに、永久パターン、その形成方法及びプリント基板 |
| KR101901046B1 (ko) * | 2011-12-09 | 2018-09-20 | 아사히 가세이 이-매터리얼즈 가부시키가이샤 | 감광성 수지 조성물, 경화 릴리프 패턴의 제조 방법, 반도체 장치 및 표시체 장치 |
| JP6923334B2 (ja) * | 2016-04-14 | 2021-08-18 | 旭化成株式会社 | 感光性樹脂組成物及び硬化レリーフパターンの製造方法 |
-
2020
- 2020-12-03 WO PCT/JP2020/044951 patent/WO2021117586A1/ja not_active Ceased
- 2020-12-03 JP JP2021563897A patent/JPWO2021117586A1/ja active Pending
- 2020-12-07 TW TW109142984A patent/TW202136916A/zh unknown
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| Publication number | Publication date |
|---|---|
| WO2021117586A1 (ja) | 2021-06-17 |
| JPWO2021117586A1 (https=) | 2021-06-17 |
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