TW202128249A - Ultraviolet irradiation device - Google Patents

Ultraviolet irradiation device Download PDF

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TW202128249A
TW202128249A TW109134055A TW109134055A TW202128249A TW 202128249 A TW202128249 A TW 202128249A TW 109134055 A TW109134055 A TW 109134055A TW 109134055 A TW109134055 A TW 109134055A TW 202128249 A TW202128249 A TW 202128249A
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electrode block
irradiation device
excimer lamp
ultraviolet irradiation
lamp
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TW109134055A
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Chinese (zh)
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TWI825353B (en
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柳生英昭
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日商牛尾電機股份有限公司
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    • AHUMAN NECESSITIES
    • A61MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61NELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00Radiation therapy
    • A61N5/06Radiation therapy using light
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J65/00Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel

Abstract

Provided is an ultraviolet irradiation device having a significantly smaller size than structures of the prior art. The ultraviolet irradiation device is provided with: a lamp house having a light extraction surface formed on at least one surface thereof; an excimer lamp housed inside the lamp house at a position away from the light extraction surface in a first direction and emitting ultraviolet light; a first electrode block disposed in contact with the outer surface of an arc tube of the excimer lamp; a second electrode block disposed in contact with the outer surface of the arc tube of the excimer lamp at a position away from the first electrode block in a second direction parallel to the tube axis of the excimer lamp; and a reflection member which is disposed inside the lamp house at a position located on the opposite side from the light extraction surface in the first direction and between the first electrode block and the second electrode block in the second direction and contains a material which is reflective with respect to the ultraviolet light emitted from the excimer lamp.

Description

紫外線照射裝置Ultraviolet irradiation device

本發明係關於紫外線照射裝置。The present invention relates to an ultraviolet irradiation device.

先前,開發有作為光源具備準分子燈,小型的紫外線照射裝置(參照後述專利文獻1)。再者,後述專利文獻1中揭示的紫外線照射裝置係主要假定皮膚疾病的治療的用途。 [先前技術文獻] [專利文獻]Previously, a compact ultraviolet irradiation device equipped with an excimer lamp as a light source has been developed (refer to Patent Document 1 described later). In addition, the ultraviolet irradiation device disclosed in Patent Document 1 described below is mainly assumed to be used for the treatment of skin diseases. [Prior Technical Literature] [Patent Literature]

[專利文獻1]日本特開2017-164417號公報[Patent Document 1] JP 2017-164417 A

[發明所欲解決之課題][The problem to be solved by the invention]

圖15係模式揭示專利文獻1所揭示之小型的紫外線照射裝置的構造的圖式。紫外線照射裝置100係具備收容於包含握持部101之框體102內的燈管收容部103,與光照射窗104。於燈管收容部103內,內藏射出紫外線的準分子燈110。FIG. 15 is a diagram schematically showing the structure of the small ultraviolet irradiation device disclosed in Patent Document 1. As shown in FIG. The ultraviolet irradiation device 100 includes a lamp tube accommodating part 103 housed in a housing 102 including a holding part 101, and a light irradiation window 104. An excimer lamp 110 that emits ultraviolet rays is housed in the tube receiving portion 103.

圖16係模式揭示準分子燈110的構造的圖式。準分子燈110係具有圓筒狀的外側管121,與於外側管121的內側中配置於與外側管121的同軸上,內徑小於外側管121之圓筒狀的內側管122。外側管121與內側管122係於方向d1的端部中被密封,兩者之間構成圓環狀的發光空間,於該空間內封入發光氣體123G。FIG. 16 is a schematic diagram showing the structure of the excimer lamp 110. The excimer lamp 110 has a cylindrical outer tube 121, which is arranged on the inner side of the outer tube 121 coaxially with the outer tube 121 and has an inner diameter smaller than that of the cylindrical inner tube 122 of the outer tube 121. The outer tube 121 and the inner tube 122 are sealed in the ends in the direction d1, and an annular light-emitting space is formed between them, and the light-emitting gas 123G is enclosed in the space.

於外側管121的外壁面,設置有網狀或網格狀的外側電極124,於內側管122的內壁面,設置有由不鏽鋼或鋁所成之膜狀的內側電極125。外側電極124及內側電極125係分別與可產生高頻之交流電壓的電源部126電性連接。The outer wall surface of the outer tube 121 is provided with a mesh or mesh outer electrode 124, and the inner wall surface of the inner tube 122 is provided with a film-shaped inner electrode 125 made of stainless steel or aluminum. The outer electrode 124 and the inner electrode 125 are respectively electrically connected to a power supply unit 126 capable of generating a high frequency AC voltage.

藉由電源部126對外側電極124與內側電極125之間施加高頻之交流電壓,隔著外側管121與內側管122的管體對於發光氣體123G施加電壓,在封入發光氣體123G的放電空間內產生放電電漿。藉此激發發光氣體123G的原子,成為準分子狀態,該原子轉移至基底狀態時,會產生準分子發光。A high-frequency AC voltage is applied between the outer electrode 124 and the inner electrode 125 by the power supply unit 126, and a voltage is applied to the luminous gas 123G via the tube body of the outer tube 121 and the inner tube 122, and the discharge space is enclosed in the luminous gas 123G Generate discharge plasma. This excites the atoms of the luminescent gas 123G and becomes an excimer state. When the atoms transfer to the base state, excimer light will be generated.

然而,圖16所圖示的準分子燈110係如上所述,2種類的管體(121,122)配置於同軸上所成。因此,收容準分子燈110的框體102必須確保某種程度的大小。如上所述,專利文獻1所記載之紫外線照射裝置100係假定利用於皮膚疾病的治療,限制利用者及利用狀況,故至今即使是圖15所示的形狀、大小,實用上也不會成為大問題。However, the excimer lamp 110 illustrated in FIG. 16 is formed by arranging two types of tubes (121, 122) coaxially as described above. Therefore, the housing 102 that houses the excimer lamp 110 must ensure a certain size. As described above, the ultraviolet irradiation device 100 described in Patent Document 1 is assumed to be used in the treatment of skin diseases, restricting users and usage conditions, so even the shape and size shown in FIG. 15 have not become large in practice. problem.

但是,例如,一般消費者在家庭內,以對於廁所、廚房、浴室、鞋子中等,細菌比較容易繁殖的場所進行殺菌處理來說,可容易搬運程度的大小及重量為佳。假定利用於此種用途的話,作為光源具備圖16所示之準分子燈110的紫外線照射裝置100的構造中,有發生實用上問題的可能性。However, for example, for general consumers in their homes, to sterilize places where bacteria are more likely to multiply, such as toilets, kitchens, bathrooms, shoes, etc., the size and weight that can be easily carried are better. If it is used for such an application, the structure of the ultraviolet irradiation device 100 including the excimer lamp 110 shown in FIG. 16 as a light source may cause practical problems.

再者,在前述內容中有提到殺菌的用途,但是,不限於醫療現場,即使是利用於一般產業上的用途,只要實現小型的紫外線照射裝置的話,也可擴大可安裝處、可利用場所的範圍,故非常有效果。In addition, the use of sterilization is mentioned in the above content, but it is not limited to the medical field. Even if it is used in general industrial applications, as long as a small ultraviolet irradiation device is realized, the installation place and the available place can be expanded. The range is very effective.

本發明的課題係有鑑於前述的課題,目的為提供相較於先前構造大幅小型化的紫外線照射裝置。 [用以解決課題之手段]The subject of the present invention is in view of the foregoing subject, and the object is to provide an ultraviolet irradiation device that is significantly downsized compared to the previous structure. [Means to solve the problem]

本發明的紫外線照射裝置,其特徵為具備: 燈室,係於至少一面形成光取出面; 準分子燈,係於前述燈室內,收容於對於前述光取出面隔開於第一方向的位置,發出紫外線; 第一電極塊,係以接觸前述準分子燈的發光管之外表面的方式配置; 第二電極塊,係以於對於前述第一電極塊隔開於與前述準分子燈之管軸平行的第二方向的位置中,接觸前述準分子燈的發光管之外表面的方式配置;及 反射構件,係配置於前述燈室內在前述第一方向中前述光取出面相反側,且在前述第二方向中前述第一電極塊與前述第二電極塊之間的位置,包含顯示對於從前述準分子燈射出之紫外線的反射性的材料。The ultraviolet irradiation device of the present invention is characterized by having: The lamp room is connected to at least one side to form a light extraction surface; The excimer lamp is located in the lamp chamber, and is housed in a position spaced apart from the light extraction surface in a first direction, and emits ultraviolet rays; The first electrode block is arranged in such a way as to contact the outer surface of the luminous tube of the aforementioned excimer lamp; The second electrode block is arranged in a position spaced apart from the first electrode block in a second direction parallel to the tube axis of the excimer lamp and in contact with the outer surface of the light-emitting tube of the excimer lamp; and The reflecting member is arranged in the lamp chamber on the opposite side of the light extraction surface in the first direction, and at a position between the first electrode block and the second electrode block in the second direction, including the display The reflective material of the ultraviolet rays emitted by the excimer lamp.

前述紫外線照射裝置,係具備接觸準分子燈的發光管之外表面的第一電極塊與第二電極塊。該等電極塊係分別於隔開於準分子燈之管軸方向的位置中與準分子燈的發光管之外表面接觸。因此,準分子燈係可藉由簡單之直管型的構造來進行放電,故不需要採用作為先前的準分子燈所一般利用之同心圓狀地管體被雙重設置而在內側管與外側管之間密封發光氣體的構造,即所謂「雙重管構造」。The aforementioned ultraviolet irradiation device includes a first electrode block and a second electrode block contacting the outer surface of the arc tube of the excimer lamp. The electrode blocks are in contact with the outer surface of the luminous tube of the excimer lamp in positions separated from the tube axis direction of the excimer lamp, respectively. Therefore, the excimer lamp can be discharged by a simple straight tube structure, so there is no need to use a concentric tube that is generally used as a conventional excimer lamp. The structure in which the luminescent gas is sealed is the so-called "double tube structure".

作為一例,前述紫外線照射裝置所具備之準分子燈的發光管的大小,係分別管軸方向(第二方向)的長度為15mm以上、200mm以下,外徑為2mm以上、16mm以下。As an example, the size of the arc tube of the excimer lamp included in the aforementioned ultraviolet irradiation device is such that the length in the tube axis direction (second direction) is 15 mm or more and 200 mm or less, and the outer diameter is 2 mm or more and 16 mm or less.

對第一電極塊與第二電極塊之間施加電壓的話,主要在位於該電極塊之間的準分子燈的發光管內發光。藉由該發光所生成的紫外線,係行進於光取出面側的話,會通過光取出面,被取出至紫外線照射裝置的外側。When a voltage is applied between the first electrode block and the second electrode block, light is mainly emitted in the arc tube of the excimer lamp located between the electrode blocks. If the ultraviolet rays generated by the light emission travel to the light extraction surface side, they will pass through the light extraction surface and be extracted to the outside of the ultraviolet irradiation device.

但是,所生成的紫外線並不是全部都朝向光取出面行進,一部分的紫外線會往光取出面相反方向行進。該紫外線係不會從光取出面被取出,又,照射至燈室的框體的話,有使框體劣化之虞。However, not all of the generated ultraviolet rays travel toward the light extraction surface, and some ultraviolet rays travel in the opposite direction of the light extraction surface. This ultraviolet system is not taken out from the light extraction surface, and if it is irradiated to the frame of the lamp house, the frame may be degraded.

相對於此,前述紫外線照射裝置係於燈室內,在光取出面相反側,且各電極塊之間的位置設置反射構件。因此,在第二方向中被電極塊挾持的區域內,以準分子燈生成而往光取出面相反側行進的紫外線係藉由反射構件反射,將行進方向變更為光取出面側。所以,可提升光取出效率,並且可抑制燈室的框體劣化。On the other hand, the aforementioned ultraviolet irradiation device is installed in the lamp chamber, and a reflection member is provided at a position between the electrode blocks on the opposite side of the light extraction surface. Therefore, in the region sandwiched by the electrode block in the second direction, the ultraviolet rays generated by the excimer lamp and traveling to the opposite side of the light extraction surface are reflected by the reflective member, and the traveling direction is changed to the light extraction surface side. Therefore, the light extraction efficiency can be improved, and the deterioration of the frame of the lamp chamber can be suppressed.

前述反射構件作為呈板形狀者亦可,作為具有沿著前述準分子燈的發光管之外表面的曲面者亦可。The reflection member may have a plate shape, or may have a curved surface along the outer surface of the arc tube of the excimer lamp.

前述反射構件,係由絕緣性材料所成,以接觸前述第一電極塊的與前述第二電極塊對向之面、及前述第二電極塊的與前述第一電極塊對向之面雙方的方式配置亦可。The reflective member is made of an insulating material so as to contact both the surface of the first electrode block facing the second electrode block and the surface of the second electrode block facing the first electrode block. The configuration is also possible.

依據相關構造,可增加藉由反射構件反射之紫外線的光量。According to the related structure, the amount of ultraviolet light reflected by the reflective member can be increased.

作為顯示絕緣性與對於紫外線的反射性之反射構件的材料,可利用氟樹脂、陶瓷等。作為反射構件的更具體範例,可採用陶瓷材料所成的構件、聚四氟乙烯(PTFE)所成的構件、於陶瓷或樹脂所成的構件之表面形成SiO2 、Al2 O3 等所成之陶瓷微粒子的構件、於玻璃等的基板之表面形成介電體多層膜等的陶瓷系之反射層的構件等。As the material of the reflective member exhibiting insulation and reflectivity to ultraviolet rays, fluororesin, ceramics, etc. can be used. As a more specific example of the reflective member, a member made of ceramic material, a member made of polytetrafluoroethylene (PTFE), a member made of ceramic or resin formed on the surface of SiO 2 , Al 2 O 3, etc. can be used The components of ceramic fine particles, the components of ceramic reflective layers such as dielectric multilayer films formed on the surface of substrates such as glass, etc.

前述反射構件,係以從前述光取出面相反側,於前述第一方向覆蓋位於前述第二方向中被前述第一電極塊與前述第二電極塊挾持的區域之前述準分子燈的部分之方式配置亦可。The reflecting member covers the part of the excimer lamp in the region sandwiched between the first electrode block and the second electrode block in the second direction in the first direction from the side opposite to the light extraction surface The configuration is also possible.

依據相關構造,可實質上防止對於位於光取出面相反側之燈室的框體的區域,照射紫外線。又,被兩電極塊挾持的間隔部分以絕緣性的反射構件埋填,故於準分子燈的發光管的外側中在兩電極之間非常難發生放電,有可抑制臭氧的產生的效果。產生臭氧的話,有產生的臭氧會讓燈室的框體劣化之虞。依據前述構造,可抑制臭氧的產生,故可更抑制框體的劣化的進行。According to the related structure, it is possible to substantially prevent ultraviolet rays from being irradiated to the area of the frame of the lamp chamber located on the opposite side of the light extraction surface. In addition, the space between the two electrode blocks is filled with an insulating reflective member. Therefore, it is very difficult for discharge to occur between the two electrodes on the outside of the arc tube of the excimer lamp, which has the effect of suppressing the generation of ozone. If ozone is generated, the generated ozone may degrade the frame of the lamp house. According to the aforementioned structure, the generation of ozone can be suppressed, and therefore, the progress of the deterioration of the frame can be suppressed more.

具有以隔開於與前述第一方向及前述第二方向正交的第三方向之方式配置的複數前述準分子燈;前述第一電極塊及前述第二電極塊,係以一邊接觸複數前述準分子燈之各別的發光管的外表面,一邊橫跨複數前述準分子燈之方式配置;前述反射構件,係以於前述第一方向中與所有複數前述準分子燈對向的位置中,覆蓋前述第二方向中被前述第一電極塊與前述第二電極塊挾持的區域之方式配置亦可。There are a plurality of the excimer lamps arranged in a third direction orthogonal to the first direction and the second direction; the first electrode block and the second electrode block are in contact with the plurality of standard The outer surfaces of the respective luminous tubes of the molecular lamps are arranged in such a way that one side crosses the plurality of the aforementioned excimer lamps; the aforementioned reflecting member is arranged to cover the positions opposite to all the plurality of the aforementioned excimer lamps in the first direction The area sandwiched by the first electrode block and the second electrode block in the second direction may also be arranged.

依據相關構造,於燈室內搭載複數準分子燈,故可從光取出面射出高輸出的紫外線。然後,於各準分子燈中,以覆蓋對於被兩電極塊挾持的區域對向於第一方向的區域之方式,設置反射構件,故可將更大量的光線導引至光取出面。According to the related structure, a plurality of excimer lamps are installed in the lamp chamber, so high-output ultraviolet rays can be emitted from the light extraction surface. Then, in each excimer lamp, a reflective member is provided to cover an area facing the first direction with respect to the area sandwiched by the two electrode blocks, so that a larger amount of light can be guided to the light extraction surface.

前述反射構件,係以接觸前述第一電極塊及前述第二電極塊雙方之與前述第一方向正交之面的方式配置亦可。The reflecting member may be arranged so as to contact the surfaces orthogonal to the first direction of both the first electrode block and the second electrode block.

依據相關構造,即使在搬運紫外線照射裝置之狀況中,反射構件在燈室內也難以發生位置偏離。According to the related structure, even when the ultraviolet irradiation device is transported, it is difficult for the reflecting member to deviate in position in the lamp chamber.

前述準分子燈,係發出屬於主要發光波長屬於190nm以上、225nm以下之波長帶的紫外線亦可。The aforementioned excimer lamp may emit ultraviolet light that belongs to the wavelength band above 190nm and below 225nm.

公知DNA係在波長260nm附近顯示最高的吸收特性。因此,從低壓水銀燈等射出之波長254nm的紫外線係具有殺菌作用,另一方面,有對於人體的不良影響之虞。It is known that DNA exhibits the highest absorption characteristics around a wavelength of 260 nm. Therefore, ultraviolet light with a wavelength of 254 nm emitted from a low-pressure mercury lamp or the like has a bactericidal effect. On the other hand, it may have an adverse effect on the human body.

但是,主要發光波長屬於190nm以上、225 nm以下之波長帶的紫外線係假設即使對於人體的皮膚照射,也會在皮膚的角質層被吸收,不會行進至比其還內側(基底層側)。包含於角質層的角質細胞係作為細胞為死亡狀態,故例如像被照射波長254nm的紫外線之狀況,幾乎不存在被有棘層、顆粒層、真皮等活著的細胞吸收而導致破壞DNA的風險。However, ultraviolet rays whose main emission wavelengths belong to the wavelength band of 190 nm or more and 225 nm or less are assumed to be absorbed in the stratum corneum of the skin even if they are irradiated to the skin of the human body and do not travel to the inner side (basal layer side). The keratinocyte cell line contained in the stratum corneum is in a dead state as a cell, so for example, when irradiated with ultraviolet light with a wavelength of 254nm, there is almost no risk of being absorbed by living cells such as the spinous layer, granular layer, and dermis, leading to damage to DNA. .

又,關於該190nm以上、225nm以下之波長帶的紫外線,也存在對於照射對象物的殺菌效果。因此,利用具備發出相關波長帶之紫外線的準分子燈,可一邊將對於人體的影響抑制成最小限度,一邊利用於對於對象物的殺菌處理之用途。此種波長帶的紫外線可藉由封入包含KrCl、KrBr、或ArF之發光氣體的準分子燈所生成。In addition, the ultraviolet rays in the wavelength band of 190 nm or more and 225 nm or less have a sterilization effect on the irradiated object. Therefore, the excimer lamp that emits ultraviolet light in the relevant wavelength band can be used for sterilization treatment of objects while minimizing the impact on the human body. Ultraviolet rays in this wavelength band can be generated by an excimer lamp containing luminescent gas containing KrCl, KrBr, or ArF.

再者,於本說明書中「主要發光波長」係指在發射光譜上規定對於某波長λ±10nm的波長區域Z(λ)之狀況中,對於發射光譜內的所有積分強度顯示40%以上的積分強度的波長區域Z(λi)之波長λi。例如像封入包含KrCl、KrBr、ArF的發光氣體的準分子燈等,半寬度非常狹窄,且僅於特定波長中顯示光強度的光源中,通常將相對強度最高的波長(主要峰值波長),作為主要發光波長亦可。Furthermore, in this specification, the "main emission wavelength" refers to a situation where the emission spectrum specifies the wavelength region Z(λ) for a certain wavelength λ±10nm, and all the integrated intensity in the emission spectrum shows an integral of more than 40% The wavelength λi of the intensity wavelength zone Z(λi). For example, an excimer lamp with luminous gas containing KrCl, KrBr, ArF, etc., has a very narrow half-width and only displays light intensity at a specific wavelength. Usually, the wavelength with the highest relative intensity (the main peak wavelength) is used as The main emission wavelength is also acceptable.

前述反射構件,係配置於前述第一方向中從前述第一電極塊及前述第二電極塊雙方隔開的位置亦可。 [發明的效果]The reflecting member may be arranged at a position separated from both the first electrode block and the second electrode block in the first direction. [Effects of the invention]

依據本發明的紫外線照射裝置,可相較於先前構造大幅小型化。The ultraviolet irradiation device according to the present invention can be greatly miniaturized compared with the previous structure.

針對本發明的紫外線照射裝置的實施形態,適當參照圖式來進行說明。再者,以下的各圖式係模式圖示者,圖式上的尺寸比與實際的尺寸比不一定一致。又,於各圖式之間,尺寸比不一定一致。The embodiment of the ultraviolet irradiation device of the present invention will be described with reference to the drawings as appropriate. In addition, each of the following drawings is a schematic diagram, and the size ratio on the drawing does not necessarily match the actual size ratio. Moreover, the size ratios are not necessarily the same among the various drawings.

圖1係模式揭示紫外線照射裝置之外觀的立體圖。圖2係從圖1分解紫外線照射裝置1的燈室2之本體殼體部2a與蓋子部2b的立體圖。Fig. 1 is a perspective view schematically showing the appearance of the ultraviolet irradiation device. Fig. 2 is a perspective view of the main body housing portion 2a and the cover portion 2b of the lamp chamber 2 of the ultraviolet irradiation device 1 disassembled from Fig. 1.

在以下的各圖中,參照將紫外線L1的取出方向設為X方向,將與X方向正交的平面設為YZ平面,參照X-Y-Z座標系進行說明。更詳細來說,如參照圖2之後的圖式所後述般,將準分子燈3的管軸方向設為Y方向,將與X方向及Y方向正交的方向設為Z方向。X方向對應「第一方向」,Y方向對應「第二方向」,Z方向對應「第三方向」。In each of the following figures, the description will be made with reference to the X direction as the extraction direction of the ultraviolet rays L1, the YZ plane as the plane orthogonal to the X direction, and the X-Y-Z coordinate system. In more detail, as will be described later with reference to the drawings following FIG. 2, the tube axis direction of the excimer lamp 3 is set to the Y direction, and the direction orthogonal to the X direction and the Y direction is set to the Z direction. The X direction corresponds to the "first direction", the Y direction corresponds to the "second direction", and the Z direction corresponds to the "third direction".

又,在以下的說明中,在表現方向時區別正負的朝向時,如「+X方向」、「-X方向」般,附加正負的符號記載。又,在不區別正負的朝向來表現方向時,僅記載為「X方向」。亦即,於本說明書中,在僅記載為「X方向」時,包含「+X方向」與「-X方向」雙方。關於Y方向及Z方向也相同。In addition, in the following description, when the direction of expression is distinguished between positive and negative directions, it is described with positive and negative signs like "+X direction" and "-X direction". In addition, when expressing directions without distinguishing between positive and negative directions, only the "X direction" is described. That is, in this specification, when only the "X direction" is described, both the "+X direction" and the "-X direction" are included. The same applies to the Y direction and the Z direction.

如圖1及圖2所示,紫外線照射裝置1係具備於一方之面形成光取出面10的燈室2。燈室2係具備本體殼體部2a與蓋子部2b,於本體殼體部2a內,收容準分子燈3、電極塊(11,12)、反射構件8。再者,在本實施形態中,舉出於燈室2內收容4根準分子燈3(3a,3b,3c,3d)之狀況為例進行說明(參照圖3),但是,準分子燈3的數量即使1根亦可,2根、3根或5根以上亦可。電極塊(11,12)係構成用以對於各準分子燈3供電的電極。As shown in FIGS. 1 and 2, the ultraviolet irradiation device 1 includes a lamp chamber 2 in which a light extraction surface 10 is formed on one surface. The lamp chamber 2 includes a main body housing portion 2a and a cover portion 2b, and an excimer lamp 3, electrode blocks (11, 12), and a reflecting member 8 are housed in the main body housing portion 2a. In addition, in the present embodiment, a situation where four excimer lamps 3 (3a, 3b, 3c, 3d) are housed in the lamp chamber 2 will be described as an example (refer to FIG. 3). However, the excimer lamp 3 The number can be one, two, three, or more than five. The electrode blocks (11, 12) constitute electrodes for supplying power to each excimer lamp 3.

在本實施形態中,如圖2所示,於構成構成燈室2之一部分的蓋子部2b的光取出面10的區域,設置光學濾光片21。關於該光學濾光片21的特性,於後敘述。In the present embodiment, as shown in FIG. 2, an optical filter 21 is provided in a region constituting the light extraction surface 10 of the cover portion 2 b constituting a part of the lamp chamber 2. The characteristics of the optical filter 21 will be described later.

圖3及圖4係從圖2省略構成燈室2之一部分的本體殼體部2a的圖示,僅圖示電極塊(11,12)、準分子燈3(3a,3b,3c,3d)及反射構件8的立體圖。圖3與圖4僅觀察角度不同。又,圖5係從圖4進而省略準分子燈3及反射構件8的圖示的立體圖。Figures 3 and 4 omit the illustration of the main body portion 2a constituting a part of the lamp chamber 2 from Figure 2 and only show the electrode blocks (11, 12) and the excimer lamp 3 (3a, 3b, 3c, 3d) And a perspective view of the reflective member 8. Figure 3 and Figure 4 differ only in viewing angles. In addition, FIG. 5 is a perspective view of the excimer lamp 3 and the reflection member 8 further omitted from FIG. 4.

如圖3及圖4所示,本實施形態的紫外線照射裝置1係具備隔開於Z方向配置的4根準分子燈3(3a,3b,3c,3d)。又,以接觸各準分子燈3的發光管之外表面的方式,配置2個電極塊(11,12)。以下,適當將電極塊11稱為「第一電極塊11」,將電極塊12稱為「第二電極塊12」。As shown in FIGS. 3 and 4, the ultraviolet irradiation device 1 of the present embodiment includes four excimer lamps 3 (3a, 3b, 3c, 3d) arranged in the Z direction. In addition, two electrode blocks (11, 12) are arranged so as to contact the outer surface of the arc tube of each excimer lamp 3. Hereinafter, the electrode block 11 is appropriately referred to as the "first electrode block 11", and the electrode block 12 is referred to as the "second electrode block 12".

第一電極塊11與第二電極塊12係配置於隔開於Y方向的位置。在圖5所示的範例中,第一電極塊11係具有呈沿著準分子燈3的發光管之外表面的曲面的形狀且載置準分子燈3的載置區域11a,與形成於對於準分子燈3隔離於Z方向的位置,對於YZ平面傾斜的錐面11b所構成。同樣地,關於第二電極塊12,也具有載置區域12a與錐面12b。The first electrode block 11 and the second electrode block 12 are arranged at positions spaced apart in the Y direction. In the example shown in FIG. 5, the first electrode block 11 has a curved shape along the outer surface of the luminous tube of the excimer lamp 3 and the placement area 11a where the excimer lamp 3 is placed, and is formed in the opposite The excimer lamp 3 is isolated from a position in the Z direction, and is constituted by a tapered surface 11b inclined with respect to the YZ plane. Similarly, the second electrode block 12 also has a mounting area 12a and a tapered surface 12b.

再者,第一電極塊11與第二電極塊12係由導電性材料所成,更理想為顯示對於從準分子燈3射出的紫外線之反射性的材料所成。作為一例,第一電極塊11與第二電極塊12都以Al、Al合金、不鏽鋼等構成。Furthermore, the first electrode block 11 and the second electrode block 12 are made of a conductive material, and more desirably are made of a material showing reflectivity to ultraviolet rays emitted from the excimer lamp 3. As an example, both the first electrode block 11 and the second electrode block 12 are made of Al, Al alloy, stainless steel, or the like.

第一電極塊11與第二電極塊12係任一都以一邊接觸各準分子燈3(3a,3b,3c,3d)的發光管之外表面,一邊在Z方向中跨越各準分子燈3的方式配置。The first electrode block 11 and the second electrode block 12 are both in contact with the outer surface of the luminous tube of each excimer lamp 3 (3a, 3b, 3c, 3d) while straddling each excimer lamp 3 in the Z direction. Way to configure.

圖6係模式揭示準分子燈3、電極塊(11,12)及反射構件8的位置關係的圖面,對應從+Z方向觀察準分子燈3時的模式俯視圖。又,圖7係模式揭示準分子燈3、電極塊(11,12)及反射構件8的位置關係的圖面,對應從+X方向觀察準分子燈3時的模式俯視圖。FIG. 6 is a schematic diagram showing the positional relationship of the excimer lamp 3, the electrode blocks (11, 12), and the reflective member 8, and corresponds to a schematic plan view of the excimer lamp 3 when viewed from the +Z direction. 7 is a schematic diagram showing the positional relationship of the excimer lamp 3, the electrode blocks (11, 12), and the reflective member 8, and corresponds to a schematic plan view when the excimer lamp 3 is viewed from the +X direction.

再者,在圖6中,僅圖示4根準分子燈3(3a,3b,3c,3d)中,位於最靠-Z側的準分子燈3a,省略其他準分子燈(3b,3c,3d)的圖示,如上所述,關於準分子燈(3b,3c,3d),並排於+Z方向。Furthermore, in FIG. 6, only the four excimer lamps 3 (3a, 3b, 3c, 3d) are shown, the excimer lamp 3a located on the most -Z side, and the other excimer lamps (3b, 3c, As shown in 3d), the excimer lamps (3b, 3c, 3d) are arranged in the +Z direction as described above.

反射構件8係包含顯示對於從準分子燈射出的紫外線L1之反射性的材料。反射構件8係進而顯示絕緣性及對於紫外線L1的高耐性為佳。作為表示此種特性的反射構件8,可採用例如由陶瓷材料所成的構件、由聚四氟乙烯(PTFE)等地氟樹脂所成的構件、於陶瓷或樹脂所成的構件之表面形成SiO2 、Al2 O3 等所成之陶瓷微粒子的構件、於玻璃等的基板之表面形成介電體多層膜等的陶瓷系之反射層的構件等。The reflective member 8 includes a material showing reflectivity to ultraviolet rays L1 emitted from the excimer lamp. The reflective member 8 system further preferably exhibits insulation and high resistance to ultraviolet rays L1. As the reflecting member 8 that expresses such characteristics, for example, a member made of ceramic materials, a member made of fluororesin such as polytetrafluoroethylene (PTFE), and a member made of ceramic or resin can be formed with SiO on the surface. 2. Ceramic fine particles made of Al 2 O 3, etc., and a ceramic reflective layer such as a dielectric multilayer film formed on the surface of a substrate such as glass.

於本實施形態中,反射構件8係以在Y方向中電極塊(11,12)之間的位置中,一部分接觸準分子燈3的發光管之外表面的方式配置。更詳細來說,如圖7所示,反射構件8係以在Y方向中被電極塊(11,12)挾持的區域中,在Z方向中橫跨所有準分子燈3之方式配置。藉此,於+X方向觀察準分子燈3時,被電極塊(11,12)挾持的區域係被反射構件8遮蔽,準分子燈3之發光管的外表面不會露出。In this embodiment, the reflecting member 8 is arranged so that a part of the position between the electrode blocks (11, 12) in the Y direction contacts the outer surface of the arc tube of the excimer lamp 3. In more detail, as shown in FIG. 7, the reflective member 8 is arranged so as to straddle all the excimer lamps 3 in the Z direction in a region sandwiched by the electrode blocks (11, 12) in the Y direction. Thereby, when the excimer lamp 3 is viewed in the +X direction, the area pinched by the electrode blocks (11, 12) is shielded by the reflective member 8, and the outer surface of the luminous tube of the excimer lamp 3 will not be exposed.

又,反射構件8係以接觸第一電極塊11的第二電極塊12側之面11c、及第二電極塊12的第一電極塊11側之面12c雙方的方式配置。但是,如上所述,反射構件8係由絕緣性材料所成,故第一電極塊11與第二電極塊12之間不會短路。In addition, the reflective member 8 is arranged so as to contact both the surface 11c of the first electrode block 11 on the second electrode block 12 side and the surface 12c of the second electrode block 12 on the first electrode block 11 side. However, as described above, the reflective member 8 is made of an insulating material, so there is no short circuit between the first electrode block 11 and the second electrode block 12.

準分子燈3係具有將Y方向設為管軸方向的發光管,於隔開於Y方向的位置中,準分子燈3的發光管之外表面接觸於各電極塊(11,12)。於準分子燈3的發光管,封入發光氣體3G。對各電極塊(11,12)之間施加例如10kHz~5MHz程度之高頻的交流電壓的話,則會透過準分子燈3的發光管,對於發光氣體3G施加前述電壓。此時,在封入發光氣體3G的放電空間內產生放電電漿,而激發發光氣體3G的原子,成為準分子狀態,該原子轉移至基底狀態時,會產生準分子發光。The excimer lamp 3 has a luminous tube with the Y direction as the tube axis direction. In a position spaced apart from the Y direction, the outer surface of the luminous tube of the excimer lamp 3 is in contact with each electrode block (11, 12). In the luminous tube of the excimer lamp 3, luminous gas 3G is enclosed. If a high-frequency AC voltage of, for example, about 10 kHz to 5 MHz is applied between the electrode blocks (11, 12), the arc tube of the excimer lamp 3 is passed through, and the aforementioned voltage is applied to the luminous gas 3G. At this time, discharge plasma is generated in the discharge space enclosed with the luminescent gas 3G, and the atoms of the luminescent gas 3G are excited to be in an excimer state. When the atoms are transferred to the base state, excimer light emission is generated.

從準分子燈3射出之紫外線L1的波長係依存於發光氣體3G的物質來決定。例如,作為發光氣體3G而包含KrCl時,從準分子燈3射出之紫外線L1係表示主要峰值波長為222nm附近的光譜(參照圖8)。The wavelength of the ultraviolet light L1 emitted from the excimer lamp 3 is determined depending on the substance of the luminescent gas 3G. For example, when KrCl is included as the luminescent gas 3G, the ultraviolet light L1 emitted from the excimer lamp 3 shows a spectrum with a main peak wavelength around 222 nm (see FIG. 8).

作為發光氣體3G,除了KrCl之外,可利用KrBr、ArF等。在發光氣體3G包含KrBr時,從準分子燈3係射出主要峰值波長為207nm附近的紫外線L1。在發光氣體3G包含ArF時,從準分子燈3係射出主要峰值波長為193nm附近的紫外線L1。於該等任一氣體種中,從準分子燈3係生成主要峰值波長屬於190nm以上、225nm以下的波長帶的紫外線L1。再者,除了前述的氣體種之外,混合氬(Ar)、氖(Ne)等的惰性氣體亦可。As the luminescent gas 3G, in addition to KrCl, KrBr, ArF, etc. can be used. When the luminescent gas 3G contains KrBr, ultraviolet rays L1 with a main peak wavelength around 207 nm are emitted from the excimer lamp 3 system. When the luminescent gas 3G contains ArF, ultraviolet rays L1 with a main peak wavelength around 193 nm are emitted from the excimer lamp 3 system. In any of these gas species, the excimer lamp 3 generates ultraviolet light L1 whose main peak wavelength belongs to a wavelength band of 190 nm or more and 225 nm or less. Furthermore, in addition to the aforementioned gas species, an inert gas such as argon (Ar) and neon (Ne) may be mixed.

於發光氣體3G包含KrCl時,如圖8所示,於紫外線L1的光譜,光輸出幾乎集中於主要峰值波長即222nm附近,但是,關於被掛念對於人體的影響之240nm以上的波長帶,雖然只有微量也確認到光輸出。因此,於構成光取出面10的區域,以遮斷相關波長帶之光成分為目的,設置光學濾光片21。也就是說,光學濾光片21具有遮斷240nm以上、300nm以下之紫外線的功能。When the luminescent gas 3G contains KrCl, as shown in Fig. 8, in the spectrum of ultraviolet L1, the light output is almost concentrated near 222nm, which is the main peak wavelength. However, the wavelength band above 240nm, which is concerned about the effect on the human body, is only The light output was also confirmed for a small amount. Therefore, in the region constituting the light extraction surface 10, an optical filter 21 is provided for the purpose of blocking light components in the relevant wavelength band. In other words, the optical filter 21 has a function of blocking ultraviolet rays of 240 nm or more and 300 nm or less.

圖9係圖6的部分放大圖。再者,於圖9模式附加紫外線L1的行進之樣子。Fig. 9 is a partial enlarged view of Fig. 6. Furthermore, in the mode of FIG. 9, the progress of the ultraviolet light L1 is added.

對兩電極塊(11,12)之間施加電壓的話,如上所述,封入於準分子燈3的發光管的發光氣體3G會發光。藉由該發光所產生的紫外線L1中,行進於+X方向的紫外線L1a係直接從光取出面10射出至紫外線照射裝置1的外部。另一方面,紫外線L1中行進於-X方向的紫外線L1b係藉由反射構件8反射,將行進方向變更成+X方向之後,同樣地,從光取出面10射出至紫外線照射裝置1的外部。When a voltage is applied between the two electrode blocks (11, 12), as described above, the luminous gas 3G enclosed in the arc tube of the excimer lamp 3 emits light. Among the ultraviolet rays L1 generated by this light emission, the ultraviolet rays L1a traveling in the +X direction are directly emitted from the light extraction surface 10 to the outside of the ultraviolet irradiation device 1. On the other hand, the ultraviolet rays L1b traveling in the −X direction among the ultraviolet rays L1 are reflected by the reflecting member 8 and the traveling direction is changed to the +X direction, and then similarly emitted from the light extraction surface 10 to the outside of the ultraviolet irradiation device 1.

假設未設置反射構件8之狀況中,紫外線L1b係行進於-X方向,都會照射至燈室2的框體。結果,紫外線L1b係不會從紫外線照射裝置1被取出之外,有促使燈室2的框體劣化之虞。依據紫外線照射裝置1,設置有反射構件8,故可提升從光取出面10取出之紫外線L1的取出效率,並且可抑制燈室2的框體劣化。Assuming that in a situation where the reflecting member 8 is not provided, the ultraviolet rays L1b travel in the -X direction, and all are irradiated to the frame of the lamp house 2. As a result, the ultraviolet rays L1b are not taken out from the ultraviolet irradiation device 1 and may promote the deterioration of the frame of the lamp chamber 2. According to the ultraviolet irradiation device 1, the reflective member 8 is provided, so the extraction efficiency of the ultraviolet L1 extracted from the light extraction surface 10 can be improved, and the deterioration of the frame of the lamp chamber 2 can be suppressed.

[實施例] 利用Y方向中被電極塊(11,12)挾持的區域內設置反射構件8,驗證對於從紫外線照射裝置1取出之紫外線L1的照度之影響。[Example] The reflection member 8 is installed in the area pinched by the electrode blocks (11, 12) in the Y direction to verify the influence on the illuminance of the ultraviolet L1 taken out from the ultraviolet irradiation device 1.

準備4根於管軸方向(Y方向)的長度70mm、外徑ϕ6mm的管體,作為發光氣體3G,封入Kr、Cl2 、Ar、及Ne的混合氣體的準分子燈3。然後,使該等4根準分子燈3,接觸於Y方向隔開7mm配置之Al製的電極塊(11,12)。再者,各準分子燈3彼此之Z方向的間隔距離設為14mm。Prepare 4 tubes with a length of 70 mm and an outer diameter of ϕ 6 mm in the tube axis direction (Y direction) as the luminous gas 3G, and an excimer lamp 3 filled with a mixed gas of Kr, Cl 2, Ar, and Ne. Then, the four excimer lamps 3 were brought into contact with the electrode blocks (11, 12) made of Al which were arranged 7 mm apart in the Y direction. In addition, the distance between each excimer lamp 3 in the Z direction is set to 14 mm.

在前述條件下,將峰值約4kV、頻率70kHz的交流電壓施加於電極塊(11,12)之間,使各準分子燈3產生介電體屏障放電,利用照度計測定從光取出面10於+X方向離開20mm之4根準分子燈3之中央的位置之照度。Under the aforementioned conditions, an AC voltage with a peak value of about 4kV and a frequency of 70kHz was applied between the electrode blocks (11, 12) to cause each excimer lamp 3 to generate a dielectric barrier discharge. The illuminance at the center of the 4 excimer lamps 3 that is 20mm away from the +X direction.

在相關條件下,在將由PTFE所成,具有X方向×Y方向×Z方向為21mm×7mm×65mm之尺寸的反射構件8,參照圖3~圖7配置於如上所述的位置之狀況,與未配置反射構件8之狀況中,比較照度。並於表1揭示其結果。Under relevant conditions, in a situation where the reflecting member 8 made of PTFE with dimensions of 21mm×7mm×65mm in the X direction×Y direction×Z direction is arranged in the above-mentioned position with reference to Figs. 3-7, and In a situation where the reflecting member 8 is not arranged, the illuminance is compared. The results are shown in Table 1.

Figure 02_image001
Figure 02_image001

依據表1,可知利用設置反射構件8,光線的取出效率提升,照射面上之照度提升24%。According to Table 1, it can be seen that by providing the reflective member 8, the light extraction efficiency is improved, and the illuminance on the irradiated surface is increased by 24%.

再者,反射構件8係配置於從準分子燈3的發光管之外表面隔開於-X方向的位置亦可。作為一例,如圖10所示,反射構件8以跨越第一電極塊11的-X側之面11d,與第二電極塊12的-X側之間12d的方式配置亦可。作為其他一例,如圖11所示,電極塊(11,12)係分別具有切口部(11e,12e),以於該切口部(11e,12e)的位置嵌入反射構件8之方式配置亦可。Furthermore, the reflecting member 8 may be arranged at a position separated from the outer surface of the arc tube of the excimer lamp 3 in the −X direction. As an example, as shown in FIG. 10, the reflective member 8 may be arranged so as to straddle the surface 11d on the -X side of the first electrode block 11 and 12d between the -X side of the second electrode block 12. As another example, as shown in FIG. 11, the electrode blocks (11, 12) have cutouts (11e, 12e), respectively, and may be arranged such that the reflective member 8 is inserted into the position of the cutouts (11e, 12e).

作為其他範例,反射構件8係如圖12所示,與電極塊(11,12)相同,具有沿著準分子燈3的發光管之外表面的曲面亦可。依據圖12,反射構件8係以可嵌入各準分子燈3(3a,3b,3c,3d)之方式,具有呈沿著準分子燈3(3a,3b,3c,3d)的發光管之外表面的形狀之形狀的凹部(8a,8b,8c,8d)。該反射構件8係利用配置於Y方向的電極塊(11,12)之間,於電極塊(11,12)之間的位置中,在與準分子燈3密接的狀態下配置反射構件8(參照圖13)。圖13係仿效圖10及圖11,模式揭示配置圖12所示之形狀的反射構件8時的樣態的俯視圖。As another example, the reflective member 8 is shown in FIG. 12, and the same as the electrode blocks (11, 12), it may have a curved surface along the outer surface of the luminous tube of the excimer lamp 3. According to Fig. 12, the reflective member 8 can be embedded in each excimer lamp 3 (3a, 3b, 3c, 3d), and has a shape along the excimer lamp 3 (3a, 3b, 3c, 3d) outside the luminous tube Concavities (8a, 8b, 8c, 8d) of the shape of the surface. The reflecting member 8 is arranged between the electrode blocks (11, 12) in the Y direction. The reflecting member 8 ( Refer to Figure 13). FIG. 13 is a plan view which imitates FIG. 10 and FIG. 11 and schematically shows the state when the reflection member 8 of the shape shown in FIG. 12 is arranged.

如此藉由以由絕緣性構件所成的反射構件8密接的電極塊(11,12)之間,於準分子燈3之外側的位置中,可在電極塊(11,12)之間抑制放電,藉此可防止臭氧的產生。In this way, between the electrode blocks (11, 12) closely contacted with the reflective member 8 made of an insulating member, the discharge can be suppressed between the electrode blocks (11, 12) in a position outside the excimer lamp 3 , Which can prevent the generation of ozone.

再者,根據圖6、圖10、及圖11所示之反射構件8的配置樣態,抑制準分子燈3之外側的位置之放電的發生的效果雖然相較於圖12所示的配置樣態,效果降低,但是可確認道一定程度。Furthermore, according to the configuration of the reflecting member 8 shown in FIGS. 6, 10, and 11, the effect of suppressing the occurrence of discharge at a position outside the excimer lamp 3 is compared to the configuration shown in FIG. 12 The effect is reduced, but it can be confirmed to a certain extent.

[其他實施形態] 以下,針對其他實施形態進行說明。[Other embodiments] Hereinafter, other embodiments will be described.

<1>在前述實施形態中,已說明第一電極塊11及第二電極塊12都具有錐面(11a,11b)。但是,於本發明中,各電極塊是否具有錐面可設為任意。亦即,如圖12所示之反射構件8的形狀,嵌入準分子燈3之處以外的部分以平坦面構成亦可。<1> In the foregoing embodiment, it has been described that both the first electrode block 11 and the second electrode block 12 have tapered surfaces (11a, 11b). However, in the present invention, whether or not each electrode block has a tapered surface can be arbitrarily set. That is, in the shape of the reflecting member 8 shown in FIG. 12, the part other than the place where the excimer lamp 3 is inserted may be formed with a flat surface.

<2>於紫外線照射裝置1具備複數根準分子燈3的狀況中,2根以上的準分子燈3的X方向相關之配置位置變位亦可。<2> In a situation where the ultraviolet irradiation device 1 includes a plurality of excimer lamps 3, the arrangement positions of two or more excimer lamps 3 in the X direction may be displaced.

<3>於前述實施形態中,已說明紫外線照射裝置1係於光取出面10設置光學濾光片21者,但是,於本發明中紫外線照射裝置1是否具備光學濾光片21可設為任意。尤其,在對於人體照射紫外線L1的可能性無限低的狀況中設置紫外線照射裝置1時,不設置光學濾光片21亦可。<3> In the foregoing embodiment, it has been described that the ultraviolet irradiation device 1 is provided with the optical filter 21 on the light extraction surface 10. However, in the present invention, whether the ultraviolet irradiation device 1 is equipped with the optical filter 21 can be arbitrarily set. . In particular, when the ultraviolet irradiation device 1 is installed in a situation where the possibility of irradiating the ultraviolet L1 to the human body is infinitely low, the optical filter 21 may not be installed.

又,在前述實施形態中,已針對從紫外線照射裝置1射出之紫外線L1的主要發光波長屬於190nm以上、225nm以下的波長帶之狀況進行說明,但是,本發明並不排除發出主要發光波長超過225nm的紫外線者。例如,紫外線照射裝置1係具備發光氣體3G使用XeCl,發出顯示主要峰值波長為307nm之紫外線L1的準分子燈3者亦可。In addition, in the foregoing embodiment, the situation in which the main emission wavelength of the ultraviolet light L1 emitted from the ultraviolet irradiation device 1 belongs to the wavelength band of 190 nm or more and 225 nm or less has been described. However, the present invention does not exclude that the main emission wavelength exceeds 225 nm. The ultraviolet ones. For example, the ultraviolet irradiation device 1 may include an excimer lamp 3 that emits ultraviolet light L1 with a main peak wavelength of 307 nm using XeCl as the luminous gas 3G.

<4>在前述實施形態中,已針對反射構件8接觸第一電極塊11與第二電極塊12雙方之狀況進行說明。但是,本發明並未排除反射構件8未接觸各電極塊(11,12)之狀況。<4> In the foregoing embodiment, the situation in which the reflective member 8 contacts both the first electrode block 11 and the second electrode block 12 has been described. However, the present invention does not exclude the situation that the reflective member 8 does not contact the electrode blocks (11, 12).

例如,於圖6中,反射構件8以於兩電極塊(11,12)之間的位置中,不接觸面11c及12c之方式配置亦可。For example, in FIG. 6, the reflective member 8 may be arranged in a position between the two electrode blocks (11, 12) so as not to contact the surfaces 11c and 12c.

又,作為其他範例,如圖14所示,反射構件8作為配置於對於各電極塊(11,12)隔開於-X方向的位置者亦可。此時,反射構件8作為固定於燈室2的框體之內側者亦可。As another example, as shown in FIG. 14, the reflective member 8 may be arranged at a position spaced apart from each electrode block (11, 12) in the -X direction. At this time, the reflection member 8 may be fixed to the inner side of the frame of the lamp house 2.

1:紫外線照射裝置 2:燈室 2a:本體殼體部 2b:蓋子部 3:準分子燈 3a,3b,3c,3d:準分子燈 3G:發光氣體 8:反射構件 8a,8b,8c,8d:凹部 10:光取出面 11:第一電極塊 11a:載置區域 11b:錐面 11c,11d:第一電極塊之面 11e:第一電極塊的切口部 12:第二電極塊 12a:載置區域 12b:錐面 12c,12d:第二電極塊之面 12e:第二電極塊的切口部 21:光學濾光片 100:紫外線照射裝置 101:握持部 102:框體 103:燈管收容部 104:光照射窗 110:準分子燈 121:外側管 122:內側管 123G:發光氣體 124:外側電極 125:內側電極 126:電源部 L1:紫外線 L1a:紫外線 L1b:紫外線1: Ultraviolet irradiation device 2: Light room 2a: body shell part 2b: Lid 3: Excimer lamp 3a, 3b, 3c, 3d: Excimer lamp 3G: luminous gas 8: Reflective member 8a, 8b, 8c, 8d: recess 10: Light take-out surface 11: The first electrode block 11a: Placement area 11b: Cone 11c, 11d: the surface of the first electrode block 11e: Cutout of the first electrode block 12: The second electrode block 12a: Placement area 12b: Cone 12c, 12d: the surface of the second electrode block 12e: Cut out of the second electrode block 21: Optical filter 100: Ultraviolet irradiation device 101: Grip 102: Frame 103: Light tube receiving part 104: light irradiation window 110: Excimer light 121: Outer tube 122: Inside tube 123G: Luminous gas 124: Outer electrode 125: inner electrode 126: Power Supply Department L1: Ultraviolet L1a: Ultraviolet L1b: Ultraviolet

[圖1]模式揭示紫外線照射裝置之外觀的立體圖。 [圖2]從圖1分解紫外線照射裝置的燈室之本體殼體部與蓋子部的立體圖。 [圖3]模式揭示紫外線照射裝置所具備之電極塊、準分子燈及反射構件的構造的立體圖。 [圖4]從圖3變更視點的立體圖。 [圖5]從圖4省略準分子燈及反射構件的圖示,模式揭示電極塊的構造的立體圖。 [圖6]Z方向觀察圖3的立體圖時的模式俯視圖。 [圖7]從光取出面相反側X方向觀察圖3的立體圖時的模式俯視圖。 [圖8]發光氣體包含KrCl的準分子燈的發射光譜之一例。 [圖9]於圖6的一部分放大圖,附加紫外線的進行之樣子的圖式。 [圖10]模式揭示反射構件的其他配置樣態的俯視圖。 [圖11]模式揭示反射構件的其他配置樣態的俯視圖。 [圖12]模式揭示反射構件的其他樣態的立體圖。 [圖13]模式揭示圖12的形狀之反射構件時的樣態的俯視圖。 [圖14]模式揭示反射構件的其他配置樣態的俯視圖。 [圖15]模式揭示先前之小型的紫外線照射裝置的構造的圖式。 [圖16]模式揭示搭載於圖15所示之紫外線照射裝置的準分子燈之構造的圖面。[Fig. 1] A schematic perspective view showing the appearance of the ultraviolet irradiation device. [Fig. 2] A perspective view of the main body housing part and the cover part of the lamp chamber of the ultraviolet irradiation device disassembled from Fig. 1. [FIG. 3] A perspective view schematically showing the structure of an electrode block, an excimer lamp, and a reflective member included in the ultraviolet irradiation device. [Fig. 4] A perspective view with a changed viewpoint from Fig. 3. [Fig. 5] The illustration of the excimer lamp and the reflecting member is omitted from Fig. 4, and a perspective view schematically showing the structure of the electrode block. [Fig. 6] A schematic plan view when the perspective view of Fig. 3 is viewed in the Z direction. [FIG. 7] A schematic plan view when the perspective view of FIG. 3 is viewed from the X direction on the opposite side of the light extraction surface. [Figure 8] An example of the emission spectrum of an excimer lamp in which the luminescent gas contains KrCl. [Fig. 9] A diagram showing the progress of ultraviolet rays is added to a part of the enlarged view of Fig. 6. [Fig. 10] A top view schematically showing other configurations of the reflective member. [FIG. 11] A top view schematically showing another configuration of the reflective member. [Fig. 12] A schematic perspective view showing other aspects of the reflective member. [FIG. 13] A plan view schematically showing the state of the reflective member in the shape of FIG. 12. [FIG. 14] A top view schematically showing another configuration of the reflective member. [Fig. 15] A schematic diagram showing the structure of a conventional compact ultraviolet irradiation device. [FIG. 16] A schematic diagram showing the structure of an excimer lamp mounted on the ultraviolet irradiation device shown in FIG. 15.

1:紫外線照射裝置 1: Ultraviolet irradiation device

2:燈室 2: Light room

10:光取出面 10: Light take-out surface

L1:紫外線 L1: Ultraviolet

Claims (10)

一種紫外線照射裝置,其特徵為具備: 燈室,係於至少一面形成光取出面; 準分子燈,係於前述燈室內,收容於對於前述光取出面隔開於第一方向的位置,發出紫外線; 第一電極塊,係以接觸前述準分子燈的發光管之外表面的方式配置; 第二電極塊,係以於對於前述第一電極塊隔開於與前述準分子燈之管軸平行的第二方向的位置中,接觸前述準分子燈的發光管之外表面的方式配置;及 反射構件,係配置於前述燈室內在前述第一方向中前述光取出面相反側,且在前述第二方向中前述第一電極塊與前述第二電極塊之間的位置,包含顯示對於從前述準分子燈射出之紫外線的反射性的材料。An ultraviolet irradiation device, which is characterized by having: The lamp room is connected to at least one side to form a light extraction surface; The excimer lamp is located in the lamp chamber, and is housed in a position spaced apart from the light extraction surface in a first direction, and emits ultraviolet rays; The first electrode block is arranged in such a way as to contact the outer surface of the luminous tube of the aforementioned excimer lamp; The second electrode block is arranged in a position spaced apart from the first electrode block in a second direction parallel to the tube axis of the excimer lamp and in contact with the outer surface of the light-emitting tube of the excimer lamp; and The reflecting member is arranged in the lamp chamber on the opposite side of the light extraction surface in the first direction, and at a position between the first electrode block and the second electrode block in the second direction, including the display The reflective material of the ultraviolet rays emitted by the excimer lamp. 如請求項1所記載之紫外線照射裝置,其中, 前述反射構件,係由絕緣性材料所成,以接觸前述第一電極塊的與前述第二電極塊對向之面、及前述第二電極塊的與前述第一電極塊對向之面雙方的方式配置。The ultraviolet irradiation device described in claim 1, wherein: The reflective member is made of an insulating material so as to contact both the surface of the first electrode block facing the second electrode block and the surface of the second electrode block facing the first electrode block. Mode configuration. 如請求項2所記載之紫外線照射裝置,其中, 前述反射構件,係以從前述光取出面相反側,於前述第一方向覆蓋位於前述第二方向中被前述第一電極塊與前述第二電極塊挾持的區域之前述準分子燈的部分之方式配置。The ultraviolet irradiation device described in claim 2, wherein: The reflecting member covers the part of the excimer lamp in the region sandwiched between the first electrode block and the second electrode block in the second direction in the first direction from the side opposite to the light extraction surface Configuration. 如請求項3所記載之紫外線照射裝置,其中, 具有以隔開於與前述第一方向及前述第二方向正交的第三方向之方式配置的複數前述準分子燈; 前述第一電極塊及前述第二電極塊,係以一邊接觸複數前述準分子燈之各別的發光管的外表面,一邊橫跨複數前述準分子燈之方式配置; 前述反射構件,係以於前述第一方向中與所有複數前述準分子燈對向的位置中,覆蓋前述第二方向中被前述第一電極塊與前述第二電極塊挾持的區域之方式配置。The ultraviolet irradiation device described in claim 3, wherein: Having a plurality of the aforementioned excimer lamps arranged in a manner of being spaced apart in a third direction orthogonal to the aforementioned first direction and the aforementioned second direction; The first electrode block and the second electrode block are arranged in such a way that they touch the outer surfaces of the respective luminous tubes of the plurality of excimer lamps while straddling the plurality of excimer lamps; The reflecting member is arranged in a position opposite to all of the excimer lamps in the first direction to cover an area sandwiched by the first electrode block and the second electrode block in the second direction. 如請求項2至4中任一項所記載之紫外線照射裝置,其中, 前述反射構件,係以接觸前述第一電極塊及前述第二電極塊雙方之與前述第一方向正交之面的方式配置。The ultraviolet irradiation device described in any one of claims 2 to 4, wherein: The reflecting member is arranged so as to contact a surface orthogonal to the first direction of both the first electrode block and the second electrode block. 如請求項2至4中任一項所記載之紫外線照射裝置,其中, 前述反射構件,係配置於前述第一方向中從前述第一電極塊及前述第二電極塊雙方隔開的位置。The ultraviolet irradiation device described in any one of claims 2 to 4, wherein: The reflecting member is arranged at a position separated from both the first electrode block and the second electrode block in the first direction. 如請求項1至6中任一項所記載之紫外線照射裝置,其中, 前述反射構件,係呈板形狀。The ultraviolet irradiation device described in any one of claims 1 to 6, wherein: The aforementioned reflecting member is in the shape of a plate. 如請求項1至4中任一項所記載之紫外線照射裝置,其中, 前述反射構件,係具有沿著前述準分子燈的發光管之外表面的曲面。The ultraviolet irradiation device described in any one of claims 1 to 4, wherein: The reflecting member has a curved surface along the outer surface of the arc tube of the excimer lamp. 如請求項1至8中任一項所記載之紫外線照射裝置,其中, 前述反射構件,係由氟樹脂或陶瓷所成。The ultraviolet irradiation device described in any one of claims 1 to 8, wherein: The aforementioned reflecting member is made of fluororesin or ceramics. 如請求項1至9中任一項所記載之紫外線照射裝置,其中, 前述準分子燈,係發出屬於主要發光波長屬於190nm以上、225nm以下之波長帶的紫外線。The ultraviolet irradiation device described in any one of claims 1 to 9, wherein: The aforementioned excimer lamp emits ultraviolet rays whose main emission wavelength belongs to the wavelength band above 190nm and below 225nm.
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CN114342042A (en) 2022-04-12

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