TW202108790A - Template for supporting mask, producing method of template for supporting mask and producing method of mask integrated frame - Google Patents
Template for supporting mask, producing method of template for supporting mask and producing method of mask integrated frame Download PDFInfo
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Abstract
Description
發明領域Invention field
本發明涉及掩模支撐模板、掩模支撐模板的製造方法及框架一體型掩模的製造方法。更具體地,本發明涉及一種使掩模不發生變形且可穩定地得到支撐並移動,且能夠準確地對準(align)各掩模的掩模支撐模板、掩模支撐模板的製造方法及框架一體型掩模的製造方法。The invention relates to a mask support template, a method for manufacturing a mask support template, and a method for manufacturing a frame-integrated mask. More specifically, the present invention relates to a mask support template, a method for manufacturing a mask support template, and a frame that enables the mask to not deform, can be stably supported and moved, and can accurately align each mask. Manufacturing method of integrated mask.
發明背景Background of the invention
作為OLED製造工藝中形成像素的技術,主要使用FMM(Fine Metal Mask,精細金屬掩模)方法,該方法將薄膜形式的金屬掩模(Shadow Mask,陰影掩模)緊貼到基板且在所需位置上蒸鍍有機物。As a technology for forming pixels in the OLED manufacturing process, the FMM (Fine Metal Mask) method is mainly used, which attaches a thin-film metal mask (Shadow Mask) to the substrate and is Evaporate organic matter on the position.
在現有的OLED製造工藝中,將掩模製造成條狀、板狀等後,將掩模焊接固定到OLED像素蒸鍍框架上並使用。一個掩模上可以具備與一個顯示器對應的多個單元。另外,為了製造大面積OLED,可將多個掩模固定於OLED像素蒸鍍框架,在固定於框架的過程中,拉伸各個掩模,以使其變得平坦。調節拉伸力以使掩模的整體部分變得平坦是非常困難的作業。尤其為了一邊使各單元都平坦化且一邊對準尺寸為數~數十μm的掩模圖案,需要進行如下高難度作業:一邊細微地調節施加於掩模各側的拉伸力,一邊即時地確認對準狀態。In the existing OLED manufacturing process, after the mask is manufactured into a strip shape, a plate shape, etc., the mask is welded and fixed to the OLED pixel evaporation frame and used. One mask may have a plurality of cells corresponding to one display. In addition, in order to manufacture a large-area OLED, a plurality of masks can be fixed to the OLED pixel evaporation frame, and in the process of fixing to the frame, each mask is stretched to make it flat. It is a very difficult task to adjust the stretching force to flatten the entire part of the mask. Especially in order to flatten each cell and align the mask pattern with a size of several to tens of μm, it is necessary to perform the following difficult work: finely adjust the tensile force applied to each side of the mask while checking immediately Alignment status.
儘管如此,在將多個掩模固定於一個框架過程中,仍然存在掩模之間及掩模單元之間對準不好的問題。另外,在將掩模焊接固定於框架的過程中,掩模膜的厚度過薄且面積大,因此存在掩模因荷重而下垂或者扭曲的問題;由於焊接過程中在焊接部分產生的皺紋、毛刺(burr)等,導致掩模單元的對準不準的問題等。Nevertheless, in the process of fixing a plurality of masks to a frame, there is still a problem of poor alignment between the masks and between the mask units. In addition, in the process of welding and fixing the mask to the frame, the thickness of the mask film is too thin and the area is large, so there is a problem of the mask sagging or twisting due to the load; due to wrinkles and burrs generated in the welding part during the welding process (burr), etc., causing the problem of inaccurate alignment of the mask unit.
在超高畫質的OLED中,現有QHD畫質為500-600PPI(pixel per inch,每英寸像素),像素的尺寸達到約30-50μm,而4K UHD、8K UHD高畫質具有比其更高的~860PPI、~1600PPI等的分辨率。如此,考慮到超高畫質的OLED的像素尺寸,需要將各單元之間的對準誤差縮減為數μm左右,超出這一誤差將導致產品的不良,所以收率可能極低。因此,需要開發能夠防止掩模的下垂或者扭曲等變形並使對準精確的技術以及將掩模固定於框架的技術等。Among the ultra-high-quality OLEDs, the existing QHD image quality is 500-600PPI (pixel per inch, pixels per inch), and the pixel size reaches about 30-50μm, while 4K UHD and 8K UHD have higher image quality. Resolutions of ~860PPI, ~1600PPI, etc. In this way, considering the pixel size of the ultra-high-quality OLED, the alignment error between each unit needs to be reduced to a few μm. Exceeding this error will lead to product failure, so the yield may be extremely low. Therefore, it is necessary to develop a technique that can prevent deformation such as sagging or twisting of the mask and make the alignment accurate, and a technique that fixes the mask to the frame, and the like.
技術問題technical problem
因此,本發明為了解決如上所述的現有技術的各種問題而提出,其目的在於提供一種可使掩模不發生變形且穩定地得到支撐並移動,而且可防止掩模發生下垂或者扭曲等變形,並可準確地對準的掩模支撐模板、掩模支撐模板的製造方法及框架一體型掩模的製造方法。Therefore, the present invention is proposed in order to solve the various problems of the prior art as described above, and its object is to provide a mask that can be supported and moved stably without deformation, and can prevent the mask from sagging or twisting. The mask support template, the manufacturing method of the mask support template and the manufacturing method of the frame-integrated mask can be accurately aligned.
此外,本發明的目的在於提供一種可明顯縮短製造時間並顯著提高收率的框架一體型掩模的製造方法。 技術方案In addition, an object of the present invention is to provide a method for manufacturing a frame-integrated mask that can significantly shorten the manufacturing time and significantly improve the yield. Technical solutions
本發明的上述目的通過掩模支撐模板來實現,該模板(template)用於支撐OLED像素形成用掩模並將該掩模對應到框架上,該掩模支撐模板包括:模板;臨時黏合部,其形成在模板上;以及掩模,其通過夾設臨時黏合部黏合在模板上且形成有掩模圖案,模板的熱膨脹係數低於掩模。The above-mentioned object of the present invention is achieved by a mask support template, which is used to support the OLED pixel forming mask and correspond to the mask on the frame. The mask support template includes: a template; a temporary bonding part, It is formed on a template; and a mask, which is adhered to the template by interposing a temporary adhesive part and is formed with a mask pattern, and the thermal expansion coefficient of the template is lower than that of the mask.
掩模的熱膨脹係數可以至少大於1。The thermal expansion coefficient of the mask may be at least greater than 1.
模板的熱膨脹係數可以小於1(大於0)。The thermal expansion coefficient of the template can be less than 1 (greater than 0).
臨時黏合部可以為基於加熱可分離的黏合劑、基於照射UV可分離的黏合劑。The temporary adhesive part may be an adhesive that can be separated by heating or an adhesive that can be separated by UV irradiation.
臨時黏合部可以為液蠟。The temporary bonding part may be liquid wax.
常溫下掩模可以被施以側面方向的拉伸力的狀態黏合到模板上。At room temperature, the mask can be adhered to the template by applying a tensile force in the lateral direction.
另外,本發明的上述目的通過掩模支撐模板的製造方法來實現,該模板用於支撐OLED像素形成用掩模並將該掩模對應到框架上,該方法包括:(a)準備一面形成有臨時黏合部的模板的步驟;(b)將工藝溫度上升到至少高於常溫,並將掩模金屬膜黏合到模板上的步驟;(c)使工藝溫度下降的步驟;以及(d)通過在掩模金屬膜上形成掩模圖案來製造掩模的步驟,模板的熱膨脹係數低於掩模。In addition, the above-mentioned object of the present invention is achieved by a method for manufacturing a mask support template, which is used to support the OLED pixel forming mask and correspond to the mask on the frame, the method includes: (a) preparing a surface with The step of temporarily bonding the template of the part; (b) the step of raising the process temperature to at least higher than normal temperature and bonding the mask metal film to the template; (c) the step of lowering the process temperature; and (d) the step of In the step of forming a mask pattern on the mask metal film to manufacture the mask, the thermal expansion coefficient of the template is lower than that of the mask.
掩模的熱膨脹係數可至少大於1,且模板的熱膨脹係數可小於1(大於0)。The thermal expansion coefficient of the mask may be at least greater than 1, and the thermal expansion coefficient of the template may be less than 1 (greater than 0).
臨時黏合部可以為基於加熱可分離的黏合劑、基於照射UV可分離的黏合劑。The temporary adhesive part may be an adhesive that can be separated by heating or an adhesive that can be separated by UV irradiation.
臨時黏合部可以為液蠟。The temporary bonding part may be liquid wax.
如果在步驟(a)中使工藝溫度下降,則模板的收縮將小於掩模的收縮,從而掩模可被施以側面方向的拉伸力。If the process temperature is lowered in step (a), the shrinkage of the template will be smaller than the shrinkage of the mask, so that the mask can be applied with a tensile force in the lateral direction.
另外,本發明的上述目的通過掩模支撐模板的製造方法來實現,該模板用於支撐OLED像素形成用掩模並將該掩模對應到框架上,該方法包括:(a)準備一面形成有臨時黏合部的模板的步驟;(b)將工藝溫度上升到至少高於常溫,並將形成有掩模圖案的掩模黏合到模板上的步驟;以及(c)使工藝溫度下降的步驟,模板的熱膨脹係數低於掩模。In addition, the above-mentioned object of the present invention is achieved by a method for manufacturing a mask support template, which is used to support the OLED pixel forming mask and correspond to the mask on the frame, the method includes: (a) preparing a surface with The step of temporarily bonding the template of the part; (b) the step of raising the process temperature to at least higher than normal temperature, and bonding the mask with the mask pattern formed on the template; and (c) the step of lowering the process temperature, the template The coefficient of thermal expansion is lower than that of the mask.
另外,本發明的上述目的通過框架一體型掩模的製造方法來實現,該框架一體型掩模由至少一個掩模與用於支撐掩模的框架一體形成,該方法包括:(a)準備一面形成有臨時黏合部的模板的步驟;(b)將工藝溫度上升到至少高於常溫,並將掩模金屬膜黏合到模板上的步驟;以及(c)使工藝溫度下降的步驟;(d)通過在掩模金屬膜上形成掩模圖案來製造掩模的步驟;(e)將模板裝載到具有至少一個掩模單元區域的框架上,並將掩模對應到框架的掩模單元區域的步驟;以及(f)將掩模附著到框架上的步驟,模板的熱膨脹係數低於掩模。 另外,本發明的上述目的通過框架一體型掩模的製造方法來實現,該框架一體型掩模由至少一個掩模與用於支撐掩模的框架一體形成,該方法包括:(a)將一面黏合有掩模的模板轉裝載到具有至少一個掩模單元區域的框架上,並將掩模對應到框架的掩模單元區域的步驟;以及(b)將掩模附著到框架上的步驟,模板的熱膨脹係數低於掩模。 有益效果In addition, the above-mentioned object of the present invention is achieved by a method for manufacturing a frame-integrated mask. The frame-integrated mask is integrally formed by at least one mask and a frame for supporting the mask. The method includes: (a) preparing a surface The step of forming the template with the temporary bonding part; (b) the step of raising the process temperature to at least higher than normal temperature and bonding the mask metal film to the template; and (c) the step of lowering the process temperature; (d) A step of manufacturing a mask by forming a mask pattern on a mask metal film; (e) a step of loading a template on a frame having at least one mask unit area, and corresponding the mask to the mask unit area of the frame And (f) the step of attaching the mask to the frame, the thermal expansion coefficient of the template is lower than that of the mask. In addition, the above-mentioned object of the present invention is achieved by a method for manufacturing a frame-integrated mask. The frame-integrated mask is integrally formed by at least one mask and a frame for supporting the mask. The method includes: (a) The step of loading the template with the mask bonded onto the frame having at least one mask unit area, and corresponding the mask to the mask unit area of the frame; and (b) the step of attaching the mask to the frame, the template The coefficient of thermal expansion is lower than that of the mask. Beneficial effect
根據具有如上所述結構的本發明,具有可使掩模不發生變形且穩定地得到支撐並移動,而且可防止掩模發生下垂或者扭曲等變形並可準確地對準的效果。 另外,根據本發明,具有能夠明顯縮短製造時間並顯著提高收率的效果。According to the present invention having the above-mentioned structure, the mask can be supported and moved stably without deformation, and the mask can be prevented from being deformed such as sagging or twisting and can be accurately aligned. In addition, according to the present invention, it is possible to significantly shorten the manufacturing time and significantly improve the yield.
具體實施方式Detailed ways
下面,參照附圖詳細說明本發明,所述附圖用於圖示作為本發明可實施的特定實施例的示例。對這些實施例進行詳細說明,以使本領域技術人員能夠充分地實施本發明。本發明的各種實施例應理解為互為不同但不相排斥。例如,在此記載的特定形狀、結構及特性可將一實施例在不超出本發明的精神及範圍的情況下實現為其他實施例。另外,公開的每一個實施例中的個別組成要素的位置或佈置應理解為在不超出本發明精神及範圍情況下可進行變更。因此,以下詳細說明並非用於限定本發明,只要能適當地說明,本發明的範圍僅由所附的申請專利範圍和與其等同的所有範圍限定。附圖中類似的附圖標記通過各個方面指代相同或類似的功能,為了方便起見,長度、面積及厚度等及其形態還可誇張表示。Hereinafter, the present invention will be described in detail with reference to the accompanying drawings, which are used to illustrate examples of specific embodiments that can be implemented as the present invention. These embodiments are described in detail so that those skilled in the art can fully implement the present invention. The various embodiments of the present invention should be understood to be different from each other but not mutually exclusive. For example, the specific shapes, structures, and characteristics described herein can implement one embodiment into other embodiments without departing from the spirit and scope of the present invention. In addition, the position or arrangement of the individual component elements in each disclosed embodiment should be understood to be changeable without departing from the spirit and scope of the present invention. Therefore, the following detailed description is not intended to limit the present invention, as long as it can be appropriately described, the scope of the present invention is limited only by the scope of the attached patent application and all the scopes equivalent thereto. Similar reference numerals in the drawings refer to the same or similar functions in various aspects. For convenience, the length, area, thickness, etc. and their forms can also be exaggerated.
下面,為了能夠使本領域技術人員容易實施本發明,參照附圖對本發明涉及的優選實施例進行詳細說明。Hereinafter, in order to enable those skilled in the art to easily implement the present invention, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.
圖1是現有的將掩模附著到框架的過程的示意圖。Fig. 1 is a schematic diagram of an existing process of attaching a mask to a frame.
現有的掩模10為條型(Stick-Type)或者板型(Plate-Type),圖1的條型掩模10可以將條的兩側焊接固定到OLED像素蒸鍍框架上並使用。掩模10的主體(Body,或者掩模膜11)具備多個顯示單元C。一個單元C與智慧手機等的一個顯示器對應。單元C中形成有像素圖案P,以便與顯示器的各個像素對應。The
參照圖1的(a),沿著條型掩模10的長軸方向施加拉伸力F1-F2,並在展開的狀態下將條型掩模10裝載在方框形狀的框架20上。條型掩模10的單元C1-C6將位於框架20的框內部空白區域部分。Referring to Fig. 1(a), a tensile force F1-F2 is applied along the long axis direction of the
參照圖1的(b),微調施加到條型掩模10各側的拉伸力F1-F2的同時進行對準,之後通過焊接W條型掩模10側面的一部分,使條型掩模10和框架20彼此連接。圖1的(c)示出彼此連接的條型掩模10和框架的側截面。1(b), the tensile force F1-F2 applied to each side of the
儘管微調施加到條型掩模10各側的拉伸力F1-F2,但是仍發生掩模單元C1-C3彼此之間對準不好的問題。例如,單元C1-C6的圖案P之間的距離彼此不同或者圖案P歪斜。由於條型掩模10具有包括多個單元C1-C6的大面積,並且具有數十μm的非常薄的厚度,所以容易因荷重而下垂或者扭曲。另外,一邊調節拉伸力F1-F2使各單元C1-C6全部變得平坦,一邊通過顯微鏡即時確認各單元C1-C6之間的對準狀態是非常困難的作業。但是為了避免尺寸為數μm至數十μm的掩模圖案P對超高畫質OLED的像素工藝造成壞影響,對準誤差優選不大於3μm。將如此相鄰的單元之間的對準誤差稱為像素定位精度(pixel position accuracy,PPA)。Although the tensile forces F1-F2 applied to each side of the
進一步而言,將各條型掩模10分別連接到一個框架20,同時使多個條型掩模10之間及條型掩模10的多個單元C-C6之間的對準狀態精確是非常困難的作業,而且只會增加基於對準的工藝時間,從而成為降低生產效率的重要原因。Furthermore, each
另外,將條型掩模10連接固定到框架20後,施加到條型掩模10的拉伸力F1-F2會反向地作用於框架20。該張力會導致框架20細微變形,而且會發生多個單元C-C6間的對準狀態扭曲的問題。In addition, after the
鑒於此,本發明提出能夠使掩模100與框架200形成一體型結構的框架200及框架一體型掩模。與框架200形成一體的掩模100不僅可以防止下垂或者扭曲等變形,而且可以與框架200準確地對準。In view of this, the present invention proposes a
圖2是根據本發明一實施例的框架一體型掩模的主視圖[圖2的(a)]及側截面圖[圖2的(b)]。2 is a front view [FIG. 2(a)] and a side sectional view [FIG. 2(b)] of a frame-integrated mask according to an embodiment of the present invention.
下面,本說明書雖然對框架一體型掩模的配置進行說明,但框架一體型掩模的結構、製造過程可理解為包括韓國專利申請第2018-0016186號的全部內容。Hereinafter, although this specification describes the configuration of the frame-integrated mask, the structure and manufacturing process of the frame-integrated mask can be understood to include all the contents of Korean Patent Application No. 2018-0016186.
參照圖2,框架一體型掩模可以包括多個掩模100及一個框架200。換而言之,是將多個掩模100分別附著至框架200的形態。下面,為了便於說明,以四角形狀的掩模100為例進行說明,但是掩模100附著到框架200之前,可以是兩側具備用於夾持的突出部的條型掩模形狀,附著至框架200後可以去除突出部。Referring to FIG. 2, the frame-integrated mask may include a plurality of
各掩模100上形成有多個掩模圖案P,一個掩模100上可以形成有一個單元C。一個掩模單元C可以與智慧手機等的一個顯示器對應。A plurality of mask patterns P are formed on each
掩模100也可以為因瓦合金(invar)、超因瓦合金(super invar)、鎳(Ni)、鎳-鈷(Ni-Co)等材料。掩模100可使用由軋製(rolling)工藝或者電鑄(electroforming)生成的金屬片材(sheet)。稍後將通過圖9和圖10進行詳細說明。The
框架200可以以附著多個掩模100的形式形成。考慮到熱變形,框架200優選由與掩模具有相同熱膨脹係數的因瓦合金、超級因瓦合金、鎳、鎳-鈷等材料形成。框架200可包括大致四角形狀、方框形狀的邊緣框架部210。邊緣框架部210的內部可以為中空形態。The
另外,框架200具備多個掩模單元區域CR,並且可以包括與邊緣框架部210連接的掩模單元片材部220。掩模單元片材部220可以由邊緣片材部221及第一柵格片材部223、第二柵格片材部225組成。邊緣片材部221及第一柵格片材部223、第二柵格片材部225是指在同一片材上劃分的各部分,它們彼此形成一體。In addition, the
邊緣框架部210的厚度可以大於掩模單元片材部220的厚度,可以以數mm至數十cm的厚度形成。掩模單元片材部220的厚度雖然薄於邊緣框架部210的厚度,但比掩模100厚,可約為0.1mm至1mm的厚度。第一柵格片材部223、第二柵格片材部225的寬度可以約為1-5mm。The thickness of the
在平面片材中,除了邊緣片材部221、第一柵格片材部223、第二柵格片材部225佔據的區域以外,可以提供多個掩模單元區域CR(CR11-CR56)。In the flat sheet, in addition to the area occupied by the
掩模200具備多個掩模單元區域CR,各掩模100可以各掩模單元C與各掩模單元區域CR分別對應的方式附著。掩模單元C與框架200的掩模單元區域CR對應,虛設部的局部或者全部可以附著到框架200(掩模單元片材部220)上。因此,掩模100和框架200可以形成一體型結構。The
圖3是根據本發明的一實施例的掩模100的示意圖。FIG. 3 is a schematic diagram of a
掩模100可包括形成有多個掩模圖案P的掩模單元C和掩模單元C周圍的虛設部DM。可利用軋製工藝、電鑄等生成的金屬片材製造掩模100,掩模100中可形成有一個單元C。虛設部DM與除單元C以外的掩模膜110[掩模金屬膜110]部分對應,且可以只包括掩模膜110,或者包括形成有類似於掩模圖案P形態的預定的虛設部圖案的掩模膜110。虛設部DM對應掩模100的邊緣且虛設部DM的局部或者全部可附著在框架200[掩模單元片材部220]。The
掩模圖案P的寬度可小於40㎛,而且掩模100的厚度可約為5-20㎛。由於框架200具備多個掩模單元區域CR(CR11-CR56),因此也可具備多個掩模100,所述掩模100具有對應每個掩模單元區域CR(CR11-CR56)的掩模單元C(C11-C56)。The width of the mask pattern P may be less than 40㎛, and the thickness of the
參照圖4的(a),可提供模板50(template)。模板50是一種媒介,其一面上附著有掩模100並以支撐掩模100的狀態使掩模100移動。模板50的一面優選為平坦面以支撐並搬運平坦的掩模100。中心部50a可對應掩模金屬膜110的掩模單元C,邊緣部50b可對應掩模金屬膜110的虛設部DM。為了能夠整體上支撐掩模金屬膜110,模板50為面積大於掩模金屬膜110的平坦形狀。Referring to FIG. 4(a), a template 50 (template) may be provided. The
為了使從模板50的上部照射的激光L能夠到達掩模100的焊接部WP(執行焊接的區域),模板50上可形成有激光通過孔51。激光通過孔51能夠以與焊接部WP的位置和數量對應的方式形成在模板50上。由於在掩模100的邊緣或者虛設部DM部分上以預定的間隔佈置多個焊接部WP,因此與之對應地也可以以預定間隔形成多個激光通過孔51。作為一示例,由於在掩模100的兩側(左側/右側)虛設部DM部分上以預定間隔佈置多個焊接部WP,因此激光通過孔51也可以在模板50的兩側(左側/右側)以預定間隔形成多個。In order for the laser light L irradiated from the upper portion of the
激光通過孔51的位置和數量不必一定與焊接部WP的位置和數量對應。例如,也可以僅對部分激光通過孔51照射激光L以進行焊接。此外,不與焊接部WP對應的部分激光通過孔51在對準掩模100與模板50時也可作為對準標記而使用。如果模板50的材料對激光L透明,則也可以不形成激光通過孔51。The position and the number of the
模板50的一面可形成臨時黏合部55。掩模100附著到框架200之前,臨時黏合部55可使掩模100[或者掩模金屬膜110]臨時附著在模板50的一面並支撐在模板50上。A
臨時黏合部55可使用基於加熱可分離的黏合劑、基於照射UV可分離的黏合劑。The temporary
作為一示例,臨時黏合部55可使用液蠟(liquid wax)。液蠟可使用與半導體晶圓的拋光步驟等中使用的相同的蠟,其類型不做特別限制。作為主要用於控制與維持力有關的黏合力、耐衝擊性等的樹脂成分,液蠟可包括如丙烯酸、醋酸乙烯酯,尼龍及各種聚合物的物質及溶劑。作為一示例,臨時黏合部55可使用包括作為樹脂成分的丁腈橡膠(ABR,Acrylonitrile butadiene rubber)和作為溶劑成分的n-丙醇的SKYLIQUIDABR-4016。在臨時黏合部55上使用旋塗方法形成液蠟。As an example, the
作為液蠟的臨時黏合部55在高於85℃-100℃的溫度下黏性下降,而在低於85℃的溫度下黏性增加,一部分被固化成固體,從而可將掩模金屬膜110’與模板50固定黏合。The temporary
其次,參照圖4的(b),可以在模板50上黏合掩模金屬膜110’。可以將液蠟加熱到85℃以上,並將掩模金屬膜110’接觸到模板50,之後使掩模金屬膜110’與模板50通過滾軸之間以進行黏合。Next, referring to FIG. 4(b), the mask metal film 110' may be bonded on the
根據一實施例,在約120℃下對模板50執行60秒的烘焙(baking),從而使臨時黏合部55的溶劑氣化,之後可馬上進行掩模金屬膜層壓(lamination)工藝。層壓通過在一面上形成有臨時黏合部55的模板50上裝載掩模金屬膜110’並使其通過約100℃的上部滾軸(roll)和約0℃的下部滾軸之間來執行。其結果,掩模金屬膜110’可通過夾設臨時黏合部55與模板50接觸。According to an embodiment, the
接著,進一步參照圖4的(b),也可以對掩模金屬膜110’的一面進行平坦化PS。由軋製工藝製造的掩模金屬膜110’可由平坦化PS工藝縮減厚度(110'→110)。此外,為了控制表面特性、厚度,也可以對經電鑄工藝製造的掩模金屬膜110進行平坦化PS工藝。Next, referring further to Fig. 4(b), one surface of the mask metal film 110' may be planarized PS. The mask metal film 110' manufactured by the rolling process can be reduced in thickness by the planarization PS process (110'→110). In addition, in order to control the surface characteristics and thickness, the
因此,如圖4的(c)所示,隨著掩模金屬膜110'的厚度縮減(110'→110),掩模金屬膜110的厚度可約為5㎛至20㎛。Therefore, as shown in (c) of FIG. 4, as the thickness of the mask metal film 110' decreases (110'→110), the thickness of the
然後,參照圖5的(d),可在掩模金屬膜110上形成經圖案化的絕緣部25。絕緣部25可利用印刷法等由光刻膠形成。Then, referring to (d) of FIG. 5, the patterned insulating
接下來,可對掩模金屬膜110進行蝕刻。可不受限制地使用乾式蝕刻、濕式蝕刻等方法,經蝕刻的結果,由絕緣部25之間的空白空間26露出的掩模金屬膜110部分可被蝕刻掉。掩模金屬膜110中被蝕刻的部分形成掩模圖案P,從而可製造形成有多個掩模圖案P的掩模100。Next, the
然後,參照圖5的(e),通過去除絕緣部25可結束支撐掩模100的模板50的製造。Then, referring to FIG. 5( e ), the manufacturing of the
另外,圖5的(d)及(e)中雖然說明了將掩模金屬膜110黏合到模板50之後形成掩模圖案P的過程,但不限於此,可以將形成有掩模圖案P的掩模100[參照圖3]黏合到模板50上,以此結束用於支撐掩模100的模板50的製造。In addition, although the process of forming the mask pattern P after bonding the
由於框架200具有多個掩模單元區域CR(CR11-CR56),因此也可具有多個掩模100,所述掩模100具有對應每個掩模單元區域CR(CR11-CR56)的掩模單元C(C11-C56)。此外,可具有多個模板50,其用於分別支撐多個掩模100的每一個。Since the
圖6是根據比較例的模板的熱膨脹係數高於掩模時存在的問題的示意圖。FIG. 6 is a schematic diagram of the problem when the thermal expansion coefficient of the template according to the comparative example is higher than that of the mask.
參照圖6的(a),將執行掩模金屬膜110[或者掩模100]與模板50'黏合工藝的空間的工藝溫度上升到高於常溫的溫度T1。工藝溫度T1可以是使上述臨時黏合部55的黏性下降的85℃-100℃。接著,通過烘焙使臨時黏合部55的溶劑氣化,並將掩模金屬膜110黏合到模板50'上。然後,可將工藝溫度降到使臨時黏合部55的黏性變大且能夠使一部分固化成固體的溫度T2。6(a), the process temperature of the space where the bonding process of the mask metal film 110 [or the mask 100] and the template 50' is performed is increased to a temperature T1 higher than the normal temperature. The process temperature T1 may be 85° C. to 100° C. to reduce the viscosity of the
過去,作為模板50'的材料使用玻璃(glass)、硼矽酸鹽玻璃(borosilicate glass)等。其中,尤其作為硼矽酸鹽玻璃的BOROFLOAT®
33的熱膨脹係數約為3.3 × 10-6/℃,其與熱膨脹係數約為1.5-3 × 10-6/℃的因瓦合金(invar)掩模金屬膜110的熱膨脹係數差異較小,容易控制掩模金屬膜110,因此經常使用。In the past, glass, borosilicate glass, etc. have been used as the material of the
模板50’的熱膨脹係數高於掩模金屬膜110,當如圖6的(a)所示使溫度T2下降時,掩模金屬膜110基於溫度變化而收縮的程度L2相對小,相反,模板50’相對收縮的程度L1(L1>L2)大。與此同時,模板50’和掩模金屬膜110為中間夾設臨時黏合部55而被牢固地黏合固定的狀態,掩模金屬膜110被施以比原來收縮的程度L2欲更加收縮的力CT。欲更加收縮的力CT由於模板50’收縮的程度L1大於掩模金屬膜110收縮的程度L2而產生。因此,掩模金屬膜110被施以側面方向[掩模金屬膜110的內側]的壓縮力CT的狀態黏合到模板50’上。The thermal expansion coefficient of the template 50' is higher than that of the
如果模板50’的熱膨脹係數高於掩模100[或者掩模金屬膜110],則會發生如下問題。If the thermal expansion coefficient of the template 50' is higher than that of the mask 100 [or the mask metal film 110], the following problems may occur.
參照圖6的(b),將圖6的(a)的模板50’裝載到框架200[或者邊緣片材部221、第一柵格片材部223及第二柵格片材部225]上並將其對應到掩模100,而且通過焊接形成焊珠WB,從而可以將掩模100附著到框架200上。6(b), the template 50' of FIG. 6(a) is loaded on the frame 200 [or the
此外,可以從掩模100分離模板50’。然而,從掩模100分離模板50’的同時施加到掩模100上的壓縮力CT被解除,從而會導致掩模100的對準狀態被打亂。換而言之,會發生不能以掩模100兩側朝外側繃緊地拉拽的狀態下附著到框架200上,而以褶皺或下垂的狀態附著到框架200上的問題。這將造成基於掩模100的對準誤差、單元C之間的PPA誤差等的產品不良。In addition, the template 50' can be separated from the
因此,本發明的模板50具有熱膨脹係數低於掩模100[或者掩模金屬膜110]的特徵。Therefore, the
圖7是根據本發明一實施例的模板的熱膨脹係數低於掩模時的掩模與托盤的界面狀態及掩模附著到框架上的狀態的示意圖。7 is a schematic diagram of the interface state between the mask and the tray and the state of the mask attached to the frame when the thermal expansion coefficient of the template is lower than that of the mask according to an embodiment of the present invention.
參照圖7的(a),如圖6的(a)將空間的工藝溫度上升到高於常溫的溫度T1,並將掩模金屬膜110[或者圖案P形成結束的掩模100]黏合到模板50上。接著,可將工藝溫度降到使臨時黏合部55的黏性變大且能夠使一部分固化成固體的溫度T2。7(a), as shown in FIG. 6(a), the process temperature of the space is raised to a temperature T1 higher than normal temperature, and the mask metal film 110 [or the
掩模金屬110[或者掩模100]為熱膨脹係數至少大於1的因瓦合金、超因瓦合金、鎳、鎳-鈷等材料。反之,模板50的熱膨脹係數可以小於1(大於0)。優選地,可使用熱膨脹係數為0.55的石英(quartz)材料的模板50,但不限於此。The mask metal 110 [or the mask 100] is a material such as Invar, Super Invar, nickel, nickel-cobalt, etc., with a thermal expansion coefficient of at least greater than 1. Conversely, the thermal expansion coefficient of the
由於模板50的熱膨脹係數低於掩模金屬膜110,當如圖7的(a)所示使溫度T2下降時,模板50幾乎不收縮或者收縮的程度相對小於掩模金屬膜110。掩模金屬膜110的收縮程度[收縮圖7(a)的L2程度]雖然會相對較大,但由於是通過夾設臨時黏合部55而牢固地黏合固定到模板50上的狀態,因此不能收縮且被施以欲收縮的內部力IT。換而言之,掩模金屬膜110被施以側面方向的拉伸力IT並以繃緊的狀態黏合到模板50。Since the thermal expansion coefficient of the
參照圖7的(b),以圖6的(a)狀態將模板50裝載到框架200[或者邊緣片材部221、第一柵格片材部223及第二柵格片材部225]上,並將其對應到掩模100,而且通過焊接形成焊珠WB,從而可以將掩模100黏合到框架200。7(b), the
此外,可以從掩模100分離模板50。然而,從掩模100分離模板50’的同時施加到掩模100上的拉伸力IT被解除並會轉換成使掩模100的兩側繃緊的張力TS。換而言之,該狀態是拉拽到比掩模100的原來下降溫度T2下的長度更長的長度後黏合到模板50上的狀態,由於在該狀態原封不動地焊接黏合到框架200上,因此能夠保持被拉拽的狀態[自身對周邊的掩模單元片材部220施加張力TS的狀態]。掩模100以被繃緊拉拽的狀態附著到框架200上,從而不會發生皺紋、變形等。因此,具有減少掩模100的對準誤差、單元C間的PPA誤差的效果。In addition, the
圖8是根據本發明一實施例的將模板50裝載在框架200上並將掩模100對應到框架200的單元區域CR的狀態的示意圖。圖8中列舉了將一個掩模100對應/附著在單元區域CR上的方式,也可以將多個掩模100同時對應到所有的單元區域CR並將掩模100附著到框架200上的過程。此時可具有多個模板50,其用於分別支撐多個掩模100的每一個。FIG. 8 is a schematic diagram of a state where the
模板50可通過真空吸盤90移送。可以用真空吸盤90吸附黏合有掩模100的模板50的面的相反面並進行移送。真空吸盤90吸附模板50並進行翻轉之後向框架200移送模板50的過程中仍不會影響掩模100的黏合狀態和對準狀態。The
接著參照圖8,可以將掩模100對應到框架200的一個掩模單元區域CR上。通過將模板50裝載到框架200[或者掩模單元片材部220]可使掩模100對應至掩模單元區域CR。控制模板50/真空吸盤90的位置的同時可通過顯微鏡觀察掩模100是否對應於掩模單元區域CR。由於模板50擠壓掩模100,因此掩模100可與框架200緊貼。Next, referring to FIG. 8, the
另外,框架200下部可以進一步佈置下部支撐體70。下部支撐體70可擠壓與掩模100接觸的掩模單元區域CR的反面。與此同時,由於下部支撐體70和模板50向相互相反的方向擠壓掩模100的邊緣和框架200[或者掩模單元片材部220],因此能夠保持掩模100的對準狀態且不被打亂。In addition, a
接下來,向掩模100照射激光L並基於激光焊接將掩模100附著到框架200上。由激光焊接的掩模的焊接部WP部分上生成焊珠WB,焊珠WB可具有與掩模100/框架200相同的材料且與它們一體連接。Next, the
圖9是根據本發明一實施例的將掩模附著到框架上之後使掩模與模板分離的過程的示意圖。FIG. 9 is a schematic diagram of a process of separating the mask from the template after attaching the mask to the frame according to an embodiment of the present invention.
參照圖9,將掩模100附著在框架200之後,可將掩模100與模板50進行分離(debonding)。掩模100與模板50的分離可通過對臨時黏合部55進行加熱ET、化學處理CM、施加超聲波US、施加紫外線UV中至少任意一個而執行。由於掩模100保持附著在框架200的狀態,因此可只抬起模板50。作為一示例,如果施加高於85℃-100℃的溫度的熱ET,則臨時黏合部55的黏性降低,掩模100與模板50的黏合力減弱,從而可分離掩模100與模板50。作為另一示例,可通過利用將臨時黏合部55沉浸CM在IPA、丙酮、乙醇等化學物質中以使臨時黏合部55溶解、去除等的方式來使掩模100與模板50分離。作為另一示例,通過施加超聲波US或者施加紫外線UV使掩模100與模板50的黏合力減弱,從而可分離掩模100與模板50。9, after the
如果模板50從掩模100分離,則施加到掩模100上的拉伸力IT被解除的同時可轉換成使掩模100的兩側繃緊的張力TS。由此,可通過向框架200[掩模單元片材部220]施加張力TS使掩模100以繃緊的狀態附著。If the
圖10是根據本發明一實施例的將掩模100附著到框架200的狀態的示意圖。圖10中圖示了將所有掩模100附著到框架200的單元區域CR的狀態。雖然可一一附著掩模100後再將模板50分離,但也可將所有掩模100附著後再將所有模板50分離。FIG. 10 is a schematic diagram of a state where the
現有的圖1的掩模10包括6個單元C1-C6,因此具有較長的長度,而本發明的掩模100包括一個單元C,因此具有較短的長度,因此PPA(pixel position accuracy)扭曲的程度會變小。而且,本發明由於只需要對應掩模100的一個單元C並確認對準狀態即可,因此與同時對應多個單元C(C1-C6)並需要確認全部對準狀態的現有方法相比,本發明可以明顯縮短製造時間。The existing
如果每個掩模100均附著在對應的掩模單元區域CR上之後將模板50與掩模100進行分離,則由於多個掩模100施加向相反的方向收縮的張力TS,所述張力相互抵消,因此掩模單元片材部220上不會發生變形。例如,在CR11單元區域上附著的掩模100與CR12單元區域上附著的掩模100之間的第一柵格片材部223上,附著在CR11單元區域上的掩模100向右側方向作用的張力TS與附著在CR12單元區域上的掩模100向左側方向作用的張力TS可相互抵消。因此,框架200[或者掩模單元片材部220]因張力TS發生的變形被最小化,從而具有使掩模100[或者,掩模圖案P]的對準誤差最小化的優點。If each
如上所述,本發明列舉了優選實施例進行圖示和說明,但是本發明不限於上述實施例,在不脫離本發明的精神的範圍內,本領域技術人員能夠進行各種變形和變更。這種變形和變更均屬本發明和所附的申請專利範圍的範圍。As described above, the present invention exemplifies preferred embodiments for illustration and description, but the present invention is not limited to the above-mentioned embodiments, and those skilled in the art can make various modifications and changes within the scope not departing from the spirit of the present invention. Such deformations and changes are within the scope of the present invention and the attached patent application.
10,100:掩模
11,110,110’:掩模膜,掩模金屬膜
20,200:框架
25:絕緣部
26:空白空間
50,50’:模板(template)
50a:中心部
50b:邊緣部
51:激光通過孔
55:臨時黏合部
70:下部支撐體
90:真空吸盤
210:邊緣框架部
220:掩模單元片材部
221:邊緣片材部
223:第一柵格片材部
225:第二柵格片材部
C,C1-C6,C11-C56:單元,掩模單元
CR,CR11-CR56:掩模單元區域
CM:化學處理
CT:收縮的力,壓縮力
DM:虛設部,掩模虛設部
ET:加熱
F1-F2:拉伸力
L:激光
L1,L2:收縮的程度
IT:內部力,拉伸力
P:掩模圖案
PS:平坦化
T1,T2:溫度
TS:張力
W:焊接
WB:焊珠
WP:焊接部
US:超聲波
UV:紫外線10,100: mask
11,110,110’: Mask film, mask metal film
20,200: frame
25: Insulation part
26:
圖1是現有的將掩模附著到框架的過程的示意圖。 圖2是根據本發明一實施例的框架一體型掩模的主視圖及側截面圖。 圖3是根據本發明一實施例的掩模的示意圖。 圖4至圖5是根據本發明一實施例的通過在模板上黏合掩模金屬膜來形成掩模以製造掩模支撐模板的過程的示意圖。 圖6是根據比較例的模板的熱膨脹係數高於掩模時存在的問題的示意圖。 圖7是根據本發明一實施例的模板的熱膨脹係數低於掩模時的掩模與托盤的界面狀態及掩模附著到框架上的狀態的示意圖。 圖8是根據本發明的一實施例的將模板裝載到框架上並將其對應到框架的單元區域的狀態的示意圖。 圖9是根據本發明的一實施例的將掩模附著到框架上之後使掩模和模板分離的過程的示意圖。 圖10是根據本發明的一實施例的將掩模附著到框架的單元區域的狀態的示意圖。Fig. 1 is a schematic diagram of an existing process of attaching a mask to a frame. Fig. 2 is a front view and a side sectional view of a frame-integrated mask according to an embodiment of the present invention. Fig. 3 is a schematic diagram of a mask according to an embodiment of the present invention. 4 to 5 are schematic diagrams of a process of forming a mask by bonding a mask metal film on a template to manufacture a mask support template according to an embodiment of the present invention. FIG. 6 is a schematic diagram of the problem when the thermal expansion coefficient of the template according to the comparative example is higher than that of the mask. 7 is a schematic diagram of the interface state between the mask and the tray and the state of the mask attached to the frame when the thermal expansion coefficient of the template is lower than that of the mask according to an embodiment of the present invention. Fig. 8 is a schematic diagram of a state in which a template is loaded on a frame and corresponds to a unit area of the frame according to an embodiment of the present invention. 9 is a schematic diagram of a process of separating the mask and the template after attaching the mask to the frame according to an embodiment of the present invention. FIG. 10 is a schematic diagram of a state in which a mask is attached to a unit area of a frame according to an embodiment of the present invention.
50:模板(template) 50: template
55:臨時黏合部 55: Temporary bonding part
100:掩模 100: mask
110:掩模膜,掩模金屬膜 110: Mask film, mask metal film
200:框架 200: frame
210:邊緣框架部 210: Edge frame part
221:邊緣片材部 221: Edge sheet section
L2:收縮的程度 L2: The degree of contraction
IT:內部力,拉伸力 IT: Internal force, tensile force
T1,T2:溫度 T1, T2: temperature
TS:張力 TS: Tension
WB:焊珠 WB: Solder bead
Claims (14)
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KR1020190106596A KR20210026168A (en) | 2019-08-29 | 2019-08-29 | Template for supporting mask, producing method of template for supporting mask and producing method of mask integrated frame |
KR10-2019-0106596 | 2019-08-29 |
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JP2004335393A (en) * | 2003-05-12 | 2004-11-25 | Rohm Co Ltd | Metal mask and manufacturing method of organic el display device using the same |
US20060081184A1 (en) * | 2004-10-19 | 2006-04-20 | Yeh Te L | Evaporation mask with high precision deposition pattern |
KR101135544B1 (en) * | 2009-09-22 | 2012-04-17 | 삼성모바일디스플레이주식회사 | Mask Assembly, Fabrication method of the same and Deposition Apparatus using the same for Flat Panel Display device |
KR101820020B1 (en) * | 2011-04-25 | 2018-01-19 | 삼성디스플레이 주식회사 | Mask frame assembly for thin film deposition |
CN111095592A (en) * | 2017-09-01 | 2020-05-01 | 悟勞茂材料公司 | Method for manufacturing frame-integrated mask |
KR102011723B1 (en) * | 2018-04-20 | 2019-08-19 | 주식회사 티지오테크 | Producing device of mask integrated frame |
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