TW202040656A - 脆性材料基板之裂斷裝置及裂斷方法 - Google Patents
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- 239000004065 semiconductor Substances 0.000 description 14
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- 235000012431 wafers Nutrition 0.000 description 12
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- 239000010408 film Substances 0.000 description 5
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Abstract
本發明之目的在於提供一種可抑制分斷時傷及基板表面而獲得高品質之製品的裂斷裝置。
本發明係一種裂斷裝置,其具備:左右一對之承托刃1、2,其等於基板載置面之端邊形成有角部1a、1b;及壓刃3;且承托刃以相互空開間隔且角部彼此平行之方式配置,壓刃配置為可壓入至承托刃間,將分斷對象之脆性材料基板W,以形成於其表面之劃線S與角部平行之方式載置,且構成為將承托刃之角部以0.05~0.2 mm之微小之R(Radius)進行倒角。
Description
本發明關於一種沿劃線(切槽)分斷脆性材料基板之裂斷裝置。尤其,本發明關於一種於製造將電子電路等圖案化形成於SiC基板(晶圓)等非常硬之脆性材料之母基板之表面上的元件(器件)之步驟中,自該母基板分斷為各元件之裂斷裝置。
於分斷Si基板等之脆性材料基板之加工中,先前以來,多採用使用切割輪或雷射光束等於基板表面形成劃線,其後,沿劃線自劃線形成面之相反側之面施加外力使基板撓曲,藉此分斷為每個單位基板(元件)的方法。
具體而言,如圖7所示,將於端邊形成有角部(邊緣)11a、12a之左右一對承托刃11、12以角部彼此相互平行之方式空開特定間隔而配置,並將分斷對象之基板W以劃線S落在間隔之中心位置之方式載置於承托刃上(基板載置面),並將壓刃13自劃線之上方抵接於基板W,藉由3點支持之彎曲力矩使基板W撓曲而自劃線分斷(參照專利文獻1及2)。
為使左右之承托刃11、12發揮作為支點之功能,先前,形成為使左右承托刃之對向之角部(邊緣)11a、12a較尖銳,剖視時相對於要分斷之基板W大體呈點接觸。藉此,有效地產生左右之承托刃11、12與壓刃13之3點支持之彎曲力矩而提高基板之分斷效率。又,對於承托刃或壓刃,以硬度與韌性優異之超硬合金或工具鋼等作成。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本專利特開2017-114138號公報
[專利文獻2]日本專利特開2016-043503號公報
[發明所欲解決之問題]
近年來,因謀求半導體器件之高精細化、高功能化,故必須進一步改善基板之品質、強度。作為以此為目的之一種方法,藉由對半導體器件之基板材料使用SiC(碳化矽)而謀求提高性能。SiC基板具備明顯高於Si基板之絕緣破壞電場強度或高耐壓性,可以薄膜達成高精細化、高功能化。
然而,SiC為非常堅硬之材質。因此,分斷SiC基板時,若使用使作為支點之左右一對承托刃之角部(邊緣)較尖銳之裂斷裝置,使載荷集中於左右承托刃之前端,以左右之承托刃與壓刃之3點支持之彎曲力矩重複分斷母基板,則會於承托刃之邊緣部分產生微細損傷,且產生如刃體破損之缺口。
裂斷前之母基板(晶圓)於形成有電子電路等之器件面,貼附有較薄之樹脂保護膜(PET等之樹脂保護薄膜),且使該器件面朝下,以上述3點支持之彎曲力矩分斷,但若於承托刃之邊緣產生如上所述之損傷,則分斷基板時與承托刃邊緣接觸之基板面會受到損傷。該損傷會傷及上述之樹脂保護膜、或破壞樹脂保護膜傷及形成有電子電路等之器件面。由於包含電子電路之器件為非常纖細且高精度之組成物,故即便為細微之損傷亦會引起產生重大缺陷,而對成品率之降低造成較大影響。
因此,本發明之目的在於提供一種可解決上述問題,抑制基板分斷時產生之損傷,而獲得高品質之製品的裂斷裝置。
[解決問題之技術手段]
為解決上述問題,本發明謀求如下之技術方法。即,本發明之裂斷裝置係一種脆性材料基板之裂斷裝置,其具備:左右一對之承托刃,其等於基板載置面之端邊形成有角部;及壓刃;且上述左右一對之承托刃以相互空開間隔且上述角部彼此平行之方式配置,上述壓刃配置為可壓入至上述左右一對之承托刃間,將分斷對象之脆性材料基板以形成於其表面之劃線於上述左右一對之承托刃間之位置與上述角部平行之方式載置於上述基板載置面上,以將上述壓刃壓入至上述左右一對之承托刃間使上述脆性材料基板撓曲之方式裂斷,且
上述左右一對之承托刃之角部經R倒角。
此處,左右一對之承托刃之角部之R倒角之R形成為0.05~0.2 mm(較佳為0.08~0.15 mm,尤佳為0.1±0.025 mm)之微小之R。又,上述左右一對之承托刃之角部間之間隔可為與欲裂斷之劃線相鄰之兩側之劃線彼此之間隔的1/2~3/4倍(元件大小之1~1.5倍)。
又,基於其他觀點完成之本發明之裂斷方法為將脆性材料基板沿劃線分斷之裂斷方法,且
使用於基板載置面之端邊形成有進行過(以例如0.05~0.2 mm之微小之R)倒角之角部之左右一對之承托刃,並將該等承托刃以相互空開間隔且上述角部彼此平行之方式配置,以上述脆性材料基板之上述劃線於上述左右一對之承托刃間之位置與上述角部平行之方式,將上述脆性材料基板載置於上述基板載置面上,以將可壓入至上述左右一對之承托刃間而配置之壓刃,壓入至該等左右一對之承托刃間使上述脆性材料基板撓曲之方式,進行裂斷。
此處,可將SiC基板作為脆性材料基板裂斷。
[發明之效果]
於本發明之裂斷裝置中,由於左右一對之承托刃之角部經過以微小之R進行倒角,故即使於分斷非常堅硬之基板時,亦可分散分斷時之載荷而使其不集中於角部,抑制角部破損產生損傷部分,藉此,可抑制起因於承托刃之損傷而造成之分斷後製品所產生之損傷,提供高品質之製品。又,由於角部之倒角以0.05~0.2 mm之非常小之R(Radius,半徑)形成,故不會損害到作為3點支持之彎曲力矩之支點的功能。
於以下,就本發明之裂斷裝置之一實施例,參照圖式詳細地進行說明。於本實施形態中,作為分斷對象即母基板之一例,以如圖2所示之將一面具有以薄的樹脂保護膜保護之電子電路等的器件面的SiC晶圓(以下簡稱為基板)W,作為對象。於基板W,於前步驟中格柵狀加工有彼此交叉之X-Y方向之複數條劃線(分斷線)S1、S2,且沿該等劃線S1、S2,藉由本發明之分斷裝置分斷基板W,並切出作為製品之各個半導體元件W1。
圖1係顯示本發明之分斷裝置者。該分斷裝置具備:左右一對之承托刃1、2,其等沿應分斷之基板W之劃線之方向,空開特定間隔平行地配置;及壓刃3,其於該等左右之承托刃1、2之中間上方位置,藉由升降機構(圖示外)可升降地配置,並下降至承托刃1、2間。承托刃1、2以及壓刃3,係由硬度與韌性優異之超硬合金或工具鋼製作。
各個承托刃1、2於彼此交叉之縱、橫兩面之交點具有角部1a、2a,且該等角部1a、2a經以0.05~0.2 mm(較佳為0.08~0.15 mm)之微小之R(半徑)倒角。
又,於例如欲切出2 mm方形之半導體元件W1時,左右之承托刃1、2之間隔L以2~3 mm形成。
於分斷基板W時,以將器件面設為下方,且使X方向或Y方向之劃線,例如X方向之劃線S1於間隔L之中心位置成為下側之方式將其載置於承托刃1、2上,將可升降之壓刃3自劃線上方朝基板W壓入,藉由因3點支持產生之彎曲力矩使基板W撓曲而自劃線S1分斷。接著,與上述同樣,將基板W沿Y方向之劃線S2分斷切出作為製品之半導體元件W1。於該分斷時,由於承托刃之角部1a、2a之R(Radius) 為0.05~0.2 mm非常小,故不會損害到角部1a、2a之作為3點支持之彎曲力矩之支點的功能。
本發明者等人分別進行本發明之承托刃與先前之承托刃之基板之分斷實驗。基板使用可自一片切出5000個左右之2mm方形之半導體元件之直徑150 mm、厚度0.2 mm之SiC晶圓。將該晶圓分斷為20片,且抽出自最後之晶圓切出之100片半導體元件W1,進行有無損傷之檢證。另,此時之本發明之承托刃1、2之角部之R(Radius)為0.1 mm,且左右承托刃之間隔L為2.5 mm。
圖3係顯示上述之先前之承托刃之分斷實驗結果之圖,圖4係顯示本發明之承托刃之分斷實驗結果之圖。圖3(a)、圖4(a)中之「沿橫向排列之損傷」,意指將圖5所示之半導體元件W1沿Y方向分斷時,與沿Y方向配置之一承托刃接觸而產生之損傷K1,圖3(b)、圖4(b)中之「沿縱向排列之損傷」意指與沿X方向分斷時之承托刃接觸而產生之損傷K2。
於該等圖中,顯示例如於圖3(a)之座標X1-Y1之座標點所在之半導體元件上,有10條沿橫向排列之損傷,於圖3(b)之座標X5-Y6之座標點所在之半導體元件上,有12條沿縱向排列之損傷。
根據該實驗結果,切出之100個半導體元件,於先前之方法(未形成微小R)之情形,橫向之損傷為441條,縱向之損傷為987條,合計有1428條傷,與此相對,本發明之方法(形成微小之R)之分斷,幾乎未見產生損傷,僅產生2條橫向之損傷,可獲得高品質之半導體元件。
又,於分斷實驗後,檢證各個承托刃。圖6係摹寫先前之承托刃之檢證結果之放大立體圖,確認到於承托刃角部(邊緣)產生如圖所示之缺口等細微之損傷。與此相對,本發明之承托刃中,角部完全未見到缺口等之損傷。
如此,由於承托刃之角部1a、2a經過以微小之R(Radius)倒角,故即便於分斷如SiC晶圓之非常堅硬之基板時,亦可將分斷時之載荷分散而抑制於角部產生缺口等損傷部分。因此,可抑制起因於承托刃之損傷之分斷後之製品之損傷,而獲得高品質之製品。又,由於角部之倒角由0.08~0.15 mm之非常小之R(Radius)形成,故作為3點支持之彎曲力矩之支點的功能不受損。
以上,已對本發明之代表性之實施例進行說明,但本發明並非限定於上述實施形態者。例如,作為分斷之基板,除上述實施例中所示之SiC晶圓外,亦可應用於各種基板之分斷。此外,於本發明中,達成其之目的,且於未脫離申請專利範圍之範圍內可適當修正、變更。
[產業上之可利用性]
本發明可較好地作為將SiC晶圓等之硬度較高之脆性材料基板沿劃線分斷之裂斷裝置使用。
1:承托刃
1a:角部
2:承托刃
2a:角部
3:壓刃
11:承托刃
11a:角部
12:承托刃
12a:角部
13:壓刃
K1:損傷
K2:損傷
L:承托刃間之間隔
R:半徑
S:劃線
S1:X方向之劃線
S2:Y方向之劃線
W:基板(晶圓)
W1:半導體元件
X:方向
Y:方向
圖1係顯示本發明之裂斷裝置之承托刃部分之剖視圖。
圖2係顯示分斷之基板(晶圓)之立體圖。
圖3(a)、(b)係顯示使用先前之承托刃之分斷結果之圖表。
圖4(a)、(b)係顯示使用本發明之承托刃之分斷結果之圖表。
圖5係顯示所切出之半導體元件之損傷產生例之俯視圖。
圖6係模仿先前之承托刃邊緣中產生之損傷之放大立體圖。
圖7係顯示先前之承托刃部分之剖視圖。
1:承托刃
1a:角部
2:承托刃
2a:角部
3:壓刃
L:承托刃間之間隔
R:半徑
S1:X方向之劃線
S2:Y方向之劃線
W:基板(晶圓)
Claims (5)
- 一種裂斷裝置,其係一種脆性材料基板之裂斷裝置,且包含: 左右一對之承托刃,其等於基板載置面之端邊形成有角部;及壓刃;且 上述左右一對之承托刃以相互空開間隔且上述角部彼此平行之方式配置,上述壓刃配置為可壓入至上述左右一對之承托刃間, 將分斷對象之脆性材料基板,以形成於其表面之劃線於上述左右一對之承托刃間之位置與上述角部平行之方式,載置於上述基板載置面上, 以將上述壓刃壓入至上述左右一對之承托刃間,使上述脆性材料基板撓曲之方式進行裂斷, 上述左右一對之承托刃之角部經R倒角。
- 如請求項1之裂斷裝置,其中上述角部之R倒角之R為0.05~0.2 mm。
- 如請求項1或2之裂斷裝置,其中上述左右一對之承托刃之角部間之間隔,為與欲裂斷之劃線相鄰之兩側之劃線彼此之間的間隔的1/2~3/4倍。
- 一種脆性材料基板之裂斷方法,其係將脆性材料基板沿劃線分斷者,且 使用於基板載置面之端邊形成有經R倒角之角部之左右一對之承托刃,將該等承托刃以相互空開間隔且上述角部彼此平行之方式配置, 以上述脆性材料基板之上述劃線於上述左右一對之承托刃間之位置與上述角部平行之方式,將上述脆性材料基板載置於上述基板載置面上, 以將可壓入至上述左右一對之承托刃間而配置之壓刃,壓入至該等左右一對之承托刃間使上述脆性材料基板撓曲之方式,進行裂斷。
- 如請求項4之脆性材料基板之裂斷方法,其中上述脆性材料基板為SiC基板。
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