TW202036165A - LED lighting device and exposure machine capable of improving the productivity and yield of edge exposure, and saving the cost of spare parts - Google Patents

Abstract

An embodiment of the present invention discloses an LED lighting device and an exposure machine. The LED lighting device includes: an LED light source module, a light source control module, a uniform illumination module, an imaging module, and a field of view adjustment module; the light source control module is connected to the LED light source module, and is used to control the light emitting state of the LED light source module; the uniform illumination module is used to uniform the light beam emitted by the LED light source module; the field of view adjustment module is used to adjust the size of the field of view of the light beam emitted by the uniform illumination module/ the imaging module is used to project the light beam emitted by the field of view adjustment module to an illumination position. The scheme of the embodiment of the present invention can effectively solve the problems of switch delay of the lighting device, low illuminance and short service life, so as to improve the productivity and yield of edge exposure and save the cost of spare parts.

Description

LED lighting device and exposure machine

The embodiment of the present invention relates to edge exposure technology, and particularly relates to an LED lighting device and exposure machine.

Wafer edge exposure (WEE) is one of the very important processes in IC circuit manufacturing. Due to cracks on the edge of the silicon wafer, notch to determine the direction, as well as defects such as photoresist residues, cleaning contaminants and uneven coating, etching, and polishing, the edge of the silicon wafer cannot be used or even the entire The edge of the silicon wafer is full of wafers, but it will still become a waste piece due to the problem of the edge of the silicon wafer. This requires the photoresist on the edge of the silicon wafer to be exposed and removed in advance.

Plating In the IC circuit packaging process, it is necessary to use the edge of the silicon wafer as the anode, and the electroplating window in the middle of the silicon wafer as the cathode. The metal bump is controlled by controlling the current between the anode and the cathode and the concentration of the plating solution. the height of. Because the photoresist is not conductive, the photoresist on the edge of the silicon wafer needs to be removed before the electroplating process, and the edge removal width depends on the edge removal width requirement of the WEE process. Moreover, in some special processes, it is further required to expose a certain width of the ring area inside the edge of the silicon wafer, which affects the spot size adjustment, energy utilization, light source response time, exposure yield, and product life of the edge exposure system. Many other aspects put forward higher requirements.

However, the previous edge exposure machines used mercury lamps as the light source, which had the problems of switching delay, low illuminance and short life, frequent replacement, and waste of spare parts cost.

The invention provides an LED lighting device and an exposure machine, which can effectively solve the problems of lighting device switching delay, low illuminance and short life, improve the yield and yield of edge exposure, and save the cost of spare parts.

In the first aspect, an embodiment of the present invention provides an LED lighting device, including:

LED light source module, light source control module, homogenization module, imaging module and field of view adjustment module;

The aforementioned light source control module is connected to the aforementioned LED light source module for controlling the light-emitting state of the aforementioned LED light source module;

The aforementioned homogenization module is used to homogenize the light beam emitted by the aforementioned LED light source module;

The aforementioned field of view adjustment module is used to adjust the size of the field of view of the light beam emitted by the aforementioned homogenization module;

The aforementioned imaging module is used to project the light beam emitted by the aforementioned field of view adjustment module to the illumination position.

Optionally, the field of view adjustment module includes a plurality of apertures, and the apertures of the plurality of apertures are of different sizes and can be switched into the illumination light path.

Optionally, the distances between the centers of the openings of the plurality of diaphragms are all greater than or equal to 12 mm.

Optionally, the size of the apertures of the plurality of diaphragms along the exposure width direction increases sequentially, and the sizes in other directions are all equal.

Optionally, the aforementioned LED light source module includes an LED light-emitting unit and a focusing lens.

Optionally, the aforementioned imaging module includes a first biconvex lens, a first convex-concave lens, a second bi-convex lens, a third bi-convex lens, a first meniscus lens, and a fourth bi-convex lens arranged in sequence along the optical path;

The first biconvex lens is arranged on a side of the first convex-concave lens adjacent to the LED light source module.

Optionally, the aforementioned homogenization module includes a first quartz rod.

Optionally, the aforementioned LED light source module includes an LED light emitting unit array.

Optionally, the aforementioned homogenization module includes a microlens array and a second quartz rod;

The microlens array is arranged on the side of the second quartz rod adjacent to the LED light source module along the optical path.

Optionally, the area of the exit end surface of the aforementioned second quartz rod is larger than the area of the entrance end surface.

Optionally, the LED lighting device further includes:

The optical baffle is arranged between the LED light source module and the homogenizing module along the optical path, and the optical baffle is used to adjust the numerical aperture of the light beam emitted by the LED light source module.

Optionally, the imaging module includes a second concave-convex lens, a fifth bi-convex lens, a second convex-concave lens, a third convex-concave lens, a sixth bi-convex lens, a mirror, a first bi-concave lens, and a third concave-convex lens arranged in sequence along the optical path. , The seventh biconvex lens and flat lens;

The second concave-convex lens is arranged on the side of the fifth biconvex lens adjacent to the LED light source module.

In the second aspect, an embodiment of the present invention further provides an exposure machine including the aforementioned LED lighting device in any embodiment of the present invention.

Optionally, the exposure machine further includes:

The first moving part, the aforementioned first moving part is used to drive the field of view adjustment module of the LED lighting device to move and switch different apertures.

The LED lighting device provided by the embodiment of the present invention adopts the LED light source module. Because the LED light-emitting unit has high energy illuminance, low energy consumption, long service life, and quick response, it can effectively solve the problems of LED lighting device switching delay, low illuminance and short life. Problem, improve the yield and yield of edge exposure, and save the cost of spare parts.

10‧‧‧LED light source module

20‧‧‧Light source control module

30‧‧‧Uniform light module

40‧‧‧Field of View Adjustment Module

50‧‧‧Imaging module

[Figure 1] is a schematic diagram of an LED lighting device provided by an embodiment of the present invention.

[Figure 2] is a schematic diagram of a field of view adjustment module provided by an embodiment of the present invention.

[Fig. 3] is a schematic structural diagram of an LED lighting device provided by an embodiment of the present invention.

[Figure 4] is a schematic diagram of the position of the field of view adjustment module and the uniform light module.

[Figure 5] is a schematic diagram of an imaging module provided by an embodiment of the present invention.

[Figure 6] is a schematic diagram of yet another LED lighting device provided by an embodiment of the present invention.

[Figure 7] is a schematic diagram of a microlens array.

[Fig. 8] is a schematic diagram of another imaging module provided by an embodiment of the present invention.

[Fig. 9] is a schematic diagram of an exposure machine provided by an embodiment of the present invention.

The present invention will be further described in detail below in conjunction with the drawings and embodiments. It can be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. It should be further noted that, for ease of description, only a part of the structure related to the present invention but not all of the structure is shown in the drawings.

The present invention provides an LED lighting device. FIG. 1 is a schematic diagram of an LED lighting device provided by an embodiment of the present invention. Referring to FIG. 1, the device includes:

LED light source module 10, light source control module 20, homogenization module 30, field of view adjustment module 40 and imaging module 50;

The light source control module 20 is connected to the LED light source module 10 and is used to control the light-emitting state of the LED light source module 10;

The homogenization module 30 is used to homogenize the light beam emitted by the LED light source module 10;

The field of view adjustment module 40 is used to adjust the field of view of the light beam emitted by the homogenization module 30;

The imaging module 50 is used for projecting the light beam emitted by the field of view adjustment module 40 to the illumination position.

Wherein, the LED light source module 10 includes at least one light emitting diode (Light Emitting Diode, LED) light emitting unit, and the light emitting wavelengths of the multiple LED light emitting units may be the same or different. The light-emitting wavelength band of the LED light source module 10 may include 365 nm, 385 nm, 395 nm, 400 nm, 425 nm, and so on. Specifically, the LED light-emitting unit has high energy illuminance, and the energy consumption of the LED light-emitting unit is very small compared with the conventional arc lamp, which can effectively save energy, and the LED light-emitting unit has a long service life without frequent replacement. In addition, the LED light-emitting unit is turned on and off Time only It has 25ms, and the response is fast, which can effectively solve the problems of lighting device switching delay, low illuminance and short life, improve the yield and yield of edge exposure, and save the cost of spare parts.

The light source control module 20 is used to control the turning on or off of the LED light source module 10. The light source control module 20 receives the exposure dose and controls the illuminance of the LED light source module 10 according to the exposure dose. In addition, the light source control module 20 is further used to monitor the temperature and lifespan of the LED light source module 10, so that the optical stability of the LED light source module 10 is automatically maintained within ±5% during the irradiation period, which realizes automatic closed-loop calibration and further improves The yield and yield of edge exposure. The light source control module 20 may include a PLC controller, an optical coupler device, and the like.

Because the spot energy distribution at the light emitting end of the LED light-emitting unit is uneven, in order to obtain a uniformly distributed illumination spot, it is necessary to perform homogenization. The homogenization module 30 may use a homogenization device such as a quartz rod, which is not specifically limited in this embodiment. In addition, by providing the field of view adjustment module 40, the size of the field of view of the light beam can be conveniently adjusted to meet the requirements of different exposure widths and improve process adaptability. The imaging module 50 is used to converge and image the light beam on the surface of the silicon wafer to achieve exposure of a specified area.

The LED lighting device provided in this embodiment adopts the LED light source module 10. Because the LED has high energy illuminance, low energy consumption, long service life, and quick response, it can effectively solve the problems of LED lighting device switching delay, low illuminance and short life. Improve the yield and yield of edge exposure, and save the cost of spare parts.

2 is a schematic diagram of a field of view adjustment module provided by an embodiment of the present invention. Optionally, referring to FIG. 2, the field of view adjustment module 40 includes a plurality of apertures 41, and the apertures of the plurality of apertures 41 are of different sizes and can be Switch to enter the illumination light path.

Among them, the aperture 41 with different opening sizes corresponds to different sizes of field of view, which can The size of the field of view is adjusted by switching the diaphragm 41 with different openings, thereby adjusting the exposure size. Exemplarily, the field of view adjustment module 40 may include an aperture base 42 and a plurality of apertures 41 fixed on the aperture base 42, and the switching of different apertures 41 is realized by moving the aperture base 42.

Optionally, the distance between the aperture centers of the plurality of diaphragms 41 is greater than or equal to 12 mm.

Specifically, if the center distance of the aperture 41 is too small, the adjacent apertures 41 are likely to affect the exposure field of view. By setting the distance between the aperture centers of the aperture 41 to be greater than or equal to 12 mm, the exposure is guaranteed. For example, the distance between the centers of the openings of adjacent apertures 41 can be set to 23mm, and the outer dimension of the aperture 41 can be set to 22mm×15mm.

Specifically, the aperture size of the aperture 41 can be set according to different exposure width requirements. The aperture of the aperture 41 can be set to increase in size along the exposure width direction, and the sizes of the apertures 41 in other directions can be set to be equal. , The exemplary can be set to 2mm, 3mm or 5mm. Table 1 shows the specific dimensions of the aperture of the diaphragm 41. Among them, the aperture size refers to the size of the aperture 41 along the exposure width direction, the lens magnification refers to the magnification of the imaging module, and the image size refers to the size of the image formed by the imaging module's illumination beam, negative glue deviation and positive glue deviation Refers to the exposure size deviation when using negative photoresist and using positive photoresist respectively. The negative glue exposure width and the positive glue exposure width respectively refer to the exposure width when the negative glue and the positive glue are used for exposure when the corresponding opening size is used. The corresponding opening size can be selected according to different exposure width needs.

Table 1

FIG. 3 is a schematic structural diagram of an LED lighting device provided by an embodiment of the present invention. Optionally, referring to FIG. 3, the LED light source module 10 includes an LED light-emitting unit 11 and a focusing lens 12.

Among them, the focusing lens 12 is used to converge the light beam emitted by the LED light-emitting unit 11, so that the light beam emitted by the LED light-emitting unit 11 enters the homogenizing module 30 more, and improves the light energy utilization rate.

Optionally, referring to FIG. 3 continuously, the homogenization module 30 includes a first quartz rod.

Specifically, the first quartz rod achieves the purpose of uniform light by reflecting the light beam multiple times inside it. Wherein, the cross-sectional dimensions of the incident end surface and the exit end surface of the first quartz rod may be the same, that is, the first quartz rod is a rectangular parallelepiped. In order to meet the uniformity requirement, the first quartz rod needs to achieve a certain aspect ratio. The width of the incident end face and the exit end face of the first quartz rod is the same as that of the first quartz rod The ratio of the length along the transmission direction of the light beam determines the uniform light effect. The width and height of the incident end surface and the output end surface of the first quartz rod are determined by the object field size of the LED lighting device. Exemplarily, the size of the first quartz rod may be set to 9.4mm×9.4mm×175mm.

In addition, when the exit numerical aperture of the LED light source module is large, the incident angle of the light beam entering the first quartz rod is relatively large, and the light beam cannot meet the condition of total reflection. The four reflective surfaces of the first quartz rod can be coated with total reflection film , Thereby improving the utilization rate of light energy.

Fig. 4 is a schematic diagram of the position of the field of view adjustment module and the homogenization module. Referring to Fig. 4, the first quartz rod is fixed on the mechanical fixing seat 31, and the distance between the aperture 41 and the mechanical fixing seat can be set to 0.2mm, The distance from the exit end surface of the first quartz rod can be set to 0.5 mm. This arrangement ensures that the diaphragm 41 will not rub against the mechanical fixing seat 31 when it moves, and the effect of the diaphragm 41 on the refraction, reflection, and scattering of the beam is small, and it is ensured that the diaphragm 41 does not adjust the size of the field of view. Affect the beam.

FIG. 5 is a schematic diagram of an imaging module provided by an embodiment of the present invention. Optionally, referring to FIG. 5, the imaging module 50 includes a first lenticular lens 51, a first convex-concave lens 52, and a second lenticular lens 53 arranged in sequence along the optical path. , The third biconvex lens 54, the first meniscus lens 55 and the fourth biconvex lens 56;

The first biconvex lens 51 is disposed on the side of the first convex-concave lens 52 adjacent to the LED light source module.

Specifically, Table 2 shows the specific size of each lens and the spacing between each lens. Among them, rij refers to the radius of the j-th surface of the i-th lens along the optical path transmission direction, where i is a positive integer greater than or equal to 1 and less than or equal to 6, j is 1 or 2, and j is equal to 1 for the lens adjacent to the LED The surface of the light source module, j is equal to 2 means the lens is far away from the surface of the LED light source module surface. A positive number of rij means that the surface is convex in a direction away from the LED light source module along the light transmission direction, and a negative number of rij means that the surface is convex in a direction adjacent to the LED light source module along the light transmission direction. dm represents the thickness of the mth lens along the optical axis along the optical path transmission direction, and m is a positive integer greater than or equal to 1 and less than or equal to 6. dpq represents the distance along the optical axis between the p-th lens and the q-th lens along the optical path transmission direction, and p and q are both integers greater than or equal to 1 and less than or equal to m.

Table 2

Exemplarily, referring to Table 2, r11 is the radius of the surface of the first lenticular lens 51 adjacent to the LED light source module, and r11 is a negative value indicating that the surface of the first lenticular lens 51 adjacent to the LED light source module is convex toward the LED light source module . d1 is the thickness of the first lenticular lens 51, and d12 is the distance between the first lenticular lens 51 and the first convex-concave lens 52 along the optical axis.

In addition, referring to FIG. 5, the imaging module further includes a first stray light blocking diaphragm 57, which is disposed between the second lenticular lens 53 and the third lenticular lens 54 for removing stray light in the environment. Along the transmission direction of the optical path, the distances between the first stray light blocking diaphragm 57, the second lenticular lens 53, and the third lenticular lens 54 are d8 and d7, respectively, and the distance between the first lenticular lens 51 and the object surface is d0, The distance between the fourth lenticular lens 56 and the image plane is d9. It should be noted that the pitches mentioned in this embodiment are all distances on the central optical axis.

Through simulation, the maximum diffuse spot size of the imaging module of this embodiment does not exceed 0.25mm, and the corresponding optical penumbra does not exceed 0.2mm; the maximum distortion of different wavelengths in the field of view is less than 0.4%, and the detector is set on the image plane. By setting conditions to trace a large number of light rays, and analyzing the light intensity data on the detector, it can be seen that the uniformity of the 5×5mm illumination area on the silicon wafer surface is 2.5%.

In order to facilitate the installation and reduce the cost of parts, the imaging module can be adjusted to ensure the accuracy of lens eccentricity, tilt and air spacing.

FIG. 6 is a schematic diagram of another LED lighting device provided by an embodiment of the present invention. Based on the above-mentioned embodiment, and optionally, referring to FIG. 6, the LED light source module includes an array of LED light-emitting units 11.

Specifically, the LED light emitting unit array may include m*n LED light emitting units 11, where m and n are both integers greater than or equal to 1. Exemplarily, it may include nine LED light emitting units 11 of the same model, arranged in a 3*3 array. The angular distribution of the LED light-emitting unit 11 array adopts a Lambertian distribution, so that the light beam emitted by the LED light source module 10 approximates a light-emitting disc with the same radius and the same brightness. The light emitting wavelength of the LED light emitting unit 11 may be 465 nm, 435 nm, 365 nm or shorter wavelengths. The emission NA of the LED light-emitting unit 11 array is less than 0.95. By adopting the LED light-emitting unit 11 array, the illuminance of the LED light source module 10 can be increased, thereby increasing the illuminance of the LED light source module 10 and improving the exposure efficiency. Specifically, the number of LED light-emitting units 11 in the LED light-emitting unit 11 array can be adjusted according to the need of illumination.

Optionally, the homogenization module 30 includes a micro lens array 33 and a second quartz rod 32;

The micro lens array 33 is arranged on the side of the second quartz rod 32 adjacent to the LED light source module 10 along the optical path.

Specifically, the microlens array 33 is composed of two sets of mutually perpendicular cylindrical mirrors superimposed, which can decompose a single light source into multiple illumination light sources to improve the uniformity of illumination. The role of the microlens array 33 to collect light beams is preliminary uniform light. By designing the curvature of the microlens array 33 to change the numerical aperture of the beam, the numerical aperture of the beam entering the second quartz rod 32 is changed. Larger, the number of reflections of the light beam in the second quartz rod 32 is increased, achieving the effect that the light beam distribution at the exit end of the second quartz rod 32 is more uniform. Fig. 7 is a schematic diagram of a microlens array. Illustratively, the structure of the microlens array 33 is shown in Fig. 7, the size is 20mm*20mm*2mm (tolerances are both ±0.1), the aperture is 18mm*18mm, and the radius is It is 4.35±0.13mm and the transmittance is 92%.

The second quartz rod 32 is a quartz integrator rod with a certain ratio M between the entrance end face and the exit end face. The exit numerical aperture of the quartz rod can be controlled by changing the value of M. The object plane of the imaging module 50 is located on the exit end surface of the second quartz rod 32, amplifies the uniform field of view of the exit end surface of the second quartz rod 32, and forms a uniform exposure field with a uniformity of less than 1% on the relay image plane.

In this embodiment, the microlens array 33 and the second quartz rod 32 are combined to form the homogenization module 30 to adjust the uniformity of the light beam, and further improve the homogenization effect, and the light emitted by the LED light emitting unit 11 array directly enters the homogenization module 30 In this process, there is no loss of light energy, which greatly improves the utilization rate of light energy.

Optionally, referring to FIG. 6, the LED lighting device further includes:

The optical baffle 60 is arranged between the LED light source module 10 and the homogenizing module 30 along the optical path. The optical baffle 60 is used to adjust the numerical aperture of the light beam emitted by the LED light source module 10.

Wherein, when the LED light source module 10 adopts the LED light emitting unit 11 array, it has a certain output numerical aperture, and the numerical aperture is symmetrical about the center of the LED light emitting unit 11 array. By providing the optical baffle 60, the numerical aperture of the LED light source module 10 can be reduced to a certain extent, so that the light emitted by the LED light source module 10 can be coupled into the uniform light module 30 to the maximum extent, and the light energy utilization rate is improved.

Specifically, the distance between the LED light source module 10 and the optical baffle 60 is L1, L1 are less than 2mm. Wherein, the distance L1 between the LED light source module 10 and the optical baffle 60 is determined by the numerical aperture of the emitting end of the LED light source module 10 and the size of the incident end surface of the second quartz rod 32, the closer the distance (the smaller L1), The more light energy coupled into the microlens array 33 and the second quartz rod 32, the higher the utilization rate of light energy. When L1 is less than 1mm, the light energy coupled into the microlens array 33 and the second quartz rod 32 can reach 100%.

Optionally, the distance between the optical baffle 60 and the aforementioned microlens array 33 is L2, L2<L4/2tanθ, where θ is the maximum half-scattering angle of the aforementioned LED light source module 10. The distance between the micro lens array 33 and the second quartz rod 32 is also L2, so that the second quartz rod 32 can collect all the light beams passing through the optical baffle 60.

Optionally, the area of the exit end surface of the second quartz rod 32 is larger than the area of the entrance end surface.

Specifically, the exit cross-section of the LED light source module 10 is L3XL3 square, the exit numerical aperture is less than 0.95, the incident end face of the second quartz rod 32 is L4 X L4 square, the exit end face is L5 X L5 square, and L3<L4 <L5, a uniform area with a numerical aperture of 0.40 and a field of view of L5×L5mm can be obtained.

In addition, since the area of the exit end surface of the second quartz rod 32 is larger than the area of the incident end surface, the numerical aperture of the exit beam of the second quartz rod 32 matches the subsequent optical system. Of course, in this embodiment, the numerical aperture of the light beam emitted from the second quartz rod 32 can also be adjusted by adjusting the distance between the LED light source module 10 and the second quartz rod 32 to achieve the effect of matching with the subsequent optical system.

Optionally, the reflective surface of the second quartz rod 32 is plated with a total reflection film.

Specifically, when the numerical aperture of the emitted light beam of the LED light source module 10 is very When entering the second quartz rod 32, the light beam with a larger incident angle cannot satisfy the total reflection condition. By coating the four reflecting surfaces of the second quartz rod 32 with a total reflection film, the light energy utilization rate can be greatly improved.

FIG. 8 is a schematic diagram of another imaging module provided by an embodiment of the present invention. Optionally, referring to FIG. 8, the imaging module 50 includes a second meniscus lens 71, a fifth lenticular lens 72, and a second convex and concave lens arranged in sequence along the optical path. Lens 73, third convex-concave lens 74, sixth bi-convex lens 75, mirror 76, first bi-concave lens 77, third meniscus lens 78, seventh bi-convex lens 79, and flat lens 80;

The second concave-convex lens 71 is disposed on a side of the fifth biconvex lens 72 adjacent to the LED light source module 10.

Specifically, Table 3 shows the specific size of each lens and the distance between each lens. Among them, Rij refers to the radius of the j-th surface of the i-th lens along the optical path transmission direction, where i is a positive integer greater than or equal to 1 and less than or equal to 6, j is 1 or 2, and j is equal to 1 for the lens adjacent to the LED The surface of the light source module, j is equal to 2 represents the surface of the lens away from the LED light source module. A positive number of Rij means that the surface is convex in a direction away from the LED light source module along the light transmission direction, and a negative number of Rij means that the surface is convex in a direction adjacent to the LED light source module along the light transmission direction. Dm represents the thickness of the m-th lens along the optical axis along the optical path transmission direction, and m is a positive integer greater than or equal to 1 and less than or equal to 6. Dpq represents the distance along the optical axis between the p-th lens and the q-th lens along the optical path transmission direction, and p and q are both integers greater than or equal to 1 and less than or equal to m.

table 3

Exemplarily, referring to Table 3, R11 is the radius of the surface of the second meniscus lens 71 adjacent to the LED light source module, and R11 represents that the surface is convex along the optical path away from the LED light source module. D1 is the thickness of the second meniscus lens 71, and D12 is the distance between the second meniscus lens 71 and the fifth lenticular lens 71.

In addition, referring to FIG. 8, the imaging module further includes a second stray light blocking diaphragm 81, which is disposed between the second convex-concave lens 73 and the third convex-concave lens 74 to remove stray light in the environment. Along the optical path transmission direction, the distances between the second stray light blocking diaphragm 81, the second convex-concave lens 73, and the third convex-concave lens 74 are D31 and D41, respectively, and the distance between the second meniscus lens 71 and the object surface is D0.

By using the above imaging module, a telecentric collimated field of view can be obtained, and the simulation and actual measurement of the above imaging module show that the uniformity of the simulated beam can reach 3.69%, and the uniformity of the measured beam can reach 3.9%.

This embodiment further provides an exposure machine. FIG. 9 is an example of the present invention. For a schematic diagram of an exposure machine provided, referring to FIG. 9, the exposure machine 100 includes the LED lighting device 200 provided by any embodiment of the present invention.

Optionally, the exposure machine 100 further includes:

The first moving part, the first moving part is used to drive the field of view adjustment module of the LED lighting device 200 to move and switch different apertures.

Specifically, the exposure machine 100 further includes a moving part 300, a control part 400, and a monitoring part 500, which can perform various functions such as edge exposure, segment exposure, and linear exposure of a ring exposure box for 6-inch, 8-inch, and 12-inch silicon wafers. among them:

The moving part 300 includes a WEE moving element and a pre-aligned moving element. The WEE motion component includes X and Y motion platforms and the diaphragm automatically switches to the D axis (ie the first moving part). The D axis mainly completes the automatic switching and adjustment of the field of view to meet the needs of different field of view sizes; the X and Y motion platforms carry the implemented LED lighting device 200, through the coordinated movement of the X and Y motion platforms, the illuminating beam is realized in the silicon Adjust the different positions on one side, and realize the automatic switching of different silicon wafer exposure stations at the same time, and realize the linear exposure in the Y direction.

The pre-alignment components mainly include a centering table, a rotating lift table, a CCD lens light source, and a switching axis. The centering table provides horizontal linear movement (to realize the compensation of silicon wafer eccentricity); the rotating lifting table provides vertical lifting (to achieve the vertical positioning of the silicon wafer and the transfer of the silicon wafer with the centering table) and horizontal rotation (to drive the silicon wafer to rotate ); The CCD lens light source realizes the collection of the edge shape data of the silicon wafer; the switching axis provides horizontal linear movement (the position of the CCD lens light source is switched to adapt to different sizes of silicon wafers, such as 6-inch, 8-inch, 12-inch silicon Automatic switching of film stations).

The pre-alignment process is mainly to complete the centering and orientation functions of silicon wafers (including 6-inch, 8-inch and 12-inch silicon wafers), and realize the precise positioning of silicon wafer marks (such as notch marks). Continue to lay the foundation for the realization of the edge exposure function.

The monitoring part 500 includes an ESS sensor element. The ESS sensor (energy spot sensor) is used to measure the light intensity of the LED lighting device, and respond to different light intensities to output a voltage value ESS = gain × U corresponding to a certain linearity.

The control part 400 includes a light source controller, a control mainframe, a computer software and hardware system and other components. By controlling the LED lighting device 200, the moving parts 300, and the monitoring parts 500, the edge exposure process is completed in coordination. The calculation of exposure parameters is mainly to control the relationship between the illuminance, scanning speed, field of view size, and silicon wafer size according to the dose of edge exposure, and to calculate the exposure movement speed of the rotating R axis. For the same target dose, the relationship between the above main variables is:

Among them, I is the illuminance; dl is the size of the field of view; v scan speed; W is the circumference of the silicon wafer, where the target dose dDose is determined according to different photoresists, etc. The size of the silicon wafer is determined; the field of view size dl is unchanged In the above formula, only the illuminance I and the scanning speed v are controllable variables, and the exposure function is realized by adjusting the illuminance and the scanning speed.

The exposure machine 100 provided in this embodiment adopts the LED lighting device 200, and the LED lighting device 200 uses the LED light source module. Because of the high LED energy illuminance, low energy consumption, long service life, and fast response, it can effectively solve the LED lighting device The problems of switching delay, low illuminance and short lifespan improve the yield and yield of edge exposure and save the cost of spare parts.

Note that the above are only the preferred embodiments of the present invention and the applied technical principles. Those with ordinary knowledge in the field to which the present invention pertains will understand that the present invention is not limited to the specific embodiments described above, and various obvious changes can be made to those with ordinary knowledge in the field to which the present invention pertains. Readjustment, mutual combination and substitution will not depart from the protection scope of the present invention. Therefore, although the present invention is described in more detail through the above embodiments, the present invention is not limited to the above embodiments. Without departing from the concept of the present invention, it may further include more other equivalent embodiments. The scope is determined by the scope of the attached patent application.

10‧‧‧LED light source module

20‧‧‧Light source control module

30‧‧‧Uniform light module

40‧‧‧Field of View Adjustment Module

50‧‧‧Imaging module

Claims (14)

An LED lighting device, its characteristics are: LED light source module, light source control module, homogenization module, imaging module and field of view adjustment module; The aforementioned light source control module is connected to the aforementioned LED light source module for controlling the light-emitting state of the aforementioned LED light source module; The aforementioned homogenization module is used to homogenize the light beam emitted by the aforementioned LED light source module; The aforementioned field of view adjustment module is used to adjust the size of the field of view of the light beam emitted by the aforementioned homogenization module; The aforementioned imaging module is used to project the light beam emitted by the aforementioned field of view adjustment module to the illumination position. Such as the LED lighting device described in item 1 of the scope of patent application, in which, The aforementioned field of view adjustment module includes a plurality of diaphragms, and the plurality of diaphragm openings are of different sizes and can be switched into the illumination light path. Such as the LED lighting device described in item 2 of the scope of patent application, in which, The distances between the centers of the apertures of the aforementioned multiple diaphragms are all greater than or equal to 12 mm. Such as the LED lighting device described in item 2 of the scope of patent application, in which, The size of the apertures of the plurality of apertures along the exposure width direction increases sequentially, and the sizes in other directions are all equal. Such as the LED lighting device described in item 1 of the scope of patent application, in which, The aforementioned LED light source module includes an LED light-emitting unit and a focusing lens. Such as the lighting device described in item 5 of the scope of patent application, in which, The aforementioned imaging module includes a first bi-convex lens, a first convex-concave lens, a second bi-convex lens, a third bi-convex lens, a first meniscus lens, and a fourth bi-convex lens arranged in sequence along the optical path; The first biconvex lens is arranged on a side of the first convex-concave lens adjacent to the LED light source module. Such as the LED lighting device described in item 5 of the scope of patent application, in which, The aforementioned homogenization module includes a first quartz rod. Such as the LED lighting device described in item 1 of the scope of patent application, in which, The aforementioned LED light source module includes an LED light emitting unit array. Such as the LED lighting device described in item 1 or 8 of the scope of patent application, in which, The aforementioned homogenization module includes a microlens array and a second quartz rod; The microlens array is arranged on the side of the second quartz rod adjacent to the LED light source module along the optical path. Such as the LED lighting device described in item 9 of the scope of patent application, in which, The area of the exit end surface of the aforementioned second quartz rod is larger than the area of the entrance end surface. Such as the LED lighting device described in item 8 of the scope of patent application, which further includes: The optical baffle is arranged between the LED light source module and the homogenizing module along the optical path, and the optical baffle is used to adjust the numerical aperture of the light beam emitted by the LED light source module. Such as the LED lighting device described in item 8 of the scope of patent application, in which, The aforementioned imaging module includes a second concave-convex lens, a fifth double-convex lens, a second convex-concave lens, a third convex-concave lens, a sixth double-convex lens, a mirror, a first double-concave lens, a third concave-convex lens, and a seventh concave-convex lens, a fifth double-convex lens, a second convex-convex lens, a third convex-concave lens, a sixth double-convex lens, and a second concave-convex lens. Double convex lens and flat lens; The second concave-convex lens is arranged on the side of the fifth biconvex lens adjacent to the LED light source module. An exposure machine characterized by the LED lighting device described in any one of items 1 to 12 in the scope of patent application. Such as the exposure machine described in item 13 of the scope of patent application, which further includes: The first moving part, the aforementioned first moving part is used to drive the field of view adjustment module of the LED lighting device to move and switch different apertures.

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