CN112305863B - Illumination system, pupil ellipticity compensation method and photoetching machine - Google Patents
Illumination system, pupil ellipticity compensation method and photoetching machine Download PDFInfo
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- CN112305863B CN112305863B CN201910679758.5A CN201910679758A CN112305863B CN 112305863 B CN112305863 B CN 112305863B CN 201910679758 A CN201910679758 A CN 201910679758A CN 112305863 B CN112305863 B CN 112305863B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
Abstract
The invention provides an illumination system, a pupil ovality compensation method and a photoetching machine, which comprise a light source module for emitting illumination light beams, a convergence module for receiving and converging the illumination light beams and a pupil adjusting module positioned between the light source module and the convergence module, wherein a control module can change the incident angle of the illumination light beams by controlling the pupil adjusting module to rotate on a plane vertical to an optical axis, and the relative illumination of different positions on a pupil plane can be changed due to the change of the transmittance of the pupil adjusting module along with the change of the incident angle of the light beams, so that the pupil ovality of the illumination system is compensated, the CDU performance is improved, in addition, the invention can perform compensation according to the current pupil ovality of the illumination system, so that the pupil ovality of the illumination system in the life cycle meets the control requirement, and the reliability of equipment is improved, because the pupil adjusting module only rotates on a plane vertical to the optical axis, the pupil adjusting module is convenient to control, simple in structure and lower in cost.
Description
Technical Field
The invention relates to the technical field of semiconductor preparation, in particular to an illumination system, a pupil ellipticity compensation method and a photoetching machine.
Background
In the conventional exposure process, CDU (Critical Dimension Uniformity) is an important factor for measuring exposure effect, in order to improve CDU, it is considered to decompose CDU into line width Uniformity of H line and line width Uniformity of V line, and improve CDU by improving average deviation (HV bias) of H line and V line, and pupil ellipticity of illumination system in the lithography apparatus is a main factor affecting HV bias.
Pupil ovality refers to the energy difference in the X direction and the Y direction in a pupil plane of the illumination system, and with the use of the lithographic apparatus, the performance of the illumination system also deteriorates, which results in deterioration of pupil ovality of the illumination system, and a compensation control means needs to be added to make the pupil ovality in the whole life cycle of the illumination system meet the control requirement. However, most of the existing pupil ellipticity compensation methods are light blocking methods, that is, an optical baffle is arranged on a pupil plane to change the energy distribution on the pupil plane, and the methods have high requirements on machinery and control, complex structure and high cost.
Disclosure of Invention
The invention aims to provide an illumination system, a pupil ellipticity compensation method and a photoetching machine, and aims to solve the problems of high control requirement, complex structure and the like of a pupil ellipticity compensation mode of the conventional illumination system.
In order to achieve the above object, the present invention provides an illumination system comprising:
the light source module is used for emitting an illumination light beam;
the convergence module is used for receiving and converging the illumination light beams;
the pupil adjusting module is positioned between the light source module and the converging module, and the transmittance of the pupil adjusting module changes along with the change of the incident angle of the light beam;
a control module that controls the pupil adjustment module to rotate on a plane perpendicular to an optical axis to change an incident angle of the illumination beam and compensate for pupil ovality of the illumination system.
Optionally, the pupil adjusting module includes a transparent plate and an antireflection film coated on the surface of the transparent plate.
Optionally, the pupil adjustment module is located at an object plane of the convergence module.
Optionally, the light source module includes a mercury lamp light source and an ellipsoidal reflector, and the mercury lamp light source is located at any focal point of the ellipsoidal reflector.
Optionally, the light source module includes a laser light source, a beam expanding unit, and an optical diffraction unit, where the beam expanding unit expands and collimates an illumination light beam emitted from the laser light source and then enters the optical diffraction unit, and the optical diffraction unit diffracts the illumination light beam and then enters the convergence module, so as to form a pupil distribution with a set shape on a pupil plane of the illumination system.
Optionally, the convergence module is a 2F optical module, a 4F optical module, or a 6F optical module.
Optionally, the focal length of the converging module is adjustable, and the focal length of the converging module is adjusted to change the magnification of the converging module and change the size of the pupil distribution formed on the pupil plane of the illumination system.
Optionally, the lighting system further comprises:
the light homogenizing module is positioned on the image surface of the converging module and used for receiving the illumination light beams converged by the converging module and homogenizing the illumination light beams so as to form a uniform illumination field of view;
and the relay module is positioned at the light outlet end of the light homogenizing module and is used for amplifying the illumination field of view.
The invention also provides a pupil ovality compensation method for compensating the pupil ovality of the illumination system, comprising the following steps:
acquiring the current pupil ellipticity of the illumination system at different stages within the life cycle of the illumination system;
and controlling the pupil adjusting module to rotate on a plane vertical to an optical axis according to the current pupil ellipticity of the illumination system so as to change the incidence angle of the illumination light beam, so as to compensate the ellipticity of the illumination system and enable the pupil ellipticity of the illumination system in the life cycle to meet the control requirement.
The invention also provides a photoetching machine comprising the illumination system.
In the illumination system, the pupil ovality compensation method and the lithography machine provided by the invention, the illumination system comprises a light source module for emitting an illumination light beam, a convergence module for receiving and converging the illumination light beam and a pupil adjusting module positioned between the light source module and the convergence module, the control module can change the incident angle of the illumination light beam by controlling the pupil adjusting module to rotate on a plane vertical to an optical axis, the relative illumination of different positions on a pupil plane can be changed due to the change of the transmittance of the pupil adjusting module along with the change of the incident angle of the light beam, so that the pupil ovality of the illumination system is compensated, the CDU performance is improved, in addition, the invention can perform compensation according to the current pupil ovality of the illumination system, so that the pupil ovality of the illumination system in the life cycle meets the control requirement, and the reliability of the equipment is improved, because the pupil adjusting module only rotates on a plane vertical to the optical axis, the pupil adjusting module is convenient to control, simple in structure and lower in cost.
Drawings
Fig. 1 is a simplified optical path diagram of an illumination system according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a pupil adjustment module located on an object plane of a convergence module according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a pupil adjustment module not located on an object plane of a convergence module according to an embodiment of the present invention;
FIG. 4 is a diagram illustrating a relationship between a transmittance of a pupil adjustment module and an angle variation of an incident beam according to an embodiment of the present invention;
fig. 5a is a distribution diagram of illuminance on a pupil plane when the pupil adjusting module in fig. 4 is parallel to the XY plane according to a first embodiment of the present invention;
FIG. 5b is a diagram of an illuminance distribution at a pupil plane when the pupil adjustment module in FIG. 4 is tilted by 12 degrees along the X-axis according to an embodiment of the present invention;
FIG. 6 is a diagram of a relationship between a tilt angle of the pupil adjustment module in FIG. 4 along the X-axis and an ellipticity of the pupil according to an embodiment of the present invention;
FIG. 7 is a diagram illustrating a relationship between a transmittance of a pupil adjustment module and an angle variation of an incident beam according to an embodiment of the invention;
FIG. 8a is a diagram of a relationship between a tilt angle of the pupil adjustment module in FIG. 7 along the X-axis and an ellipticity of the pupil according to an embodiment of the present invention;
FIG. 8b is a diagram of a relationship between a tilt angle of the pupil adjustment module in FIG. 7 along the Y-axis and a pupil ovality according to a first embodiment of the present invention;
FIG. 9 is a flowchart of a pupil ovality compensation method provided by an embodiment of the present invention;
fig. 10 is a simplified optical path diagram of an illumination system according to a second embodiment of the present invention;
wherein the reference numerals are:
10-a light source module; 11-a laser light source; 12-a beam expanding unit; 13-an optical diffraction unit;
60-a light source module; 61-mercury lamp light sources; 62-ellipsoidal reflectors;
20-a pupil adjustment module;
30-a convergence module; l1 — first fourier lens; l2-second fourier lens; p1-object plane; p2 — image plane; s-pupil plane; f-focal length.
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. The advantages and features of the present invention will become more apparent from the following description. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Example one
For convenience of description, the present embodiment establishes an XYZ three-dimensional coordinate system with a vertical upward direction as a Y direction, an inward direction perpendicular to a paper surface as an X direction, and a horizontal leftward direction as a Z direction (meanwhile, the Z direction is also a direction of an optical axis), as shown in fig. 1, and the present embodiment provides an illumination system, including:
a light source module 60, wherein the light source module 60 comprises a mercury lamp light source 61 and an ellipsoidal reflector 62, the mercury lamp light source 61 is located at any focus of the ellipsoidal reflector 61, the mercury lamp light source 61 is used for emitting an illumination light beam, and the ellipsoidal reflector 62 reflects the illumination light beam and transmits the illumination light beam along an optical axis;
a convergence module 30, the convergence module 30 being configured to receive and converge the illumination light beam;
a pupil adjusting module 20 located between the light source module 60 and the converging module 30, wherein the transmittance of the pupil adjusting module 20 varies with the incident angle of the light beam;
a control module (not shown) for controlling the pupil adjustment module 20 to rotate in the XY plane to change the angle of incidence of the illumination beam and to compensate for pupil ovality of the illumination system.
Specifically, as shown in fig. 2, in the present embodiment, the converging module 30 is a 4F optical module, which includes a first fourier lens L1 and a second fourier lens L2 arranged along the Z axis, focal lengths of the first fourier lens L1 and the second fourier lens L2 are both F, a distance between the first fourier lens L1 and the second fourier lens L2 is also F, a distance between the object plane P1 of the converging module 30 and the central axis of the first fourier lens L1 is also F, and a distance between the image plane P2 of the converging module 30 and the central axis of the second fourier lens L2 is also F, so that the module is called a 4F optical module. It can be understood that the angular distribution of the object plane of the illumination system is the position distribution of the pupil plane (or the spectrum plane), so that the relative illuminance at different positions of the pupil plane (or the spectrum plane) can be changed by changing the transmittance at different angles of the object plane, and the ellipticity of the pupil plane can be further changed, and in this embodiment, the pupil plane S of the converging module 30 is the pupil plane of the illumination system.
Further, the object plane P1 of the converging module 30 is located at the light outlet end of the ellipsoidal reflector 61 so as to receive the illumination light, as shown in fig. 2, the pupil adjusting module 20 is located at the object plane P1 of the converging module 30 so as to achieve the best adjusting effect, the mercury lamp light source 61 is adjusted to the target spectrum to emit the illumination light beam (for example, the illumination light beam with the center wavelength of 365 nm) meeting the illumination requirement, then the pupil adjusting module 20 is controlled by the control module to rotate along the X axis and/or the Y axis so that the pupil adjusting module 20 has a tilt on the XY plane, since the transmittance of the pupil adjusting module 20 varies with the incident angle of the light beam, the relative illuminance (the energy distribution on the pupil plane S) at different positions on the pupil plane S can be changed, thereby compensating the pupil ellipticity of the illumination system, and the CDU performance is improved. For example, when the pupil adjustment module 20 rotates around the X axis, the transmittance of the illumination beam exiting along the X axis from the object plane is not changed, but the transmittance of the illumination beam exiting along the Y axis is changed by the pupil adjustment module 20, so that the energy difference is generated in the X direction and the Y direction on the pupil plane S, and the pupil ellipticity of the illumination system is changed.
It is understood that the pupil adjustment module 20 is not only located on the object plane P1 of the converging module 30, as shown in fig. 3, the pupil adjustment module 20 may be located at any position between the object plane P1 of the converging module 30 and the first fourier lens L1 or between the converging module 30 and the light source module 60, and the effect of compensating the pupil ellipticity may be achieved.
Further, in this embodiment, the converging module 30 is a 4F optical module, and in other embodiments, the converging module 30 may also be a 2F optical module (only one fourier lens with a focal length F) or a 6F optical module (3 fourier lenses with a focal length F), and the like, as long as the converging module relates to the mutual conversion between the object plane and the pupil plane, which is not illustrated herein.
In this embodiment, the pupil adjusting module 20 includes a transparent flat plate and an antireflection film coated on the surface of the transparent flat plate, the antireflection film and the transparent flat plate are two media with different refractive indexes, the illumination beam is refracted when entering the pupil adjusting module 20, and when the incident angle is different, the transmittance of the pupil adjusting module 20 is also different, so when the pupil adjusting module 20 is parallel to the XY plane, the illumination beam enters perpendicularly, and the transmittance is the largest, and when the pupil adjusting module 20 rotates along the X axis and/or the Y axis, the incident angle of the illumination beam changes, and the transmittance of the pupil adjusting module 20 is also different. Moreover, since the pupil adjusting module 20 is coated with an antireflection film, it also has a filtering function, or it can be understood that the pupil adjusting module 20 in this embodiment adopts an existing driving optical filter, and the optical filter can be driven by the rotation of the control module to realize an effect of compensating the pupil ellipticity while selecting the wavelength of the illumination beam, so that no other optical element needs to be added to the illumination system, and the structure is simple and the cost is lower.
Further, as shown in fig. 1 and fig. 2, the illumination system in this embodiment further includes a light uniformizing module 40 and a relay module 50, where the light uniformizing module 40 is located on the image plane P2 of the converging module 30, and is configured to receive the illumination light beams converged by the converging module 30 and perform light uniformizing, so as to form a uniform illumination field of view at a light exit end of the light uniformizing module 40, and the relay module 50 is located at a light exit end of the light uniformizing module 40, and is configured to amplify the illumination field of view, and form an illumination field of view at a relay image plane, that is, an illumination image plane, where uniformity and field of view range both meet requirements.
To further illustrate the compensation effect of the pupil adjustment module 20, the present embodiment provides a relationship between the transmittance of the pupil adjustment module 20 and the incident beam angle as shown in fig. 4, and the pupil adjustment module 20 is placed in the illumination system as shown in fig. 5a, which is the illuminance distribution on the pupil plane when the pupil adjustment module 20 is parallel to the XY plane (tilted on the XY plane, and the illumination beam is incident vertically), as shown in fig. 5b, which is the illuminance distribution on the pupil plane when the pupil adjustment module 20 is tilted by 12 ° along the X axis, as can be seen from comparing fig. 5a and 5b, when the pupil adjustment module 20 is tilted by 12 ° along the X axis, the pupil ellipticity of the illumination system is better (the illuminance distribution in the X direction and the Y direction on the pupil plane is more uniform in fig. 5 b). The relationship curve between the inclination angle of the pupil adjustment module 20 along the X axis and the pupil ellipticity obtained through a plurality of experiments is shown in fig. 6, and the experiment shows that when the pupil adjustment module 20 shown in fig. 4 is adopted, the pupil ellipticity of the illumination system can be compensated by about 8% when the pupil adjustment module 20 is inclined by 13 degrees along the X axis.
Next, the present embodiment further provides a pupil adjustment module 20 with transmittance and incident beam angle variation as shown in fig. 7, the pupil adjustment module 20 is placed in the illumination system, a curve of a tilt angle (Rx) of the pupil adjustment module 20 along the X-axis versus pupil ellipticity is obtained through a plurality of experiments as shown in fig. 8a, and the pupil ellipticity of the illumination system can be compensated by about 4% when the pupil adjustment module 20 is tilted by 1 ° along the X-axis as shown in fig. 7 is used through experiments; the relationship curve between the inclination angle (Ry) of the pupil adjustment module 20 along the Y axis and the pupil ellipticity is shown in fig. 8b, and it can be seen that, when the pupil adjustment module 20 shown in fig. 7 is adopted, the pupil ellipticity of the illumination system can also be compensated by about 4% when the pupil adjustment module 20 is inclined by 13 ° along the Y axis. If the pupil ellipticity is equal to 1 (the energy in the X direction and the energy in the Y direction on the pupil plane are equal) is the optimal pupil ellipticity, if the current pupil ellipticity is less than 1 (the energy in the X direction on the pupil plane is less than the energy in the Y direction) or greater than 1 (the energy in the X direction on the pupil plane is greater than the energy in the Y direction), the pupil adjustment module 20 may be tilted along the X axis or the Y axis accordingly to make the pupil ellipticity approach the optimal pupil ellipticity.
It can be understood that the relationship between the transmittance of the pupil adjusting module 20 and the incident beam angle can be other types, the degree of compensation when the pupil adjusting module 20 rotates a set angle on the XY plane can be countless, and in practical applications, different types of dielectric films (antireflection films) can be selectively formed on a plane glass according to different situations, so that the pupil adjusting module 20 has different relationships between the transmittance and the incident beam angle.
Further, since the performance of the illumination system may also be degraded after the illumination system is used for a period of time, thereby causing the degradation of the pupil ovality of the illumination system, for example, the pupil ovality is equal to 1, which is the optimal pupil ovality, and the pupil ovality is degraded to less than 1 or more than 1, at which time the CDU performance of the illumination system is degraded, based on which, as shown in fig. 9, the present embodiment further provides a pupil ovality compensation method for compensating the pupil ovality of the illumination system, comprising:
step S1: acquiring the current pupil ellipticity of the illumination system at different stages within the life cycle of the illumination system;
step S2: and controlling the pupil adjusting module to rotate on a plane vertical to an optical axis according to the current pupil ellipticity of the illumination system so as to change the incidence angle of the illumination light beam, so as to compensate the ellipticity of the illumination system and enable the pupil ellipticity of the illumination system in the life cycle to meet the control requirement.
Specifically, the pupil ovality compensation method may be performed whenever pupil ovality compensation is required, for example, when the current pupil ovality of the illumination system deteriorates to be less than 1 (energy in the X direction on the pupil plane is less than energy in the Y direction) or greater than 1 (energy in the X direction on the pupil plane is greater than energy in the Y direction), the pupil adjustment module needs to be controlled to rotate on a plane perpendicular to the optical axis so that the current pupil ovality approaches 1, and the specific rotation direction and rotation angle may be determined according to the transmittance of the pupil adjustment module and the incident beam angle variation relationship.
Based on this, the present embodiment also provides a lithography machine including the illumination system.
Example two
As shown in fig. 10, the difference from the first embodiment is that, in the present embodiment, a light source module 10 includes a laser light source 11, a beam expanding unit 12, and an optical diffraction unit 13, the beam expanding unit 12 expands and collimates an illumination light beam emitted from the laser light source and then enters the illumination light beam into the optical diffraction unit 13, the optical diffraction unit diffracts the illumination light beam to form a certain angle distribution and then enters the convergence module 30, and a pupil distribution with a set shape, for example, an elliptical pupil distribution or an annular pupil distribution, is formed on a pupil plane of the convergence module 30. In this embodiment, the converging module 30 may be a fixed focal length or a variable focal length, and when the focal length of the converging module 30 is adjustable, the focal length of the converging module 30 may be adjusted to change the magnification of the converging module 30, and change the size of the pupil distribution formed on the pupil plane of the converging module 30, so that pupil distributions with different sizes and shapes may be obtained by switching different optical diffraction units 13 and changing the magnification of the converging module 30, so as to meet the requirement of exposure with higher precision.
Due to the adoption of the laser light source 11, compared with a mercury lamp light source, the laser light source emits an illuminating beam with a narrower bandwidth, so that the exposure resolution is higher, and the filtering burden in a subsequent light path is reduced.
Further, since the performance of the illumination system may also be degraded after the illumination system is used for a period of time, thereby causing the degradation of the pupil ovality of the illumination system, for example, the pupil ovality is equal to 1, which is the optimal pupil ovality, and the pupil ovality is degraded to less than 1 or more than 1, at which time the CDU performance of the illumination system is degraded, based on which, as shown in fig. 9, the present embodiment further provides a pupil ovality compensation method for compensating the pupil ovality of the illumination system, comprising:
step S1: acquiring the current pupil ellipticity of the illumination system at different stages within the life cycle of the illumination system;
step S2: and controlling the pupil adjusting module to rotate on a plane vertical to an optical axis according to the current pupil ellipticity of the illumination system so as to change the incidence angle of the illumination light beam, so as to compensate the ellipticity of the illumination system and enable the pupil ellipticity of the illumination system in the life cycle to meet the control requirement.
Specifically, the pupil ovality compensation method may be performed whenever pupil ovality compensation is required, for example, when the current pupil ovality of the illumination system deteriorates to be less than 1 (energy in the X direction on the pupil plane is less than energy in the Y direction) or greater than 1 (energy in the X direction on the pupil plane is greater than energy in the Y direction), the pupil adjustment module needs to be controlled to rotate on a plane perpendicular to the optical axis so that the current pupil ovality approaches 1, and the specific rotation direction and rotation angle may be determined according to the transmittance of the pupil adjustment module and the incident beam angle variation relationship.
Based on this, the present embodiment also provides a lithography machine including the illumination system.
In summary, in the illumination system, the pupil ovality compensation method and the lithography machine provided in the embodiments of the present invention, the illumination system includes a light source module for emitting an illumination beam, a converging module for receiving and converging the illumination beam, and a pupil adjusting module located between the light source module and the converging module, the control module can change an incident angle of the illumination beam by controlling the pupil adjusting module to rotate on a plane perpendicular to an optical axis, and since a transmittance of the pupil adjusting module changes with a change of an incident angle of the illumination beam, a relative illumination intensity at different positions on the pupil plane can be changed, so as to compensate a pupil ovality of the illumination system and improve a CDU performance, and the present invention can perform compensation according to a current pupil ovality of the illumination system, so that the pupil ovality of the illumination system in a life cycle of the illumination system meets a control requirement, thereby improving a reliability of the apparatus, because the pupil adjusting module only rotates on a plane vertical to the optical axis, the pupil adjusting module is convenient to control, simple in structure and lower in cost.
The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any way. It will be understood by those skilled in the art that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (10)
1. An illumination system, comprising:
the light source module is used for emitting an illumination light beam;
the convergence module is used for receiving and converging the illumination light beams;
the pupil adjusting module is positioned between the light source module and the converging module, and the transmittance of the pupil adjusting module changes along with the change of the incident angle of the light beam;
a control module that controls the pupil adjustment module to rotate on a plane perpendicular to an optical axis to change an incident angle of the illumination beam and compensate for pupil ovality of the illumination system.
2. The illumination system of claim 1, wherein the pupil adjustment module comprises a transparent plate and an anti-reflection coating applied to a surface of the transparent plate.
3. The illumination system of claim 1 or 2, wherein the pupil adjustment module is located at an object plane position of the converging module.
4. The illumination system according to claim 1 or 2, wherein the light source module comprises a mercury lamp light source and an ellipsoidal mirror, the mercury lamp light source being located at any focal point of the ellipsoidal mirror.
5. The illumination system according to claim 1 or 2, wherein the light source module comprises a laser light source, a beam expanding unit and an optical diffraction unit, the beam expanding unit expands and collimates an illumination light beam emitted from the laser light source and then enters the optical diffraction unit, and the optical diffraction unit diffracts the illumination light beam and then enters the convergence module, so as to form a pupil distribution with a set shape on a pupil plane of the illumination system.
6. The illumination system of claim 1, wherein the collection module is a 2F optical module, a 4F optical module, or a 6F optical module.
7. The illumination system of claim 1 or 6, wherein the focal length of the converging module is adjustable by adjusting the focal length of the converging module to change the magnification of the converging module and to change the size of a pupil distribution formed on a pupil plane of the illumination system.
8. The illumination system of claim 1, wherein the illumination system further comprises:
the light homogenizing module is positioned on the image surface of the converging module and used for receiving the illumination light beams converged by the converging module and homogenizing the illumination light beams so as to form a uniform illumination field of view;
and the relay module is positioned at the light outlet end of the light homogenizing module and is used for amplifying the illumination field of view.
9. A pupil ovality compensation method for compensating a pupil ovality of an illumination system as claimed in any one of claims 1 to 8, characterized in that it comprises:
acquiring the current pupil ellipticity of the illumination system at different stages within the life cycle of the illumination system;
and controlling the pupil adjusting module to rotate on a plane vertical to an optical axis according to the current pupil ellipticity of the illumination system so as to change the incidence angle of the illumination light beam, so as to compensate the ellipticity of the illumination system and enable the pupil ellipticity of the illumination system in the life cycle to meet the control requirement.
10. A lithography machine comprising an illumination system according to any one of claims 1 to 8.
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| WO2006079486A2 (en) * | 2005-01-29 | 2006-08-03 | Carl Zeiss Smt Ag | Illumination system, in particular for a projection exposure machine in semiconductor lithography |
| CN107870522A (en) * | 2016-09-26 | 2018-04-03 | 上海微电子装备（集团）股份有限公司 | The detection control method of imaging optical path device and imaging optical path device |
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| US7511886B2 (en) * | 2003-05-13 | 2009-03-31 | Carl Zeiss Smt Ag | Optical beam transformation system and illumination system comprising an optical beam transformation system |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006079486A2 (en) * | 2005-01-29 | 2006-08-03 | Carl Zeiss Smt Ag | Illumination system, in particular for a projection exposure machine in semiconductor lithography |
| CN107870522A (en) * | 2016-09-26 | 2018-04-03 | 上海微电子装备（集团）股份有限公司 | The detection control method of imaging optical path device and imaging optical path device |
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