CN108803244B - Illumination device and illumination method and photoetching machine - Google Patents
Illumination device and illumination method and photoetching machine Download PDFInfo
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- CN108803244B CN108803244B CN201710288055.0A CN201710288055A CN108803244B CN 108803244 B CN108803244 B CN 108803244B CN 201710288055 A CN201710288055 A CN 201710288055A CN 108803244 B CN108803244 B CN 108803244B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
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Abstract
The invention discloses a lighting device, which comprises a light source and a light homogenizing system, wherein the light homogenizing system is arranged on an optical axis of the light source, and light beams emitted by the light source are imaged on a mask through the light homogenizing system; the light source comprises an LED array and a light source controller, and the light source controller respectively controls the inclination angle of the light beam emitted by each LED light source in the LED array and the light source optical axis according to the pupil energy distribution requirement. The illumination device can obtain required energy distribution at different positions of a pupil plane by changing the inclination angle between each LED light source emergent light beam and the light source optical axis, so as to realize a corresponding off-axis illumination mode. The invention also discloses an illumination method, which is used for the illumination device, realizes the off-axis illumination method, and has simple operation and high accuracy. The invention also discloses a photoetching machine, which comprises the lighting device, so that the focal depth of the projection objective of the photoetching machine is improved, and the photoetching efficiency of the photoetching machine is improved.
Description
Technical Field
The invention relates to an illumination device and an illumination method and a photoetching machine.
Background
Microlithography in semiconductor fabrication uses an optical system to precisely project and expose a pattern on a reticle onto a photoresist-coated silicon wafer.
In the photolithography process, two factors that play a key role in image quality are resolution and focal depth, in order to enhance the resolution capability of an exposure system, improve the focal depth and enlarge a process window, an advanced photolithography process requires the use of off-axis illumination technology (OAI), and conventional off-axis illumination includes annular illumination, dipole illumination, quadrupole illumination, and the like, and different off-axis illumination pupil distributions are mainly selected according to a specific mask pattern.
At present, the technical solutions of dipole illumination or quadrupole illumination include:
1. a baffle plate or a glass flat plate with variable transmittance distribution is arranged on the pupil plane to directly change the energy distribution of the pupil plane. This solution is the simplest and can be applied in any optical system, but with high energy losses and slow pupil switching speeds.
2. Using Diffractive Optical Elements (DOEs), a corresponding energy distribution is obtained in the pupil plane by selecting DOEs with different far field distributions. The scheme is commonly used in an exposure system taking a laser as a light source, the energy utilization rate is improved, but only preset pupil distribution can be obtained, the pupil switching speed is low, and the DOE price is high.
With the development of Light Emitting Diode (LED) technology, the power of an LED light source is closer to the high-power and high-intensity requirement of the modern semiconductor industry, the LED light source has the characteristics of small volume, long service life, easy control of emergent light power and the like, the LED light source meets the requirements under different use scenes by using different energy collecting devices and light homogenizing devices, and the LED light source has a great application prospect.
Disclosure of Invention
The invention provides an illuminating device, which is used for solving the problems of low energy utilization rate, low pupil switching speed and high manufacturing cost of the existing illuminating device for realizing off-axis illumination.
In order to solve the technical problems, the technical scheme of the invention is as follows:
an illumination device comprises a light source and an dodging system, wherein the dodging system is arranged on an optical axis of the light source, and a light beam emitted by the light source is imaged on a mask through the dodging system;
the light source comprises an LED array and a light source controller, and the light source controller respectively controls the inclination angle of the light beam emitted by each LED light source in the LED array and the light source optical axis according to the pupil energy distribution requirement.
Preferably, the light source further comprises a light beam collector array for collimating the light beams emitted by the LED arrays, the LED arrays comprise a plurality of LED light sources of the same type, the light beam collector array comprises a plurality of light beam collectors, one light beam collector corresponds to one LED light source, and the LED light sources and the corresponding light beam collectors are fixed into a whole.
Preferably, the angular distribution of the light beam emitted by the LED light source is lambertian.
Preferably, the wavelength of the light beam emitted from the LED light source is 365nm, 248nm or shorter.
Preferably, the dodging system includes a first converging lens group, a dodging unit and a relay lens group which are sequentially arranged on the optical axis of the light source, the object plane of the first converging lens group is located at the light outlet end of the light source, the light inlet end of the dodging unit is located on the image plane of the first converging lens group, and the object plane of the relay lens group is located at the light outlet end of the dodging unit.
Preferably, the first converging lens group is a fixed focus converging lens group or a zoom converging lens group, and the first converging lens group can control the pupil distribution position of the illumination pupil plane and change the size of the pupil while controlling the inclination angle between the light beam emitted by the light source and the optical axis of the light source, so as to better realize multiple off-axis illumination modes.
Preferably, the light uniformizing unit includes a light uniformizer and a second converging lens group, the light uniformizer is located on an image plane of the first converging lens group, an entrance pupil plane of the second converging lens group is located at an exit end of the light uniformizer, and an object plane of the relay lens group is located on an image plane of the second converging lens group.
Preferably, the light homogenizing unit is a micro lens array or an integrating rod.
Preferably, the dodging system further comprises a field control unit, the field control unit comprises a variable field diaphragm and a variable field diaphragm controller, the variable field diaphragm is located at the light outlet end of the dodging unit, and the variable field diaphragm controller controls the size of the field formed by the variable field diaphragm.
The illumination device has the advantages of simple pupil modulation principle, high switching speed and high energy utilization rate; meanwhile, the lighting device is simple in structure, convenient to install and debug and capable of reducing production cost.
The invention also discloses an illumination method, which is used in the illumination device and comprises the following steps: and setting the number of the LED light sources in the LED array according to the pupil energy distribution requirement, when the pupil energy distribution requirement is an N-level illumination mode, setting the number of the LED light sources in the LED array to be at least N, respectively controlling the inclination angle of the light beam emitted by each LED light source in the LED array and the light source optical axis to generate the required pupil appearance, and imaging the light beam on a mask after passing through the dodging system to finish off-axis illumination.
Preferably, a beam collector is arranged behind each LED light source to collimate the emergent light of the LED light source.
Preferably, the LED array is set to include four LED light sources, and the four LED light sources are symmetrically distributed on the X axis and the Y axis in pairs.
Preferably, the light beam emitted by each LED light source is controlled not to incline in the X direction and the Y direction with the light source optical axis, and the illumination device forms a circular pupil illumination mode.
Preferably, the light beams emitted by the four LED light sources are controlled to incline at two angles around the Y axis, and the lighting device forms an X-direction two-pole lighting mode.
Preferably, the light beams emitted by the four LED light sources are controlled to incline at two angles around the X axis, and the lighting device forms a Y-direction dipolar lighting mode.
Preferably, two of the light beams emitted by the four LED light sources are controlled to be tilted at four angles around the X axis and two of the light beams emitted by the four LED light sources around the Y axis, and the lighting device forms a quadrupole lighting mode.
Preferably, the dodging system comprises a first converging lens group, a dodging unit and a relay lens group which are sequentially arranged on the light source optical axis, the object plane of the first converging lens group is located at the light outlet end of the light source, the light inlet end of the dodging unit is located on the image plane of the first converging lens group, the object plane of the relay lens group is located at the light outlet end of the dodging unit, and the inclination angle between the light beam emitted by the LED array and the light source optical axis is calculated according to the focal length of the first converging lens group.
Preferably, the first converging lens group is a zoom converging lens group, and the pupil distribution position and size of the illumination pupil plane are changed by changing the focal length of the zoom converging lens group.
Preferably, the illumination method further comprises arranging a variable field stop along an optical axis between the dodging unit and the relay lens group, and adjusting the size of the illumination field on the mask.
According to the technical scheme, the illumination method is simple to operate and high in accuracy.
The invention also discloses a photoetching machine, and the photoetching illumination device of the photoetching machine adopts the illumination device.
According to the technical scheme, the off-axis illumination mode can be realized by adopting the illumination device, the focal depth of the projection objective of the photoetching machine is improved, and the photoetching efficiency of the photoetching machine is improved.
Drawings
Fig. 1 and 2 are schematic structural views of a lighting device according to a first embodiment of the present invention;
FIG. 3 is a diagram of a light source generating a circular pupil illumination pattern according to a first embodiment of the present invention;
FIG. 4 is a schematic view of the upper pupil of the mask in a circular pupil illumination mode according to a first embodiment of the present invention;
FIG. 5 shows a scheme of generating a Y-direction dipolar illumination pattern by a light source according to a first embodiment of the present invention;
FIG. 6 is a schematic view of the pupil of the mask in a Y-direction dipole illumination mode according to a first embodiment of the present invention;
FIG. 7 is a schematic diagram of a light source generating an X-direction dipole illumination pattern according to a first embodiment of the present invention;
FIG. 8 is a schematic view of the upper pupil of the mask in an X-direction dipole illumination mode in accordance with a first embodiment of the present invention;
FIG. 9 shows a quadrupole illumination mode scheme generated by a light source according to a first embodiment of the present invention;
FIG. 10 is a schematic view of the pupil of the mask during a quadrupole illumination mode in accordance with a first embodiment of the invention;
FIG. 11 is a flow chart of pupil energy distribution detection according to a first embodiment of the invention;
fig. 12 is a schematic structural view of a lighting device according to a second embodiment of the present invention.
Shown in the figure: 101-light source, 102-first converging lens group, 103-micro lens array, 104-second converging lens group, 105-variable field diaphragm, 106-relay lens group, 107-control unit and 108-mask.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. It is to be noted that the drawings are in simplified form and are not to precise scale, which is provided for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Example one
Referring to fig. 1, an illumination apparatus includes a light source and an dodging system disposed on an optical axis of the light source, wherein a light beam emitted from the light source is imaged on a mask 108 through the dodging system.
The light source 101 comprises an LED array and a light source controller, and the light source controller respectively controls the inclination angle between the light beam emitted by each LED light source in the LED array and the light source optical axis according to the pupil energy distribution requirement.
The light source 101 further includes a light beam collector array for collimating the light beam emitted from the LED array, the LED array includes a plurality of LED light sources of the same type, the light beam collector array includes a plurality of light beam collectors, one light beam collector corresponds to one LED light source, the LED light sources and the light beam collectors corresponding thereto are fixed as a whole, please refer to fig. 2, and the light source controller controls the light beam emitted from each of the LED light sources and the light source optical axis to be inclined in the X direction and the Y direction.
The angular distribution of the light beam emitted by the LED light source is Lambertian. The wavelength of the light beam emitted by the LED light source is 365nm, 248nm or shorter.
With reference to fig. 1, the dodging system includes a first converging lens group 102, a dodging unit and a relay lens group 106 sequentially disposed on the optical axis of the light source, an object plane of the first converging lens group 102 is disposed at the light exit end of the light source 101, an incident end of the dodging unit is disposed on an image plane of the first converging lens group 102, and an object plane of the relay lens group 106 is disposed at the light exit end of the dodging unit.
The first focusing mirror group 102 is a fixed focus focusing mirror group, and the light source controller controls the inclination angle between the light beam emitted from the LED light source and the light axis of the light source, and controls the distribution position of the pupil on the mask 108. The light uniformizing unit comprises a light uniformizer and a second converging lens group 104, the light uniformizer is a micro lens array 103 in the embodiment, and the micro lens array 103 is composed of two groups of mutually perpendicular cylindrical lens groups.
The dodging system further comprises a field control unit, the field control unit comprises a variable field diaphragm 105 and a variable field diaphragm controller, the variable field diaphragm 105 is located on the image plane of the second converging lens group 104, and the object plane of the relay lens group 106 is located on the image plane of the second converging lens group 104. The variable field stop controller controls the size of the field formed by the variable field stop 105. In this embodiment, the light source controller and the variable field stop controller are both arranged in the control unit 107.
An illumination method for the illumination device comprises the following steps:
and setting the number of the LED light sources in the LED array according to the pupil energy distribution requirement, when the pupil energy distribution requirement is that at least N-level illumination modes are formed, setting the number of the LED light sources in the LED array to be at least N, controlling the inclination angle of the light beam emitted by the LED array and the light source optical axis to generate the required pupil appearance, and imaging the light beam on a mask 108 after passing through the dodging system to finish off-axis illumination.
In this embodiment, the LED array 101 includes four LED light sources, the four LED light sources are symmetrically distributed on the X axis and the Y axis two by two, and four light beam collectors are correspondingly disposed. The light source controller is used for respectively controlling the inclination angle between the light beam emitted by each of the four LED light sources and the light axis of the light source, and the illumination device can form a circular pupil illumination mode, a two-pole illumination mode or a four-pole illumination mode. However, the LED array is not limited to only four LED light sources, and if the number of LED light sources and beam collectors is larger, a wider variety of illumination pupil distributions can be formed.
Referring to fig. 3 and 4, the light beams emitted by the four LED light sources and the light axes of the light sources are controlled not to tilt in the X direction and the Y direction, and the illumination device forms a circular pupil illumination mode.
Referring to fig. 7 and 8, the light beams emitted by the four LED light sources are controlled to tilt at two angles around the Y axis, the light beams and the light source optical axis tilt in the X direction, and the lighting device forms an X-direction two-pole lighting mode.
Referring to fig. 5 and 6, the light beams emitted by the four LED light sources are controlled to tilt at two angles around the X axis, the light beams and the light source optical axis tilt in the Y direction, and the lighting device forms a Y-direction two-pole lighting mode.
Referring to fig. 9 and 10, two light beams emitted by the four LED light sources are controlled to tilt around the X axis and four angles around the Y axis, the light beams and the light source optical axes tilt in the X direction and the Y direction, respectively, and the lighting device forms a four-pole lighting mode.
The angle of the light beam emitted by the LED array and the light axis of the light source inclining in the X direction or the Y direction is calculated according to the focal length of the first collecting lens group 102.
Referring to fig. 11, before the off-axis illumination is completed, the method further includes the following steps: according to the pupil formed by the light beam on the mask 108, testing whether the pupil energy distribution meets the requirement of the required pupil energy distribution, if so, finishing off-axis illumination, and if not, readjusting the inclination angle between the light beam emergent from each group of LEDs in the LED array 101 and the light source optical axis until the pupil energy distribution meets the requirement.
According to the illumination device, the required pupil energy distribution can be obtained on the mask 108 by changing the inclination angle between the emergent light beam of each LED light source and the light axis of the light source, so that the corresponding off-axis illumination is realized, and the pupil modulation principle is simple, the switching speed is high, and the energy utilization rate is high; meanwhile, the lighting device is simple in structure, convenient to install and debug and capable of reducing production cost.
Example two
Referring to fig. 12, a difference between the second embodiment and the first embodiment is that the first converging lens group 102 is a zoom converging lens group, and the control unit 107 controls an inclination angle between a light beam emitted from the LED light source and an optical axis of the light source, and at the same time, controls a movable lens in the zoom converging lens group to change a focal length of the zoom converging lens group, so as to change a pupil distribution position of an illumination pupil plane, change a size of a pupil, and better implement multiple off-axis illumination modes.
EXAMPLE III
The difference from the first and second embodiments is that the microlens array in the light uniformizing unit can be replaced by other light uniformizing schemes such as an integrating rod.
The invention also protects a photoetching machine, and the photoetching illumination device of the photoetching machine adopts the illumination device. According to the technical scheme, the off-axis illumination mode can be realized by adopting the illumination device, the focal depth of the projection objective of the photoetching machine is improved, and the photoetching efficiency of the photoetching machine is improved.
Various modifications and alterations of this invention may be made by those skilled in the art without departing from the spirit and scope of this invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (20)
1. An illumination device comprises a light source and a light homogenizing system, wherein the light homogenizing system is arranged on an optical axis of the light source, and light beams emitted by the light source are imaged on a mask through the light homogenizing system; and for the set pupil energy distribution requirement, the inclination angle of the light beam emitted by each LED light source in the LED array and the light source optical axis is generated at the same time.
2. A lighting device as recited in claim 1, wherein said light source further comprises a beam dump array for collimating the light exiting from said LED array, said LED array comprising a plurality of LED light sources of the same type, said beam dump array comprising a plurality of beam dumps, one beam dump corresponding to each of said LED light sources, said LED light sources being integrally fixed with their corresponding beam dump.
3. The illumination device of claim 1, wherein the angular distribution of the light beam emitted by the LED light source is lambertian.
4. A lighting device as recited in claim 1, wherein said LED light source emits a light beam having a wavelength of 365nm or 248 nm.
5. The illumination device according to claim 1, wherein the dodging system comprises a first converging lens group, a dodging unit and a relay lens group, which are sequentially disposed on the optical axis of the light source, an object plane of the first converging lens group is located at the light exit end of the light source, an input end of the dodging unit is located at an image plane of the first converging lens group, and an object plane of the relay lens group is located at the light exit end of the dodging unit.
6. An illumination device according to claim 5, wherein said first focusing lens group is a fixed focus focusing lens group or a variable focus focusing lens group.
7. The illumination device according to claim 5, wherein the light uniformizing unit comprises a light uniformizer and a second collection lens group, the light uniformizer is located at the image plane of the first collection lens group, the entrance pupil plane of the second collection lens group is located at the light exit end of the light uniformizer, and the object plane of the relay lens group is located at the image plane of the second collection lens group.
8. The illumination device of claim 7, wherein the light homogenizer is a microlens array or an integrating rod.
9. The illumination device of claim 5, wherein the dodging system further comprises a field control unit, the field control unit comprises a variable field diaphragm and a variable field diaphragm controller, the variable field diaphragm is located at the light exit end of the dodging unit, and the variable field diaphragm controller controls the size of the field formed by the variable field diaphragm.
10. An illumination method for use in an illumination device as claimed in claim 1, characterized by the steps of: and setting the number of the LED light sources in the LED array according to the pupil energy distribution requirement, when the pupil energy distribution requirement is an N-pole illumination mode, setting the number of the LED light sources in the LED array to be at least N, respectively controlling the inclination angle of the light beam emitted by each LED light source in the LED array and the light source optical axis to generate the required pupil appearance, and imaging the light beam on a mask after passing through the dodging system to finish off-axis illumination.
11. A method as recited in claim 10, wherein a beam dump is positioned after each of said LED light sources to collimate the emitted light from said LED light sources.
12. The lighting method according to claim 10, wherein the LED array is configured to include four LED light sources, and the four LED light sources are symmetrically distributed on the X axis and the Y axis in pairs.
13. The illumination method according to claim 12, wherein the light beam emitted by each LED light source is controlled to be not inclined in the X direction and the Y direction from the light source optical axis, and the illumination device forms a circular pupil illumination mode.
14. The illumination method of claim 12, wherein the light beams emitted by the four LED light sources are controlled to be tilted about the Y-axis by two angles, and the illumination device forms an X-direction dipolar illumination mode.
15. The illumination method of claim 12, wherein the light beams emitted by the four LED light sources are controlled to be tilted about the X-axis by two angles, and the illumination device forms a Y-direction dipolar illumination mode.
16. The illumination method of claim 13, wherein the four LED light sources are controlled to emit light beams, two of which are tilted about an X-axis and two of which are tilted about a Y-axis by four angles, so that the illumination device forms a quadrupole illumination mode.
17. The illumination method according to claim 10, wherein the dodging system includes a first converging lens group, a dodging unit and a relay lens group sequentially disposed on the optical axis of the light source, the object plane of the first converging lens group is located at the light exit end of the light source, the light entrance end of the dodging unit is located at the image plane of the first converging lens group, the object plane of the relay lens group is located at the light exit end of the dodging unit, and the inclination angle between the light beam emitted from the LED array and the optical axis of the light source is calculated according to the focal length of the first converging lens group.
18. The illumination method according to claim 17, wherein the first collection lens group is a zoom collection lens group, and the pupil distribution position and size of the illumination pupil plane are changed by changing the focal length of the zoom collection lens group.
19. The illumination method of claim 17, further comprising providing a variable field stop along an optical axis between the dodging unit and the relay lens group, adjusting the size of the illumination field on the mask.
20. A lithography machine comprising an illumination device according to any one of claims 1 to 9.
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| CN111752108A (en) * | 2019-03-28 | 2020-10-09 | 上海微电子装备（集团）股份有限公司 | LED lighting device and exposure machine |
| TWI721433B (en) * | 2019-05-22 | 2021-03-11 | 財團法人國家實驗研究院 | Light emitting device and exposing equipment having the same |
| JP7508278B2 (en) * | 2020-06-04 | 2024-07-01 | キヤノン株式会社 | Exposure apparatus, exposure method, and method for manufacturing article |
| CN111795921B (en) * | 2020-07-14 | 2023-08-22 | 南京理工大学 | Illumination system for particle counter sensor beam homogenization and sharpening |
| CN112965340A (en) * | 2021-02-04 | 2021-06-15 | 电子科技大学 | Compact maskless photoetching system and exposure method thereof |
| CN114690433B (en) * | 2022-04-11 | 2023-09-19 | 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） | Lighting system and objective offline detection device |
| WO2024138530A1 (en) * | 2022-12-29 | 2024-07-04 | 中国科学院光电技术研究所 | Coaxial and off-axis compatible illumination device and illumination method |
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| CN102566294A (en) * | 2010-12-28 | 2012-07-11 | 上海微电子装备有限公司 | Photoetching lamp optical system |
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| TW200625027A (en) * | 2005-01-14 | 2006-07-16 | Zeiss Carl Smt Ag | Illumination system for a microlithographic projection exposure apparatus |
| CN100559277C (en) * | 2006-11-03 | 2009-11-11 | 上海微电子装备有限公司 | A kind of lithography illuminating system |
| DE102008011501A1 (en) * | 2008-02-25 | 2009-08-27 | Carl Zeiss Smt Ag | Method for operating an illumination system of a microlithographic projection exposure apparatus |
| CN105805609B (en) * | 2014-12-31 | 2019-03-12 | 上海微电子装备（集团）股份有限公司 | A kind of LED light source lighting system |
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| CN1666153A (en) * | 2002-07-08 | 2005-09-07 | 卡尔蔡司Smt股份有限公司 | Optical device comprising an light source |
| CN102566294A (en) * | 2010-12-28 | 2012-07-11 | 上海微电子装备有限公司 | Photoetching lamp optical system |
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